JP4384181B2 - リソグラフィ装置およびデバイス製造方法 - Google Patents

リソグラフィ装置およびデバイス製造方法 Download PDF

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Publication number
JP4384181B2
JP4384181B2 JP2006546022A JP2006546022A JP4384181B2 JP 4384181 B2 JP4384181 B2 JP 4384181B2 JP 2006546022 A JP2006546022 A JP 2006546022A JP 2006546022 A JP2006546022 A JP 2006546022A JP 4384181 B2 JP4384181 B2 JP 4384181B2
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JP
Japan
Prior art keywords
chuck
frame
substrate
deformation
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006546022A
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English (en)
Japanese (ja)
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JP2007515799A (ja
JP2007515799A5 (enExample
Inventor
スミツ、ペーター
スマルダース、パトリック、ヨハネス、コーネルス、ヘンドリック
ツァール、コーエン、ヤコブス、ヨハネス、マリア
コックス、ヘンリクス、ヘルマン、マリー
オッテンス、ヨースト、ジェローン
ジリッセン、ノード、ヤン
スターレフェルト、ジェローン、ピーター
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2007515799A publication Critical patent/JP2007515799A/ja
Publication of JP2007515799A5 publication Critical patent/JP2007515799A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006546022A 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP4384181B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method
PCT/EP2004/014481 WO2005064400A2 (en) 2003-12-24 2004-12-20 Chuck system, lithographic apparatus using the same and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2007515799A JP2007515799A (ja) 2007-06-14
JP2007515799A5 JP2007515799A5 (enExample) 2007-07-26
JP4384181B2 true JP4384181B2 (ja) 2009-12-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006546022A Expired - Fee Related JP4384181B2 (ja) 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (1) US7119884B2 (enExample)
EP (1) EP1702241A2 (enExample)
JP (1) JP4384181B2 (enExample)
KR (3) KR100882893B1 (enExample)
CN (1) CN100517074C (enExample)
TW (1) TWI303355B (enExample)
WO (1) WO2005064400A2 (enExample)

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Also Published As

Publication number Publication date
US7119884B2 (en) 2006-10-10
EP1702241A2 (en) 2006-09-20
KR20080091268A (ko) 2008-10-09
KR100950069B1 (ko) 2010-03-26
JP2007515799A (ja) 2007-06-14
CN100517074C (zh) 2009-07-22
WO2005064400A3 (en) 2006-03-09
TW200530764A (en) 2005-09-16
CN1898611A (zh) 2007-01-17
KR20060103269A (ko) 2006-09-28
KR100882893B1 (ko) 2009-02-10
TWI303355B (en) 2008-11-21
WO2005064400A2 (en) 2005-07-14
KR20080032015A (ko) 2008-04-11
US20050140962A1 (en) 2005-06-30
KR100882892B1 (ko) 2009-02-10

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