TWI435900B - 表面修飾劑及經併入該表面修飾劑之物件 - Google Patents
表面修飾劑及經併入該表面修飾劑之物件 Download PDFInfo
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- TWI435900B TWI435900B TW95111459A TW95111459A TWI435900B TW I435900 B TWI435900 B TW I435900B TW 95111459 A TW95111459 A TW 95111459A TW 95111459 A TW95111459 A TW 95111459A TW I435900 B TWI435900 B TW I435900B
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- modifying agent
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- surface modifying
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- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
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- 238000006198 methoxylation reaction Methods 0.000 description 1
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- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
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- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
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- 229920000573 polyethylene Polymers 0.000 description 1
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- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
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- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
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- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000007613 slurry method Methods 0.000 description 1
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
- C09D183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249987—With nonvoid component of specified composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Polyethers (AREA)
- Surface Treatment Of Glass (AREA)
- Electroluminescent Light Sources (AREA)
- Silicon Polymers (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Eyeglasses (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66748205P | 2005-04-01 | 2005-04-01 | |
| US74093905P | 2005-11-30 | 2005-11-30 |
Publications (2)
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| TW200643067A TW200643067A (en) | 2006-12-16 |
| TWI435900B true TWI435900B (zh) | 2014-05-01 |
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| TW95111459A TWI435900B (zh) | 2005-04-01 | 2006-03-31 | 表面修飾劑及經併入該表面修飾劑之物件 |
| TW102119554A TWI481648B (zh) | 2005-04-01 | 2006-03-31 | 表面修飾劑 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW102119554A TWI481648B (zh) | 2005-04-01 | 2006-03-31 | 表面修飾劑 |
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| Country | Link |
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| US (1) | US8211544B2 (OSRAM) |
| EP (1) | EP1871780B1 (OSRAM) |
| JP (3) | JP5274839B2 (OSRAM) |
| KR (1) | KR100967981B1 (OSRAM) |
| CN (2) | CN103551075B (OSRAM) |
| TW (2) | TWI435900B (OSRAM) |
| WO (1) | WO2006107083A2 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9045647B2 (en) | 2010-11-10 | 2015-06-02 | Dow Corning Corporation | Surface treatment composition, method of producing the surface treatment composition, and surface-treated article |
Families Citing this family (120)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| EP2078977A4 (en) | 2006-10-31 | 2014-05-21 | Nikon Essilor Co Ltd | LASER LENS AND METHOD FOR THE PRODUCTION THEREOF |
| CN100457803C (zh) * | 2006-11-28 | 2009-02-04 | 苏州大学 | 一种新型含氟烷氧丙基甲基硅油及其制备方法 |
| EP1946832A1 (en) * | 2007-01-19 | 2008-07-23 | Università Degli Studi Di Milano - Bicocca | A processing method for surfaces of stone materials and composites |
| WO2009087981A1 (ja) * | 2008-01-11 | 2009-07-16 | Kri Inc. | 重合性化合物及びこの製造方法 |
| JP5655215B2 (ja) * | 2008-10-01 | 2015-01-21 | 株式会社カツラヤマテクノロジー | コーティング用組成物、防汚処理方法および防汚性基材 |
| WO2011059430A1 (en) * | 2009-11-11 | 2011-05-19 | Essilor International | Surface treatment composition, process for producing the same, and surface-treated article |
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| US9000069B1 (en) | 2010-07-02 | 2015-04-07 | The Sherwin-Williams Company | Self-stratifying coatings |
| JP2012157856A (ja) * | 2011-01-13 | 2012-08-23 | Central Glass Co Ltd | 防汚性物品及びその製造方法 |
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| DE102013020551A1 (de) | 2013-12-12 | 2015-06-18 | Merck Patent Gmbh | Emulsionen von Perfluorpolyethern |
| CN105940077B (zh) * | 2014-01-31 | 2018-05-29 | Dic株式会社 | 表面改性剂、涂布组合物及物品 |
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| JP6398500B2 (ja) | 2014-09-10 | 2018-10-03 | 信越化学工業株式会社 | 含フッ素コーティング剤及び該コーティング剤で処理された物品 |
| JPWO2016047523A1 (ja) * | 2014-09-26 | 2017-07-13 | 旭硝子株式会社 | 光学素子及び撮像装置 |
| KR101907811B1 (ko) | 2014-11-28 | 2018-10-12 | 다이킨 고교 가부시키가이샤 | 플루오로옥시메틸렌기 함유 퍼플루오로폴리에테르 변성체 |
| KR20220084188A (ko) * | 2015-01-29 | 2022-06-21 | 다이킨 고교 가부시키가이샤 | 표면 처리제 |
| JP6081637B2 (ja) | 2015-04-10 | 2017-02-15 | ダイキン工業株式会社 | 防汚処理組成物、処理装置、処理方法および処理物品 |
| EP3085749B1 (en) * | 2015-04-20 | 2017-06-28 | Shin-Etsu Chemical Co., Ltd. | Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article |
| JP6260579B2 (ja) | 2015-05-01 | 2018-01-17 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
| JP6390521B2 (ja) * | 2015-06-03 | 2018-09-19 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン |
| TWI644942B (zh) | 2015-06-12 | 2018-12-21 | 日商大金工業股份有限公司 | 表面處理劑 |
| TWI637977B (zh) | 2015-06-12 | 2018-10-11 | 大金工業股份有限公司 | 表面處理劑 |
| US10351247B2 (en) | 2015-06-15 | 2019-07-16 | Subaru Corporation | Wing and anti-icing system |
| JP6582652B2 (ja) * | 2015-07-13 | 2019-10-02 | ダイキン工業株式会社 | 表面処理剤 |
| EP3766889A1 (en) | 2015-07-31 | 2021-01-20 | Daikin Industries, Ltd. | Silane compound containing perfluoro(poly)ether group |
| JP6098749B2 (ja) | 2015-08-31 | 2017-03-22 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
| KR102648003B1 (ko) | 2015-11-06 | 2024-03-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 플루오로폴리에터기 함유 폴리머 변성 유기 규소 화합물, 표면 처리제 및 물품 |
| JP6531833B2 (ja) | 2015-11-06 | 2019-06-19 | 信越化学工業株式会社 | 表面処理された樹脂製品 |
| CN106810684A (zh) * | 2015-12-02 | 2017-06-09 | 中昊晨光化工研究院有限公司 | 一种氟硅防水拒油剂及其合成方法和应用 |
| JP6642589B2 (ja) | 2015-12-14 | 2020-02-05 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
| US10870729B2 (en) | 2016-01-26 | 2020-12-22 | Daikin Industries, Ltd. | Surface treatment agent |
| JP6680350B2 (ja) | 2016-02-17 | 2020-04-15 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
| CN105801835B (zh) * | 2016-04-12 | 2016-12-14 | 泉州市思康新材料发展有限公司 | 一种全氟聚醚改性硅烷化合物及包含其的表面处理组合物和薄膜 |
| CN105778080B (zh) * | 2016-04-12 | 2016-12-14 | 泉州市思康新材料发展有限公司 | 一种全氟聚醚改性硅烷化合物及包含其的表面处理组合物和薄膜 |
| US11001670B2 (en) | 2016-06-10 | 2021-05-11 | Shin-Etsu Chemical Co., Ltd. | Fluoropolyether-group-containing polymer, surface treatment agent, and article |
| WO2018012343A1 (ja) * | 2016-07-12 | 2018-01-18 | シャープ株式会社 | 防汚性フィルムの製造方法 |
| EP3486067B1 (en) * | 2016-07-12 | 2022-09-28 | Sharp Kabushiki Kaisha | Method for producing antifouling film |
| KR101945712B1 (ko) * | 2016-07-27 | 2019-02-08 | 제이에스아이실리콘주식회사 | 지문 방지용 플로오로실리콘 화합물 및 이의 제조 방법 |
| KR101888511B1 (ko) * | 2016-08-18 | 2018-08-16 | 주식회사 시노펙스 | 임프린팅 공정을 이용한 연성동박적층필름의 마이크로 패턴 제작 방법 |
| KR20210136148A (ko) | 2016-09-08 | 2021-11-16 | 다이킨 고교 가부시키가이샤 | 퍼플루오로(폴리)에테르기 함유 실란 화합물을 포함하는 조성물 |
| CN107915835B (zh) * | 2016-10-09 | 2019-08-27 | 中昊晨光化工研究院有限公司 | 一种氟硅防水拒油剂及其利用一锅法进行合成的方法 |
| KR102155040B1 (ko) | 2016-12-13 | 2020-09-11 | 다이킨 고교 가부시키가이샤 | 방오성 물품 |
| US11560485B2 (en) | 2017-01-12 | 2023-01-24 | Daikin Industries, Ltd. | Surface-treating agent comprising perfluoro(poly)ether group-containing compound |
| CN107057056B (zh) * | 2017-01-18 | 2018-06-01 | 泉州市思康新材料发展有限公司 | 一种全氟聚醚改性硅烷化合物及包含其的表面处理组合物和薄膜 |
| WO2018143433A1 (ja) | 2017-02-03 | 2018-08-09 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有化合物、これを含む表面処理剤、および物品 |
| JP6501016B1 (ja) | 2017-03-17 | 2019-04-17 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
| EP3623440A4 (en) | 2017-05-12 | 2021-01-20 | Daikin Industries, Ltd. | SURFACE TREATMENT PRODUCTS WITH PERFLUORINE (POLY) ETHER GROUP CONTAINING COMPOUNDS |
| CN110662810B (zh) | 2017-05-23 | 2022-06-17 | 信越化学工业株式会社 | 含氟涂布剂组合物和含有该组合物的表面处理剂以及物品 |
| JP6984656B2 (ja) | 2017-05-25 | 2021-12-22 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、表面処理剤及び物品 |
| KR102577376B1 (ko) | 2017-06-21 | 2023-09-11 | 에이지씨 가부시키가이샤 | 발수발유층 부착 물품 및 그 제조 방법 |
| WO2019035297A1 (ja) * | 2017-08-18 | 2019-02-21 | Agc株式会社 | 組成物および物品 |
| JP7136109B2 (ja) * | 2017-08-22 | 2022-09-13 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
| US10544260B2 (en) | 2017-08-30 | 2020-01-28 | Ppg Industries Ohio, Inc. | Fluoropolymers, methods of preparing fluoropolymers, and coating compositions containing fluoropolymers |
| CN111148804B (zh) | 2017-09-27 | 2022-05-17 | 信越化学工业株式会社 | 含氟涂布剂组合物、表面处理剂和物品 |
| JP6888685B2 (ja) | 2017-10-20 | 2021-06-16 | 信越化学工業株式会社 | 含フッ素コーティング剤組成物、表面処理剤及び物品 |
| WO2019082583A1 (ja) | 2017-10-26 | 2019-05-02 | 信越化学工業株式会社 | 親油性基含有オルガノシラン化合物、表面処理剤及び物品 |
| JP7070587B2 (ja) | 2017-11-21 | 2022-05-18 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー、表面処理剤及び物品 |
| US11560494B2 (en) | 2018-01-22 | 2023-01-24 | Shin-Etsu Chemical Co., Ltd. | Coating composition, surface treatment agent containing said composition, and article which is surface-treated with said surface treatment agent |
| KR102766400B1 (ko) | 2018-02-13 | 2025-02-13 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 오가노실록산 화합물 및 표면처리제 |
| US11987723B2 (en) | 2018-03-14 | 2024-05-21 | Shin-Etsu Chemical Co., Ltd. | Fluorinated coating agent composition, surface treatment agent, and article |
| EP3832386B1 (en) * | 2018-07-27 | 2024-01-24 | Kyocera Corporation | Vehicle-mounted camera and mobile body |
| CN112533932B (zh) | 2018-07-31 | 2024-07-26 | 信越化学工业株式会社 | 含有亲油性基团的有机硅烷化合物、表面处理剂和物品 |
| JP7468355B2 (ja) | 2018-11-13 | 2024-04-16 | Agc株式会社 | 撥水撥油層付き基材、蒸着材料および撥水撥油層付き基材の製造方法 |
| EP3889205B1 (en) | 2018-11-30 | 2024-06-19 | Daikin Industries, Ltd. | Polyether group-containing compound |
| CN113260599B (zh) | 2018-12-26 | 2023-05-30 | Agc株式会社 | 带拒水拒油层的基材及其制造方法 |
| WO2020162371A1 (ja) | 2019-02-08 | 2020-08-13 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品、物品の製造方法、及び含フッ素化合物の製造方法 |
| CN114206987B (zh) | 2019-08-09 | 2025-09-12 | 信越化学工业株式会社 | 含有氟聚醚基的聚合物、表面处理剂及物品 |
| JP6758725B1 (ja) * | 2019-10-11 | 2020-09-23 | 株式会社ハーベス | 含フッ素シラン化合物、表面処理剤、及び該表面処理剤を用いた物品 |
| CN114746475B (zh) | 2019-12-03 | 2024-03-22 | 信越化学工业株式会社 | 含有氟聚醚基的聚合物、表面处理剂及物品 |
| JP7456499B2 (ja) | 2020-04-14 | 2024-03-27 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー及び/又はその部分(加水分解)縮合物を含む表面処理剤及び物品 |
| WO2021229624A1 (ja) | 2020-05-11 | 2021-11-18 | 信越化学工業株式会社 | コーティング剤組成物、該組成物を含む表面処理剤、及び該表面処理剤で表面処理された物品 |
| CN111808483B (zh) * | 2020-07-31 | 2021-12-21 | 南北兄弟药业投资有限公司 | 一种包含锌改性纳米碳纤维和表面改性剂的涂料 |
| US20230416566A1 (en) | 2020-11-13 | 2023-12-28 | Shin-Etsu Chemical Co., Ltd. | Coating agent composition, surface treatment agent comprising said composition, and article surface-treated with said surface treatment agent |
| JP7616240B2 (ja) | 2020-12-17 | 2025-01-17 | 信越化学工業株式会社 | 表面処理剤及び該表面処理剤で処理された物品 |
| KR20220105255A (ko) * | 2021-01-19 | 2022-07-27 | 삼성디스플레이 주식회사 | 지문방지 코팅용 화합물, 이를 포함하는 디스플레이 보호층 및 전자 장치 |
| CN117222689A (zh) | 2021-04-28 | 2023-12-12 | 信越化学工业株式会社 | 含有氟聚醚基的聚合物、表面处理剂和物品 |
| WO2023022038A1 (ja) | 2021-08-17 | 2023-02-23 | 信越化学工業株式会社 | 表面処理された物品、並びに撥水性を有する物品の耐uvc性を向上させる方法 |
| JPWO2023140177A1 (OSRAM) | 2022-01-19 | 2023-07-27 | ||
| KR20230123789A (ko) | 2022-02-17 | 2023-08-24 | 동우 화인켐 주식회사 | 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물 |
| KR20230127507A (ko) | 2022-02-25 | 2023-09-01 | 동우 화인켐 주식회사 | 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물 |
| JP7644377B2 (ja) | 2022-03-31 | 2025-03-12 | ダイキン工業株式会社 | 硬化性組成物 |
| KR20250003777A (ko) | 2022-04-19 | 2025-01-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 플루오로폴리에테르기 함유 폴리머 조성물, 코팅제 및 물품, 그리고 물품의 표면 개질 방법 |
| CN119790105A (zh) | 2022-09-06 | 2025-04-08 | 信越化学工业株式会社 | 含氟组合物、表面处理剂和物品 |
| CN120092049A (zh) | 2022-10-07 | 2025-06-03 | 信越化学工业株式会社 | 含有氟聚醚基的聚合物组合物、涂布剂和物品以及物品的表面改性方法 |
| KR20240050168A (ko) | 2022-10-11 | 2024-04-18 | 동우 화인켐 주식회사 | 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물 |
| KR20240050255A (ko) | 2022-10-11 | 2024-04-18 | 동우 화인켐 주식회사 | 퍼플루오로폴리에테르기 함유 실란 화합물 및 이를 포함하는 표면 처리용 조성물 |
| JPWO2024135362A1 (OSRAM) | 2022-12-22 | 2024-06-27 | ||
| KR20250133721A (ko) * | 2023-01-13 | 2025-09-08 | 유니마테크 가부시키가이샤 | 표면개질제 |
| KR20250142350A (ko) | 2023-01-25 | 2025-09-30 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 물품 및 물품의 표면 개질 방법 |
| KR20250145040A (ko) | 2023-02-07 | 2025-10-13 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 함불소 코팅제, 물품, 및 물품의 표면 개질 방법 |
| WO2024237105A1 (ja) | 2023-05-16 | 2024-11-21 | 信越化学工業株式会社 | 炭化水素末端基含有化合物、表面処理剤及び物品 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL292285A (OSRAM) * | 1962-09-07 | |||
| US3646085A (en) | 1970-09-24 | 1972-02-29 | Du Pont | Perfluoroalkyletheramidoalkyltrialkoxysilanes |
| JPH0629332B2 (ja) | 1985-04-26 | 1994-04-20 | 旭硝子株式会社 | 防汚性・低反射性プラスチツク |
| JPS63250389A (ja) | 1987-04-03 | 1988-10-18 | Shin Etsu Chem Co Ltd | 含フツ素有機ケイ素化合物およびその製造法 |
| US5041588A (en) * | 1989-07-03 | 1991-08-20 | Dow Corning Corporation | Chemically reactive fluorinated organosilicon compounds and their polymers |
| JP2907515B2 (ja) * | 1990-09-07 | 1999-06-21 | 松下電器産業株式会社 | 末端パーフルオロアルキルシラン化合物及びその製造方法 |
| JP2668472B2 (ja) * | 1991-10-17 | 1997-10-27 | 信越化学工業株式会社 | 含フッ素有機ケイ素化合物 |
| JPH0778066B2 (ja) * | 1991-10-17 | 1995-08-23 | 信越化学工業株式会社 | 含フッ素有機ケイ素化合物およびその製造方法 |
| JPH0716940A (ja) | 1993-06-23 | 1995-01-20 | Toray Ind Inc | 防汚性を有する光学物品 |
| JP3196621B2 (ja) * | 1995-04-20 | 2001-08-06 | 信越化学工業株式会社 | 水溶性表面処理剤 |
| JP3494195B2 (ja) | 1995-06-15 | 2004-02-03 | 住友化学工業株式会社 | 反射防止フィルター |
| DE19539789A1 (de) * | 1995-10-26 | 1997-04-30 | Merck Patent Gmbh | Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten |
| JPH09259406A (ja) | 1996-03-25 | 1997-10-03 | Sony Corp | 磁気ヘッドとその製造方法 |
| JP3233024B2 (ja) | 1996-06-03 | 2001-11-26 | 信越化学工業株式会社 | 有機ケイ素化合物及びその製造方法 |
| JP4420476B2 (ja) | 1996-10-18 | 2010-02-24 | ソニー株式会社 | 表面改質膜用組成物,表面改質膜,表示装置用フィルター,表示装置及び表示装置用フィルターの製造方法 |
| JPH1129585A (ja) * | 1997-07-04 | 1999-02-02 | Shin Etsu Chem Co Ltd | パーフルオロポリエーテル変性アミノシラン及び表面処理剤 |
| US6277485B1 (en) | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| JP4733798B2 (ja) | 1998-01-31 | 2011-07-27 | 凸版印刷株式会社 | 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置 |
| DE19825100A1 (de) * | 1998-06-05 | 1999-12-16 | Merck Patent Gmbh | Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten |
| JP4174867B2 (ja) | 1998-09-17 | 2008-11-05 | 凸版印刷株式会社 | 防汚層の形成方法 |
| US6296796B1 (en) * | 1999-02-02 | 2001-10-02 | Trw Inc. | Method for molding a two-material part using a rotatable mold insert member |
| JP3932732B2 (ja) | 1999-09-21 | 2007-06-20 | 株式会社日立製作所 | 燃料噴射弁とそれを用いた筒内噴射式エンジン |
| JP2001188102A (ja) * | 1999-12-27 | 2001-07-10 | Toppan Printing Co Ltd | 反射防止フィルム |
| JP2001269442A (ja) | 2000-03-24 | 2001-10-02 | Koichi Miki | ネットワークを使用した遊技システム |
| JP2001269942A (ja) | 2000-03-27 | 2001-10-02 | Seiko Epson Corp | 微細構造体および映像表示デバイスの製造方法 |
| JP2002056887A (ja) | 2000-08-10 | 2002-02-22 | Ngk Insulators Ltd | ナトリウム−硫黄電池を構成する絶縁リングと陽極金具の熱圧接合部材の製造方法 |
| US6846672B2 (en) * | 2000-11-16 | 2005-01-25 | Emory University | Mitogenic oxygenase regulators |
| US6656258B2 (en) * | 2001-03-20 | 2003-12-02 | 3M Innovative Properties Company | Compositions comprising fluorinated silanes and compressed fluid CO2 |
| DE60229340D1 (de) | 2001-10-05 | 2008-11-27 | Shinetsu Chemical Co | Perfluoropolyethermodifizierte Silane, Oberflächenbehandlungsmittel und Antireflexfilter |
| JP4412450B2 (ja) | 2001-10-05 | 2010-02-10 | 信越化学工業株式会社 | 反射防止フィルター |
| US6592659B1 (en) | 2001-11-15 | 2003-07-15 | 3M Innovative Properties Company | Compositions for aqueous delivery of fluorinated silanes |
| JP2003145971A (ja) | 2001-11-19 | 2003-05-21 | Hitachi Ltd | 記録媒体 |
| DE10217151A1 (de) | 2002-04-17 | 2003-10-30 | Clariant Gmbh | Nanoimprint-Resist |
| JP3951886B2 (ja) | 2002-10-23 | 2007-08-01 | 株式会社日立製作所 | 配線基板,表示デバイス,表示デバイス用カラーフィルター、及び配線基板形成方法,表示デバイス形成方法,表示デバイス用カラーフィルター形成方法 |
| JP4309694B2 (ja) | 2003-05-09 | 2009-08-05 | 株式会社日立製作所 | 撥水膜を有する物品及びその製法 |
| US7695781B2 (en) * | 2004-02-16 | 2010-04-13 | Fujifilm Corporation | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film |
-
2006
- 2006-03-30 WO PCT/JP2006/307261 patent/WO2006107083A2/en not_active Ceased
- 2006-03-30 KR KR1020077025425A patent/KR100967981B1/ko active Active
- 2006-03-30 CN CN201310473055.XA patent/CN103551075B/zh active Active
- 2006-03-30 JP JP2007544670A patent/JP5274839B2/ja active Active
- 2006-03-30 US US11/910,356 patent/US8211544B2/en active Active
- 2006-03-30 EP EP06731209.0A patent/EP1871780B1/en active Active
- 2006-03-30 CN CN201310473099.2A patent/CN103551076B/zh active Active
- 2006-03-31 TW TW95111459A patent/TWI435900B/zh active
- 2006-03-31 TW TW102119554A patent/TWI481648B/zh active
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9045647B2 (en) | 2010-11-10 | 2015-06-02 | Dow Corning Corporation | Surface treatment composition, method of producing the surface treatment composition, and surface-treated article |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090208728A1 (en) | 2009-08-20 |
| TW201336905A (zh) | 2013-09-16 |
| CN103551076B (zh) | 2016-07-06 |
| WO2006107083A3 (en) | 2007-02-15 |
| US8211544B2 (en) | 2012-07-03 |
| KR20070118285A (ko) | 2007-12-14 |
| TWI481648B (zh) | 2015-04-21 |
| JP2013241602A (ja) | 2013-12-05 |
| EP1871780B1 (en) | 2018-07-04 |
| JP2012037896A (ja) | 2012-02-23 |
| KR100967981B1 (ko) | 2010-07-07 |
| JP5274839B2 (ja) | 2013-08-28 |
| EP1871780A2 (en) | 2008-01-02 |
| JP5669699B2 (ja) | 2015-02-12 |
| CN103551076A (zh) | 2014-02-05 |
| WO2006107083A2 (en) | 2006-10-12 |
| JP2008534696A (ja) | 2008-08-28 |
| CN103551075A (zh) | 2014-02-05 |
| TW200643067A (en) | 2006-12-16 |
| CN103551075B (zh) | 2016-07-06 |
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