TWI465432B - 肟酯光起始劑（一） - Google Patents

肟酯光起始劑（一） Download PDF

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Publication number
TWI465432B
TWI465432B TW097117241A TW97117241A TWI465432B TW I465432 B TWI465432 B TW I465432B TW 097117241 A TW097117241 A TW 097117241A TW 97117241 A TW97117241 A TW 97117241A TW I465432 B TWI465432 B TW I465432B
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TW
Taiwan
Prior art keywords
group
alkyl
phenyl
substituted
interrupted
Prior art date
Application number
TW097117241A
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English (en)
Chinese (zh)
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TW200904800A (en
Inventor
Akira Matsumoto
Junichi Tanabe
Hisatoshi Kura
Masaki Ohwa
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Ciba Holding Inc
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Publication of TW200904800A publication Critical patent/TW200904800A/zh
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Publication of TWI465432B publication Critical patent/TWI465432B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)
TW097117241A 2007-05-11 2008-05-09 肟酯光起始劑（一） TWI465432B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07108025 2007-05-11
EP07110623 2007-06-20

Publications (2)

Publication Number Publication Date
TW200904800A TW200904800A (en) 2009-02-01
TWI465432B true TWI465432B (zh) 2014-12-21

Family

ID=39665960

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097117241A TWI465432B (zh) 2007-05-11 2008-05-09 肟酯光起始劑（一）

Country Status (7)

Country Link
US (2) US8911921B2 (enExample)
EP (2) EP2402315A1 (enExample)
JP (2) JP5535063B2 (enExample)
KR (1) KR101526618B1 (enExample)
CN (2) CN101687794B (enExample)
TW (1) TWI465432B (enExample)
WO (1) WO2008138724A1 (enExample)

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KR101526619B1 (ko) * 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
EP2287206B1 (en) 2008-05-30 2014-01-01 Advanced Softmaterials Inc. Polyrotaxane, aqueous polyrotaxane dispersion composition, crosslinked body of polyrotaxane and polymer and method for producing the same
WO2009147031A2 (en) * 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
EP2285836B1 (en) * 2008-06-06 2012-01-18 Basf Se Photoinitiator mixtures
US8507726B2 (en) * 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
US8507569B2 (en) 2009-03-23 2013-08-13 Basf Se Photoresist compositions
WO2011069943A1 (en) 2009-12-07 2011-06-16 Agfa-Gevaert Uv-led curable compositions and inks
CA2780036C (en) 2009-12-07 2017-08-22 Agfa-Gevaert Photoinitiators for uv-led curable compositions and inks
JP5640722B2 (ja) * 2010-02-05 2014-12-17 Jsr株式会社 新規化合物及びそれを含有する感放射線性組成物
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
CA2797709C (en) 2010-04-28 2018-07-31 Jason J. Locklin Photochemical cross-linkable polymers, methods of making photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
EP2625166B1 (en) * 2010-10-05 2014-09-24 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
JP5747345B2 (ja) * 2011-03-16 2015-07-15 新日鉄住金化学株式会社 ベクトル波記録媒体、及び多重記録再生方法
RU2628076C2 (ru) * 2011-05-25 2017-08-14 Америкэн Дай Сорс, Инк. Соединения с группами сложных эфиров оксима и/или ацильными группами
WO2013012664A2 (en) 2011-07-15 2013-01-24 The University Of Georgia Research Foundation, Inc Permanent attachment of agents to surfaces containing c-h functionality
US9839213B2 (en) 2011-10-14 2017-12-12 The University Of Georgia Research Foundation, Inc. Photochemical cross-linkable polymers, methods of making photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
US9594302B2 (en) * 2012-03-22 2017-03-14 Adeka Corporation Compound and photosensitive resin composition
JP6195456B2 (ja) * 2013-03-12 2017-09-13 東京応化工業株式会社 感放射線性樹脂組成物
US10234761B2 (en) 2013-07-08 2019-03-19 Basf Se Oxime ester photoinitiators
KR102028477B1 (ko) * 2013-07-19 2019-10-04 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
KR101435652B1 (ko) * 2014-01-17 2014-08-28 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
JP5890464B2 (ja) * 2014-05-01 2016-03-22 東京応化工業株式会社 感光性樹脂組成物
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JP6894188B2 (ja) * 2015-09-02 2021-06-30 東京応化工業株式会社 感光性組成物、当該感光性組成物の製造方法、当該感光性組成物を用いる膜の形成方法、感光性組成物の保管時の増粘抑制方法、光重合開始剤、及び光重合開始剤の製造方法
CN106483760B (zh) * 2015-09-02 2019-11-12 东京应化工业株式会社 感光性组合物、其制造方法、膜的形成方法、粘度增加抑制方法、光聚合引发剂及其制造方法
KR102504338B1 (ko) * 2015-12-03 2023-02-28 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이를 이용한 유기 절연막
CN107129458B (zh) * 2016-02-26 2021-02-09 江苏和成新材料有限公司 咔唑肟酯类化合物及其合成方法与应用
JP6758070B2 (ja) * 2016-03-31 2020-09-23 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化させた遮光膜を備えたディスプレイ用基板、及びディスプレイ用基板の製造方法
TWI635079B (zh) * 2016-07-08 2018-09-11 韓國化學研究院 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物
CN106467482B (zh) * 2016-07-27 2019-04-09 江苏三月光电科技有限公司 一种基于二芳基酮的化合物及其应用
KR20180014982A (ko) * 2016-08-02 2018-02-12 동우 화인켐 주식회사 카바졸 유도체 및 이를 포함하는 광경화성 조성물
WO2018138928A1 (ja) * 2017-01-30 2018-08-02 Ｊｘ金属株式会社 表面処理めっき材、コネクタ端子、コネクタ、ｆｆｃ端子、ｆｆｃ、ｆｐｃ及び電子部品
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
JP7079581B2 (ja) * 2017-08-31 2022-06-02 東京応化工業株式会社 感光性組成物、硬化物形成方法、硬化物、画像表示装置用パネル、及び画像表示装置
KR102085958B1 (ko) * 2018-01-26 2020-03-06 타코마테크놀러지 주식회사 고감도 옥심에스터 광중합 개시제 및 이를 포함하는 광중합 조성물
CN108658839A (zh) * 2018-05-04 2018-10-16 武汉瑞凯兴科技有限公司 N-(4-苯甲酰基苯)-咔唑的合成方法
US12013637B2 (en) 2018-06-29 2024-06-18 Adeka Corporation Oxime ester compound and photopolymerization initiator containing same
US20220121113A1 (en) * 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
CN114450322B (zh) * 2019-12-17 2023-06-27 株式会社Lg化学 化合物、粘合剂树脂、负型光敏树脂组合物和包括使用所述负型光敏树脂组合物形成的黑堤的显示装置
TW202308979A (zh) * 2021-06-15 2023-03-01 日商三菱瓦斯化學股份有限公司 樹脂組成物、樹脂片、多層印刷配線板、及半導體裝置
TWI850579B (zh) * 2021-08-13 2024-08-01 達興材料股份有限公司 感光性樹脂組成物及其用途、顯示裝置、半導體裝置
CN118978473A (zh) * 2022-12-08 2024-11-19 阜阳欣奕华新材料科技股份有限公司 咔唑类化合物、含环己基咔唑类化合物、光引发剂、感光性树脂组合物和固化膜
CN119080675A (zh) * 2022-12-08 2024-12-06 阜阳欣奕华新材料科技股份有限公司 含咔唑并茚酮基团的化合物和肟酯类光引发剂、光固化涂料和固化膜

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