GB2283489B
(en)
*
|
1993-11-01 |
1997-10-29 |
Delta Resins Limited |
Curing of resins and resin systems
|
CA2134156A1
(en)
*
|
1993-11-22 |
1995-05-23 |
Thomas P. Klun |
Coatable compositions, abrasive articles made therefrom, and methods of making and using same
|
ATE219717T1
(de)
*
|
1995-09-20 |
2002-07-15 |
Uponor Wirsbo Ab |
Verfahren zum heizen und/oder vernetzen von polymeren und dazugehörende vorrichtung
|
JPH09137089A
(ja)
*
|
1995-11-17 |
1997-05-27 |
Kansai Paint Co Ltd |
近赤外光硬化型パテ組成物
|
TW466256B
(en)
|
1995-11-24 |
2001-12-01 |
Ciba Sc Holding Ag |
Borate photoinitiator compounds and compositions comprising the same
|
US6316089B1
(en)
|
1997-12-05 |
2001-11-13 |
Showa Denko K.K. |
Photocurable prepreg sheet for waterproofing, method and apparatus for production of prepreg sheet, and waterproofing method using the sheet
|
ATE334162T1
(de)
*
|
1997-12-05 |
2006-08-15 |
Showa Denko Kk |
Photohärtbare prepregmatte zum wasserdichten
|
WO1999044099A1
(en)
*
|
1998-02-25 |
1999-09-02 |
Cycolor, Inc. |
Imaging system employing encapsulated radiation sensitive composition
|
CA2342872A1
(en)
|
1998-09-02 |
2000-03-16 |
Kaneka Corporation |
Polymer, processes for producing polymer, and composition
|
CN1272380C
(zh)
|
1998-10-08 |
2006-08-30 |
钟渊化学工业株式会社 |
可固化的组合物
|
EP1002817B1
(de)
|
1998-11-17 |
2004-04-28 |
Showa Denko K.K. |
Photohärtbare Zusammensetzung
|
JP4585068B2
(ja)
*
|
1998-11-30 |
2010-11-24 |
山本化成株式会社 |
ポリメチン化合物、その製造方法及び用途
|
DE69910333T2
(de)
*
|
1998-11-30 |
2004-06-03 |
Yamamoto Chemicals, Inc., Yao |
Polymethin verbindungen, ihre verfahren zur herstellung und ihre verwendung
|
US6174642B1
(en)
|
1999-02-25 |
2001-01-16 |
Cycolor, Inc. |
Imaging system employing encapsulated radiation sensitive composition
|
US6566035B1
(en)
|
1999-10-29 |
2003-05-20 |
Fuji Photo Film Co., Ltd. |
Negative-type image recording material and precursor for negative-type lithographic printing plate
|
JP4648695B2
(ja)
*
|
2000-01-31 |
2011-03-09 |
三菱製紙株式会社 |
感光性組成物および感光性平版印刷版材料
|
US6864040B2
(en)
*
|
2001-04-11 |
2005-03-08 |
Kodak Polychrome Graphics Llc |
Thermal initiator system using leuco dyes and polyhalogene compounds
|
JP4319363B2
(ja)
*
|
2001-01-15 |
2009-08-26 |
富士フイルム株式会社 |
ネガ型画像記録材料
|
JP4132707B2
(ja)
|
2001-03-29 |
2008-08-13 |
富士フイルム株式会社 |
画像記録材料
|
US7056639B2
(en)
|
2001-08-21 |
2006-06-06 |
Eastman Kodak Company |
Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
|
EP1653281B1
(de)
|
2003-06-18 |
2010-09-29 |
Kodak Graphic Communications Japan Ltd. |
Negativ-lichtempfindliche zusammensetzung und negativ-lichtempfindliche lithographische druckplatte
|
US7470015B2
(en)
*
|
2004-06-30 |
2008-12-30 |
Fujifilm Corporation |
Inkjet-recording ink composition and image-forming process
|
JP4707981B2
(ja)
|
2004-08-06 |
2011-06-22 |
昭和電工株式会社 |
成形物の製造方法
|
US7189494B2
(en)
|
2005-05-26 |
2007-03-13 |
Eastman Kodak Company |
On-press developable imageable element comprising a tetraarylborate salt
|
US20090234072A1
(en)
|
2005-09-08 |
2009-09-17 |
Kaneka Corporation |
Curable composition
|
US20090170975A1
(en)
|
2005-09-22 |
2009-07-02 |
Kaneka Corporation |
Photoradical- and photocation-curable composition
|
TWI406061B
(zh)
|
2005-11-10 |
2013-08-21 |
Dainippon Ink & Chemicals |
光配向膜用組成物、光學異向體及其製法
|
EP1961786B1
(de)
|
2005-12-13 |
2011-04-06 |
Kaneka Corporation |
Härtbare zusammensetzung für dämpfungsmaterial und dämpfungsmaterial
|
JP5283339B2
(ja)
*
|
2006-03-09 |
2013-09-04 |
富士フイルム株式会社 |
画像形成材料、画像形成方法、平版印刷版原版及び平版印刷方法
|
US8048607B2
(en)
|
2006-03-09 |
2011-11-01 |
Fujifilm Corporation |
Compound having polymethine-chain structure, image forming material, planographic printing plate precursor, and image forming method using the same, method of making planographic printing plate, and planographic printing method
|
DE602007008273D1
(de)
|
2006-10-05 |
2010-09-16 |
Kaneka Corp |
Härtbare zusammensetzung
|
EP2116527A4
(de)
|
2007-01-23 |
2011-09-14 |
Fujifilm Corp |
Oximverbindung, photosensible zusammensetzung, farbfilter, verfahren zur herstellung des farbfilters und flüssigkristallanzeigeelement
|
US7429445B1
(en)
|
2007-03-07 |
2008-09-30 |
Eastman Kodak Company |
Negative-working imageable elements and methods of use
|
EP2144900B1
(de)
|
2007-05-11 |
2015-03-18 |
Basf Se |
Oximester-photoinitiatoren
|
CN102702073B
(zh)
|
2007-05-11 |
2015-06-10 |
巴斯夫欧洲公司 |
肟酯光引发剂
|
US20100286353A1
(en)
|
2007-09-19 |
2010-11-11 |
Fujifilm Corporation |
Acetylene compound, salt thereof, condensate thereof, and composition thereof
|
JP5552419B2
(ja)
|
2008-02-29 |
2014-07-16 |
株式会社カネカ |
硬化性組成物
|
CN102361896B
(zh)
|
2009-03-23 |
2015-10-07 |
巴斯夫欧洲公司 |
光致抗蚀剂组合物
|
EP2411359B1
(de)
|
2009-03-24 |
2017-02-01 |
Basf Se |
Neuartige oligofunktionelle fotoinitiatoren
|
WO2011012560A1
(en)
|
2009-07-30 |
2011-02-03 |
Basf Se |
Macrophotoinitiators
|
EP2467755B1
(de)
|
2009-08-21 |
2016-10-12 |
Basf Se |
Verfahren für eine submikroskopische und optisch variable bildträgervorrichtung
|
US8932398B2
(en)
|
2009-10-29 |
2015-01-13 |
Mylan Group |
Gallotannic compounds for lithographic printing plate coating compositions
|
US20110236832A1
(en)
|
2010-03-26 |
2011-09-29 |
Celin Savariar-Hauck |
Lithographic processing solutions and methods of use
|
WO2011122473A1
(ja)
|
2010-03-29 |
2011-10-06 |
三菱製紙株式会社 |
感光性組成物及び感光性平版印刷版材料
|
TWI520973B
(zh)
|
2010-09-01 |
2016-02-11 |
Kaneka Corp |
電氣、電子元件材料用組合物及其硬化物
|
EP2623531B1
(de)
|
2010-09-30 |
2016-11-16 |
Kaneka Corporation |
Zusammensetzung mit einem verzweigten polymer für ein schwingungsdämpfendes material
|
US9051397B2
(en)
|
2010-10-05 |
2015-06-09 |
Basf Se |
Oxime ester
|
JP6038033B2
(ja)
|
2010-10-05 |
2016-12-07 |
ビーエーエスエフ ソシエタス・ヨーロピアBasf Se |
ベンゾカルバゾール化合物のオキシムエステル誘導体ならびに前記誘導体の光重合性の組成物における光開始剤としての使用
|
US8900798B2
(en)
*
|
2010-10-18 |
2014-12-02 |
Eastman Kodak Company |
On-press developable lithographic printing plate precursors
|
US20130303649A1
(en)
|
2010-12-02 |
2013-11-14 |
Kaneka Corporation |
Active energy ray-curable composition for optical material, cured product, and production method
|
EP2668156B1
(de)
|
2011-01-28 |
2018-10-31 |
Basf Se |
Polymerisierbare zusammensetzung mit einem oximsulfonat als thermisches härtungsmittel
|
US8632940B2
(en)
|
2011-04-19 |
2014-01-21 |
Eastman Kodak Company |
Aluminum substrates and lithographic printing plate precursors
|
JP6088972B2
(ja)
|
2011-09-27 |
2017-03-01 |
株式会社カネカ |
(メタ)アクリロイル末端ポリイソブチレン系重合体、その製造方法、および活性エネルギー線硬化性組成物
|
JP6113181B2
(ja)
|
2011-12-07 |
2017-04-12 |
ビーエーエスエフ ソシエタス・ヨーロピアBasf Se |
オキシムエステル光開始剤
|
EP2963015B1
(de)
|
2012-05-09 |
2018-07-11 |
Basf Se |
Oximester-photoinitiatoren
|
EP2909165B1
(de)
|
2012-10-19 |
2018-05-30 |
IGM Group B.V. |
Hybride photoinitiatoren
|
CN105051087A
(zh)
|
2012-12-18 |
2015-11-11 |
巴斯夫欧洲公司 |
基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料
|
EP3459957A1
(de)
|
2012-12-19 |
2019-03-27 |
IGM Group B.V. |
Derivate von bisacylphosphinsäure, deren herstellung und verwendung als photoinitiatoren
|
CN111116777A
(zh)
|
2013-07-08 |
2020-05-08 |
Igm集团公司 |
液态双酰基氧化膦光引发剂
|
KR20160030233A
(ko)
|
2013-07-08 |
2016-03-16 |
바스프 에스이 |
옥심 에스테르 광개시제
|
KR102282647B1
(ko)
|
2013-09-10 |
2021-07-28 |
바스프 에스이 |
옥심 에스테르 광개시제
|
EP3149013B1
(de)
|
2014-05-30 |
2018-10-24 |
IGM Resins Italia S.r.l. |
Multifunktionelle acylphosphinoxid-fotoinitiatoren
|
EP3186226B1
(de)
|
2014-08-29 |
2020-06-17 |
Basf Se |
Oximsulfonatderivate
|
WO2016034963A1
(en)
|
2014-09-04 |
2016-03-10 |
Basf Se |
Polycyclic photoinitiators
|
JP6633814B2
(ja)
|
2016-09-02 |
2020-01-22 |
アイジーエム グループ ビー.ヴィ. |
光開始剤としての多環式グリオキシレート
|
EP3630693A1
(de)
|
2017-06-02 |
2020-04-08 |
DSM IP Assets B.V. |
Wärmebeständige strahlungshärtbare beschichtungen für optische fasern
|
WO2018226720A1
(en)
|
2017-06-05 |
2018-12-13 |
The Regents Of The University Of California |
Heterocyclyl polymethine ir chromophores
|
JP7364239B2
(ja)
|
2017-11-03 |
2023-10-18 |
コベストロ (ネザーランズ) ビー.ブイ. |
液体放射線硬化性sap組成物でコーティングされたファイバーを含む水遮断システム
|
US11952453B2
(en)
|
2018-06-01 |
2024-04-09 |
Covestro (Netherlands) B.V |
Radiation curable compositions for coating optical fiber and the coatings produced therefrom
|
JP2022506003A
(ja)
|
2018-08-30 |
2022-01-17 |
コベストロ (ネザーランズ) ビー.ヴィー. |
光ファイバーをコーティングするための放射線硬化性組成物
|
WO2020049378A1
(en)
|
2018-09-07 |
2020-03-12 |
Igm Resins Italia S.R.L. |
Multifunctional bisacylphosphine oxide photoinitiators
|
CN113165971A
(zh)
|
2018-12-03 |
2021-07-23 |
Ms控股有限公司 |
用于涂布光纤的填充式可辐射固化组合物以及由其产生的涂层
|
EP3891224A4
(de)
*
|
2018-12-05 |
2023-01-18 |
The Regents of the University of California |
Heterocyclylpolymethinir-ir-chromophore
|
CN113518805B
(zh)
|
2018-12-28 |
2023-08-08 |
意大利艾坚蒙树脂有限公司 |
光引发剂
|
US20220121113A1
(en)
|
2019-01-23 |
2022-04-21 |
Basf Se |
Oxime ester photoinitiators having a special aroyl chromophore
|
JP7338832B2
(ja)
*
|
2019-05-09 |
2023-09-05 |
国立大学法人宇都宮大学 |
光硬化性組成物および光導波路用光硬化性組成物
|
WO2020239564A1
(en)
|
2019-05-24 |
2020-12-03 |
Dsm Ip Assets B.V. |
Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
|
JP2022533793A
(ja)
|
2019-05-24 |
2022-07-25 |
コベストロ (ネザーランズ) ビー.ヴィー. |
強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
|
JP2023502311A
(ja)
|
2019-10-11 |
2023-01-24 |
アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ |
Led光硬化用のクマリングリオキシレート
|
KR20220149716A
(ko)
|
2020-03-04 |
2022-11-08 |
바스프 에스이 |
옥심 에스테르 광개시제
|
IT202000023815A1
(it)
|
2020-10-09 |
2022-04-09 |
Igm Resins Italia Srl |
Ketoquinolones as photonitiators
|
IT202100014885A1
(it)
|
2021-06-08 |
2022-12-08 |
Igm Resins Italia Srl |
Fotoiniziatori a base di silicio bifunzionali
|
IT202100025868A1
(it)
|
2021-10-08 |
2023-04-08 |
Igm Resins Italia Srl |
Nuovi fotoiniziatori
|
WO2023156485A1
(de)
|
2022-02-21 |
2023-08-24 |
Covestro Deutschland Ag |
Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
|
WO2023161049A1
(en)
|
2022-02-24 |
2023-08-31 |
Igm Resins Italia S.R.L. |
Photoinitiators
|
EP4273200A1
(de)
|
2022-05-06 |
2023-11-08 |
IGM Group B.V. |
Photoinitiatorpaket mit speziellen bisacylphosphinoxid-photoinitiatoren und optischen aufheller-sensibilisatoren
|
WO2024074945A1
(en)
|
2022-10-05 |
2024-04-11 |
Igm Resins Italia S.R.L. |
Polymeric (meth)acrylate photoinitiators
|