FI20002731A - Valoherkkä hartsikoostumus - Google Patents
Valoherkkä hartsikoostumus Download PDFInfo
- Publication number
- FI20002731A FI20002731A FI20002731A FI20002731A FI20002731A FI 20002731 A FI20002731 A FI 20002731A FI 20002731 A FI20002731 A FI 20002731A FI 20002731 A FI20002731 A FI 20002731A FI 20002731 A FI20002731 A FI 20002731A
- Authority
- FI
- Finland
- Prior art keywords
- resin composition
- photosensitive resin
- photosensitive
- composition
- resin
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/52—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- C08K5/33—Oximes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Optical Filters (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Indole Compounds (AREA)
- Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
- Furan Compounds (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polyamides (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99811161 | 1999-12-15 | ||
EP00810630 | 2000-07-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
FI20002731A0 FI20002731A0 (fi) | 2000-12-13 |
FI20002731A true FI20002731A (fi) | 2001-06-16 |
Family
ID=26073958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20002731A FI20002731A (fi) | 1999-12-15 | 2000-12-13 | Valoherkkä hartsikoostumus |
Country Status (22)
Country | Link |
---|---|
US (1) | US7829257B2 (fi) |
JP (1) | JP4532726B2 (fi) |
KR (1) | KR20010082582A (fi) |
CN (1) | CN1302339C (fi) |
AT (1) | AT410146B (fi) |
AU (1) | AU773749B2 (fi) |
BE (1) | BE1013705A3 (fi) |
BR (1) | BR0005866A (fi) |
CA (1) | CA2328342A1 (fi) |
CH (1) | CH694673A5 (fi) |
CZ (1) | CZ20004639A3 (fi) |
DE (1) | DE10061948A1 (fi) |
DK (1) | DK200001877A (fi) |
ES (1) | ES2189609B1 (fi) |
FI (1) | FI20002731A (fi) |
FR (1) | FR2802655B1 (fi) |
GB (1) | GB2357293B (fi) |
IT (1) | IT1319687B1 (fi) |
MY (1) | MY123712A (fi) |
NL (1) | NL1016814C2 (fi) |
SE (1) | SE522645C2 (fi) |
SG (1) | SG97168A1 (fi) |
Families Citing this family (80)
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TW575792B (en) * | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
CA2446722A1 (en) * | 2001-06-11 | 2002-12-19 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators having a combined structure |
US6702437B2 (en) * | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
US6905243B2 (en) * | 2001-11-17 | 2005-06-14 | Dr. Friedrichs Gruppe Gmbh | Buoyancy liquid for galilean thermometer |
ATE552120T1 (de) | 2001-12-24 | 2012-04-15 | L 1 Secure Credentialing Inc | Verdeckte variableninformationen auf id- dokumenten und verfahren zu ihrer herstellung |
AU2002364036A1 (en) | 2001-12-24 | 2003-07-15 | Digimarc Id Systems, Llc | Laser etched security features for identification documents and methods of making same |
US7694887B2 (en) | 2001-12-24 | 2010-04-13 | L-1 Secure Credentialing, Inc. | Optically variable personalized indicia for identification documents |
WO2003088144A2 (en) | 2002-04-09 | 2003-10-23 | Digimarc Id Systems, Llc | Image processing techniques for printing identification cards and documents |
US7824029B2 (en) | 2002-05-10 | 2010-11-02 | L-1 Secure Credentialing, Inc. | Identification card printer-assembler for over the counter card issuing |
EP1533419B1 (en) * | 2002-05-10 | 2009-09-23 | Kao Corporation | Production mold for formed fiber |
WO2004049242A2 (en) | 2002-11-26 | 2004-06-10 | Digimarc Id Systems | Systems and methods for managing and detecting fraud in image databases used with identification documents |
TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
US20050215656A1 (en) | 2002-11-28 | 2005-09-29 | Taiyo Ink Manufacturing Co., Ltd. | Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
US20040222080A1 (en) * | 2002-12-17 | 2004-11-11 | William Marsh Rice University | Use of microwaves to crosslink carbon nanotubes to facilitate modification |
US7604755B2 (en) * | 2003-02-17 | 2009-10-20 | Japan Composite Co., Ltd. | Electroconductive resin composition and separator for fuel cell |
JP3797348B2 (ja) * | 2003-02-24 | 2006-07-19 | コニカミノルタホールディングス株式会社 | 活性エネルギー線硬化組成物 |
US7225991B2 (en) | 2003-04-16 | 2007-06-05 | Digimarc Corporation | Three dimensional data storage |
TW200519535A (en) * | 2003-11-27 | 2005-06-16 | Taiyo Ink Mfg Co Ltd | Hardenable resin composition, hardened body thereof, and printed circuit board |
JP4292985B2 (ja) * | 2003-12-25 | 2009-07-08 | Jsr株式会社 | 感放射線性組成物、マイクロレンズとその形成方法および液晶表示素子 |
DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
JP2005215147A (ja) * | 2004-01-28 | 2005-08-11 | Fuji Photo Film Co Ltd | 重合性組成物 |
TWI285297B (en) * | 2004-02-09 | 2007-08-11 | Chi Mei Corp | Light-sensitive resin composition for black matrix |
JP2005300994A (ja) * | 2004-04-13 | 2005-10-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
TWI390346B (zh) * | 2005-01-17 | 2013-03-21 | Toagosei Co Ltd | Active line hardening composition |
JP2006284976A (ja) * | 2005-04-01 | 2006-10-19 | Jsr Corp | 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子 |
TWI347499B (en) * | 2005-05-12 | 2011-08-21 | Tokyo Ohka Kogyo Co Ltd | A method for increasing optical stability of three-dimensional micro moldings |
TW200710572A (en) | 2005-05-31 | 2007-03-16 | Taiyo Ink Mfg Co Ltd | Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same |
JP4679356B2 (ja) * | 2005-06-28 | 2011-04-27 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物およびそれを用いた感光性樹脂積層体 |
CN1904736B (zh) * | 2005-07-25 | 2012-06-13 | 日产化学工业株式会社 | 正型感光性树脂组合物和由其得到的固化膜 |
JP5270814B2 (ja) * | 2005-08-11 | 2013-08-21 | 東京応化工業株式会社 | 感光性組成物用着色剤分散液 |
ES2333442T3 (es) * | 2005-08-26 | 2010-02-22 | Agfa Graphics N.V. | Precursor de placa de impresion fotopolimerico. |
KR100791817B1 (ko) * | 2005-09-30 | 2008-01-04 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
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KR100787853B1 (ko) * | 2006-08-16 | 2007-12-27 | 주식회사 동진쎄미켐 | 아크릴계 포토레지스트 모노머, 폴리머 및 이를 포함하는포토레지스트 조성물 |
JP2008064890A (ja) * | 2006-09-05 | 2008-03-21 | Fujifilm Corp | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
WO2008059935A1 (fr) | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, produit durci et planche de câblage imprimé |
WO2008059670A1 (fr) | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée |
TW200846823A (en) * | 2006-11-15 | 2008-12-01 | Taiyo Ink Mfg Co Ltd | Photosensitive composition |
KR20090104877A (ko) * | 2007-01-23 | 2009-10-06 | 후지필름 가부시키가이샤 | 옥심 화합물, 감광성 조성물, 컬러 필터, 그 제조방법 및 액정표시소자 |
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JP2010145425A (ja) * | 2007-03-30 | 2010-07-01 | Fujifilm Corp | 感光性樹脂組成物、感光性フィルム、並びにそれを用いたパターン形成方法及びプリント基板 |
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JP5167252B2 (ja) * | 2007-04-24 | 2013-03-21 | 三井化学株式会社 | 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 |
JP5207837B2 (ja) * | 2007-08-02 | 2013-06-12 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置 |
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JP5535444B2 (ja) * | 2008-03-28 | 2014-07-02 | 富士フイルム株式会社 | 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法 |
WO2010046240A1 (en) | 2008-10-20 | 2010-04-29 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
CN106633277A (zh) * | 2009-12-02 | 2017-05-10 | 巴斯夫欧洲公司 | 光敏分子和金属配合物作为氧清除剂成分的用途 |
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US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
TWI422970B (zh) * | 2011-03-21 | 2014-01-11 | Chi Mei Corp | 感光性樹脂組成物、間隙體及含彼之液晶顯示元件 |
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CN103838084B (zh) * | 2012-11-26 | 2020-06-16 | 住友化学株式会社 | 感光性树脂组合物 |
US9957258B2 (en) | 2013-09-10 | 2018-05-01 | Basf Se | Oxime ester photoinitiators |
WO2015152153A1 (ja) * | 2014-04-04 | 2015-10-08 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
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CN116836388B (zh) * | 2023-08-30 | 2023-12-15 | 明士(北京)新材料开发有限公司 | 一种正性光敏性树脂、树脂组合物及它们的制备方法与应用 |
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-
2000
- 2000-11-03 SG SG200006382A patent/SG97168A1/en unknown
- 2000-12-06 NL NL1016814A patent/NL1016814C2/nl not_active IP Right Cessation
- 2000-12-07 MY MYPI20005760A patent/MY123712A/en unknown
- 2000-12-07 GB GB0029801A patent/GB2357293B/en not_active Expired - Fee Related
- 2000-12-11 JP JP2000376036A patent/JP4532726B2/ja not_active Expired - Fee Related
- 2000-12-11 SE SE0004565A patent/SE522645C2/sv not_active IP Right Cessation
- 2000-12-11 CH CH02411/00A patent/CH694673A5/de not_active IP Right Cessation
- 2000-12-12 IT IT2000MI002675A patent/IT1319687B1/it active
- 2000-12-12 US US09/734,635 patent/US7829257B2/en not_active Expired - Fee Related
- 2000-12-12 CZ CZ20004639A patent/CZ20004639A3/cs unknown
- 2000-12-13 CA CA002328342A patent/CA2328342A1/en not_active Abandoned
- 2000-12-13 FI FI20002731A patent/FI20002731A/fi not_active IP Right Cessation
- 2000-12-13 BR BR0005866-1A patent/BR0005866A/pt not_active IP Right Cessation
- 2000-12-13 DE DE10061948A patent/DE10061948A1/de not_active Ceased
- 2000-12-14 CN CNB001350633A patent/CN1302339C/zh not_active Expired - Fee Related
- 2000-12-14 BE BE2000/0786A patent/BE1013705A3/fr not_active IP Right Cessation
- 2000-12-14 DK DK200001877A patent/DK200001877A/da not_active Application Discontinuation
- 2000-12-14 AU AU72268/00A patent/AU773749B2/en not_active Ceased
- 2000-12-14 FR FR0016309A patent/FR2802655B1/fr not_active Expired - Fee Related
- 2000-12-14 AT AT0208000A patent/AT410146B/de not_active IP Right Cessation
- 2000-12-14 ES ES200002990A patent/ES2189609B1/es not_active Expired - Fee Related
- 2000-12-15 KR KR1020000077181A patent/KR20010082582A/ko not_active Application Discontinuation
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