USD854506S1 - Chemical vapor deposition wafer carrier with thermal cover - Google Patents

Chemical vapor deposition wafer carrier with thermal cover Download PDF

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Publication number
USD854506S1
USD854506S1 US29/641,933 US201829641933F USD854506S US D854506 S1 USD854506 S1 US D854506S1 US 201829641933 F US201829641933 F US 201829641933F US D854506 S USD854506 S US D854506S
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United States
Prior art keywords
vapor deposition
chemical vapor
wafer carrier
thermal cover
deposition wafer
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US29/641,933
Inventor
Sandeep Krishnan
Yuliy Rashkovsky
Alexander Gurary
Leo Chin
Mandar Deshpande
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Veeco Instruments Inc
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Veeco Instruments Inc
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Priority to US29/641,933 priority Critical patent/USD854506S1/en
Assigned to VEECO INSTRUMENTS INC. reassignment VEECO INSTRUMENTS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KRISHNAN, SANDEEP, DESHPANDE, MANDAR, CHIN, LEO, GURARY, ALEXANDER, RASHKOVSKY, YULIY
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Publication of USD854506S1 publication Critical patent/USD854506S1/en
Assigned to HSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENT reassignment HSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENT PATENT SECURITY AGREEMENT Assignors: VEECO INSTRUMENTS INC.
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Description

FIG. 1 is a perspective view of a chemical vapor deposition wafer carrier with thermal cover, showing our new design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a right side view thereof, with the left side view, front view, and rear view being identical.
FIG. 4 is a bottom plan view thereof; and,
FIG. 5 is a perspective view of the thermal cover of the chemical vapor deposition wafer carrier with thermal cover, shown separately for ease of illustration.
The broken lines in FIG. 4 form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a chemical vapor deposition wafer carrier with thermal cover, as shown and described.
US29/641,933 2018-03-26 2018-03-26 Chemical vapor deposition wafer carrier with thermal cover Active USD854506S1 (en)

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US29/641,933 USD854506S1 (en) 2018-03-26 2018-03-26 Chemical vapor deposition wafer carrier with thermal cover

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US29/641,933 USD854506S1 (en) 2018-03-26 2018-03-26 Chemical vapor deposition wafer carrier with thermal cover

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Citations (104)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3461537A (en) 1965-11-23 1969-08-19 Telefunken Patent Separation of individual wafers of a semiconductor disc
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3845738A (en) 1973-09-12 1974-11-05 Rca Corp Vapor deposition apparatus with pyrolytic graphite heat shield
US3895967A (en) 1973-10-30 1975-07-22 Gen Electric Semiconductor device production
US4165584A (en) * 1977-01-27 1979-08-28 International Telephone And Telegraph Corporation Apparatus for lapping or polishing materials
JPS58128724A (en) 1982-01-27 1983-08-01 Hitachi Ltd Wafer inverting apparatus
USD320361S (en) * 1989-06-02 1991-10-01 Tokyo Electron Limited Wafer probe plate holder
JPH04110466A (en) 1990-08-31 1992-04-10 Oki Electric Ind Co Ltd Wafer holder
USD325934S (en) * 1990-04-20 1992-05-05 Vinko Ramljak Holder for crayons, markers, pencils and the like
US5152842A (en) 1991-12-05 1992-10-06 Rohm Co., Ltd. Reactor for epitaxial growth
US5191738A (en) * 1989-06-16 1993-03-09 Shin-Etsu Handotai Co., Ltd. Method of polishing semiconductor wafer
US5242501A (en) 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
EP0795624A1 (en) 1996-03-15 1997-09-17 STMicroelectronics S.A. Substrate holder for evaporation apparatus
US5690742A (en) 1994-09-06 1997-11-25 Komatsu Electronic Metals Co., Ltd. Susceptor for an epitaxial growth apparatus
JPH10167886A (en) 1996-12-13 1998-06-23 Toyo Tanso Kk Susceptor for vapor growth
JPH10167885A (en) 1996-12-13 1998-06-23 Toyo Tanso Kk Susceptor for vapor growth
WO1999018599A2 (en) 1997-10-03 1999-04-15 Koninklijke Philips Electronics N.V. Holder for a semiconductor substrate, and method of manufacturing a semiconductor device using such a holder
US6001183A (en) 1996-06-10 1999-12-14 Emcore Corporation Wafer carriers for epitaxial growth processes
EP1096549A2 (en) 1999-10-29 2001-05-02 The Boc Group, Inc. Substrates support devices
US20020027762A1 (en) 1998-09-29 2002-03-07 Shinji Yamaguchi Electrostatic chuck
US6436796B1 (en) 2000-01-31 2002-08-20 Mattson Technology, Inc. Systems and methods for epitaxial processing of a semiconductor substrate
US6492625B1 (en) 2000-09-27 2002-12-10 Emcore Corporation Apparatus and method for controlling temperature uniformity of substrates
US6506252B2 (en) 2001-02-07 2003-01-14 Emcore Corporation Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
US20030057089A1 (en) * 2000-12-01 2003-03-27 Tin Nguyen Disk carrier
WO2003069029A1 (en) 2002-02-15 2003-08-21 Lpe Spa A susceptor provided with indentations and an epitaxial reactor which uses the same
US6666756B1 (en) 2000-03-31 2003-12-23 Lam Research Corporation Wafer carrier head assembly
JP2004128271A (en) 2002-10-03 2004-04-22 Toyo Tanso Kk Susceptor
DE10261362A1 (en) 2002-12-30 2004-07-15 Osram Opto Semiconductors Gmbh Semiconductor substrate holder for epitaxial processes, has structure designed to equalize temperature over substrate placed on or near it
US20040179323A1 (en) 2003-03-11 2004-09-16 Alon Litman Electrostatic chuck for wafer metrology and inspection equipment
US20050011436A1 (en) 2003-07-15 2005-01-20 Heng Liu Chemical vapor deposition reactor
US6902623B2 (en) 2001-06-07 2005-06-07 Veeco Instruments Inc. Reactor having a movable shutter
US20050274374A1 (en) 2004-06-09 2005-12-15 Veeco Instruments Inc. System and method for increasing the emissivity of a material
JP2006066417A (en) 2004-08-24 2006-03-09 Ulvac Japan Ltd Electrostatic chuck and tray for substrate conveyance
USD517073S1 (en) 2004-07-14 2006-03-14 Capital One Financial Corporation Data card
US20060102081A1 (en) 2004-11-16 2006-05-18 Sumitomo Electric Industries, Ltd. Wafer Guide, MOCVD Equipment, and Nitride Semiconductor Growth Method
US7101272B2 (en) 2005-01-15 2006-09-05 Applied Materials, Inc. Carrier head for thermal drift compensation
US7122844B2 (en) 2002-05-13 2006-10-17 Cree, Inc. Susceptor for MOCVD reactor
US20070186853A1 (en) 2006-02-10 2007-08-16 Veeco Instruments Inc. System and method for varying wafer surface temperature via wafer-carrier temperature offset
KR100854974B1 (en) 2007-04-25 2008-08-28 (주)리드 Substrate carrier and apparatus for manufacturing of light emitting diode
KR20090036722A (en) 2007-10-10 2009-04-15 주성엔지니어링(주) Substrate supporting plate and apparatus for depositing thin film having the same
KR20090038606A (en) 2007-10-16 2009-04-21 엘지이노텍 주식회사 Susceptor and fabrication method of semiconductor using thereof
US20090155028A1 (en) * 2007-12-12 2009-06-18 Veeco Instruments Inc. Wafer carrier with hub
US20090224175A1 (en) 2008-02-15 2009-09-10 Veeco Instruments Inc. Apparatus and Method for Batch Non-Contact Material Characterization
US20100055318A1 (en) 2008-08-29 2010-03-04 Veeco Instruments Inc. Wafer carrier with varying thermal resistance
US20100055320A1 (en) 2008-09-04 2010-03-04 Tokyo Electron Limited Film deposition apparatus, substrate processing apparatus, film deposition method and storage medium
US20100162957A1 (en) 2007-05-23 2010-07-01 Adam Boyd Device for coating a plurality of closest packed substrates arranged on a susceptor
US20100190418A1 (en) 2009-01-27 2010-07-29 Kai Yasuoka Lapping plate-conditioning grindstone segment, lapping plate-conditioning lapping machine, and method for conditioning lapping plate
US20110049779A1 (en) 2009-08-28 2011-03-03 Applied Materials, Inc. Substrate carrier design for improved photoluminescence uniformity
CN102130035A (en) 2009-12-30 2011-07-20 塔工程有限公司 Integrated chip tray
US20110290175A1 (en) 2009-06-07 2011-12-01 Veeco Instruments, Inc. Multi-Chamber CVD Processing System
US20110300297A1 (en) 2010-06-07 2011-12-08 Veeco Instruments Inc. Multi-wafer rotating disc reactor with inertial planetary drive
US8092599B2 (en) 2007-07-10 2012-01-10 Veeco Instruments Inc. Movable injectors in rotating disc gas reactors
US8093696B2 (en) 2008-05-16 2012-01-10 Qimonda Ag Semiconductor device
WO2012021370A1 (en) 2010-08-13 2012-02-16 Veeco Instruments Inc. Enhanced wafer carrier
US8182315B2 (en) 2008-03-24 2012-05-22 Phuong Van Nguyen Chemical mechanical polishing pad and dresser
US20120156374A1 (en) 2010-12-15 2012-06-21 Veeco Instruments Inc. Sectional wafer carrier
US8216379B2 (en) * 2009-04-23 2012-07-10 Applied Materials, Inc. Non-circular substrate holders
US20120234229A1 (en) 2011-03-16 2012-09-20 Applied Materials, Inc. Substrate support assembly for thin film deposition systems
US20120240859A1 (en) * 2011-03-22 2012-09-27 Chi Mei Lighting Technology Corp. Wafer susceptor and chemical vapor deposition apparatus
CN202492576U (en) 2012-02-20 2012-10-17 中微半导体设备(上海)有限公司 Chemical vapor deposition device
US20120272892A1 (en) 2011-04-07 2012-11-01 Veeco Instruments Inc. Metal-Organic Vapor Phase Epitaxy System and Process
USD674759S1 (en) * 2010-08-19 2013-01-22 Epistar Corporation Wafer carrier
US8367477B2 (en) 2009-03-13 2013-02-05 Wen-Cheng Chien Electronic device package and method for forming the same
US8366830B2 (en) 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
KR101235928B1 (en) 2011-10-05 2013-02-21 전종근 Wafer tray for plasma processing apparatus
US20130175005A1 (en) 2012-01-06 2013-07-11 Keerthi Gowdaru Adaptive heat transfer methods and systems for uniform heat transfer
US8486726B2 (en) 2009-12-02 2013-07-16 Veeco Instruments Inc. Method for improving performance of a substrate carrier
USD686175S1 (en) * 2012-03-20 2013-07-16 Veeco Instruments Inc. Wafer carrier having pockets
USD686582S1 (en) * 2012-03-20 2013-07-23 Veeco Instruments Inc. Wafer carrier having pockets
CN103258763A (en) 2012-02-15 2013-08-21 沈阳拓荆科技有限公司 Wafer loading platform structure commonly used by wafers of different sizes
US8518753B2 (en) 2011-11-15 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Assembly method for three dimensional integrated circuit
WO2013123859A1 (en) 2012-02-22 2013-08-29 光达光电设备科技(嘉兴)有限公司 Graphite plate, reaction chamber having same, and method for heating substrate
USD690671S1 (en) * 2012-03-20 2013-10-01 Veeco Instruments Inc. Wafer carrier having pockets
US20130276704A1 (en) * 2012-04-18 2013-10-24 Sandeep Krishnan Wafter carrier for chemical vapor deposition systems
US20130291798A1 (en) 2011-01-14 2013-11-07 Wonik Ip Co., Ltd. Thin film deposition apparatus and substrate treatment system including the same
USD695241S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
USD695242S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
US20140110894A1 (en) 2012-10-22 2014-04-24 Samsung Electronics Co., Ltd. Wafer Carrier Having Cavity
CN203569185U (en) 2013-11-25 2014-04-30 中微半导体设备(上海)有限公司 Chemical vapor deposition device, substrate tray and rotary shaft
CN203569186U (en) 2013-11-25 2014-04-30 中微半导体设备(上海)有限公司 Chemical vapor deposition device, substrate tray and rotary shaft
CN203715721U (en) 2013-11-25 2014-07-16 中微半导体设备(上海)有限公司 Chemical vapor deposition device and rotating shaft
US20140261698A1 (en) * 2013-03-14 2014-09-18 Veeco Instruments Inc. Wafer carrier with temperature distribution control
US20140261187A1 (en) 2013-03-15 2014-09-18 Veeco Instruments, Inc. Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems
US20140360430A1 (en) * 2013-06-05 2014-12-11 Veeco Instruments, Inc. Wafer carrier having thermal uniformity-enhancing features
USD721417S1 (en) * 2013-04-11 2015-01-20 Canada Pipeline Accessories, Co., Ltd. Flow conditioner
TWM496228U (en) 2014-10-28 2015-02-21 Advanced System Technology Co Ltd Wafer tray structure
US9017483B2 (en) 2008-03-21 2015-04-28 Sumco Corporation Susceptor for vapor phase epitaxial growth device
US20150118009A1 (en) * 2012-12-03 2015-04-30 Xiamen Sanan Optoelectronics Technology Co., Ltd. Graphite Wafer Carrier for LED Epitaxial Wafer Processes
USD731409S1 (en) 2014-06-26 2015-06-09 Water Technology Llc Surface ornamentation for a passive solar heating article
US20150187620A1 (en) 2013-12-26 2015-07-02 Veeco Instruments Inc. Water Carrier Having Thermal Cover for Chemical Vapor Deposition Systems
US20150330601A1 (en) 2014-05-16 2015-11-19 The Boeing Company Optical Filtering System for Solar Cell Testing
CN204982132U (en) 2015-09-06 2016-01-20 中微半导体设备(上海)有限公司 Chemical vapor deposition or epitaxial layer growth reaction ware and substrate tray and back shaft thereof
CN105369348A (en) 2014-08-29 2016-03-02 中微半导体设备(上海)有限公司 Wafer carrier plate for MOCVD reaction system
USD754785S1 (en) * 2014-01-22 2016-04-26 Karen Theresa Gibson Musical steel pan with drum sticks
TW201624605A (en) 2014-12-31 2016-07-01 Advanced Micro Fab Equip Inc Wafer tray
TW201624596A (en) 2014-12-31 2016-07-01 Advanced Micro Fab Equip Inc Wafer tray
US20160251758A1 (en) 2010-12-30 2016-09-01 Veeco Instruments Inc. Wafer processing with carrier extension
TWM531049U (en) 2015-04-16 2016-10-21 維克儀器公司 Wafer carrier with a thirty-four pocket configuration
US20170076972A1 (en) * 2015-09-15 2017-03-16 Veeco Instruments Inc. Planetary wafer carriers
CN206127421U (en) 2016-10-17 2017-04-26 安徽三安光电有限公司 Be applied to subassembly of MOCVD board cavity
USD793971S1 (en) * 2015-03-27 2017-08-08 Veeco Instruments Inc. Wafer carrier with a 14-pocket configuration
USD793972S1 (en) * 2015-03-27 2017-08-08 Veeco Instruments Inc. Wafer carrier with a 31-pocket configuration
USD797067S1 (en) * 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD813181S1 (en) * 2016-07-26 2018-03-20 Hitachi Kokusai Electric Inc. Cover of seal cap for reaction chamber of semiconductor

Patent Citations (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3461537A (en) 1965-11-23 1969-08-19 Telefunken Patent Separation of individual wafers of a semiconductor disc
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3845738A (en) 1973-09-12 1974-11-05 Rca Corp Vapor deposition apparatus with pyrolytic graphite heat shield
US3895967A (en) 1973-10-30 1975-07-22 Gen Electric Semiconductor device production
US4165584A (en) * 1977-01-27 1979-08-28 International Telephone And Telegraph Corporation Apparatus for lapping or polishing materials
JPS58128724A (en) 1982-01-27 1983-08-01 Hitachi Ltd Wafer inverting apparatus
US5242501A (en) 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
USD320361S (en) * 1989-06-02 1991-10-01 Tokyo Electron Limited Wafer probe plate holder
US5191738A (en) * 1989-06-16 1993-03-09 Shin-Etsu Handotai Co., Ltd. Method of polishing semiconductor wafer
USD325934S (en) * 1990-04-20 1992-05-05 Vinko Ramljak Holder for crayons, markers, pencils and the like
JPH04110466A (en) 1990-08-31 1992-04-10 Oki Electric Ind Co Ltd Wafer holder
US5152842A (en) 1991-12-05 1992-10-06 Rohm Co., Ltd. Reactor for epitaxial growth
US5690742A (en) 1994-09-06 1997-11-25 Komatsu Electronic Metals Co., Ltd. Susceptor for an epitaxial growth apparatus
EP0795624A1 (en) 1996-03-15 1997-09-17 STMicroelectronics S.A. Substrate holder for evaporation apparatus
US6001183A (en) 1996-06-10 1999-12-14 Emcore Corporation Wafer carriers for epitaxial growth processes
JPH10167886A (en) 1996-12-13 1998-06-23 Toyo Tanso Kk Susceptor for vapor growth
JPH10167885A (en) 1996-12-13 1998-06-23 Toyo Tanso Kk Susceptor for vapor growth
WO1999018599A2 (en) 1997-10-03 1999-04-15 Koninklijke Philips Electronics N.V. Holder for a semiconductor substrate, and method of manufacturing a semiconductor device using such a holder
US20020027762A1 (en) 1998-09-29 2002-03-07 Shinji Yamaguchi Electrostatic chuck
EP1096549A2 (en) 1999-10-29 2001-05-02 The Boc Group, Inc. Substrates support devices
US6436796B1 (en) 2000-01-31 2002-08-20 Mattson Technology, Inc. Systems and methods for epitaxial processing of a semiconductor substrate
US6666756B1 (en) 2000-03-31 2003-12-23 Lam Research Corporation Wafer carrier head assembly
US6492625B1 (en) 2000-09-27 2002-12-10 Emcore Corporation Apparatus and method for controlling temperature uniformity of substrates
US20030057089A1 (en) * 2000-12-01 2003-03-27 Tin Nguyen Disk carrier
US6506252B2 (en) 2001-02-07 2003-01-14 Emcore Corporation Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
US7276124B2 (en) 2001-06-07 2007-10-02 Veeco Instruments Inc. Reactor having a movable shutter
US6902623B2 (en) 2001-06-07 2005-06-07 Veeco Instruments Inc. Reactor having a movable shutter
WO2003069029A1 (en) 2002-02-15 2003-08-21 Lpe Spa A susceptor provided with indentations and an epitaxial reactor which uses the same
US8372204B2 (en) 2002-05-13 2013-02-12 Cree, Inc. Susceptor for MOCVD reactor
US7122844B2 (en) 2002-05-13 2006-10-17 Cree, Inc. Susceptor for MOCVD reactor
JP2004128271A (en) 2002-10-03 2004-04-22 Toyo Tanso Kk Susceptor
DE10261362A1 (en) 2002-12-30 2004-07-15 Osram Opto Semiconductors Gmbh Semiconductor substrate holder for epitaxial processes, has structure designed to equalize temperature over substrate placed on or near it
US8366830B2 (en) 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
US20040179323A1 (en) 2003-03-11 2004-09-16 Alon Litman Electrostatic chuck for wafer metrology and inspection equipment
US20050011436A1 (en) 2003-07-15 2005-01-20 Heng Liu Chemical vapor deposition reactor
US20050274374A1 (en) 2004-06-09 2005-12-15 Veeco Instruments Inc. System and method for increasing the emissivity of a material
USD517073S1 (en) 2004-07-14 2006-03-14 Capital One Financial Corporation Data card
JP2006066417A (en) 2004-08-24 2006-03-09 Ulvac Japan Ltd Electrostatic chuck and tray for substrate conveyance
US20060102081A1 (en) 2004-11-16 2006-05-18 Sumitomo Electric Industries, Ltd. Wafer Guide, MOCVD Equipment, and Nitride Semiconductor Growth Method
US7101272B2 (en) 2005-01-15 2006-09-05 Applied Materials, Inc. Carrier head for thermal drift compensation
JP5156240B2 (en) 2006-02-10 2013-03-06 ビーコ・インストゥルメンツ・インコーポレイテッド System and method for changing surface temperature of wafer by temperature compensation of wafer carrier
US8603248B2 (en) 2006-02-10 2013-12-10 Veeco Instruments Inc. System and method for varying wafer surface temperature via wafer-carrier temperature offset
US20070186853A1 (en) 2006-02-10 2007-08-16 Veeco Instruments Inc. System and method for varying wafer surface temperature via wafer-carrier temperature offset
KR100854974B1 (en) 2007-04-25 2008-08-28 (주)리드 Substrate carrier and apparatus for manufacturing of light emitting diode
US20100162957A1 (en) 2007-05-23 2010-07-01 Adam Boyd Device for coating a plurality of closest packed substrates arranged on a susceptor
US8092599B2 (en) 2007-07-10 2012-01-10 Veeco Instruments Inc. Movable injectors in rotating disc gas reactors
KR20090036722A (en) 2007-10-10 2009-04-15 주성엔지니어링(주) Substrate supporting plate and apparatus for depositing thin film having the same
KR20090038606A (en) 2007-10-16 2009-04-21 엘지이노텍 주식회사 Susceptor and fabrication method of semiconductor using thereof
US20090155028A1 (en) * 2007-12-12 2009-06-18 Veeco Instruments Inc. Wafer carrier with hub
US8021487B2 (en) 2007-12-12 2011-09-20 Veeco Instruments Inc. Wafer carrier with hub
US20090224175A1 (en) 2008-02-15 2009-09-10 Veeco Instruments Inc. Apparatus and Method for Batch Non-Contact Material Characterization
US9017483B2 (en) 2008-03-21 2015-04-28 Sumco Corporation Susceptor for vapor phase epitaxial growth device
US8182315B2 (en) 2008-03-24 2012-05-22 Phuong Van Nguyen Chemical mechanical polishing pad and dresser
US8093696B2 (en) 2008-05-16 2012-01-10 Qimonda Ag Semiconductor device
US20100055318A1 (en) 2008-08-29 2010-03-04 Veeco Instruments Inc. Wafer carrier with varying thermal resistance
US20100055320A1 (en) 2008-09-04 2010-03-04 Tokyo Electron Limited Film deposition apparatus, substrate processing apparatus, film deposition method and storage medium
US20100190418A1 (en) 2009-01-27 2010-07-29 Kai Yasuoka Lapping plate-conditioning grindstone segment, lapping plate-conditioning lapping machine, and method for conditioning lapping plate
US8552547B2 (en) 2009-03-13 2013-10-08 Xintec Inc. Electronic device package and method for forming the same
US8367477B2 (en) 2009-03-13 2013-02-05 Wen-Cheng Chien Electronic device package and method for forming the same
US8216379B2 (en) * 2009-04-23 2012-07-10 Applied Materials, Inc. Non-circular substrate holders
US20110290175A1 (en) 2009-06-07 2011-12-01 Veeco Instruments, Inc. Multi-Chamber CVD Processing System
US20110049779A1 (en) 2009-08-28 2011-03-03 Applied Materials, Inc. Substrate carrier design for improved photoluminescence uniformity
US8486726B2 (en) 2009-12-02 2013-07-16 Veeco Instruments Inc. Method for improving performance of a substrate carrier
CN102130035A (en) 2009-12-30 2011-07-20 塔工程有限公司 Integrated chip tray
US20110300297A1 (en) 2010-06-07 2011-12-08 Veeco Instruments Inc. Multi-wafer rotating disc reactor with inertial planetary drive
US20120040097A1 (en) 2010-08-13 2012-02-16 Veeco Instruments Inc. Enhanced wafer carrier
US8535445B2 (en) 2010-08-13 2013-09-17 Veeco Instruments Inc. Enhanced wafer carrier
WO2012021370A1 (en) 2010-08-13 2012-02-16 Veeco Instruments Inc. Enhanced wafer carrier
USD674759S1 (en) * 2010-08-19 2013-01-22 Epistar Corporation Wafer carrier
USD704155S1 (en) * 2010-08-19 2014-05-06 Epistar Corporation Wafer carrier
US20120156374A1 (en) 2010-12-15 2012-06-21 Veeco Instruments Inc. Sectional wafer carrier
US8562746B2 (en) 2010-12-15 2013-10-22 Veeco Instruments Inc. Sectional wafer carrier
US20160251758A1 (en) 2010-12-30 2016-09-01 Veeco Instruments Inc. Wafer processing with carrier extension
US20130291798A1 (en) 2011-01-14 2013-11-07 Wonik Ip Co., Ltd. Thin film deposition apparatus and substrate treatment system including the same
US20120234229A1 (en) 2011-03-16 2012-09-20 Applied Materials, Inc. Substrate support assembly for thin film deposition systems
US20120240859A1 (en) * 2011-03-22 2012-09-27 Chi Mei Lighting Technology Corp. Wafer susceptor and chemical vapor deposition apparatus
US20120272892A1 (en) 2011-04-07 2012-11-01 Veeco Instruments Inc. Metal-Organic Vapor Phase Epitaxy System and Process
KR101235928B1 (en) 2011-10-05 2013-02-21 전종근 Wafer tray for plasma processing apparatus
US8518753B2 (en) 2011-11-15 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Assembly method for three dimensional integrated circuit
US20130175005A1 (en) 2012-01-06 2013-07-11 Keerthi Gowdaru Adaptive heat transfer methods and systems for uniform heat transfer
CN103258763A (en) 2012-02-15 2013-08-21 沈阳拓荆科技有限公司 Wafer loading platform structure commonly used by wafers of different sizes
CN202492576U (en) 2012-02-20 2012-10-17 中微半导体设备(上海)有限公司 Chemical vapor deposition device
WO2013123859A1 (en) 2012-02-22 2013-08-29 光达光电设备科技(嘉兴)有限公司 Graphite plate, reaction chamber having same, and method for heating substrate
USD695241S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
USD695242S1 (en) * 2012-03-20 2013-12-10 Veeco Instruments Inc. Wafer carrier having pockets
USD686175S1 (en) * 2012-03-20 2013-07-16 Veeco Instruments Inc. Wafer carrier having pockets
USD686582S1 (en) * 2012-03-20 2013-07-23 Veeco Instruments Inc. Wafer carrier having pockets
USD690671S1 (en) * 2012-03-20 2013-10-01 Veeco Instruments Inc. Wafer carrier having pockets
US20130276704A1 (en) * 2012-04-18 2013-10-24 Sandeep Krishnan Wafter carrier for chemical vapor deposition systems
US20140110894A1 (en) 2012-10-22 2014-04-24 Samsung Electronics Co., Ltd. Wafer Carrier Having Cavity
US20150118009A1 (en) * 2012-12-03 2015-04-30 Xiamen Sanan Optoelectronics Technology Co., Ltd. Graphite Wafer Carrier for LED Epitaxial Wafer Processes
US20140261698A1 (en) * 2013-03-14 2014-09-18 Veeco Instruments Inc. Wafer carrier with temperature distribution control
US20140261187A1 (en) 2013-03-15 2014-09-18 Veeco Instruments, Inc. Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems
USD721417S1 (en) * 2013-04-11 2015-01-20 Canada Pipeline Accessories, Co., Ltd. Flow conditioner
US20140360430A1 (en) * 2013-06-05 2014-12-11 Veeco Instruments, Inc. Wafer carrier having thermal uniformity-enhancing features
US20170121847A1 (en) 2013-06-05 2017-05-04 Veeco Instruments Inc. Wafer carrier having thermal uniformity-enhancing features
CN203569186U (en) 2013-11-25 2014-04-30 中微半导体设备(上海)有限公司 Chemical vapor deposition device, substrate tray and rotary shaft
CN203569185U (en) 2013-11-25 2014-04-30 中微半导体设备(上海)有限公司 Chemical vapor deposition device, substrate tray and rotary shaft
CN203715721U (en) 2013-11-25 2014-07-16 中微半导体设备(上海)有限公司 Chemical vapor deposition device and rotating shaft
US20150187620A1 (en) 2013-12-26 2015-07-02 Veeco Instruments Inc. Water Carrier Having Thermal Cover for Chemical Vapor Deposition Systems
USD754785S1 (en) * 2014-01-22 2016-04-26 Karen Theresa Gibson Musical steel pan with drum sticks
US20150330601A1 (en) 2014-05-16 2015-11-19 The Boeing Company Optical Filtering System for Solar Cell Testing
USD731409S1 (en) 2014-06-26 2015-06-09 Water Technology Llc Surface ornamentation for a passive solar heating article
CN105369348A (en) 2014-08-29 2016-03-02 中微半导体设备(上海)有限公司 Wafer carrier plate for MOCVD reaction system
TWM496228U (en) 2014-10-28 2015-02-21 Advanced System Technology Co Ltd Wafer tray structure
TW201624605A (en) 2014-12-31 2016-07-01 Advanced Micro Fab Equip Inc Wafer tray
CN105810625A (en) 2014-12-31 2016-07-27 中微半导体设备(上海)有限公司 Wafer tray
CN105810626A (en) 2014-12-31 2016-07-27 中微半导体设备(上海)有限公司 Wafer pallet
TW201624596A (en) 2014-12-31 2016-07-01 Advanced Micro Fab Equip Inc Wafer tray
USD793972S1 (en) * 2015-03-27 2017-08-08 Veeco Instruments Inc. Wafer carrier with a 31-pocket configuration
USD793971S1 (en) * 2015-03-27 2017-08-08 Veeco Instruments Inc. Wafer carrier with a 14-pocket configuration
TWD181305S (en) 2015-04-16 2017-02-11 維克儀器公司 Wafer carrier
TWD181306S (en) 2015-04-16 2017-02-11 維克儀器公司 Wafer carrier
USD778247S1 (en) * 2015-04-16 2017-02-07 Veeco Instruments Inc. Wafer carrier with a multi-pocket configuration
TWM531049U (en) 2015-04-16 2016-10-21 維克儀器公司 Wafer carrier with a thirty-four pocket configuration
USD806046S1 (en) * 2015-04-16 2017-12-26 Veeco Instruments Inc. Wafer carrier with a multi-pocket configuration
USD797067S1 (en) * 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
CN204982132U (en) 2015-09-06 2016-01-20 中微半导体设备(上海)有限公司 Chemical vapor deposition or epitaxial layer growth reaction ware and substrate tray and back shaft thereof
US20170076972A1 (en) * 2015-09-15 2017-03-16 Veeco Instruments Inc. Planetary wafer carriers
USD813181S1 (en) * 2016-07-26 2018-03-20 Hitachi Kokusai Electric Inc. Cover of seal cap for reaction chamber of semiconductor
CN206127421U (en) 2016-10-17 2017-04-26 安徽三安光电有限公司 Be applied to subassembly of MOCVD board cavity

Non-Patent Citations (20)

* Cited by examiner, † Cited by third party
Title
Application and file history for U.S. Appl. No. 14/297,244, filed Jun. 5, 2014. Inventors: Armour et al.
Application and file history for U.S. Appl. No. 14/583,346, filed Dec. 26, 2014. Inventors: Guruary et al.
Application and file history for U.S. Appl. No. 15/403,709, filed Jan. 11, 2017. Inventors: Armour et al.
Application and file history for U.S. Appl. No. 29/627,938, filed Nov. 30, 2017. Inventors: Rashkovsky et al.
Application and file history for U.S. Appl. No. 29/627,940, filed Nov. 30, 2017. Inventors: Rashkovsky et al.
Application and file history for U.S. Appl. No. 29/641,924, filed Mar. 26, 2018. Inventors: Krishnan et al.
Application and file history for U.S. Appl. No. 29/641,925, filed Mar. 26, 2018. Inventors Krishnan et al.
Application and file history for U.S. Appl. No. 29/641,927, filed Mar. 26, 2018. Inventors: Krishnan et al.
Application and file history for U.S. Appl. No. 29/641,928, filed Mar. 16, 2018. Inventors: Krishnan et al.
Application and file history for U.S. Appl. No. 29/641,930, filed Mar. 26, 2018. Inventors: Krishnan et al.
Application and file history for U.S. Appl. No. 29/641,931, filed Mar. 26, 2018. Inventors: Krishnan et al.
Application No. PCT/US2011/0456567, Search Report dated Dec. 21, 2011, 6 pages.
Application No. PCT/US2014/041134, Written Opinion and Search Report dated Oct. 7, 2014, 11 pages.
Application No. PCT/US2014/072425, filed Dec. 26, 2014, International Search Report dated Apr. 29, 2015, 3 pages.
Application No. PCT/US2014/072425, filed Dec. 26, 2014, Written Opinion dated Apr. 29, 2015, 7 pages.
Gurary et al., "Investigation of the Wafer Temperature Uniformity in an OMVPE Vertical Rotating Disk Reactor," Journal of Electronic Material, Nov. 1995, vol. 24, Issue 11, Abstract, 1 page.
International Written Opinion and Search Report for International Application No. PCT/US2011/061615 dated May 18, 2012, 9 pages.
Taiwan Application No. 103145394, Search Report dated Jan. 9, 2018, 9 page.
Taiwan Application No. 106307693, Office Action dated Jun. 8, 2018, 2 pages.
Taiwan Application No. 106307693D01, Search Report dated May 5, 2018, 1 page.

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