ES2189609A1 - Composicion de resina fotosensible. - Google Patents

Composicion de resina fotosensible.

Info

Publication number
ES2189609A1
ES2189609A1 ES200002990A ES200002990A ES2189609A1 ES 2189609 A1 ES2189609 A1 ES 2189609A1 ES 200002990 A ES200002990 A ES 200002990A ES 200002990 A ES200002990 A ES 200002990A ES 2189609 A1 ES2189609 A1 ES 2189609A1
Authority
ES
Spain
Prior art keywords
substituted
unsubstituted
c12alkyl
phenyl
inter alia
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES200002990A
Other languages
English (en)
Other versions
ES2189609B1 (es
Inventor
Hidetaka Oka
Kazuhiko Kunimoto
Hisatoshi Kura
Masaki Ohwa
Junichi Tanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Ciba SC Holding AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of ES2189609A1 publication Critical patent/ES2189609A1/es
Application granted granted Critical
Publication of ES2189609B1 publication Critical patent/ES2189609B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/52—Radicals substituted by nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Abstract

Composiciones de resinas fotosensibles. El invento se refiere a composiciones fotosensibles que contienen (A) un compuesto soluble en álcalis; (B) por lo menos un compuesto de fórmula I ó II, en donde R{sub,1}, Ar{sub,1}, X, R{sub,3}, R{sub,4}, R{sub,5} y R{sub,6} tienen el significado expuesto en las reivindicaciones y (C) un compuesto fotopolimerizable. Estas composiciones presentan un buen e inesperado rendimiento, en particular en la tecnología de los fotoresists.
ES200002990A 1999-12-15 2000-12-14 Composicion de resina fotosensible. Expired - Fee Related ES2189609B1 (es)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP99811161 1999-12-15
EP99811161 1999-12-15
EP00810630 2000-07-17
EP00810630 2000-07-17

Publications (2)

Publication Number Publication Date
ES2189609A1 true ES2189609A1 (es) 2003-07-01
ES2189609B1 ES2189609B1 (es) 2004-04-01

Family

ID=26073958

Family Applications (1)

Application Number Title Priority Date Filing Date
ES200002990A Expired - Fee Related ES2189609B1 (es) 1999-12-15 2000-12-14 Composicion de resina fotosensible.

Country Status (22)

Country Link
US (1) US7829257B2 (es)
JP (1) JP4532726B2 (es)
KR (1) KR20010082582A (es)
CN (1) CN1302339C (es)
AT (1) AT410146B (es)
AU (1) AU773749B2 (es)
BE (1) BE1013705A3 (es)
BR (1) BR0005866A (es)
CA (1) CA2328342A1 (es)
CH (1) CH694673A5 (es)
CZ (1) CZ20004639A3 (es)
DE (1) DE10061948A1 (es)
DK (1) DK200001877A (es)
ES (1) ES2189609B1 (es)
FI (1) FI20002731A (es)
FR (1) FR2802655B1 (es)
GB (1) GB2357293B (es)
IT (1) IT1319687B1 (es)
MY (1) MY123712A (es)
NL (1) NL1016814C2 (es)
SE (1) SE522645C2 (es)
SG (1) SG97168A1 (es)

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CN114163364A (zh) * 2021-12-06 2022-03-11 河北科技大学 2-甲氧基烯丙基磺酸酯及其合成方法
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US20020020832A1 (en) 2002-02-21
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CA2328342A1 (en) 2001-06-15
US7829257B2 (en) 2010-11-09
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CN1305124A (zh) 2001-07-25

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