DE69709582D1 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE69709582D1
DE69709582D1 DE69709582T DE69709582T DE69709582D1 DE 69709582 D1 DE69709582 D1 DE 69709582D1 DE 69709582 T DE69709582 T DE 69709582T DE 69709582 T DE69709582 T DE 69709582T DE 69709582 D1 DE69709582 D1 DE 69709582D1
Authority
DE
Germany
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69709582T
Other languages
English (en)
Other versions
DE69709582T2 (de
Inventor
Seung-Joon Yoo
Ik-Chul Lim
Chang-Wook Kim
Ki-Wook Kang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung SDI Co Ltd
Original Assignee
Samsung Display Devices Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Devices Co Ltd filed Critical Samsung Display Devices Co Ltd
Application granted granted Critical
Publication of DE69709582D1 publication Critical patent/DE69709582D1/de
Publication of DE69709582T2 publication Critical patent/DE69709582T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
DE69709582T 1996-07-16 1997-07-03 Photolackzusammensetzung Expired - Fee Related DE69709582T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960028854A KR980010618A (ko) 1996-07-16 1996-07-16 포토레지스트 조성물

Publications (2)

Publication Number Publication Date
DE69709582D1 true DE69709582D1 (de) 2002-02-21
DE69709582T2 DE69709582T2 (de) 2002-11-21

Family

ID=19466566

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69709582T Expired - Fee Related DE69709582T2 (de) 1996-07-16 1997-07-03 Photolackzusammensetzung

Country Status (8)

Country Link
US (1) US5885744A (de)
EP (1) EP0819983B1 (de)
JP (1) JPH1083077A (de)
KR (1) KR980010618A (de)
CN (1) CN1109925C (de)
BR (1) BR9704236A (de)
DE (1) DE69709582T2 (de)
TW (1) TW442707B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100408201B1 (ko) * 2000-04-19 2003-12-01 일동화학 주식회사 아지도기를 고분자 측쇄에 가지는 수용성 포토레지스터고분자 및 이의 제조방법
CN100371826C (zh) * 2002-08-26 2008-02-27 住友化学工业株式会社 磺酸盐和光刻胶组合物
KR20060106873A (ko) * 2005-04-04 2006-10-12 주식회사 동진쎄미켐 네가티브형 포토레지스트 조성물
US20090041923A1 (en) * 2007-08-06 2009-02-12 Abbott Cardiovascular Systems Inc. Medical device having a lubricious coating with a hydrophilic compound in an interlocking network
CN108715693B (zh) * 2018-06-29 2020-08-25 南方科技大学 一种光化学除去氧气来保护光敏剂的三重激发态的介质以及方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3695886A (en) * 1970-09-29 1972-10-03 Ibm High speed azide resists
JPS5418933B2 (de) * 1972-11-06 1979-07-11
US4019907A (en) * 1973-10-24 1977-04-26 Hodogaya Chemical Co., Ltd. Photosensitive azido color-forming element
US4191571A (en) * 1974-04-26 1980-03-04 Hitachi, Ltd. Method of pattern forming in a photosensitive composition having a reciprocity law failing property
JPS5857094B2 (ja) * 1975-04-21 1983-12-19 株式会社日立製作所 カンコウセイソセイブツ
JPS5660431A (en) * 1979-10-24 1981-05-25 Hitachi Ltd Photosensitive composition and pattern forming method
JPS57132139A (en) * 1981-02-10 1982-08-16 Toshiba Corp Photoresist composition
JPS57146247A (en) * 1981-11-30 1982-09-09 Toshiba Corp Water-soluble photoresist
JPH01173028A (ja) * 1987-12-28 1989-07-07 Nitto Boseki Co Ltd 感光性樹脂組成物
JPH07120920A (ja) * 1993-10-25 1995-05-12 Toppan Printing Co Ltd 感光性着色組成物およびカラーフィルターとその製造方法
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法

Also Published As

Publication number Publication date
DE69709582T2 (de) 2002-11-21
KR980010618A (ko) 1998-04-30
EP0819983B1 (de) 2002-01-16
CN1173647A (zh) 1998-02-18
EP0819983A1 (de) 1998-01-21
CN1109925C (zh) 2003-05-28
TW442707B (en) 2001-06-23
BR9704236A (pt) 1998-12-22
US5885744A (en) 1999-03-23
JPH1083077A (ja) 1998-03-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee