TW200745183A - High-molecular compound and production method thereof, pigment dispersant, pigment dispersed composition, light-curable composition, and color filter and production method thereof - Google Patents
High-molecular compound and production method thereof, pigment dispersant, pigment dispersed composition, light-curable composition, and color filter and production method thereofInfo
- Publication number
- TW200745183A TW200745183A TW096109027A TW96109027A TW200745183A TW 200745183 A TW200745183 A TW 200745183A TW 096109027 A TW096109027 A TW 096109027A TW 96109027 A TW96109027 A TW 96109027A TW 200745183 A TW200745183 A TW 200745183A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- production method
- pigment
- color filter
- light
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/04—Acids, Metal salts or ammonium salts thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/52—Amides or imides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0084—Dispersions of dyes
- C09B67/0085—Non common dispersing agents
- C09B67/009—Non common dispersing agents polymeric dispersing agent
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/101—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an anthracene dye
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
- G03C1/735—Organo-metallic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006075558 | 2006-03-17 | ||
JP2006075434 | 2006-03-17 | ||
JP2006269707A JP5171005B2 (ja) | 2006-03-17 | 2006-09-29 | 高分子化合物およびその製造方法、並びに顔料分散剤 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200745183A true TW200745183A (en) | 2007-12-16 |
Family
ID=38522399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109027A TW200745183A (en) | 2006-03-17 | 2007-03-16 | High-molecular compound and production method thereof, pigment dispersant, pigment dispersed composition, light-curable composition, and color filter and production method thereof |
Country Status (7)
Country | Link |
---|---|
US (2) | US8808947B2 (zh) |
EP (1) | EP2006310A2 (zh) |
JP (1) | JP5171005B2 (zh) |
KR (2) | KR101473812B1 (zh) |
CN (1) | CN101405310B (zh) |
TW (1) | TW200745183A (zh) |
WO (1) | WO2007108367A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI617624B (zh) * | 2014-03-31 | 2018-03-11 | 富士軟片股份有限公司 | 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、圖像顯示裝置、有機電激發光元件、色素及色素的製造方法 |
TWI637236B (zh) * | 2012-10-26 | 2018-10-01 | 富士軟片股份有限公司 | 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、有機el顯示裝置、液晶顯示裝置、以及觸控面板顯示裝置 |
TWI760311B (zh) * | 2015-08-31 | 2022-04-11 | 日商富士軟片股份有限公司 | 著色感光性組成物、硬化膜、彩色濾光片、遮光膜、固體攝影元件、圖像顯示裝置以及硬化膜的製造方法 |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008007772A (ja) * | 2006-06-02 | 2008-01-17 | Fujifilm Corp | 顔料分散組成物、それを用いた着色感光性樹脂組成物、インクジェットインク、および感光性樹脂転写材料、それらを用いたカラーフィルタ、液晶表示装置、およびccdデバイス |
US20080233307A1 (en) * | 2007-02-09 | 2008-09-25 | Chisso Corporation | Photocurable inkjet ink |
JP5243072B2 (ja) * | 2007-03-30 | 2013-07-24 | 富士フイルム株式会社 | インク組成物、並びに、それを用いた画像記録方法及び画像記録物 |
KR101037782B1 (ko) * | 2007-04-05 | 2011-05-27 | 주식회사 엘지화학 | 컬러필터의 제조방법 및 이에 의해 제조된 컬러필터 |
JP5213375B2 (ja) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子 |
JP2009079148A (ja) * | 2007-09-26 | 2009-04-16 | Fujifilm Corp | 加工顔料、顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子 |
JP5244354B2 (ja) * | 2007-09-14 | 2013-07-24 | 富士フイルム株式会社 | インクジェット用インク組成物、並びに、それを用いたインクジェット記録方法及び印刷物 |
JP4959495B2 (ja) * | 2007-09-27 | 2012-06-20 | 富士フイルム株式会社 | 着色硬化性組成物、それを用いた着色パターン、及び、カラーフィルタ |
JP5334403B2 (ja) * | 2007-10-31 | 2013-11-06 | 富士フイルム株式会社 | 処理顔料、顔料分散組成物、着色感光性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
US20090214797A1 (en) * | 2008-02-25 | 2009-08-27 | Fujifilm Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
US8362140B2 (en) | 2008-03-17 | 2013-01-29 | Fujifilm Corporation | Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display device, and solid-state image pickup device |
JP2009256572A (ja) * | 2008-03-17 | 2009-11-05 | Fujifilm Corp | 顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子 |
JP5241283B2 (ja) * | 2008-03-24 | 2013-07-17 | 富士フイルム株式会社 | 顔料分散組成物、光硬化性組成物、カラーフィルタ、液晶表示装置、および固体撮像素子 |
JP5189393B2 (ja) * | 2008-03-31 | 2013-04-24 | 富士フイルム株式会社 | 活性放射線硬化型インクジェット記録用インク組成物、インクジェット記録方法及び印刷物 |
JP2010077402A (ja) * | 2008-08-29 | 2010-04-08 | Fujifilm Corp | 顔料分散組成物、光硬化性組成物、カラーフィルタ、及び液晶表示装置 |
JP5393090B2 (ja) * | 2008-09-26 | 2014-01-22 | 富士フイルム株式会社 | 顔料分散物、及びそれを用いたインク組成物 |
SG172999A1 (en) * | 2009-01-16 | 2011-08-29 | Fujifilm Electronic Materials | Nonpolymeric binders for semiconductor substrate coatings |
TWI495957B (zh) | 2009-08-28 | 2015-08-11 | Fujifilm Corp | 感光化射線或感放射線樹脂組成物及使用該組成物之圖案形成方法 |
US8778235B2 (en) | 2009-09-29 | 2014-07-15 | Fujifilm Corporation | Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter |
JP2012003225A (ja) | 2010-01-27 | 2012-01-05 | Fujifilm Corp | ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法 |
US8642709B2 (en) | 2010-03-23 | 2014-02-04 | Henkel Ag & Co. Kgaa | Epoxy resin composition with reduced toxicity |
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2006
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-
2007
- 2007-03-13 US US12/293,226 patent/US8808947B2/en active Active
- 2007-03-13 CN CN2007800094346A patent/CN101405310B/zh active Active
- 2007-03-13 EP EP07738420A patent/EP2006310A2/en not_active Withdrawn
- 2007-03-13 WO PCT/JP2007/054948 patent/WO2007108367A1/ja active Application Filing
- 2007-03-13 KR KR1020137033876A patent/KR101473812B1/ko active IP Right Grant
- 2007-03-13 KR KR1020087025198A patent/KR101395070B1/ko active IP Right Grant
- 2007-03-16 TW TW096109027A patent/TW200745183A/zh unknown
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2014
- 2014-02-28 US US14/193,881 patent/US8921018B2/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI637236B (zh) * | 2012-10-26 | 2018-10-01 | 富士軟片股份有限公司 | 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、有機el顯示裝置、液晶顯示裝置、以及觸控面板顯示裝置 |
TWI617624B (zh) * | 2014-03-31 | 2018-03-11 | 富士軟片股份有限公司 | 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、圖像顯示裝置、有機電激發光元件、色素及色素的製造方法 |
TWI760311B (zh) * | 2015-08-31 | 2022-04-11 | 日商富士軟片股份有限公司 | 著色感光性組成物、硬化膜、彩色濾光片、遮光膜、固體攝影元件、圖像顯示裝置以及硬化膜的製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20140175348A1 (en) | 2014-06-26 |
KR101473812B1 (ko) | 2014-12-17 |
KR101395070B1 (ko) | 2014-05-16 |
KR20090007705A (ko) | 2009-01-20 |
WO2007108367A1 (ja) | 2007-09-27 |
KR20140007966A (ko) | 2014-01-20 |
JP2007277514A (ja) | 2007-10-25 |
US20100233595A1 (en) | 2010-09-16 |
US8808947B2 (en) | 2014-08-19 |
CN101405310B (zh) | 2011-04-20 |
EP2006310A9 (en) | 2009-07-22 |
CN101405310A (zh) | 2009-04-08 |
US8921018B2 (en) | 2014-12-30 |
JP5171005B2 (ja) | 2013-03-27 |
EP2006310A2 (en) | 2008-12-24 |
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