BR0005866A - Composição de resina fotossensìvel - Google Patents
Composição de resina fotossensìvelInfo
- Publication number
- BR0005866A BR0005866A BR0005866-1A BR0005866A BR0005866A BR 0005866 A BR0005866 A BR 0005866A BR 0005866 A BR0005866 A BR 0005866A BR 0005866 A BR0005866 A BR 0005866A
- Authority
- BR
- Brazil
- Prior art keywords
- alkyl
- substituted
- unsubstituted
- phenyl
- resin composition
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 5
- 150000001875 compounds Chemical class 0.000 abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000003342 alkenyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 abstract 2
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 abstract 1
- 125000001589 carboacyl group Chemical group 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/52—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- C08K5/33—Oximes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Optical Filters (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Indole Compounds (AREA)
- Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
- Furan Compounds (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polyamides (AREA)
Abstract
Patente de Invenção: "COMPOSIçãO DE RESINA FOTOSSENSìVEL". A invenção refere-se a composições fotossensíveis que compreendem (A) um composto álcali solúvel; (B) pelo menos um composto de fórmula I ou II onde R~ 1~ entre outros é C~ 4~-C~ 9~ cicloalcanoíla, C~ 3~-C~ 12~ alquenoíla, ou benzoíla que é não- substituída ou substituída; A~ 1~ é C~ 6~-C~ 20~ arila ou C~ 6~-C~ 20~ ariloíla cada uma das quais é não-substituída ou substituída; x é 2 ou 3; M~ 1~ quando x é 2, entre outros é um grupo fenileno ou naftaleno, cada um dos quais é opcionalmente substituído entre outros por OR~ 3~, SR~ 4~ ou NR~ 5~R~ 6~; ou M~ 1~, quando x é 3, é um grupo trivalente, opcionalmente substituído; R~ 3~ é por exemplo hidrogênio ou C~ 1~-C~ 12~ alquila; C~ 2~-C~ 6~ alquila que é por exemplo substituída por -OH, -SH, -CN, C~ 3~-C~ 6~ alquenóxi, ou -OCH~ 2~CH~ 2~CN; R~ 4~ é por exemplo hidrogênio, C~ 1~-C~ 12~ alquila, C~ 3~-C~ 12~ alquenila, cicloexila, ou fenila que é não-substituída ou substituída; R5 e R6 independentemente um do outro entre outros são hidrogênio, C~ 1~-C~ 12~ alquila, C~ 2~-C~ 4~ hidroxialquila, C~ 2~-C~ 10~ alcoxialquila, C~ 3~-C~ 5~ alquenila, C~ 3~-C~ 8~ cicloalquila, fenil-C~ 1~-C~ 3~ alquila, C~ 1~-C~ 4~ alcanoíla, C~ 3~-C~ 6~ alquenoíla, benzoíla ou fenila que é não-substituída ou substituída; e (C) um composto fotopolimerizável; exibem inesperadamente um bom desempenho, em particular, em tecnologia de fotorrevestimento.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99811161 | 1999-12-15 | ||
EP00810630 | 2000-07-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0005866A true BR0005866A (pt) | 2002-05-21 |
Family
ID=26073958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0005866-1A BR0005866A (pt) | 1999-12-15 | 2000-12-13 | Composição de resina fotossensìvel |
Country Status (22)
Country | Link |
---|---|
US (1) | US7829257B2 (pt) |
JP (1) | JP4532726B2 (pt) |
KR (1) | KR20010082582A (pt) |
CN (1) | CN1302339C (pt) |
AT (1) | AT410146B (pt) |
AU (1) | AU773749B2 (pt) |
BE (1) | BE1013705A3 (pt) |
BR (1) | BR0005866A (pt) |
CA (1) | CA2328342A1 (pt) |
CH (1) | CH694673A5 (pt) |
CZ (1) | CZ20004639A3 (pt) |
DE (1) | DE10061948A1 (pt) |
DK (1) | DK200001877A (pt) |
ES (1) | ES2189609B1 (pt) |
FI (1) | FI20002731A (pt) |
FR (1) | FR2802655B1 (pt) |
GB (1) | GB2357293B (pt) |
IT (1) | IT1319687B1 (pt) |
MY (1) | MY123712A (pt) |
NL (1) | NL1016814C2 (pt) |
SE (1) | SE522645C2 (pt) |
SG (1) | SG97168A1 (pt) |
Families Citing this family (82)
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NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
WO2002100903A1 (en) * | 2001-06-11 | 2002-12-19 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators having a combined structure |
US6702437B2 (en) * | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
US6905243B2 (en) * | 2001-11-17 | 2005-06-14 | Dr. Friedrichs Gruppe Gmbh | Buoyancy liquid for galilean thermometer |
CA2470547C (en) | 2001-12-24 | 2008-05-20 | Digimarc Id Systems, Llc | Laser etched security features for identification documents and methods of making same |
US7694887B2 (en) | 2001-12-24 | 2010-04-13 | L-1 Secure Credentialing, Inc. | Optically variable personalized indicia for identification documents |
WO2003056500A1 (en) | 2001-12-24 | 2003-07-10 | Digimarc Id Systems, Llc | Covert variable information on id documents and methods of making same |
WO2003088144A2 (en) * | 2002-04-09 | 2003-10-23 | Digimarc Id Systems, Llc | Image processing techniques for printing identification cards and documents |
DE60233826D1 (de) * | 2002-05-10 | 2009-11-05 | Kao Corp | Form zur herstellung von fasergussformteilen |
US7824029B2 (en) | 2002-05-10 | 2010-11-02 | L-1 Secure Credentialing, Inc. | Identification card printer-assembler for over the counter card issuing |
WO2004049242A2 (en) | 2002-11-26 | 2004-06-10 | Digimarc Id Systems | Systems and methods for managing and detecting fraud in image databases used with identification documents |
US20050215656A1 (en) | 2002-11-28 | 2005-09-29 | Taiyo Ink Manufacturing Co., Ltd. | Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
US20040222080A1 (en) * | 2002-12-17 | 2004-11-11 | William Marsh Rice University | Use of microwaves to crosslink carbon nanotubes to facilitate modification |
JP4911975B2 (ja) * | 2003-02-17 | 2012-04-04 | ジャパンコンポジット株式会社 | 導電性樹脂組成物及び燃料電池用セパレーター |
JP3797348B2 (ja) * | 2003-02-24 | 2006-07-19 | コニカミノルタホールディングス株式会社 | 活性エネルギー線硬化組成物 |
DE602004030434D1 (de) | 2003-04-16 | 2011-01-20 | L 1 Secure Credentialing Inc | Dreidimensionale datenspeicherung |
TW200519535A (en) * | 2003-11-27 | 2005-06-16 | Taiyo Ink Mfg Co Ltd | Hardenable resin composition, hardened body thereof, and printed circuit board |
JP4292985B2 (ja) * | 2003-12-25 | 2009-07-08 | Jsr株式会社 | 感放射線性組成物、マイクロレンズとその形成方法および液晶表示素子 |
DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
JP2005215147A (ja) * | 2004-01-28 | 2005-08-11 | Fuji Photo Film Co Ltd | 重合性組成物 |
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2000
- 2000-11-03 SG SG200006382A patent/SG97168A1/en unknown
- 2000-12-06 NL NL1016814A patent/NL1016814C2/nl not_active IP Right Cessation
- 2000-12-07 MY MYPI20005760A patent/MY123712A/en unknown
- 2000-12-07 GB GB0029801A patent/GB2357293B/en not_active Expired - Fee Related
- 2000-12-11 JP JP2000376036A patent/JP4532726B2/ja not_active Expired - Fee Related
- 2000-12-11 CH CH02411/00A patent/CH694673A5/de not_active IP Right Cessation
- 2000-12-11 SE SE0004565A patent/SE522645C2/sv not_active IP Right Cessation
- 2000-12-12 IT IT2000MI002675A patent/IT1319687B1/it active
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- 2000-12-13 CA CA002328342A patent/CA2328342A1/en not_active Abandoned
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- 2000-12-13 BR BR0005866-1A patent/BR0005866A/pt not_active IP Right Cessation
- 2000-12-14 AT AT0208000A patent/AT410146B/de not_active IP Right Cessation
- 2000-12-14 FR FR0016309A patent/FR2802655B1/fr not_active Expired - Fee Related
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- 2000-12-14 AU AU72268/00A patent/AU773749B2/en not_active Ceased
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- 2000-12-14 CN CNB001350633A patent/CN1302339C/zh not_active Expired - Fee Related
- 2000-12-14 DK DK200001877A patent/DK200001877A/da not_active Application Discontinuation
- 2000-12-15 KR KR1020000077181A patent/KR20010082582A/ko not_active Application Discontinuation
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