JP2022066392A5 - - Google Patents
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- JP2022066392A5 JP2022066392A5 JP2022033068A JP2022033068A JP2022066392A5 JP 2022066392 A5 JP2022066392 A5 JP 2022066392A5 JP 2022033068 A JP2022033068 A JP 2022033068A JP 2022033068 A JP2022033068 A JP 2022033068A JP 2022066392 A5 JP2022066392 A5 JP 2022066392A5
- Authority
- JP
- Japan
- Prior art keywords
- mask assembly
- pellicle frame
- submount
- patterning device
- movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000059 patterning Methods 0.000 claims 12
- 230000000295 complement effect Effects 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023117230A JP7509969B2 (ja) | 2014-11-17 | 2023-07-19 | マスクアセンブリ |
| JP2024099760A JP2024111212A (ja) | 2014-11-17 | 2024-06-20 | マスクアセンブリ |
Applications Claiming Priority (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462080561P | 2014-11-17 | 2014-11-17 | |
| US62/080,561 | 2014-11-17 | ||
| US201562108348P | 2015-01-27 | 2015-01-27 | |
| US62/108,348 | 2015-01-27 | ||
| US201562110841P | 2015-02-02 | 2015-02-02 | |
| US62/110,841 | 2015-02-02 | ||
| US201562126173P | 2015-02-27 | 2015-02-27 | |
| US62/126,173 | 2015-02-27 | ||
| US201562149176P | 2015-04-17 | 2015-04-17 | |
| US62/149,176 | 2015-04-17 | ||
| US201562183342P | 2015-06-23 | 2015-06-23 | |
| US62/183,342 | 2015-06-23 | ||
| JP2020127414A JP7037606B2 (ja) | 2014-11-17 | 2020-07-28 | マスクアセンブリ |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020127414A Division JP7037606B2 (ja) | 2014-11-17 | 2020-07-28 | マスクアセンブリ |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023117230A Division JP7509969B2 (ja) | 2014-11-17 | 2023-07-19 | マスクアセンブリ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022066392A JP2022066392A (ja) | 2022-04-28 |
| JP2022066392A5 true JP2022066392A5 (enExample) | 2022-06-15 |
| JP7318040B2 JP7318040B2 (ja) | 2023-07-31 |
Family
ID=54542272
Family Applications (10)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017522491A Active JP6837433B2 (ja) | 2014-11-17 | 2015-11-16 | ペリクル取り付け装置及びペリクル取り付け方法 |
| JP2017522010A Active JP6769954B2 (ja) | 2014-11-17 | 2015-11-16 | マスクアセンブリ |
| JP2019209301A Active JP6882431B2 (ja) | 2014-11-17 | 2019-11-20 | ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法 |
| JP2020127414A Active JP7037606B2 (ja) | 2014-11-17 | 2020-07-28 | マスクアセンブリ |
| JP2021018959A Active JP7123206B2 (ja) | 2014-11-17 | 2021-02-09 | ペリクル取り付け装置及びペリクル取り付け方法 |
| JP2022033068A Active JP7318040B2 (ja) | 2014-11-17 | 2022-03-04 | マスクアセンブリ |
| JP2022127298A Active JP7438287B2 (ja) | 2014-11-17 | 2022-08-09 | 装置 |
| JP2023117230A Active JP7509969B2 (ja) | 2014-11-17 | 2023-07-19 | マスクアセンブリ |
| JP2024019495A Active JP7689216B2 (ja) | 2014-11-17 | 2024-02-13 | スタッド取り付け装置及びスタッド取り付け方法 |
| JP2024099760A Pending JP2024111212A (ja) | 2014-11-17 | 2024-06-20 | マスクアセンブリ |
Family Applications Before (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017522491A Active JP6837433B2 (ja) | 2014-11-17 | 2015-11-16 | ペリクル取り付け装置及びペリクル取り付け方法 |
| JP2017522010A Active JP6769954B2 (ja) | 2014-11-17 | 2015-11-16 | マスクアセンブリ |
| JP2019209301A Active JP6882431B2 (ja) | 2014-11-17 | 2019-11-20 | ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法 |
| JP2020127414A Active JP7037606B2 (ja) | 2014-11-17 | 2020-07-28 | マスクアセンブリ |
| JP2021018959A Active JP7123206B2 (ja) | 2014-11-17 | 2021-02-09 | ペリクル取り付け装置及びペリクル取り付け方法 |
Family Applications After (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022127298A Active JP7438287B2 (ja) | 2014-11-17 | 2022-08-09 | 装置 |
| JP2023117230A Active JP7509969B2 (ja) | 2014-11-17 | 2023-07-19 | マスクアセンブリ |
| JP2024019495A Active JP7689216B2 (ja) | 2014-11-17 | 2024-02-13 | スタッド取り付け装置及びスタッド取り付け方法 |
| JP2024099760A Pending JP2024111212A (ja) | 2014-11-17 | 2024-06-20 | マスクアセンブリ |
Country Status (9)
| Country | Link |
|---|---|
| US (5) | US10558129B2 (enExample) |
| EP (4) | EP4286941A3 (enExample) |
| JP (10) | JP6837433B2 (enExample) |
| KR (7) | KR102589077B1 (enExample) |
| CN (5) | CN107172884B (enExample) |
| CA (4) | CA3206173A1 (enExample) |
| NL (2) | NL2015795A (enExample) |
| TW (4) | TWI679491B (enExample) |
| WO (2) | WO2016079052A2 (enExample) |
Families Citing this family (75)
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| WO2016079052A2 (en) | 2014-11-17 | 2016-05-26 | Asml Netherlands B.V. | Apparatus |
| WO2017102378A1 (en) | 2015-12-14 | 2017-06-22 | Asml Netherlands B.V. | A membrane assembly |
| US11320731B2 (en) | 2015-12-14 | 2022-05-03 | Asml Netherlands B.V. | Membrane for EUV lithography |
| KR102186010B1 (ko) * | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | Euv 펠리클 구조체, 및 그 제조 방법 |
| CN114942566A (zh) | 2016-04-25 | 2022-08-26 | Asml荷兰有限公司 | 用于euv光刻术的隔膜 |
| CN116609996A (zh) | 2016-07-05 | 2023-08-18 | 三井化学株式会社 | 防护膜及其组件和组件框体、组件制造方法、曝光原版、曝光装置、半导体装置的制造方法 |
| KR102483397B1 (ko) * | 2016-07-29 | 2022-12-29 | 에이에스엠엘 홀딩 엔.브이. | 멤브레인 조립체 및 입자 트랩 |
| JP6607574B2 (ja) * | 2016-08-24 | 2019-11-20 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
| KR101848153B1 (ko) * | 2016-09-12 | 2018-05-29 | 한양대학교 산학협력단 | 마스크 보호 모듈, 이를 포함하는 펠리클, 및 이를 포함하는 리소그래피 장치 |
| KR102237878B1 (ko) | 2017-02-17 | 2021-04-07 | 미쯔이가가꾸가부시끼가이샤 | 펠리클, 노광 원판, 노광 장치 및 반도체 장치의 제조 방법 |
| US11183410B2 (en) * | 2017-04-24 | 2021-11-23 | Photronics, Inc. | Pellicle removal tool |
| NL2021084B1 (en) | 2017-06-15 | 2019-03-27 | Asml Netherlands Bv | Pellicle and Pellicle Assembly |
| US11143952B2 (en) | 2017-09-28 | 2021-10-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle removal method |
| CN119414654A (zh) * | 2017-10-27 | 2025-02-11 | Asml荷兰有限公司 | 表膜框架和表膜组件 |
| US11106127B2 (en) | 2017-11-08 | 2021-08-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure of pellicle-mask structure with vent structure |
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| JP6921412B2 (ja) * | 2018-01-25 | 2021-08-18 | 株式会社ブイ・テクノロジー | ペリクルフレーム把持装置及びペリクルフレーム把持方法 |
| EP3530511B1 (de) * | 2018-02-27 | 2020-05-27 | Joseph Vögele AG | Verfahren zum rekonfigurieren einer bedienanordnung für eine baumaschine |
| CN112088334B (zh) * | 2018-03-05 | 2024-08-27 | 三井化学株式会社 | 防护膜组件、曝光原版、曝光装置及半导体装置的制造方法 |
| JP7019472B2 (ja) * | 2018-03-22 | 2022-02-15 | 三井化学株式会社 | カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法 |
| JP7061494B2 (ja) * | 2018-03-28 | 2022-04-28 | 三井化学株式会社 | 検査方法、ペリクルの製造方法、および検査装置 |
| CA3105488A1 (en) | 2018-07-04 | 2020-01-09 | Asml Netherlands B.V. | Apparatus for positioning and clamped curing |
| CN108950475B (zh) * | 2018-07-25 | 2020-11-10 | 京东方科技集团股份有限公司 | 张网结构、张网装置及张网方法 |
| US11016383B2 (en) * | 2018-08-31 | 2021-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| CN112771446B (zh) | 2018-09-28 | 2024-12-20 | Asml荷兰有限公司 | 光刻系统和方法 |
| WO2020099072A1 (en) | 2018-11-16 | 2020-05-22 | Asml Netherlands B.V. | A pellicle for euv lithography |
| KR102243367B1 (ko) * | 2018-11-30 | 2021-04-23 | 한양대학교 산학협력단 | 펠리클 홀더, 펠리클 검사 장치, 및 펠리클 검사 방법 |
| US11137693B2 (en) * | 2018-11-30 | 2021-10-05 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Pellicle holder, pellicle inspection apparatus, and pellicle inspection method |
| JP7104856B2 (ja) * | 2018-12-10 | 2022-07-21 | アプライド マテリアルズ インコーポレイテッド | 極端紫外線リソグラフィ用途におけるフォトマスクからの取付具取り外し |
| EP3671342B1 (en) * | 2018-12-20 | 2021-03-17 | IMEC vzw | Induced stress for euv pellicle tensioning |
| KR102172722B1 (ko) | 2018-12-26 | 2020-11-02 | 주식회사 에프에스티 | 초극자외선 리소그라피용 펠리클의 검사에 사용되는 캡슐 |
| KR20200088528A (ko) | 2019-01-14 | 2020-07-23 | 주식회사 에프에스티 | 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법 |
| KR20200088529A (ko) | 2019-01-14 | 2020-07-23 | 주식회사 에프에스티 | 초극자외선 리소그라피용 펠리클 검사 시스템 |
| CN113853550B (zh) * | 2019-02-28 | 2025-08-05 | Asml荷兰有限公司 | 用于组装掩模版组件的设备 |
| WO2020182637A1 (en) * | 2019-03-13 | 2020-09-17 | Asml Holding N.V. | Electrostatic clamp for a lithographic apparatus |
| NL2025186B1 (en) | 2019-04-12 | 2021-02-23 | Asml Netherlands Bv | Pellicle for euv lithography |
| KR102242356B1 (ko) * | 2019-08-05 | 2021-04-20 | 주식회사 에프에스티 | 일체화된 프레임과 멤브레인을 포함하는 펠리클, 그 제조방법, 펠리클을 포함하는 노광장치 및 펠리클의 제조장치 |
| KR102273266B1 (ko) * | 2019-10-23 | 2021-07-06 | 주식회사 에프에스티 | 일체화된 프레임과 멤브레인을 포함하는 펠리클의 제조방법 |
| US11448957B2 (en) * | 2020-03-13 | 2022-09-20 | Samsung Electronics Co., Ltd. | Pellicle transfer apparatus and method |
| NL2027834B1 (en) | 2020-04-23 | 2022-09-08 | Asml Netherlands Bv | Pellicle frame for euv lithography |
| TWI760062B (zh) * | 2020-05-14 | 2022-04-01 | 家登精密工業股份有限公司 | 提供有保持銷組件之光罩盒及固持光罩的方法 |
| TWM622366U (zh) * | 2020-06-04 | 2022-01-21 | 日商信越化學工業股份有限公司 | 防護薄膜框架、防護薄膜、帶防護薄膜的曝光原版、曝光裝置、曝光系統、半導體的製造系統及液晶顯示板的製造系統 |
| WO2021251157A1 (ja) * | 2020-06-08 | 2021-12-16 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 |
| US11822230B2 (en) * | 2020-07-24 | 2023-11-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV pellicle and mounting method thereof on photo mask |
| CN115836248A (zh) * | 2020-08-06 | 2023-03-21 | 三井化学株式会社 | 防护膜组件、曝光原版、曝光装置、防护膜组件的制造方法和半导体装置的制造方法 |
| WO2022042993A1 (en) * | 2020-08-24 | 2022-03-03 | Asml Netherlands B.V. | Apparatus and method for processing a reticle and pellicle assembly |
| JP2023544099A (ja) * | 2020-09-17 | 2023-10-20 | リンテック オブ アメリカ インク | ナノファイバーフィルム張力制御 |
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| KR102668456B1 (ko) | 2020-12-07 | 2024-05-23 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 |
| KR102512243B1 (ko) | 2020-12-16 | 2023-03-21 | 주식회사 에프에스티 | 극자외선 리소그라피용 다공성 펠리클 프레임 |
| JP7734308B2 (ja) * | 2020-12-17 | 2025-09-05 | エムイー２－ファクトリー・ゲーエムベーハー | 少なくとも１つの結合要素を伴うイオン注入システムのためのエネルギーフィルタ組立体 |
| KR102581084B1 (ko) | 2021-02-04 | 2023-09-21 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 |
| KR102279897B1 (ko) | 2021-02-18 | 2021-07-21 | 주식회사 에프에스티 | 다액형 경화성 조성물의 도포 방법 |
| KR102581086B1 (ko) | 2021-03-16 | 2023-09-21 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 막 |
| KR20220148472A (ko) * | 2021-04-29 | 2022-11-07 | 주식회사 에프에스티 | 펠리클 조립체 |
| KR102624936B1 (ko) | 2021-05-21 | 2024-01-15 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 및 극자외선 리소그라피용 펠리클 프레임용 실링재 |
| KR102662985B1 (ko) * | 2021-06-30 | 2024-05-03 | 주식회사 에프에스티 | 펠리클 조립체 |
| US12386252B2 (en) | 2021-08-26 | 2025-08-12 | Mitsui Chemicals, Inc. | Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film |
| KR102691250B1 (ko) | 2021-09-14 | 2024-08-05 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법 |
| WO2023110313A1 (en) | 2021-12-17 | 2023-06-22 | Asml Netherlands B.V. | Method and system for preventing degradation of a material of an optical component for euv-lithography |
| JPWO2023182186A1 (enExample) * | 2022-03-23 | 2023-09-28 | ||
| CA3247367A1 (en) | 2022-04-05 | 2023-10-12 | Asml Netherlands B.V. | EUV LITHOGRAPH FILM |
| EP4273626A1 (en) | 2022-05-04 | 2023-11-08 | ASML Netherlands B.V. | Device and method for measuring contamination and lithographic apparatus provided with said device |
| CN115032860A (zh) * | 2022-06-08 | 2022-09-09 | 豪威集成电路(成都)有限公司 | 光罩及半导体晶圆的制造方法 |
| EP4336258A1 (en) * | 2022-09-12 | 2024-03-13 | ASML Netherlands B.V. | Pellicle and methods for forming pellicle for use in a lithographic apparatus |
| WO2024056548A1 (en) * | 2022-09-12 | 2024-03-21 | Asml Netherlands B.V. | Pellicle and methods for forming pellicle for use in a lithographic apparatus |
| KR102690337B1 (ko) * | 2022-12-19 | 2024-08-05 | 주식회사 에프에스티 | 3d 탄성 픽스쳐를 포함하는 펠리클 마운팅 어셈블리 및 이를 이용한 펠리클 마운팅 방법과 이를 이용한 펠리클 디 마운팅 방법, 이를 포함한 euv 노광 장치 |
| CN120731396A (zh) | 2023-03-06 | 2025-09-30 | Asml荷兰有限公司 | 允许表膜与图案形成装置之间的区域中压力增加的、用于支撑光刻设备中的表膜的系统 |
| CN116609958B (zh) * | 2023-05-17 | 2025-09-19 | 安徽晶海纳光电科技有限公司 | 一种化学气相沉积工艺用的扩散板整形装置及整形方法 |
| US12399440B2 (en) * | 2023-06-02 | 2025-08-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography system and methods |
| KR102834398B1 (ko) * | 2023-07-28 | 2025-07-15 | 주식회사 에프에스티 | 교체형 멤브레인을 포함하는 euv 펠리클, 이를 포함하는 euv 노광 장치 및 euv 펠리클에서 멤브레인의 마운팅 및 디마운팅 방법 |
| KR102687699B1 (ko) * | 2023-08-18 | 2024-07-24 | 주식회사 에프에스티 | 응력 완충구조를 구비하는 euv 펠리클의 마운팅 블록, 마운팅 블록을 포함하는 euv 펠리클 구조체, euv 펠리클 구조체를 포함하는 euv 노광 장치 및 euv 펠리클의 마운팅 및 디마운팅 방법 |
| KR102877472B1 (ko) * | 2023-09-26 | 2025-10-29 | 주식회사 에프에스티 | Euv 펠리클의 디마운팅 장치 및 이를 이용한 euv 펠리클의 디마운팅 방법 |
| US20250102903A1 (en) * | 2023-09-27 | 2025-03-27 | Intel Corporation | Euv mask and pellicle assembly |
| TW202530851A (zh) | 2024-01-17 | 2025-08-01 | 韓商Ｓ＆Ｓ技術股份有限公司 | 光罩安裝護膜用之框組件 |
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2015
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