DE69607710T2 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69607710T2
DE69607710T2 DE69607710T DE69607710T DE69607710T2 DE 69607710 T2 DE69607710 T2 DE 69607710T2 DE 69607710 T DE69607710 T DE 69607710T DE 69607710 T DE69607710 T DE 69607710T DE 69607710 T2 DE69607710 T2 DE 69607710T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69607710T
Other languages
English (en)
Other versions
DE69607710D1 (de
Inventor
Ryoji Hattori
Tatsuichi Maehashi
Takaaki Kuroki
Sota Kawakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of DE69607710D1 publication Critical patent/DE69607710D1/de
Application granted granted Critical
Publication of DE69607710T2 publication Critical patent/DE69607710T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y10S430/119—Hydroxyl or carbonyl group containing as sole functional groups
DE69607710T 1995-09-08 1996-09-05 Lichtempfindliche Zusammensetzung Expired - Lifetime DE69607710T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23144495 1995-09-08

Publications (2)

Publication Number Publication Date
DE69607710D1 DE69607710D1 (de) 2000-05-18
DE69607710T2 true DE69607710T2 (de) 2000-08-17

Family

ID=16923638

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69607710T Expired - Lifetime DE69607710T2 (de) 1995-09-08 1996-09-05 Lichtempfindliche Zusammensetzung

Country Status (3)

Country Link
US (1) US5773194A (de)
EP (1) EP0762208B1 (de)
DE (1) DE69607710T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6664019B2 (en) * 1996-06-19 2003-12-16 Printing Developments Inc. Aluminum printing plates and method of making
FR2762001B1 (fr) * 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques
WO1999045558A1 (en) * 1998-03-05 1999-09-10 Fed Corporation Blue and ultraviolet photolithography with organic light emitting devices
JP2000275864A (ja) * 1999-01-22 2000-10-06 Kodak Polychrome Graphics Japan Ltd 印刷刷版作製方法
US6455132B1 (en) 1999-02-04 2002-09-24 Kodak Polychrome Graphics Llc Lithographic printing printable media and process for the production thereof
US6399276B1 (en) * 1999-06-29 2002-06-04 Agfa-Gevaert Processless printing plate with cover layer containing compounds with cationic groups
US6558875B1 (en) * 1999-07-27 2003-05-06 Mitsubishi Chemical Corporation Method for treating photosensitive lithographic printing plate
JP4050854B2 (ja) * 1999-12-21 2008-02-20 富士フイルム株式会社 画像形成方法
JP3654422B2 (ja) * 2000-01-31 2005-06-02 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
JP2002002134A (ja) * 2000-06-19 2002-01-08 Kimoto & Co Ltd 平版印刷用刷版材料
JP2002072462A (ja) * 2000-08-25 2002-03-12 Fuji Photo Film Co Ltd 平版印刷版原版及びその製版方法
US6696216B2 (en) * 2001-06-29 2004-02-24 International Business Machines Corporation Thiophene-containing photo acid generators for photolithography
JP4230130B2 (ja) * 2001-07-04 2009-02-25 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
JP2003215800A (ja) * 2002-01-24 2003-07-30 Kodak Polychrome Graphics Japan Ltd 感光性組成物および感光性平版印刷版
JP3969109B2 (ja) * 2002-02-08 2007-09-05 コニカミノルタホールディングス株式会社 感光性平版印刷版及びその記録方法
US6783913B2 (en) 2002-04-05 2004-08-31 Kodak Polychrome Graphics Llc Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
JP2004210932A (ja) * 2002-12-27 2004-07-29 Daicel Chem Ind Ltd 硬化性樹脂組成物及び硬化物
US20050046915A1 (en) * 2003-08-22 2005-03-03 Fuji Photo Film Co., Ltd. Hologram recording material composition, hologram recording material and hologram recording method
EP1510862A3 (de) * 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Verfahren zur Aufzeichnung von Hologrammen und Auzeichnungsmaterial für Hologramme
JP4384570B2 (ja) * 2003-12-01 2009-12-16 東京応化工業株式会社 厚膜用ホトレジスト組成物及びレジストパターンの形成方法
WO2005109098A1 (en) * 2004-05-12 2005-11-17 Fuji Photo Film Co., Ltd. Pattern forming material, pattern forming apparatus, and pattern forming process
JP2006256132A (ja) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc ネガ型感光性平版印刷版材料及び平版印刷版の製版方法
EP1783548B1 (de) * 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Verfahren zur Bildung einer gemusterten Schicht auf einem Substrat
JP4820640B2 (ja) * 2005-12-20 2011-11-24 富士フイルム株式会社 平版印刷版の作製方法
ES2916205T3 (es) * 2015-01-09 2022-06-29 Ivoclar Vivadent Ag Materiales compuestos dentales con estabilidad en almacenamiento mejorada
JP7228121B2 (ja) * 2018-04-25 2023-02-24 エア・ウォーター・パフォーマンスケミカル株式会社 光重合増感剤組成物

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1860426A (en) 1930-06-30 1932-05-31 Westinghouse Air Brake Co Brake and power controller
US2807648A (en) 1955-09-16 1957-09-24 Stauffer Chemical Co Process for making sulfonium compounds
GB896563A (en) 1959-12-10 1962-05-16 Algraphy Ltd Improvements in or relating to the graining of lithographic plates
US3181461A (en) 1963-05-23 1965-05-04 Howard A Fromson Photographic plate
US3859261A (en) * 1971-06-08 1975-01-07 Hercules Inc Azides
JPS4828123A (de) 1972-04-14 1973-04-13
JPS5637695B2 (de) 1973-05-18 1981-09-02
JPS5723253B2 (de) 1974-03-25 1982-05-18
JPS585795B2 (ja) 1976-11-27 1983-02-01 日本軽金属株式会社 オフセツト印刷用アルミニウム粗面板の製造法
DE2823820A1 (de) * 1978-05-31 1979-12-06 Siemens Ag Verfahren zur vernetzung und stabilisierung von radikalisch vernetzbaren polymeren
JPS55527A (en) 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
US4258128A (en) 1978-12-01 1981-03-24 Eastman Kodak Company Tellurium(II) compounds and complexes having organic moieties containing silicon containing compositions, articles and photoimaging processes
JPS59192250A (ja) 1982-11-29 1984-10-31 Konishiroku Photo Ind Co Ltd 平版印刷版材料及びその製造方法
JPS59101651A (ja) 1982-12-02 1984-06-12 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS59182785A (ja) 1983-02-28 1984-10-17 Konishiroku Photo Ind Co Ltd 熱現像拡散転写写真用受像要素及び感熱昇華転写材料用受像要素
JPS6076503A (ja) * 1983-10-03 1985-05-01 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
JPS60130735A (ja) 1983-12-19 1985-07-12 Konishiroku Photo Ind Co Ltd 熱転写用受像要素
JPH0694234B2 (ja) 1984-01-17 1994-11-24 富士写真フイルム株式会社 感光性平版印刷版
US4591443A (en) * 1984-11-08 1986-05-27 Fmc Corporation Method for decontaminating a permeable subterranean formation
JPH0731399B2 (ja) * 1984-12-21 1995-04-10 三菱化学株式会社 光重合性組成物
JPS61159644A (ja) 1985-01-07 1986-07-19 Fuji Photo Film Co Ltd 色素固定材料
JPS6219494A (ja) 1985-07-18 1987-01-28 Fuji Photo Film Co Ltd 平版印刷版用支持体
US4772541A (en) 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
DE3602472A1 (de) * 1986-01-28 1987-07-30 Basf Ag Polymeranalog modifizierte polymerisate
DE3619130A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
AU599400B2 (en) * 1986-08-01 1990-07-19 Ciba-Geigy Ag Titanocenes and their use
JPH062436B2 (ja) 1986-12-26 1994-01-12 富士写真フイルム株式会社 平版印刷版用支持体
JPH01127389A (ja) 1987-11-12 1989-05-19 Fuji Photo Film Co Ltd 平版印刷版支持体の製造方法
JPH0764786B2 (ja) 1987-12-23 1995-07-12 住友化学工業株式会社 フェノール系化合物およびこれを有効成分とするブタジエン系ポリマー用安定剤
JP2707709B2 (ja) 1989-04-13 1998-02-04 住友化学工業株式会社 フェノール系化合物およびこれを有効成分とするブタジエン系ポリマー用安定剤
JPH024258A (ja) 1988-06-21 1990-01-09 Konica Corp ネガ型感光性印刷版
JP2549303B2 (ja) * 1988-09-21 1996-10-30 富士写真フイルム株式会社 感光性組成物
JPH02306247A (ja) 1989-01-19 1990-12-19 Mitsubishi Kasei Corp 光重合性組成物
JPH02289857A (ja) * 1989-04-28 1990-11-29 Mitsubishi Kasei Corp フォトソルダーレジスト
JPH03148655A (ja) * 1989-07-29 1991-06-25 Canon Inc 画像形成媒体及び画像形成方法
DE4023240A1 (de) * 1990-07-21 1992-01-23 Basf Ag Modifizierte emulsionspolymerisate insbesondere fuer in wasser und waessrigen loesungsmitteln entwickelbare photopolymerisierbare aufzeichnungsmaterialien
US5153102A (en) * 1990-08-10 1992-10-06 Industrial Technology Research Institute Alkalline-solution-developable liquid photographic composition
JPH04161957A (ja) 1990-10-24 1992-06-05 Nippon Paint Co Ltd 光重合性組成物および感光性平版印刷版
DE4102173A1 (de) * 1991-01-25 1992-07-30 Basf Ag Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten
JP2722870B2 (ja) 1991-06-14 1998-03-09 日本ゼオン株式会社 レジスト組成物
JPH04367864A (ja) 1991-06-14 1992-12-21 Nippon Zeon Co Ltd レジスト組成物
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
JP3028725B2 (ja) * 1994-02-10 2000-04-04 東洋インキ製造株式会社 反応性マイクロゲルおよびそれを用いた水現像可能なフレキソ印刷版用感光性樹脂組成物

Also Published As

Publication number Publication date
US5773194A (en) 1998-06-30
EP0762208A3 (de) 1997-09-17
DE69607710D1 (de) 2000-05-18
EP0762208B1 (de) 2000-04-12
EP0762208A2 (de) 1997-03-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition