NL1016814A1 - Voor licht gevoelige harssamenstelling. - Google Patents

Voor licht gevoelige harssamenstelling.

Info

Publication number
NL1016814A1
NL1016814A1 NL1016814A NL1016814A NL1016814A1 NL 1016814 A1 NL1016814 A1 NL 1016814A1 NL 1016814 A NL1016814 A NL 1016814A NL 1016814 A NL1016814 A NL 1016814A NL 1016814 A1 NL1016814 A1 NL 1016814A1
Authority
NL
Netherlands
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Application number
NL1016814A
Other languages
English (en)
Other versions
NL1016814C2 (nl
Inventor
Hidetaka Oka
Kazuhiko Kunimoto
Hisatoshi Kura
Masaki Ohwa
Junichi Tanabe
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of NL1016814A1 publication Critical patent/NL1016814A1/nl
Application granted granted Critical
Publication of NL1016814C2 publication Critical patent/NL1016814C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/52—Radicals substituted by nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Indole Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Furan Compounds (AREA)
  • Polyamides (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
NL1016814A 1999-12-15 2000-12-06 Voor licht gevoelige harssamenstelling. NL1016814C2 (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP99811161 1999-12-15
EP99811161 1999-12-15
EP00810630 2000-07-17
EP00810630 2000-07-17

Publications (2)

Publication Number Publication Date
NL1016814A1 true NL1016814A1 (nl) 2001-06-18
NL1016814C2 NL1016814C2 (nl) 2002-01-29

Family

ID=26073958

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1016814A NL1016814C2 (nl) 1999-12-15 2000-12-06 Voor licht gevoelige harssamenstelling.

Country Status (22)

Country Link
US (1) US7829257B2 (nl)
JP (1) JP4532726B2 (nl)
KR (1) KR20010082582A (nl)
CN (1) CN1302339C (nl)
AT (1) AT410146B (nl)
AU (1) AU773749B2 (nl)
BE (1) BE1013705A3 (nl)
BR (1) BR0005866A (nl)
CA (1) CA2328342A1 (nl)
CH (1) CH694673A5 (nl)
CZ (1) CZ20004639A3 (nl)
DE (1) DE10061948A1 (nl)
DK (1) DK200001877A (nl)
ES (1) ES2189609B1 (nl)
FI (1) FI20002731A (nl)
FR (1) FR2802655B1 (nl)
GB (1) GB2357293B (nl)
IT (1) IT1319687B1 (nl)
MY (1) MY123712A (nl)
NL (1) NL1016814C2 (nl)
SE (1) SE522645C2 (nl)
SG (1) SG97168A1 (nl)

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TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
ATE446322T1 (de) * 2001-06-11 2009-11-15 Basf Se Oxim ester photoinitiatoren mit kombinierter struktur
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DE60233826D1 (de) * 2002-05-10 2009-11-05 Kao Corp Form zur herstellung von fasergussformteilen
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CN111221215A (zh) * 2018-11-23 2020-06-02 常州强力先端电子材料有限公司 感光性树脂组合物及应用
CN110551098B (zh) * 2019-06-17 2021-03-12 湖北固润科技股份有限公司 包含五元芳杂环结构的肟酯类光引发剂及其制备和用途
CN111028987B (zh) * 2019-12-23 2021-12-28 合肥微晶材料科技有限公司 一种纳米银线导电膜及其作为触控传感器电极层的制作方法
KR102586093B1 (ko) * 2020-04-16 2023-10-05 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
CN114163364A (zh) * 2021-12-06 2022-03-11 河北科技大学 2-甲氧基烯丙基磺酸酯及其合成方法
CN116836388B (zh) * 2023-08-30 2023-12-15 明士(北京)新材料开发有限公司 一种正性光敏性树脂、树脂组合物及它们的制备方法与应用
CN118092072A (zh) * 2024-04-26 2024-05-28 湖南初源新材料股份有限公司 酸显影型感光树脂组合物及其制备方法与感光干膜

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BR0005866A (pt) 2002-05-21
CZ20004639A3 (cs) 2001-09-12
DK200001877A (da) 2001-06-16
SE0004565L (sv) 2001-07-25
SE0004565D0 (sv) 2000-12-11
GB0029801D0 (en) 2001-01-17
NL1016814C2 (nl) 2002-01-29
BE1013705A3 (fr) 2002-06-04
JP4532726B2 (ja) 2010-08-25
AU773749B2 (en) 2004-06-03
DE10061948A1 (de) 2001-06-21
FI20002731A (fi) 2001-06-16
ES2189609B1 (es) 2004-04-01
US7829257B2 (en) 2010-11-09
AT410146B (de) 2003-02-25
ES2189609A1 (es) 2003-07-01
CN1302339C (zh) 2007-02-28
ATA20802000A (de) 2002-06-15
CH694673A5 (de) 2005-05-31
IT1319687B1 (it) 2003-10-23
CN1305124A (zh) 2001-07-25
US20020020832A1 (en) 2002-02-21
FR2802655A1 (fr) 2001-06-22
SE522645C2 (sv) 2004-02-24
FR2802655B1 (fr) 2003-08-15
AU7226800A (en) 2001-06-21
SG97168A1 (en) 2003-07-18
JP2001235858A (ja) 2001-08-31
CA2328342A1 (en) 2001-06-15
FI20002731A0 (fi) 2000-12-13
KR20010082582A (ko) 2001-08-30
GB2357293B (en) 2002-08-07
GB2357293A (en) 2001-06-20
ITMI20002675A1 (it) 2002-06-12
MY123712A (en) 2006-05-31

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