DK1131286T3 - Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme - Google Patents

Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme

Info

Publication number
DK1131286T3
DK1131286T3 DK99972622T DK99972622T DK1131286T3 DK 1131286 T3 DK1131286 T3 DK 1131286T3 DK 99972622 T DK99972622 T DK 99972622T DK 99972622 T DK99972622 T DK 99972622T DK 1131286 T3 DK1131286 T3 DK 1131286T3
Authority
DK
Denmark
Prior art keywords
photopolymerization
same
systems containing
photoinitiators suitable
photopolymerizable systems
Prior art date
Application number
DK99972622T
Other languages
English (en)
Inventor
Marco Visconti
Domenico Badone
Bassi Giuseppe Li
Enzo Meneguzzo
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lamberti Spa filed Critical Lamberti Spa
Application granted granted Critical
Publication of DK1131286T3 publication Critical patent/DK1131286T3/da

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/22Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/65Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfone or sulfoxide groups bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
  • Paints Or Removers (AREA)
DK99972622T 1998-11-19 1999-11-05 Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme DK1131286T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT1998MI002508A IT1303775B1 (it) 1998-11-19 1998-11-19 Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
PCT/EP1999/008497 WO2000031030A1 (en) 1998-11-19 1999-11-05 Bifunctional photoinitiators suitable for photopolymerization and photopolymerizable systems containing the same

Publications (1)

Publication Number Publication Date
DK1131286T3 true DK1131286T3 (da) 2004-01-05

Family

ID=11381089

Family Applications (1)

Application Number Title Priority Date Filing Date
DK99972622T DK1131286T3 (da) 1998-11-19 1999-11-05 Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme

Country Status (12)

Country Link
US (1) US6492514B1 (da)
EP (1) EP1131286B1 (da)
JP (1) JP4409095B2 (da)
KR (1) KR100694946B1 (da)
AT (1) ATE248813T1 (da)
AU (1) AU1160800A (da)
CA (1) CA2351232C (da)
DE (1) DE69911050T2 (da)
DK (1) DK1131286T3 (da)
ES (1) ES2207343T3 (da)
IT (1) IT1303775B1 (da)
WO (1) WO2000031030A1 (da)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITVA20030028A1 (it) 2003-08-07 2005-02-08 Lamberti Spa Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
EP2075293B1 (en) 2007-12-28 2014-03-12 Konica Minolta Holdings, Inc. Ink-jet ink and ink-jet recording method
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
JP2011068783A (ja) * 2009-09-25 2011-04-07 Fujifilm Corp インク組成物、及び、インクジェット記録方法
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
CN102981367A (zh) * 2012-12-05 2013-03-20 北京化工大学常州先进材料研究院 含有4-(2,4,6-三甲基苯甲酰基)二苯硫醚作为光引发剂的感光性组合物
JP2016079157A (ja) * 2014-10-22 2016-05-16 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
US11054743B2 (en) 2015-12-15 2021-07-06 Changzhou Tronly Advanced Electronic Materials Co., Ltd. Fluorene polyfunctional photoinitiator and preparation and use thereof, and photosensitive resin composition containing fluorene photoinitiator and use thereof
EP3514135B1 (en) 2016-09-13 2021-04-21 Changzhou Tronly Advanced Electronic Materials Co., Ltd. Fluorene photoinitiator, preparation method therefor, photocurable composition having same, and use of same in photocuring field
US11118065B2 (en) 2017-02-17 2021-09-14 Changzhou Tronly Advanced Electronic Materials Co., Ltd. Fluorenylaminoketone photoinitiator, preparation method thereof, and UV photocurable composition containing same
US11267977B2 (en) 2017-08-10 2022-03-08 Sun Chemical Corporation UV-curable compositions comprising acylphosphine oxide photoinitiators
CN109896985A (zh) * 2017-12-07 2019-06-18 孙建 一种新型α-氨基酮类LED引发剂及其制备方法
KR102067533B1 (ko) * 2018-08-24 2020-02-11 주식회사 그래피 3d 프린터용 광경화형 고분자 조성물

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3505998A1 (de) * 1985-02-21 1986-08-21 Merck Patent Gmbh, 6100 Darmstadt Verwendung thiosubstituierter ketone als photoinitiatoren
JPH0741510A (ja) * 1993-08-02 1995-02-10 Nippon Kayaku Co Ltd 光重合開始剤、これを含有する感光性樹脂組成物及びその硬化物
WO1997010270A1 (en) * 1995-09-11 1997-03-20 Lamberti S.P.A. Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same

Also Published As

Publication number Publication date
KR100694946B1 (ko) 2007-03-14
DE69911050D1 (de) 2003-10-09
US6492514B1 (en) 2002-12-10
JP2002530372A (ja) 2002-09-17
KR20010080997A (ko) 2001-08-25
WO2000031030A1 (en) 2000-06-02
DE69911050T2 (de) 2004-07-08
CA2351232C (en) 2008-05-27
EP1131286A1 (en) 2001-09-12
ATE248813T1 (de) 2003-09-15
EP1131286B1 (en) 2003-09-03
IT1303775B1 (it) 2001-02-23
ITMI982508A1 (it) 2000-05-19
JP4409095B2 (ja) 2010-02-03
AU1160800A (en) 2000-06-13
CA2351232A1 (en) 2000-06-02
ES2207343T3 (es) 2004-05-16

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