JP2009540511A - 電子顕微鏡用ユーザ・インタフェース - Google Patents

電子顕微鏡用ユーザ・インタフェース Download PDF

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Publication number
JP2009540511A
JP2009540511A JP2009514538A JP2009514538A JP2009540511A JP 2009540511 A JP2009540511 A JP 2009540511A JP 2009514538 A JP2009514538 A JP 2009514538A JP 2009514538 A JP2009514538 A JP 2009514538A JP 2009540511 A JP2009540511 A JP 2009540511A
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image
sample
electron microscope
magnification
region
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JP2009540511A5 (https=
Inventor
マート・ペートルス・マリア・ビールホフ
バート・バイセ
コーネリス・サンデル・クイマン
ヒューゴ・ヴァン・レーヴェン
ヘンドリック・ゲジヌス・タパル
コリン・オーガスト・サンフォード
サンデル・リチャード・マリー・ストクス
スティーブン・バーガー
ベン・ヤコブ・マリー・ボーマンス
クーン・アーノルドゥス・ヴィルヘルムス・ドリーセン
ヨハネス・アントニウス・ヘンドリクス・ヴィルヘルムス・ゲラルドゥス・パルソン
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エフ・イ−・アイ・カンパニー
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Publication of JP2009540511A publication Critical patent/JP2009540511A/ja
Publication of JP2009540511A5 publication Critical patent/JP2009540511A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/162—Open vessel, i.e. one end sealed by object or workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2005—Seal mechanisms
    • H01J2237/2006—Vacuum seals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sliding-Contact Bearings (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Microscoopes, Condenser (AREA)
JP2009514538A 2006-06-07 2007-06-07 電子顕微鏡用ユーザ・インタフェース Pending JP2009540511A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81162106P 2006-06-07 2006-06-07
PCT/US2007/070650 WO2007143734A2 (en) 2006-06-07 2007-06-07 User interface for an electron microscope

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012248422A Division JP5744821B2 (ja) 2006-06-07 2012-11-12 電子顕微鏡用ユーザ・インタフェース

Publications (2)

Publication Number Publication Date
JP2009540511A true JP2009540511A (ja) 2009-11-19
JP2009540511A5 JP2009540511A5 (https=) 2010-01-07

Family

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Family Applications (4)

Application Number Title Priority Date Filing Date
JP2009514538A Pending JP2009540511A (ja) 2006-06-07 2007-06-07 電子顕微鏡用ユーザ・インタフェース
JP2009514539A Active JP5611586B2 (ja) 2006-06-07 2007-06-07 小型の走査型電子顕微鏡
JP2010181477A Active JP5285036B2 (ja) 2006-06-07 2010-08-14 小型の走査型電子顕微鏡
JP2012248422A Active JP5744821B2 (ja) 2006-06-07 2012-11-12 電子顕微鏡用ユーザ・インタフェース

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2009514539A Active JP5611586B2 (ja) 2006-06-07 2007-06-07 小型の走査型電子顕微鏡
JP2010181477A Active JP5285036B2 (ja) 2006-06-07 2010-08-14 小型の走査型電子顕微鏡
JP2012248422A Active JP5744821B2 (ja) 2006-06-07 2012-11-12 電子顕微鏡用ユーザ・インタフェース

Country Status (5)

Country Link
US (5) US9025018B2 (https=)
EP (3) EP2024732B1 (https=)
JP (4) JP2009540511A (https=)
CN (1) CN101461026B (https=)
WO (3) WO2007143736A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013183573A1 (ja) * 2012-06-08 2013-12-12 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1816668A2 (en) 2006-02-01 2007-08-08 FEI Company Particle-optical apparatus with a predetermined final vacuum pressure
US8598524B2 (en) 2006-06-07 2013-12-03 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
KR101118692B1 (ko) * 2006-10-11 2012-03-12 전자빔기술센터 주식회사 자기 렌즈층을 포함한 전자 칼럼
EP2105944A1 (en) 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
US7791020B2 (en) 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
EP2350798A1 (en) * 2008-10-30 2011-08-03 The University of Bristol Representation system
DE102008064696B4 (de) * 2008-12-23 2022-01-27 Carl Zeiss Microscopy Gmbh Teilchenoptische Vorrichtung mit Magnetanordnung und ihre Verwendung zum Abbilden oder Beleuchten
CN101769475B (zh) * 2008-12-31 2013-04-24 鸿富锦精密工业（深圳）有限公司 影像测量仪光源及利用该光源的自动定位系统
JP5124507B2 (ja) * 2009-02-16 2013-01-23 株式会社日立ハイテクノロジーズ 電子線装置および電子線装置用試料保持装置
DE102009020663A1 (de) 2009-05-11 2010-11-25 Carl Zeiss Ag Mikroskopie eines Objektes mit einer Abfolge von optischer Mikroskopie und Teilchenstrahlmikroskopie
US8334511B2 (en) * 2009-05-15 2012-12-18 Fei Company Electron microscope with integrated detector(s)
JP5306088B2 (ja) * 2009-07-14 2013-10-02 オリンパス株式会社 顕微鏡システム
EP2292953A1 (en) 2009-09-07 2011-03-09 Fei Company High-vacuum seal
US9492887B2 (en) 2010-04-01 2016-11-15 Electro Scientific Industries, Inc. Touch screen interface for laser processing
EP2557446B1 (en) * 2010-04-05 2019-09-04 Olympus Corporation Microscope controller and microscope system comprising the microscope controller
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
DE102010063392B4 (de) * 2010-11-15 2016-12-15 Leica Microsystems (Schweiz) Ag Mikroskop mit Sensorbildschirm, zugehörige Steuereinrichtung und Betriebsverfahren
AT510799B1 (de) * 2010-11-29 2012-12-15 Leica Microsystems Schweiz Ag Halterung für einen elektronenmikroskopischen probenträger
WO2012116168A2 (en) * 2011-02-23 2012-08-30 Rhk Technology, Inc. Integrated microscope and related methods and devices
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8624199B2 (en) * 2011-10-28 2014-01-07 Fei Company Sample block holder
KR101270773B1 (ko) 2011-11-07 2013-06-03 한국해양과학기술원 빛의 난반사를 감소시키는 해양 생물표본 촬영장치
TWI457598B (zh) * 2012-01-20 2014-10-21 Academia Sinica 光學模組及顯微鏡
JP5814855B2 (ja) * 2012-04-27 2015-11-17 株式会社日立ハイテクノロジーズ 荷電粒子線調整支援装置および方法
JP6124570B2 (ja) 2012-11-30 2017-05-10 株式会社ミツトヨ Ｘｙｚ直交測定装置
KR101878753B1 (ko) * 2012-12-20 2018-07-16 삼성전자주식회사 수직 장착이 가능한 현미경용 시료 스테이지 및 이를 채용한 주사 탐침 현미경
NL2010213C2 (en) * 2013-01-31 2014-08-04 Lely Patent Nv Camera system, animal related system therewith, and method to create 3d camera images.
JP6078637B2 (ja) * 2013-04-12 2017-02-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびフィルタ部材
DE102013007220B4 (de) * 2013-04-25 2015-12-03 Crosslinking AB Verbindungselement für eine Elektronenstrahleinheit, Elektronenstrahleinheit sowie Verfahren zur Instandsetzung einer Elektronenstrahleinheit
US20180252907A1 (en) * 2013-06-28 2018-09-06 Discover Echo Inc. Upright and inverted standing microscope
US9601305B2 (en) 2013-11-11 2017-03-21 Howard Hughes Medical Institute Specimen sample holder for workpiece transport apparatus
US9564291B1 (en) * 2014-01-27 2017-02-07 Mochii, Inc. Hybrid charged-particle beam and light beam microscopy
KR101623949B1 (ko) * 2014-05-19 2016-05-25 (주)코셈 소형 전자 현미경
EP2966668B1 (en) * 2014-07-10 2016-10-12 Fei Company Method of calibrating a scanning transmission charged-particle microscope
NL2013432B1 (en) 2014-09-05 2016-09-28 Delmic B V Compact inspection apparatus comprising a combination of a Scanning Electron Microscope and an Optical microscope.
US9842724B2 (en) 2015-02-03 2017-12-12 Kla-Tencor Corporation Method and system for imaging of a photomask through a pellicle
KR101725137B1 (ko) * 2015-08-21 2017-04-26 한국표준과학연구원 전자현미경용 시료실 장치 및 이를 구비한 전자현미경
US9859097B2 (en) 2015-09-01 2018-01-02 The Board Of Trustees Of The Leland Stanford Junior University Vacuum tube electron microscope
IL259602B (en) * 2015-11-30 2022-07-01 Hermes Microvision Inc Apparatus of plural charged-particle beams
NL2016367B1 (en) * 2016-03-04 2017-09-19 Phenom-World Holding B V Scanning electron microscope
US10211021B2 (en) 2016-04-11 2019-02-19 Kla-Tencor Corporation Permanent-magnet particle beam apparatus and method incorporating a non-magnetic metal portion for tunability
US9972474B2 (en) 2016-07-31 2018-05-15 Fei Company Electron microscope with multiple types of integrated x-ray detectors arranged in an array
CN106680305B (zh) * 2016-11-23 2023-08-04 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
JP7042071B2 (ja) 2016-12-20 2022-03-25 エフ・イ－・アイ・カンパニー ｅビーム操作用の局部的に排気された容積を用いる集積回路解析システムおよび方法
JP2019132637A (ja) * 2018-01-30 2019-08-08 株式会社日立ハイテクノロジーズ 欠陥観察装置
DE102018203096B9 (de) * 2018-03-01 2020-02-27 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens
JP6824210B2 (ja) * 2018-03-05 2021-02-03 日本電子株式会社 電子顕微鏡
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NL2024694B1 (en) 2020-01-17 2021-09-08 Delmic Ip B V Apparatus and method for projecting an array of multiple charged particle beamlets on a sample
BE1028265B1 (nl) * 2020-05-05 2021-12-06 Matthias Iturrospe Scanning microscoop mechanisme en werkwijze voor het laden van preparaten
DE102021109820B3 (de) 2021-04-19 2022-08-04 Carl Zeiss Microscopy Gmbh Verfahren zum Betreiben eines Teilchenstrahlmikroskopiesystems, Teilchenstrahlmikroskopiesystem und Computerprogrammprodukt
TWI781623B (zh) * 2021-05-17 2022-10-21 和碩聯合科技股份有限公司 物件量測方法與物件量測系統
US20230197399A1 (en) * 2021-12-21 2023-06-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron microscope, electron source for electron microscope, and methods of operating an electron microscope
US12437965B1 (en) * 2022-08-01 2025-10-07 Mochil, Inc. Charged-particle beam microscope with differential vacuum pressures
JP7681649B2 (ja) * 2023-07-19 2025-05-22 日本電子株式会社 荷電粒子線装置及びカメラ画像表示方法
CN118914259A (zh) * 2024-08-15 2024-11-08 深圳市中图仪器股份有限公司 扫描电子显微成像系统及显微测量方法

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933744A (ja) * 1982-08-18 1984-02-23 Jeol Ltd 試料走査像表示装置
JPH0197359A (ja) * 1987-10-09 1989-04-14 Jeol Ltd 電子顕微鏡等の自動モンタージュ撮影装置
JPH03138841A (ja) * 1989-10-23 1991-06-13 Hitachi Ltd 走査形電子顕微鏡
JPH0613011A (ja) * 1991-12-12 1994-01-21 Denshi Kogaku Kenkyusho:Kk 電子顕微鏡の試料位置制御装置
JPH06275226A (ja) * 1993-03-18 1994-09-30 Sumitomo Metal Ind Ltd 観察位置表示装置
JPH08210987A (ja) * 1995-02-02 1996-08-20 Olympus Optical Co Ltd 欠陥検出用顕微鏡装置
JPH103875A (ja) * 1996-06-13 1998-01-06 Hitachi Ltd 走査電子顕微鏡
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式
JP2005033177A (ja) * 2003-05-05 2005-02-03 Kla-Tencor Technologies Corp 反射率測定によるエッジビード除去の検査
JP2005123018A (ja) * 2003-10-16 2005-05-12 Jeol Ltd 画像表示方法及び画像表示装置
JP2006019280A (ja) * 2004-07-01 2006-01-19 Fei Co サンプルを真空排気するための装置
JP2006073345A (ja) * 2004-09-02 2006-03-16 Keyence Corp 荷電粒子線装置、荷電粒子線装置の操作方法、荷電粒子線装置操作プログラムおよびコンピュータで読み取り可能な記録媒体又は記録した機器

Family Cites Families (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US706990A (en) * 1900-11-08 1902-08-12 Champion Sanitary Enamel Ware Co Water-closet bowl.
US2272843A (en) * 1940-07-31 1942-02-10 Rca Corp Electron microscope specimen chamber
US3602686A (en) 1967-04-11 1971-08-31 Westinghouse Electric Corp Electron-beam apparatus and method of welding with this apparatus
US3981546A (en) * 1969-09-29 1976-09-21 Sperman Jacob H Air bearing construction
US3761709A (en) * 1971-03-16 1973-09-25 Jeol Ltd Method and apparatus for observing biological specimens using a scanning electron microscope
NL7203264A (https=) 1972-03-10 1973-09-12
US3755706A (en) 1972-03-20 1973-08-28 Varian Associates Miniaturized traveling wave tube
DE2333441C3 (de) 1973-06-30 1975-12-18 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Lauffeldröhre
JPS5523746Y2 (https=) 1976-02-05 1980-06-06
US4165881A (en) * 1976-07-15 1979-08-28 Morgan Construction Company Flexible seal and seal assembly
US4162391A (en) * 1977-12-19 1979-07-24 Sciaky Bros., Inc. Sliding vacuum seal means
DE2819165A1 (de) * 1978-05-02 1979-11-15 Siemens Ag Rasterelektronenmikroskop
EP0017472A1 (en) * 1979-04-06 1980-10-15 Lintott Engineering Limited Evacuable equipment containing a device for heat transfer and process for the manufacture of semi-conductor components using this equipment
US4229655A (en) * 1979-05-23 1980-10-21 Nova Associates, Inc. Vacuum chamber for treating workpieces with beams
GB2079035A (en) * 1980-06-10 1982-01-13 Philips Electronic Associated Deflection system for charged-particle beam
FR2499314A1 (fr) * 1981-02-04 1982-08-06 Centre Nat Rech Scient Ensemble de microscope electronique a balayage a fonctionnement in situ
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4607167A (en) * 1982-10-19 1986-08-19 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
US4584479A (en) * 1982-10-19 1986-04-22 Varian Associates, Inc. Envelope apparatus for localized vacuum processing
US4660190A (en) * 1983-01-25 1987-04-21 Sharp Kabushiki Kaisha Optical focus position control in optical disc apparatus
DE3332248A1 (de) 1983-09-07 1985-03-21 Lutz-Achim Dipl.-Ing. 7000 Stuttgart Gäng System zum ableiten von probenaufladungen bei rasterelektronenmikroskopischen untersuchungen
JPS6091544A (ja) * 1983-10-24 1985-05-22 Anelva Corp オ−ジエ分析装置
US4705949A (en) 1985-11-25 1987-11-10 The United States Of America As Represented By The Secretary Of Commerce Method and apparatus relating to specimen cells for scanning electron microscopes
GB2192092A (en) * 1986-06-25 1987-12-31 Philips Electronic Associated Magnetic lens system
US4818838A (en) 1988-01-11 1989-04-04 The Perkin-Elmer Corporation Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems
JPH01296549A (ja) 1988-05-25 1989-11-29 Hitachi Ltd 荷電粒子光学系
US4933552A (en) * 1988-10-06 1990-06-12 International Business Machines Corporation Inspection system utilizing retarding field back scattered electron collection
US5103102A (en) 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
JPH03194838A (ja) 1989-12-22 1991-08-26 Sumitomo Metal Ind Ltd 帯電防止方法及び該方法に使用する帯電防止装置
EP0462554B1 (en) * 1990-06-20 2000-10-11 Hitachi, Ltd. Charged particle beam apparatus
DE4102102C2 (de) * 1991-01-25 1995-09-07 Leybold Ag Magnetanordnung mit wenigstens zwei Permanentmagneten sowie ihre Verwendung
JPH04363849A (ja) 1991-06-10 1992-12-16 Mitsubishi Electric Corp 電子ビーム装置
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
US5300776A (en) * 1992-09-16 1994-04-05 Gatan, Inc. Autoadjusting electron microscope
JP2851213B2 (ja) * 1992-09-28 1999-01-27 株式会社東芝 走査電子顕微鏡
JPH06139984A (ja) 1992-10-23 1994-05-20 Hitachi Ltd 電子顕微鏡の真空リーク機構
JP3422045B2 (ja) * 1993-06-21 2003-06-30 株式会社日立製作所 組成及び格子歪測定用電子顕微鏡及びその観察方法
JP3310136B2 (ja) * 1994-09-17 2002-07-29 株式会社東芝 荷電ビーム装置
JP3610635B2 (ja) * 1995-07-18 2005-01-19 マツダ株式会社 車載機器の操作用表示装置
FR2747112B1 (fr) * 1996-04-03 1998-05-07 Commissariat Energie Atomique Dispositif de transport d'objets plats et procede de transfert de ces objets entre ledit dispositif et une machine de traitement
US5852270A (en) * 1996-07-16 1998-12-22 Leybold Inficon Inc. Method of manufacturing a miniature quadrupole using electrode-discharge machining
DE19633997C1 (de) * 1996-08-23 1998-03-26 Univ Stuttgart Bildübertragende Objektfernuntersuchungseinrichtung
US5869833A (en) * 1997-01-16 1999-02-09 Kla-Tencor Corporation Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
SG74599A1 (en) * 1997-09-27 2000-08-22 Inst Of Material Res & Enginee Portable high resolution scanning electron microscope column using permanent magnet electron lenses
US5989444A (en) * 1998-02-13 1999-11-23 Zywno; Marek Fluid bearings and vacuum chucks and methods for producing same
JPH11283544A (ja) 1998-03-31 1999-10-15 Advantest Corp 電子ビーム照射装置
EP0969494A1 (en) 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
TWI233535B (en) * 1999-04-19 2005-06-01 Asml Netherlands Bv Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
TWI242111B (en) 1999-04-19 2005-10-21 Asml Netherlands Bv Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
JP3850182B2 (ja) 1999-09-09 2006-11-29 日本電子株式会社 荷電粒子線装置
KR100633201B1 (ko) * 1999-12-23 2006-10-11 엘지전자 주식회사 광픽업용 엑츄에이터
EP1122761B1 (en) 2000-02-01 2004-05-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optical column for charged particle beam device
US6515288B1 (en) * 2000-03-16 2003-02-04 Applied Materials, Inc. Vacuum bearing structure and a method of supporting a movable member
US6559457B1 (en) * 2000-03-23 2003-05-06 Advanced Micro Devices, Inc. System and method for facilitating detection of defects on a wafer
US6582251B1 (en) * 2000-04-28 2003-06-24 Greene, Tweed Of Delaware, Inc. Hermetic electrical connector and method of making the same
WO2001097245A2 (en) * 2000-06-15 2001-12-20 Kla-Tencor, Inc. Sectored magnetic lens and method of use
WO2002013227A1 (en) * 2000-07-27 2002-02-14 Ebara Corporation Sheet beam test apparatus
JP3619132B2 (ja) * 2000-08-25 2005-02-09 株式会社日立製作所 電子顕微鏡
US6507147B1 (en) * 2000-08-31 2003-01-14 Intevac, Inc. Unitary vacuum tube incorporating high voltage isolation
US6552340B1 (en) * 2000-10-12 2003-04-22 Nion Co. Autoadjusting charged-particle probe-forming apparatus
FR2823005B1 (fr) 2001-03-28 2003-05-16 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau
US20020145118A1 (en) * 2001-04-10 2002-10-10 Applied Materials, Inc. Detection of backscattered electrons from a substrate
JP2002319361A (ja) * 2001-04-20 2002-10-31 Hitachi Ltd 走査電子顕微鏡の異種倍率設定方法
US6683316B2 (en) * 2001-08-01 2004-01-27 Aspex, Llc Apparatus for correlating an optical image and a SEM image and method of use thereof
JP2003086355A (ja) * 2001-09-05 2003-03-20 Kiko Kenji Kagi Kofun Yugenkoshi 有機ｅｌ素子の封止構造並びに封止方法及び封止装置
JP2003098112A (ja) * 2001-09-25 2003-04-03 Hitachi Ltd 薄膜デバイスの表面画像の検出・出力方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
CN101266909B (zh) * 2001-10-05 2010-09-01 佳能株式会社 截面评估方法
JP3886777B2 (ja) 2001-11-02 2007-02-28 日本電子株式会社 電子線照射装置および方法
US6710354B1 (en) * 2001-12-11 2004-03-23 Kla-Tencor Corporation Scanning electron microscope architecture and related material handling system
JP4014916B2 (ja) * 2002-04-11 2007-11-28 株式会社キーエンス 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡操作プログラムおよびコンピュータで読み取り可能な記録媒体
JP2003346697A (ja) 2002-05-24 2003-12-05 Technex Lab Co Ltd 永久磁石レンズを使用した走査電子顕微鏡
US6891170B1 (en) * 2002-06-17 2005-05-10 Zyvex Corporation Modular manipulation system for manipulating a sample under study with a microscope
JP2004031207A (ja) * 2002-06-27 2004-01-29 Canon Inc 電子線照射装置および走査型電子顕微鏡装置
US6843927B2 (en) * 2002-08-27 2005-01-18 Kla-Tencor Technologies Corporation Method and apparatus for endpoint detection in electron beam assisted etching
US6667475B1 (en) 2003-01-08 2003-12-23 Applied Materials, Inc. Method and apparatus for cleaning an analytical instrument while operating the analytical instrument
JP4373104B2 (ja) 2003-02-18 2009-11-25 株式会社荏原製作所 荷電粒子ビーム装置
NL1022886C2 (nl) * 2003-03-10 2004-09-14 Fei Co Deeltjes optische inrichting voor het bestralen van een object.
NL1023260C1 (nl) * 2003-04-24 2004-10-27 Fei Co Deeltjes-optisch apparaat met een permanent magnetische lens en een elektrostatische lens.
JP4211473B2 (ja) 2003-04-25 2009-01-21 ソニー株式会社 電子顕微鏡
US6730904B1 (en) * 2003-04-30 2004-05-04 Varian, Inc. Asymmetric-field ion guiding devices
JP2004363085A (ja) 2003-05-09 2004-12-24 Ebara Corp 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法
JP2004349515A (ja) * 2003-05-23 2004-12-09 Hitachi High-Technologies Corp Ｓｅｍ式外観検査装置，レビュー装置、およびアライメント座標設定方法
US6897443B2 (en) * 2003-06-02 2005-05-24 Harald Gross Portable scanning electron microscope
US7060990B2 (en) * 2003-06-16 2006-06-13 Sumitomo Heavy Industries, Ltd. Stage base, substrate processing apparatus, and maintenance method for stage
EP1501115B1 (en) * 2003-07-14 2009-07-01 FEI Company Dual beam system
JP4564728B2 (ja) * 2003-07-25 2010-10-20 株式会社日立ハイテクノロジーズ 回路パターンの検査装置
US7100925B2 (en) * 2003-07-31 2006-09-05 Perkin Elmer, Inc. Pressure energized metallic seal
KR100592242B1 (ko) 2003-08-12 2006-06-21 삼성에스디아이 주식회사 캐리어 및 이를 구비하는 분석장치
JP4090983B2 (ja) 2003-11-11 2008-05-28 三菱電機株式会社 回路遮断器
JP4063201B2 (ja) 2003-11-18 2008-03-19 ソニー株式会社 電子ビーム照射装置
US7043848B2 (en) * 2003-11-26 2006-05-16 The Micromanipulator Company Method and apparatus for maintaining accurate positioning between a probe and a DUT
JP2005203123A (ja) 2004-01-13 2005-07-28 Sony Corp 荷電粒子ビーム装置。
JP2005243587A (ja) 2004-03-01 2005-09-08 Technex Lab Co Ltd 低真空走査電子顕微鏡
JP4528014B2 (ja) * 2004-04-05 2010-08-18 株式会社日立ハイテクノロジーズ 試料検査方法
NL1026006C2 (nl) * 2004-04-22 2005-10-25 Fei Co Deeltjes-optisch apparaat voorzien van lenzen met permanent magnetisch materiaal.
JP4559137B2 (ja) * 2004-06-30 2010-10-06 キヤノン株式会社 真空機器の製造装置及び製造方法
JP2006114225A (ja) * 2004-10-12 2006-04-27 Hitachi High-Technologies Corp 荷電粒子線装置
KR100628321B1 (ko) 2004-12-16 2006-09-27 한국전자통신연구원 마이크로 칼럼 전자빔 장치
US7211767B1 (en) * 2004-12-27 2007-05-01 Emc Corporation Techniques for treating a surface crack on a component
JP4895569B2 (ja) * 2005-01-26 2012-03-14 株式会社日立ハイテクノロジーズ 帯電制御装置及び帯電制御装置を備えた計測装置
US20060249917A1 (en) * 2005-04-07 2006-11-09 Saint-Gobain Performance Plastics Corporation Composite sealing device
US20070010006A1 (en) 2005-06-29 2007-01-11 Pitney Bowes Incorporated System and method for detecting biohazardous threats
US20070011300A1 (en) 2005-07-11 2007-01-11 Hollebeek Robert J Monitoring method and system for monitoring operation of resources
US7301157B2 (en) 2005-09-28 2007-11-27 Fei Company Cluster tool for microscopic processing of samples
NL1030295C2 (nl) * 2005-10-28 2007-05-03 Fei Co Hermetisch afgesloten behuizing met elektrische doorvoer.
US20070145267A1 (en) * 2005-12-12 2007-06-28 Adler David L Portable scanning electron microscope
EP1863066A1 (en) 2006-05-29 2007-12-05 FEI Company Sample carrier and sample holder
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
US8598524B2 (en) * 2006-06-07 2013-12-03 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
EP2105944A1 (en) * 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
US8110801B2 (en) * 2009-03-05 2012-02-07 Agilent Technologies, Inc. Layered scanning charged particle microscope package for a charged particle and radiation detector
US8087309B2 (en) 2009-05-22 2012-01-03 Sion Power Corporation Hermetic sample holder and method for performing microanalysis under controlled atmosphere environment

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933744A (ja) * 1982-08-18 1984-02-23 Jeol Ltd 試料走査像表示装置
JPH0197359A (ja) * 1987-10-09 1989-04-14 Jeol Ltd 電子顕微鏡等の自動モンタージュ撮影装置
JPH03138841A (ja) * 1989-10-23 1991-06-13 Hitachi Ltd 走査形電子顕微鏡
JPH0613011A (ja) * 1991-12-12 1994-01-21 Denshi Kogaku Kenkyusho:Kk 電子顕微鏡の試料位置制御装置
JPH06275226A (ja) * 1993-03-18 1994-09-30 Sumitomo Metal Ind Ltd 観察位置表示装置
JPH08210987A (ja) * 1995-02-02 1996-08-20 Olympus Optical Co Ltd 欠陥検出用顕微鏡装置
JPH103875A (ja) * 1996-06-13 1998-01-06 Hitachi Ltd 走査電子顕微鏡
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式
JP2005033177A (ja) * 2003-05-05 2005-02-03 Kla-Tencor Technologies Corp 反射率測定によるエッジビード除去の検査
JP2005123018A (ja) * 2003-10-16 2005-05-12 Jeol Ltd 画像表示方法及び画像表示装置
JP2006019280A (ja) * 2004-07-01 2006-01-19 Fei Co サンプルを真空排気するための装置
JP2006073345A (ja) * 2004-09-02 2006-03-16 Keyence Corp 荷電粒子線装置、荷電粒子線装置の操作方法、荷電粒子線装置操作プログラムおよびコンピュータで読み取り可能な記録媒体又は記録した機器

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013183573A1 (ja) * 2012-06-08 2013-12-12 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
JP5537737B2 (ja) * 2012-06-08 2014-07-02 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9129773B2 (en) 2012-06-08 2015-09-08 Hitachi High-Technologies Corporation Charged particle beam apparatus

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