SG11201504889VA - Fluoropolymer composition including an oligomer having an ultraviolet absorbing group - Google Patents

Fluoropolymer composition including an oligomer having an ultraviolet absorbing group

Info

Publication number
SG11201504889VA
SG11201504889VA SG11201504889VA SG11201504889VA SG11201504889VA SG 11201504889V A SG11201504889V A SG 11201504889VA SG 11201504889V A SG11201504889V A SG 11201504889VA SG 11201504889V A SG11201504889V A SG 11201504889VA SG 11201504889V A SG11201504889V A SG 11201504889VA
Authority
SG
Singapore
Prior art keywords
oligomer
composition including
ultraviolet absorbing
fluoropolymer composition
absorbing group
Prior art date
Application number
SG11201504889VA
Other languages
English (en)
Inventor
David B Olson
Patricia M Savu
Timothy J Hebrink
Diane North
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of SG11201504889VA publication Critical patent/SG11201504889VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07—Flat, e.g. panels
    • B29C48/08—Flat, e.g. panels flexible, e.g. films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2027/00—Use of polyvinylhalogenides or derivatives thereof as moulding material
    • B29K2027/12—Use of polyvinylhalogenides or derivatives thereof as moulding material containing fluorine
    • B29K2027/16—PVDF, i.e. polyvinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2327/16—Homopolymers or copolymers of vinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10—Homopolymers or copolymers of methacrylic acid esters
    • C08J2433/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08J2433/16—Homopolymers or copolymers of esters containing halogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photovoltaic Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
SG11201504889VA 2012-12-20 2013-12-20 Fluoropolymer composition including an oligomer having an ultraviolet absorbing group SG11201504889VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261740135P 2012-12-20 2012-12-20
PCT/US2013/076914 WO2014100580A1 (en) 2012-12-20 2013-12-20 Fluoropolymer composition including an oligomer having an ultraviolet absorbing group

Publications (1)

Publication Number Publication Date
SG11201504889VA true SG11201504889VA (en) 2015-07-30

Family

ID=49943581

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201504889VA SG11201504889VA (en) 2012-12-20 2013-12-20 Fluoropolymer composition including an oligomer having an ultraviolet absorbing group

Country Status (8)

Country Link
US (1) US10577467B2 (enrdf_load_stackoverflow)
EP (1) EP2935472B1 (enrdf_load_stackoverflow)
JP (2) JP6632378B2 (enrdf_load_stackoverflow)
KR (1) KR102194159B1 (enrdf_load_stackoverflow)
CN (1) CN105073909B (enrdf_load_stackoverflow)
SG (1) SG11201504889VA (enrdf_load_stackoverflow)
TW (1) TWI624519B (enrdf_load_stackoverflow)
WO (1) WO2014100580A1 (enrdf_load_stackoverflow)

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CN104884486A (zh) * 2012-12-20 2015-09-02 3M创新有限公司 包含紫外线吸收基团的共聚物以及包含其的含氟聚合物组合物
SG11201610789SA (en) * 2014-06-25 2017-01-27 3M Innovative Properties Co Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
EP3161078B1 (en) 2014-06-25 2020-05-27 3M Innovative Properties Company Extruded film comprising a fluoropolymer composition including at least one oligomer
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
KR101947421B1 (ko) * 2014-10-20 2019-02-14 (주)엘지하우시스 표면코팅용 수성 조성물 및 이를 적용한 자동차용 시트
KR20180021094A (ko) * 2015-06-25 2018-02-28 쓰리엠 이노베이티브 프로퍼티즈 캄파니 자외광-흡수 기를 포함하는 공중합체 및 그것을 포함하는 조성물
JP6949048B2 (ja) 2016-04-01 2021-10-13 スリーエム イノベイティブ プロパティズ カンパニー 多層フルオロポリマーフィルム
TWI656199B (zh) * 2016-06-29 2019-04-11 臺灣永光化學工業股份有限公司 聚氨酯型高分子紫外線吸收劑
EP3290451B1 (fr) 2016-09-01 2021-08-18 The Swatch Group Research and Development Ltd. Substrat comprenant une surface recouverte d'un agent épilame et procédé d'épilamage d'un tel substrat
EP3551440B1 (en) 2016-12-09 2023-08-23 3M Innovative Properties Company Polymeric multilayer film
EP3551449B1 (en) 2016-12-09 2021-05-26 3M Innovative Properties Company Article comprising multilayer film
CN110049871B (zh) 2016-12-09 2021-05-14 3M创新有限公司 聚合物多层膜
WO2018106561A1 (en) 2016-12-09 2018-06-14 3M Innovative Properties Company Polymeric multilayer film
WO2018106557A1 (en) 2016-12-09 2018-06-14 3M Innovative Properties Company Polymeric multilayer film
CN108531063B (zh) * 2018-04-12 2020-07-28 太仓中化环保化工有限公司 一种阴极电泳涂料及其制备方法和应用
CN114341291A (zh) 2019-09-09 2022-04-12 3M创新有限公司 共挤出聚合物粘合剂制品
CN114058142B (zh) * 2020-08-04 2023-05-12 浙江省化工研究院有限公司 一种透明含氟聚合物薄膜
CN115776992B (zh) 2020-08-21 2024-10-22 富士胶片株式会社 聚合性组合物、聚合物、紫外线遮蔽材料、层叠体、化合物、紫外线吸收剂及化合物的制造方法
JPWO2022113926A1 (enrdf_load_stackoverflow) * 2020-11-25 2022-06-02

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