DE69604601T2 - Fotopolymerisierbare Zusammensetzung - Google Patents
Fotopolymerisierbare ZusammensetzungInfo
- Publication number
- DE69604601T2 DE69604601T2 DE69604601T DE69604601T DE69604601T2 DE 69604601 T2 DE69604601 T2 DE 69604601T2 DE 69604601 T DE69604601 T DE 69604601T DE 69604601 T DE69604601 T DE 69604601T DE 69604601 T2 DE69604601 T2 DE 69604601T2
- Authority
- DE
- Germany
- Prior art keywords
- photopolymerizable composition
- photopolymerizable
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP01310895A JP3498869B2 (ja) | 1995-01-30 | 1995-01-30 | 光重合性組成物を有する画像形成材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69604601D1 DE69604601D1 (de) | 1999-11-18 |
DE69604601T2 true DE69604601T2 (de) | 2000-03-23 |
Family
ID=11823963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69604601T Expired - Lifetime DE69604601T2 (de) | 1995-01-30 | 1996-01-25 | Fotopolymerisierbare Zusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5703140A (de) |
EP (1) | EP0724197B1 (de) |
JP (1) | JP3498869B2 (de) |
DE (1) | DE69604601T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3723312B2 (ja) * | 1997-02-25 | 2005-12-07 | 富士写真フイルム株式会社 | 光重合性組成物 |
US20010010893A1 (en) * | 1998-03-05 | 2001-08-02 | Hiroshi Takanashi | Negative-working photosensitive resin composition and photosensitive resin plate using the same |
SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
ATE440308T1 (de) | 2000-06-15 | 2009-09-15 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
US7790353B2 (en) | 2000-06-15 | 2010-09-07 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
JP4786858B2 (ja) | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
AU2001266905A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
JP2004503392A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | マイクロ流体製品を製造するためのプロセス |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
JP4472922B2 (ja) * | 2000-06-15 | 2010-06-02 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子光化学プロセスを使用したマルチカラー画像化 |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
JP2006160836A (ja) | 2004-12-03 | 2006-06-22 | Fuji Photo Film Co Ltd | 放射線の照射により硬化可能なインクジェット記録用インク及びこれを用いた平版印刷版作製方法 |
JP2007055224A (ja) | 2005-01-26 | 2007-03-08 | Fujifilm Corp | 平版印刷版原版、平版印刷方法および平版印刷版原版の梱包体 |
EP1696268B1 (de) | 2005-02-28 | 2016-11-09 | FUJIFILM Corporation | Flachdruckplattenvorläufer |
JP5274132B2 (ja) * | 2007-07-17 | 2013-08-28 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法 |
EP2037323B1 (de) * | 2007-07-17 | 2014-12-10 | FUJIFILM Corporation | Lichtempfindliche Zusammensetzungen |
JP5496482B2 (ja) * | 2007-08-27 | 2014-05-21 | 富士フイルム株式会社 | 新規化合物、光重合性組成物、カラーフィルタ用光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
JP5507054B2 (ja) | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
DE2558812A1 (de) * | 1975-12-27 | 1977-07-07 | Hoechst Ag | Lichtempfindliche kopiermassen und darin enthaltene photoinitiatoren |
US4590145A (en) * | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
DE4219385A1 (de) * | 1992-06-13 | 1993-12-16 | Basf Ag | Copolymerisierbare Oximether und diese enthaltende Copolymerisate |
DE4309193A1 (de) * | 1993-03-22 | 1994-09-29 | Basf Ag | Copolymerisierbare Oximether und diese enthaltende Copolymerisate |
-
1995
- 1995-01-30 JP JP01310895A patent/JP3498869B2/ja not_active Expired - Fee Related
-
1996
- 1996-01-23 US US08/589,992 patent/US5703140A/en not_active Expired - Lifetime
- 1996-01-25 DE DE69604601T patent/DE69604601T2/de not_active Expired - Lifetime
- 1996-01-25 EP EP96101075A patent/EP0724197B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH08202035A (ja) | 1996-08-09 |
DE69604601D1 (de) | 1999-11-18 |
EP0724197B1 (de) | 1999-10-13 |
US5703140A (en) | 1997-12-30 |
EP0724197A1 (de) | 1996-07-31 |
JP3498869B2 (ja) | 2004-02-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |