SG10201401559QA - Exposure apparatus, exposure method, and method for producing device - Google Patents
Exposure apparatus, exposure method, and method for producing deviceInfo
- Publication number
- SG10201401559QA SG10201401559QA SG10201401559QA SG10201401559QA SG10201401559QA SG 10201401559Q A SG10201401559Q A SG 10201401559QA SG 10201401559Q A SG10201401559Q A SG 10201401559QA SG 10201401559Q A SG10201401559Q A SG 10201401559QA SG 10201401559Q A SG10201401559Q A SG 10201401559QA
- Authority
- SG
- Singapore
- Prior art keywords
- exposure
- producing device
- exposure apparatus
- producing
- exposure method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003049365 | 2003-02-26 | ||
JP2003110748 | 2003-04-15 | ||
JP2003320100 | 2003-09-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201401559QA true SG10201401559QA (en) | 2014-06-27 |
Family
ID=33101941
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2012087615A SG2012087615A (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
SG2008042996A SG183572A1 (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
SG10201809095SA SG10201809095SA (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
SG10201401559QA SG10201401559QA (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2012087615A SG2012087615A (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
SG2008042996A SG183572A1 (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
SG10201809095SA SG10201809095SA (en) | 2003-02-26 | 2004-02-26 | Exposure apparatus, exposure method, and method for producing device |
Country Status (9)
Country | Link |
---|---|
US (15) | US7268854B2 (zh) |
EP (9) | EP2466623B1 (zh) |
JP (11) | JP4640516B2 (zh) |
KR (11) | KR101875296B1 (zh) |
CN (2) | CN104678715B (zh) |
HK (9) | HK1168912A1 (zh) |
SG (4) | SG2012087615A (zh) |
TW (6) | TWI591445B (zh) |
WO (1) | WO2004086468A1 (zh) |
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2005
- 2005-08-26 US US11/211,749 patent/US7268854B2/en not_active Expired - Lifetime
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2006
- 2006-03-03 US US11/366,746 patent/US7932991B2/en not_active Expired - Fee Related
- 2006-08-11 US US11/502,393 patent/US8102504B2/en not_active Expired - Fee Related
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2007
- 2007-07-16 US US11/826,465 patent/US7907253B2/en not_active Expired - Fee Related
- 2007-07-17 US US11/826,622 patent/US7535550B2/en not_active Expired - Fee Related
- 2007-07-17 US US11/826,624 patent/US7453550B2/en not_active Expired - Fee Related
- 2007-07-18 US US11/879,510 patent/US7911583B2/en not_active Expired - Fee Related
- 2007-07-18 US US11/879,514 patent/US7542128B2/en not_active Expired - Fee Related
- 2007-07-19 US US11/826,943 patent/US7907254B2/en not_active Expired - Fee Related
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2009
- 2009-03-27 JP JP2009078805A patent/JP4640516B2/ja not_active Expired - Fee Related
- 2009-10-01 JP JP2009229571A patent/JP5126190B2/ja not_active Expired - Fee Related
- 2009-10-01 JP JP2009229572A patent/JP5126191B2/ja not_active Expired - Fee Related
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2010
- 2010-10-15 US US12/923,947 patent/US8736809B2/en not_active Expired - Fee Related
- 2010-11-02 JP JP2010246879A patent/JP5353862B2/ja not_active Expired - Fee Related
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2012
- 2012-03-30 JP JP2012083140A patent/JP5699977B2/ja not_active Expired - Fee Related
- 2012-09-26 HK HK12109463.5A patent/HK1168912A1/zh not_active IP Right Cessation
- 2012-10-29 HK HK12110803.2A patent/HK1170067A1/zh not_active IP Right Cessation
- 2012-10-29 HK HK12110802.3A patent/HK1170066A1/zh not_active IP Right Cessation
- 2012-10-29 HK HK12110800.5A patent/HK1170064A1/zh not_active IP Right Cessation
- 2012-10-29 HK HK12110806.9A patent/HK1170070A1/zh not_active IP Right Cessation
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2014
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- 2014-05-02 US US14/268,558 patent/US9182684B2/en not_active Expired - Fee Related
- 2014-05-23 US US14/286,332 patent/US9348239B2/en not_active Expired - Fee Related
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2015
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- 2015-09-07 HK HK15108688.3A patent/HK1208088A1/zh not_active IP Right Cessation
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2016
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- 2016-02-25 HK HK16102136.3A patent/HK1214372A1/zh not_active IP Right Cessation
- 2016-05-03 US US15/145,467 patent/US9766555B2/en not_active Expired - Fee Related
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2017
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- 2017-09-07 US US15/697,750 patent/US10180632B2/en not_active Expired - Lifetime
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2018
- 2018-04-02 JP JP2018070681A patent/JP2018106206A/ja active Pending
- 2018-06-05 HK HK18107319.9A patent/HK1247997A1/zh unknown
- 2018-12-19 US US16/225,306 patent/US20190121244A1/en not_active Abandoned
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