FR1462335A - Procédé d'application de couches d'oxyde d'étain sur des dispositifs supports - Google Patents
Procédé d'application de couches d'oxyde d'étain sur des dispositifs supportsInfo
- Publication number
- FR1462335A FR1462335A FR35235A FR35235A FR1462335A FR 1462335 A FR1462335 A FR 1462335A FR 35235 A FR35235 A FR 35235A FR 35235 A FR35235 A FR 35235A FR 1462335 A FR1462335 A FR 1462335A
- Authority
- FR
- France
- Prior art keywords
- tin oxide
- oxide layers
- support devices
- applying tin
- applying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR35235A FR1462335A (fr) | 1965-10-16 | 1965-10-16 | Procédé d'application de couches d'oxyde d'étain sur des dispositifs supports |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR35235A FR1462335A (fr) | 1965-10-16 | 1965-10-16 | Procédé d'application de couches d'oxyde d'étain sur des dispositifs supports |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1462335A true FR1462335A (fr) | 1966-04-15 |
Family
ID=8590629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR35235A Expired FR1462335A (fr) | 1965-10-16 | 1965-10-16 | Procédé d'application de couches d'oxyde d'étain sur des dispositifs supports |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1462335A (fr) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1984004334A1 (fr) * | 1983-04-29 | 1984-11-08 | Hughes Aircraft Co | Chambre de reaction de deposition de vapeur chimique a ecoulement vertical positif inverse |
FR2570085A1 (fr) * | 1984-09-13 | 1986-03-14 | Itaru Todoriki Dir Kogyo Gijut | Dispositif de formation de fines pellicules sur des substrats |
EP0192892A1 (fr) * | 1985-02-25 | 1986-09-03 | Ford Motor Company Limited | Procédé de préparation d'une feuille de verre réfléchissant l'infrarouge |
EP0232434A1 (fr) * | 1985-12-13 | 1987-08-19 | Corning Glass Works | Méthode de dépôt de films d'oxydes métalliques minces transparents |
US4732110A (en) * | 1983-04-29 | 1988-03-22 | Hughes Aircraft Company | Inverted positive vertical flow chemical vapor deposition reactor chamber |
US4993361A (en) * | 1986-07-11 | 1991-02-19 | Unvala Limited | Chemical vapor deposition |
WO2003029516A1 (fr) * | 2001-09-29 | 2003-04-10 | Cree, Inc. | Appareil pour depot chimique en phase vapeur inverse |
WO2004079043A2 (fr) * | 2003-03-04 | 2004-09-16 | Cree, Inc. | Suscepteur pour reacteur mocvd inverse |
US7122844B2 (en) | 2002-05-13 | 2006-10-17 | Cree, Inc. | Susceptor for MOCVD reactor |
-
1965
- 1965-10-16 FR FR35235A patent/FR1462335A/fr not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1984004334A1 (fr) * | 1983-04-29 | 1984-11-08 | Hughes Aircraft Co | Chambre de reaction de deposition de vapeur chimique a ecoulement vertical positif inverse |
US4732110A (en) * | 1983-04-29 | 1988-03-22 | Hughes Aircraft Company | Inverted positive vertical flow chemical vapor deposition reactor chamber |
FR2570085A1 (fr) * | 1984-09-13 | 1986-03-14 | Itaru Todoriki Dir Kogyo Gijut | Dispositif de formation de fines pellicules sur des substrats |
EP0192892A1 (fr) * | 1985-02-25 | 1986-09-03 | Ford Motor Company Limited | Procédé de préparation d'une feuille de verre réfléchissant l'infrarouge |
EP0232434A1 (fr) * | 1985-12-13 | 1987-08-19 | Corning Glass Works | Méthode de dépôt de films d'oxydes métalliques minces transparents |
US4993361A (en) * | 1986-07-11 | 1991-02-19 | Unvala Limited | Chemical vapor deposition |
WO2003029516A1 (fr) * | 2001-09-29 | 2003-04-10 | Cree, Inc. | Appareil pour depot chimique en phase vapeur inverse |
US8133322B2 (en) | 2001-09-29 | 2012-03-13 | Cree, Inc. | Apparatus for inverted multi-wafer MOCVD fabrication |
US7122844B2 (en) | 2002-05-13 | 2006-10-17 | Cree, Inc. | Susceptor for MOCVD reactor |
US8372204B2 (en) | 2002-05-13 | 2013-02-12 | Cree, Inc. | Susceptor for MOCVD reactor |
WO2004079043A2 (fr) * | 2003-03-04 | 2004-09-16 | Cree, Inc. | Suscepteur pour reacteur mocvd inverse |
WO2004079043A3 (fr) * | 2003-03-04 | 2005-01-20 | Cree Inc | Suscepteur pour reacteur mocvd inverse |
US8366830B2 (en) | 2003-03-04 | 2013-02-05 | Cree, Inc. | Susceptor apparatus for inverted type MOCVD reactor |
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