SG11201504914SA - Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them - Google Patents
Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including themInfo
- Publication number
- SG11201504914SA SG11201504914SA SG11201504914SA SG11201504914SA SG11201504914SA SG 11201504914S A SG11201504914S A SG 11201504914SA SG 11201504914S A SG11201504914S A SG 11201504914SA SG 11201504914S A SG11201504914S A SG 11201504914SA SG 11201504914S A SG11201504914S A SG 11201504914SA
- Authority
- SG
- Singapore
- Prior art keywords
- ultraviolet absorbing
- fluoropolymer compositions
- absorbing groups
- copolymers
- compositions including
- Prior art date
Links
- 229920001577 copolymer Polymers 0.000 title 1
- 229920002313 fluoropolymer Polymers 0.000 title 1
- 239000004811 fluoropolymer Substances 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2327/16—Homopolymers or copolymers of vinylidene fluoride
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
- C08J2333/16—Homopolymers or copolymers of esters containing halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2427/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2427/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2427/16—Homopolymers or copolymers of vinylidene fluoride
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2433/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2433/12—Homopolymers or copolymers of methyl methacrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261740125P | 2012-12-20 | 2012-12-20 | |
PCT/US2013/076840 WO2014100551A1 (en) | 2012-12-20 | 2013-12-20 | Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201504914SA true SG11201504914SA (en) | 2015-07-30 |
Family
ID=50979239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201504914SA SG11201504914SA (en) | 2012-12-20 | 2013-12-20 | Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them |
Country Status (8)
Country | Link |
---|---|
US (1) | US9670300B2 (en) |
EP (1) | EP2935373A4 (en) |
JP (1) | JP6074059B2 (en) |
KR (1) | KR20150096730A (en) |
CN (1) | CN104884486A (en) |
SG (1) | SG11201504914SA (en) |
TW (1) | TW201433580A (en) |
WO (1) | WO2014100551A1 (en) |
Families Citing this family (29)
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KR102194159B1 (en) | 2012-12-20 | 2020-12-22 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | Fluoropolymer composition including an oligomer having an ultraviolet absorbing group |
CN105229090A (en) * | 2013-05-31 | 2016-01-06 | 3M创新有限公司 | LBL self assembly comprises method and the goods of the polymer electrolyte of photoabsorption or Photostabilised compound |
US11110689B2 (en) | 2014-06-25 | 2021-09-07 | 3M Innovative Properties Company | Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer |
CN106661365B (en) | 2014-06-25 | 2019-03-01 | 3M创新有限公司 | Fluoro-containing copolymer composition comprising at least one oligomer |
CN106661400B (en) * | 2014-06-25 | 2018-11-13 | 3M创新有限公司 | Include the pressure-sensitive adhesive composition of UV Absorption oligomer |
US10519350B2 (en) * | 2015-06-25 | 2019-12-31 | 3M Innovative Properties Company | Copolymer including ultraviolet light-absorbing group and compositions including the same |
EP3345955B1 (en) * | 2015-08-31 | 2022-04-06 | Daikin Industries, Ltd. | Perfluoro(poly)ether group-containing silane compound |
CN108883617B (en) | 2016-04-01 | 2020-09-15 | 3M创新有限公司 | Multilayer fluoropolymer films |
JP6407918B2 (en) * | 2016-05-30 | 2018-10-17 | 住友化学株式会社 | Resin laminate, display device and polarizing plate |
TWI656199B (en) * | 2016-06-29 | 2019-04-11 | 臺灣永光化學工業股份有限公司 | Polyurethane-based uv absorber |
WO2018106558A1 (en) | 2016-12-09 | 2018-06-14 | 3M Innovative Properties Company | Polymeric multilayer film |
EP3551455A1 (en) | 2016-12-09 | 2019-10-16 | 3M Innovative Properties Company | Polymeric multilayer film |
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WO2018106560A1 (en) | 2016-12-09 | 2018-06-14 | 3M Innovative Properties Company | Article comprising multilayer film |
US11906701B2 (en) | 2017-12-29 | 2024-02-20 | 3M Innovative Properties Company | Anti-reflective surface structures |
WO2019130199A1 (en) | 2017-12-29 | 2019-07-04 | 3M Innovative Properties Company | Passive cooling articles having a fluoropolymer |
CN108531063B (en) * | 2018-04-12 | 2020-07-28 | 太仓中化环保化工有限公司 | Cathode electrophoretic coating and preparation method and application thereof |
US11940651B2 (en) | 2018-12-26 | 2024-03-26 | 3M Innovative Properties Company | Ultraviolet C light guides |
US11906252B2 (en) | 2019-05-31 | 2024-02-20 | 3M Innovative Properties Company | Composite cooling film and article including the same |
US20220221627A1 (en) | 2019-05-31 | 2022-07-14 | 3M Innovative Properties Company | Composite cooling film and article including the same |
US11634613B2 (en) | 2019-12-19 | 2023-04-25 | 3M Innovative Properties Company | Composite cooling film comprising an organic polymeric layer, a UV-absorbing layer, and a reflective metal layer |
EP4085174A1 (en) | 2019-12-31 | 2022-11-09 | 3M Innovative Properties Co. | Multi-surface passive cooling articles |
US11654664B2 (en) | 2020-01-16 | 2023-05-23 | 3M Innovative Properties Company | Composite cooling film comprising a reflective nonporous organic polymeric layer and a UV-protective layer |
US20230213243A1 (en) | 2020-05-06 | 2023-07-06 | 3M Innovative Properties Company | Solar Energy Absorbing and Radiative Cooling Articles and Methods |
KR20230112104A (en) * | 2020-11-25 | 2023-07-26 | 에이지씨 가부시키가이샤 | Compositions, laminates and films of tetrafluoroethylene-based polymers |
WO2023099974A1 (en) | 2021-12-01 | 2023-06-08 | 3M Innovative Properties Company | Semi-fluorinated thermoplastic copolymers and passive cooling articles including the same |
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-
2013
- 2013-12-20 SG SG11201504914SA patent/SG11201504914SA/en unknown
- 2013-12-20 JP JP2015549766A patent/JP6074059B2/en not_active Expired - Fee Related
- 2013-12-20 KR KR1020157019041A patent/KR20150096730A/en not_active Application Discontinuation
- 2013-12-20 EP EP13864927.2A patent/EP2935373A4/en not_active Withdrawn
- 2013-12-20 US US14/654,121 patent/US9670300B2/en active Active
- 2013-12-20 CN CN201380066697.6A patent/CN104884486A/en active Pending
- 2013-12-20 WO PCT/US2013/076840 patent/WO2014100551A1/en active Application Filing
- 2013-12-20 TW TW102147666A patent/TW201433580A/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP2935373A4 (en) | 2016-07-27 |
JP6074059B2 (en) | 2017-02-01 |
KR20150096730A (en) | 2015-08-25 |
JP2016503099A (en) | 2016-02-01 |
EP2935373A1 (en) | 2015-10-28 |
CN104884486A (en) | 2015-09-02 |
WO2014100551A1 (en) | 2014-06-26 |
US9670300B2 (en) | 2017-06-06 |
TW201433580A (en) | 2014-09-01 |
US20150353662A1 (en) | 2015-12-10 |
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