JP6837433B2 - ペリクル取り付け装置及びペリクル取り付け方法 - Google Patents

ペリクル取り付け装置及びペリクル取り付け方法 Download PDF

Info

Publication number
JP6837433B2
JP6837433B2 JP2017522491A JP2017522491A JP6837433B2 JP 6837433 B2 JP6837433 B2 JP 6837433B2 JP 2017522491 A JP2017522491 A JP 2017522491A JP 2017522491 A JP2017522491 A JP 2017522491A JP 6837433 B2 JP6837433 B2 JP 6837433B2
Authority
JP
Japan
Prior art keywords
pellicle
frame
stud
arm
patterning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017522491A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017534078A (ja
Inventor
デル メーレン，フリッツ ヴァン
デル メーレン，フリッツ ヴァン
ヤンセン，マールテン，マティス，マリヌス
リマ，ジョージ，マヌエル アゼレード
リマ，ジョージ，マヌエル アゼレード
ブラウンス，デルク，ゼルヴァーティウス，ゲートルダ
ブルーイン，マルク
デッカーズ，ジェロエン
ヤンセン，ポール
クラメル，ロナルド，ハルム，ギュンター
クリュイツィンガ，マティアス
ランスバーゲン，ロバート，ガブリエル，マリア
リーンダース，マルチヌス，ヘンドリカス，アントニアス
ループストラ，エリック，ロエロフ
デン ボッシュ，ゲリット ヴァン
デン ボッシュ，ゲリット ヴァン
ロー，ジュローム，フランソワ，シルヴァン，ヴィルジール ヴァン
ロー，ジュローム，フランソワ，シルヴァン，ヴィルジール ヴァン
フェルブルッヘ，ベアトリス，ルイーズ，マリー−ヨセフ，カトリーン
クラーク，アンジェロ，シーザー，ピーター デ
クラーク，アンジェロ，シーザー，ピーター デ
ディングス，ジャコバス，マリア
ヤンセン，モーリス，レオナルダス，ヨハンネス
カーズテンズ，ロナルド，ジャコバス，ヨハンネス
ケスターズ，マルチヌス，ヨーゼフ，マリア
ルース，マイケル
ミデル，ヘールツ
レイジンデルス，シルベスター，マテウス
トイアーゼイト，フランク，ヨハンネス，クリスティアーン
リーヴェンオーゲン，アン，ヨハンネス，ウィルヘルムス ヴァン
リーヴェンオーゲン，アン，ヨハンネス，ウィルヘルムス ヴァン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of JP2017534078A publication Critical patent/JP2017534078A/ja
Application granted granted Critical
Publication of JP6837433B2 publication Critical patent/JP6837433B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Regulation And Control Of Combustion (AREA)
JP2017522491A 2014-11-17 2015-11-16 ペリクル取り付け装置及びペリクル取り付け方法 Active JP6837433B2 (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23
PCT/EP2015/076688 WO2016079052A2 (en) 2014-11-17 2015-11-16 Apparatus

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2019209301A Division JP6882431B2 (ja) 2014-11-17 2019-11-20 ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法
JP2021018959A Division JP7123206B2 (ja) 2014-11-17 2021-02-09 ペリクル取り付け装置及びペリクル取り付け方法

Publications (2)

Publication Number Publication Date
JP2017534078A JP2017534078A (ja) 2017-11-16
JP6837433B2 true JP6837433B2 (ja) 2021-03-03

Family

ID=54542272

Family Applications (10)

Application Number Title Priority Date Filing Date
JP2017522010A Active JP6769954B2 (ja) 2014-11-17 2015-11-16 マスクアセンブリ
JP2017522491A Active JP6837433B2 (ja) 2014-11-17 2015-11-16 ペリクル取り付け装置及びペリクル取り付け方法
JP2019209301A Active JP6882431B2 (ja) 2014-11-17 2019-11-20 ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法
JP2020127414A Active JP7037606B2 (ja) 2014-11-17 2020-07-28 マスクアセンブリ
JP2021018959A Active JP7123206B2 (ja) 2014-11-17 2021-02-09 ペリクル取り付け装置及びペリクル取り付け方法
JP2022033068A Active JP7318040B2 (ja) 2014-11-17 2022-03-04 マスクアセンブリ
JP2022127298A Active JP7438287B2 (ja) 2014-11-17 2022-08-09 装置
JP2023117230A Active JP7509969B2 (ja) 2014-11-17 2023-07-19 マスクアセンブリ
JP2024019495A Active JP7689216B2 (ja) 2014-11-17 2024-02-13 スタッド取り付け装置及びスタッド取り付け方法
JP2024099760A Pending JP2024111212A (ja) 2014-11-17 2024-06-20 マスクアセンブリ

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2017522010A Active JP6769954B2 (ja) 2014-11-17 2015-11-16 マスクアセンブリ

Family Applications After (8)

Application Number Title Priority Date Filing Date
JP2019209301A Active JP6882431B2 (ja) 2014-11-17 2019-11-20 ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法
JP2020127414A Active JP7037606B2 (ja) 2014-11-17 2020-07-28 マスクアセンブリ
JP2021018959A Active JP7123206B2 (ja) 2014-11-17 2021-02-09 ペリクル取り付け装置及びペリクル取り付け方法
JP2022033068A Active JP7318040B2 (ja) 2014-11-17 2022-03-04 マスクアセンブリ
JP2022127298A Active JP7438287B2 (ja) 2014-11-17 2022-08-09 装置
JP2023117230A Active JP7509969B2 (ja) 2014-11-17 2023-07-19 マスクアセンブリ
JP2024019495A Active JP7689216B2 (ja) 2014-11-17 2024-02-13 スタッド取り付け装置及びスタッド取り付け方法
JP2024099760A Pending JP2024111212A (ja) 2014-11-17 2024-06-20 マスクアセンブリ

Country Status (9)

Country Link
US (5) US10558129B2 (enExample)
EP (4) EP4296778A3 (enExample)
JP (10) JP6769954B2 (enExample)
KR (7) KR102634793B1 (enExample)
CN (5) CN115840333A (enExample)
CA (4) CA3177744A1 (enExample)
NL (2) NL2015796A (enExample)
TW (4) TWI724622B (enExample)
WO (2) WO2016079051A2 (enExample)

Families Citing this family (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4296778A3 (en) 2014-11-17 2024-03-27 ASML Netherlands B.V. Mask assembly
EP3391138A1 (en) 2015-12-14 2018-10-24 ASML Netherlands B.V. A membrane for euv lithography
EP3391140A1 (en) * 2015-12-14 2018-10-24 ASML Netherlands B.V. A membrane assembly
KR102186010B1 (ko) * 2016-01-26 2020-12-04 한양대학교 산학협력단 Euv 펠리클 구조체, 및 그 제조 방법
KR102719334B1 (ko) 2016-04-25 2024-10-21 에이에스엠엘 네델란즈 비.브이. Euv 리소그래피를 위한 멤브레인
EP3483655A4 (en) * 2016-07-05 2020-02-26 Mitsui Chemicals, Inc. FILM FILM, FILM FRAME, FILM, PRODUCTION METHOD THEREOF, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
KR102483397B1 (ko) * 2016-07-29 2022-12-29 에이에스엠엘 홀딩 엔.브이. 멤브레인 조립체 및 입자 트랩
JP6607574B2 (ja) * 2016-08-24 2019-11-20 信越化学工業株式会社 ペリクルフレーム及びペリクル
KR101848153B1 (ko) * 2016-09-12 2018-05-29 한양대학교 산학협력단 마스크 보호 모듈, 이를 포함하는 펠리클, 및 이를 포함하는 리소그래피 장치
CN110325908A (zh) 2017-02-17 2019-10-11 三井化学株式会社 防护膜组件、曝光原版、曝光装置及半导体装置的制造方法
US11183410B2 (en) * 2017-04-24 2021-11-23 Photronics, Inc. Pellicle removal tool
CN110809736B (zh) 2017-06-15 2023-10-24 Asml荷兰有限公司 表膜和表膜组件
US11143952B2 (en) 2017-09-28 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle removal method
US11314163B2 (en) * 2017-10-27 2022-04-26 Asml Netherlands B.V. Pellicle frame and pellicle assembly
US11106127B2 (en) 2017-11-08 2021-08-31 Taiwan Semiconductor Manufacturing Co., Ltd. Structure of pellicle-mask structure with vent structure
KR20200087774A (ko) * 2017-11-21 2020-07-21 에이에스엠엘 네델란즈 비.브이. 다공성 그래파이트 펠리클
JP6921412B2 (ja) * 2018-01-25 2021-08-18 株式会社ブイ・テクノロジー ペリクルフレーム把持装置及びペリクルフレーム把持方法
PL3530511T3 (pl) * 2018-02-27 2020-11-16 Joseph Vögele AG Sposób rekonfiguracji układu operacyjnego dla maszyny budowlanej
WO2019172141A1 (ja) * 2018-03-05 2019-09-12 三井化学株式会社 ペリクル、露光原版、露光装置、及び半導体装置の製造方法
JP7019472B2 (ja) * 2018-03-22 2022-02-15 三井化学株式会社 カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法
JP7061494B2 (ja) * 2018-03-28 2022-04-28 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置
CA3105488A1 (en) 2018-07-04 2020-01-09 Asml Netherlands B.V. Apparatus for positioning and clamped curing
CN108950475B (zh) * 2018-07-25 2020-11-10 京东方科技集团股份有限公司 张网结构、张网装置及张网方法
US11016383B2 (en) * 2018-08-31 2021-05-25 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle for an EUV lithography mask and a method of manufacturing thereof
WO2020064217A1 (en) 2018-09-28 2020-04-02 Asml Netherlands B.V. Lithographic system and method
NL2024075B1 (en) 2018-11-16 2020-08-19 Asml Netherlands Bv A pellicle for euv lithography
KR102243367B1 (ko) * 2018-11-30 2021-04-23 한양대학교 산학협력단 펠리클 홀더, 펠리클 검사 장치, 및 펠리클 검사 방법
US11137693B2 (en) * 2018-11-30 2021-10-05 Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) Pellicle holder, pellicle inspection apparatus, and pellicle inspection method
KR20240104185A (ko) * 2018-12-10 2024-07-04 어플라이드 머티어리얼스, 인코포레이티드 극자외선 리소그래피 애플리케이션에서 포토마스크로부터의 부착 피처 제거
EP3671342B1 (en) * 2018-12-20 2021-03-17 IMEC vzw Induced stress for euv pellicle tensioning
KR102172722B1 (ko) 2018-12-26 2020-11-02 주식회사 에프에스티 초극자외선 리소그라피용 펠리클의 검사에 사용되는 캡슐
KR20200088528A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법
KR20200088529A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 초극자외선 리소그라피용 펠리클 검사 시스템
WO2020173892A2 (en) 2019-02-28 2020-09-03 Asml Netherlands B.V. Apparatus for assembly of a reticle assembly
CN113557475B (zh) * 2019-03-13 2024-09-17 Asml控股股份有限公司 用于光刻设备的静电夹具
CN113646697A (zh) 2019-04-12 2021-11-12 Asml荷兰有限公司 用于euv光刻的表膜
KR102242356B1 (ko) * 2019-08-05 2021-04-20 주식회사 에프에스티 일체화된 프레임과 멤브레인을 포함하는 펠리클, 그 제조방법, 펠리클을 포함하는 노광장치 및 펠리클의 제조장치
KR102273266B1 (ko) * 2019-10-23 2021-07-06 주식회사 에프에스티 일체화된 프레임과 멤브레인을 포함하는 펠리클의 제조방법
KR102898051B1 (ko) * 2020-03-13 2025-12-10 삼성전자주식회사 펠리클 전사 장치 및 펠리클 전사 방법
KR102873574B1 (ko) * 2020-04-23 2025-10-21 에이에스엠엘 네델란즈 비.브이. Euv 리소그래피용 펠리클 프레임
TWI760062B (zh) * 2020-05-14 2022-04-01 家登精密工業股份有限公司 提供有保持銷組件之光罩盒及固持光罩的方法
CN215932363U (zh) * 2020-06-04 2022-03-01 信越化学工业株式会社 防护薄膜框架、防护薄膜及包括其的装置及系统
EP4163720A4 (en) * 2020-06-08 2024-08-14 Shin-Etsu Chemical Co., Ltd. FILM FRAME, FILM, EXPOSURE ORIGINAL PLATE WITH FILM, EXPOSURE METHOD, SEMICONDUCTOR MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY PANEL MANUFACTURING METHOD
US11822230B2 (en) 2020-07-24 2023-11-21 Taiwan Semiconductor Manufacturing Company, Ltd. EUV pellicle and mounting method thereof on photo mask
KR20230014781A (ko) * 2020-08-06 2023-01-30 미쯔이가가꾸가부시끼가이샤 펠리클, 노광 원판, 노광 장치, 펠리클의 제조 방법 및 반도체 장치의 제조 방법
US20230314930A1 (en) * 2020-08-24 2023-10-05 Asml Netherlands B.V. Apparatus and method for processing a reticle and pellicle assembly
KR20230066590A (ko) * 2020-09-17 2023-05-16 린텍 오브 아메리카, 인크. 나노섬유 필름 인장 제어
KR20220043268A (ko) 2020-09-29 2022-04-05 삼성전자주식회사 온도/압력이 독립으로 제어되는 스터드 부착 장치 및 스터드 부착 방법
KR102668456B1 (ko) 2020-12-07 2024-05-23 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102512243B1 (ko) 2020-12-16 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 다공성 펠리클 프레임
WO2022128593A1 (en) * 2020-12-17 2022-06-23 mi2-factory GmbH Energy filter assembly for ion implantation system with at least one coupling element
KR102581084B1 (ko) 2021-02-04 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102279897B1 (ko) 2021-02-18 2021-07-21 주식회사 에프에스티 다액형 경화성 조성물의 도포 방법
KR102581086B1 (ko) 2021-03-16 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 막
KR20220148472A (ko) * 2021-04-29 2022-11-07 주식회사 에프에스티 펠리클 조립체
KR102624936B1 (ko) 2021-05-21 2024-01-15 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 극자외선 리소그라피용 펠리클 프레임용 실링재
KR102662985B1 (ko) * 2021-06-30 2024-05-03 주식회사 에프에스티 펠리클 조립체
KR20240171161A (ko) 2021-08-26 2024-12-06 미쯔이가가꾸가부시끼가이샤 펠리클막, 펠리클, 노광 원판, 노광 장치 및 펠리클막의 제조 방법
KR102691250B1 (ko) 2021-09-14 2024-08-05 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법
CN118414583A (zh) 2021-12-17 2024-07-30 Asml荷兰有限公司 用于防止用于euv光刻的光学部件的材料的劣化的方法和系统
CN118891583A (zh) * 2022-03-23 2024-11-01 三井化学株式会社 带粘着层的防护膜组件框的制造方法、带保护膜的防护膜组件框、带粘着层的防护膜组件框、防护膜组件和带防护膜组件的光掩模
KR20240168985A (ko) 2022-04-05 2024-12-02 에이에스엠엘 네델란즈 비.브이. Euv 리소그래피를 위한 펠리클
EP4273626A1 (en) 2022-05-04 2023-11-08 ASML Netherlands B.V. Device and method for measuring contamination and lithographic apparatus provided with said device
CN115032860A (zh) * 2022-06-08 2022-09-09 豪威集成电路(成都)有限公司 光罩及半导体晶圆的制造方法
CN119856116A (zh) * 2022-09-12 2025-04-18 Asml荷兰有限公司 用于在光刻设备中使用的表膜和用于形成该表膜的方法
EP4336258A1 (en) * 2022-09-12 2024-03-13 ASML Netherlands B.V. Pellicle and methods for forming pellicle for use in a lithographic apparatus
KR102690337B1 (ko) * 2022-12-19 2024-08-05 주식회사 에프에스티 3d 탄성 픽스쳐를 포함하는 펠리클 마운팅 어셈블리 및 이를 이용한 펠리클 마운팅 방법과 이를 이용한 펠리클 디 마운팅 방법, 이를 포함한 euv 노광 장치
CN120731396A (zh) 2023-03-06 2025-09-30 Asml荷兰有限公司 允许表膜与图案形成装置之间的区域中压力增加的、用于支撑光刻设备中的表膜的系统
CN116609958B (zh) * 2023-05-17 2025-09-19 安徽晶海纳光电科技有限公司 一种化学气相沉积工艺用的扩散板整形装置及整形方法
US12399440B2 (en) * 2023-06-02 2025-08-26 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and methods
KR102834398B1 (ko) * 2023-07-28 2025-07-15 주식회사 에프에스티 교체형 멤브레인을 포함하는 euv 펠리클, 이를 포함하는 euv 노광 장치 및 euv 펠리클에서 멤브레인의 마운팅 및 디마운팅 방법
KR102687699B1 (ko) * 2023-08-18 2024-07-24 주식회사 에프에스티 응력 완충구조를 구비하는 euv 펠리클의 마운팅 블록, 마운팅 블록을 포함하는 euv 펠리클 구조체, euv 펠리클 구조체를 포함하는 euv 노광 장치 및 euv 펠리클의 마운팅 및 디마운팅 방법
KR102877472B1 (ko) * 2023-09-26 2025-10-29 주식회사 에프에스티 Euv 펠리클의 디마운팅 장치 및 이를 이용한 euv 펠리클의 디마운팅 방법
US20250102903A1 (en) * 2023-09-27 2025-03-27 Intel Corporation Euv mask and pellicle assembly
TW202530851A (zh) 2024-01-17 2025-08-01 韓商Ｓ＆Ｓ技術股份有限公司 光罩安裝護膜用之框組件

Family Cites Families (117)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52136390A (en) 1976-05-11 1977-11-15 Matsushita Electric Ind Co Ltd Resistance compound
JPH0619547B2 (ja) * 1984-07-05 1994-03-16 株式会社ニコン マスク保護装置
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
JPS61245163A (ja) 1985-04-23 1986-10-31 Nippon Kogaku Kk <Nikon> マスク保護装置
JPS6344824Y2 (enExample) 1985-02-28 1988-11-21
JPH0123137Y2 (enExample) * 1985-04-05 1989-07-17
JPS6323704Y2 (enExample) * 1985-05-30 1988-06-29
JPS63220143A (ja) * 1987-03-09 1988-09-13 Seiko Epson Corp フオトマスク
JPH0324547A (ja) * 1989-06-22 1991-02-01 Oki Electric Ind Co Ltd マスク保護用ペリクル
JPH0342153U (enExample) * 1989-08-31 1991-04-22
JPH05188583A (ja) * 1992-01-17 1993-07-30 Fujitsu Ltd ペリクル
JP3390882B2 (ja) * 1994-03-17 2003-03-31 富士通株式会社 露光レチクル用ペリクル及びその貼り付け方法及びその貼り付け装置
US5576125A (en) * 1995-07-27 1996-11-19 Micro Lithography, Inc. Method for making an optical pellicle
JPH09204039A (ja) 1996-01-25 1997-08-05 Shin Etsu Chem Co Ltd ペリクル枠保持具
KR19990051659A (ko) * 1997-12-19 1999-07-05 정몽규 타이어 변형 경고 장치
JPH11194481A (ja) 1997-12-26 1999-07-21 Oki Electric Ind Co Ltd ペリクル装着構造
JP4006659B2 (ja) * 1998-01-14 2007-11-14 沖電気工業株式会社 ペリクルの取付構造
JPH11258779A (ja) * 1998-03-13 1999-09-24 Shin Etsu Chem Co Ltd ペリクルライナー貼り合わせ装置及び方法
US5976307A (en) * 1998-03-13 1999-11-02 Dupont Photomasks, Inc. Method and apparatus for removing a pellicle frame from a photomask plate
JPH11295880A (ja) 1998-04-07 1999-10-29 Seiko Epson Corp ペリクルフレーム
DE19936308A1 (de) * 1998-09-09 2000-03-16 Alkor Gmbh Vorrichtung und Verfahren zur Herstellung von zwei- oder mehrfarbigen Folien, Schalttafelfolien, Armaturenbrettfolien
US6197454B1 (en) 1998-12-29 2001-03-06 Intel Corporation Clean-enclosure window to protect photolithographic mask
JP3601996B2 (ja) * 1999-03-05 2004-12-15 信越化学工業株式会社 ペリクル粘着層保護用ライナーおよびこれを具備するペリクル
US6192100B1 (en) 1999-06-18 2001-02-20 International Business Machines Corporation X-ray mask pellicles and their attachment in semiconductor manufacturing
JP2001117213A (ja) 1999-08-10 2001-04-27 Nikon Corp フォトマスク、該フォトマスクの製造方法、該フォトマスクを扱う投影露光装置、及び投影露光方法
US6239863B1 (en) * 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same
US6492067B1 (en) 1999-12-03 2002-12-10 Euv Llc Removable pellicle for lithographic mask protection and handling
JP4380910B2 (ja) * 2000-12-14 2009-12-09 信越化学工業株式会社 ペリクル
JP2002182373A (ja) 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US6911283B1 (en) * 2001-02-07 2005-06-28 Dupont Photomasks, Inc. Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
US6894766B1 (en) * 2001-03-27 2005-05-17 Dupont Photomasks, Inc. Method for constructing a photomask assembly using an encoded mark
US6734445B2 (en) 2001-04-23 2004-05-11 Intel Corporation Mechanized retractable pellicles and methods of use
US6566018B2 (en) 2001-04-23 2003-05-20 Intel Corporation Dual-member pellicle assemblies and methods of use
US6573980B2 (en) * 2001-07-26 2003-06-03 Micro Lithography, Inc. Removable optical pellicle
JP2003059801A (ja) * 2001-08-14 2003-02-28 Canon Inc 露光装置及び露光方法
US6646720B2 (en) 2001-09-21 2003-11-11 Intel Corporation Euv reticle carrier with removable pellicle
DE10253928A1 (de) * 2001-11-21 2003-06-18 Asahi Glass Co Ltd Struktur zum Anbringen eines Häutchens an einer Photomaske
JP2003156836A (ja) * 2001-11-21 2003-05-30 Sony Corp フォトマスク構造体、露光方法及び露光装置
US7304720B2 (en) 2002-02-22 2007-12-04 Asml Holding N.V. System for using a two part cover for protecting a reticle
JP2003307832A (ja) * 2002-04-16 2003-10-31 Asahi Glass Co Ltd ペリクル及びペリクル装着フォトマスク
JP2004012597A (ja) 2002-06-04 2004-01-15 Asahi Glass Co Ltd ペリクル
KR20040005355A (ko) * 2002-07-10 2004-01-16 주식회사 하이닉스반도체 펠리클 분리형 프레임구조
WO2004040374A2 (en) 2002-10-29 2004-05-13 Dupont Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
JP2004153122A (ja) * 2002-10-31 2004-05-27 Nikon Corp 露光装置
JP4027214B2 (ja) * 2002-11-28 2007-12-26 キヤノン株式会社 搬送装置、デバイス製造装置、搬送方法およびデバイス製造方法
US6912043B2 (en) * 2003-01-09 2005-06-28 Asml Holding, N.V. Removable reticle window and support frame using magnetic force
JP2004240221A (ja) * 2003-02-06 2004-08-26 Semiconductor Leading Edge Technologies Inc フォトマスク、ペリクル装脱着装置及び基板処理装置
CA3002927C (en) * 2003-03-28 2021-05-04 Inguran, Llc Apparatus, methods and processes for sorting particles and for providing sex-sorted animal sperm
JP4330377B2 (ja) * 2003-05-15 2009-09-16 旭化成イーマテリアルズ株式会社 大型ペリクルの組立方法及び大型ペリクルの組立装置
KR20050003293A (ko) * 2003-06-30 2005-01-10 주식회사 하이닉스반도체 반도체 소자 제조용 포토 마스크
JP2005070191A (ja) * 2003-08-21 2005-03-17 Asahi Glass Co Ltd フレームとペリクル板の貼り合せ装置
US7316869B2 (en) * 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
WO2005036600A2 (en) * 2003-10-06 2005-04-21 Toppan Photomasks, Inc. System and method for automatically mounting a pellicle assembly on a photomask
JP2005195992A (ja) 2004-01-09 2005-07-21 Asahi Glass Co Ltd ペリクル装着治具、ペリクル装着方法及びペリクル装着構造並びにペリクル
JP4396354B2 (ja) * 2004-03-30 2010-01-13 凸版印刷株式会社 フォトマスク
JP2005308901A (ja) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
US7110195B2 (en) * 2004-04-28 2006-09-19 International Business Machines Corporation Monolithic hard pellicle
JP2006003620A (ja) 2004-06-17 2006-01-05 Asahi Glass Co Ltd ペリクル
CN200996043Y (zh) * 2004-07-16 2007-12-26 应用材料公司 一种屏蔽框架组件
US8721952B2 (en) * 2004-11-16 2014-05-13 International Business Machines Corporation Pneumatic method and apparatus for nano imprint lithography having a conforming mask
US20060246234A1 (en) 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
JP4880941B2 (ja) 2005-08-02 2012-02-22 株式会社日立ハイテクノロジーズ 真空搬送装置およびこれを備えた荷電粒子線検査装置
JP4905455B2 (ja) 2006-09-08 2012-03-28 株式会社ニコン マスク、露光装置、及びデバイス製造方法
US7799486B2 (en) * 2006-11-21 2010-09-21 Infineon Technologies Ag Lithography masks and methods of manufacture thereof
US8323855B2 (en) 2007-03-01 2012-12-04 Nikon Corporation Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method
JP2008242346A (ja) * 2007-03-29 2008-10-09 Omron Corp レーザ転写装置の転写ヘッド
US8139199B2 (en) 2007-04-02 2012-03-20 Nikon Corporation Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method
US8018578B2 (en) 2007-04-19 2011-09-13 Asml Netherlands B.V. Pellicle, lithographic apparatus and device manufacturing method
KR101191055B1 (ko) * 2007-07-06 2012-10-15 아사히 가세이 이-매터리얼즈 가부시키가이샤 대형 펠리클 프레임체 및 그 프레임체의 파지 방법
US7829248B2 (en) * 2007-07-24 2010-11-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle stress relief
KR101357305B1 (ko) * 2007-08-29 2014-01-28 삼성전자주식회사 펠리클 부착 장치 및 이를 이용한 펠리클 부착 방법
CN101241319B (zh) * 2008-03-06 2010-08-25 上海微电子装备有限公司 具有对准标记体系的机器视觉对准系统及其对准方法
KR20090101671A (ko) * 2008-03-24 2009-09-29 삼성전자주식회사 반도체 공정 마스크의 유지보수 방법
JP4928494B2 (ja) * 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP5382412B2 (ja) 2008-10-24 2014-01-08 株式会社ブイ・テクノロジー 露光装置及びフォトマスク
JP5489499B2 (ja) * 2009-03-18 2014-05-14 オリンパス株式会社 薄膜の貼り付け方法、およびそれにより製造されたペリクル光学素子
JP2010261987A (ja) 2009-04-30 2010-11-18 Shin-Etsu Chemical Co Ltd フォトマスク
US8349525B2 (en) 2009-06-18 2013-01-08 Nikon Corporation Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
JP5600921B2 (ja) * 2009-10-19 2014-10-08 凸版印刷株式会社 ペリクル貼付装置
JP5610380B2 (ja) * 2009-12-28 2014-10-22 レーザーテック株式会社 ペリクル装着装置、ペリクル装着方法、及びパターン基板の製造方法
KR20110077976A (ko) * 2009-12-30 2011-07-07 주식회사 하이닉스반도체 포토마스크와 펠리클 부착장치 및 이를 이용한 부착방법
KR101143628B1 (ko) 2010-01-07 2012-06-28 에스케이하이닉스 주식회사 펠리클, 펠리클을 포함하는 포토마스크, 포토마스크의 제조방법
JP2011158585A (ja) 2010-01-29 2011-08-18 Shin-Etsu Chemical Co Ltd ペリクルおよびペリクルの製造方法
JP5269128B2 (ja) * 2010-03-12 2013-08-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
JP5189614B2 (ja) * 2010-03-29 2013-04-24 信越化学工業株式会社 ペリクル及びその取り付け方法、並びにペリクル付マスク及びマスク
NL2006556A (en) * 2010-05-13 2011-11-15 Asml Holding Nv Optical system, inspection system and manufacturing method.
EP2465012B1 (en) * 2010-06-25 2012-12-12 ASML Netherlands BV Lithographic apparatus and method
JP5668346B2 (ja) 2010-07-14 2015-02-12 凸版印刷株式会社 ペリクルのフォトマスクへの取り付け構造
JP5843307B2 (ja) * 2010-10-28 2016-01-13 信越化学工業株式会社 帯電防止性粘着剤
US8681310B2 (en) * 2010-12-02 2014-03-25 Globalfoundries Inc. Mechanical fixture of pellicle to lithographic photomask
EP2490073B1 (en) * 2011-02-18 2015-09-23 ASML Netherlands BV Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder
JP5663376B2 (ja) * 2011-04-04 2015-02-04 信越化学工業株式会社 ペリクルフレーム、その製造方法、及びペリクル
NL2008695A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv Lithographic apparatus comprising substrate table.
WO2012172642A1 (ja) 2011-06-14 2012-12-20 松下精機株式会社 ペリクル貼付装置
JP5823040B2 (ja) * 2011-07-22 2015-11-25 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置及びデバイス製造方法
US8586267B2 (en) 2011-09-12 2013-11-19 Samsung Austin Semiconductor, L.P. Removable transparent membrane for a pellicle
NL2009284A (en) * 2011-09-22 2013-10-31 Asml Netherlands Bv A cleaning substrate for a lithography apparatus, a cleaning method for a lithography apparatus and a lithography apparatus.
JP2013109126A (ja) * 2011-11-21 2013-06-06 Toshiba Corp ペリクルの製造方法、フォトマスクの製造方法及び半導体装置の製造方法
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
US20130250260A1 (en) * 2012-03-23 2013-09-26 Globalfoundries Inc. Pellicles for use during euv photolithography processes
KR101317206B1 (ko) 2012-07-24 2013-10-10 민경준 페리클 자동 접착 장치
CN202794840U (zh) * 2012-10-11 2013-03-13 中芯国际集成电路制造(北京)有限公司 用于光掩膜版的防尘保护装置
JP5854511B2 (ja) 2012-10-16 2016-02-09 信越化学工業株式会社 ペリクルおよびペリクルの貼付け方法
US8968971B2 (en) * 2013-03-08 2015-03-03 Micro Lithography, Inc. Pellicles with reduced particulates
WO2014154452A1 (en) * 2013-03-27 2014-10-02 Asml Netherlands B.V. Lithographic apparatus
JP6008784B2 (ja) * 2013-04-15 2016-10-19 信越化学工業株式会社 ペリクルフレーム及びその製作方法とペリクル
JP5984187B2 (ja) * 2013-04-22 2016-09-06 信越化学工業株式会社 ペリクルとフォトマスクのアセンブリ
JP6303286B2 (ja) 2013-04-30 2018-04-04 凸版印刷株式会社 ペリクル付きフォトマスクの検査方法及びペリクル粘着耐久性検査装置
CN103246157A (zh) 2013-05-21 2013-08-14 上海和辉光电有限公司 防尘薄膜框架、光学掩膜版及其安装方法
CN203422554U (zh) * 2013-08-01 2014-02-05 上海凸版光掩模有限公司 一种光掩模板贴膜装置
CN203650297U (zh) * 2013-10-25 2014-06-18 常州市佳和工具有限公司 轴承夹具
JP2015138128A (ja) 2014-01-22 2015-07-30 凸版印刷株式会社 ペリクルフレーム除去方法及びペリクルフレーム除去装置
WO2015182483A1 (ja) 2014-05-27 2015-12-03 三井化学株式会社 ペリクル製造装置
EP4296778A3 (en) * 2014-11-17 2024-03-27 ASML Netherlands B.V. Mask assembly

Also Published As

Publication number Publication date
WO2016079052A3 (en) 2016-09-22
KR102544701B1 (ko) 2023-06-16
KR20230092024A (ko) 2023-06-23
US20180329314A1 (en) 2018-11-15
TWI679491B (zh) 2019-12-11
US20200012204A1 (en) 2020-01-09
CN115840333A (zh) 2023-03-24
KR20230004946A (ko) 2023-01-06
US10558129B2 (en) 2020-02-11
EP3221748A2 (en) 2017-09-27
JP7318040B2 (ja) 2023-07-31
CA2968151A1 (en) 2016-05-26
US11009803B2 (en) 2021-05-18
KR20170085118A (ko) 2017-07-21
TW201619692A (zh) 2016-06-01
CN107172884A (zh) 2017-09-15
CN117826520A (zh) 2024-04-05
JP2024111212A (ja) 2024-08-16
US20190025717A1 (en) 2019-01-24
CN107111224A (zh) 2017-08-29
KR102548823B1 (ko) 2023-06-28
CA2968151C (en) 2024-01-16
KR102544694B1 (ko) 2023-06-16
US10539886B2 (en) 2020-01-21
JP7123206B2 (ja) 2022-08-22
CN111458973A (zh) 2020-07-28
US11003098B2 (en) 2021-05-11
JP2022066392A (ja) 2022-04-28
EP4296778A3 (en) 2024-03-27
JP7438287B2 (ja) 2024-02-26
KR20220143144A (ko) 2022-10-24
NL2015795A (en) 2016-09-06
WO2016079051A2 (en) 2016-05-26
KR102634793B1 (ko) 2024-02-08
JP2021076871A (ja) 2021-05-20
KR20190135562A (ko) 2019-12-06
KR20170088379A (ko) 2017-08-01
CN111458973B (zh) 2024-02-09
CN107172884B (zh) 2022-11-04
WO2016079051A3 (en) 2016-09-22
JP2017534078A (ja) 2017-11-16
JP2017534077A (ja) 2017-11-16
CN107111224B (zh) 2021-05-07
TWI679492B (zh) 2019-12-11
JP7509969B2 (ja) 2024-07-02
TW202001412A (zh) 2020-01-01
US20200057394A1 (en) 2020-02-20
CA2968159C (en) 2023-02-21
US10969701B2 (en) 2021-04-06
NL2015796A (en) 2016-09-06
JP7689216B2 (ja) 2025-06-05
JP2023143925A (ja) 2023-10-06
JP2022145866A (ja) 2022-10-04
JP2024045512A (ja) 2024-04-02
JP6882431B2 (ja) 2021-06-02
TW202011109A (zh) 2020-03-16
JP7037606B2 (ja) 2022-03-16
CA2968159A1 (en) 2016-05-26
EP4296778A2 (en) 2023-12-27
TWI724622B (zh) 2021-04-11
KR102589077B1 (ko) 2023-10-16
JP2020024470A (ja) 2020-02-13
EP4286941A2 (en) 2023-12-06
JP2020181212A (ja) 2020-11-05
EP3221747A2 (en) 2017-09-27
CA3177744A1 (en) 2016-05-26
TW201619693A (zh) 2016-06-01
KR20230146669A (ko) 2023-10-19
TWI724612B (zh) 2021-04-11
US20200096882A1 (en) 2020-03-26
EP4286941A3 (en) 2024-03-06
EP3221747B1 (en) 2024-01-03
CA3206173A1 (en) 2016-05-26
KR102873584B1 (ko) 2025-10-21
WO2016079052A2 (en) 2016-05-26
EP3221748B1 (en) 2024-01-03
JP6769954B2 (ja) 2020-10-14

Similar Documents

Publication Publication Date Title
JP6882431B2 (ja) ペリクルフレーム取り付け装置及びペリクルアセンブリの取り付け方法
US12449726B2 (en) Apparatus for assembly of a reticle assembly
KR102873574B1 (ko) Euv 리소그래피용 펠리클 프레임
TWI906130B (zh) 用於組裝倍縮光罩總成之裝置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170627

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20181010

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190826

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190828

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200528

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200824

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210118

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210209

R150 Certificate of patent or registration of utility model

Ref document number: 6837433

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250