CA3206173A1 - Mask assembly - Google Patents
Mask assemblyInfo
- Publication number
- CA3206173A1 CA3206173A1 CA3206173A CA3206173A CA3206173A1 CA 3206173 A1 CA3206173 A1 CA 3206173A1 CA 3206173 A CA3206173 A CA 3206173A CA 3206173 A CA3206173 A CA 3206173A CA 3206173 A1 CA3206173 A1 CA 3206173A1
- Authority
- CA
- Canada
- Prior art keywords
- pellicle
- pellicle frame
- patterning device
- frame
- sub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000059 patterning Methods 0.000 claims abstract description 647
- 238000000034 method Methods 0.000 claims abstract description 60
- 230000008569 process Effects 0.000 claims abstract description 27
- 230000007246 mechanism Effects 0.000 claims description 167
- 239000003292 glue Substances 0.000 claims description 142
- 230000033001 locomotion Effects 0.000 claims description 119
- 239000000463 material Substances 0.000 claims description 44
- 239000010409 thin film Substances 0.000 claims description 35
- 238000000926 separation method Methods 0.000 claims description 18
- 230000000295 complement effect Effects 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 description 144
- 239000007789 gas Substances 0.000 description 119
- 210000003128 head Anatomy 0.000 description 98
- 239000002245 particle Substances 0.000 description 79
- 238000011109 contamination Methods 0.000 description 62
- 239000000758 substrate Substances 0.000 description 48
- 238000005192 partition Methods 0.000 description 47
- 238000010943 off-gassing Methods 0.000 description 43
- 230000001965 increasing effect Effects 0.000 description 42
- 238000004140 cleaning Methods 0.000 description 22
- 238000005452 bending Methods 0.000 description 21
- 238000007689 inspection Methods 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 20
- 239000010408 film Substances 0.000 description 19
- 238000005286 illumination Methods 0.000 description 18
- 239000011148 porous material Substances 0.000 description 18
- 229920006254 polymer film Polymers 0.000 description 16
- 239000000853 adhesive Substances 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 14
- 238000000605 extraction Methods 0.000 description 14
- 230000002829 reductive effect Effects 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000012530 fluid Substances 0.000 description 11
- 239000004696 Poly ether ether ketone Substances 0.000 description 10
- 239000000356 contaminant Substances 0.000 description 10
- 230000000670 limiting effect Effects 0.000 description 10
- 229920002530 polyetherether ketone Polymers 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 229910052726 zirconium Inorganic materials 0.000 description 9
- 230000000712 assembly Effects 0.000 description 8
- 238000000429 assembly Methods 0.000 description 8
- 230000001143 conditioned effect Effects 0.000 description 8
- 239000004020 conductor Substances 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 8
- 229910052758 niobium Inorganic materials 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 229920005591 polysilicon Polymers 0.000 description 8
- 239000011358 absorbing material Substances 0.000 description 7
- 230000008602 contraction Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 229910052707 ruthenium Inorganic materials 0.000 description 7
- 229910052684 Cerium Inorganic materials 0.000 description 6
- 238000005411 Van der Waals force Methods 0.000 description 6
- 238000004026 adhesive bonding Methods 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052746 lanthanum Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000004806 packaging method and process Methods 0.000 description 6
- 230000008093 supporting effect Effects 0.000 description 6
- 238000013519 translation Methods 0.000 description 6
- 229910052727 yttrium Inorganic materials 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000000446 fuel Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000009304 pastoral farming Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 239000012858 resilient material Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 206010010144 Completed suicide Diseases 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 235000005824 Zea mays ssp. parviglumis Nutrition 0.000 description 1
- 235000002017 Zea mays subsp mays Nutrition 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004964 aerogel Substances 0.000 description 1
- 210000000436 anus Anatomy 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 235000005822 corn Nutrition 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 230000001976 improved effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910021428 silicene Inorganic materials 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- -1 trimethoxy silane secondary amine Chemical class 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Regulation And Control Of Combustion (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462080561P | 2014-11-17 | 2014-11-17 | |
| US62/080,561 | 2014-11-17 | ||
| US201562108348P | 2015-01-27 | 2015-01-27 | |
| US62/108,348 | 2015-01-27 | ||
| US201562110841P | 2015-02-02 | 2015-02-02 | |
| US62/110,841 | 2015-02-02 | ||
| US201562126173P | 2015-02-27 | 2015-02-27 | |
| US62/126,173 | 2015-02-27 | ||
| US201562149176P | 2015-04-17 | 2015-04-17 | |
| US62/149,176 | 2015-04-17 | ||
| US201562183342P | 2015-06-23 | 2015-06-23 | |
| US62/183,342 | 2015-06-23 | ||
| CA2968151A CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2968151A Division CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA3206173A1 true CA3206173A1 (en) | 2016-05-26 |
Family
ID=54542272
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2968151A Active CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3206173A Pending CA3206173A1 (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3177744A Pending CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
| CA2968159A Active CA2968159C (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2968151A Active CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA3177744A Pending CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
| CA2968159A Active CA2968159C (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Country Status (9)
| Country | Link |
|---|---|
| US (5) | US10539886B2 (enExample) |
| EP (4) | EP4296778A3 (enExample) |
| JP (10) | JP6837433B2 (enExample) |
| KR (7) | KR102544701B1 (enExample) |
| CN (5) | CN107172884B (enExample) |
| CA (4) | CA2968151C (enExample) |
| NL (2) | NL2015796A (enExample) |
| TW (4) | TWI679492B (enExample) |
| WO (2) | WO2016079051A2 (enExample) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102544701B1 (ko) * | 2014-11-17 | 2023-06-16 | 에이에스엠엘 네델란즈 비.브이. | 장치 |
| CN108738360B (zh) | 2015-12-14 | 2022-08-19 | Asml荷兰有限公司 | 用于制造隔膜组件的方法 |
| CN108604058A (zh) * | 2015-12-14 | 2018-09-28 | Asml荷兰有限公司 | 隔膜组件 |
| KR102186010B1 (ko) * | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | Euv 펠리클 구조체, 및 그 제조 방법 |
| JP7009380B2 (ja) | 2016-04-25 | 2022-01-25 | エーエスエムエル ネザーランズ ビー．ブイ． | Ｅｕｖリソグラフィ用のメンブレン |
| CN116609996A (zh) | 2016-07-05 | 2023-08-18 | 三井化学株式会社 | 防护膜及其组件和组件框体、组件制造方法、曝光原版、曝光装置、半导体装置的制造方法 |
| CN109564394B (zh) * | 2016-07-29 | 2021-06-18 | Asml控股股份有限公司 | 膜组件和颗粒捕集器 |
| JP6607574B2 (ja) * | 2016-08-24 | 2019-11-20 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
| KR101848153B1 (ko) * | 2016-09-12 | 2018-05-29 | 한양대학교 산학협력단 | 마스크 보호 모듈, 이를 포함하는 펠리클, 및 이를 포함하는 리소그래피 장치 |
| KR102237878B1 (ko) | 2017-02-17 | 2021-04-07 | 미쯔이가가꾸가부시끼가이샤 | 펠리클, 노광 원판, 노광 장치 및 반도체 장치의 제조 방법 |
| US11183410B2 (en) * | 2017-04-24 | 2021-11-23 | Photronics, Inc. | Pellicle removal tool |
| EP3639091A2 (en) | 2017-06-15 | 2020-04-22 | ASML Netherlands B.V. | Pellicle and pellicle assembly |
| US11143952B2 (en) | 2017-09-28 | 2021-10-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle removal method |
| KR20250036267A (ko) | 2017-10-27 | 2025-03-13 | 에이에스엠엘 네델란즈 비.브이. | 펠리클 프레임 및 펠리클 조립체 |
| US11106127B2 (en) * | 2017-11-08 | 2021-08-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure of pellicle-mask structure with vent structure |
| KR20200087774A (ko) * | 2017-11-21 | 2020-07-21 | 에이에스엠엘 네델란즈 비.브이. | 다공성 그래파이트 펠리클 |
| JP6921412B2 (ja) * | 2018-01-25 | 2021-08-18 | 株式会社ブイ・テクノロジー | ペリクルフレーム把持装置及びペリクルフレーム把持方法 |
| PL3530511T3 (pl) * | 2018-02-27 | 2020-11-16 | Joseph Vögele AG | Sposób rekonfiguracji układu operacyjnego dla maszyny budowlanej |
| EP3764161A4 (en) * | 2018-03-05 | 2021-12-01 | Mitsui Chemicals, Inc. | PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR COMPONENT |
| JP7019472B2 (ja) * | 2018-03-22 | 2022-02-15 | 三井化学株式会社 | カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法 |
| JP7061494B2 (ja) * | 2018-03-28 | 2022-04-28 | 三井化学株式会社 | 検査方法、ペリクルの製造方法、および検査装置 |
| US12271108B2 (en) * | 2018-07-04 | 2025-04-08 | Asml Netherlands B.V. | Apparatus for positioning and clamped curing |
| CN108950475B (zh) * | 2018-07-25 | 2020-11-10 | 京东方科技集团股份有限公司 | 张网结构、张网装置及张网方法 |
| US11016383B2 (en) * | 2018-08-31 | 2021-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| WO2020064217A1 (en) | 2018-09-28 | 2020-04-02 | Asml Netherlands B.V. | Lithographic system and method |
| KR20210090189A (ko) | 2018-11-16 | 2021-07-19 | 에이에스엠엘 네델란즈 비.브이. | Euv 리소그래피를 위한 펠리클 |
| US11137693B2 (en) * | 2018-11-30 | 2021-10-05 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Pellicle holder, pellicle inspection apparatus, and pellicle inspection method |
| KR102243367B1 (ko) * | 2018-11-30 | 2021-04-23 | 한양대학교 산학협력단 | 펠리클 홀더, 펠리클 검사 장치, 및 펠리클 검사 방법 |
| JP7104856B2 (ja) * | 2018-12-10 | 2022-07-21 | アプライド マテリアルズ インコーポレイテッド | 極端紫外線リソグラフィ用途におけるフォトマスクからの取付具取り外し |
| EP3671342B1 (en) * | 2018-12-20 | 2021-03-17 | IMEC vzw | Induced stress for euv pellicle tensioning |
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