KR102174783B1 - 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막 - Google Patents

수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막 Download PDF

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KR102174783B1
KR102174783B1 KR1020187018655A KR20187018655A KR102174783B1 KR 102174783 B1 KR102174783 B1 KR 102174783B1 KR 1020187018655 A KR1020187018655 A KR 1020187018655A KR 20187018655 A KR20187018655 A KR 20187018655A KR 102174783 B1 KR102174783 B1 KR 102174783B1
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photosensitive
resin composition
photosensitive layer
forming
film pattern
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KR20180077336A (ko
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야스하루 무라카미
히로시 야마자키
요시미 이가라시
나오키 사사하라
이쿠오 무카이
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쇼와덴코머티리얼즈가부시끼가이샤
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    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10S430/1055—Radiation sensitive composition or product or process of making
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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Human Computer Interaction (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Position Input By Displaying (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
  • Inorganic Chemistry (AREA)
KR1020187018655A 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막 Active KR102174783B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2011/078104 2011-12-05
PCT/JP2011/078104 WO2013084282A1 (ja) 2011-12-05 2011-12-05 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
PCT/JP2012/081383 WO2013084886A1 (ja) 2011-12-05 2012-12-04 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜

Related Parent Applications (1)

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KR1020147016026A Division KR20140101783A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막

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KR20180077336A KR20180077336A (ko) 2018-07-06
KR102174783B1 true KR102174783B1 (ko) 2020-11-05

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KR1020187018655A Active KR102174783B1 (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막
KR1020177024713A Ceased KR20170104644A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막
KR1020147016026A Ceased KR20140101783A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막
KR1020147016029A Ceased KR20140097356A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막

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KR1020177024713A Ceased KR20170104644A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막
KR1020147016026A Ceased KR20140101783A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막
KR1020147016029A Ceased KR20140097356A (ko) 2011-12-05 2012-12-04 수지 경화막 패턴의 형성 방법, 감광성 수지 조성물, 감광성 엘리먼트, 터치패널의 제조 방법 및 수지 경화막

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US (4) US9348223B2 (enExample)
JP (6) JP5304968B1 (enExample)
KR (4) KR102174783B1 (enExample)
CN (4) CN107256105A (enExample)
TW (3) TWI550349B (enExample)
WO (3) WO2013084282A1 (enExample)

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WO2013084283A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
JP2015141429A (ja) * 2014-01-27 2015-08-03 信越ポリマー株式会社 透明電極静電容量センサ及びその製造方法
JP6361191B2 (ja) * 2014-03-14 2018-07-25 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びタッチパネルの製造方法
US10901125B2 (en) 2014-05-23 2021-01-26 Eyesafe, Llc Light emission reducing compounds for electronic devices
KR102582577B1 (ko) * 2014-05-23 2023-09-25 가부시끼가이샤 레조낙 레지스트 패턴의 형성 방법, 프린트 배선판의 제조 방법, 투영 노광용 감광성 수지 조성물 및 감광성 엘리먼트
US10642087B2 (en) 2014-05-23 2020-05-05 Eyesafe, Llc Light emission reducing compounds for electronic devices
JP2016021170A (ja) * 2014-07-15 2016-02-04 日立化成株式会社 静電容量結合方式タッチパネル入力装置付き表示装置
KR101650796B1 (ko) 2014-07-30 2016-08-25 현대자동차주식회사 조절 노브 장치
JP6284913B2 (ja) 2014-08-29 2018-02-28 富士フイルム株式会社 タッチパネル電極保護膜形成用組成物、転写フィルム、積層体、タッチパネル用電極の保護膜及びその形成方法、静電容量型入力装置、並びに、画像表示装置
JP6318260B2 (ja) 2014-09-24 2018-04-25 旭化成株式会社 感光性樹脂積層体、樹脂パターンの製造方法、硬化膜の製造方法及び表示装置の製造方法
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