CN101002140B - 保持平板印刷投射透镜下面的浸没流体的设备和方法 - Google Patents

保持平板印刷投射透镜下面的浸没流体的设备和方法 Download PDF

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Publication number
CN101002140B
CN101002140B CN2004800097020A CN200480009702A CN101002140B CN 101002140 B CN101002140 B CN 101002140B CN 2004800097020 A CN2004800097020 A CN 2004800097020A CN 200480009702 A CN200480009702 A CN 200480009702A CN 101002140 B CN101002140 B CN 101002140B
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CN
China
Prior art keywords
workpiece
immersion
optical assembly
clamp
wafer
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Expired - Lifetime
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CN2004800097020A
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Chinese (zh)
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CN101002140A (zh
Inventor
M·宾纳德
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
CN2004800097020A 2003-04-11 2004-03-17 保持平板印刷投射透镜下面的浸没流体的设备和方法 Expired - Lifetime CN101002140B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US46249903P 2003-04-11 2003-04-11
US60/462,499 2003-04-11
PCT/IB2004/001259 WO2004090577A2 (en) 2003-04-11 2004-03-17 Maintaining immersion fluid under a lithographic projection lens

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN201010510290.6A Division CN101980086B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法
CN2010105103063A Division CN101980087B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法

Publications (2)

Publication Number Publication Date
CN101002140A CN101002140A (zh) 2007-07-18
CN101002140B true CN101002140B (zh) 2010-12-08

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Family Applications (3)

Application Number Title Priority Date Filing Date
CN2004800097020A Expired - Lifetime CN101002140B (zh) 2003-04-11 2004-03-17 保持平板印刷投射透镜下面的浸没流体的设备和方法
CN2010105103063A Expired - Lifetime CN101980087B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法
CN201010510290.6A Expired - Lifetime CN101980086B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN2010105103063A Expired - Lifetime CN101980087B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法
CN201010510290.6A Expired - Lifetime CN101980086B (zh) 2003-04-11 2004-03-17 浸没曝光设备以及浸没曝光方法

Country Status (9)

Country Link
US (18) US7372538B2 (enExample)
EP (8) EP2613192B1 (enExample)
JP (12) JP4315198B2 (enExample)
KR (15) KR20180054929A (enExample)
CN (3) CN101002140B (enExample)
IL (5) IL170735A (enExample)
SG (12) SG139733A1 (enExample)
TW (16) TWI648589B (enExample)
WO (1) WO2004090577A2 (enExample)

Families Citing this family (223)

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