WO2009078443A1 - 露光装置、露光方法及びデバイス製造方法 - Google Patents

露光装置、露光方法及びデバイス製造方法 Download PDF

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Publication number
WO2009078443A1
WO2009078443A1 PCT/JP2008/072998 JP2008072998W WO2009078443A1 WO 2009078443 A1 WO2009078443 A1 WO 2009078443A1 JP 2008072998 W JP2008072998 W JP 2008072998W WO 2009078443 A1 WO2009078443 A1 WO 2009078443A1
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WO
WIPO (PCT)
Prior art keywords
scale member
exposure
exposure apparatus
device manufacturing
cleaning
Prior art date
Application number
PCT/JP2008/072998
Other languages
English (en)
French (fr)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2009546287A priority Critical patent/JP5446875B2/ja
Publication of WO2009078443A1 publication Critical patent/WO2009078443A1/ja
Priority to US12/816,775 priority patent/US20100296068A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　露光装置は、露光光で物体を露光する。露光装置は、物体を保持して所定面内を移動可能で且つ、格子を含むスケール部材が配置される移動体と、スケール部材を用いて所定面内での移動体の位置情報を計測する計測システムと、スケール部材の表面の異物及びそのサイズに関する情報を検出する検出システムと、スケール部材をクリーニング可能なクリーニング装置とを備えている。検出システムの検出結果に応じて、スケール部材に対するクリーニング動作が実行される。
PCT/JP2008/072998 2007-12-17 2008-12-17 露光装置、露光方法及びデバイス製造方法 WO2009078443A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009546287A JP5446875B2 (ja) 2007-12-17 2008-12-17 露光装置、露光方法及びデバイス製造方法
US12/816,775 US20100296068A1 (en) 2007-12-17 2010-06-16 Exposure apparatus, exposure method, and device manufacturing method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007325078 2007-12-17
JP2007-325078 2007-12-17
JP2007340875 2007-12-28
JP2007-340875 2007-12-28

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/816,775 Continuation US20100296068A1 (en) 2007-12-17 2010-06-16 Exposure apparatus, exposure method, and device manufacturing method

Publications (1)

Publication Number Publication Date
WO2009078443A1 true WO2009078443A1 (ja) 2009-06-25

Family

ID=40795556

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/072998 WO2009078443A1 (ja) 2007-12-17 2008-12-17 露光装置、露光方法及びデバイス製造方法

Country Status (5)

Country Link
US (1) US20100296068A1 (ja)
JP (1) JP5446875B2 (ja)
KR (1) KR20100102580A (ja)
SG (2) SG183057A1 (ja)
WO (1) WO2009078443A1 (ja)

Cited By (6)

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CN104142351A (zh) * 2014-07-10 2014-11-12 深圳清华大学研究院 半导体激光测试装置及测试方法
US9013683B2 (en) 2010-12-21 2015-04-21 Asml Netherlands B.V. Substrate table, a lithographic apparatus and a device manufacturing method
JP2016002668A (ja) * 2014-06-13 2016-01-12 キヤノン株式会社 インプリント装置及び物品の製造方法
US9298107B2 (en) 2010-07-16 2016-03-29 Asml Netherlands B.V. Lithographic apparatus and method
JP2018183033A (ja) * 2017-04-13 2018-11-15 株式会社デンソー アクチュエータ
JP2019197229A (ja) * 2009-08-25 2019-11-14 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

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NL1036618A1 (nl) * 2008-03-24 2009-09-25 Asml Netherlands Bv Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.
NL2003758A (en) * 2008-12-04 2010-06-07 Asml Netherlands Bv A member with a cleaning surface and a method of removing contamination.
CN102163006A (zh) * 2011-04-19 2011-08-24 南昌航空大学 一种全自动步进数字化光刻装置
US8711222B2 (en) 2011-04-27 2014-04-29 Georgetown Rail Equipment Company Method and system for calibrating laser profiling systems
DE102012021935A1 (de) * 2012-11-09 2014-05-15 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
US9823064B1 (en) * 2014-09-16 2017-11-21 Amazon Technologies, Inc. Apparatus for contact angle measurement
CN108475025B (zh) * 2015-11-20 2021-02-26 Asml荷兰有限公司 光刻设备和操作光刻设备的方法
JP7252322B2 (ja) 2018-09-24 2023-04-04 エーエスエムエル ネザーランズ ビー．ブイ． プロセスツール及び検査方法
US11045845B2 (en) 2019-09-25 2021-06-29 Honda Motor Co., Ltd. Decontamination station and methods of making and using the same
JP2023000112A (ja) * 2021-06-17 2023-01-04 キオクシア株式会社 計測装置および計測プログラム
CN115274528B (zh) * 2022-09-22 2022-12-06 西北电子装备技术研究所(中国电子科技集团公司第二研究所) 一种芯片倒装键合用标定玻璃片

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Publication number Priority date Publication date Assignee Title
JP2019197229A (ja) * 2009-08-25 2019-11-14 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP2021012387A (ja) * 2009-08-25 2021-02-04 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
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US10591828B2 (en) 2010-07-16 2020-03-17 Asml Netherlands B.V. Lithographic apparatus and method
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JP2018183033A (ja) * 2017-04-13 2018-11-15 株式会社デンソー アクチュエータ

Also Published As

Publication number Publication date
SG183057A1 (en) 2012-08-30
JPWO2009078443A1 (ja) 2011-04-28
US20100296068A1 (en) 2010-11-25
JP5446875B2 (ja) 2014-03-19
SG183058A1 (en) 2012-08-30
KR20100102580A (ko) 2010-09-24

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