JP5001516B2 - Ｍｏｃｖｄ反応炉用サセプタ - Google Patents

Ｍｏｃｖｄ反応炉用サセプタ Download PDF

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Publication number
JP5001516B2
JP5001516B2 JP2004506067A JP2004506067A JP5001516B2 JP 5001516 B2 JP5001516 B2 JP 5001516B2 JP 2004506067 A JP2004506067 A JP 2004506067A JP 2004506067 A JP2004506067 A JP 2004506067A JP 5001516 B2 JP5001516 B2 JP 5001516B2
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Japan
Prior art keywords
susceptor
graphite
face plate
wafer
plate
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Expired - Lifetime
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JP2004506067A
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Japanese (ja)
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JP2005526394A (ja
JP2005526394A5 (enExample
Inventor
シュウジ ナカムラ
ピー．デンバーズ スティーブン
バトレス マックス
クールター マイケル
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Wolfspeed Inc
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Cree Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
JP2004506067A 2002-05-13 2003-04-30 Ｍｏｃｖｄ反応炉用サセプタ Expired - Lifetime JP5001516B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/144,943 US7122844B2 (en) 2002-05-13 2002-05-13 Susceptor for MOCVD reactor
US10/144,943 2002-05-13
PCT/US2003/013648 WO2003098667A1 (en) 2002-05-13 2003-04-30 Susceptor for mocvd reactor

Publications (3)

Publication Number Publication Date
JP2005526394A JP2005526394A (ja) 2005-09-02
JP2005526394A5 JP2005526394A5 (enExample) 2006-06-15
JP5001516B2 true JP5001516B2 (ja) 2012-08-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004506067A Expired - Lifetime JP5001516B2 (ja) 2002-05-13 2003-04-30 Ｍｏｃｖｄ反応炉用サセプタ

Country Status (9)

Country Link
US (2) US7122844B2 (enExample)
EP (1) EP1504463A1 (enExample)
JP (1) JP5001516B2 (enExample)
KR (1) KR20040108785A (enExample)
CN (1) CN1669117A (enExample)
AU (1) AU2003234333A1 (enExample)
CA (1) CA2484700A1 (enExample)
TW (1) TW200405394A (enExample)
WO (1) WO2003098667A1 (enExample)

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* Cited by examiner, † Cited by third party
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