DK1131286T3 - Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme - Google Patents
Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder sammeInfo
- Publication number
- DK1131286T3 DK1131286T3 DK99972622T DK99972622T DK1131286T3 DK 1131286 T3 DK1131286 T3 DK 1131286T3 DK 99972622 T DK99972622 T DK 99972622T DK 99972622 T DK99972622 T DK 99972622T DK 1131286 T3 DK1131286 T3 DK 1131286T3
- Authority
- DK
- Denmark
- Prior art keywords
- photopolymerization
- same
- systems containing
- photoinitiators suitable
- photopolymerizable systems
- Prior art date
Links
- 230000001588 bifunctional effect Effects 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 101100496169 Arabidopsis thaliana CLH1 gene Proteins 0.000 abstract 1
- 101100044057 Mesocricetus auratus SYCP3 gene Proteins 0.000 abstract 1
- 101100080600 Schizosaccharomyces pombe (strain 972 / ATCC 24843) nse6 gene Proteins 0.000 abstract 1
- 101150111293 cor-1 gene Proteins 0.000 abstract 1
- 238000009472 formulation Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/22—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
- C07C323/65—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfone or sulfoxide groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Dental Preparations (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT1998MI002508A IT1303775B1 (it) | 1998-11-19 | 1998-11-19 | Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni. |
PCT/EP1999/008497 WO2000031030A1 (en) | 1998-11-19 | 1999-11-05 | Bifunctional photoinitiators suitable for photopolymerization and photopolymerizable systems containing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
DK1131286T3 true DK1131286T3 (da) | 2004-01-05 |
Family
ID=11381089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK99972622T DK1131286T3 (da) | 1998-11-19 | 1999-11-05 | Bifunktionelle fotoinitiatorer, der er egnede til fotopolymerisering, og fotopolymeriserbare systemer, der indeholder samme |
Country Status (12)
Country | Link |
---|---|
US (1) | US6492514B1 (da) |
EP (1) | EP1131286B1 (da) |
JP (1) | JP4409095B2 (da) |
KR (1) | KR100694946B1 (da) |
AT (1) | ATE248813T1 (da) |
AU (1) | AU1160800A (da) |
CA (1) | CA2351232C (da) |
DE (1) | DE69911050T2 (da) |
DK (1) | DK1131286T3 (da) |
ES (1) | ES2207343T3 (da) |
IT (1) | IT1303775B1 (da) |
WO (1) | WO2000031030A1 (da) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITVA20030028A1 (it) | 2003-08-07 | 2005-02-08 | Lamberti Spa | Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. |
ITVA20050049A1 (it) * | 2005-08-05 | 2007-02-06 | Lamberti Spa | Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' |
EP2075293B1 (en) | 2007-12-28 | 2014-03-12 | Konica Minolta Holdings, Inc. | Ink-jet ink and ink-jet recording method |
US8507726B2 (en) | 2008-11-03 | 2013-08-13 | Basf Se | Photoinitiator mixtures |
JP2011068783A (ja) * | 2009-09-25 | 2011-04-07 | Fujifilm Corp | インク組成物、及び、インクジェット記録方法 |
US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
US8816211B2 (en) | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
CN102981367A (zh) * | 2012-12-05 | 2013-03-20 | 北京化工大学常州先进材料研究院 | 含有4-(2,4,6-三甲基苯甲酰基)二苯硫醚作为光引发剂的感光性组合物 |
JP2016079157A (ja) * | 2014-10-22 | 2016-05-16 | 株式会社Adeka | 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物 |
US11054743B2 (en) | 2015-12-15 | 2021-07-06 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | Fluorene polyfunctional photoinitiator and preparation and use thereof, and photosensitive resin composition containing fluorene photoinitiator and use thereof |
EP3514135B1 (en) | 2016-09-13 | 2021-04-21 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | Fluorene photoinitiator, preparation method therefor, photocurable composition having same, and use of same in photocuring field |
US11118065B2 (en) | 2017-02-17 | 2021-09-14 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | Fluorenylaminoketone photoinitiator, preparation method thereof, and UV photocurable composition containing same |
US11267977B2 (en) | 2017-08-10 | 2022-03-08 | Sun Chemical Corporation | UV-curable compositions comprising acylphosphine oxide photoinitiators |
CN109896985A (zh) * | 2017-12-07 | 2019-06-18 | 孙建 | 一种新型α-氨基酮类LED引发剂及其制备方法 |
KR102067533B1 (ko) * | 2018-08-24 | 2020-02-11 | 주식회사 그래피 | 3d 프린터용 광경화형 고분자 조성물 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
DE3505998A1 (de) * | 1985-02-21 | 1986-08-21 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung thiosubstituierter ketone als photoinitiatoren |
JPH0741510A (ja) * | 1993-08-02 | 1995-02-10 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有する感光性樹脂組成物及びその硬化物 |
WO1997010270A1 (en) * | 1995-09-11 | 1997-03-20 | Lamberti S.P.A. | Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same |
-
1998
- 1998-11-19 IT IT1998MI002508A patent/IT1303775B1/it active
-
1999
- 1999-11-05 AT AT99972622T patent/ATE248813T1/de active
- 1999-11-05 EP EP99972622A patent/EP1131286B1/en not_active Expired - Lifetime
- 1999-11-05 DK DK99972622T patent/DK1131286T3/da active
- 1999-11-05 KR KR1020017005986A patent/KR100694946B1/ko not_active IP Right Cessation
- 1999-11-05 AU AU11608/00A patent/AU1160800A/en not_active Abandoned
- 1999-11-05 DE DE69911050T patent/DE69911050T2/de not_active Expired - Lifetime
- 1999-11-05 ES ES99972622T patent/ES2207343T3/es not_active Expired - Lifetime
- 1999-11-05 US US09/856,260 patent/US6492514B1/en not_active Expired - Lifetime
- 1999-11-05 WO PCT/EP1999/008497 patent/WO2000031030A1/en active IP Right Grant
- 1999-11-05 JP JP2000583858A patent/JP4409095B2/ja not_active Expired - Lifetime
- 1999-11-05 CA CA002351232A patent/CA2351232C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100694946B1 (ko) | 2007-03-14 |
DE69911050D1 (de) | 2003-10-09 |
US6492514B1 (en) | 2002-12-10 |
JP2002530372A (ja) | 2002-09-17 |
KR20010080997A (ko) | 2001-08-25 |
WO2000031030A1 (en) | 2000-06-02 |
DE69911050T2 (de) | 2004-07-08 |
CA2351232C (en) | 2008-05-27 |
EP1131286A1 (en) | 2001-09-12 |
ATE248813T1 (de) | 2003-09-15 |
EP1131286B1 (en) | 2003-09-03 |
IT1303775B1 (it) | 2001-02-23 |
ITMI982508A1 (it) | 2000-05-19 |
JP4409095B2 (ja) | 2010-02-03 |
AU1160800A (en) | 2000-06-13 |
CA2351232A1 (en) | 2000-06-02 |
ES2207343T3 (es) | 2004-05-16 |
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