JPS6490516A - Semiconductor porcelain material - Google Patents

Semiconductor porcelain material

Info

Publication number
JPS6490516A
JPS6490516A JP24891487A JP24891487A JPS6490516A JP S6490516 A JPS6490516 A JP S6490516A JP 24891487 A JP24891487 A JP 24891487A JP 24891487 A JP24891487 A JP 24891487A JP S6490516 A JPS6490516 A JP S6490516A
Authority
JP
Japan
Prior art keywords
crystal particle
semiconductor porcelain
particle field
material layer
dielectric material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24891487A
Other languages
Japanese (ja)
Other versions
JPH0524646B2 (en
Inventor
Osamu Kanda
Tsutomu Sakashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP24891487A priority Critical patent/JPS6490516A/en
Publication of JPS6490516A publication Critical patent/JPS6490516A/en
Publication of JPH0524646B2 publication Critical patent/JPH0524646B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To improve permittivity and insulation resistivity, by dispersing a composition composed of bismuth oxide, copper oxide and boric acid into crystal particle field of a semiconductor porcelain and forming a dielectric material layer in the crystal particle field. CONSTITUTION:A composition composed of bismuth oxide (10-80mol%), copper oxide (10-50mol%) and boric acid (10-70mol%) is dispersed into crystal particle field of a semiconductor porcelain. Consequently, a dielectric material layer is formed in the crystal particle field, thus improving permittivity and insulation resistivity.
JP24891487A 1987-09-30 1987-09-30 Semiconductor porcelain material Granted JPS6490516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24891487A JPS6490516A (en) 1987-09-30 1987-09-30 Semiconductor porcelain material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24891487A JPS6490516A (en) 1987-09-30 1987-09-30 Semiconductor porcelain material

Publications (2)

Publication Number Publication Date
JPS6490516A true JPS6490516A (en) 1989-04-07
JPH0524646B2 JPH0524646B2 (en) 1993-04-08

Family

ID=17185300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24891487A Granted JPS6490516A (en) 1987-09-30 1987-09-30 Semiconductor porcelain material

Country Status (1)

Country Link
JP (1) JPS6490516A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7304008B2 (en) * 2001-05-15 2007-12-04 Eurokera Thermochromic material
WO2008090640A1 (en) 2007-01-23 2008-07-31 Fujifilm Corporation Oxime compound, photosensitive composition, color filter, method for production of the color filter, and liquid crystal display element
WO2008138724A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2010108835A1 (en) 2009-03-23 2010-09-30 Basf Se Photoresist composition
WO2012045736A1 (en) 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
WO2012101245A1 (en) 2011-01-28 2012-08-02 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
WO2020152120A1 (en) 2019-01-23 2020-07-30 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7304008B2 (en) * 2001-05-15 2007-12-04 Eurokera Thermochromic material
WO2008090640A1 (en) 2007-01-23 2008-07-31 Fujifilm Corporation Oxime compound, photosensitive composition, color filter, method for production of the color filter, and liquid crystal display element
WO2008138724A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
WO2010108835A1 (en) 2009-03-23 2010-09-30 Basf Se Photoresist composition
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2012045736A1 (en) 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
WO2012101245A1 (en) 2011-01-28 2012-08-02 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
EP3354641A1 (en) 2012-05-09 2018-08-01 Basf Se Oxime ester photoinitiators
US9864273B2 (en) 2012-05-09 2018-01-09 Basf Se Oxime ester photoinitiators
EP2963015A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
EP2963016A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
EP2963014A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
US11209733B2 (en) 2012-05-09 2021-12-28 Basf Se Oxime ester photoinitiators
US11209734B2 (en) 2012-05-09 2021-12-28 Basf Se Oxime ester photoinitiators
US11204554B2 (en) 2012-05-09 2021-12-21 Basf Se Oxime ester photoinitiators
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
US10488756B2 (en) 2012-05-09 2019-11-26 Basf Se Oxime ester photoinitiators
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
WO2020152120A1 (en) 2019-01-23 2020-07-30 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators

Also Published As

Publication number Publication date
JPH0524646B2 (en) 1993-04-08

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