BR0005866A - Composição de resina fotossensìvel - Google Patents

Composição de resina fotossensìvel

Info

Publication number
BR0005866A
BR0005866A BR0005866-1A BR0005866A BR0005866A BR 0005866 A BR0005866 A BR 0005866A BR 0005866 A BR0005866 A BR 0005866A BR 0005866 A BR0005866 A BR 0005866A
Authority
BR
Brazil
Prior art keywords
alkyl
substituted
unsubstituted
phenyl
resin composition
Prior art date
Application number
BR0005866-1A
Other languages
English (en)
Inventor
Hidetaka Oka
Kazuhiko Kunimoto
Hisatoshi Kura
Masaki Ohwa
Junichi Tanabe
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0005866A publication Critical patent/BR0005866A/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32Oximes
    • C07C251/62Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • C07D209/10Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/52Radicals substituted by nitrogen atoms not forming part of a nitro radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/32Compounds containing nitrogen bound to oxygen
    • C08K5/33Oximes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Indole Compounds (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Furan Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polyamides (AREA)

Abstract

Patente de Invenção: "COMPOSIçãO DE RESINA FOTOSSENSìVEL". A invenção refere-se a composições fotossensíveis que compreendem (A) um composto álcali solúvel; (B) pelo menos um composto de fórmula I ou II onde R~ 1~ entre outros é C~ 4~-C~ 9~ cicloalcanoíla, C~ 3~-C~ 12~ alquenoíla, ou benzoíla que é não- substituída ou substituída; A~ 1~ é C~ 6~-C~ 20~ arila ou C~ 6~-C~ 20~ ariloíla cada uma das quais é não-substituída ou substituída; x é 2 ou 3; M~ 1~ quando x é 2, entre outros é um grupo fenileno ou naftaleno, cada um dos quais é opcionalmente substituído entre outros por OR~ 3~, SR~ 4~ ou NR~ 5~R~ 6~; ou M~ 1~, quando x é 3, é um grupo trivalente, opcionalmente substituído; R~ 3~ é por exemplo hidrogênio ou C~ 1~-C~ 12~ alquila; C~ 2~-C~ 6~ alquila que é por exemplo substituída por -OH, -SH, -CN, C~ 3~-C~ 6~ alquenóxi, ou -OCH~ 2~CH~ 2~CN; R~ 4~ é por exemplo hidrogênio, C~ 1~-C~ 12~ alquila, C~ 3~-C~ 12~ alquenila, cicloexila, ou fenila que é não-substituída ou substituída; R5 e R6 independentemente um do outro entre outros são hidrogênio, C~ 1~-C~ 12~ alquila, C~ 2~-C~ 4~ hidroxialquila, C~ 2~-C~ 10~ alcoxialquila, C~ 3~-C~ 5~ alquenila, C~ 3~-C~ 8~ cicloalquila, fenil-C~ 1~-C~ 3~ alquila, C~ 1~-C~ 4~ alcanoíla, C~ 3~-C~ 6~ alquenoíla, benzoíla ou fenila que é não-substituída ou substituída; e (C) um composto fotopolimerizável; exibem inesperadamente um bom desempenho, em particular, em tecnologia de fotorrevestimento.
BR0005866-1A 1999-12-15 2000-12-13 Composição de resina fotossensìvel BR0005866A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99811161 1999-12-15
EP00810630 2000-07-17

Publications (1)

Publication Number Publication Date
BR0005866A true BR0005866A (pt) 2002-05-21

Family

ID=26073958

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0005866-1A BR0005866A (pt) 1999-12-15 2000-12-13 Composição de resina fotossensìvel

Country Status (22)

Country Link
US (1) US7829257B2 (pt)
JP (1) JP4532726B2 (pt)
KR (1) KR20010082582A (pt)
CN (1) CN1302339C (pt)
AT (1) AT410146B (pt)
AU (1) AU773749B2 (pt)
BE (1) BE1013705A3 (pt)
BR (1) BR0005866A (pt)
CA (1) CA2328342A1 (pt)
CH (1) CH694673A5 (pt)
CZ (1) CZ20004639A3 (pt)
DE (1) DE10061948A1 (pt)
DK (1) DK200001877A (pt)
ES (1) ES2189609B1 (pt)
FI (1) FI20002731A (pt)
FR (1) FR2802655B1 (pt)
GB (1) GB2357293B (pt)
IT (1) IT1319687B1 (pt)
MY (1) MY123712A (pt)
NL (1) NL1016814C2 (pt)
SE (1) SE522645C2 (pt)
SG (1) SG97168A1 (pt)

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CN114163364A (zh) * 2021-12-06 2022-03-11 河北科技大学 2-甲氧基烯丙基磺酸酯及其合成方法
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DE10061948A1 (de) 2001-06-21
FR2802655B1 (fr) 2003-08-15
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GB0029801D0 (en) 2001-01-17
CN1305124A (zh) 2001-07-25
SE0004565D0 (sv) 2000-12-11
ES2189609A1 (es) 2003-07-01
KR20010082582A (ko) 2001-08-30
AU7226800A (en) 2001-06-21
SE522645C2 (sv) 2004-02-24
FR2802655A1 (fr) 2001-06-22
FI20002731A (fi) 2001-06-16
GB2357293B (en) 2002-08-07
US7829257B2 (en) 2010-11-09
MY123712A (en) 2006-05-31
US20020020832A1 (en) 2002-02-21
AT410146B (de) 2003-02-25
GB2357293A (en) 2001-06-20
DK200001877A (da) 2001-06-16
ITMI20002675A1 (it) 2002-06-12
SG97168A1 (en) 2003-07-18
NL1016814C2 (nl) 2002-01-29
NL1016814A1 (nl) 2001-06-18
IT1319687B1 (it) 2003-10-23
CA2328342A1 (en) 2001-06-15
BE1013705A3 (fr) 2002-06-04
CZ20004639A3 (cs) 2001-09-12
CH694673A5 (de) 2005-05-31
JP4532726B2 (ja) 2010-08-25
SE0004565L (sv) 2001-07-25
JP2001235858A (ja) 2001-08-31
CN1302339C (zh) 2007-02-28
ES2189609B1 (es) 2004-04-01
ATA20802000A (de) 2002-06-15

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