JP5283300B2 - ボンドパッドを有する半導体装置およびそのための方法 - Google Patents
ボンドパッドを有する半導体装置およびそのための方法 Download PDFInfo
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- JP5283300B2 JP5283300B2 JP2003577333A JP2003577333A JP5283300B2 JP 5283300 B2 JP5283300 B2 JP 5283300B2 JP 2003577333 A JP2003577333 A JP 2003577333A JP 2003577333 A JP2003577333 A JP 2003577333A JP 5283300 B2 JP5283300 B2 JP 5283300B2
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Description
ド44に電気的接続を提供するのに必要な面積によってのみ制限される。他の実施形態では、複数の相対的に小さい最終金属層パッドおよび対応するパッシベーション開口があってもよく、それらが一体となってボンドパッド44に十分な電気的接続を提供する。ボンドパッド44がパッシベーション層18上に延在し、最終金属層パッド42の大きさに影響がないことから、プローブおよびワイヤボンド領域の配置においては自由度が高い。例えば、プローブ領域およびワイヤボンド領域は他の実施形態において、必ずしも接触しているとは限らない。
図7には、本発明の別の実施形態による半導体装置80の平面図を示してある。集積回路80は図1に示したボンドパッドと同様の複数のボンドパッドを備え、図2または図3に示した実施形態に従って構築することができる。集積回路80は、集積回路80の縁部81に沿って形成された複数のボンドパッド82〜85を備える。前記複数のボンドパッドのそれぞれの上にある点線は、パッシベーション層に形成された開口部86を示してい
る。各ボンドパッドは、図1で議論したようにプローブ領域およびワイヤボンド領域に分離されている。楕円形を境界とする各ボンドパッド上の領域はプローブ検査用に指定された領域であり、円形を境界とする各ボンドパッド上の領域はワイヤボンディング用に指定された領域である。前記複数のボンドパッドは同じ大きさであり、外周81から等距離に配置されている。
って提供された空間は、集積回路上のより多くの機能やボンドパッドを形成するためのより大きい表面積を半導体装置上に提供することができる。
定された領域であり、円形を境界とする各ボンドパッド上の領域はワイヤボンディング用に指定された領域である。ボンドパッドの長軸は、縁部141と平行になるように方向付けられている。隣接するボンドパッドのワイヤボンド領域およびプローブ領域は、縁部141から等距離の線上に維持されている。ボンドパッドの長軸が縁部141と平行に方向付けられていることから、パッドに限定されない集積回路用の分離したワイヤボンド領域およびプローブ領域を維持しながら、ボンドパッドの全体高さが低減される。
Claims (2)
- 能動回路構成部および外周を有する基板;
前記基板上の第1の複数の相互接続層;
前記第1の複数の相互接続層上に位置する、銅からなる最終層パッド;
前記最終層パッドに対応する複数の整列した開口部を有するパッシベーション層;および
前記開口部を通って前記最終層パッドに結合された、アルミニウムからなる複数のボンドパッドであって、前記開口部上に第1部分を有し、さらに前記パッシベーション層上に延びる第2部分を有し、前記第2部分が前記第1部分より面積が大きい、ボンドパッド;
を備え、
前記複数のボンドパッドは、前記能動回路構成部の上方に延在し、前記第2部分は前記第1部分よりも有意に大きく、第1部分はワイヤボンディング用の領域であり、第2部分はプローブ用の領域であり、
前記第1部分は互いに整列し、
前記第2部分は互い違いであり、隣のボンドパッドの第2部分が互いに第1部分の反対側に位置している、
集積回路。 - 能動領域を含む基板上に複数の金属層を形成する工程であり、前記金属層が、前記基板の外周に関して位置する複数の最終層パッドを有する最終金属層を含む、工程;
前記最終金属層上にパッシベーション層を成膜する工程;
前記パッシベーション層内に複数の整列した開口部を形成する工程であって、前記複数の開口部の各々が前記複数の最終層パッドのうちの一つの最終層パッドに対応し、かつ、前記複数の開口部の各々がそれが対応する最終層パッド上にある工程;
前記パッシベーション層の成膜後に、前記パッシベーション層の上方にパッド層を成膜する工程;及び
前記パッド層をパターニングして、前記開口部を通って前記最終層パッドに結合する複数のボンドパッドを形成する工程;
を備え、
前記複数のボンドパッドの各ボンドパッドが、
前記複数の開口部のうちの一つの開口部に対応し;
それが対応する開口部上の第1部分および前記パッシベーション層上に延びる第2部分を有し、
前記第2部分の方が第1部分より面積が大きく、
前記第1部分は互いに整列し、
前記第2部分は互い違いであり、隣のボンドパッドの第2部分が互いに第1部分の反対側に位置している、
集積回路の形成方法。
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JP3531863B2 (ja) * | 2000-01-13 | 2004-05-31 | ユナイテッド マイクロエレクトロニクス コープ | ウェーハ・レベルの集積回路の構造およびそれを製造するための方法 |
JP2001264391A (ja) * | 2000-03-17 | 2001-09-26 | Mitsubishi Materials Corp | 電極端子及び該電極端子を有する回路素子 |
JP2001284394A (ja) * | 2000-03-31 | 2001-10-12 | Matsushita Electric Ind Co Ltd | 半導体素子 |
US20020016070A1 (en) * | 2000-04-05 | 2002-02-07 | Gerald Friese | Power pads for application of high current per bond pad in silicon technology |
JP2001338955A (ja) * | 2000-05-29 | 2001-12-07 | Texas Instr Japan Ltd | 半導体装置及びその製造方法 |
JP4979154B2 (ja) * | 2000-06-07 | 2012-07-18 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP2002016069A (ja) * | 2000-06-29 | 2002-01-18 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
US6844631B2 (en) * | 2002-03-13 | 2005-01-18 | Freescale Semiconductor, Inc. | Semiconductor device having a bond pad and method therefor |
-
2002
- 2002-03-13 US US10/097,036 patent/US6844631B2/en not_active Expired - Lifetime
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2003
- 2003-03-12 CN CNB038057700A patent/CN100435327C/zh not_active Expired - Lifetime
- 2003-03-12 JP JP2003577333A patent/JP5283300B2/ja not_active Expired - Fee Related
- 2003-03-12 KR KR1020047014389A patent/KR100979081B1/ko active IP Right Grant
- 2003-03-12 AU AU2003218145A patent/AU2003218145A1/en not_active Abandoned
- 2003-03-12 EP EP03714136A patent/EP1483787A2/en not_active Withdrawn
- 2003-03-12 TW TW092105326A patent/TWI266402B/zh not_active IP Right Cessation
- 2003-03-12 WO PCT/US2003/007782 patent/WO2003079437A2/en active Application Filing
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Also Published As
Publication number | Publication date |
---|---|
CN100435327C (zh) | 2008-11-19 |
TW200306659A (en) | 2003-11-16 |
WO2003079437A2 (en) | 2003-09-25 |
KR100979081B1 (ko) | 2010-08-31 |
CN1643684A (zh) | 2005-07-20 |
JP2011040759A (ja) | 2011-02-24 |
TWI266402B (en) | 2006-11-11 |
AU2003218145A1 (en) | 2003-09-29 |
JP5432083B2 (ja) | 2014-03-05 |
US20030173667A1 (en) | 2003-09-18 |
EP1483787A2 (en) | 2004-12-08 |
US7271013B2 (en) | 2007-09-18 |
US20050098903A1 (en) | 2005-05-12 |
JP2005527968A (ja) | 2005-09-15 |
US6844631B2 (en) | 2005-01-18 |
KR20040093738A (ko) | 2004-11-08 |
WO2003079437A3 (en) | 2004-05-13 |
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