DK200001877A - Fotofølsom resinsammensætning. - Google Patents
Fotofølsom resinsammensætning. Download PDFInfo
- Publication number
- DK200001877A DK200001877A DK200001877A DKPA200001877A DK200001877A DK 200001877 A DK200001877 A DK 200001877A DK 200001877 A DK200001877 A DK 200001877A DK PA200001877 A DKPA200001877 A DK PA200001877A DK 200001877 A DK200001877 A DK 200001877A
- Authority
- DK
- Denmark
- Prior art keywords
- alkyl
- substituted
- phenyl
- unsubstituted
- halogen
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 description 77
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 27
- 229910052736 halogen Inorganic materials 0.000 description 22
- 150000002367 halogens Chemical class 0.000 description 22
- 125000001589 carboacyl group Chemical group 0.000 description 16
- 125000001624 naphthyl group Chemical group 0.000 description 14
- 125000003545 alkoxy group Chemical group 0.000 description 13
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 125000003342 alkenyl group Chemical group 0.000 description 9
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 125000000753 cycloalkyl group Chemical group 0.000 description 9
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 8
- -1 diphenylamino Chemical group 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- 125000001072 heteroaryl group Chemical group 0.000 description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 4
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 4
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 3
- 101100533888 Hypocrea jecorina (strain QM6a) sor4 gene Proteins 0.000 description 3
- 101100533877 Hypocrea jecorina (strain QM6a) sor8 gene Proteins 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000002757 morpholinyl group Chemical group 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
- 125000005530 alkylenedioxy group Chemical group 0.000 description 2
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000000389 2-pyrrolyl group Chemical group [H]N1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/52—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- C08K5/33—Oximes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Optical Filters (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Indole Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
- Furan Compounds (AREA)
- Polyamides (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
Patentkrav. 1. Fotofølsom sammensætning, som kan fremkaldes ved base, indeholdende (A) mindst én baseopløselig binderresin, præpolymer- eller monomerkomponent;
(B) mindst én forbindelse med formlen I eller II
hvori R, er C(4-9)cycloalkanoyl, C(3-12)alkenoyl; C(1-20)alkanoyl, som er usubstitueret eller substitueret med en eller flere halogen, CN eller phenyl; eller R, er benzoyl, som er usubstitueret eller substitueret med en eller flere C(1-6)alkyl, halogen, CN, OR3, SR4 eller NR5R6; eller R, er C(2-12)alkoxycarbonyl eller benzyloxycarbonyl; eller phenoxy-carbonyl, som er usubstitueret eller substitueret med en eller flere C(1-6)alkyl eller halogen; er C(6-20) aryl eller C(6-20)aryloyl, som begge er usubstitueret eller substitueret 1-12 gange med halogen, C(1-20)alkyl, benzyl, C(1-20)alkanoyl, C(3-8)cycloalkyl; eller C(6-20)aryl eller C(6-20)aryloyl er substitueret med phenyl eller benzoyl, som hver især eventuelt er substitueret med en eller flere OR3, SR4 eller NR5R6; eller C(6-20)aryl eller C(6-20)aryloyl er substitueret med C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller eventuelt substitueret med en eller flere hydroxylgrupper, eller C(6-20)aryl eller C(6-20)aryloyl er substitueret med phenoxycarbonyl, OR3, SR4, SOR4, S02R4 eller NR5R6, hvori substituenterne OR3, SR4 eller NR5R6 eventuelt danner 5- eller 6-leddede ringe via grupperne R3, R4, R5 og/eller R6 med yderligere sub-stituenter på arylringen i C(6-20)arylgruppen eller C(6-20)aryloylgruppen eller med et af carbonatomerne i arylringen i C(6-20)arylgruppen eller C(6-20)aryloylgruppen; eller
Ar, er C(3-9)heteroaryl, forudsat at R, er acetyl, hvor C(3-9)heteroaryl er usubstitueret eller substitueret 1-7 gange med halogen, C(1-20)alkyl, benzyl, C(1-20)alkanoyl eller C(3-8)cycloalkyl; eller C(3-9)heteroaryl er substitueret med phenyl eller benzyl, som hver især eventuelt er substitueret med en eller flere OR3, SR4 eller NR5R6; eller C(3-9)heteroaryl er substitueret med C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller eventuelt substitueret med en eller flere hydroxylgrupper; eller C(6- 20)aryl eller C(6-20)aryloyl er substitueret med phenoxycarbonyl, OR3, SR4, SOR4, SO2R4 eller NRsRgj xer2 eller 3; når x er 2, er
som hver især eventuelt er substitueret 1-12 gange med halogen, C(1-12)alkyl, C(3-8)cycloalkyl, benzyl; phenyl, som er usubstitueret eller substitueret med en eller flere OR3, SR4 eller NRsR6, benzoyl, som er usubstitueret eller substitueret med en eller flere OR3, SR4 eller NR5R6; C(1-12)alkanoyl; C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller substitueret med en eller flere OH, phenoxycarbonyl, OR3, SR4> SOR4i S02R4 eller NRsRg; eller Mi, når x er 3, er
eller
som hver især eventuelt er substitueret 1-12 gange med halogen, C(1-12)alkyl, C(3-8)cycloalkyl; phenyl, som er usubstitueret eller substitueret med en eller flere OR3, SR4 eller NR5R6; benzyl, benzoyl, C(1-12)alkanoyl; C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller eventuelt substitueret med en eller flere hydroxylgrupper, phenoxycarbonyl, OR3, SR4> SOR4, S02R4 eller NR5R6: M2 en direkte binding, -O-, -S-, -SS-, -NR3-, -(CO)-, C(1-12)aikylen, cydohexylen, phe-nylen, naphthylen, -(C0)0-(C(2-12)alkylen)-0(C0)-, -(C0)0-(CH2CH20)n-(C0)- eller -(CO)-(C(2-12)alkylen)-(CO)-; eller M2 er C(4-12)alkylen eller C(4-12)alkylendioxy, som hver især eventuelt er afbrudt af 1-5 -O-, -S- og/eller -NR3-; M3 er en direkte binding, -CH2-, -O-, -S-, -SS-, -NR3- eller -(CO)-;
M4 er eller i R3 er hydrogen eller C(1-20)alkyl; eller R3 er C(2-I2)alkyl, som er substitueret med -OH, -SH, -CN, C(3-6)alkenoxy, -OCH2CH2CN, -0CH2CH2(C0)0(C(1-4)alkyl), -O(CO)-C(1-4)alkyl, -0(C0)-phenyl, -(CO)OH, -(C0)0(C(1-4)alkyl), -N(C(1-4)alkyl)2, -N(CH2CH2OH)2, -N[CH2CH20-(C0)-C(1-4)alkyl]2 eller morpholinyl; eller R3 er 0(2-12)-alkyl som er afbrudt af en eller flere -0-; eller R3 er -(CH2CH20)n+iH, -(CH2CH20)n(C0)-C(1-8)alkyl, C(1-8)alkanoyl, C(3-12)alkenyl, C(3-6)alkenoyl, 0(3-8)cycloalkyl; eller R3 er benzoyl, som er usubstitueret eller substitueret med en eller flere C(1-6)alkyl, halogen, -OH eller C(1-4)alkoxy; eller R3 er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med halogen, -OH, C(1-12)alkyl, 0(1-12)alkoxy, phenyl-C(1-3)alkoxy, phenoxy, C(1-12)alkylsulfanyl, phenylsulfanyl, -N(C(1-12)alkyl)2, diphenylamino eller -(CO)R7; eller R3 er phenyl-C(1-3)alkyl eller Si(C(1-6)-alkyl)r(phenyl)3.r; rer 0,1, 2 eller 3; n er 1 til 20; R4 er hydrogen, C(1-20)alkyl, C(3-12)alkenyl, C(3-8)cycloalkyl, phenyl-C(1-3)alkyl; C(2-8)alkyl som er substitueret med -OH, -SH, -CN, C(3-6)alkenoxy, -OCH2CH2CN, -OCH2CH2(CO)0(C(1 -4)alkyl), -0(C0)-C(1-4)alkyl, -0(C0)-phenyl, -(CO)OH, -(C0)0(C(1-4)alkyl); eller R4 er C(2-12)alkyl, som er afbrudt af en eller flere -O- eller -S-; eller R4 er -(CH2CH20)n+1H, -(CH2CH20)n(C0)-C(1-8)alkyl, C(2-8)alkanoyl, 0(3-12)alkenyl, C(3-6)alkenoyl; eller R4 er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med halogen C(1-12)alkyl, C(1-12)alkoxy eller -(CO)R7; R5 og R6 hver for sig uafhængigt af hinanden er hydrogen, C(1-20)alkyl, 0(2-4)hydroxyalkyl, C(2-10)alkoxyalkyl, C(3-5)alkenyl, C(3-8)cycloalkyl, phenyl-C(1-3)alkyl, C(1-4)alkanoyl, 0(3-12)alkenoyl, benzoyl; eller er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med C(1-12)alkyl eller C(1-12)alkoxy; eller R5 og R6 sammen er C(2-6)alkylen eventuelt afbrudt af -O- eller -NR3- og/eller eventuelt substitueret med hydroxyl, C(1-4)alkoxy, C(2-4)alkanoyloxy eller benzoyloxy; R7 er hydrogen, C(1-20)alkyl; eller er C(2-8)alkyl, som er substitueret med halogen, phenyl, -OH, -SH, -CN, C(3-6)alkenoxy, -OCH2CH2CN, -0CH2CH2(C0)0(C(1-4)alkyl), -0(C0)-C(1 -4)alkyI, -0(C0)-phenyl, -(CO)OH eller -(C0)0(C(1-4)alkyl); eller R7 er C(2-12)alkyl, som er afbrudt af en eller flere -O-; eller R7 er -(CH2CH20)n+iH, -(CH2CH 20)n(C0)-C(1-8)alkyl, C(3-12)alkenyl, C(3-8)cycloalkyl; phenyl eventuelt substitueret med en eller flere halogen, -OH, C(1-12)alkyl, C(1-12)alkoxy, phenoxy, C(1-12)alkylsulfanyl, phenylsulfanyl, -N(C(1-12)alkyl)2, eller diphenylamino; og (C) en fotopolymeriserbar forbindelse. 2. Fotofølsom sammensætning ifølge krav 1, hvori forbindelse (A) er en oligomer eller polymer forbindelse. 3. Fotofølsom sammensætning ifølge krav 2, hvor den fotopolymeriserbare forbindelse (C) er en væske. 4. Fotofølsom sammensætning ifølge ethvert af kravene 1-3, hvori komponent (B) er en forbindelse med formlen I eller II, hvori
Ri er C(2-6)alkanoyl eller C(2-5)alkoxycarbonyl; eller Rt er benzoyl, usubstitueret eller substitueret med en eller flere C(1-6)alkyl eller halogen,
Ah er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret 1-5 gange med halogen, C(1-20)alkyl, benzyl eller C(1-20)alkanoyl; eller phenyl eller naphthyl er substitueret med phenyl eller benzoyl, som hver især er eventuelt substitueret med en eller flere OR3, SR4 eller NR5R6; eller phenyl eller naphthyl er substitueret med C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller eventuelt substitueret med en eller flere OH; eller phenyl eller naphthyl er substitueret med OR3, SR4 eller NR5R6, hvori substituenteme OR3, SR4 eller NR5R6 eventuelt danner 5- eller 6-leddede ringe via grupperne R3, R4, R5 og/eller R6 med yderligere substituenter på phenyl- eller naphthylringen eller med et af carbonatomeme i phenyl- eller naphthylringen, eller Ah er furyl, pyrrolyl, thienyl, benzofuranyl, indolyl, benzothiophenyl eller pyrridyl, forudsat at R1 er acetyl; hvor hver af disse grupper er usubstitueret eller substitueret 1-4 gange med halogen, C(1-20)alkyl, benzyl, C(3-8)cycloalkyl, phenyl, C(1-20)alkanoyl, benzoyl, C(2-12)alkoxycarbonyl, phenoxycarbonyl, OR3, SR4, SOR4, S02R4 eller NR5R6; xer2;
Mi eren gruppe
eller
som hver især eventuelt er substitueret 1-4 gange med halogen, C(1-12)alkyl, benzyl, OR3i SR4 eller NR5R6; eller med phenyl, som er usubstitueret eller substitueret med en eller flere OR3, SR4 eller NR5R6; eller med benzoyl, som er usubstitueret eller substitueret med en eller flere OR3, SR4 eller NR5R6; eller med C(1-12)alkanoyl; eller med C(2-12)alkoxycarbonyl eventuelt afbrudt af en eller flere -O- og/eller eventuelt substitueret med en eller flere hydroxylgrupper; M2 er en direkte binding, -O-, -S-, -SS-, -NR3-, -(CO)-, C(1-12)alkylen, phenylen, -(C0)0-(C(2-12)alkylen)-0(C0)-, -(C0)0-(CH2CH20)n-(C0)- eller -(CO)-(C(2-12)alkyl-en)-(CO)-; eller M2 er C(4-12)alkylen eller C(4-12)alkylendioxy-, som hver især eventuelt er afbrudt af 1-5-0-, -S- og/eller -NR3-; M3 er en direkte binding, -CH2-, -O-, -S-, -NR3- eller -(CO)-; R3 er hydrogen eller C(1-20)alkyl; eller R3 er C(2-12)alkyl, som er substitueret med -OH, -SH, -0(C0)-C(1-4)alkyl, -O(CO)-pheny), -(C0)0(C(1-4)alkyl), -N(C(1-4)alkyl)2, -N(CH2CH2OH) 2, -N[CH2CH20-(C0)-C(1-4)alkyl]2 eller morpholinyl; eller R3 er C(2-12)-alkyl, som er afbrudt af en eller flere -0-; eller R3 er -(CH2CH20)n+1H, -(CH2CH 20)n(C0)-C(1-8)alkyl, phenyl-C(1-3)alkyl, C(2-8)alkanoyl, C(3-12)alkenyl eller C(3-6)alkenoyl; eller R3 er benzoyl, som er usubstitueret eller substitueret med en eller flere C(1-6)alkyl, halogen eller C(1-4)alkoxy; eller R3 er phenyl eller naphthyl, som hver isærer usubstitueret eller substitueret med halogen, C(1-12)alkyl, C(1-12)alkoxy, phe-nyl-C(1-3)alkoxy, phenoxy, C(1-12)alkylsulfanyl, phenylsulfanyl, -N(C(1-12)alkyl)2, dip-henylamino eller -(CO)R7; n er 1 til 20; R4 er hydrogen, C(1-20)alkyl, C(3-12)alkenyl, phenyl-C(1-3)alkyl; C(2-8)alkyl som er substitueret med -OH, -SH, -0(C0)-C(1-4)alkyl, -0(C0)-phenyl eller -(C0)0(C(1-4)al-kyl); eller R4 er C(2-12)alkyl som er afbrudt af en eller flere -O- eller -S-; eller R4 er -(CH2CH20)n+iH, -(CH2CH20)n(C0)-C(1-8)alkyl, C(2-8)alkanoyl, C(3-12)alkenyl, C(3- 6)alkenoyl; eller R4 er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med halogen, C(1-12)alkyl, C(1-12)alkoxy eller -(CO)R7; R5 og R6 uafhængig af hinanden er hydrogen, C(1-20)alkyl, C(2-4)hydroxyalkyl, C(2-10)alkoxyalkyl, phenyl-C(1-3)alkyl, C(1-4)alkanoyl, C(3-12)alkenoyl, benzoyl; eller er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med C(1-12)alkyl eller C(1-12)alkoxy; eller R5 og Re sammen betyder C(2-6)alkylen eventuelt afbrudt af -O- eller -NR3- og/eller eventuelt substitueret med hydroxyl, C(1-4)alkoxy, C(2-4)alkanoyloxy eller benzoyloxy; og R7 er hydrogen, C(1-20)alkyl; eller er C(2-8)alkyl, som er substitueret med halogen, phenyl, -OH, -SH, C(3-6)alkenoxy, -0(C0)-C(1-4)alkyl, -0(C0)-phenyl eller -(C0)0(C(1-4)alkyl); eller R7 er C(2-12)alkyl som er afbrudt af en eder flere -0-; eller R7 er -(CH2CH20)n+1H, -{CH2CH20)n(CO)-C(1-8)alkyl eller C(3-12)alkenyl; eller er phenyl, som eventuelt er substitueret med en eller flere halogen, C(1-12)alkyl, C(1-12)alkoxy, phenoxy, C(1-12)alkylsulfanyl, phenylsulfanyl, -N(C(1-12)alkyl)2, eller di-phenylamino. S. Fotofølsom sammensætning ifølge ethvert af kravene 1-4, hvori komponent (B) er en forbindelse med formlen I eller II, hvori Rt er C(2-4)alkanoyl,
An er phenyl eller naphthyl, som hver især er usubstitueret eller substitueret med halogen, C(1-8)alkyl, NR5R6 eller OR3, hvori substituenterne OR3, eventuelt danner 5-eller 6-leddede ringe via grupperne R3 med yderligere substituenter på phenyl- eller naphthylringen; eller Ar! er2-furyl, 2-pyrrolyl, 2-thienyl, 3-indolyl, forudsat at R, er acetyl;
Mt er
x er 2; R3 er C(1-20)alkyl; eller R3 er C(2-12)alkyl, som er substitueret med OH, -0(C0)-C(1-4)alkyl, -N(C(1-4)alkyl)2, -N(CH2CH2OH)2, -N[CH2CH20-(C0)-C(1-4)alkyl eller morpho-linyl; eller R3 er C(2-12)alkyl, som er afbrudt af en eller flere -O-; eller R3 er -(CH2CH20)n+1H eller -(CH2CH20)n(C0)-C(1-4)alkyl; n er 1 til 3; og R5 og R6 er C(1-4)alkyl. 6. Fotofølsom sammensætning ifølge krav 1, hvori oligomeren eller polymeren (A) er en binderpolymer, især en copolymer af (meth)acrylat og (meth)acrylsyre, eller en resin dannet ved omsætning af et mættet eller umættet polybasisk syreanhydrid med et produkt fra omsætningen af en epoxyforbindelse og en umættet monocarboxylsyre, eller er et additionsprodukt dannet mellem en carboxylgruppeholdig resin og en umættet forbindelse indeholdende en α,β-umættet dobbeltbinding og en epoxygruppe. 7. Fotofølsom sammensætning ifølge krav 1, som foruden komponenterne (A), (B) og (C) indeholder mindst én fotosensibilisatorforbindelse (D). 8. Fotofølsom sammensætning ifølge krav 7, som indeholder 100 vægtdele komponent (A), 0,015-120 vægtdele komponent (B), 5-500 vægtdele komponent (C) og 0,015-120 vægtdele komponent (D). 9. Fotofølsom sammensætning ifølge krav 1, som indeholder yderligere additiver (E), der er valgt fra gruppen bestående af epoxyforbindelser, termiske polymerisationsinhibitorer, uorganiske fyldstoffer, farvestoffer, epoxyhærdningsmidler, aminer, kædeoverføringsmidler, termiske radikalinitiatorer, fotoreducerbare farvestoffer, optiske klaringsmidler, fortykningsmidler, antiskummidler og udjævningsmidler (leveling agents), især uorganiske fyldstoffer. 10. Fotofølsom sammensætning ifølge krav 1, som yderligere indeholderen epoxyforbindelse, der indeholder mindst to epoxygrupper i molekylet. 11. Lodderesist indeholdende en sammensætning ifølge et hvilket som helst af kravene 1-10. 12. Farvefilterresist indeholdende en sammensætning ifølge et hvilket som helst af kravene 1-10. 13. Fremgangsmåde til fotopolymerisation af forbindelser indeholdende ethylenisk umættede dobbeltbindinger, ved hvilken en sammensætning ifølge et hvilket som helst af kravene 1-10 bestråles med elektromagnetisk stråling i området fra 150 til 600 nm. 14. Overtrukket substrat, som er overtrukket på mindst én overflade med en sammensætning ifølge et hvilket som helst af kravene 1-10. 15. Fremgangsmåde til fremstilling af reliefbilleder, ved hvilken et overtrukket substrat ifølge krav 14 underkastes billedvis eksponering med elektromagnetisk stråling i området fra 150 til 600 nm, hvorefter de ueksponerede dele fjernes med et opløsningsmiddel. 16. Farvefilter fremstillet ved tilvejebringelse af røde, grønne og blå (RGB) fareelementer og, eventuelt en sort matriks, alle omfattende en fotofølsom sammensætning ifølge et hvilket som helst af kravene 1-10 og et pigment på et transparent substrat, og tilvejebringelse af en transparent elektrode enten på overfladen af substratet eller på overfladen af farvefilterlaget. 17. Fremgangsmåde til billeddannelse, ved hvilken (1) komponenterne i en sammensætning ifølge et hvilket som helst af kravene 1-10 blandes, (2) den dannede sammensætning anbringes på substratet, (3) opløsningsmidlet, hvis dette er til stede, afdampes ved forhøjet temperatur, (4) det overtrukne substrat eksponeres mønstervis for bestråling, (5) den bestrålede prøve fremkaldes med vandig baseopløsning, hvorved de ikke-hærdede områder fjernes, og (6) prøven hærdes termisk.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99811161 | 1999-12-15 | ||
EP00810630 | 2000-07-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
DK200001877A true DK200001877A (da) | 2001-06-16 |
Family
ID=26073958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK200001877A DK200001877A (da) | 1999-12-15 | 2000-12-14 | Fotofølsom resinsammensætning. |
Country Status (22)
Country | Link |
---|---|
US (1) | US7829257B2 (da) |
JP (1) | JP4532726B2 (da) |
KR (1) | KR20010082582A (da) |
CN (1) | CN1302339C (da) |
AT (1) | AT410146B (da) |
AU (1) | AU773749B2 (da) |
BE (1) | BE1013705A3 (da) |
BR (1) | BR0005866A (da) |
CA (1) | CA2328342A1 (da) |
CH (1) | CH694673A5 (da) |
CZ (1) | CZ20004639A3 (da) |
DE (1) | DE10061948A1 (da) |
DK (1) | DK200001877A (da) |
ES (1) | ES2189609B1 (da) |
FI (1) | FI20002731A (da) |
FR (1) | FR2802655B1 (da) |
GB (1) | GB2357293B (da) |
IT (1) | IT1319687B1 (da) |
MY (1) | MY123712A (da) |
NL (1) | NL1016814C2 (da) |
SE (1) | SE522645C2 (da) |
SG (1) | SG97168A1 (da) |
Families Citing this family (82)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW575792B (en) * | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
ATE446322T1 (de) * | 2001-06-11 | 2009-11-15 | Basf Se | Oxim ester photoinitiatoren mit kombinierter struktur |
US6702437B2 (en) * | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
US6905243B2 (en) * | 2001-11-17 | 2005-06-14 | Dr. Friedrichs Gruppe Gmbh | Buoyancy liquid for galilean thermometer |
US7207494B2 (en) | 2001-12-24 | 2007-04-24 | Digimarc Corporation | Laser etched security features for identification documents and methods of making same |
US7694887B2 (en) | 2001-12-24 | 2010-04-13 | L-1 Secure Credentialing, Inc. | Optically variable personalized indicia for identification documents |
CA2471457C (en) | 2001-12-24 | 2011-08-02 | Digimarc Id Systems, Llc | Covert variable information on id documents and methods of making same |
AU2003221894A1 (en) * | 2002-04-09 | 2003-10-27 | Digimarc Id Systems, Llc | Image processing techniques for printing identification cards and documents |
US7824029B2 (en) | 2002-05-10 | 2010-11-02 | L-1 Secure Credentialing, Inc. | Identification card printer-assembler for over the counter card issuing |
DE60233826D1 (de) * | 2002-05-10 | 2009-11-05 | Kao Corp | Form zur herstellung von fasergussformteilen |
US7804982B2 (en) | 2002-11-26 | 2010-09-28 | L-1 Secure Credentialing, Inc. | Systems and methods for managing and detecting fraud in image databases used with identification documents |
TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
US20050215656A1 (en) | 2002-11-28 | 2005-09-29 | Taiyo Ink Manufacturing Co., Ltd. | Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
US20040222080A1 (en) * | 2002-12-17 | 2004-11-11 | William Marsh Rice University | Use of microwaves to crosslink carbon nanotubes to facilitate modification |
JP4911975B2 (ja) * | 2003-02-17 | 2012-04-04 | ジャパンコンポジット株式会社 | 導電性樹脂組成物及び燃料電池用セパレーター |
JP3797348B2 (ja) * | 2003-02-24 | 2006-07-19 | コニカミノルタホールディングス株式会社 | 活性エネルギー線硬化組成物 |
CA2522551C (en) | 2003-04-16 | 2009-12-22 | Digimarc Corporation | Three dimensional data storage |
TW200519535A (en) * | 2003-11-27 | 2005-06-16 | Taiyo Ink Mfg Co Ltd | Hardenable resin composition, hardened body thereof, and printed circuit board |
JP4292985B2 (ja) * | 2003-12-25 | 2009-07-08 | Jsr株式会社 | 感放射線性組成物、マイクロレンズとその形成方法および液晶表示素子 |
DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
JP2005215147A (ja) * | 2004-01-28 | 2005-08-11 | Fuji Photo Film Co Ltd | 重合性組成物 |
TWI285297B (en) * | 2004-02-09 | 2007-08-11 | Chi Mei Corp | Light-sensitive resin composition for black matrix |
JP2005300994A (ja) * | 2004-04-13 | 2005-10-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
TWI390346B (zh) * | 2005-01-17 | 2013-03-21 | Toagosei Co Ltd | Active line hardening composition |
JP2006284976A (ja) * | 2005-04-01 | 2006-10-19 | Jsr Corp | 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子 |
TWI347499B (en) * | 2005-05-12 | 2011-08-21 | Tokyo Ohka Kogyo Co Ltd | A method for increasing optical stability of three-dimensional micro moldings |
TW200710572A (en) | 2005-05-31 | 2007-03-16 | Taiyo Ink Mfg Co Ltd | Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same |
JP4679356B2 (ja) * | 2005-06-28 | 2011-04-27 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物およびそれを用いた感光性樹脂積層体 |
US8828651B2 (en) * | 2005-07-25 | 2014-09-09 | Nissan Chemical Industries, Ltd. | Positive-type photosensitive resin composition and cured film manufactured therefrom |
JP5270814B2 (ja) * | 2005-08-11 | 2013-08-21 | 東京応化工業株式会社 | 感光性組成物用着色剤分散液 |
EP1757981B1 (en) * | 2005-08-26 | 2009-10-14 | Agfa Graphics N.V. | Photopolymer printing plate precursor |
KR100791817B1 (ko) * | 2005-09-30 | 2008-01-04 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
WO2007071497A1 (en) * | 2005-12-20 | 2007-06-28 | Ciba Holding Inc. | Oxime ester photoinitiators |
CN1991582B (zh) * | 2005-12-31 | 2010-04-21 | 财团法人工业技术研究院 | 负型感光间隙控制材料的组成及其形成方法 |
KR20070074080A (ko) * | 2006-01-06 | 2007-07-12 | 삼성전자주식회사 | 잉크 조성물, 상기 잉크 조성물을 포함하는 표시판 및 그제조 방법 |
JP4874659B2 (ja) * | 2006-01-24 | 2012-02-15 | 富士フイルム株式会社 | アニリン化合物及びその製造方法、並びに、感光性組成物 |
JP5312743B2 (ja) * | 2006-02-01 | 2013-10-09 | 富士フイルム株式会社 | オキシム化合物及びそれを含む感光性組成物 |
JP4584164B2 (ja) * | 2006-03-08 | 2010-11-17 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
CN102445850B (zh) | 2006-04-13 | 2013-07-31 | 太阳控股株式会社 | 碱显影型阻焊剂及其固化物以及使用其得到的印刷线路板 |
US7955682B2 (en) * | 2006-04-25 | 2011-06-07 | Hewlett-Packard Development Company, L.P. | Photochemical and photothermal rearrangements for optical data and image recording |
JP4711886B2 (ja) * | 2006-05-26 | 2011-06-29 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム及びプリント基板 |
KR101320894B1 (ko) * | 2006-07-05 | 2013-10-24 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 이를 이용한 컬러 필터 기판의제조방법 |
KR100787853B1 (ko) * | 2006-08-16 | 2007-12-27 | 주식회사 동진쎄미켐 | 아크릴계 포토레지스트 모노머, 폴리머 및 이를 포함하는포토레지스트 조성물 |
JP2008064890A (ja) * | 2006-09-05 | 2008-03-21 | Fujifilm Corp | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
WO2008059670A1 (fr) | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée |
CN101183216B (zh) * | 2006-11-15 | 2011-11-02 | 太阳控股株式会社 | 感光性组合物 |
WO2008059935A1 (fr) | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, produit durci et planche de câblage imprimé |
EP2116527A4 (en) * | 2007-01-23 | 2011-09-14 | Fujifilm Corp | OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR MANUFACTURING THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT |
JP2008249857A (ja) * | 2007-03-29 | 2008-10-16 | Fujifilm Corp | 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子 |
JP5224699B2 (ja) * | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版 |
JP2010145425A (ja) * | 2007-03-30 | 2010-07-01 | Fujifilm Corp | 感光性樹脂組成物、感光性フィルム、並びにそれを用いたパターン形成方法及びプリント基板 |
KR100957703B1 (ko) * | 2007-04-13 | 2010-05-12 | 주식회사 엘지화학 | 미세패턴 형성 방법 |
CN101675387B (zh) * | 2007-04-24 | 2012-10-10 | 三井化学株式会社 | 感光性树脂组合物、干膜以及使用该干膜的加工品 |
JP5207837B2 (ja) * | 2007-08-02 | 2013-06-12 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置 |
JP4637221B2 (ja) | 2007-09-28 | 2011-02-23 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 |
CN101464632A (zh) * | 2007-12-21 | 2009-06-24 | 太阳油墨制造株式会社 | 光固化性热固化性树脂组合物和干膜以及使用这些的印刷线路板 |
KR101023843B1 (ko) | 2008-01-11 | 2011-03-22 | 주식회사 엘지화학 | 점착제 조성물, 상기를 포함하는 편광판 및 액정표시장치 |
JP5535444B2 (ja) * | 2008-03-28 | 2014-07-02 | 富士フイルム株式会社 | 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法 |
JP5721630B2 (ja) * | 2008-10-20 | 2015-05-20 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | スルホニウム誘導体および潜在酸としてのその使用 |
CN102639631A (zh) * | 2009-12-02 | 2012-08-15 | 巴斯夫欧洲公司 | 光敏分子和金属配合物作为氧清除剂成分的用途 |
US8875629B2 (en) * | 2010-04-09 | 2014-11-04 | Presstek, Inc. | Ablation-type lithographic imaging with enhanced debris removal |
US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
TWI422970B (zh) * | 2011-03-21 | 2014-01-11 | Chi Mei Corp | 感光性樹脂組成物、間隙體及含彼之液晶顯示元件 |
TWI477854B (zh) * | 2012-02-09 | 2015-03-21 | Chi Mei Corp | 彩色液晶顯示裝置 |
CN103838084B (zh) * | 2012-11-26 | 2020-06-16 | 住友化学株式会社 | 感光性树脂组合物 |
EP3044208B1 (en) | 2013-09-10 | 2021-12-22 | Basf Se | Oxime ester photoinitiators |
EP3127898B1 (en) * | 2014-04-04 | 2021-08-25 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing said compound |
JPWO2016013587A1 (ja) * | 2014-07-24 | 2017-05-25 | 日立化成株式会社 | 感光性樹脂組成物、感光性フィルム、パターン基板、感光性導電フィルム及び導電パターン基板 |
CN104559474A (zh) * | 2015-01-30 | 2015-04-29 | 河源诚展科技有限公司 | 一种五金蚀刻用保护油墨 |
KR101612673B1 (ko) * | 2015-03-11 | 2016-04-14 | 동우 화인켐 주식회사 | 네가티브형 감광성 수지 조성물 |
PL3225112T3 (pl) * | 2016-04-01 | 2022-01-03 | Trioptotec Gmbh | Dyspersja fotouczulacza i jej zastosowanie |
KR102291856B1 (ko) * | 2017-03-06 | 2021-08-20 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치 |
DE112019002914T5 (de) * | 2018-06-08 | 2021-03-04 | Cummins Filtration Ip, Inc. | Vernetzte vliese, hergestellt durch schmelzblasen reversibler polymernetzwerke |
CN111221215A (zh) * | 2018-11-23 | 2020-06-02 | 常州强力先端电子材料有限公司 | 感光性树脂组合物及应用 |
CN110551098B (zh) * | 2019-06-17 | 2021-03-12 | 湖北固润科技股份有限公司 | 包含五元芳杂环结构的肟酯类光引发剂及其制备和用途 |
CN111028987B (zh) * | 2019-12-23 | 2021-12-28 | 合肥微晶材料科技有限公司 | 一种纳米银线导电膜及其作为触控传感器电极层的制作方法 |
KR102586093B1 (ko) * | 2020-04-16 | 2023-10-05 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
CN114163364A (zh) * | 2021-12-06 | 2022-03-11 | 河北科技大学 | 2-甲氧基烯丙基磺酸酯及其合成方法 |
CN116836388B (zh) * | 2023-08-30 | 2023-12-15 | 明士(北京)新材料开发有限公司 | 一种正性光敏性树脂、树脂组合物及它们的制备方法与应用 |
CN118092072A (zh) * | 2024-04-26 | 2024-05-28 | 湖南初源新材料股份有限公司 | 酸显影型感光树脂组合物及其制备方法与感光干膜 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
US4282309A (en) * | 1979-01-24 | 1981-08-04 | Agfa-Gevaert, N.V. | Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer |
JPS59157637A (ja) * | 1983-02-25 | 1984-09-07 | Fuji Photo Film Co Ltd | 熱現像カラ−感光材料 |
JPS59229553A (ja) * | 1983-05-18 | 1984-12-24 | Hitachi Chem Co Ltd | 光重合性組成物 |
JPS60108837A (ja) * | 1983-11-17 | 1985-06-14 | Fuji Photo Film Co Ltd | 酸プレカ−サ− |
US4590145A (en) * | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
JPS62184056A (ja) * | 1986-02-10 | 1987-08-12 | Asahi Chem Ind Co Ltd | 感光性組成物 |
JP2505746B2 (ja) * | 1986-05-20 | 1996-06-12 | 旭化成工業株式会社 | 感光性組成物 |
US5019482A (en) * | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
US5104770A (en) | 1988-03-11 | 1992-04-14 | Hoechst Celanese Corporation | Positive-working photoresist compositions |
JPH02289856A (ja) * | 1989-01-18 | 1990-11-29 | Fuji Photo Film Co Ltd | 感光・感熱性組成物、それを用いた記録材料及び画像形成方法 |
US5399450A (en) * | 1989-04-28 | 1995-03-21 | Seiko Epson Corporation | Method of preparation of a color filter by electrolytic deposition of a polymer material on a previously deposited pigment |
JP2962103B2 (ja) * | 1993-06-23 | 1999-10-12 | 東レ株式会社 | i線用感光性ポリイミド前駆体組成物 |
US5849857A (en) * | 1994-09-14 | 1998-12-15 | Nippon Shokubai Co., Ltd. | Production method for photo-sensitive resin and liquid photo-sensitive resin composition |
JP3498869B2 (ja) | 1995-01-30 | 2004-02-23 | 富士写真フイルム株式会社 | 光重合性組成物を有する画像形成材料 |
JP2937800B2 (ja) | 1995-03-29 | 1999-08-23 | 日華化学株式会社 | ソルダーフォトレジストインキ用組成物 |
JPH08339081A (ja) | 1995-06-09 | 1996-12-24 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物及びその製造方法 |
TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
MY121423A (en) * | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
EP1635220A2 (en) * | 1999-03-03 | 2006-03-15 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use thereof as photoinitiators |
SG78412A1 (en) * | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
KR100310252B1 (ko) * | 1999-06-22 | 2001-11-14 | 박종섭 | 유기 반사방지 중합체 및 그의 제조방법 |
NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
-
2000
- 2000-11-03 SG SG200006382A patent/SG97168A1/en unknown
- 2000-12-06 NL NL1016814A patent/NL1016814C2/nl not_active IP Right Cessation
- 2000-12-07 GB GB0029801A patent/GB2357293B/en not_active Expired - Fee Related
- 2000-12-07 MY MYPI20005760A patent/MY123712A/en unknown
- 2000-12-11 JP JP2000376036A patent/JP4532726B2/ja not_active Expired - Fee Related
- 2000-12-11 CH CH02411/00A patent/CH694673A5/de not_active IP Right Cessation
- 2000-12-11 SE SE0004565A patent/SE522645C2/sv not_active IP Right Cessation
- 2000-12-12 CZ CZ20004639A patent/CZ20004639A3/cs unknown
- 2000-12-12 US US09/734,635 patent/US7829257B2/en not_active Expired - Fee Related
- 2000-12-12 IT IT2000MI002675A patent/IT1319687B1/it active
- 2000-12-13 CA CA002328342A patent/CA2328342A1/en not_active Abandoned
- 2000-12-13 FI FI20002731A patent/FI20002731A/fi not_active IP Right Cessation
- 2000-12-13 BR BR0005866-1A patent/BR0005866A/pt not_active IP Right Cessation
- 2000-12-13 DE DE10061948A patent/DE10061948A1/de not_active Ceased
- 2000-12-14 BE BE2000/0786A patent/BE1013705A3/fr not_active IP Right Cessation
- 2000-12-14 AU AU72268/00A patent/AU773749B2/en not_active Ceased
- 2000-12-14 CN CNB001350633A patent/CN1302339C/zh not_active Expired - Fee Related
- 2000-12-14 DK DK200001877A patent/DK200001877A/da not_active Application Discontinuation
- 2000-12-14 FR FR0016309A patent/FR2802655B1/fr not_active Expired - Fee Related
- 2000-12-14 AT AT0208000A patent/AT410146B/de not_active IP Right Cessation
- 2000-12-14 ES ES200002990A patent/ES2189609B1/es not_active Expired - Fee Related
- 2000-12-15 KR KR1020000077181A patent/KR20010082582A/ko not_active Application Discontinuation
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK200001877A (da) | Fotofølsom resinsammensætning. | |
US6048653A (en) | Polymerizable composition for a color filter | |
KR100807494B1 (ko) | 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 패널 | |
DK200001878A (da) | Oximesterfotoinitiatorer | |
KR101356950B1 (ko) | 감광성 수지 조성물 | |
JP2006330209A (ja) | 感光性組成物および該感光性組成物から形成されたカラーフィルタ | |
KR20110019979A (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 액정표시장치 | |
JP4806611B2 (ja) | 感光性樹脂組成物 | |
JP2003246935A (ja) | 着色組成物及び感光性着色組成物並びにカラーフィルタ | |
JP4426197B2 (ja) | 着色組成物及び感光性着色組成物及びカラーフィルタ | |
TWI578103B (zh) | A radiation-sensitive resin composition, an insulating film, and a display device | |
KR20140106281A (ko) | 착색 감광성 수지 조성물 | |
JP4775535B2 (ja) | カラーフィルタ欠陥修復用感放射線性樹脂組成物およびカラーフィルタ欠陥の修復方法 | |
KR20120088026A (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치 | |
KR20150011496A (ko) | 착색 감광성 수지 조성물, 이를 포함하는 컬러 필터 및 표시 장치 | |
US5641594A (en) | Colored, photosensitive resin composition | |
JPH09203806A (ja) | カラーフィルター用ネガ型感光性組成物 | |
KR101373984B1 (ko) | 포토 스페이서용 감광성 수지 조성물 | |
KR20070070472A (ko) | 감광성 수지 조성물 및 이를 이용한 블랙매트릭스 | |
KR940001549B1 (ko) | 고감도의 폴리아미드 에스테르 감광성 내식막 제제 | |
KR20120021006A (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 | |
KR20180013744A (ko) | 수지, 경화성 수지 조성물 및 경화막 | |
JP4411001B2 (ja) | 着色組成物及び感光性着色組成物及びカラーフィルタ | |
JP2017037305A (ja) | 着色感光性樹脂組成物およびこれを用いるカラーフィルタ | |
JP3852516B2 (ja) | カラーフィルター用重合組成物、カラーフィルターおよび液晶表示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AHS | Application shelved for other reasons than non-payment |