WO2008007453A1 - Liquide de revêtement, couche mince d'oxyde de titane formée en utilisant le liquide de revêtement et son procédé de formation - Google Patents
Liquide de revêtement, couche mince d'oxyde de titane formée en utilisant le liquide de revêtement et son procédé de formation Download PDFInfo
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- WO2008007453A1 WO2008007453A1 PCT/JP2006/325783 JP2006325783W WO2008007453A1 WO 2008007453 A1 WO2008007453 A1 WO 2008007453A1 JP 2006325783 W JP2006325783 W JP 2006325783W WO 2008007453 A1 WO2008007453 A1 WO 2008007453A1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/066—Zirconium or hafnium; Oxides or hydroxides thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0219—Coating the coating containing organic compounds
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
- C09C1/3607—Titanium dioxide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/84—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by UV- or VIS- data
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the present invention relates to a coating solution used for forming a titanium oxide thin film, a titanium oxide thin film, a method for forming the same, and a product on which a titanium oxide thin film is formed.
- Titanium oxide photocatalysts are strong by absorbing near ultraviolet rays! ⁇ Demonstrates oxidative decomposability and makes it possible to decompose and detoxify various organic substances and environmental pollutants such as NO.
- the surface of the substrate is coated with an acid titan photocatalyst
- the surface of the substrate exhibits light-induced superhydrophilicity when exposed to light, and it becomes easy to become familiar with water. Can be easily washed away with water. That is, the titanium oxide photocatalyst has a function of decomposing dirt by light and a function of facilitating removal of dirt by washing with water. Using this function, titanium oxide photocatalysts have been put into practical use as self-cleaning materials that always keep the surface clean.
- Patent Document 1 JP-A-11 228113
- Patent Document 2 Japanese Patent Laid-Open No. 11-256342
- Patent Document 3 Japanese Patent Application Laid-Open No. 09-278489
- Patent Document 4 Japanese Patent Laid-Open No. 07-100378
- Patent Document 5 Japanese Unexamined Patent Application Publication No. 2005-290369
- Patent Document 6 Japanese Unexamined Patent Publication No. 2000-290533
- the sol of the coating solution is often unstable, and there are many problems in implementation, such as maintaining the viscosity of the sol and devising measures to prevent solids from settling.
- the binder component containing silicon that is usually used does not have photocatalytic activity, so that the photocatalytic activity of the entire thin film is lowered, and the binder component is also reduced. There is a problem that the initial antifouling property is low, which is likely to cause the adsorption of pollutants.
- the dispersibility of the coating solution necessary for obtaining a uniform coating film is wet. It is difficult to adjust sex.
- the glass when a film is formed on a substrate such as soda lime glass, after applying the coating liquid, if the glass is baked at a temperature of 500 ° C or higher above the annealing point of ordinary soda lime glass glass, the glass may be distorted. May occur.
- photocatalyst glass for building materials is commercially available, but photocatalyst glass for vehicles such as automobiles and railways exists except for products with a relatively small area such as photocatalyst mirrors. do not do. This is because, as described above, the photocatalytic thin film formed by the conventional technology does not have sufficient durability and cannot withstand the friction of a car wash brush or the like that is routinely used for washing vehicles. is there.
- the present invention has been made in view of the above points, and it is easy to form a titanium oxide thin film, the firing temperature can be lowered, and cracks and adhesion to the obtained titanium oxide thin film are obtained. It is an object of the present invention to provide a coating solution, a titanium oxide thin film forming method, a titanium oxide thin film, and a titanium oxide thin film-coated product in which the resulting titanium oxide thin film exhibits excellent antifouling properties.
- the first invention of the present application is:
- the gist is a coating solution containing an organometallic complex represented by Chemical Formula 1.
- n is an integer greater than or equal to 0
- a titanium oxide thin film can be formed on the surface of the substrate.
- a coating film containing an organometallic complex is formed on the surface of the substrate.
- the coating film is baked, the organic metal complex is thermally decomposed, the ligand disappears, and a thin film made of titanium oxide is formed.
- the titanium oxide thin film formed using the coating solution of the present invention does not cause cracks and has excellent adhesion to the substrate. Further, since no cracks are generated, the thickness of the titanium oxide thin film can be increased.
- the reason why the crack does not occur is assumed as follows. That is, since the organometallic complex has a flat structure, as is apparent from the molecular structure represented by Chemical Formula 1, when the coating solution is applied to the substrate to form a coating film, the organometallic complex is Due to the mutual interaction, a molecular assembly structure (stacking) is formed in which organometallic complexes overlap. In addition, the interaction between the aromatic rings contained in the ligand also forms the above-mentioned molecular assembly structure. Contribute to. As a result, even if the ligand disappears during firing, volume shrinkage in a direction parallel to the surface of the substrate is suppressed, and cracking and peeling are considered to be suppressed.
- the titanium oxide thin film formed using the coating liquid of the present invention has high hardness. Furthermore, since the titanium oxide thin film formed using the coating solution of the present invention is smooth and highly transparent, for example, when an oxide titanium thin film is formed on the surface of glass, the transparency is maintained. In the case where a titanium oxide thin film is formed on the surface of the mirror, the reflectance can be maintained.
- the coating liquid of the present invention can form a durable acidic titanium thin film without containing a binder. For this reason, since the concentration of titanium oxide in the formed thin film is not thinner than that of Noinda, the action of titanium oxide (for example, photocatalytic action in the wavelength region of ultraviolet light) is high.
- the coating liquid of the present invention is stable, it can be stored for a long time.
- the organometallic complex represented by Chemical Formula 1 can be, for example, a titanium'salicylic acid complex. Titanium 'salicylic acid complex is represented by chemical formula 1! ⁇ ⁇ Is all! ! It is a chemical compound.
- the coating solution of the present invention can be easily produced.
- an organometallic complex is produced by heating, and if necessary Just filter and collect.
- the component serving as a ligand is, for example, represented by Chemical Formula 2.
- R 1C) to R 13 are any one of the following (1) to (4).
- n is an integer greater than or equal to 0
- Examples of the compound represented by Chemical Formula 2 include salicylic acid.
- Salicylic acid is a compound in which R 1C) to R 13 are all H in Chemical Formula 2.
- Examples of the solvent constituting the coating solution of the present invention include alcohols (for example, 2-propanol, methanol, ethanol, n-butanol), ethers (for example, jetyl ether, MTBE, THF, etc.), Hydrocarbons (eg, octane, n-hexane, cyclohexane, benzene, toluene, xylene, etc.), dimethyl sulfoxide, dimethylformamide, halides (eg, cycloform, dibromomethane, dichloromethane), ketones (aceto , Methyl ethyl ketone (MEK), AcAc, etc.), ethyl acetate, and one or a mixture of two or more selected from the group consisting of water.
- alcohols for example, 2-propanol, methanol, ethanol, n-butanol
- ethers for example, jetyl ether, MTBE,
- the concentration of the organometallic complex in the coating solution is not particularly limited as long as it does not exceed the solubility of the organometallic complex! / ⁇ range, but for example, a concentration of 0.01 to L0% by weight is suitable. .
- n in the group represented by C H is preferably 10 or less, and more preferably 5 or less.
- the group represented by COOR 9 is R 2 , R 3 , R 6
- R 7 , 1 and R 12 are desirable.
- examples of the halogen atom include Cl, Br, and I.
- the second invention of the present application is:
- a coating film is formed by coating the coating liquid of the first invention on a substrate, and is contained in the coating film.
- the gist is a method for forming a titanium oxide thin film, wherein the organometallic complex is changed to titanium oxide.
- the titanium oxide thin film formed according to the present invention has excellent adhesion to a substrate that does not cause cracks, and has high hardness. Further, as described above, since no crack is generated, the thickness of the titanium oxide thin film can be increased.
- the titanium oxide thin film formed according to the present invention is smooth and highly transparent, for example, when a titanium oxide thin film is formed on the surface of glass, the permeability can be maintained. In addition, when a titanium oxide thin film is formed on the surface of the mirror, the reflectance can be maintained.
- the coating liquid used in the present invention can form a durable acid titanium thin film without containing a binder. Therefore, the concentration of titanium oxide in the formed thin film is not thinner than that of the binder, so that the action of titanium oxide (for example, photocatalytic action) is high.
- Examples of the substrate include glass (for example, PYREX (registered trademark) glass, common glass, quartz glass). Even when the firing method is used in the process of changing from an organometallic complex to titanium oxide, the firing temperature may be lower than the annealing point of the glass (especially soda lime glass), so the strain of the glass There is no risk of this.
- glass for example, PYREX (registered trademark) glass, common glass, quartz glass.
- metals for example, iron, stainless steel, aluminum, copper, brass, etc.
- ceramics for example, alumina, zirconium, silica
- resin for example, polyimide resin
- the coating method can be widely used as long as it is a method capable of forming a coating film of a coating solution.
- commonly used coating methods such as spin coating, dip coating, and spray coating are used. Can be mentioned.
- the coating film After applying the coating solution, the coating film is kept at room temperature. It is preferable to dry naturally under pressure. Thereafter, for example, the coating film can be baked.
- a method of changing the organometallic complex to titanium oxide for example, there is a method of baking a coating film formed by applying a coating solution.
- the baking temperature is, for example, 300 ° C. or higher, and a temperature lower than the melting point of the substrate on which the coating solution is applied (preferably having a melting point of 300 ° C. or higher) is suitable.
- the firing temperature may be in the range of 300 to 600 ° C. If the temperature is 300 ° C or higher, the photocatalytic activity of the titanium oxide thin film is increased. If the temperature is 350 ° C or higher, the titanium oxide thin film
- the temperature is set to 400 ° C or higher, a harder and denser thin film (a film that can withstand the brush test described later) can be formed.
- the firing temperature may be as low as about 300 ° C (or 350 ° C, 400 ° C), it is possible to form a titanium oxide thin film on the surface of a heat-sensitive substrate. it can.
- the firing temperature can be adjusted according to the desired crystal phase of the titanium oxide thin film.
- the firing time is 1 minute or longer, preferably 1 hour or longer.
- the third invention of the present application is:
- the gist of the present invention is the titanium oxide thin film formed by the method for forming a titanium oxide thin film according to the second invention.
- the titanium oxide thin film of the present invention does not cause cracks, has excellent adhesion to the substrate, and has high hardness. Furthermore, since the titanium oxide thin film of the present invention is smooth and highly transparent, for example, when the titanium oxide thin film is formed on the surface of glass, the transparency can be maintained, and the mirror When a titanium oxide thin film is formed on the surface, the reflectance can be maintained. In addition, since the titanium oxide thin film of the present invention does not need to contain a binder, the concentration of titanium oxide titanium in the formed thin film is not affected by the action of titanium oxide (for example, it is not diluted). High photocatalytic activity.
- the fourth invention of the present application is:
- a gist is a titanium oxide thin film-coated product comprising a substrate and the titanium oxide thin film formed on the surface of the substrate according to the second invention.
- the oxidized titanium thin film coated product of the present invention the oxidized titanium thin film is cracked. It has excellent adhesion to the substrate and high hardness. Furthermore, since the titanium oxide thin film in the present invention is smooth and highly transparent, for example, when the substrate is glass, the transparency can be maintained, and when the substrate is a mirror, the reflectance is high. Can be maintained. In addition, since the titanium oxide thin film in the present invention does not need to contain a binder, the concentration of the titanium oxide titanium in the formed thin film can be reduced by the action of titanium oxide (which is less likely to be thinner than the binder ( For example, photocatalysis is high.
- Examples of the substrate include glass (for example, PYREX (registered trademark) glass, common glass, quartz glass). Even when the firing method is used in the process of changing from an organometallic complex to titanium oxide, the firing temperature may be lower than the annealing point of the glass (especially soda lime glass), so the strain of the glass There is no risk of this.
- glass for example, PYREX (registered trademark) glass, common glass, quartz glass.
- metal for example, iron, stainless steel, aluminum, copper, brass, etc.
- ceramics for example, alumina, zirconium, silica
- resin for example, polyimide resin
- FIG. 1 is a cross-sectional view showing a configuration of a titanium oxide thin film-coated product 7.
- FIG. 2 is an explanatory diagram showing a brush test method.
- FIG. 3 is a photomicrograph of the surface of a titanium oxide thin film.
- FIG. 4 is a photomicrograph of the surface of a titanium oxide thin film.
- FIG. 5 is an explanatory diagram showing the molecular structure of a titanium monoiminodiethanol complex.
- the concentration of P was adjusted to 0.5 M (mol / L).
- the above mixed solution was refluxed for about 1 hour, and then distilled until the amount of the mixed solution was halved. It was confirmed that the steam temperature was 140 ° C during distillation. After distillation, the remaining mixture was allowed to stand overnight at room temperature, and the resulting precipitate was suction filtered using a membrane filter. The filtered solid was placed in a 140 ° C. vacuum to remove volatile components and dried. This drying was continued until the amount of solids was close to the theoretical value (about 98%). The resulting solid is a titanium'salicylic acid complex.
- the coating solution A is completed by dissolving the titanium 'salicylic acid complex in 100 ml of a mixed solution of acetylacetone and MEK (methylethyl ketone) in a volume ratio of 1: 9. did.
- the concentration of titanium'salicylic acid complex in coating solution A is 0.05M, or 0.
- the coating solution B was completed by dissolving the titanium 'salicylic acid complex in acetylylacetone as a coating solution for forming a thick film.
- the concentration of the titanium 'salicylic acid complex in the coating solution B was 0.5 M or 0.1 lwt%.
- An undercoat layer (alkali barrier layer) was formed on the surface of a 150 mm ⁇ 75 mm substrate made of ordinary glass (melting point: about 1000 ° C.).
- the undercoat layer is formed by applying a commercially available high-temperature photocatalyst undercoat solution (Nippon Soda Visrent I H (NDH-500A)) to the surface of the substrate by the dip coating method, and then firing it in air for 1 hour. did.
- the lifting speed in the dip coating method was 8 mmZsec.
- temperature control during firing was performed by heating from room temperature to 500 ° C over 1 hour, maintaining at 500 ° C for 1 hour, and cooling to room temperature over 1 hour.
- the coating solution A produced in (a) above was applied to the surface of the glass substrate on which the undercoat layer had been formed by the dip coating method to form a coating film.
- the lifting speed in the dip coating method was 8 mmZsec.
- firing was performed at the firing temperature shown in Table 1.
- Temperature control during firing was performed by raising the room temperature force to a predetermined firing temperature over 1 hour, maintaining the firing temperature for 1 hour, and cooling to room temperature over 1 hour.
- a titanium oxide thin film coated product 7 in which a titanium oxide (TiO 2) thin film 5 is formed on a plain glass substrate 1 via an undercoat layer 3 is completed. did.
- the haze, color difference, and hardness of the titanium oxide thin film 5 were evaluated. Haze was measured based on JISK7136 using NDH-50000W manufactured by Nippon Denshoku Industries Co., Ltd. The color difference was measured based on JISZ8722 using Nippon Denshoku Industries Co., Ltd. SE-2000. The hardness measurement conditions conformed to the lead brush grab test (JIS K 5400).
- Table 1 shows the measurement results of haze, color difference, and hardness of the titanium oxide thin film 5.
- the titanium oxide thin film coated product 7 of Example 1 had a small haze value S (high transparency), a high color difference value power, and a high hardness.
- S high transparency
- a high color difference value power high color difference value power
- a high hardness the higher the firing temperature, the better the color difference and hardness measurement results.
- Comparative Example 1 the hardness of the formed thin film was remarkably low.
- Table 2 shows the measured amounts of methylene blue adsorbed.
- “Baking temperature” is
- the firing temperature when the titanium oxide thin film 5 is formed is formed.
- the contact angles were all 14 ° or more before UV irradiation, but the oxidation temperature when the titanium oxide thin film 5 was formed was 60 ° C or higher.
- the titanium thin film coated product 7 was hydrophilized until 6 hours after UV irradiation until the contact angle was 10 ° or less. This result indicates that the titanium oxide thin film 5 is photoinduced superhydrophilic.
- the organic substance decomposition activity by the photocatalyst produced by the acid / titanium thin film 5 of the acid / titanium thin film-coated product 7 produced in (b) above was evaluated based on the photocatalyst industry association “wet decomposition performance test method”.
- a substrate on which the titanium oxide thin film 5 was not formed was evaluated in the same manner.
- Table 4 shows the evaluation results.
- “calcination temperature” is the firing temperature when the titanium oxide thin film 5 is formed
- “absorbance at 665 nm” is a numerical value when the initial concentration of methylene blue (MB) is 10.
- “No photocatalyst” means a substrate (Comparative Example 2) on which a titanium oxide thin film 5 is formed.
- the titanium oxide thin film-coated product 7 having a firing temperature of 400 ° C or higher when forming the titanium oxide thin film 5 showed particularly high MB decomposition performance. This indicates that the photocatalytic activity is particularly high when the firing temperature is 400 ° C or higher. In contrast, the titanium oxide thin film 5 of Comparative Example 2 was formed, and the MB decomposition performance was low in the substrate (“no photocatalyst”).
- the surface of the oxidized titanium thin film coated product 7 on which the oxidized titanium thin film 5 was formed was rubbed with a brush 9.
- the brush 9 is a cylindrical cleaning brush having horse hairs 13 attached radially around the rotating shaft 11, and the hair length of the horse hair 13 is 35 mm.
- the brush 9 was mounted so that the distance between the rotating shaft 11 and the titanium oxide thin film-coated product 7 was 25 mm, and was rotated at 500 rpm for 10 minutes.
- a coating solution was a titanana nanosheet (TNS) suspension having a concentration of 0.25 wt%.
- An undercoat layer was coated on a common glass substrate.
- the common glass substrate and the undercoat layer are the above This is the same as (b) of Example 1.
- the coating solution prepared in the above (0 was applied by the dip coating method to form a coating film.
- the pulling rate in the dip coating method was 8 mmZsec.
- baking was performed in the atmosphere. In the control, the temperature is raised from room temperature to 500 ° C over 1 hour, maintained at 500 ° C for 1 hour, and cooled to room temperature over 1 hour.
- a commercial product (Nippon Sheet Glass Co., Ltd., Rayborg Hikari) was prepared by forming a titanium oxide film on soda-lime glass by the notching method.
- the titanium oxide thin film coated product 7 having a firing temperature power of 00 ° C or higher had a contact angle of 6 hours after UV irradiation even after brush polishing. It is very low. This indicates that when the firing temperature is 400 ° C. or higher, the hardness of the titanium oxide thin film 5 is further increased and is not easily worn even by brush polishing. On the other hand, in Comparative Examples 3 to 4, when brush polishing is performed, the contact angle is lowered even after UV irradiation is performed for 6 hours. This is because the photocatalyst film is low in hardness, so that the photocatalyst film is worn by brush polishing. Show that you ’ve gone! /
- Example 1 an undercoat layer was coated on a common glass substrate.
- the common glass substrate and the undercoat layer are the same as in Example 1 (b).
- the coating solution B produced in (a) of Example 1 was applied by the dip coating method to form a coating film.
- the lifting speed in the dip coating method was 8 mmZse C. After that, it was baked in the atmosphere to complete the product with titanium oxide thin film coating.
- the temperature control in firing is that the temperature is raised from room temperature to 500 ° C over 1 hour, maintained at 500 ° C for 1 hour, and cooled to room temperature over 1 hour.
- the titanium oxide thin film coated product produced in (a) above was evaluated for the hardness, haze, and state of the titanium oxide thin film of the titanium oxide thin film.
- the haze measurement method was based on the method for obtaining the haze of a plastic transparent material (JIS K 7136), and the hardness measurement conditions were based on the pencil pulling force test CFIS K 5400).
- the film state was evaluated by visual observation, and if the film had no cracks, the film was evaluated as good.
- An undercoat layer was coated on a common glass substrate.
- the common glass substrate and the undercoat layer are the same as in Example 1 (b).
- a commercially available high-temperature baking sol-gel type photocatalytic coating solution (Nippon Soda Co., Ltd. Visicide H Photocatalyst coating NDH-510C) was applied by the dip coating method to form a coating film.
- the lifting speed in the dip coating method was 8 mmZsec.
- firing was performed in the air.
- the temperature control in firing is performed by raising the temperature from room temperature to 500 ° C over 1 hour, maintaining at 500 ° C for 1 hour, and cooling to room temperature over 1 hour.
- Table 6 shows the evaluation results of hardness, haze, and film state.
- the titanium oxide thin film formed on the titanium oxide thin film-coated product of Example 2 had a high hardness and a low haze value (high transparency), and the film was in good condition. .
- the haze value at which the hardness was very low was high.
- the titanium oxide thin film of the titanium oxide thin film coated product produced in (a) was observed with a microscope.
- Fig. 3 shows a photomicrograph at that time. As shown in Fig. 3, no crack was observed in the titanium oxide thin film.
- This coating solution is a solution of titanium 2, 2 ′ iminodiethoxide (titanium monoiminodiethanol complex).
- Figure 5 shows the molecular structure of titanium 2, 2 'iminojetoxide.
- Example 2 An undercoat layer was coated on a common glass substrate.
- the common glass substrate and the undercoat layer are the same as in Example 1 (b).
- the coating solution prepared in the above (0 was applied by the dip coating method to form a coating film.
- the pulling rate in the dip coating method was 8 mmZsec.
- baking was performed in the atmosphere. Control from room temperature over 1 hour 5 The temperature is raised to 00 ° C, maintained at 500 ° C for 1 hour, and cooled to room temperature over 1 hour.
- An undercoat layer (alkali barrier layer) was formed on the surface of a substrate having a size of 150 mm ⁇ 75 mm, which has a normal glass power.
- a high-temperature photocatalyst undercoat liquid commercial product (Nippon Soda Bidovaichi H (NDH-500A)) is applied to the surface of the substrate by the dip coating method, and then baked in the atmosphere for 1 hour. Formed.
- the lifting speed in the dip coating method was 8 mmZsec.
- temperature control during firing was performed by raising the temperature from room temperature to 500 ° C over 1 hour, maintaining at 500 ° C for 1 hour, and cooling to room temperature over 1 hour.
- Example 7 the coating solution A produced in Example 1 was applied to the surface of the glass substrate on which the undercoat layer was formed by the dip coating method to form a coating film.
- the pulling speed in the dip coating method was 8 mmZsec.
- firing was performed at a firing temperature shown in Table 7.
- Temperature control during firing was performed by raising the temperature to a predetermined firing temperature over 1 hour, maintaining the firing temperature for 24 hours, and cooling to room temperature over 1 hour.
- the contact angle of water on the surface of the titanium oxide thin film 5 was measured for the oxidized titanium thin film-coated product 7 formed in (a) above having a firing temperature of 300 ° C and 350 ° C. Measurement is U
- the test was performed before V irradiation, 1 hour after UV irradiation, 2 hours later, and 3 hours later.
- a 40W-BLB lamp is used as the light source, and the UV irradiation conditions are such that the UV intensity force on the sample surface is 2.4 mW / cm 2 (at 365 nm).
- the measurement results are shown in Table 7 above.
- the contact angle was 40 ° or more before UV irradiation, but the oxidation temperature of the titanium oxide thin film 5 was 300 ° C when the oxide titanium thin film 5 was formed.
- the coated product 7 was hydrophilized until 3 hours after UV irradiation until the contact angle was 6.5 °.
- the titanium oxide thin film coated product 7 with a firing temperature of 350 ° C when forming the titanium oxide thin film 5 becomes hydrophilic until the contact angle shows 6.0 ° after 1 hour of UV irradiation. After 3 hours of irradiation, it was hydrophilized until the contact angle was 4.6 °. This result shows that the titanium oxide thin film 5 becomes photo-induced superhydrophilic under baking conditions of 300 ° C or higher.
- the titanium oxide thin film-coated product manufactured in the same manner as in Example 6 is also evaluated for hydrophilicity (photocatalytic action) except that the coating solution prepared in Comparative Example 3 is used. It was. The results are shown in Table 7 above.
- the film hardness of the titanium oxide thin film 5 was evaluated for the titanium oxide thin film coated product 7 manufactured in (a) above.
- the hardness measurement conditions were in accordance with the pencil grabbing test CFIS K 5400). The measurement results are shown in Table 7 above.
- the film hardness was similarly evaluated for the titanium oxide thin film-coated product produced in the same manner as in Example 6 except that the coating solution prepared in Comparative Example 3 was used.
- the results are shown in Table 7 above. As shown in Table 7, even when the firing temperature was 350 ° C, the film hardness was 6B or less.
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Description
Claims
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/226,826 US7993753B2 (en) | 2006-07-13 | 2006-12-25 | Coating liquid, titanium oxide film formed by coating liquid, and forming method thereof |
JP2008524716A JP5324218B2 (ja) | 2006-07-13 | 2006-12-25 | 塗布液、及び酸化チタン薄膜の形成方法 |
CN2006800553338A CN101484386B (zh) | 2006-07-13 | 2006-12-25 | 涂布液、使用该涂布液形成的氧化钛薄膜及其形成方法 |
EP20060843186 EP2050718A1 (en) | 2006-07-13 | 2006-12-25 | Coating liquid, titanium oxide thin-film formed using coating liquid, and method of forming the same |
EP20070790723 EP2048111A1 (en) | 2006-07-13 | 2007-07-12 | Coating liquid, metal compound thin film formed by using coating liquid, and method for forming the same |
JP2008524846A JP5243248B2 (ja) | 2006-07-13 | 2007-07-12 | 塗布液、及び金属化合物薄膜の形成方法 |
CN2007800265212A CN101489920B (zh) | 2006-07-13 | 2007-07-12 | 涂布液、使用涂布液形成的金属化合物薄膜及其形成方法 |
TW96125367A TWI389987B (zh) | 2006-07-13 | 2007-07-12 | A coating liquid, a metal compound film formed by using a coating liquid, and a method for forming the same |
US12/307,725 US8445118B2 (en) | 2006-07-13 | 2007-07-12 | Coating liquid, metal compound film formed by coating liquid, and forming method thereof |
KR1020097002515A KR101075285B1 (ko) | 2006-07-13 | 2007-07-12 | 도포액, 도포액을 이용하여 형성된 금속화합물박막 및 그 형성방법 |
PCT/JP2007/063929 WO2008007751A1 (fr) | 2006-07-13 | 2007-07-12 | Liquide de revêtement, couche mince de composé métallique formée en utilisant le liquide de revêtement et son procédé de formation |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2006-193415 | 2006-07-13 | ||
JP2006193415 | 2006-07-13 |
Publications (1)
Publication Number | Publication Date |
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WO2008007453A1 true WO2008007453A1 (fr) | 2008-01-17 |
Family
ID=38923024
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2006/325082 WO2008007451A1 (fr) | 2006-07-13 | 2006-12-15 | Solution de revêtement, couche mince d'oxyde de titane formée en utilisant la solution de revêtement et procédé de formation de la couche mince |
PCT/JP2006/325783 WO2008007453A1 (fr) | 2006-07-13 | 2006-12-25 | Liquide de revêtement, couche mince d'oxyde de titane formée en utilisant le liquide de revêtement et son procédé de formation |
PCT/JP2007/051618 WO2008007469A1 (fr) | 2006-07-13 | 2007-01-31 | Fluide de revêtement, film mince conducteur formé à partir du fluide de revêtement, et procédé de formation de ce dernier |
PCT/JP2007/063929 WO2008007751A1 (fr) | 2006-07-13 | 2007-07-12 | Liquide de revêtement, couche mince de composé métallique formée en utilisant le liquide de revêtement et son procédé de formation |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2006/325082 WO2008007451A1 (fr) | 2006-07-13 | 2006-12-15 | Solution de revêtement, couche mince d'oxyde de titane formée en utilisant la solution de revêtement et procédé de formation de la couche mince |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/051618 WO2008007469A1 (fr) | 2006-07-13 | 2007-01-31 | Fluide de revêtement, film mince conducteur formé à partir du fluide de revêtement, et procédé de formation de ce dernier |
PCT/JP2007/063929 WO2008007751A1 (fr) | 2006-07-13 | 2007-07-12 | Liquide de revêtement, couche mince de composé métallique formée en utilisant le liquide de revêtement et son procédé de formation |
Country Status (7)
Country | Link |
---|---|
US (4) | US7964283B2 (ja) |
EP (4) | EP2053022A1 (ja) |
JP (4) | JP4988737B2 (ja) |
KR (4) | KR101025122B1 (ja) |
CN (4) | CN101484387B (ja) |
TW (1) | TWI389987B (ja) |
WO (4) | WO2008007451A1 (ja) |
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JP5238023B2 (ja) * | 2008-05-14 | 2013-07-17 | 東京応化工業株式会社 | ポジ型感光性組成物 |
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-
2006
- 2006-12-15 JP JP2008524715A patent/JP4988737B2/ja not_active Expired - Fee Related
- 2006-12-15 KR KR1020087030714A patent/KR101025122B1/ko not_active IP Right Cessation
- 2006-12-15 US US12/226,835 patent/US7964283B2/en not_active Expired - Fee Related
- 2006-12-15 WO PCT/JP2006/325082 patent/WO2008007451A1/ja active Application Filing
- 2006-12-15 CN CN2006800553427A patent/CN101484387B/zh not_active Expired - Fee Related
- 2006-12-15 EP EP20060834809 patent/EP2053022A1/en not_active Withdrawn
- 2006-12-25 KR KR1020087030715A patent/KR101077709B1/ko not_active IP Right Cessation
- 2006-12-25 CN CN2006800553338A patent/CN101484386B/zh not_active Expired - Fee Related
- 2006-12-25 US US12/226,826 patent/US7993753B2/en not_active Expired - Fee Related
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