KR20030063109A - 디엘씨층 시스템 및 이러한 층 시스템을 제작하기 위한 방법 - Google Patents
디엘씨층 시스템 및 이러한 층 시스템을 제작하기 위한 방법 Download PDFInfo
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- KR20030063109A KR20030063109A KR1020027013744A KR20027013744A KR20030063109A KR 20030063109 A KR20030063109 A KR 20030063109A KR 1020027013744 A KR1020027013744 A KR 1020027013744A KR 20027013744 A KR20027013744 A KR 20027013744A KR 20030063109 A KR20030063109 A KR 20030063109A
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/046—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
- F16C33/043—Sliding surface consisting mainly of ceramics, cermets or hard carbon, e.g. diamond like carbon [DLC]
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- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
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- Y10T428/265—1 mil or less
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Abstract
Description
아르곤 흐름 | 75 sccm |
기판 바이어싱 전압[V] | 0 |
저-전압 아크의 전류세기 | 100 A |
수소 흐름 | 170 sccm |
위쪽 코일의 전류세기 | 20 내지 10 A 사이에서 변동 |
아래쪽 코일의 전류세기 | 반대방향으로 20 내지 5 A에서 변동 |
최고 전류세기와 최저 전류세기 사이의 지속 기간 | 1.5분 |
가열 시간 | 20분 |
아르곤 흐름 | 75 sccm |
기판 전압 | -150 V |
저-전압 아크의 전류세기 | 150 A |
아르곤 흐름 | 50 sccm |
아세틸렌 흐름 | 350 sccm |
상부코일에서의 들뜸 전류 | 10A |
저부코일에서의 들뜸 전류 | 3A |
전압진폭 | 2400 V |
들뜸 주파수 | 40kHz |
성질- 실시예 1 | |
미세경도 | 약 2200 HK |
침적률 | 1-2㎛/h |
점착력 | HF1 |
저항 | <10㏀ |
수소량 | 12% |
마찰률 | 0.2 |
내부응력 | 약 2 GPa |
분절모양 | 유리모양이 아님 |
아르곤 흐름 | 50 sccm |
아세틸렌 흐름 | 350 sccm |
상부코일에서의 들뜸 전류 | 10 A |
저부코일에서의 들뜸 전류 | 3 A |
전압진폭 | 700 V |
들뜸 주파수 | 40 kHz |
성질- 실시예 2 | |
미세경도 | 약 2400 HK |
침적률 | 약 1.5㎛/h |
점착력 | HF1 |
저항 | >500 ㏀ |
수소량 | 13% |
마찰률 | 0.2 |
내부응력 | 약 2 GPa |
아르곤 흐름 | 50 sccm |
아세틸렌 흐름 | 350 sccm |
상부코일에서의 들뜸 전류 | 10 A |
저부코일에서의 들뜸 전류 | 3 A |
전압진폭 | 1150 V |
들뜸 주파수 f | 30 kHz |
성질- 실시예 3 | |
미세경도 | > 2400 HK |
침적률 | 약 1.8 ㎛/h |
점착력 | HF1 |
저항 | >1 ㏀ |
수소량 | 12-16% |
마찰률 | 0.2 |
내부응력 | 약 2 GPa |
아르곤 흐름 | 50 sccm |
아세틸렌 흐름 | 350 sccm |
상부코일에서의 들뜸 전류 | 0 A |
저부코일에서의 들뜸 전류 | 0 A |
전압진폭 | 2400 V |
들뜸 주파수 f | 40 kHz |
성질- 실시예 4 | |
미세경도 | 균일하지 않음 1200- 2500 HK |
침적률 | 균일하지 않음 |
점착력 | 균일하지 않음 |
저항 | >1 ㏀ |
방법 실시예 | 5 | 6 | 7 |
DLC층 시스템 | 전압진폭이 1000V를 제외하고 실시예 1과 같음 | 실시예 2와 같음 | 실시예 3과 같음 |
아르곤 흐름 | 50 sccm | 50 sccm | 50 sccm |
아세틸렌 흐름 | 350 sccm | 350 sccm | 350sccm |
상부코일내들뜸 전류 | 3 A | 10A | 10A |
하부코일내들뜸 전류 | 10 A | 3A | 3A |
기판전압 진폭 | 2400 V | 2400V | 2400V |
전압경사 | 15분 | 25분 | 15분 |
들뜸 주파수 f | 40 kHz | 40kHz | 30kHz |
들뜸형 | AC 사인파 | 양극성 펄스 | 단극성 펄스 |
방법 실시예 | 8 | 9 | 10 |
DLC층 번호 | 1 | 2 | 3 |
아르곤 흐름 1 | 30 sccm | 50 sccm | 50 sccm |
아르곤 흐름 2 | 30 (100) sccm | - | - |
아르곤 경사 | 0 (10분) | - | - |
아세틸렌 흐름 1 | 0 sccm | 350 sccm | 350sccm |
아세틸렌 흐름 2 | 350 sccm | 350 sccm | 350sccm |
아르곤 경사 | 15분 | 20분 | 20분 |
메탄 흐름 1 | - | - | 0 sccm |
메탄 흐름 2 | - | - | 150 sccm |
메탄 경사 | - | - | 20분 |
전력크롬 타겟 1 | 8 kW | 7kW | - |
전력크롬 타겟 2 | 7 kW | - | - |
크롬타겟 경사 | 20분 | 30분 | - |
상부코일내들뜸 전류 | 10A | 10A | 10A |
저부코일내들뜸 전류 | 3A | 3A | 3A |
기판전압 진폭 | 2400 V | 700V | 1150V |
들뜸 주파수 f | 40 kHz | 40kHz | 30kHz |
들뜸형 | AC 사인파 | 양극성 펄스 | 단극성 펄스 |
시험번호 | 5 | 6 | 7 |
점착력 | HF1 | HF1 | HF1 |
저항 | <100 ㏀ | <100 ㏀ | <100 ㏀ |
마찰률 | 약 0.08 | 약 0.07 | 약 0.13 |
시험번호 | 8 | 9 | 10 |
점착력 | HF1 | HF1 | HF1 |
저항 | <1 ㏀ | <1 ㏀ | <100 ㏀ |
수소량 | n.s. | n.s. | >30원자% |
마찰률 | 약 0.08 | 약 0.07 | 약 0.13 |
Claims (25)
- 기판상에 배열되는 접착층, 상기 접착층상에 배열되는 전이층 및 DLC 또는 다이아몬드층을 포함하는 마모 방지, 침식 방지 및 슬리핑 성질이 향상된 층 시스템에 있어서, 상기 DLC 또는 다이아몬드층 상에 DLC 또는 다이아몬드층의 조성물과 상이한 화학조성물을 갖는 슬리핑층이 배열되어 있는 것을 특징으로 하는 층 시스템.
- 제 1항에 있어서, 상기 슬리핑층의 sp2 결합 및/또는 sp2/sp3 할당량의 점유율이 상기 DLC 또는 다이아몬드층의 점유율보다 큰 것을 특징으로 하는 층 시스템.
- 제 1항 또는 2항에 있어서, 상기 슬리핑층의 수소함량이 상기 DLC 또는 다이아몬드층의 수소함량보다 크고, 상기 슬리핑층의 탄소함량은 상기 DLC 또는 다이아몬드층의 탄소함량보다 작은 것을 특징으로 하는 층 시스템.
- 제 3항에 있어서, 상기 슬리핑층은 20 내지 60 원자%, 바람직하게는 30 내지 50 원자%의 수소함량을 갖는 것을 특징으로 하는 층 시스템.
- 제 2항 내지 4항중 어느 한 항에 있어서, 상기 슬리핑층의 결합비율 변경 및/또는 상기 슬리핑층의 전체층에 대한 수소함량의 증가가 동시에 또는 단계적으로 발생되는 것을 특징으로 하는 층 시스템.
- 제 1항에 있어서, 상기 슬리핑층의 금속함량이 상기 DLC 또는 다이아몬드층의 금속함량보다 큰 것을 특징으로 하는 층 시스템.
- 제 1항에 있어서, 상기 슬리핑층의 탄소함량은 감소되는 반면에, 상기 슬리핑층의 금속함량은 단계적으로, 또는 바람직하게는 연속적으로 증가되는 것을 특징으로 하는 층 시스템.
- 제 5항 및 제 6항에 있어서, 상기 DLC 또는 다이아몬드층이 위치된 후, 먼저, 높은 금속함량을 갖는 층, 바람직하게는 금속성 또는 탄소성층이 위치되고, 이후 금속 함량이 감소중이고 탄소함량이 증가중인 층이 위치되는 것을 특징으로 하는 층 시스템.
- 제 1항 내지 8항중 어느 한 항에 있어서, 일정한 화학조성물 영역이 표면에 근접한 상기 슬리핑층의 일부에 배열되는 것을 특징으로 하는 층 시스템.
- 제 1항 내지 9항중 어느 한 항에 있어서, 상기 슬리핑층 표면의 마찰계수가 μ=1.5 이하, 바람직하게는 μ=1.0 이하이고, 상기 층 시스템의 접착력이 3 HF 이상이거나, 바람직하게는 2 HF 이상인 것을 특징으로 하는 층 시스템.
- 제 1항 내지 10항중 어느 한 항에 있어서, 상기 전이층의 두께가 전체 두께의 5 내지 60%, 바람직하게는 10 내지 50%를 차지하는 것을 특징으로 하는 층 시스템.
- 제 1항 내지 11항중 어느 한 항에 있어서, 상기 접착층, 상기 전이층, 상기 DLC 또는 다이아몬드 층 및/또는 상기 슬리핑층은 수소 및/또는 불가피한 불순물을 포함하는 것을 특징으로 하는 반면에, 상기 불가피한 불순물이 불활성 가스, 특히 아르곤 및 크세논을 포함하는 층 시스템.
- 제 1항 내지 12항중 어느 한 항에 있어서, 상기 DLC 또는 다이아몬드층의 두께는 0.05 ㎛ 내지 10 ㎛, 바람직하게는 0.5 ㎛ 내지 5 ㎛인 것을 특징으로 하는 층 시스템.
- 제 1항 내지 13항중 어느 한 항에 있어서, 상기 다이아몬드 유사 탄소의 DLC 또는 다이아몬드층은 미세입자층 구조를 가지거나 또는 나노결정성 다이아몬드로 이루어지는 것을 특징으로 하는 층 시스템.
- 제 1항 내지 14항중 어느 한 항에 있어서, 상기 슬리핑층이 DLC 층 시스템상에 적용되는 것을 특징으로 하는 층 시스템.
- 층 시스템, 특히 제 1항 내지 15항중 어느 한 항에 따른 층 시스템의 기판을 제조하는 방법에 있어서, 상기 방법이 하기의 제조단계를 포함하는 것을 특징으로 하는 방법:a) 기판을 진공 챔버내로 도입시키고, 챔버 압력이 10-3mbar 이하, 바람직하게는 10-5mbar 이하가 될 때까지 챔버를 흡입하는 단계;b) 기판 표면을 세척하는 단계;c) 기판상의 접착층을 플라즈마-지지 증착(plasma-supported depositon)시키는 단계;d) 상기 접착층 성분을 플라즈마-지지 증착시키는 동시에 가스상으로부터 탄소를 증착시켜 상기 접착층상의 전이층을 증착시키는 단계;e) 가스상으로부터 탄소를 플라즈마-지지 증착시켜 상기 전이층상에 상기 DLC 또는 다이아몬드층을 적용시키는 단계;f) 가스상으로부터 탄소를 증착시켜 상기 DLC 또는 다이아몬드층상에 상기 슬리핑층을 적용시키는 단계,여기서, 적어도 상기 c), d), e) 및 f) 단계 공정중에 기판 바이어스 전압(substrate biasing voltage)이 상기 기판에 적용되고, 상기 플라즈마는 적어도 상기 d) 및 e) 단계 공정중에 자기장에 의해 안정화된다.
- 제 16항에 있어서, 상기 b) 내지 f) 단계 공정중 적어도 하나의 단계중에 양극성 또는 단극성 바이어스 전압이 기질에 적용되는 것을 특징으로 하며, 여기서 사인파 또는 기타 형상이 될 수 있는 상기 바이어스 전압이 1 내지 10,000 kHz, 바람직하게는 20 내지 250 kHz의 중주파 범위에서 펄스되는 방법.
- 제 16항 또는 17항에 있어서, 상기 b) 내지 f) 단계 공정중 적어도 하나의 단계중에, 바람직하게는 적어도 상기 d) 및 e) 단계 공정중에 기판을 감싸고, 시간 및/또는 공간에 따라 연속적이거나 단계적으로 변할 수 있는 균일한 필드라인 양식을 갖는 종축의 자기장이 존재하는 것을 특징으로 하는 방법.
- 제 16항 내지 18항중 어느 한 항에 있어서, 주기율표상의 제4, 제5 및 제6 아족 원소들을 포함하는 원소로 이루어진 족(group)중 적어도 하나의 원소 및 실리콘을 제 30 또는 31항에 따른 방법에 따라 증착시키고 동시에 가스상으로부터 탄소를 플라즈마-지지 증착시켜 상기 전이층 및 상기 슬리핑층이 제조되는 것을 특징으로 하며, 여기서 탄소-함유 가스, 바람직하게는 탄화수소 가스, 특히 아세틸렌이 반응 가스로 사용되는 방법.
- 제 16항 내지 19항 중 어느 한 항에 있어서, 슬리핑층을 적용시키기 위하여, 금속함유층, 바람직하게는 금속성 또는 탄소성층이, 일차적으로 DLC 또는 다이아몬드층상에 증착되고, 슬리핑층의 두께가 증가함에 따라서 탄소 증착 점유율이 표면방향을 따라 연속적으로 또는 단계적으로 증가되는 것을 특징으로 하는 방법.
- 제 16항 내지 20항에 있어서, 탄소 증착 점유율은 슬리핑층의 두께가 증가함에 따라서 표면 방향을 따라 연속적으로 또는 단계적으로 감소되고, 금속 또는 수소 증착 점유율은 증가되는 것을 특징으로 하는 방법.
- 제 16항 내지 21항에 있어서, 상기 DLC 또는 다이아몬드층이 가스상으로부터 탄소를 플라즈마-CVD 증착시켜 제조되는 것을 특징으로 하며, 여기서 탄소함유 가스, 바람직하게는 탄화수소 가스, 특히 아세틸렌은 반응 가스로 사용되는 방법.
- 제 16항 내지 22항에 있어서, 상기 b) 내지 f) 단계 공정이 10-4mbar 내지 10-2mbar 압력하에 수행되는 것을 특징으로 하는 방법.
- 진공챔버(1), 진공챔버(1)내에 진공을 발생시키기 위한 펌프 시스템(9), 코팅될 기판을 수용하기 위한 기판수용장치(3), 공정 가스 공급을 조절하는 적어도 하나의 가스공급유닛(8), 이용가능한 증착용 코팅물질을 제조하기 위한 적어도 하나의 증발장치(14), 저-전압 직류 아크를 점화시키기 위한 아크 발생장치(10, 13), 기판 바이어스 전압 발생 장치(16), 및 원자기장 형성을 위한 적어도 하나 또는 다수의 자기장 발생장치(17)를 포함하는, 바람직하게는 제 17 내지 24 특징에 따른코팅방법을 수행하기 위한, 하나 이상의 기판을 코팅하는 장치.
- 제 24항에 있어서, 상기 원자기장 형성을 위한 자기장 발생 장치(17)는 적어도 두 개의 전자기 코일을 포함하고, 각각의 코일은 서로 마주보며 배열된 두 개의 마그네트론 장치중 하나를 측면으로 감싸고 있으며, 여기서 마주 배열된 마그네트론 자기 시스템들의 극성은 한 시스템의 북극이 다른 시스템의 남극을 향하도록 배열되어 있고, 자기코일 필드들이 서로를 보충하여 폐쇄 자기장을 이루며 마그네트론 자기 시스템들의 외부 폴 및 자기 코일들의 극성이 동일한 방향으로 작용하는 방식으로 각 시스템과 관련된 코일들이 동시에 전류원에 연결되어 있는 것을 특징으로 하는 장치.
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DE10018143A DE10018143C5 (de) | 2000-04-12 | 2000-04-12 | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
PCT/EP2000/013299 WO2001079585A1 (de) | 2000-04-12 | 2000-12-27 | Dlc-schichtsystem sowie verfahren zur herstellung eines derartigen schichtsystems |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100897323B1 (ko) * | 2007-05-30 | 2009-05-14 | 한국생산기술연구원 | 플라즈마 화학기상증착과 물리기상증착을 복합한 박막 코팅방법 |
KR20130121078A (ko) * | 2010-06-22 | 2013-11-05 | 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 | 지정된 전기장을 갖는 아크 증착 소스 |
KR101499272B1 (ko) * | 2007-05-25 | 2015-03-05 | 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 | 진공 처리 장치 및 진공 처리 방법 |
RU2763357C1 (ru) * | 2021-04-13 | 2021-12-28 | Александр Васильевич Вахрушев | Способ получения высококачественных пленок методом механической вибрации подложки |
Families Citing this family (184)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
US7250196B1 (en) * | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
JP2003231203A (ja) * | 2001-08-21 | 2003-08-19 | Toshiba Corp | 炭素膜被覆部材 |
WO2003029685A1 (fr) * | 2001-09-27 | 2003-04-10 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Element coulissant a coefficient de frottement eleve |
DE10149588B4 (de) * | 2001-10-08 | 2017-09-07 | Oerlikon Trading Ag, Trübbach | Verfahren zur Diamantbeschichtung von Substraten |
JP2003206820A (ja) * | 2002-01-17 | 2003-07-25 | Keihin Corp | 電磁式燃料噴射弁 |
DE10203730B4 (de) * | 2002-01-30 | 2010-09-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Abscheidung von metallfreien Kohlenstoffschichten |
GB0205959D0 (en) * | 2002-03-14 | 2002-04-24 | Teer Coatings Ltd | Apparatus and method for applying diamond-like carbon coatings |
US20030180450A1 (en) * | 2002-03-22 | 2003-09-25 | Kidd Jerry D. | System and method for preventing breaker failure |
JP2006509967A (ja) * | 2002-04-25 | 2006-03-23 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | 構造化させた層システム |
DE10223844B4 (de) * | 2002-05-28 | 2013-04-04 | Danfoss A/S | Wasserhydraulische Maschine |
JP2004138128A (ja) * | 2002-10-16 | 2004-05-13 | Nissan Motor Co Ltd | 自動車エンジン用摺動部材 |
DE10305159B4 (de) * | 2002-11-02 | 2006-12-07 | Rowapack Gmbh Verpackungsdesign Und Stanztechnik | Stanzverfahren |
US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
DE10256063A1 (de) * | 2002-11-30 | 2004-06-17 | Mahle Gmbh | Verfahren zum Beschichten von Kolbenringen für Verbrennungsmotoren |
US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
DE10259174B4 (de) * | 2002-12-18 | 2006-10-12 | Robert Bosch Gmbh | Verwendung eines tribologisch beanspruchten Bauelements |
US7866342B2 (en) * | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
US8555921B2 (en) * | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
SE526481C2 (sv) | 2003-01-13 | 2005-09-20 | Sandvik Intellectual Property | Ythärdat rostfritt stål med förbättrad nötningsbeständighet och låg statisk friktion |
US20060226003A1 (en) * | 2003-01-22 | 2006-10-12 | John Mize | Apparatus and methods for ionized deposition of a film or thin layer |
CN100594253C (zh) * | 2003-02-26 | 2010-03-17 | 住友电气工业株式会社 | 无定形碳膜 |
US20040258547A1 (en) * | 2003-04-02 | 2004-12-23 | Kurt Burger | Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material |
RU2240376C1 (ru) * | 2003-05-22 | 2004-11-20 | Ооо "Альбатэк" | Способ формирования сверхтвердого аморфного углеродного покрытия в вакууме |
CN100523299C (zh) * | 2003-07-25 | 2009-08-05 | 贝卡尔特股份有限公司 | 覆盖有中间涂层和硬质碳涂层的基材 |
JP4863152B2 (ja) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
WO2005014761A2 (ja) | 2003-08-06 | 2005-02-17 | Nissan Motor Co., Ltd. | 低摩擦摺動機構、低摩擦剤組成物及び摩擦低減方法 |
JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
EP1508611B1 (en) | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Transmission comprising low-friction sliding members and transmission oil therefor |
WO2005029538A2 (en) * | 2003-09-22 | 2005-03-31 | Seok Kyun Song | A plasma generating apparatus and an alignment process for liquid crystal displays using the apparatus |
US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
US7824498B2 (en) * | 2004-02-24 | 2010-11-02 | Applied Materials, Inc. | Coating for reducing contamination of substrates during processing |
US20050193852A1 (en) * | 2004-03-05 | 2005-09-08 | Cooper Clark V. | Transmission system with increased power density |
JP4572688B2 (ja) * | 2004-04-27 | 2010-11-04 | 株式会社豊田中央研究所 | 低摩擦摺動部材 |
JP4805255B2 (ja) * | 2004-04-29 | 2011-11-02 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | 銅含有軸受材料のdlc硬質コーティング |
JP4543373B2 (ja) * | 2004-06-03 | 2010-09-15 | 三菱マテリアル株式会社 | 非鉄材料の高速切削加工ですぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具の製造方法 |
KR101256231B1 (ko) * | 2004-07-09 | 2013-04-17 | 빌란트-베르케악티엔게젤샤프트 | Me-DLC 경질 코팅이 포함된 구리 함유성 전도재 |
JP2006116633A (ja) * | 2004-10-20 | 2006-05-11 | Osg Corp | 硬質被膜被覆工具、コーティング被膜、および被膜のコーティング方法 |
JP2006138404A (ja) * | 2004-11-12 | 2006-06-01 | Kobe Steel Ltd | 水系環境下での耐摩耗性に優れた摺動部材 |
CH697552B1 (de) | 2004-11-12 | 2008-11-28 | Oerlikon Trading Ag | Vakuumbehandlungsanlage. |
EP1698713A1 (de) * | 2005-03-01 | 2006-09-06 | Ceco Ltd | Kratzfester Werkstoff und Verfahren zu seiner Herstellung |
US9659758B2 (en) * | 2005-03-22 | 2017-05-23 | Honeywell International Inc. | Coils utilized in vapor deposition applications and methods of production |
US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
BRPI0611436B1 (pt) | 2005-05-04 | 2018-04-24 | Oerlikon Trading Ag, Trübbach | Amplificador de plasma para instalação de tratamento de plasma |
CN101208461B (zh) * | 2005-05-26 | 2011-07-06 | 萨尔泽曼塔普拉斯有限公司 | 具有多层硬质涂层的活塞环 |
US20060278520A1 (en) * | 2005-06-13 | 2006-12-14 | Lee Eal H | Use of DC magnetron sputtering systems |
CN1899992A (zh) * | 2005-07-19 | 2007-01-24 | 鸿富锦精密工业(深圳)有限公司 | 模仁及其制备方法 |
WO2007020139A1 (en) * | 2005-08-18 | 2007-02-22 | Nv Bekaert Sa | Substrate coated with a layered structure comprising a tetrahedral carbon layer and a softer outer layer |
DE502006005651D1 (de) * | 2005-09-10 | 2010-01-28 | Ixetic Hueckeswagen Gmbh | Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben |
CN100482379C (zh) * | 2005-10-27 | 2009-04-29 | 鸿富锦精密工业(深圳)有限公司 | 一种压铸模仁及其制备方法 |
DE102005054132B4 (de) * | 2005-11-14 | 2020-03-26 | Robert Bosch Gmbh | Ventil zum Steuern eines Fluids mit Tribosystem |
WO2007064332A1 (en) * | 2005-12-02 | 2007-06-07 | United Technologies Corporation | Metal-free diamond-like-carbon coatings |
JP2009519379A (ja) * | 2005-12-13 | 2009-05-14 | ユナイテッド テクノロジーズ コーポレイション | アモルファス炭素を堆積させる方法 |
JP2007162099A (ja) * | 2005-12-15 | 2007-06-28 | Toyota Motor Corp | 硬質炭素膜及びその製造方法並びに摺動部材 |
KR100656955B1 (ko) * | 2005-12-30 | 2006-12-14 | 삼성전자주식회사 | 이온 임플랜터의 이온 발생 장치 |
JP4735309B2 (ja) * | 2006-02-10 | 2011-07-27 | トヨタ自動車株式会社 | 耐キャビテーションエロージョン用部材及びその製造方法 |
US9526814B2 (en) * | 2006-02-16 | 2016-12-27 | Boston Scientific Scimed, Inc. | Medical balloons and methods of making the same |
JP5030439B2 (ja) * | 2006-02-28 | 2012-09-19 | 株式会社リケン | 摺動部材 |
JP2007246996A (ja) * | 2006-03-16 | 2007-09-27 | Tdk Corp | 保護膜及び該保護膜付き内燃機関用部品 |
EP1999776A1 (en) * | 2006-03-28 | 2008-12-10 | NV Bekaert SA | Coating apparatus |
JP5355382B2 (ja) * | 2006-03-28 | 2013-11-27 | スルザー メタプラス ゲーエムベーハー | スパッタリング装置 |
JP4704950B2 (ja) * | 2006-04-27 | 2011-06-22 | 株式会社神戸製鋼所 | 非晶質炭素系硬質多層膜及びこの膜を表面に備えた硬質表面部材 |
US8273222B2 (en) * | 2006-05-16 | 2012-09-25 | Southwest Research Institute | Apparatus and method for RF plasma enhanced magnetron sputter deposition |
GB2452190B (en) * | 2006-05-17 | 2011-12-28 | G & H Technologies Llc | Wear resistant depositied coating, method of coating deposition and applications therefor |
AT503288B1 (de) * | 2006-07-26 | 2007-09-15 | Bosch Gmbh Robert | Verfahren zum aufbringen eines beschichtungsmaterials sowie beschichtung für eine metallische oberfläche |
ATE529881T1 (de) * | 2006-08-03 | 2011-11-15 | Creepservice S A R L | Verfahren zur beschichtung von substraten mit diamantähnlichen kohlenstoffschichten |
DE102006037774A1 (de) * | 2006-08-11 | 2008-02-14 | Polysius Ag | Walzen- oder Rollenmühle |
FR2907470B1 (fr) * | 2006-10-20 | 2009-04-17 | Hef Soc Par Actions Simplifiee | Piece en contact glissant, en regime lubrifie, revetue d'une couche mince. |
DE102006049974A1 (de) * | 2006-10-24 | 2008-04-30 | Oerlikon Leybold Vacuum Gmbh | Turbomaschine |
DE102006058078A1 (de) * | 2006-12-07 | 2008-06-19 | Systec System- Und Anlagentechnik Gmbh & Co. Kg | Vakuumbeschichtungsanlage zur homogenen PVD-Beschichtung |
JP2008163430A (ja) * | 2006-12-28 | 2008-07-17 | Jtekt Corp | 高耐食性部材およびその製造方法 |
DE102007047629A1 (de) * | 2007-04-13 | 2008-10-16 | Stein, Ralf | Verfahren zum Aufbringen einer hochfesten Beschichtung auf Werkstücke und/oder Werkstoffe |
DE102007019994A1 (de) * | 2007-04-27 | 2008-10-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Transparente Barrierefolie und Verfahren zum Herstellen derselben |
JP2008310849A (ja) * | 2007-06-12 | 2008-12-25 | Fuji Electric Device Technology Co Ltd | 保護膜形成法及び保護膜を備えた磁気記録媒体 |
US20090029067A1 (en) * | 2007-06-28 | 2009-01-29 | Sciamanna Steven F | Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors |
US8105660B2 (en) * | 2007-06-28 | 2012-01-31 | Andrew W Tudhope | Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component |
US8277617B2 (en) * | 2007-08-14 | 2012-10-02 | Southwest Research Institute | Conformal magnetron sputter deposition |
JP2009127059A (ja) * | 2007-11-20 | 2009-06-11 | Tokyo Denki Univ | ダイヤモンドライクカーボン膜の形成方法 |
US20090194414A1 (en) * | 2008-01-31 | 2009-08-06 | Nolander Ira G | Modified sputtering target and deposition components, methods of production and uses thereof |
DE102008011921A1 (de) * | 2008-02-29 | 2009-09-10 | Ks Kolbenschmidt Gmbh | Beschichtung von Bauteilen einer Brennkraftmaschine zur Verminderung von Reibung, Verschleiß und Adhäsionsneigung |
DE102008016864B3 (de) * | 2008-04-02 | 2009-10-22 | Federal-Mogul Burscheid Gmbh | Kolbenring |
TW200942633A (en) * | 2008-04-14 | 2009-10-16 | Yu-Hsueh Lin | Method for plating film on surface of drill and structure of film-plated drill |
WO2009140417A1 (en) * | 2008-05-13 | 2009-11-19 | Sub-One Technology, Inc. | Method of coating inner and outer surfaces of pipes for thermal solar and other applications |
DE102008028542B4 (de) * | 2008-06-16 | 2012-07-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Abscheiden einer Schicht auf einem Substrat mittels einer plasmagestützten chemischen Reaktion |
JP5244495B2 (ja) * | 2008-08-06 | 2013-07-24 | 三菱重工業株式会社 | 回転機械用の部品 |
TWI399451B (zh) * | 2008-09-05 | 2013-06-21 | Yu Hsueh Lin | 傳動機構之表面鍍膜方法 |
DE102008042896A1 (de) * | 2008-10-16 | 2010-04-22 | Federal-Mogul Burscheid Gmbh | Verfahren zur Beschichtung eines Gleitelements und Gleitelement, insbesondere Kolbenring oder Zylinderlaufbuchse eines Verbrennungsmotors |
US8332314B2 (en) | 2008-11-05 | 2012-12-11 | Kent Griffin | Text authorization for mobile payments |
US7939367B1 (en) * | 2008-12-18 | 2011-05-10 | Crystallume Corporation | Method for growing an adherent diamond layer atop an interlayer bonded to a compound semiconductor substrate |
JP4755262B2 (ja) * | 2009-01-28 | 2011-08-24 | 株式会社神戸製鋼所 | ダイヤモンドライクカーボン膜の製造方法 |
JP5222764B2 (ja) * | 2009-03-24 | 2013-06-26 | 株式会社神戸製鋼所 | 積層皮膜および積層皮膜被覆部材 |
JP5741891B2 (ja) * | 2009-06-19 | 2015-07-01 | 株式会社ジェイテクト | Dlc膜形成方法 |
BR112012002820A2 (pt) * | 2009-08-07 | 2016-08-30 | Oerlikon Trading Ag | tribologia combinada com resistência à corrosão: uma nova família de revestimentos de pvd e pacvd |
DE102009028504C5 (de) * | 2009-08-13 | 2014-10-30 | Federal-Mogul Burscheid Gmbh | Kolbenring mit einer Beschichtung |
WO2011060847A1 (de) * | 2009-11-20 | 2011-05-26 | Oerlikon Trading Ag, Trübbach | Teilspulensystem zur simulation von kreisspulen für vakuumvorrichtungen |
US8715789B2 (en) * | 2009-12-18 | 2014-05-06 | Sub-One Technology, Inc. | Chemical vapor deposition for an interior of a hollow article with high aspect ratio |
EP2543633A4 (en) * | 2010-03-03 | 2016-07-06 | Taiyo Yuden Chemical Technology Co Ltd | METHOD OF FIXING ON A LAYER COMPRISING AMORPHOUS CARBON FILM, AND LAMINATE |
US8747631B2 (en) * | 2010-03-15 | 2014-06-10 | Southwest Research Institute | Apparatus and method utilizing a double glow discharge plasma for sputter cleaning |
CN102844462B (zh) * | 2010-04-15 | 2015-10-07 | 斯恩蒂斯有限公司 | 用于CoCrMo基材的涂层 |
US9169551B2 (en) * | 2010-04-15 | 2015-10-27 | DePuy Synthes Products, Inc. | Coating for a CoCrMo substrate |
EP2385259A1 (en) * | 2010-05-06 | 2011-11-09 | Protec Surface Technologies S.r.L. | Fluid-operated cylinder for a vehicle adapted to handle materials |
JP5649333B2 (ja) * | 2010-06-01 | 2015-01-07 | 株式会社神戸製鋼所 | イオンボンバードメント装置及びこの装置を用いた基材表面のクリーニング方法 |
WO2012005325A1 (ja) * | 2010-07-09 | 2012-01-12 | 大同メタル工業株式会社 | 摺動部材 |
US9034466B2 (en) * | 2010-07-09 | 2015-05-19 | Daido Metal Company Ltd. | Sliding member |
JP5665409B2 (ja) * | 2010-08-06 | 2015-02-04 | 株式会社ジェイテクト | 被膜の成膜方法 |
DE102010062114B4 (de) * | 2010-11-29 | 2014-12-11 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, mit einer Beschichtung |
DE102011009347B4 (de) | 2010-11-29 | 2016-05-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines kohlenstoffhaltigen Schichtsystems sowie Vorrichtung zur Durchführung des Verfahrens |
DE102010052971A1 (de) * | 2010-11-30 | 2012-05-31 | Amg Coating Technologies Gmbh | Werkstück mit Si-DLC Beschichtung und Verfahren zur Herstellung von Beschichtungen |
CN102108484B (zh) * | 2011-01-18 | 2012-07-04 | 厦门建霖工业有限公司 | 一种双层抗菌镀层的制备方法 |
CN102108485B (zh) * | 2011-01-28 | 2012-03-28 | 厦门建霖工业有限公司 | 塑胶表面抗菌镀层的制备方法 |
BRPI1100176A2 (pt) * | 2011-02-10 | 2013-04-24 | Mahle Metal Leve Sa | componente de motor |
EP2673497B1 (en) * | 2011-02-11 | 2019-01-23 | Sphenic Technologies Inc. | System, circuit, and method for controlling combustion |
MY180513A (en) * | 2011-03-02 | 2020-12-01 | Oerlikon Surface Solutions Ag Trubbach | Sliding component coated with metal-comprising carbon layer for improving wear and friction behavior by tribological applications under lubricated conditions |
JP5904537B2 (ja) * | 2011-04-20 | 2016-04-13 | Ntn株式会社 | 非晶質炭素膜の成膜方法 |
US9909365B2 (en) | 2011-04-29 | 2018-03-06 | Baker Hughes Incorporated | Downhole tools having mechanical joints with enhanced surfaces |
FR2975404B1 (fr) * | 2011-05-19 | 2014-01-24 | Hydromecanique & Frottement | Piece avec revetement dlc et procede d'application du revetement dlc |
DE102011077556A1 (de) | 2011-06-15 | 2012-12-20 | Schaeffler Technologies AG & Co. KG | Gleitlager |
US9340854B2 (en) * | 2011-07-13 | 2016-05-17 | Baker Hughes Incorporated | Downhole motor with diamond-like carbon coating on stator and/or rotor and method of making said downhole motor |
JP2011225999A (ja) * | 2011-07-21 | 2011-11-10 | Yamaguchi Prefectural Industrial Technology Institute | プラズマ処理装置及び成膜方法 |
CN103814150B (zh) * | 2011-09-22 | 2015-11-25 | Ntn株式会社 | 硬质膜、硬质膜形成体及滚动轴承 |
DE102011116576A1 (de) * | 2011-10-21 | 2013-04-25 | Oerlikon Trading Ag, Trübbach | Bohrer mit Beschichtung |
JP5689051B2 (ja) * | 2011-11-25 | 2015-03-25 | 株式会社神戸製鋼所 | イオンボンバードメント装置 |
AT511605B1 (de) * | 2011-12-12 | 2013-01-15 | High Tech Coatings Gmbh | Kohlenstoffbasierende beschichtung |
KR101382997B1 (ko) * | 2012-02-08 | 2014-04-08 | 현대자동차주식회사 | 코팅층 표면 처리 방법 |
EP2628822B1 (en) | 2012-02-15 | 2015-05-20 | IHI Hauzer Techno Coating B.V. | Current insulated bearing components and bearings |
EP2628817B1 (en) | 2012-02-15 | 2016-11-02 | IHI Hauzer Techno Coating B.V. | A coated article of martensitic steel and a method of forming a coated article of steel |
DE102012007763A1 (de) | 2012-04-20 | 2013-10-24 | Ulrich Schmidt | Modularer Rahmen für Steckdosen und Schalter |
EP2664690B1 (en) | 2012-05-15 | 2015-09-16 | ZhongAo HuiCheng Technology Co. Ltd. | A magnetron sputtering coating device and the preparation method of a nano-multilayer film |
RU2494172C1 (ru) * | 2012-08-07 | 2013-09-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Казанский национальный исследовательский технологический университет" (ФГБОУ ВПО "КНИТУ") | Способ получения износостойкого покрытия |
DE102012214284B4 (de) * | 2012-08-10 | 2014-03-13 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, mit einer widerstandsfähigen Beschichtung |
US9412569B2 (en) | 2012-09-14 | 2016-08-09 | Vapor Technologies, Inc. | Remote arc discharge plasma assisted processes |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9793098B2 (en) | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
KR101439131B1 (ko) * | 2012-09-21 | 2014-09-11 | 현대자동차주식회사 | 흡배기 밸브용 코팅재 및 이의 제조방법 |
TWI565353B (zh) * | 2012-10-19 | 2017-01-01 | 逢甲大學 | 可撓性電熱發熱體及其製作方法 |
JP5564099B2 (ja) * | 2012-12-28 | 2014-07-30 | 株式会社リケン | シリンダとピストンリングの組合せ |
JP6076112B2 (ja) * | 2013-02-07 | 2017-02-08 | 株式会社神戸製鋼所 | イオンボンバードメント装置及びこの装置を用いた基材の表面のクリーニング方法 |
DE102013007146A1 (de) * | 2013-04-25 | 2014-10-30 | Oerlikon Trading Ag, Trübbach | DLC Beschichtung mit Einlaufschicht |
KR102240344B1 (ko) * | 2013-02-21 | 2021-04-15 | 외를리콘 서피스 솔루션즈 아게, 페피콘 | 마모성 층을 갖는 dlc 코팅 |
DE102013002911A1 (de) | 2013-02-21 | 2014-08-21 | Oerlikon Trading Ag, Trübbach | Dekorative, tiefschwarze Beschichtung |
US9308090B2 (en) | 2013-03-11 | 2016-04-12 | DePuy Synthes Products, Inc. | Coating for a titanium alloy substrate |
JPWO2014148479A1 (ja) * | 2013-03-19 | 2017-02-16 | 太陽誘電ケミカルテクノロジー株式会社 | 防汚用の非晶質炭素膜を備える構造体及び防汚用の非晶質炭素膜の形成方法 |
EP2957655B1 (en) * | 2013-03-22 | 2019-01-16 | Nittan Valve Co., Ltd. | Dlc coating film |
JP6103040B2 (ja) * | 2013-03-29 | 2017-03-29 | 日立金属株式会社 | 被覆工具の製造方法 |
JP2014237890A (ja) * | 2013-05-10 | 2014-12-18 | 国立大学法人電気通信大学 | ダイヤモンドライクカーボン膜の成膜装置および形成方法 |
US20150004362A1 (en) * | 2013-07-01 | 2015-01-01 | General Electric Company | Multilayered coatings with diamond-like carbon |
DE102013213454B3 (de) * | 2013-07-09 | 2015-01-15 | Friedrich-Alexander-Universität Erlangen - Nürnberg | Werkzeug zum Einsatz beim Aluminiumguss |
CN105431563B (zh) * | 2013-07-19 | 2019-06-11 | 欧瑞康表面处理解决方案股份公司普费菲孔 | 用于成型工具的涂层 |
JP6533374B2 (ja) * | 2013-11-06 | 2019-06-19 | Dowaサーモテック株式会社 | Dlc皮膜の成膜方法 |
DE102013225608A1 (de) * | 2013-12-11 | 2015-06-11 | Apo Gmbh Massenkleinteilbeschichtung | Vorrichtung und Verfahren zur Oberflächenbehandlung von Kleinteilen mittels Plasma |
WO2015161469A1 (zh) * | 2014-04-23 | 2015-10-29 | 中奥汇成科技股份有限公司 | 一种人工关节臼杯、磁控溅射镀膜装置及其制备方法 |
FR3022560B1 (fr) * | 2014-06-18 | 2022-02-25 | Hydromecanique & Frottement | Procede de revetement en carbone dlc du nez des cames d'un arbre a came, arbre a cames ainsi obtenu et installation pour la mise en oeuvre de ce procede |
JP6044602B2 (ja) | 2014-07-11 | 2016-12-14 | トヨタ自動車株式会社 | 成膜装置 |
KR20190016147A (ko) * | 2014-08-01 | 2019-02-15 | 히타치 긴조쿠 가부시키가이샤 | 피복 공구의 제조 방법 |
US10612123B2 (en) * | 2015-02-04 | 2020-04-07 | The University Of Akron | Duplex surface treatment for titanium alloys |
EP3284980B1 (en) | 2015-04-16 | 2020-08-05 | Eagle Industry Co., Ltd. | Sliding part |
US10688565B2 (en) * | 2015-05-28 | 2020-06-23 | Kyocera Corporation | Cutting tool |
JP6014941B2 (ja) * | 2015-07-31 | 2016-10-26 | 地方独立行政法人山口県産業技術センター | プラズマ処理装置及び成膜方法 |
WO2017083369A1 (en) * | 2015-11-12 | 2017-05-18 | National Oilwell DHT, L.P. | Downhole drill bit with coated cutting element |
CN105734527B (zh) * | 2016-03-08 | 2019-01-18 | 仪征亚新科双环活塞环有限公司 | 一种用于活塞环表面的类金刚石镀层、活塞环及制备工艺 |
KR101828508B1 (ko) * | 2016-07-13 | 2018-03-29 | 제이와이테크놀로지(주) | Dlc 박막 제조 장치 |
JP6380483B2 (ja) | 2016-08-10 | 2018-08-29 | トヨタ自動車株式会社 | 成膜装置 |
DE102016116123B4 (de) * | 2016-08-30 | 2018-07-19 | Federal-Mogul Valvetrain Gmbh | Verschleißarmes Kegelstück |
US10377508B2 (en) | 2016-11-29 | 2019-08-13 | The Boeing Company | Enhanced tooling for interference-fit fasteners |
EP3690079B1 (en) * | 2017-09-25 | 2023-06-07 | Sumitomo Electric Industries, Ltd. | Method for manufacturing hard carbon-based coating, and member provided with coating |
US11183373B2 (en) | 2017-10-11 | 2021-11-23 | Honeywell International Inc. | Multi-patterned sputter traps and methods of making |
KR102055046B1 (ko) * | 2017-12-29 | 2019-12-12 | 트인로드 주식회사 | Dlc 및 다이아몬드 박막이 이중 코팅된 펀칭공구 및 그 제조방법 |
CN108374154B (zh) * | 2018-02-26 | 2023-06-13 | 温州职业技术学院 | 带有复合磁场的类金刚石涂层制备装置及其应用 |
US10702862B2 (en) * | 2018-04-13 | 2020-07-07 | U.S. Department Of Energy | Superlubricious carbon films derived from natural gas |
FR3082527B1 (fr) * | 2018-06-18 | 2020-09-18 | Hydromecanique & Frottement | Piece revetue par un revetement de carbone amorphe non-hydrogene sur une sous-couche comportant du chrome, du carbone et du silicium |
FR3082526B1 (fr) * | 2018-06-18 | 2020-09-18 | Hydromecanique & Frottement | Piece revetue par un revetement de carbone amorphe hydrogene sur une sous-couche comportant du chrome, du carbone et du silicium |
DE102018125464B4 (de) * | 2018-10-15 | 2022-09-29 | PiKa GbR (Vertretungsberechtigter Gesellschafter: Markus Pittroff, 91278 Pottenstein) | Sägekette zur Holz- und Kunststoffbearbeitung und Verfahren zur Herstellung eines Sägegliedes |
EP3650583A1 (en) | 2018-11-08 | 2020-05-13 | Nanofilm Technologies International Pte Ltd | Ta-c based coatings with improved hardness |
CN110066982A (zh) * | 2019-04-17 | 2019-07-30 | 厦门阿匹斯智能制造系统有限公司 | 一种pvd镀膜产线磁控溅射的磁场分布方法 |
US20220275498A1 (en) * | 2019-07-31 | 2022-09-01 | Oerlikon Surface Solutions Ag, Pfäffikon | Graded hydrogen-free carbon-based hard material layer coated onto a substrate |
US11664226B2 (en) | 2020-06-29 | 2023-05-30 | Applied Materials, Inc. | Methods for producing high-density carbon films for hardmasks and other patterning applications |
CN111676452A (zh) * | 2020-06-29 | 2020-09-18 | 哈尔滨奥瑞德光电技术有限公司 | 一种高效镀超硬膜的方法 |
US11664214B2 (en) | 2020-06-29 | 2023-05-30 | Applied Materials, Inc. | Methods for producing high-density, nitrogen-doped carbon films for hardmasks and other patterning applications |
CN111748789B (zh) * | 2020-07-10 | 2022-06-24 | 哈尔滨工业大学 | 一种石墨阴极弧增强辉光放电沉积纯dlc的装置及其方法 |
EP3964356A1 (en) * | 2020-09-03 | 2022-03-09 | Boegli-Gravures SA | A method and system for manufacturing an embossing device by using an etch mask |
JP2024507744A (ja) * | 2021-02-09 | 2024-02-21 | エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト,プフェフィコーン | Picvdコーティングシステムにおけるアークビーム位置監視および位置制御 |
Family Cites Families (182)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US50689A (en) * | 1865-10-31 | Improvement in gaging and ullaging casks | ||
US50681A (en) * | 1865-10-31 | Improvement in photographic lenses | ||
US91154A (en) * | 1869-06-08 | Improvement in attaching- handles to picks | ||
US3287630A (en) * | 1964-03-02 | 1966-11-22 | Varian Associates | Apparatus for improving the uniformity of magnetic fields |
US3458426A (en) * | 1966-05-25 | 1969-07-29 | Fabri Tek Inc | Symmetrical sputtering apparatus with plasma confinement |
DD133688A1 (de) † | 1977-08-04 | 1979-01-17 | Klaus Bewilogua | Verfahren zur herstellung diamanthaltiger schichten hoher haftfestigkeit |
US4276570A (en) * | 1979-05-08 | 1981-06-30 | Nancy Burson | Method and apparatus for producing an image of a person's face at a different age |
EP0057998B1 (en) * | 1981-01-23 | 1984-08-08 | Takeda Chemical Industries, Ltd. | Alicyclic compounds, their production and use |
DE3246361A1 (de) * | 1982-02-27 | 1983-09-08 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Kohlenstoff enthaltende gleitschicht |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
US4602280A (en) * | 1983-12-05 | 1986-07-22 | Maloomian Laurence G | Weight and/or measurement reduction preview system |
US4698256A (en) * | 1984-04-02 | 1987-10-06 | American Cyanamid Company | Articles coated with adherent diamondlike carbon films |
US4877677A (en) * | 1985-02-19 | 1989-10-31 | Matsushita Electric Industrial Co., Ltd. | Wear-protected device |
FR2583250B1 (fr) * | 1985-06-07 | 1989-06-30 | France Etat | Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique |
CH664768A5 (de) * | 1985-06-20 | 1988-03-31 | Balzers Hochvakuum | Verfahren zur beschichtung von substraten in einer vakuumkammer. |
DD243514B1 (de) * | 1985-12-17 | 1989-04-26 | Karl Marx Stadt Tech Hochschul | Hartstoffschichten fuer mechanisch und korrosiv beanspruchte teile |
JPS62188776A (ja) | 1986-01-14 | 1987-08-18 | Sumitomo Electric Ind Ltd | 対向タ−ゲツト式スパツタ装置 |
FR2596775B1 (fr) * | 1986-04-07 | 1992-11-13 | Univ Limoges | Revetement dur multicouches elabore par depot ionique de nitrure de titane, carbonitrure de titane et i-carbone |
JPS63195266A (ja) * | 1987-02-10 | 1988-08-12 | Semiconductor Energy Lab Co Ltd | 炭素膜がコーティングされた時計 |
KR900008505B1 (ko) * | 1987-02-24 | 1990-11-24 | 세미콘덕터 에너지 라보라터리 캄파니 리미티드 | 탄소 석출을 위한 마이크로파 강화 cvd 방법 |
DE3706340A1 (de) * | 1987-02-27 | 1988-09-08 | Winter & Sohn Ernst | Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis |
DE3708716C2 (de) * | 1987-03-18 | 1993-11-04 | Hans Prof Dr Rer Nat Oechsner | Hochfrequenz-ionenquelle |
DE3884653T2 (de) * | 1987-04-03 | 1994-02-03 | Fujitsu Ltd | Verfahren und Vorrichtung zur Gasphasenabscheidung von Diamant. |
US4926791A (en) * | 1987-04-27 | 1990-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Microwave plasma apparatus employing helmholtz coils and ioffe bars |
US5113493A (en) * | 1987-05-11 | 1992-05-12 | Liberty Life Insurance Co. | Full speed animation system for low-speed computers and method |
JPS63286334A (ja) * | 1987-05-19 | 1988-11-24 | Idemitsu Petrochem Co Ltd | 積層体およびその製造法 |
KR920002864B1 (ko) * | 1987-07-20 | 1992-04-06 | 가부시기가이샤 히다찌세이사꾸쇼 | 플라즈마 처리방법 및 그 장치 |
ATE65265T1 (de) * | 1987-08-26 | 1991-08-15 | Balzers Hochvakuum | Verfahren zur aufbringung von schichten auf substraten und vakuumbeschichtungsanlage zur durchfuehrung des verfahrens. |
NL8800345A (nl) * | 1988-02-12 | 1989-09-01 | Philips Nv | Knipeenheid voor een scheerapparaat en scheerapparaat voorzien van deze knipeenheid. |
JP2610469B2 (ja) * | 1988-02-26 | 1997-05-14 | 株式会社 半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜を形成する方法 |
US5411797A (en) * | 1988-04-18 | 1995-05-02 | Board Of Regents, The University Of Texas System | Nanophase diamond films |
ATE115647T1 (de) † | 1988-08-25 | 1994-12-15 | Hauzer Ind Bv | Physikalische dampfniederschlag- doppelbeschichtungsvorrichtung und verfahren. |
US4952273A (en) * | 1988-09-21 | 1990-08-28 | Microscience, Inc. | Plasma generation in electron cyclotron resonance |
US4918031A (en) * | 1988-12-28 | 1990-04-17 | American Telephone And Telegraph Company,At&T Bell Laboratories | Processes depending on plasma generation using a helical resonator |
US4919974A (en) * | 1989-01-12 | 1990-04-24 | Ford Motor Company | Making diamond composite coated cutting tools |
US4992153A (en) | 1989-04-26 | 1991-02-12 | Balzers Aktiengesellschaft | Sputter-CVD process for at least partially coating a workpiece |
US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
CZ278295B6 (en) † | 1989-08-14 | 1993-11-17 | Fyzikalni Ustav Avcr | Process of sputtering layers and apparatus for making the same |
ATE133718T1 (de) † | 1989-08-21 | 1996-02-15 | Balzers Hochvakuum | Beschichtetes werkstück mit einer mischkristallbeschichtung, verfahren zu dessen herstellung, sowie vorrichtung zur durchführung des verfahrens |
GB9006073D0 (en) † | 1990-03-17 | 1990-05-16 | D G Teer Coating Services Limi | Magnetron sputter ion plating |
EP0469204B1 (en) * | 1990-08-03 | 1997-01-15 | Fujitsu Limited | Method for vapour deposition of diamond film |
DE4029270C1 (ko) * | 1990-09-14 | 1992-04-09 | Balzers Ag, Balzers, Li | |
KR930011413B1 (ko) * | 1990-09-25 | 1993-12-06 | 가부시키가이샤 한도오따이 에네루기 겐큐쇼 | 펄스형 전자파를 사용한 플라즈마 cvd 법 |
DE4035131C2 (de) * | 1990-11-05 | 1995-09-21 | Balzers Hochvakuum | Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer |
DE4126852A1 (de) * | 1991-08-14 | 1993-02-18 | Krupp Widia Gmbh | Werkzeug mit verschleissfester diamantschneide, verfahren zu dessen herstellung sowie dessen verwendung |
US6692359B1 (en) * | 1991-02-15 | 2004-02-17 | America Online, Inc. | Method of interfacing on a computer network by visual representations of users, method of interacting and computer network |
JPH07109034B2 (ja) * | 1991-04-08 | 1995-11-22 | ワイケイケイ株式会社 | 硬質多層膜形成体およびその製造方法 |
US5147687A (en) * | 1991-05-22 | 1992-09-15 | Diamonex, Inc. | Hot filament CVD of thick, adherent and coherent polycrystalline diamond films |
DE69232403T2 (de) * | 1991-08-06 | 2002-08-22 | Canon K.K., Tokio/Tokyo | Dreidimensionales Modellverarbeitungsverfahren und -gerät |
US5541003A (en) * | 1991-10-31 | 1996-07-30 | Tdk Corporation | Articles having diamond-like protective thin film |
US5673362A (en) * | 1991-11-12 | 1997-09-30 | Fujitsu Limited | Speech synthesis system in which a plurality of clients and at least one voice synthesizing server are connected to a local area network |
US5989511A (en) * | 1991-11-25 | 1999-11-23 | The University Of Chicago | Smooth diamond films as low friction, long wear surfaces |
US5555426A (en) * | 1992-01-08 | 1996-09-10 | International Business Machines Corporation | Method and apparatus for disseminating messages to unspecified users in a data processing system |
US5416899A (en) * | 1992-01-13 | 1995-05-16 | Massachusetts Institute Of Technology | Memory based method and apparatus for computer graphics |
US5680481A (en) * | 1992-05-26 | 1997-10-21 | Ricoh Corporation | Facial feature extraction method and apparatus for a neural network acoustic and visual speech recognition system |
US5537662A (en) * | 1992-05-29 | 1996-07-16 | Casio Computer Co., Ltd. | Electronic montage composing apparatus |
US5439492A (en) * | 1992-06-11 | 1995-08-08 | General Electric Company | Fine grain diamond workpieces |
US5306408A (en) * | 1992-06-29 | 1994-04-26 | Ism Technologies, Inc. | Method and apparatus for direct ARC plasma deposition of ceramic coatings |
JP3336682B2 (ja) * | 1992-07-02 | 2002-10-21 | 住友電気工業株式会社 | 硬質炭素膜 |
JPH06111287A (ja) * | 1992-09-30 | 1994-04-22 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
US5420801A (en) * | 1992-11-13 | 1995-05-30 | International Business Machines Corporation | System and method for synchronization of multimedia streams |
DE69327774T2 (de) * | 1992-11-18 | 2000-06-21 | Canon Information Systems, Inc. | Prozessor zur Umwandlung von Daten in Sprache und Ablaufsteuerung hierzu |
US5640590A (en) * | 1992-11-18 | 1997-06-17 | Canon Information Systems, Inc. | Method and apparatus for scripting a text-to-speech-based multimedia presentation |
US5637373A (en) * | 1992-11-19 | 1997-06-10 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
US5387178A (en) * | 1992-11-23 | 1995-02-07 | Moses; Gary L. | Multi-stimuli chair |
BE1006711A3 (nl) * | 1992-12-02 | 1994-11-22 | Vito | Werkwijze voor het aanbrengen van een diamantachtige koolstoflaag op staal, ijzer of legeringen daarvan. |
US5638502A (en) * | 1992-12-25 | 1997-06-10 | Casio Computer Co., Ltd. | Device for creating a new object image relating to plural object images |
US5237967A (en) * | 1993-01-08 | 1993-08-24 | Ford Motor Company | Powertrain component with amorphous hydrogenated carbon film |
US5249554A (en) * | 1993-01-08 | 1993-10-05 | Ford Motor Company | Powertrain component with adherent film having a graded composition |
US5431963A (en) * | 1993-02-01 | 1995-07-11 | General Electric Company | Method for adhering diamondlike carbon to a substrate |
US5645900A (en) * | 1993-04-22 | 1997-07-08 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diamond composite films for protective coatings on metals and method of formation |
SE9301596L (sv) * | 1993-05-10 | 1994-05-24 | Televerket | Anordning för att öka talförståelsen vid översätttning av tal från ett första språk till ett andra språk |
US5860064A (en) * | 1993-05-13 | 1999-01-12 | Apple Computer, Inc. | Method and apparatus for automatic generation of vocal emotion in a synthetic text-to-speech system |
US5387288A (en) * | 1993-05-14 | 1995-02-07 | Modular Process Technology Corp. | Apparatus for depositing diamond and refractory materials comprising rotating antenna |
US5626963A (en) * | 1993-07-07 | 1997-05-06 | Sanyo Electric Co., Ltd. | Hard-carbon-film-coated substrate and apparatus for forming the same |
DE4421144C2 (de) * | 1993-07-21 | 2003-02-13 | Unaxis Balzers Ag | Beschichtetes Werkzeug mit erhöhter Standzeit |
WO1995004368A1 (en) † | 1993-07-29 | 1995-02-09 | Institute Of Physics Academy Of Sciences Of The Czech Republic | Method and device for magnetron sputtering |
BE1008229A3 (nl) * | 1993-10-29 | 1996-02-20 | Vito | Werkwijze voor het aanbrengen van een tegen slijtage beschermende laag op een substraat. |
US5347306A (en) * | 1993-12-17 | 1994-09-13 | Mitsubishi Electric Research Laboratories, Inc. | Animated electronic meeting place |
DE4343354C2 (de) * | 1993-12-18 | 2002-11-14 | Bosch Gmbh Robert | Verfahren zur Herstellung einer Hartstoffschicht |
JPH07175710A (ja) * | 1993-12-20 | 1995-07-14 | Canon Inc | データ管理方法及び装置 |
US5657426A (en) * | 1994-06-10 | 1997-08-12 | Digital Equipment Corporation | Method and apparatus for producing audio-visual synthetic speech |
KR0136632B1 (ko) * | 1994-07-26 | 1998-05-15 | 김은영 | 다이아몬드상 경질 카본 필름이 이중 코팅된 vtr 헤드 드럼과 그 코팅층 형성방법 및 장치 |
US5779925A (en) * | 1994-10-14 | 1998-07-14 | Fujitsu Limited | Plasma processing with less damage |
US20030057662A1 (en) * | 1995-03-09 | 2003-03-27 | Miya | Guide bush and method of forming hard carbon film over the inner surface of the guide bush |
DE19513614C1 (de) * | 1995-04-10 | 1996-10-02 | Fraunhofer Ges Forschung | Verfahren zur Abscheidung von Kohlenstoffschichten, Kohlenstoffschichten auf Substraten und deren Verwendung |
US5688557A (en) * | 1995-06-07 | 1997-11-18 | Lemelson; Jerome H. | Method of depositing synthetic diamond coatings with intermediates bonding layers |
US5647834A (en) * | 1995-06-30 | 1997-07-15 | Ron; Samuel | Speech-based biofeedback method and system |
US5745360A (en) * | 1995-08-14 | 1998-04-28 | International Business Machines Corp. | Dynamic hypertext link converter system and process |
US5712000A (en) † | 1995-10-12 | 1998-01-27 | Hughes Aircraft Company | Large-scale, low pressure plasma-ion deposition of diamondlike carbon films |
US5818461A (en) * | 1995-12-01 | 1998-10-06 | Lucas Digital, Ltd. | Method and apparatus for creating lifelike digital representations of computer animated objects |
SE519244C2 (sv) * | 1995-12-06 | 2003-02-04 | Telia Ab | Anordning och metod vid talsyntes |
US5880731A (en) * | 1995-12-14 | 1999-03-09 | Microsoft Corporation | Use of avatars with automatic gesturing and bounded interaction in on-line chat session |
FR2743089B1 (fr) * | 1995-12-28 | 1998-04-17 | Commissariat Energie Atomique | Procede de depot d'un revetement par couplage des techniques de depot physique en phase vapeur et de depot chimique en phase vapeur assiste par plasma, revetement ainsi obtenu et substrat recouvert de ce revetement |
US5781186A (en) * | 1996-02-02 | 1998-07-14 | Lucent Technologies Inc. | Arrangement for specifying presentation of multimedia message components |
US6069622A (en) * | 1996-03-08 | 2000-05-30 | Microsoft Corporation | Method and system for generating comic panels |
DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
JPH09266096A (ja) * | 1996-03-28 | 1997-10-07 | Hitachi Ltd | プラズマ処理装置及びこれを用いたプラズマ処理方法 |
US5923337A (en) * | 1996-04-23 | 1999-07-13 | Image Link Co., Ltd. | Systems and methods for communicating through computer animated images |
JP2947170B2 (ja) * | 1996-05-29 | 1999-09-13 | 日本電気株式会社 | 線対称図形整形装置 |
US6233544B1 (en) * | 1996-06-14 | 2001-05-15 | At&T Corp | Method and apparatus for language translation |
US6075905A (en) * | 1996-07-17 | 2000-06-13 | Sarnoff Corporation | Method and apparatus for mosaic image construction |
JPH1082390A (ja) * | 1996-07-18 | 1998-03-31 | Sanyo Electric Co Ltd | 摺動部材、圧縮機及び回転圧縮機 |
DE19635736C2 (de) † | 1996-09-03 | 2002-03-07 | Saxonia Umformtechnik Gmbh | Diamantähnliche Beschichtung |
EP1067210A3 (en) * | 1996-09-06 | 2002-11-13 | Sanyo Electric Co., Ltd. | Method for providing a hard carbon film on a substrate and electric shaver blade |
US5732232A (en) * | 1996-09-17 | 1998-03-24 | International Business Machines Corp. | Method and apparatus for directing the expression of emotion for a graphical user interface |
US5857099A (en) * | 1996-09-27 | 1999-01-05 | Allvoice Computing Plc | Speech-to-text dictation system with audio message capability |
US6064383A (en) * | 1996-10-04 | 2000-05-16 | Microsoft Corporation | Method and system for selecting an emotional appearance and prosody for a graphical character |
US6343141B1 (en) * | 1996-10-08 | 2002-01-29 | Lucent Technologies Inc. | Skin area detection for video image systems |
JPH10137861A (ja) | 1996-11-05 | 1998-05-26 | Sky Alum Co Ltd | 絞りしごき加工法 |
US5963217A (en) * | 1996-11-18 | 1999-10-05 | 7Thstreet.Com, Inc. | Network conference system using limited bandwidth to generate locally animated displays |
US6122606A (en) * | 1996-12-10 | 2000-09-19 | Johnson; William J. | System and method for enhancing human communications |
CA2278709A1 (en) * | 1997-01-27 | 1998-08-13 | Benjamin Slotznick | System for delivering and displaying primary and secondary information |
US5942317A (en) * | 1997-01-31 | 1999-08-24 | International Business Machines Corporation | Hydrogenated carbon thin films |
DE69803365T2 (de) * | 1997-02-04 | 2002-10-31 | N.V. Bekaert S.A., Zwevegem | Beschichtung enthaltend filme aus diamantartigem kohlenstoff und diamantartigem nanokomposit |
US6078700A (en) * | 1997-03-13 | 2000-06-20 | Sarachik; Karen B. | Method and apparatus for location and inspecting a two-dimensional image including co-linear features |
US6066399A (en) | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
JP3378758B2 (ja) * | 1997-03-19 | 2003-02-17 | 三洋電機株式会社 | 非晶質炭素系被膜の形成方法 |
JPH10259482A (ja) * | 1997-03-19 | 1998-09-29 | Sanyo Electric Co Ltd | 硬質炭素被膜の形成方法 |
JP3609591B2 (ja) * | 1997-09-25 | 2005-01-12 | 三洋電機株式会社 | 硬質炭素薄膜及びその製造方法 |
US5933151A (en) * | 1997-03-26 | 1999-08-03 | Lucent Technologies Inc. | Simulated natural movement of a computer-generated synthesized talking head |
JP3848723B2 (ja) * | 1997-03-31 | 2006-11-22 | 株式会社日立製作所 | 半導体装置の実装構造体及びその検査方法 |
US6175857B1 (en) * | 1997-04-30 | 2001-01-16 | Sony Corporation | Method and apparatus for processing attached e-mail data and storage medium for processing program for attached data |
US6014689A (en) * | 1997-06-03 | 2000-01-11 | Smith Micro Software Inc. | E-mail system with a video e-mail player |
DE19825983C2 (de) * | 1997-06-11 | 2002-12-12 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen von Diamant- und karbidische Phasen enthaltenden Komposit-Gradienten-Schichten |
ES2256948T3 (es) * | 1997-06-16 | 2006-07-16 | Robert Bosch Gmbh | Procedimiento y dispositivo para el recubrimiento en fase de vacio de un sustrato. |
US6215505B1 (en) * | 1997-06-20 | 2001-04-10 | Nippon Telegraph And Telephone Corporation | Scheme for interactive video manipulation and display of moving object on background image |
US6018774A (en) * | 1997-07-03 | 2000-01-25 | Yobaby Productions, Llc | Method and system for creating messages including image information |
JP3224760B2 (ja) * | 1997-07-10 | 2001-11-05 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 音声メールシステム、音声合成装置およびこれらの方法 |
JPH1149506A (ja) * | 1997-07-31 | 1999-02-23 | Kyocera Corp | 装飾部材 |
US6075857A (en) * | 1997-09-11 | 2000-06-13 | Ooltewah Manufacturing, Inc. | Motor cycle helmet headset |
DE19740793C2 (de) * | 1997-09-17 | 2003-03-20 | Bosch Gmbh Robert | Verfahren zur Beschichtung von Oberflächen mittels einer Anlage mit Sputterelektroden und Verwendung des Verfahrens |
JPH1192935A (ja) * | 1997-09-19 | 1999-04-06 | Daido Steel Co Ltd | 耐摩耗性硬質炭素被膜 |
EP1034507A2 (en) * | 1997-12-01 | 2000-09-13 | Arsev H. Eraslan | Three-dimensional face identification system |
US6726993B2 (en) † | 1997-12-02 | 2004-04-27 | Teer Coatings Limited | Carbon coatings, method and apparatus for applying them, and articles bearing such coatings |
US6417853B1 (en) * | 1998-02-05 | 2002-07-09 | Pinnacle Systems, Inc. | Region based moving image editing system and method |
US6466213B2 (en) * | 1998-02-13 | 2002-10-15 | Xerox Corporation | Method and apparatus for creating personal autonomous avatars |
US6433784B1 (en) * | 1998-02-26 | 2002-08-13 | Learn2 Corporation | System and method for automatic animation generation |
US6195631B1 (en) * | 1998-04-15 | 2001-02-27 | At&T Corporation | Method and apparatus for automatic construction of hierarchical transduction models for language translation |
US6690830B1 (en) * | 1998-04-29 | 2004-02-10 | I.Q. Bio Metrix, Inc. | Method and apparatus for encoding/decoding image data |
BE1011927A3 (nl) † | 1998-05-20 | 2000-03-07 | Vito | Plasmamethode voor de afzetting van deklagen. |
US6173250B1 (en) * | 1998-06-03 | 2001-01-09 | At&T Corporation | Apparatus and method for speech-text-transmit communication over data networks |
US6405225B1 (en) * | 1998-06-17 | 2002-06-11 | Microsoft Corporation | Integrating email functionality into a word processor by incorporating an email GUI within the word processor |
JP2000008155A (ja) * | 1998-06-25 | 2000-01-11 | Sumitomo Electric Ind Ltd | 硬質炭素膜被覆部材 |
US6366949B1 (en) * | 1998-07-30 | 2002-04-02 | Maila Nordic Ab | Method and arrangement relating to communication in a network |
US6230111B1 (en) * | 1998-08-06 | 2001-05-08 | Yamaha Hatsudoki Kabushiki Kaisha | Control system for controlling object using pseudo-emotions and pseudo-personality generated in the object |
US6782431B1 (en) * | 1998-09-30 | 2004-08-24 | International Business Machines Corporation | System and method for dynamic selection of database application code execution on the internet with heterogenous clients |
IT1315446B1 (it) * | 1998-10-02 | 2003-02-11 | Cselt Centro Studi Lab Telecom | Procedimento per la creazione di modelli facciali tridimensionali apartire da immagini di volti. |
US6163794A (en) * | 1998-10-23 | 2000-12-19 | General Magic | Network system extensible by users |
US6219638B1 (en) * | 1998-11-03 | 2001-04-17 | International Business Machines Corporation | Telephone messaging and editing system |
JP2000209425A (ja) * | 1998-11-09 | 2000-07-28 | Canon Inc | 画像処理装置及び方法並びに記憶媒体 |
KR100311234B1 (ko) * | 1999-01-18 | 2001-11-02 | 학교법인 인하학원 | 고품위 유도결합 플라즈마 리액터 |
US6385586B1 (en) * | 1999-01-28 | 2002-05-07 | International Business Machines Corporation | Speech recognition text-based language conversion and text-to-speech in a client-server configuration to enable language translation devices |
US6449634B1 (en) * | 1999-01-29 | 2002-09-10 | Digital Impact, Inc. | Method and system for remotely sensing the file formats processed by an E-mail client |
JP3711411B2 (ja) * | 1999-04-19 | 2005-11-02 | 沖電気工業株式会社 | 音声合成装置 |
US6553341B1 (en) * | 1999-04-27 | 2003-04-22 | International Business Machines Corporation | Method and apparatus for announcing receipt of an electronic message |
US6393107B1 (en) * | 1999-05-25 | 2002-05-21 | Lucent Technologies Inc. | Method and apparatus for creating and sending structured voicemail messages |
US7149690B2 (en) * | 1999-09-09 | 2006-12-12 | Lucent Technologies Inc. | Method and apparatus for interactive language instruction |
US6522333B1 (en) * | 1999-10-08 | 2003-02-18 | Electronic Arts Inc. | Remote communication through visual representations |
US6384829B1 (en) * | 1999-11-24 | 2002-05-07 | Fuji Xerox Co., Ltd. | Streamlined architecture for embodied conversational characters with reduced message traffic |
US6680934B1 (en) * | 1999-12-02 | 2004-01-20 | Nortel Networks Limited | System, device and method for expediting control flow in a communication system |
DE19960092A1 (de) * | 1999-12-14 | 2001-07-12 | Bosch Gmbh Robert | Beschichtungsverfahren |
US6377925B1 (en) * | 1999-12-16 | 2002-04-23 | Interactive Solutions, Inc. | Electronic translator for assisting communications |
US6766299B1 (en) * | 1999-12-20 | 2004-07-20 | Thrillionaire Productions, Inc. | Speech-controlled animation system |
US6751620B2 (en) * | 2000-02-14 | 2004-06-15 | Geophoenix, Inc. | Apparatus for viewing information in virtual space using multiple templates |
US6593539B1 (en) * | 2000-02-25 | 2003-07-15 | George Miley | Apparatus and methods for controlling charged particles |
US6539354B1 (en) * | 2000-03-24 | 2003-03-25 | Fluent Speech Technologies, Inc. | Methods and devices for producing and using synthetic visual speech based on natural coarticulation |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
AU2001255787A1 (en) * | 2000-05-01 | 2001-11-12 | Lifef/X Networks, Inc. | Virtual representatives for use as communications tools |
US6784901B1 (en) * | 2000-05-09 | 2004-08-31 | There | Method, system and computer program product for the delivery of a chat message in a 3D multi-user environment |
US6545682B1 (en) * | 2000-05-24 | 2003-04-08 | There, Inc. | Method and apparatus for creating and customizing avatars using genetic paradigm |
US6453294B1 (en) * | 2000-05-31 | 2002-09-17 | International Business Machines Corporation | Dynamic destination-determined multimedia avatars for interactive on-line communications |
TW517210B (en) * | 2000-08-31 | 2003-01-11 | Bextech Inc | A method for generating speaking expression variation without distortion in 2D picture using polygon computation |
US6990452B1 (en) * | 2000-11-03 | 2006-01-24 | At&T Corp. | Method for sending multi-media messages using emoticons |
US7203648B1 (en) * | 2000-11-03 | 2007-04-10 | At&T Corp. | Method for sending multi-media messages with customized audio |
US7091976B1 (en) * | 2000-11-03 | 2006-08-15 | At&T Corp. | System and method of customizing animated entities for use in a multi-media communication application |
US7035803B1 (en) * | 2000-11-03 | 2006-04-25 | At&T Corp. | Method for sending multi-media messages using customizable background images |
US6976082B1 (en) * | 2000-11-03 | 2005-12-13 | At&T Corp. | System and method for receiving multi-media messages |
US7085259B2 (en) * | 2001-07-31 | 2006-08-01 | Comverse, Inc. | Animated audio messaging |
US20030046348A1 (en) * | 2001-08-29 | 2003-03-06 | Pinto Albert Gregory | System and method of converting video to bitmap animation for use in electronic mail |
US20030046160A1 (en) * | 2001-09-06 | 2003-03-06 | Paz-Pujalt Gustavo R. | Animated electronic message and method of producing |
US6919892B1 (en) * | 2002-08-14 | 2005-07-19 | Avaworks, Incorporated | Photo realistic talking head creation system and method |
-
2000
- 2000-04-12 DE DE10018143A patent/DE10018143C5/de not_active Expired - Lifetime
- 2000-04-18 US US09/551,883 patent/US6740393B1/en not_active Expired - Lifetime
- 2000-12-27 KR KR1020027013744A patent/KR100762346B1/ko active IP Right Grant
- 2000-12-27 US US10/257,678 patent/US7160616B2/en not_active Expired - Lifetime
- 2000-12-27 BR BR0017216-2A patent/BR0017216A/pt not_active IP Right Cessation
- 2000-12-27 ES ES00993868T patent/ES2252092T3/es not_active Expired - Lifetime
- 2000-12-27 EP EP03014612.0A patent/EP1362931B2/de not_active Expired - Lifetime
- 2000-12-27 AT AT03014612T patent/ATE299956T1/de active
- 2000-12-27 AU AU28440/01A patent/AU2844001A/en not_active Abandoned
- 2000-12-27 ES ES03014612T patent/ES2244870T3/es not_active Expired - Lifetime
- 2000-12-27 WO PCT/EP2000/013299 patent/WO2001079585A1/de active IP Right Grant
- 2000-12-27 PT PT03014612T patent/PT1362931E/pt unknown
- 2000-12-27 JP JP2001576965A patent/JP4849759B2/ja not_active Expired - Lifetime
- 2000-12-27 AT AT00993868T patent/ATE311483T1/de active
- 2000-12-27 DE DE50011775T patent/DE50011775D1/de not_active Expired - Lifetime
- 2000-12-27 DE DE50010785T patent/DE50010785D1/de not_active Expired - Lifetime
- 2000-12-27 EP EP00993868A patent/EP1272683B1/de not_active Expired - Lifetime
-
2003
- 2003-04-14 HK HK03102687A patent/HK1050553A1/xx not_active IP Right Cessation
-
2004
- 2004-02-05 US US10/771,331 patent/US20040219294A1/en not_active Abandoned
-
2008
- 2008-01-11 US US12/013,003 patent/US7601405B2/en not_active Expired - Fee Related
-
2009
- 2009-08-19 US US12/543,869 patent/US20100018464A1/en not_active Abandoned
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101499272B1 (ko) * | 2007-05-25 | 2015-03-05 | 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 | 진공 처리 장치 및 진공 처리 방법 |
KR100897323B1 (ko) * | 2007-05-30 | 2009-05-14 | 한국생산기술연구원 | 플라즈마 화학기상증착과 물리기상증착을 복합한 박막 코팅방법 |
KR20130121078A (ko) * | 2010-06-22 | 2013-11-05 | 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 | 지정된 전기장을 갖는 아크 증착 소스 |
KR101854936B1 (ko) * | 2010-06-22 | 2018-06-14 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 지정된 전기장을 갖는 아크 증착 소스 |
RU2763357C1 (ru) * | 2021-04-13 | 2021-12-28 | Александр Васильевич Вахрушев | Способ получения высококачественных пленок методом механической вибрации подложки |
Also Published As
Publication number | Publication date |
---|---|
EP1362931A1 (de) | 2003-11-19 |
DE10018143C5 (de) | 2012-09-06 |
ES2244870T3 (es) | 2005-12-16 |
KR100762346B1 (ko) | 2007-10-02 |
EP1362931B9 (de) | 2005-10-05 |
EP1362931B1 (de) | 2005-07-20 |
US20040219294A1 (en) | 2004-11-04 |
AU2844001A (en) | 2001-10-30 |
US20100018464A1 (en) | 2010-01-28 |
BR0017216A (pt) | 2003-06-10 |
EP1272683A1 (de) | 2003-01-08 |
HK1050553A1 (en) | 2003-06-27 |
ES2252092T3 (es) | 2006-05-16 |
DE10018143A1 (de) | 2001-10-25 |
WO2001079585A1 (de) | 2001-10-25 |
US20040038033A1 (en) | 2004-02-26 |
ATE299956T1 (de) | 2005-08-15 |
DE50010785D1 (de) | 2005-08-25 |
DE10018143B4 (de) | 2006-05-04 |
EP1272683B1 (de) | 2005-11-30 |
DE50011775D1 (de) | 2006-01-05 |
US20080311310A1 (en) | 2008-12-18 |
PT1362931E (pt) | 2005-09-30 |
ATE311483T1 (de) | 2005-12-15 |
US7160616B2 (en) | 2007-01-09 |
EP1362931B2 (de) | 2019-08-21 |
US6740393B1 (en) | 2004-05-25 |
JP4849759B2 (ja) | 2012-01-11 |
JP2004501793A (ja) | 2004-01-22 |
US7601405B2 (en) | 2009-10-13 |
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