JPS57132139A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS57132139A
JPS57132139A JP1743781A JP1743781A JPS57132139A JP S57132139 A JPS57132139 A JP S57132139A JP 1743781 A JP1743781 A JP 1743781A JP 1743781 A JP1743781 A JP 1743781A JP S57132139 A JPS57132139 A JP S57132139A
Authority
JP
Japan
Prior art keywords
water
photoresist
soluble
resolution
storage stability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1743781A
Other languages
Japanese (ja)
Inventor
Kunihiro Isori
Masahiro Kawamoto
Tsutomu Takamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1743781A priority Critical patent/JPS57132139A/en
Publication of JPS57132139A publication Critical patent/JPS57132139A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a photoresist composition superior in adhesion to a base, resolution, storage stability, etc., by adding a specified water-soluble polyazamide type silane compound to a photosensitive composition containing a water-soluble polymer and a bisazide type photocrosslinking agent. CONSTITUTION:A photoresist solution contains 100pts.wt. water-soluble polymer, such as polyacrylamide, polyvinyl pyrolidone, or gelatin, and 1-30pts.wt. 4,4'- bisazidostilbene-2,2'-disulfonic acid or its salt or the like bisazide type photocrosslinking agent, 3,000pts.wt. water, and in addition, 0.01-20pts.wt. water- soluble polyazamide type silane compound represented by the general formula in which (x), (y) are 1-10, and R, R', R'' are each an alkylene group, such as CH2, C2H4, C3H6, etc.. This resist solution is coated on a glass substrate, or the like, dried, exposed with a high-pressure mercury arc lamp or the like, and devel oped to make an image superior in resolution, resistance to etching, abrasion, etc. This photoresist is good in storage stability, and free from deterioration of quality even left for a month in the dark at room temperature.
JP1743781A 1981-02-10 1981-02-10 Photoresist composition Pending JPS57132139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1743781A JPS57132139A (en) 1981-02-10 1981-02-10 Photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1743781A JPS57132139A (en) 1981-02-10 1981-02-10 Photoresist composition

Publications (1)

Publication Number Publication Date
JPS57132139A true JPS57132139A (en) 1982-08-16

Family

ID=11943997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1743781A Pending JPS57132139A (en) 1981-02-10 1981-02-10 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS57132139A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151149A (en) * 1983-02-15 1984-08-29 Toshiba Corp Photoresist composition
EP0819983A1 (en) * 1996-07-16 1998-01-21 Samsung Display Devices Co., Ltd. Photoresist composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151149A (en) * 1983-02-15 1984-08-29 Toshiba Corp Photoresist composition
JPH05700B2 (en) * 1983-02-15 1993-01-06 Tokyo Shibaura Electric Co
EP0819983A1 (en) * 1996-07-16 1998-01-21 Samsung Display Devices Co., Ltd. Photoresist composition

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