TWI679491B - 適合用於一微影製程中之遮罩總成 - Google Patents

適合用於一微影製程中之遮罩總成 Download PDF

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Publication number
TWI679491B
TWI679491B TW104137749A TW104137749A TWI679491B TW I679491 B TWI679491 B TW I679491B TW 104137749 A TW104137749 A TW 104137749A TW 104137749 A TW104137749 A TW 104137749A TW I679491 B TWI679491 B TW I679491B
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TW
Taiwan
Prior art keywords
frame
patterned device
film
patterned
mask assembly
Prior art date
Application number
TW104137749A
Other languages
English (en)
Chinese (zh)
Other versions
TW201619692A (zh
Inventor
馬提亞斯 可魯依寧嘉
Matthias Kruizinga
馬騰 馬吉斯 馬利努斯 詹森
Maarten Mathijs Marinus Jansen
喬治 瑪紐爾 阿瑟瑞多
Jorge Manuel Azeredo Lima
艾瑞克 威廉 寶賈特
Erik Willem Bogaart
德克 瑟華提思 傑卓達 布朗司
Derk Servatius Gertruda Brouns
馬克 布魯吉
Marc BRUIJN
理查 喬瑟夫 布魯斯
Richard Joseph Bruls
傑洛恩 戴克斯
Jeroen Dekkers
保羅 簡森
Paul Janssen
莫哈瑪德 瑞莎 卡馬利
Mohammad Reza Kamali
羅納 哈莫 剛瑟 卡默
Ronald Harm Gunther Kramer
羅博特 嘉博爾 瑪利亞 蘭博根
馬汀斯 漢德利克斯 安東尼斯 里恩德斯
Martinus Hendrikus Antonius Leenders
馬修 里普森
Matthew Lipson
艾瑞克 羅勒夫 洛卜史塔
Erik Roelof Loopstra
喬瑟夫Ｈ 黎昂斯
Joseph H Lyons
史蒂芬 露克司
Stephen Roux
登 波許 吉瑞特 凡
Gerrit Van Den Bosch
登 海吉坎特 山德 凡
Sander VAN DEN HEIJKANT
得 葛絡夫 珊卓拉 凡
Sandra Van Der Graaf
丹 慕蘭 佛利茲 凡
Frits Van Der Meulen
路 吉羅美 法蘭西歐斯 斯洛凡 凡吉兒 凡
畢兒翠斯 路意斯 瑪莉 喬瑟夫 凱翠恩 凡布魯吉
Beatrijs Louise Marie-Joseph K Verbrugge
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Asml Netherlands B. V.
荷蘭商Ａｓｍｌ控股公司
Asml Holding N. V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司, Asml Netherlands B. V., 荷蘭商Ａｓｍｌ控股公司, Asml Holding N. V. filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW201619692A publication Critical patent/TW201619692A/zh
Application granted granted Critical
Publication of TWI679491B publication Critical patent/TWI679491B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Regulation And Control Of Combustion (AREA)
TW104137749A 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成 TWI679491B (zh)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23

Publications (2)

Publication Number Publication Date
TW201619692A TW201619692A (zh) 2016-06-01
TWI679491B true TWI679491B (zh) 2019-12-11

Family

ID=54542272

Family Applications (4)

Application Number Title Priority Date Filing Date
TW104137750A TWI679492B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW108141013A TWI724622B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成
TW108140283A TWI724612B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW104137749A TWI679491B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成

Family Applications Before (3)

Application Number Title Priority Date Filing Date
TW104137750A TWI679492B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW108141013A TWI724622B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成
TW108140283A TWI724612B (zh) 2014-11-17 2015-11-16 護膜附接裝置

Country Status (9)

Country Link
US (5) US10558129B2 (enExample)
EP (4) EP3221748B1 (enExample)
JP (10) JP6769954B2 (enExample)
KR (7) KR102548823B1 (enExample)
CN (5) CN115840333A (enExample)
CA (4) CA3206173A1 (enExample)
NL (2) NL2015796A (enExample)
TW (4) TWI679492B (enExample)
WO (2) WO2016079052A2 (enExample)

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* Cited by examiner, † Cited by third party
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KR20200088528A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법
KR20200088529A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 초극자외선 리소그라피용 펠리클 검사 시스템
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KR102898051B1 (ko) * 2020-03-13 2025-12-10 삼성전자주식회사 펠리클 전사 장치 및 펠리클 전사 방법
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KR102279897B1 (ko) 2021-02-18 2021-07-21 주식회사 에프에스티 다액형 경화성 조성물의 도포 방법
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WO2023110313A1 (en) 2021-12-17 2023-06-22 Asml Netherlands B.V. Method and system for preventing degradation of a material of an optical component for euv-lithography
KR20240144378A (ko) * 2022-03-23 2024-10-02 미쯔이가가꾸가부시끼가이샤 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크
CA3247367A1 (en) 2022-04-05 2023-10-12 Asml Netherlands B.V. EUV LITHOGRAPH FILM
EP4273626A1 (en) 2022-05-04 2023-11-08 ASML Netherlands B.V. Device and method for measuring contamination and lithographic apparatus provided with said device
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