DE10252563A1 - A process for preparation of planar, optical waveguides useful for optical, electrooptical, or hybrid systems or for the preparation of electrooptical structural elements or hybrid electrooptical guide plates - Google Patents

Abstract

A process for preparation of planar, optical waveguides for integration into optical or electrooptical structural elements or in hybrid conduction plates including the steps:(i) production of an integrated planar waveguide core in a polymer layer comprising polyacryate of increased glass transition temperature (Tg) and (ii) application of a further layer to the differentially illuminated (sic) or directly structured polymer layer. A process for preparation of planar, optical waveguides for integration into optical or electrooptical structural elements or in hybrid conduction plates including the steps:(i) production of an integrated planar waveguide core in a polymer layer comprising polyacryate of increased glass transition temperature (Tg) by means of unique (one-off, sic) differential illumination (sic) via a photomask or with direct laser illumination and (ii) application of at least one further layer to the differentially illuminated (sic) or directly structured polymer layer, where the further layer is a transparent superstrate (sic) of lower refractive index than the differentially illuminated or directly patterned (sic) structure. An independent claim is included for a polymethacrylate composition of glass transition temperature Tg higher than 145[deg]C obtainable by copolymerization of monomers selected from:(a) monomers 1-7: singly or in combination of the following mole% concentration relative to the polymer:1 to 7 all 0-90; (b) monomers 8 and 9 with crosslinkable side groups: and as desired with (c) methyl methacrylate to optimize the mechanical properties, where further class (a) monomers, i.e. (1) 1-3 and 6-7 are fluorinated at the ester group, (2) 1 and 7 are optionally fluorinated with dimethyl substitution at the polyring, and = (3): R1 to R4 = H, Me, further class (b) monomers, (1) 8 with Me or dimethyl substitution at the triple ring (sic) and optionally fluorinated, (2) 9 with Me or multiple Me substitution at the ester substituent, (3) further common monomers with crosslinking functionality in quantity 0-45% relative to the polymer, i.e. preferably 2-dicyclopentenyloxyethyl-, allyl-, vinyl-, propylene glycol-, glycidyl methacrylate, 2-(2-oxo-imidazolidine-1-yl)ethyl melthacrylate, hydroxypropyl-, hydroxyethyl-, 2-isocyanatoethyl (meth)acrylate, and other class (c) monomers: (1) phenyl-, benzyl-, n-alkyl, iso-alkyl-, t-alky-, and cyloalkyl methacrylate, (2) phenyl-, benzyl-, n-alkyl, iso-alkyl-, t-alky-, and cyloalkyl acrylate, (3) a styrene derivative.

Description

The invention relates to a method for the production of integrated waveguides, polymer systems for the production such waveguide with a high glass transition temperature (Tg) as well a simplified process for the production of planar waveguide channels.

Conducting light in waveguides is achieved by total reflection. The reflection medium (Superstrat) has a lower refractive index than the waveguide core on.

Small differences in the refractive index, i.e. Differences in magnitude of 0.01, between the core of the waveguide and the surrounding one Are shell with suitable angles of incidence sufficient for the optical waveguide Total reflection.

The integration of optical signal networks and the sharp rise in data transfer has led to the development of launched new hybrid optoelectronic printed circuit boards. Furthermore acquire optoelectronic component groups with optically integrated and hybrid waveguides are becoming increasingly important.

Current methods for introducing optical waveguides into printed circuit boards or optoelectronic components comprise many stages and are complex. Existing systems for direct waveguide formation in hybrid optoelectronics have glass transition temperatures (Tg) around 145 ° C in polycarbonate packs and require 2-10 hours of curing at 135 ° C according to Optical Crosslinks in Polyguide, SPIE 1997, 3 by Booth et al. They are designed for short waveguides in components and their series production is cumbersome or complex. Other systems with high thermal stability but with low optical transparency are used in the integrated optoelectronics for short connection distances in common substrates between functional elements.

The methods for producing planar waveguides in hybrid technology usually include hot stamping and photolithographic methods (cf., for example DE 198 66 658 and 196 25 386 ).

With the two-stage hot stamping (the for example in Lehmacher, Neyer, Electronic Letters 36, 2000, S. 1) is by means of a suitable embossing tool under pressure, a wave structure is hot stamped on a substrate a superstrate is laminated onto the stamp with the conductor cores and finally filled out the wells. Then will a cover layer (superstrate) is introduced or laminated directly.

Only limited formats are available with this Process producible for Every waveguide design must first have the corresponding stamping tool getting produced.

In photolithographic processes (see DeForest, Photoresist, 1975 p. 2,3) first becomes a substrate applied on the subsequently the waveguide layer is applied. This follows Put on a mask to image the waveguide using radiation on. In a further stage, the structure is developed. The resulting Structures then become like in the embossing process by filling and covering further developed.

According to this technique, wave-guiding also becomes and enveloping Structures achieved in stages. This process requires development of structures and thus a longer one Step sequence.

Direct structuring procedures of the waveguide cores using photolithography offer shorter step sequences.

The so-called "photolocking method" is the subject of the US patent US 3,809,732 , This method is explained below, as is the so-called “diffusion method”, which is the subject of US Patents 4,883,743, 5,292,620 and 5,402,514.

In the "photolocking process" a dopant is used in the polymerization to harden the Material used, which then from unexposed surfaces needs to be evaporated out. This procedure requires insertion of the dopant in the substrate or at least its preliminary curing and additionally a thermal treatment. The evaporation of a component has disadvantages in application technology, this method is not common.

In the diffusion process Monomers in a carrier matrix photocured and two exposures are required. This method leads to uneven, molecular inhomogeneous polymer structures. Such irregularities are disadvantageous and lead on Rayleigh scattering losses. Another disadvantage of this method are the repeated exposures to finish the structures fix.

The invention is based on the object of a method for producing optical conductor structures to provide less steps than the methods described above. Polymers with improved structural homogeneity are to be generated. In particular, the method is intended to avoid the use of an embossing tool and to form the waveguide in one step. Furthermore, the design of the conductor structure should be flexibly changeable and the imaging by lasers should be made possible.

According to the invention, polymer systems are also intended are provided, which with the methods of manufacture compatible with optoelectronic components and hybrid circuit boards are.

• (i) Erzeugen von integrierten planaren Wellenleiter-Kernen in einer Polymerlage bestehend aus Polyacrylat mit einer hohen Glasübergangstemperatur (Tg) mittels einmaligem differenziellen Belichten durch eine Photomaske oder mit Laser-Direktbelichtung und
• (ii) Aufbringen mindestens einer weiteren Lage auf die differenziell belichtete oder direktstrukturierte Polymerlage, wobei die weitere Lage ein transparenter Superstrat mit geringerem Brechungsindex als der der differenziell belichteten oder direktdessinierten Strukturen ist.

The invention relates to a method for producing planar, optical waveguides for integration in optical or electro-optical components or in hybrid printed circuit boards, comprising the following stages:

• (i) Generation of integrated planar waveguide cores in a polymer layer consisting of polyacrylate with a high glass transition temperature (Tg) by means of one-time differential exposure through a photomask or with laser direct exposure and
• (ii) applying at least one further layer to the differentially exposed or directly structured polymer layer, the further layer being a transparent superstrate with a lower refractive index than that of the differentially exposed or directly patterned structures.

• (a)
  
• (b) Monomeren mit vernetzbaren Seitengruppen
  
  und wahlweise mit (c) Methylmethacrylat zur Optimierung der mechanischen Eigenschaften, wobei weitere Monomere der Klasse (a) (1) 1-3 und 6-7 mit Fluor in der Estergruppe (2) 1 und 7 mit Dimethylsubstitution am Polyzyklus, gegebenenfalls fluoriert, und (3)
  
  sind, und weitere Monomere der Klasse (b) (1) 8 mit Methyl- oder Dimethyl-Substitution am Trizyklus, gegebenenfalls fluoriert, (2) 9 mit Methyl- oder mehrfacher Methyl-Substitution am Ester-Substituent sind.

According to a preferred embodiment, the polymer layer used in stage (i) comprises polymethacrylates or polymethacrylate derivatives with a glass transition temperature above 145 ° C. obtainable from monomers selected for a high Tg value

• (A)
  
• (b) Monomers with crosslinkable side groups
  
  and optionally with (c) methyl methacrylate to optimize the mechanical properties, with further monomers of class (a) (1) 1-3 and 6-7 with fluorine in the ester group (2) 1 and 7 with dimethyl substitution on the polycycle, optionally fluorinated, and (3)
  
  are, and further monomers of class (b) (1) 8 with methyl or dimethyl substitution on the tricyclic, optionally fluorinated, (2) 9 with methyl or multiple methyl substitution on the ester substituent.

Usually optically transparent and clear materials for the production preferred by waveguides. Polymethacrylates are therefore according to the invention or polymethacrylate derivatives used as material for the production of the waveguide. preferred wavelength are in the range from 600 to 1300 nm. Preferred compositions will be later described.

The polymer systems according to the invention have a increased Glass transition temperature (Tg) and are cheaper compared to other materials. Because of the chosen one Reaction conditions result in statistically regular polymers with improved properties. Exposure becomes waveguide tracks generated directly. Dense regions with different ones are created Refractive index, which is the required difference in refractive index between the core and the shell result.

According to the invention, photolysis and Recombination used. The radiation-induced photolysis of polymethyl methacrylate is a known method (see Timpe, Photopolymers, p. 175, 183, 255, 234 (1988)), which with low radiation intensity and recombination time rather to poor solubility of the irradiated structure. This leads to networked, denser structures (Frank Tomlinson, supra). A thermal aftertreatment below the Tg is advantageous.

In the method according to the invention can both the core and the lateral cladding structures in the waveguide layer can be generated simultaneously in one step.

The principle of total reflection in planar waveguides is used by Glaser in photonics for engineers P. 132 (1987). A gradient index is created when oversubscribed of the structures by means of overexposure with conventional photomasks. Photogrid masks can also be used become. Can continue multimode optical waveguides with a large cross-section are also used (Glaser, p. 155).

The invention is illustrated by the attached figures explained in more detail:

The 1 explains the method for differentiating between waveguide and refraction medium (cladding) according to the invention. The stage of irradiation differentiates either by molecular regrouping and / or by cross-linking. If the radiation causes a lowering of the refractive index, the negative imaging method is used. Only the sheathing of the conductor core is irradiated.

The 2 describes the method according to the invention for producing a waveguide system: a waveguide substrate is applied to a carrier and this is irradiated through a photomask. This may be followed by a heat treatment.

In the second stage there is a cover layer to complete the optical envelope applied to the waveguide thus generated. Another cover layer will replace the carrier attached if it does not act as a superstrate.

The positive imaging process thus includes the imaging of optical conductor tracks and the application of cover layers on the waveguide. A thermal aftertreatment can be done, but is not mandatory. The finished optical system consists of a laminate in sandwich form, which the wave conductor tracks inside contains.

The most important steps for forming or producing the optical conductor tracks are described below:
A conductive pattern is created by irradiation on a polymer film (substrate). This can be followed by a heat treatment. The thickness of the film used is generally 0.05 to 0.1 mm.

Mapping the waveguide pattern can be done in a simple manner be, especially with polymethacrylate copolymers, since these have a high optical Have transparency in the work area used.

An optically clear material such as TOPAS, PFCB, 12F-PEK Polynorbornen or optical glass from Schott (PFCB is a perfluorocyclobutane from Dow Chemical with up to Tg 400 ° C, TOPAS is a cycloolefin copolymer from TICONA with Tg 180 ° C, 12F -PEK is a polyphenylene ether ketone from Harris Corporation with Tg 180 ° C and polynorbornene is from BF Goodrich and has a Tg value of 280 ° C) can be used as carrier material and can also be used as permanent cover (Superstrat). A gradual lamination or hot pressing of laminates can be used for the production. The unexposed film is typically used as the superstrate. Another light-refractive material can also be used advantageously in that a lamination step is omitted.

Transparent epoxy adhesives like NOAA from Norland or hot presses typically up to 150 ° C ± 40 ° C preferably used for the production of composite in order to ensure adhesion of the To achieve laminates and to complete the laminate composite. The composite can then in further lamination steps of a hybrid system be processed further.

The optical system can also by Application of a polymer solution or paste (as in the solder mask technique) be applied. In this case, coatings are applied consecutively a bare laminate is applied and the system should prefer on outer layers a hybrid circuit board. Liability is inherent through Applying a paste or coating solution causes residual solvent removed sequentially by a tempering step.

Finally, the finished waveguide system on carrier layers Laminated from PCB pre-pregs, metal foils, silicon, glass or polymers or be pressed.

• (a)
  
• (b) Monomeren mit vernetzbaren Seitengruppen
  
  und wahlweise mit (c) Methylmethacrylat zur Optimierung der mechanischen Eigenschaften, wobei weitere Monomere der Klasse (a) (1) 1-3 und 6-7 mit Fluor in der Estergruppe (2) 1 und 7 mit Dimethylsubstitution am Polyzyklus, gegebenenfalls fluoriert, und (3)
  
  sind, und weitere Monomere der Klasse (b) (1) 8 mit Methyl- oder Dimethyl-Substitution am Trizyklus, gegebenenfalls fluoriert, (2) 9 mit Methyl- oder mehrfacher Methyl-Substitution am Ester-Substituent sind.

Another object of the invention is a polymethacrylate composition with a glass transition temperature above 145 ° C obtainable by copolymerization of monomers selected from

• (A)
  
• (b) Monomers with crosslinkable side groups
  
  and optionally with (c) methyl methacrylate to optimize the mechanical properties, further monomers of classes (a) (1) 1-3 and 6-7 with fluorine in the ester group (2) 1 and 7 with dimethyl substitution on the polycycle, optionally fluorinated, and (3)
  
  are, and further monomers of class (b) (1) 8 with methyl or dimethyl substitution on the tricyclic, optionally fluorinated, (2) 9 with methyl or multiple methyl substitution on the ester substituent.

The composition according to the invention is not brittle, includes translucent Polymers and has a glass transition temperature from above 145 ° C to 300 ° C.

Combinations of monomers used in a suitable statistical sequence be polymerized. For this, e.g. the PREDICI software for simulation the polymerization can be used.

The polymers are preferred produced by radical polymerization. Preferably Azobisisobutyronitrile as a radical initiator in aprotic organic solvents used at 70 ± 15 ° C. The statistical order of the recurring units in the Polymer chain can be determined using PREDICI. The ones shown above Monomers 1 to 7 serve to stiffen the polymer chain and result in polymers with a high glass transition temperature. Glass transition temperatures of methacrylate homopolymers are cited in Cypcar (op. cit., p. 8954). You can can be combined with methyl methacrylate to improve the mechanical properties to optimize if necessary.

Adamantyl and isobornyl ester methacrylate homopolymers have a high glass transition temperature. For example, when using compound 2, a glass transition temperature of 183 ° C (Cypcar, Camelio, Zazzeri, Mathias, Waegell, Macromolecules (1996), p. 8956 and cited lit.) and when using 1 a Tg of 203 ° C ( Allen, Wallraff, Dipietro, Hofer, J. of Photopolymer Science and Technol. 7, (1974), pp. 511, 515). The homopolymer 3-tetracyclododecyl methacrylate also has a high Tg: 204 ° C. N-alkylmaleimides 4 ( JP 63 89 806 ) lead to their rigidity by introducing a cyclic structure into the polymer chain and can be polymerized with methacrylate (see Levesque, Johannet, Pham, Busnot in Pol. Prepr. 1999, p. 1296). The unsubstituted imide 4 gives an MMA copolymer with a glass transition temperature of 180 ° C (Kwang-Duk Ahn, Young-Hun Lee, Deok-Il Koo, Polymer (1992), p. 4855) while in the polymerization of cyclohexylmaleimide with MMA Glass transition temperature of 158 ° C is obtained. The homopolymer of a-methylene butyrolactone 5 has a glass transition temperature above 300 ° C after polymerization (Arnoldi, Dorn, loc. Cit.).

Photo-Sensitizer/-Initiatoren bringen Schwierigkeiten hinsichtlich der Handhabung und der Herstellung mit sich. Im Rahmen der vorliegenden Erfindung ist die Verwendung von Photo-Sensibilisatoren nicht bevorzugt, gegebenenfalls aber erforderlich bei der Verwendung von Strahlungsquellen mit geringerer Leistung oder mit Wellenlängenmaxima bei 365 nm und höher (zum Beispiel eisen-dotierten Quecksilberlampen). Vorzugsweise werden Benzyldimethylketal 13, Benzoinmethylether 12 und Antrachinon 14 verwendet, bevorzugt aber als Acrylat oder Methacrylatester 15-17 im Polymergerüst eingebaut:

The side groups of class (b) used in the polymer composition additionally serve to increase the glass transition temperature by crosslinking. Thermally stable but linkable side groups are advantageous for densification of the waveguide core: polymers containing dicyclopentenyl methacrylate 8 and furfuryl methacrylate 9 can crosslink better:

Photo-sensitizers / initiators cause handling and manufacturing difficulties. In the context of the present invention, the use of photo-sensitizers is not preferred, but may be necessary when using radiation sources with lower power or with wavelength maxima at 365 nm and higher (for example iron-doped mercury lamps). Benzyldimethylketal 13, benzoin methyl ether 12 and antrachinone 14 are preferably used, but are preferably incorporated in the polymer structure as acrylate or methacrylate ester 15-17:

Other connections are shown below:

As an alternative or additional Components can for example dyes that can be decomposed by light (spiro compounds) or photothermally differentially degradable chromophores (e.g. 5-naphthoquinonediazides) be included.

• (i) Photodissoziation der α-Substituenten
• (ii) Seitenketten-Photolyse
• (iii) Vernetzung
• (iv) Radikalbildung an der Seitenkette
• (v) Rekombination

According to the invention, the chemical reactions on the polymer chain induced by UV radiation include:

• (i) Photodissociation of the α-substituents
• (ii) Side chain photolysis
• (iii) networking
• (iv) radical formation on the side chain
• (v) recombination

To achieve these reactions required radiation sources give radiation depending on the system choice in the near to vacuum UV. Customary Radiation sources are used. Depending on the system needs it an optimization of the radiation intensity. For example, requires a 3 μm Layer of polymethyl methacrylate on a silicon substrate, for example 8 min irradiation with an Xe-Hg arc lamp at 1 kW. Similar Conditions apply to all aromatic-free polymethacrylates. Chrome or aluminum photomasks can be used.

In a preferred embodiment, UV radiation with wavelengths 250 <λ <280 nm and a radiation intensity of 1-2 mW / cm ^{2 is used} for 2-4 hours. The polymer material does not contain any additives. An ArF laser at 193 nm can also be used for the same purpose, but a low radiation intensity must be used to avoid ablation.

Working with short-wave UV, e.g. at 254 nm to all reactions (i) to (v). In the case of pure PMMA smaller fragments split off (Miraoka, IBM J. Res. Dev. 21, 121 (1977)). It is coming to a loss of volume and at the same time an increase in Refractive index in the irradiated structure. This loss of volume is serious at PMMA (Frank, Passive components in plastic materials using surface modification by ionizing radiation, Proc. POF 98, Berlin, 273 (1998)).

In the embodiment according to the invention ester groups are used in 1-11 and 15-18, the less volatile Splitting products result. As a result, the volume loss is less and the degree of crosslinking is higher. The latter property leads rather to increase Tg in contrast to the lowering of Tg in PMMA. It comes down to it according to the invention processes (i) to (v) compared to the Chain splitting with just enough energy preferred to To let trains come. You can even short successive exposures advantageously used become. A tempering of the material after exposure below the Tg temperature leads for improved thermal stability.

In another embodiment the photoinduced side chain cleavage above an irradiation wavelength of 260 nm used to crosslink the irradiated structures, e.g. at Use 15-18.

In another embodiment is the photo-induced radical formation to cross-link the irradiated Structures used, e.g. when using 8 and 9. The latter networked am Ring (Gandini, The Behavior of Furan Derivatives in Polymerization Reactions, pp. 57, 78).

In another embodiment is the photo-induced polymerization of dissolved residual monomer used to densify the irradiated structures, e.g. Using from 1-9.

The decomposition of polymethyl methacrylate (PMMA) by electron beams (Frank, Passive components in plastic materials using surface modification by ionizing radiation, Proc. POF 98, Berlin, 273 (1998)) is known and examined: the split depends in monomers on the radiation intensity off and there is a recombination. It was also observed the hardening of polymers using an electron beam. The reactivity of polymethacrylates is also known across from UV light. UV light can also be generated using a laser. reported insolubility has also become of polymethacrylate with UV exposure (Tomlinson, Hamikow, Chandross, Fork, Silfrast Appl. Phy. Lett. P. 486 (1970)). According to the invention near UV additionally a thermally stable Photoinitiator used as a sensitizer in the side chain. It serves equally as a photocrosslinker.

A reaction example with dicyclopentenyl methacrylate for the production of cross-linked patterns is shown in the following formula:

In addition to those as described above producible polymethacrylate compositions can also commercial Polymethacrylate compositions are used, provided that these have a glass transition temperature above 145 ° C. Such polymethyl acrylate compositions are, for example, in “heat resistance and optically brilliant ", Arnoldi, Dorn, Schwind, Haßkerl, Hauch in Kunststoffe 87 (1997), p. 734.

A copolymer of 40% has 4-methyl-3-methylenedihydrofuran-2-one 5 with MMA a Tg of 182 ° C. A terpolymer of 5 with MMA but with a lower proportion of MMA and containing for it 1, 2, 3, 4, 6, or 7 leads at least the same or higher Tg, by the inner softening (cf.Hans-Georg Elias, Macromolecules, p. 856 (1990)) of the MMA is reduced. MMA has a Tg of 105 ° C, while the homopolymers the replacement components 1, 2, 3, 4, 6, or 7 are above.

The Tg values of methacrylate polymers can be reliable predict as suggested by Cypcar et al. in Macromolecules, pp. 8954ff. shown. The theory of glass transition temperature is in Elias, p. 854ff. explained.

Another embodiment is copolymers with 1. By 42-5% MMA to isobornyl methacrylate 1 in the polymerization added a copolymer with a Tg temperature of 170 ° C (Allen, Wallraff (op. Cit., P. 515)) and thus 33 ° C below the Tg temperature of the homopolymer. Multi-component copolymers with 2 to 10 or 11 not only serve to achieve a high Tg, but allow through Mixing these monomers also optimizes the mechanical Properties by means of synergistic effects.

In the present invention obtain improved compositions of high Tg polymethacrylates, by statistically modeling Co, Ter, Tetra and Penta polymerizations become.

The modeling enables higher molecular weights than in uncontrolled solution polymerization. About that In addition, modeling software can provide a statistically homogeneous distribution of the monomers in the polymer chain can be adjusted (see Deuflhard, Wulkow, simulation method for Polymer Chemistry, Preprint SC 94-22 (August 1994), Konrad Zuse Center for Information Technology Berlin). One of the many options Maeder and Renken describe how to obtain the optimization parameters in DECHEMA Monographs 131 (1995), p. 433. The requirement for molecular homogeneity in waveguides for low dispersion losses are generally known. According to the invention Task by modeling the polymerization as described solved. Without modeling, preferred monomer regions form in the polymer chain according to their Reactivity (see Deuflhard, p. 15), a disadvantage for the mechanical and optical properties.

A disadvantage of high Tg compositions is that after applying and drying the polymer solution can result in internal tensions. This is avoided by tempering below the Tg. Conventional ovens, infrared and microwave radiation are used.

Synthesis instructions for the polymerization of methacrylic acid esters in solution are in macromolecules lare substances, methods of Org. Chemie, Houben-Weyl Müller, volume XIV 1, pp. 1044-1048, macromolecular substances, volume E20 part 2, pp. 1144-1149, 1156-1160.

Photopolymerization can also can be used to produce the copolymers. Davidenko, Peniche, Sastre, San Roman in J. of Polym. Science, Part A, Polymer Chemistry 54 (1996), p. 1753).

To determine the glass transition temperature become commercially available Methods used, a compilation can be found at Behrstein, Egorov in “Differential Scanning Calorimetry of Polymers ", P. 134 (1994).

The listed monomers are many for sale available, e.g. 1-Adamantyl methacrylate from BIMAX, isobornyl methacrylate from Atofina, norbornyl methacrylate from Aldrich, dicyclopentenyl methacrylate from Hitachi Chemical, furfuryl methacrylate from Aldrich and the like Sensitizers such as the 2-methylacrylic acid-5,8-dioxo-5,8-dihydronaphthalene-1-yl ester.

Claims (28)

Process for the production of planar, optical waveguides for integration in optical or electro-optical components or in hybrid circuit boards, comprising the following stages: (I) Creation of integrated planar waveguide cores in one Polymer layer consisting of polyacrylate with a high glass transition temperature (Tg) using a single differential exposure through a photomask or with laser direct exposure and (ii) Apply at least another location on the differentially exposed or directly structured Polymer layer, the further layer being a transparent superstrate with a lower refractive index than that of the differently exposed ones or directly patterned structures. A method according to claim 1, characterized in that the polymer layer polymethacrylates, polymethacrylate derivatives and copolymer compositions with a glass transition temperature above 145 ° C obtainable from monomers selected from (a) monomers 1 to 7 individually or in combination with the following molar percentages the polymer: 1 0-90%, 2 0-90%, 3 0-90%, 4 0-90%, 5 0-90, 6 0-90% and 7 0-90%.

(b) Monomers with crosslinkable side groups

and optionally with (c) methyl methacrylate to optimize the mechanical properties, further monomers of classes (a) (1) 1-3 and 6-7 with fluorine in the ester group (2) 1 and 7 with dimethyl substitution on the polycycle, optionally fluorinated, and (3)

are also further monomers of class (b) (1) 8 with methyl or dimethyl substitution on the tricyclic, optionally fluorinated, (2) 9 with methyl or multiple methyl substitution on the ester substituent, (3) further customary monomers with crosslinkable functionality with 0-45% mol percent based on the polymer, preferably 2-dicyclopentenyloxyethyl methacrylate, allyl methacrylate, vinyl methacrylate, propylene glycol methacrylate, glycidyl methacrylate, 2- (2-oxo-imidazolidin-1-yl) ethyl methacrylate, hydroxypropyl methacrylate, hydroxyethyl methacrylate, hydroxyethyl methacrylate Isocyanatoethyl methacrylate and acrylates, and other monomers of class (c) (1) phenyl, benzyl, n-alkyl, iso-alkyl, tert-alkyl and cycloalkyl methacrylates, (2) phenyl, benzyl, n- Alkyl, iso-alkyl, tert-alkyl and cycloalkyl acrylates, (3) styrene derivatives. Method according to claim 1 or 2, characterized in that that the polymer layer continues to be photosensitizers and / or crosslinking aids includes. A method according to claim 3, characterized in that the Photosensitizer also acts as a networking aid. A method according to claim 3, characterized in that the Networking aid also acts as a photosensitizer. A method according to claim 4 or 5, characterized in that the photosensitizer or the crosslinking aid is selected from compounds of the formulas

A method according to claim 1, characterized in that the The layers are applied by laminating a film. A method according to claim 1, characterized in that the The layers are applied by coating. A method according to claim 8, characterized in that the coating by applying egg ner polymer solution or paste. A method according to claim 1, characterized in that the additional layer of glass, TOPAS, PFCB, 12F-PEK, polynorbornen or a Is epoxy resin. A method according to claim 1, characterized in that the Superstrat glass, TOPAS, PFCB or 12F-PEK, polynorbornen or one Is epoxy resin. A method according to claim 1, characterized in that the Polymer film containing waveguide cores has a thickness of 0.01 up to 0.1 mm. A method according to claim 1, characterized in that in step (i) differential exposure using appropriate ones Photo masks or overexposure he follows. A method according to claim 1, characterized in that the Imaging done with light from 190-470 nm. A method according to claim 1, characterized in that after Step (i) or / and after step (ii) a thermal aftertreatment he follows. A method according to claim 1, characterized in that the in step (ii) applied further layer or superstrate from the same material as the waveguide layer. A method according to claim 1, characterized in that the Apply additional layers by laminating or hot pressing he follows. A method according to claim 1, characterized in that the another layer or superstrate is insensitive to exposure. A method according to claim 1, characterized in that a photosensitive polymer layer on a photosensitive superstrate applied with a lower refractive index than that of the waveguide cores becomes. Polymethacrylate composition with a glass transition temperature above 145 ° C obtainable by copolymerization of monomers selected from (a) monomers 1 to 7 individually or in combination with the following molar percentages based on the polymer: 1 0-90, 2 0-90%, 3 0- 90, 4 0-90%, 5 0-90%, 6 0-90% and 7 0-90%.

(b) Monomers with crosslinkable side groups

and optionally with (c) methyl methacrylate to optimize the mechanical properties, further monomers of classes (a) (1) 1-3 and 6-7 with fluorine in the ester group (2) 1 and 7 with dimethyl substitution on the polycycle, optionally fluorinated, and (3)

are further monomers of class (b) (1) 8 with methyl or dimethyl substitution on the tricyclic, optionally fluorinated, (2) 9 with methyl or multiple methyl substitution on the ester substituent, (3) other customary monomers with crosslinkable functionality with 0-45% mol percent based on the polymer, preferably 2-dicyclopentenyloxyethyl methacrylate, al-lyl methacrylate, vinyl methacrylate, propylene glycol methacrylate, glycidyl methacrylate, 2- (2-oxo-imidazolidin-1-yl) ethyl methacrylate, hydroxypropyl methacrylate, hydroxyethyl 2-isocyanatoethyl methacrylate and acrylates, and further monomers of class (c) (1) phenyl, benzyl, n-alkyl, iso-alkyl, tert-alkyl and cycloalkyl methacrylates, (2) phenyl, benzyl, n-alkyl, iso-alkyl, tert-alkyl and cycloalkyl -Acrylates, (3) styrene derivatives. Polymethacrylate composition according to claim 21, characterized in that they continue to use photosensitizers and / or networking aids includes. Polymethacrylate composition according to claim 21, characterized in that the photosensitizer also acts as a networking aid. Polymethacrylate composition according to claim 21, characterized in that the networking aid also acts as a photosensitizer. Polymethacrylate composition according to claims 22-24, characterized in that the photosensitizer or the crosslinking aid is selected from compounds of the formulas

Planar polymeric waveguide with a glass transition temperature above 145 ° C available through Photosplitting of the polymethacrylate compositions according to claims 21 to 25. Waveguide according to claim 26, characterized in that he's a differential change of the refractive index. Use of the polymethacrylate composition according to claims 21 to 25 for the production a planar optical waveguide in an optical, electro-optical or hybrid system. Use of the method according to claims 1 to 20 for the production of electro-optical components or hybrid electro-optical Printed circuit boards.