DE69604034T2 - Positiv arbeitende Fotoresistzusammensetzung - Google Patents

Positiv arbeitende Fotoresistzusammensetzung

Info

Publication number
DE69604034T2
DE69604034T2 DE69604034T DE69604034T DE69604034T2 DE 69604034 T2 DE69604034 T2 DE 69604034T2 DE 69604034 T DE69604034 T DE 69604034T DE 69604034 T DE69604034 T DE 69604034T DE 69604034 T2 DE69604034 T2 DE 69604034T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive photoresist
positive
composition
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69604034T
Other languages
English (en)
Other versions
DE69604034D1 (de
Inventor
Shiro Tan
Shinji Sakaguchi
Yasumasa Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69604034D1 publication Critical patent/DE69604034D1/de
Publication of DE69604034T2 publication Critical patent/DE69604034T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69604034T 1995-09-20 1996-09-20 Positiv arbeitende Fotoresistzusammensetzung Expired - Lifetime DE69604034T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24189595 1995-09-20

Publications (2)

Publication Number Publication Date
DE69604034D1 DE69604034D1 (de) 1999-10-07
DE69604034T2 true DE69604034T2 (de) 1999-12-16

Family

ID=17081158

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604034T Expired - Lifetime DE69604034T2 (de) 1995-09-20 1996-09-20 Positiv arbeitende Fotoresistzusammensetzung

Country Status (4)

Country Link
US (1) US5652081A (de)
EP (1) EP0764884B1 (de)
KR (1) KR100384186B1 (de)
DE (1) DE69604034T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6127087A (en) * 1997-06-18 2000-10-03 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist compositions and multilayer resist materials using same
DE69817687T2 (de) * 1997-06-24 2004-07-08 Fuji Photo Film Co., Ltd., Minami-Ashigara Positiv-Fotoresist-Zusammensetzung
JP3600713B2 (ja) * 1997-08-06 2004-12-15 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP3666839B2 (ja) * 1998-01-23 2005-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物およびその製造方法
US5985507A (en) * 1998-02-18 1999-11-16 Olin Microelectronic Chemicals, Inc. Selected high thermal novolaks and positive-working radiation-sensitive compositions
JP3688469B2 (ja) * 1998-06-04 2005-08-31 東京応化工業株式会社 ポジ型ホトレジスト組成物およびこれを用いたレジストパターンの形成方法
US6506831B2 (en) 1998-12-20 2003-01-14 Honeywell International Inc. Novolac polymer planarization films with high temperature stability
JP2001033957A (ja) * 1999-07-19 2001-02-09 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
US6964838B2 (en) 2001-01-17 2005-11-15 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist composition
WO2005050319A1 (ja) * 2003-11-21 2005-06-02 Sekisui Chemical Co., Ltd. ポジ型フォトレジスト及び構造体の製造方法
KR101852457B1 (ko) 2015-11-12 2018-04-26 삼성에스디아이 주식회사 신규한 중합체를 포함하는 수지 조성물 및 이를 이용한 유기막

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3323343A1 (de) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
EP0239423B1 (de) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
US5001040A (en) * 1988-07-11 1991-03-19 Olin Hunt Specialty Products Inc. Process of forming resist image in positive photoresist with thermally stable phenolic resin
JPH03155554A (ja) * 1989-11-14 1991-07-03 Japan Synthetic Rubber Co Ltd 放射線感応性樹脂組成物
US5609982A (en) * 1993-12-17 1997-03-11 Fuji Photo Film Co., Ltd. Positive-working photoresist composition

Also Published As

Publication number Publication date
US5652081A (en) 1997-07-29
DE69604034D1 (de) 1999-10-07
KR100384186B1 (ko) 2004-05-24
EP0764884B1 (de) 1999-09-01
EP0764884A3 (de) 1997-06-25
EP0764884A2 (de) 1997-03-26
KR970016804A (ko) 1997-04-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP