DE69112852T2 - Polymerisationsinitiator verwendbar in der Nähe von Infrarot. - Google Patents

Polymerisationsinitiator verwendbar in der Nähe von Infrarot.

Info

Publication number
DE69112852T2
DE69112852T2 DE69112852T DE69112852T DE69112852T2 DE 69112852 T2 DE69112852 T2 DE 69112852T2 DE 69112852 T DE69112852 T DE 69112852T DE 69112852 T DE69112852 T DE 69112852T DE 69112852 T2 DE69112852 T2 DE 69112852T2
Authority
DE
Germany
Prior art keywords
polymerization initiator
near infrared
initiator usable
usable near
infrared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69112852T
Other languages
English (en)
Other versions
DE69112852D1 (de
Inventor
Katsumi Murofushi
Yoshikazu Hosoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of DE69112852D1 publication Critical patent/DE69112852D1/de
Application granted granted Critical
Publication of DE69112852T2 publication Critical patent/DE69112852T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE69112852T 1990-01-16 1991-01-15 Polymerisationsinitiator verwendbar in der Nähe von Infrarot. Expired - Lifetime DE69112852T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP696190 1990-01-16

Publications (2)

Publication Number Publication Date
DE69112852D1 DE69112852D1 (de) 1995-10-19
DE69112852T2 true DE69112852T2 (de) 1996-05-15

Family

ID=11652813

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69112852T Expired - Lifetime DE69112852T2 (de) 1990-01-16 1991-01-15 Polymerisationsinitiator verwendbar in der Nähe von Infrarot.

Country Status (4)

Country Link
EP (1) EP0438123B1 (de)
JP (1) JP3016606B2 (de)
KR (1) KR100192146B1 (de)
DE (1) DE69112852T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021006273A1 (de) 2021-12-21 2023-06-22 Lohmann Gmbh & Co. Kg Indikatormischung

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2283489B (en) * 1993-11-01 1997-10-29 Delta Resins Limited Curing of resins and resin systems
CA2134156A1 (en) * 1993-11-22 1995-05-23 Thomas P. Klun Coatable compositions, abrasive articles made therefrom, and methods of making and using same
ATE219717T1 (de) * 1995-09-20 2002-07-15 Uponor Wirsbo Ab Verfahren zum heizen und/oder vernetzen von polymeren und dazugehörende vorrichtung
JPH09137089A (ja) * 1995-11-17 1997-05-27 Kansai Paint Co Ltd 近赤外光硬化型パテ組成物
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US6316089B1 (en) 1997-12-05 2001-11-13 Showa Denko K.K. Photocurable prepreg sheet for waterproofing, method and apparatus for production of prepreg sheet, and waterproofing method using the sheet
ATE334162T1 (de) * 1997-12-05 2006-08-15 Showa Denko Kk Photohärtbare prepregmatte zum wasserdichten
WO1999044099A1 (en) * 1998-02-25 1999-09-02 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
CA2342872A1 (en) 1998-09-02 2000-03-16 Kaneka Corporation Polymer, processes for producing polymer, and composition
CN1272380C (zh) 1998-10-08 2006-08-30 钟渊化学工业株式会社 可固化的组合物
EP1002817B1 (de) 1998-11-17 2004-04-28 Showa Denko K.K. Photohärtbare Zusammensetzung
JP4585068B2 (ja) * 1998-11-30 2010-11-24 山本化成株式会社 ポリメチン化合物、その製造方法及び用途
DE69910333T2 (de) * 1998-11-30 2004-06-03 Yamamoto Chemicals, Inc., Yao Polymethin verbindungen, ihre verfahren zur herstellung und ihre verwendung
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6566035B1 (en) 1999-10-29 2003-05-20 Fuji Photo Film Co., Ltd. Negative-type image recording material and precursor for negative-type lithographic printing plate
JP4648695B2 (ja) * 2000-01-31 2011-03-09 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
US6864040B2 (en) * 2001-04-11 2005-03-08 Kodak Polychrome Graphics Llc Thermal initiator system using leuco dyes and polyhalogene compounds
JP4319363B2 (ja) * 2001-01-15 2009-08-26 富士フイルム株式会社 ネガ型画像記録材料
JP4132707B2 (ja) 2001-03-29 2008-08-13 富士フイルム株式会社 画像記録材料
US7056639B2 (en) 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
EP1653281B1 (de) 2003-06-18 2010-09-29 Kodak Graphic Communications Japan Ltd. Negativ-lichtempfindliche zusammensetzung und negativ-lichtempfindliche lithographische druckplatte
US7470015B2 (en) * 2004-06-30 2008-12-30 Fujifilm Corporation Inkjet-recording ink composition and image-forming process
JP4707981B2 (ja) 2004-08-06 2011-06-22 昭和電工株式会社 成形物の製造方法
US7189494B2 (en) 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
US20090234072A1 (en) 2005-09-08 2009-09-17 Kaneka Corporation Curable composition
US20090170975A1 (en) 2005-09-22 2009-07-02 Kaneka Corporation Photoradical- and photocation-curable composition
TWI406061B (zh) 2005-11-10 2013-08-21 Dainippon Ink & Chemicals 光配向膜用組成物、光學異向體及其製法
EP1961786B1 (de) 2005-12-13 2011-04-06 Kaneka Corporation Härtbare zusammensetzung für dämpfungsmaterial und dämpfungsmaterial
JP5283339B2 (ja) * 2006-03-09 2013-09-04 富士フイルム株式会社 画像形成材料、画像形成方法、平版印刷版原版及び平版印刷方法
US8048607B2 (en) 2006-03-09 2011-11-01 Fujifilm Corporation Compound having polymethine-chain structure, image forming material, planographic printing plate precursor, and image forming method using the same, method of making planographic printing plate, and planographic printing method
DE602007008273D1 (de) 2006-10-05 2010-09-16 Kaneka Corp Härtbare zusammensetzung
EP2116527A4 (de) 2007-01-23 2011-09-14 Fujifilm Corp Oximverbindung, photosensible zusammensetzung, farbfilter, verfahren zur herstellung des farbfilters und flüssigkristallanzeigeelement
US7429445B1 (en) 2007-03-07 2008-09-30 Eastman Kodak Company Negative-working imageable elements and methods of use
EP2144900B1 (de) 2007-05-11 2015-03-18 Basf Se Oximester-photoinitiatoren
CN102702073B (zh) 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
US20100286353A1 (en) 2007-09-19 2010-11-11 Fujifilm Corporation Acetylene compound, salt thereof, condensate thereof, and composition thereof
JP5552419B2 (ja) 2008-02-29 2014-07-16 株式会社カネカ 硬化性組成物
CN102361896B (zh) 2009-03-23 2015-10-07 巴斯夫欧洲公司 光致抗蚀剂组合物
EP2411359B1 (de) 2009-03-24 2017-02-01 Basf Se Neuartige oligofunktionelle fotoinitiatoren
WO2011012560A1 (en) 2009-07-30 2011-02-03 Basf Se Macrophotoinitiators
EP2467755B1 (de) 2009-08-21 2016-10-12 Basf Se Verfahren für eine submikroskopische und optisch variable bildträgervorrichtung
US8932398B2 (en) 2009-10-29 2015-01-13 Mylan Group Gallotannic compounds for lithographic printing plate coating compositions
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
WO2011122473A1 (ja) 2010-03-29 2011-10-06 三菱製紙株式会社 感光性組成物及び感光性平版印刷版材料
TWI520973B (zh) 2010-09-01 2016-02-11 Kaneka Corp 電氣、電子元件材料用組合物及其硬化物
EP2623531B1 (de) 2010-09-30 2016-11-16 Kaneka Corporation Zusammensetzung mit einem verzweigten polymer für ein schwingungsdämpfendes material
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP6038033B2 (ja) 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se ベンゾカルバゾール化合物のオキシムエステル誘導体ならびに前記誘導体の光重合性の組成物における光開始剤としての使用
US8900798B2 (en) * 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20130303649A1 (en) 2010-12-02 2013-11-14 Kaneka Corporation Active energy ray-curable composition for optical material, cured product, and production method
EP2668156B1 (de) 2011-01-28 2018-10-31 Basf Se Polymerisierbare zusammensetzung mit einem oximsulfonat als thermisches härtungsmittel
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
JP6088972B2 (ja) 2011-09-27 2017-03-01 株式会社カネカ (メタ)アクリロイル末端ポリイソブチレン系重合体、その製造方法、および活性エネルギー線硬化性組成物
JP6113181B2 (ja) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
EP2963015B1 (de) 2012-05-09 2018-07-11 Basf Se Oximester-photoinitiatoren
EP2909165B1 (de) 2012-10-19 2018-05-30 IGM Group B.V. Hybride photoinitiatoren
CN105051087A (zh) 2012-12-18 2015-11-11 巴斯夫欧洲公司 基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料
EP3459957A1 (de) 2012-12-19 2019-03-27 IGM Group B.V. Derivate von bisacylphosphinsäure, deren herstellung und verwendung als photoinitiatoren
CN111116777A (zh) 2013-07-08 2020-05-08 Igm集团公司 液态双酰基氧化膦光引发剂
KR20160030233A (ko) 2013-07-08 2016-03-16 바스프 에스이 옥심 에스테르 광개시제
KR102282647B1 (ko) 2013-09-10 2021-07-28 바스프 에스이 옥심 에스테르 광개시제
EP3149013B1 (de) 2014-05-30 2018-10-24 IGM Resins Italia S.r.l. Multifunktionelle acylphosphinoxid-fotoinitiatoren
EP3186226B1 (de) 2014-08-29 2020-06-17 Basf Se Oximsulfonatderivate
WO2016034963A1 (en) 2014-09-04 2016-03-10 Basf Se Polycyclic photoinitiators
JP6633814B2 (ja) 2016-09-02 2020-01-22 アイジーエム グループ ビー.ヴィ. 光開始剤としての多環式グリオキシレート
EP3630693A1 (de) 2017-06-02 2020-04-08 DSM IP Assets B.V. Wärmebeständige strahlungshärtbare beschichtungen für optische fasern
WO2018226720A1 (en) 2017-06-05 2018-12-13 The Regents Of The University Of California Heterocyclyl polymethine ir chromophores
JP7364239B2 (ja) 2017-11-03 2023-10-18 コベストロ (ネザーランズ) ビー.ブイ. 液体放射線硬化性sap組成物でコーティングされたファイバーを含む水遮断システム
US11952453B2 (en) 2018-06-01 2024-04-09 Covestro (Netherlands) B.V Radiation curable compositions for coating optical fiber and the coatings produced therefrom
JP2022506003A (ja) 2018-08-30 2022-01-17 コベストロ (ネザーランズ) ビー.ヴィー. 光ファイバーをコーティングするための放射線硬化性組成物
WO2020049378A1 (en) 2018-09-07 2020-03-12 Igm Resins Italia S.R.L. Multifunctional bisacylphosphine oxide photoinitiators
CN113165971A (zh) 2018-12-03 2021-07-23 Ms控股有限公司 用于涂布光纤的填充式可辐射固化组合物以及由其产生的涂层
EP3891224A4 (de) * 2018-12-05 2023-01-18 The Regents of the University of California Heterocyclylpolymethinir-ir-chromophore
CN113518805B (zh) 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
JP7338832B2 (ja) * 2019-05-09 2023-09-05 国立大学法人宇都宮大学 光硬化性組成物および光導波路用光硬化性組成物
WO2020239564A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
JP2022533793A (ja) 2019-05-24 2022-07-25 コベストロ (ネザーランズ) ビー.ヴィー. 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
JP2023502311A (ja) 2019-10-11 2023-01-24 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ Led光硬化用のクマリングリオキシレート
KR20220149716A (ko) 2020-03-04 2022-11-08 바스프 에스이 옥심 에스테르 광개시제
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023156485A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
EP4273200A1 (de) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiatorpaket mit speziellen bisacylphosphinoxid-photoinitiatoren und optischen aufheller-sensibilisatoren
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3650107T2 (de) * 1985-11-20 1995-05-24 Mead Corp Ionische Farbstoffe.
JPS63208036A (ja) * 1987-02-25 1988-08-29 Canon Inc 製版材料
JPS6413142A (en) * 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH01229003A (ja) * 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021006273A1 (de) 2021-12-21 2023-06-22 Lohmann Gmbh & Co. Kg Indikatormischung

Also Published As

Publication number Publication date
EP0438123A3 (en) 1991-11-21
DE69112852D1 (de) 1995-10-19
JPH05194619A (ja) 1993-08-03
KR910014402A (ko) 1991-08-31
EP0438123B1 (de) 1995-09-13
JP3016606B2 (ja) 2000-03-06
KR100192146B1 (ko) 1999-06-15
EP0438123A2 (de) 1991-07-24

Similar Documents

Publication Publication Date Title
DE69112852T2 (de) Polymerisationsinitiator verwendbar in der Nähe von Infrarot.
DE58908031D1 (de) Fotoinitiator-Dispersionen.
MX9205059A (es) Copolimeros de dispersion en solventes alifaticos.
DE69130607T2 (de) Modifizierung von polymeroberflächen
DE68909999D1 (de) Modifizierte Kautschuk-Dienpolymere.
DE69015420D1 (de) Infrarot-Backofen.
FI894095A (fi) Vaermare foer anvaendning i mikrovaogsugnar.
FI911969A0 (fi) Suspensionsmedium foer en vattenloeslig polymer.
NO901183L (no) Kolestyramintablett.
FI885981A (fi) En polymer fixeringsskivkonstruktion foer kirurgiskt bruk.
DE59106678D1 (de) Optisch nichtlineare Polymerschichten.
DE69013926D1 (de) Polymerwerkstoffe.
DE3866505D1 (de) Bei der photochemischen fluorierung erhaltene perfluoralkane und deren verwendung als polymerisierungsinitiatoren.
NO891757D0 (no) Akrylpolymere.
DE58906329D1 (de) Polymerisate.
DE59002720D1 (de) Thermoplastische Polyestercarbonat-Polysiloxan-Blockcopolymere.
FI890427A0 (fi) Bruk av en elledande polymerkomposit.
DE59007872D1 (de) Parallel- und winkelanschlag.
IT8919849A0 (it) Polimeri.
DE58904475D1 (de) Kassenarbeitsplatz mit fahrbarer packmulde.
DE58907405D1 (de) Pfropfpolymerisate.
DE69011487T2 (de) Polymerisationsinitiator vom Polymertyp.
DE69110724D1 (de) Polymerisationsverfahren.
DE59106537D1 (de) Mischpolymere.
FI894874A0 (fi) Foerfarande foer kontrollering av katalytisk polymerisation av polysilazankompositioner.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition