AU2001266905A1 - Microfabrication of organic optical elements - Google Patents

Microfabrication of organic optical elements

Info

Publication number
AU2001266905A1
AU2001266905A1 AU2001266905A AU6690501A AU2001266905A1 AU 2001266905 A1 AU2001266905 A1 AU 2001266905A1 AU 2001266905 A AU2001266905 A AU 2001266905A AU 6690501 A AU6690501 A AU 6690501A AU 2001266905 A1 AU2001266905 A1 AU 2001266905A1
Authority
AU
Australia
Prior art keywords
microfabrication
optical elements
organic optical
photodefinable
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001266905A
Inventor
Robert J. De Voe
Patrick R. Fleming
Harvey W. Kalweit
Catherine Anne Leatherdale
Guoping Mao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2001266905A1 publication Critical patent/AU2001266905A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/188—Processes of additive manufacturing involving additional operations performed on the added layers, e.g. smoothing, grinding or thickness control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0075—Light guides, optical cables
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing

Abstract

Method of fabricating an optical element. A photodefinable composition is provided that includes (i) a hydrophobic, photodefinable polymer, said photodefinable polymer having a glass transition temperature in the cured state of at least about 80° C.; and (ii) a multiphoton photoinitiator system comprising at least one multiphoton photosensitizer and preferably at least one photoinitiator that is capable of being photosensitized by the photosensitizer. One or more portions of the composition are imagewise exposed to the electromagnetic energy under conditions effective to photodefinably form at least a portion of a three-dimensional optical element.
AU2001266905A 2000-06-15 2001-06-14 Microfabrication of organic optical elements Abandoned AU2001266905A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170100P 2000-06-15 2000-06-15
US60211701 2000-06-15
PCT/US2001/019038 WO2001096915A2 (en) 2000-06-15 2001-06-14 Microfabrication of organic optical elements

Publications (1)

Publication Number Publication Date
AU2001266905A1 true AU2001266905A1 (en) 2001-12-24

Family

ID=22787995

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001266905A Abandoned AU2001266905A1 (en) 2000-06-15 2001-06-14 Microfabrication of organic optical elements

Country Status (8)

Country Link
US (1) US6855478B2 (en)
EP (1) EP1292852B1 (en)
JP (1) JP4965052B2 (en)
KR (1) KR100810546B1 (en)
AT (2) ATE309553T1 (en)
AU (1) AU2001266905A1 (en)
DE (2) DE60138930D1 (en)
WO (1) WO2001096915A2 (en)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
JP4786858B2 (en) * 2000-06-15 2011-10-05 スリーエム イノベイティブ プロパティズ カンパニー Multiphoton curing to provide encapsulated optics
KR100811018B1 (en) * 2000-06-15 2008-03-14 쓰리엠 이노베이티브 프로퍼티즈 캄파니 Method for making or adding structures to an article
WO2001096959A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multidirectional photoreactive absorption method
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
JP2004503831A (en) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー Multipath multiphoton absorption method and apparatus
JP2002316363A (en) * 2001-02-16 2002-10-29 Fuji Photo Film Co Ltd Optical shaping device and exposure unit
JP4284889B2 (en) * 2001-05-28 2009-06-24 パナソニック電工株式会社 Optical waveguide, optical wiring board, electric / optical mixed circuit board, and optical waveguide manufacturing method
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7237893B2 (en) * 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
DE10252563A1 (en) * 2002-06-27 2004-01-29 Atotech Deutschland Gmbh A process for preparation of planar, optical waveguides useful for optical, electrooptical, or hybrid systems or for the preparation of electrooptical structural elements or hybrid electrooptical guide plates
US7235195B2 (en) 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
AU2002951841A0 (en) * 2002-09-30 2002-10-24 Swinburne University Of Technology Apparatus
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
EP1551906A4 (en) * 2002-10-16 2006-11-02 Georgia Tech Res Inst Polymers, methods of use thereof, and methods of decomposition thereof
JP3987787B2 (en) * 2002-11-25 2007-10-10 日東電工株式会社 Manufacturing method of three-dimensional polyimide optical waveguide
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
FR2859543B1 (en) * 2003-09-08 2005-12-09 Pascal Joffre SYSTEM FOR MANUFACTURING A THREE-DIMENSIONAL OBJECT IN A POLYMERIZABLE PHOTO MATERIAL
JP2005092177A (en) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc Optical component formation method
CN100392444C (en) * 2003-12-05 2008-06-04 3M创新有限公司 Method for producing photon crystal and controllable defect therein
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
AT413891B (en) * 2003-12-29 2006-07-15 Austria Tech & System Tech CIRCUIT BOARD ELEMENT WITH AT LEAST ONE LIGHT WAVEGUIDE, AND METHOD FOR PRODUCING SUCH A LADDER PLATE ELEMENT
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
KR101233918B1 (en) * 2004-12-29 2013-02-15 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Multi-photon polymerizable pre-ceramic polymeric compositions
US20060228386A1 (en) * 2005-02-22 2006-10-12 University Of Tennessee Research Foundation Polymeric microstructures
AR075744A1 (en) * 2005-06-10 2011-04-27 Consejo Nac Invest Cient Tec METHODS FOR MICROSCOPICAL OBSERVATION OF ONE OR MORE OBJECTS, CALIBRATE FLUORESCENCE MEASUREMENT DEVICES, PERFORM ELECTROPHYSIOLOGICAL STUDIES ON CELLS, MAKE MICROSTRUCTURED ON A PRINTED SUBSTRATE, MAKE PROTEINAR MODELS ON ONE SOPE, ON ONE
US9069256B2 (en) * 2005-10-03 2015-06-30 Carnegie Mellon University Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
US7799885B2 (en) 2005-11-30 2010-09-21 Corning Incorporated Photo or electron beam curable compositions
JP4880701B2 (en) 2005-12-21 2012-02-22 スリーエム イノベイティブ プロパティズ カンパニー Method and apparatus for processing multi-photon curable reactive compositions
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
KR100741110B1 (en) * 2006-02-15 2007-07-19 삼성에스디아이 주식회사 Optic fibre and method of forming electrodes of plasma display panel
US7728955B2 (en) * 2006-03-21 2010-06-01 Asml Netherlands B.V. Lithographic apparatus, radiation supply and device manufacturing method
US8858807B2 (en) * 2006-03-24 2014-10-14 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
AT503585B1 (en) 2006-05-08 2007-11-15 Austria Tech & System Tech PCB ELEMENT ELEMENT AND METHOD FOR THE PRODUCTION THEREOF
EP2468487B1 (en) * 2006-05-18 2017-07-12 3M Innovative Properties Company Light extraction structures and light guides incorporating same
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US20080083886A1 (en) 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
WO2009032815A1 (en) * 2007-09-06 2009-03-12 3M Innovative Properties Company Tool for making microstructured articles
JP5951928B2 (en) 2007-09-06 2016-07-13 スリーエム イノベイティブ プロパティズ カンパニー Light guide with light extraction structure to provide area control of light output
JP5161310B2 (en) * 2007-09-06 2013-03-13 スリーエム イノベイティブ プロパティズ カンパニー Method for forming a mold and method for forming an article using the mold
JP2011501209A (en) 2007-10-11 2011-01-06 スリーエム イノベイティブ プロパティズ カンパニー Color confocal sensor
US8455846B2 (en) 2007-12-12 2013-06-04 3M Innovative Properties Company Method for making structures with improved edge definition
US8605256B2 (en) * 2008-02-26 2013-12-10 3M Innovative Properties Company Multi-photon exposure system
CA2728400C (en) 2008-05-21 2014-03-25 Theraject, Inc. Method of manufacturing solid solution peforator patches and uses thereof
WO2009143482A2 (en) * 2008-05-22 2009-11-26 Georgia Tech Research Corporation Negative tone molecular glass resists and methods of making and using same
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
WO2011116306A2 (en) * 2010-03-19 2011-09-22 Avedro, Inc. Systems and methods for applying and monitoring eye therapy
DE102010020158A1 (en) * 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Device and method for producing three-dimensional structures
DE102011012484A1 (en) 2011-02-25 2012-08-30 Nanoscribe Gmbh Method and device for the spatially resolved introduction of an intensity pattern of electromagnetic radiation into a photosensitive substance and use thereof
WO2012145282A2 (en) 2011-04-22 2012-10-26 3M Innovative Properties Company Enhanced multi-photon imaging resolution method
DE102011050894A1 (en) * 2011-06-07 2012-12-13 Freie Universität Berlin Process for the polymerization of monomer and / or oligomer units by infrared light pulses
JP5995963B2 (en) 2011-06-08 2016-09-21 スリーエム イノベイティブ プロパティズ カンパニー Photoresists containing polymer-linked nanoparticles
US8903205B2 (en) 2012-02-23 2014-12-02 Karlsruhe Institute of Technology (KIT) Three-dimensional freeform waveguides for chip-chip connections
US9034222B2 (en) 2012-02-23 2015-05-19 Karlsruhe Institut Fuer Technologie Method for producing photonic wire bonds
DE102013005565A1 (en) * 2013-03-28 2014-10-02 Karlsruher Institut für Technologie Production of 3D free-form waveguide structures
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
WO2015102938A1 (en) * 2013-12-31 2015-07-09 3M Innovative Properties Company Volume based gradient index lens by additive manufacturing
CN106796392B (en) 2014-06-23 2021-12-14 卡本有限公司 Method for producing three-dimensional objects of polyurethane from materials with multiple hardening mechanisms
US10688770B2 (en) * 2015-03-03 2020-06-23 Ricoh Co., Ltd. Methods for solid freeform fabrication
US9695280B2 (en) 2015-03-03 2017-07-04 Ricoh Co., Ltd. Methods for solid freeform fabrication
US9808993B2 (en) 2015-03-03 2017-11-07 Ricoh Co., Ltd. Method for solid freeform fabrication
US10066119B2 (en) 2015-03-03 2018-09-04 Ricoh Co., Ltd. Method for solid freeform fabrication
EP3182184A1 (en) 2015-12-17 2017-06-21 Universite De Haute Alsace Method of making a self-aligned optical guide between an optical source and an optical fiber, and related kit
FR3056593B1 (en) * 2016-09-28 2020-06-26 Ecole Centrale De Marseille METHOD FOR THE PRODUCTION OF A THREE-DIMENSIONAL OBJECT BY A MULTI-PHOTONIC PHOTO-POLYMERIZATION PROCESS AND ASSOCIATED DEVICE
WO2018218085A2 (en) 2017-05-25 2018-11-29 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
US10933579B2 (en) * 2017-03-10 2021-03-02 Prellis Biologics, Inc. Methods and systems for printing biological material
US11085018B2 (en) 2017-03-10 2021-08-10 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
DE102017128824A1 (en) * 2017-12-05 2019-06-06 Osram Opto Semiconductors Gmbh Method for producing a radiation-emitting component and radiation-emitting component
US11616302B2 (en) 2018-01-15 2023-03-28 Rogers Corporation Dielectric resonator antenna having first and second dielectric portions
US11552390B2 (en) 2018-09-11 2023-01-10 Rogers Corporation Dielectric resonator antenna system
TWI820237B (en) * 2018-10-18 2023-11-01 美商羅傑斯公司 Polymer structure, its stereolithography method of manufacture, and electronic device comprising same
KR20210095632A (en) 2018-12-04 2021-08-02 로저스코포레이션 Dielectric electromagnetic structure and manufacturing method thereof
KR20220016812A (en) 2019-05-30 2022-02-10 로저스코포레이션 A photocurable composition for stereolithography, a stereolithography method using the composition, a polymer component formed by the stereolithography method, and an apparatus comprising the polymer component
CN110927873B (en) * 2019-12-25 2020-12-25 青岛五维智造科技有限公司 Method and equipment for batch production of AR diffraction optical waveguides
US11482790B2 (en) 2020-04-08 2022-10-25 Rogers Corporation Dielectric lens and electromagnetic device with same

Family Cites Families (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
GB1051391A (en) * 1959-12-24
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US3635545A (en) * 1967-04-14 1972-01-18 Eastman Kodak Co Multiple beam generation
US4041476A (en) * 1971-07-23 1977-08-09 Wyn Kelly Swainson Method, medium and apparatus for producing three-dimensional figure product
US4238840A (en) * 1967-07-12 1980-12-09 Formigraphic Engine Corporation Method, medium and apparatus for producing three dimensional figure product
US3677634A (en) * 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
US3806221A (en) * 1969-11-26 1974-04-23 Siemens Ag Holographic method of recording and reproducing etching masks
US3720921A (en) * 1970-07-14 1973-03-13 Ibm Recording in reversible, photochromic medium
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4333165A (en) * 1975-01-27 1982-06-01 Formigraphic Engine Corporation Three-dimensional pattern making methods
US4078229A (en) * 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
US4466080A (en) * 1975-01-27 1984-08-14 Formigraphic Engine Corporation Three-dimensional patterned media
US4471470A (en) * 1977-12-01 1984-09-11 Formigraphic Engine Corporation Method and media for accessing data in three dimensions
US4288861A (en) * 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4228861A (en) * 1979-08-02 1980-10-21 Hart Thomas E Folding track removing implement
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) * 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
DE3204686A1 (en) * 1982-02-11 1983-08-18 Fa. Carl Zeiss, 7920 Heidenheim OPTICAL SYSTEM FOR TRANSMITTED MICROSCOPY IN RESIDUAL ILLUMINATION
US4458345A (en) * 1982-03-31 1984-07-03 International Business Machines Corporation Process for optical information storage
US4666236A (en) * 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4496216A (en) * 1982-12-30 1985-01-29 Polaroid Corporation Method and apparatus for exposing photosensitive material
US4588664A (en) * 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms
US4614705A (en) * 1984-02-17 1986-09-30 Ricoh Co., Ltd. Optical information recording medium
US4642126A (en) * 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) * 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4775754A (en) * 1987-10-07 1988-10-04 Minnesota Mining And Manufacturing Company Preparation of leuco dyes
CN1035213A (en) * 1987-12-29 1989-08-30 精工电子工业株式会社 Travelling wave motor
JPH0826121B2 (en) * 1988-02-19 1996-03-13 旭電化工業株式会社 Resin composition for optical modeling
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
GB8911454D0 (en) * 1989-05-18 1989-07-05 Pilkington Plc Hologram construction
US5037917A (en) * 1989-06-09 1991-08-06 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159038A (en) * 1989-06-09 1992-10-27 Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159037A (en) * 1989-06-09 1992-10-27 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5034613A (en) * 1989-11-14 1991-07-23 Cornell Research Foundation, Inc. Two-photon laser microscopy
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
US5035476A (en) * 1990-06-15 1991-07-30 Hamamatsu Photonics K.K. Confocal laser scanning transmission microscope
WO1992000185A1 (en) 1990-06-22 1992-01-09 Martin Russell Harris Optical waveguides
GB2249192B (en) * 1990-07-18 1994-10-12 Sony Magnescale Inc Hologram scales
US5145942A (en) * 1990-09-28 1992-09-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Methyl substituted polyimides containing carbonyl and ether connecting groups
US5633735A (en) * 1990-11-09 1997-05-27 Litel Instruments Use of fresnel zone plates for material processing
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
JP2769393B2 (en) * 1991-04-26 1998-06-25 直弘 丹野 3D optical recording device
US5289407A (en) * 1991-07-22 1994-02-22 Cornell Research Foundation, Inc. Method for three dimensional optical data storage and retrieval
EP0538866B1 (en) * 1991-10-24 1996-09-11 Tosoh Corporation Protective coating material
EP0542656A1 (en) * 1991-10-31 1993-05-19 International Business Machines Corporation Pattern propagation by blanket illumination of patterned thermal conductors and patterned thermal insulator on a thermal conductor
DE4142327A1 (en) 1991-12-20 1993-06-24 Wacker Chemie Gmbh Iodonium salts and process for their preparation
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
US5466845A (en) 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
WO1994004744A1 (en) * 1992-08-20 1994-03-03 E.I. Du Pont De Nemours And Company Process for microstructuring surfaces of oriented polymeric substrates using laser radiation
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
TW268969B (en) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
JPH07100938A (en) * 1993-10-04 1995-04-18 C Met Kk Photosetting shaping method for improving surface roughness
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
US5854868A (en) * 1994-06-22 1998-12-29 Fujitsu Limited Optical device and light waveguide integrated circuit
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH08184718A (en) * 1994-12-28 1996-07-16 Hoechst Japan Ltd Optical waveguide element and manufacture thereof
JP3498869B2 (en) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 Image forming material having photopolymerizable composition
US5665522A (en) * 1995-05-02 1997-09-09 Minnesota Mining And Manufacturing Company Visible image dyes for positive-acting no-process printing plates
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5699175A (en) * 1995-09-08 1997-12-16 Quinta Corporation Multiphoton photorefractive holographic recording media
EP0853774B1 (en) * 1995-10-06 2001-11-07 Polaroid Corporation Holographic medium and process
US5750641A (en) * 1996-05-23 1998-05-12 Minnesota Mining And Manufacturing Company Polyimide angularity enhancement layer
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method
US5832931A (en) * 1996-10-30 1998-11-10 Photogen, Inc. Method for improved selectivity in photo-activation and detection of molecular diagnostic agents
US6267913B1 (en) * 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6618174B2 (en) * 1996-11-15 2003-09-09 Diffraction, Ltd In-line holographic mask for micromachining
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US6001297A (en) * 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
US6020591A (en) * 1997-07-11 2000-02-01 Imra America, Inc. Two-photon microscopy with plane wave illumination
JPH1135684A (en) * 1997-07-24 1999-02-09 Hitachi Chem Co Ltd Polyimide precursor and polyimide and its production
US5859251A (en) * 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) * 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
WO1999023650A1 (en) 1997-10-31 1999-05-14 Omd Devices Llc Multi-layered photochromic optical data disk
US6048911A (en) * 1997-12-12 2000-04-11 Borden Chemical, Inc. Coated optical fibers
US6103454A (en) * 1998-03-24 2000-08-15 Lucent Technologies Inc. Recording medium and process for forming medium
EP1084454B1 (en) 1998-04-21 2016-03-09 University of Connecticut Free-form nanofabrication using multi-photon excitation
KR100450542B1 (en) * 1998-10-29 2004-10-01 가부시키가이샤 히타치세이사쿠쇼 Illuminating apparatus and liquid crystal display using the same
US6327074B1 (en) * 1998-11-25 2001-12-04 University Of Central Florida Display medium using emitting particles dispersed in a transparent host
US6749814B1 (en) * 1999-03-03 2004-06-15 Symyx Technologies, Inc. Chemical processing microsystems comprising parallel flow microreactors and methods for using same
US6703188B1 (en) * 1999-03-29 2004-03-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Method of fabricating optical waveguide structure
US6100405A (en) * 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US6322931B1 (en) * 1999-07-29 2001-11-27 Siros Technologies, Inc. Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings
US6624915B1 (en) * 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
JP3876281B2 (en) * 2000-08-31 2007-01-31 独立行政法人産業技術総合研究所 Information recording method
US6541591B2 (en) * 2000-12-21 2003-04-01 3M Innovative Properties Company High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers
WO2002079691A1 (en) 2001-03-30 2002-10-10 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system

Also Published As

Publication number Publication date
EP1292852A2 (en) 2003-03-19
US20040126694A1 (en) 2004-07-01
JP2004503413A (en) 2004-02-05
EP1292852B1 (en) 2005-11-09
WO2001096915A3 (en) 2002-04-25
US6855478B2 (en) 2005-02-15
KR20030008219A (en) 2003-01-24
ATE309553T1 (en) 2005-11-15
JP4965052B2 (en) 2012-07-04
DE60138930D1 (en) 2009-07-16
DE60114820D1 (en) 2005-12-15
DE60114820T2 (en) 2006-09-14
WO2001096915A2 (en) 2001-12-20
KR100810546B1 (en) 2008-03-18
ATE433129T1 (en) 2009-06-15

Similar Documents

Publication Publication Date Title
AU2001266905A1 (en) Microfabrication of organic optical elements
WO2005035435A3 (en) Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced
ATE135826T1 (en) METHOD FOR PRODUCING EMBEDDED WAVEGUIDES
ES2179599T3 (en) PROCEDURE FOR PRODUCTION WITH HIGH PERFORMANCE OF METHYL METHYLRATE OR METACRYLIC ACID.
KR950701081A (en) Method for producing optical polymer components having integrated fiber-chip coupling by means of casting technology
BR8200744A (en) PROCESS TO FORM A SURFACE WITH LOW OPTICAL LOSS BY SPREADING; OPTICAL NUCLEUS FIBER
DE50212809D1 (en) WATER FREE UBICHINON CONCENTRATE
BR9507916A (en) Process for preparing an aqueous polymer dispersion aqueous polymer dispersion and application of a radical redox initiator system
BR0008309B1 (en) process to create a patterned concrete surface.
SE0100790L (en) System and method for fabricating Bragg gratings
AU2002360611A1 (en) Fiber optic safety system for wind turbines
BR0208740A (en) Thermosorbent layer system
ES2139143T3 (en) MICRO-MESOPOROUS GEL AND PROCEDURE FOR ITS PREPARATION.
BR0009518A (en) Process for the preparation of an ester of 2-hydroxy-4-methylthiobutyric acid
BR0110881A (en) Process for the preparation of porous inorganic solid bodies from an aqueous dispersion of particles, porous inorganic solid bodies, and use of porous inorganic solid bodies
ATE311033T1 (en) DEVICE FOR PRODUCING LINEAR MOVEMENTS
DE69840575D1 (en) OPTICAL WAVEGUIDE WITH MICROSCOPE, ITS MANUFACTURING METHOD, AND OPTICAL SIGNALING PROCESSOR
DE58900956D1 (en) METHOD FOR PRODUCING SILICA.
ATE439249T1 (en) METHOD FOR PRODUCING A MICROMECHANICALLY MACHINED STRUCTURE
SE9902552D0 (en) Optical coupling
DE29711263U1 (en) Device for the production of solar energy
CA2031057A1 (en) Fabrication of optical components utilizing a laser
EP0943935A8 (en) Optical waveguide and method for production thereof
EP0943935A9 (en) Optical waveguide and method for production thereof
WO2003048822A3 (en) Method of producing planar waveguides