EP2050718A1 - Beschichtungsflüssigkeit, durch verwendung der beschichtungsflüssigkeit gebildeter dünner titanoxidfilm und bildungsverfahren dafür - Google Patents

Beschichtungsflüssigkeit, durch verwendung der beschichtungsflüssigkeit gebildeter dünner titanoxidfilm und bildungsverfahren dafür Download PDF

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Publication number
EP2050718A1
EP2050718A1 EP20060843186 EP06843186A EP2050718A1 EP 2050718 A1 EP2050718 A1 EP 2050718A1 EP 20060843186 EP20060843186 EP 20060843186 EP 06843186 A EP06843186 A EP 06843186A EP 2050718 A1 EP2050718 A1 EP 2050718A1
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EP
European Patent Office
Prior art keywords
titanium oxide
oxide film
coating liquid
base plate
film
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP20060843186
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English (en)
French (fr)
Inventor
Christopher Cordonier
Tetsuya Shichi
Takafumi Numata
Kenichi Katsumata
Akimasa Nakamura
Yasuhiro Katsumata
Teruo Komine
Kenichirou Amemiya
Akira Fujishima
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Central Japan Railway Co
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Central Japan Railway Co
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Application filed by Central Japan Railway Co filed Critical Central Japan Railway Co
Publication of EP2050718A1 publication Critical patent/EP2050718A1/de
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/066—Zirconium or hafnium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B01J37/0219—Coating the coating containing organic compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3607—Titanium dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/84—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by UV- or VIS- data
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Definitions

  • the present invention is related to a coating liquid used for forming a titanium oxide film, a titanium oxide film, a forming method thereof, and a product having a titanium oxide film formed on a surface of the product.
  • a titanium oxide-based photocatalyst absorbs near-ultraviolet, and exhibits a strong oxidative decomposition ability so as to oxidatively decompose and detoxify environmental contaminants, such as various organic substances and NOx.
  • a base plate is coated with titanium oxide-based photocatalysts
  • upon exposure to light the surface of the base plate exhibits a photo-induced ultra hydrophilic property, and becomes easily soluble in water, such that fouling on the surface of the base plate can be easily washed off by water.
  • a titanium oxide-based photocatalyst has an ability to decompose fouling by the action of light, and an ability to facilitate a removal of fouling by water. Because of these abilities, titanium oxide-based photocatalysts have been put into practical use as self-cleaning materials which constantly keep surfaces clean.
  • amorphous titanium oxide does not have photocatalytic performance
  • amorphous titanium oxide needs to be crystallized by heating.
  • crystals obtained by the crystallization are particulate, the adhesion between a film and a base plate is lost and exfoliation and the like are caused.
  • an alternative method can be used wherein a film of titanium sol peroxide supports particles having photocatalytic performance, and the particles are fixed by drying, increasing the hardness and the strength of adhesion of the film is difficult in this method.
  • photocatalytic glass When application of photocatalysts to glass is considered, although photocatalytic glass is commercially available for building materials, photocatalytic glass for vehicles, such as for automobiles, trains, and so on, does not exist except for relatively small dimensioned products, such as photocatalytic mirrors. This is because, as described above, photocatalytic films formed by conventional techniques do not have sufficient durability, and, therefore, such films cannot endure friction caused by washing brushes and the like which are regularly used for cleaning vehicles.
  • the present invention is made in consideration of the above issues.
  • the purpose is to provide a coating liquid by which titanium oxide films can be easily formed, at lower firing temperature where cracks or poor adhesion are not caused in obtained titanium oxide films, and obtained titanium oxide films exhibit excellent anti-stain and anti-fouling properties.
  • the purpose is also to provide a method for forming such titanium oxide film, a titanium oxide film, and a product covered by such titanium oxide film.
  • a first invention of the present application is related to a coating liquid including organic metal complexes represented by Chemical Formula 1.
  • R 1 -R 8 in Chemical Formula 1 is one of the followings (1)-(4):
  • a titanium oxide film formed by using the coating liquid according to the present invention does not have cracks formed thereon, and has an excellent adhesion to a base plate. Moreover, because cracks are not formed, the thickness of a titanium oxide film can be increased.
  • the organic metal complex has a flat structure as clear from the molecular structure represented in Chemical Formula 1.
  • a molecular assembly (stacking) is formed such that the organic metal complexes are overlapped with one another.
  • aromatic rings included in the ligands contributes to the formation of the above-described molecular assembly. Therefore, even if the ligands are lost during firing, contraction in the volume in a direction parallel to the surface of a base plate is assumed to be inhibited, and occurrence of cracks and exfoliation is therefore assumed to be inhibited.
  • a titanium oxide film formed by using the coating liquid according to the present invention has a high degree of hardness. Furthermore, a titanium oxide film formed by using the coating liquid according to the present invention is flat, smooth, and has high transparency. Therefore, in a case, for example, wherein a titanium oxide film is formed on the surface of glass, the transparency of the glass can be maintained. In a case wherein a titanium oxide film is formed on the surface of a mirror, the reflectivity of the mirror can be maintained.
  • the coating liquid according to the present invention can form a titanium oxide film having durability even though the coating liquid does not contain a binder. Since the concentration of titanium oxide, contained in the formed film, is not diluted by a binder, the effect of titanium oxide (for example, photocatalytic effect in the wavelength range of ultraviolet radiation) is high.
  • the coating liquid according to the present invention is stable, the coating liquid can be preserved for a long term.
  • the organic metal complex represented in the above-described Chemical Formula 1 may be, for example, a titan-salicylic acid complex.
  • the titan-salicylic acid complex is a chemical compound wherein R 1 -R 8 in Chemical Formula 1 are all H.
  • the coating liquid according to the present invention can be easily produced.
  • the coating liquid can be made merely by adding, in a suitable solvent, two molar equivalent of an ingredient, which becomes a ligand, to basic ingredients, such as metal alkoxide, metal chloride, and so on, heating the ingredients so as to produce organic metal complexes, and performing filtering/recovering if necessary.
  • the ingredient which becomes the ligand is, for example, a compound represented Chemical Formula 2.
  • R 10 -R 13 in Chemical Formula 2 is one of the followings (1)-(4):
  • alcohol such as 2-propanol, methanol, ethanol, n-butanol
  • ether such as diethyl ether, MTBE, THF, and so on
  • hydrocarbon such as
  • the concentration of organic metal complexes in the coating liquid is not specifically limited, as long as the concentration does not exceed the solubility of organic metal complexes, the concentration is preferably, for example, 0.01-10 % by weight.
  • n in the group represented by the above-described C n H 2n+1 is preferable to be equal to or smaller than 10, more preferable to be equal to or smaller than 5, and particularly preferable to be equal to or smaller than 2.
  • m in the above-described R 9 C m H 2m+1 is preferable to be equal to or smaller than 4, more preferable to be equal to or smaller than 2, and particularly preferable to be equal to or smaller than 1.
  • the group represented by COOR 9 preferably exits in R 2 , R 3 , R 6 , R 7 , R 11 , or R 12 .
  • halogen atom Cl, Br, I, for example, can be used.
  • a second invention of the present application is related to a method for forming a titanium oxide film including steps of applying the coating liquid, according to the above-described first invention, on a base plate so as to form a film, and changing the organic metal complex, included in the film, into titanium oxide.
  • a titanium oxide film formed according to the present invention does not have cracks formed thereon, and has an excellent adhesion to a base plate. Moreover, because cracks are not formed as described above, the thickness of a titanium oxide film can be increased.
  • a titanium oxide film formed according to the present invention is flat, smooth, and has high transparency. Therefore, in a case, for example, wherein a titanium oxide film is formed on the surface of glass, the transparency of the glass can be maintained. In a case wherein a titanium oxide film is formed on the surface of a mirror, the reflectivity of the mirror can be maintained.
  • the coating liquid used in the present invention can form a titanium oxide film having durability even though the coating liquid does not contain a binder. Since the concentration of titanium oxide, contained in the formed film, is not diluted by a binder, the effect of titanium oxide (for example, photocatalytic effect in the wavelength range of ultraviolet radiation) is high.
  • glass PYREX (registered trademark) glass, soda glass, quartz glass
  • the firing temperature may be lower than the strain point and the annealing point of glass (soda-lime glass in particular).
  • metal such as iron, stainless steel, aluminum, copper, brass and so on
  • ceramics such as alumina, zirconia, silica
  • heat-resistant macromolecule of resin such as polyimide resin and the like
  • films can be formed by that method.
  • Generally used coating methods for example, spin coat, dip coat, spray coat methods and so on, may be used.
  • films are preferably naturally dried at normal temperatures and normal pressures. Then, firing of the films, for example, may be performed.
  • the firing temperature is preferable to be a temperature, for example, equal to or higher than 300°C and equal to or lower than the melting point of a base plate on which the coating liquid is applied (the melting point of the base plate is preferably 300°C or higher).
  • the firing temperature may be in a range of 300-600°C. If the firing temperature is 300°C or higher, the photocatalytic activity of a titanium oxide film becomes increased. If the firing temperature is 350°C or higher, the hardness of a titanium oxide film becomes increased (for example, 9H or higher).
  • the firing temperature is 400°C or higher, a film which is harder and denser (a film durable against a brush test to be described later) can be formed.
  • the firing temperature can be a low temperature in the range of 300°C (or 350°C, 400°C)
  • a titanium oxide film can be formed on the surface of a base plate which is not resistant to heat.
  • the firing temperature may be adjusted depending on a desired crystalline phase of a titanium oxide film. Firing time is sufficient to be 1 minute or longer, preferably 1 hour or longer.
  • a third invention of the present application is related to a titanium oxide film formed by the method for forming a titanium oxide film according to the above-described second invention.
  • a titanium oxide film according to the present invention does not have cracks formed thereon, has an excellent adhesion to a base plate, and has high degree of hardness. Moreover, the titanium oxide film according to the present invention is flat, smooth, and has high transparency. Therefore, in a case, for example, wherein the titanium oxide film is formed on the surface of glass, the transparency of the glass can be maintained. In a case wherein the titanium oxide film is formed on the surface of a mirror, the reflectivity of the mirror can be maintained.
  • the titanium oxide film according to the present invention does not have to contain a binder, the concentration of titanium oxide, contained in the formed film, is not diluted by a binder, and the effect of titanium oxide (for example, photocatalytic effect in the wavelength range of ultraviolet radiation) is high.
  • a fourth invention of the present application is related to a titanium oxide film covered product including a base plate, and a titanium oxide film formed on a surface of the base plate by the method for forming a titanium oxide film according to the above-described second invention.
  • the titanium oxide film covered product according to the present invention does not have cracks formed thereon, has an excellent adhesion to a base plate, and has high degree of hardness. Moreover, the titanium oxide film according to the present invention is flat, smooth, and has high transparency. Therefore, in a case, for example, wherein the titanium oxide film is formed on the surface of glass, the transparency of the glass can be maintained. In a case wherein the titanium oxide film is formed on the surface of a mirror, the reflectivity of the mirror can be maintained.
  • the titanium oxide film according to the present invention does not have to contain a binder, the concentration of titanium oxide, contained in the formed film, is not diluted by a binder, and the effect of titanium oxide (for example, photocatalytic effect in the wavelength range of ultraviolet radiation) is high.
  • glass PYREX (registered trademark) glass, soda glass, quartz glass
  • the firing temperature may be lower than the strain point and the annealing point of glass (soda-lime glass in particular).
  • metal such as iron, stainless steel, aluminum, copper, brass and so on
  • ceramics such as alumina, zirconia, silica
  • heat-resistant macromolecule of resin such as polyimide resin and the like
  • a solution was prepared wherein salicylic acid was dissolved in a suitable amount of xylene.
  • TTIP titanium(IV)isopropoxide
  • the above-described compound liquid was refluxed approximately for 1 hour, and then distilled until the amount of the compound liquid became half. While the compound liquid was distilled, the temperature of vapor became 140°C. After the distillation, residual mixture was left overnight at room temperature, and precipitate was formed therefrom and filtered by using a membrane suction filter. Subsequently, the filtered solid was placed in vacuum at 140°C so as to remove volatile component, and dried. The drying was continued until the amount of the solid became a value (approximately 98%) close to a theoretical value. The obtained solid was titan-salicylic acid complexes.
  • titan-salicylic acid complexes were dissolved into 100ml of compound liquid wherein acetylacetone and MEK (methyl ethyl ketone) were blended in the volume ratio of 1:9. Then, Coating Liquid A was completed. The concentration of titan-salicylic acid complexes in Coating Liquid A was determined to be 0.05M, or 0.01wt%.
  • Coating Liquid B was made by dissolving the above-described titan-salicylic acid complexes in acetylacetone.
  • concentration of titan-salicylic acid complexes in Coating Liquid B was determined to be 0.5M, or 0.1wt%.
  • each base plate made of soda glass (melting point is approximately 1000 °C) in the size of 150mm ⁇ 75mm
  • an undercoating layer (alkali barrier layer) was formed.
  • the undercoating layer was formed by a method wherein a commercially available undercoating liquid (Bistrator H (NDH-500A) produced by Nippon Soda Co., Ltd.), which is a high-temperature type photocatalytic undercoating liquid, was applied on the surface of each base plate by a dip coat method, and then fired for 1 hour in atmospheric air.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • Temperature control during firing was performed such that the temperature was increased from room temperature to 500°C in 1 hour, maintained at 500°C for 1 hour, and cooled down to room temperature in 1 hour.
  • Coating Liquid A produced in the above-described (a) was applied onto the surface of each glass base plate, on which the undercoating layer was formed, by the dip coat method.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • firing was performed at the firing temperatures shown in Table 1.
  • Temperature control during the firing was performed such that the temperature was increased from room temperature to a predetermined temperature in 1 hour, maintained at the predetermined temperature for 1 hour, and cooled down to room temperature in 1 hour.
  • titanium oxide film covered products 7 were completed, each of which includes, as shown in Fig. 1 , a titanium oxide (TiO 2 ) film 5 formed on a soda glass base plate 1 so as to interpose an undercoating layer 3.
  • haze, color difference, and hardness of the titanium oxide film 5 were evaluated.
  • Haze was measured based on JIS K 7136 by using NDH-500W produced by Nippon Denshoku Industries Co., Ltd.
  • Color difference was measured based on JIS Z 8722 by using SE-2000 produced by Nippon Denshoku Industries Co., Ltd.
  • Conditions for measuring hardness were conformed to Pencil Scratch Test (JIS K 5400).
  • the measurement results of haze, color difference, and hardness of the titanium oxide films 5 are shown in the aforementioned Table 1.
  • Table 1 in regard to the titanium oxide film covered products 7 according to Embodiment 1, haze values were small (transparency was high), color difference values were small, and hardness was high. Particularly, the higher the firing temperature was, the better the measurement results were in terms of color difference and hardness. On the other hand, in regard to Comparative Example 1, the hardness of the formed film was significantly low.
  • the amount of absorbed methylene blue measured as above is shown in Table 2.
  • "Firing temperature” shown in Table 2 is a temperature in which the titanium oxide film 5 was formed.
  • the titanium oxide film covered products 7 showed particularly high MB degradation performances, when the firing temperature so as to form the titanium oxide film 5 was 400°C or higher. This indicates that the photocatalytic property is particularly high when the firing temperature is 400°C or higher.
  • the base plate of Comparative Example 2 on which the titanium oxide film 5 was not formed (“no photocatalyst") showed a low MB degradation performance.
  • the brush 9 is a cylindrical brush for washing wherein horsehair 13 is radially attached around a rotational shaft 11. The length of the horsehair 13 is 35mm. The brush 9 was attached such that the distance between the rotational shaft 11 and the titanium oxide film covered product 7 became 25mm, and rotated at 500rmp for 10 minutes.
  • Titania nano sheet (TNS) suspension having a concentration of 0.25wt% was used as a coating liquid.
  • each soda glass base plate On the surface of each soda glass base plate, an undercoating layer was formed.
  • the type of the soda glass base plate and the undercoating layer are the same as in the above-described (b) in Embodiment 1.
  • the coating liquid prepared in the above-described (i) was applied according to the dip coat method so as to form a film.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • firing was performed in the atmospheric air. Temperature control during the firing was performed such that the temperature was increased from room temperature to 500°C in 1 hour, maintained at 500°C for 1 hour, and cooled down to room temperature in 1 hour.
  • an undercoating layer was formed on the surface of a soda glass base plate.
  • the type of the soda glass base plate and the undercoating layer are the same as the above-described (b) in Embodiment 1.
  • Coating Liquid B prepared in the above-described (a) in Embodiment 1 was applied according to the dip coat method so as to form a film.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • firing was performed in the atmospheric air. Temperature control during the firing was performed such that the temperature was increased from room temperature to 500°C in 1 hour, maintained at 500°C for 1 hour, and cooled down to room temperature in 1 hour.
  • an undercoating layer was formed on the surface of a soda glass base plate.
  • the type of the soda glass base plate and the undercoating layer are the same as the above-described (b) in Embodiment 1.
  • a commercially available photocatalytic coating liquid (Bistrator H Photocatalytic coating NDH-510C produced by Nippon Soda Co., Ltd.), which was a sol-gel type coating liquid for high-temperature baking, was applied according to the dip coat method so as to form a film.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • firing was performed in the atmospheric air. Temperature control during firing was performed such that the temperature was increased from room temperature to 500 °C in 1 hour, maintained at 500 °C for 1 hour, and cooled down to room temperature in 1 hour.
  • the titanium oxide film of the titanium oxide film covered product produced in the above-described (a) was observed by a microscope. A micrograph taken during the observation is shown in Fig. 3 . As shown in Fig. 3 , no cracks were observed on the titanium oxide film.
  • a solution was prepared wherein 2,2'-iminodiethanol (2,2'-iminodiethanol) was dissolved in a suitable amount of toluene.
  • TTIP was dropped so as to obtain a mixed solution.
  • the mixed solution was prepared such that the mol ratio of TTIP and 2,2'-iminodiethanol became 1:2, and the total amount of the solvent in the mixed solution was adjusted such that the concentration of TTIP became 0.5M.
  • the above-described mixed solution was refluxed approximately for 1 hour, and then distilled until the amount of the mixed solution became half. During distillation, the temperature of steam became 110°C.
  • the coating liquid is a solution of titanium 2,2'-iminodiethoxide (complex of titanium-iminodiethanol). The molecular structure of titanium 2,2'-iminodiethoxide is shown in Fig. 5 .
  • an undercoating layer was formed on the surface of a soda glass base plate.
  • the type of the soda glass base plate and the undercoating layer are the same as the above-described (b) in Embodiment 1.
  • the coating liquid prepared in the above-described (i) was applied according to the dip coat method so as to form a film.
  • the lifting speed in the dip coat method was determined to be 8mm/sec.
  • firing was performed in the atmospheric air. Temperature control during the firing was performed such that the temperature was increased from room temperature to 500°C in 1 hour, maintained at 500°C for 1 hour, and cooled down to room temperature in 1 hour.
  • an undercoating layer (alkali barrier layer) was formed on the surface of each base plate made of soda glass in the size of 150mm ⁇ 75mm.
  • the undercoating layer was formed by a method wherein a commercially available undercoating liquid (Bistrator H (NDH-500A) produced by Nippon Soda Co., Ltd.), which is a high-temperature type photocatalytic undercoating liquid, was applied onto the surface of each base plate by the dip coat method, and then fired for 1 hour in atmospheric air.
  • the lifting speed in the dip coat method was determined to be 8mm/sec. Temperature control during the firing was performed such that the temperature was increased from room temperature to 500°C in 1 hour, maintained at 500°C for 1 hour, and cooled down to room temperature in 1 hour.
  • Coating Liquid A produced in the above-described Embodiment 1 was applied on the surface of each glass base plate, on which the undercoating layer was formed, by the dip coating method.
  • the lifting speed in the dip coating method was determined to be 8mm/sec.
  • clacination was performed at firing temperatures shown in Table 7.
  • Temperature control during the firing was performed such that the temperature was increased from room temperature to a predetermined firing temperature in 1 hour, maintained at the firing temperature for 24 hours, and cooled down to room temperature in 1 hour.
  • titanium oxide film covered products 7 were completed, each of which includes, as shown in Fig. 1 , a titanium oxide (TiO 2 film 5 formed on a soda glass base plate 1 so as to interpose an undercoating layer 3.
EP20060843186 2006-07-13 2006-12-25 Beschichtungsflüssigkeit, durch verwendung der beschichtungsflüssigkeit gebildeter dünner titanoxidfilm und bildungsverfahren dafür Withdrawn EP2050718A1 (de)

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JP2006193415 2006-07-13
PCT/JP2006/325783 WO2008007453A1 (fr) 2006-07-13 2006-12-25 Liquide de revêtement, couche mince d'oxyde de titane formée en utilisant le liquide de revêtement et son procédé de formation

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EP20060834809 Withdrawn EP2053022A1 (de) 2006-07-13 2006-12-15 Beschichtungslösung, unter verwendung der beschichtungslösung gebildeter dünner titanoxidfilm und verfahren zur bildung von dünnem film
EP20060843186 Withdrawn EP2050718A1 (de) 2006-07-13 2006-12-25 Beschichtungsflüssigkeit, durch verwendung der beschichtungsflüssigkeit gebildeter dünner titanoxidfilm und bildungsverfahren dafür
EP20070707804 Withdrawn EP2045359A1 (de) 2006-07-13 2007-01-31 Beschichtungsfluid, daraus gebildeter leitfähiger dünner film und herstellungsverfahren dafür
EP20070790723 Withdrawn EP2048111A1 (de) 2006-07-13 2007-07-12 Beschichtungsflüssigkeit, durch verwendung der beschichtungsflüssigkeit gebildeter dünner metallverbindungsfilm und bildungsverfahren dafür

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Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5413708B2 (ja) * 2008-04-23 2014-02-12 住友金属鉱山株式会社 透明導電膜、透明導電基板及びそれを用いたデバイス並びに透明導電膜の製造方法
JP5238023B2 (ja) * 2008-05-14 2013-07-17 東京応化工業株式会社 ポジ型感光性組成物
KR101120065B1 (ko) * 2009-01-08 2012-03-23 솔브레인 주식회사 신규의 아미딘 유도체를 가지는 게르마늄 화합물 및 이의 제조 방법
DE102009009337A1 (de) * 2009-02-17 2010-08-19 Evonik Degussa Gmbh Verfahren zur Herstellung halbleitender Indiumoxid-Schichten, nach dem Verfahren hergestellte Indiumoxid-Schichten und deren Verwendung
JP5627195B2 (ja) * 2009-04-27 2014-11-19 東海旅客鉄道株式会社 感光性組成物、感光性金属錯体、塗布液、及び金属酸化物薄膜パターンの製造方法
DE102009022117A1 (de) * 2009-05-20 2010-11-25 Siemens Aktiengesellschaft Material für eine Lochtransportschicht mit p-Dotierung
JP5582843B2 (ja) * 2010-03-30 2014-09-03 東海旅客鉄道株式会社 金属酸化物膜パターンの製造方法
JP5582962B2 (ja) * 2010-10-25 2014-09-03 東海旅客鉄道株式会社 透明導電膜の製膜方法
JP5675457B2 (ja) * 2011-03-25 2015-02-25 東海旅客鉄道株式会社 透明導電膜の製造方法
JP5728659B2 (ja) * 2011-07-29 2015-06-03 パナソニックＩｐマネジメント株式会社 感光性電磁波遮断インク組成物、電磁波遮断硬化物、および電磁波遮断硬化物の製造方法
US9382274B2 (en) 2012-07-27 2016-07-05 Lockheed Martin Advanced Energy Storage, Llc Aqueous redox flow batteries featuring improved cell design characteristics
US9768463B2 (en) 2012-07-27 2017-09-19 Lockheed Martin Advanced Energy Storage, Llc Aqueous redox flow batteries comprising metal ligand coordination compounds
US10164284B2 (en) 2012-07-27 2018-12-25 Lockheed Martin Energy, Llc Aqueous redox flow batteries featuring improved cell design characteristics
KR101956333B1 (ko) * 2013-12-11 2019-03-08 주식회사 엘지화학 나프탈렌 유도체와 금속 복합체를 포함하는 캡슐 조성물 및 이를 이용한 가역적 캡슐 형성방법
JP6269361B2 (ja) * 2014-07-14 2018-01-31 三菱ケミカル株式会社 シュウ酸ジフェニルの製造方法、炭酸ジフェニルの製造方法およびポリカーボネートの製造方法
KR102512254B1 (ko) 2014-11-26 2023-03-20 록히드 마틴 에너지, 엘엘씨 치환된 카테콜레이트의 금속 착물 및 이를 포함하는 레독스 플로우 배터리
US10253051B2 (en) 2015-03-16 2019-04-09 Lockheed Martin Energy, Llc Preparation of titanium catecholate complexes in aqueous solution using titanium tetrachloride or titanium oxychloride
US9666893B2 (en) * 2015-07-30 2017-05-30 Cristal Inorganic Chemicals Switzerland Ltd Hydrothermal treatment method for producing redox-active transition metal coordination compounds
US10316047B2 (en) 2016-03-03 2019-06-11 Lockheed Martin Energy, Llc Processes for forming coordination complexes containing monosulfonated catecholate ligands
US10644342B2 (en) 2016-03-03 2020-05-05 Lockheed Martin Energy, Llc Coordination complexes containing monosulfonated catecholate ligands and methods for producing the same
US9938308B2 (en) 2016-04-07 2018-04-10 Lockheed Martin Energy, Llc Coordination compounds having redox non-innocent ligands and flow batteries containing the same
US10377687B2 (en) 2016-07-26 2019-08-13 Lockheed Martin Energy, Llc Processes for forming titanium catechol complexes
US10343964B2 (en) 2016-07-26 2019-07-09 Lockheed Martin Energy, Llc Processes for forming titanium catechol complexes
US10065977B2 (en) 2016-10-19 2018-09-04 Lockheed Martin Advanced Energy Storage, Llc Concerted processes for forming 1,2,4-trihydroxybenzene from hydroquinone
US10930937B2 (en) 2016-11-23 2021-02-23 Lockheed Martin Energy, Llc Flow batteries incorporating active materials containing doubly bridged aromatic groups
US10497958B2 (en) 2016-12-14 2019-12-03 Lockheed Martin Energy, Llc Coordinatively unsaturated titanium catecholate complexes and processes associated therewith
US10741864B2 (en) 2016-12-30 2020-08-11 Lockheed Martin Energy, Llc Aqueous methods for forming titanium catecholate complexes and associated compositions
US10320023B2 (en) * 2017-02-16 2019-06-11 Lockheed Martin Energy, Llc Neat methods for forming titanium catecholate complexes and associated compositions
CN109143713B (zh) * 2018-06-27 2021-05-11 浙江工业大学 一种TPA-TPY-Fe2+金属络合物纳米薄片及其应用

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551195B2 (de) * 1972-09-27 1980-01-12
JPS55167130A (en) 1979-06-12 1980-12-26 Hitachi Ltd Metal oxide thin film forming method
US4525556A (en) * 1982-08-13 1985-06-25 The Dow Chemical Company Polymerization of olefins
JPS62105156A (ja) * 1985-10-31 1987-05-15 Mita Ind Co Ltd 静電荷像現像用カラ−トナ−
JPS6353560A (ja) * 1986-08-25 1988-03-07 Canon Inc 静電荷像現像用現像剤
US4880758A (en) * 1987-08-24 1989-11-14 The Dow Chemical Company Preparation of ABO3 compounds from mixed metal aromatic coordination complexes
JPH06119816A (ja) 1992-09-30 1994-04-28 Asahi Glass Co Ltd 透明導電膜及びその製造方法
JP3258392B2 (ja) * 1992-10-05 2002-02-18 眞人 垣花 錯体重合法による複合酸化物の製造方法
JPH06144950A (ja) 1992-11-10 1994-05-24 Kubota Corp 窯業系軽量建材の製造方法
JP2517874B2 (ja) 1993-09-30 1996-07-24 工業技術院長 酸化チタン薄膜光触媒の製造方法
EP0737513B1 (de) 1994-10-31 2002-05-29 Kanagawa Academy Of Science And Technology Titanoxyd-photokatalysatorsystem und methode zu dessen herstellung
JPH08160668A (ja) * 1994-12-02 1996-06-21 Orient Chem Ind Ltd 荷電制御剤及び静電荷像現像用トナー
JP3012182B2 (ja) * 1995-11-15 2000-02-21 荏原ユージライト株式会社 銀および銀合金めっき浴
JP3947815B2 (ja) * 1996-02-16 2007-07-25 光史 佐藤 塗布液およびこれを用いた薄膜作製方法
JPH09248467A (ja) 1996-03-14 1997-09-22 Nippon Soda Co Ltd 酸化チタン薄膜形成用組成物及びそれを用いる光触媒構造体
JPH1087345A (ja) * 1996-09-09 1998-04-07 Teikoku Chem Ind Corp Ltd 酸化チタン薄膜形成用塗布液組成物
JPH1087535A (ja) * 1996-09-18 1998-04-07 Kuraray Co Ltd 不飽和アルコールの製造方法
JPH10237078A (ja) 1996-10-14 1998-09-08 Dainippon Printing Co Ltd 金属錯体溶液、感光性金属錯体溶液及び金属酸化物膜の形成方法
US6169119B1 (en) * 1997-02-14 2001-01-02 Reliance Electric Technologies, Llc Metal oxide sols and process for making the same
WO1998048075A1 (fr) * 1997-04-24 1998-10-29 Nippon Steel Corporation Tole enduite et fluide de traitement de surface pour metaux
JPH1171103A (ja) * 1997-06-27 1999-03-16 Kasei Optonix Co Ltd 複合金属酸化物の前駆体および複合金属酸化物の製造方法
JP3664422B2 (ja) 1998-02-04 2005-06-29 ナガセケムテックス株式会社 塗布液およびこれを用いた金属酸化物薄膜作成方法
JP3007961B2 (ja) 1998-03-13 2000-02-14 工業技術院長 金属酸化物薄膜の製造方法
JP3291560B2 (ja) * 1998-05-15 2002-06-10 三菱マテリアル株式会社 光触媒膜の成膜方法とそれに用いる塗料
JP2000264893A (ja) 1999-01-14 2000-09-26 Jsr Corp 金属錯体、金属錯体の製造方法、金属錯体水溶液および金属酸化物
JP3383838B2 (ja) * 1999-02-25 2003-03-10 独立行政法人産業技術総合研究所 金属酸化物の製造方法及び微細パターンの形成方法
JP3978635B2 (ja) 1999-04-09 2007-09-19 テイカ株式会社 シュウ酸チタニルコーティング液およびそれを用いた光触媒エレメントの製造方法
US6346570B1 (en) 1999-08-30 2002-02-12 Kuraray Co., Ltd. Water resistant composition, coating agent, and recording material
JP2001261378A (ja) 2000-03-21 2001-09-26 Taki Chem Co Ltd 鏡及びその製造方法
JP4003007B2 (ja) 2000-07-27 2007-11-07 日亜化学工業株式会社 酸化物透明導電性薄膜用組成物及び酸化物透明導電性薄膜の製造方法
JP3886759B2 (ja) * 2001-09-28 2007-02-28 中島硝子工業株式会社 酸化チタン薄膜被覆ガラス板の製造方法
WO2003037996A1 (fr) 2001-10-30 2003-05-08 Kansai Paint Co., Ltd. Matiere de revetement et procede pour former un film d'oxyde de titane et substrat metallique revetu d'un tel film
JP4972268B2 (ja) 2002-03-07 2012-07-11 日立化成工業株式会社 酸化チタン膜形成用液体、酸化チタン膜の形成法、酸化チタン膜及び光触媒性部材
JP2003267733A (ja) 2002-03-13 2003-09-25 Japan Carlit Co Ltd:The 金属酸化物前駆体溶液とその調整方法及び金属酸化物薄膜とその形成方法
JP4537023B2 (ja) * 2003-08-06 2010-09-01 学校法人日本大学 硬質塗膜の製造方法
JP4482681B2 (ja) 2003-08-12 2010-06-16 独立行政法人産業技術総合研究所 機能性金属錯体素子
JP2005181776A (ja) * 2003-12-22 2005-07-07 Canon Inc 非磁性一成分現像方法
JP4995428B2 (ja) 2004-03-10 2012-08-08 東海旅客鉄道株式会社 酸化チタン塗膜形成方法
JP2006073267A (ja) 2004-08-31 2006-03-16 Fujikura Ltd 透明導電膜および透明導電膜の製造方法ならびに色素増感太陽電池
CN1631999A (zh) * 2004-12-02 2005-06-29 上海大学 自清洁二氧化钛光催化涂布液的制造方法
JP5238023B2 (ja) * 2008-05-14 2013-07-17 東京応化工業株式会社 ポジ型感光性組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2008007453A1 *

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