JP2007515799A5 - - Google Patents

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Publication number
JP2007515799A5
JP2007515799A5 JP2006546022A JP2006546022A JP2007515799A5 JP 2007515799 A5 JP2007515799 A5 JP 2007515799A5 JP 2006546022 A JP2006546022 A JP 2006546022A JP 2006546022 A JP2006546022 A JP 2006546022A JP 2007515799 A5 JP2007515799 A5 JP 2007515799A5
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JP
Japan
Prior art keywords
substrate
chuck
frame
substrate support
support
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JP2006546022A
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English (en)
Japanese (ja)
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JP4384181B2 (ja
JP2007515799A (ja
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Priority claimed from US10/744,088 external-priority patent/US7119884B2/en
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Publication of JP2007515799A publication Critical patent/JP2007515799A/ja
Publication of JP2007515799A5 publication Critical patent/JP2007515799A5/ja
Application granted granted Critical
Publication of JP4384181B2 publication Critical patent/JP4384181B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006546022A 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP4384181B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method
PCT/EP2004/014481 WO2005064400A2 (en) 2003-12-24 2004-12-20 Chuck system, lithographic apparatus using the same and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2007515799A JP2007515799A (ja) 2007-06-14
JP2007515799A5 true JP2007515799A5 (enExample) 2007-07-26
JP4384181B2 JP4384181B2 (ja) 2009-12-16

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Family Applications (1)

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JP2006546022A Expired - Fee Related JP4384181B2 (ja) 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (1) US7119884B2 (enExample)
EP (1) EP1702241A2 (enExample)
JP (1) JP4384181B2 (enExample)
KR (3) KR100882893B1 (enExample)
CN (1) CN100517074C (enExample)
TW (1) TWI303355B (enExample)
WO (1) WO2005064400A2 (enExample)

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