JP5646478B2 - 積層体およびその製造方法 - Google Patents
積層体およびその製造方法 Download PDFInfo
- Publication number
- JP5646478B2 JP5646478B2 JP2011522711A JP2011522711A JP5646478B2 JP 5646478 B2 JP5646478 B2 JP 5646478B2 JP 2011522711 A JP2011522711 A JP 2011522711A JP 2011522711 A JP2011522711 A JP 2011522711A JP 5646478 B2 JP5646478 B2 JP 5646478B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- silicon
- polysilazane
- gas
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/16—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Wrappers (AREA)
- Electroluminescent Light Sources (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011522711A JP5646478B2 (ja) | 2009-07-17 | 2010-07-12 | 積層体およびその製造方法 |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009169014 | 2009-07-17 | ||
| JP2009169014 | 2009-07-17 | ||
| JP2009207775 | 2009-09-09 | ||
| JP2009207775 | 2009-09-09 | ||
| PCT/JP2010/004510 WO2011007543A1 (ja) | 2009-07-17 | 2010-07-12 | 積層体およびその製造方法 |
| JP2011522711A JP5646478B2 (ja) | 2009-07-17 | 2010-07-12 | 積層体およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2011007543A1 JPWO2011007543A1 (ja) | 2012-12-20 |
| JP5646478B2 true JP5646478B2 (ja) | 2014-12-24 |
Family
ID=43449153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011522711A Active JP5646478B2 (ja) | 2009-07-17 | 2010-07-12 | 積層体およびその製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20120107607A1 (enExample) |
| EP (1) | EP2455220B1 (enExample) |
| JP (1) | JP5646478B2 (enExample) |
| KR (1) | KR101687049B1 (enExample) |
| CN (1) | CN102470637B (enExample) |
| IN (1) | IN2012DN00642A (enExample) |
| MY (1) | MY158201A (enExample) |
| TW (1) | TWI499505B (enExample) |
| WO (1) | WO2011007543A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10535838B2 (en) | 2016-03-31 | 2020-01-14 | Sumitomo Chemical Company, Limited | Laminated film and process for manufacturing the same |
| US11038145B2 (en) | 2016-03-31 | 2021-06-15 | Sumitomo Chemical Company, Limited | Laminated film and process for manufacturing the same, as well as method for analyzing laminated film |
| US11283043B2 (en) | 2016-03-31 | 2022-03-22 | Sumitomo Chemical Company, Limited | Laminated film and process for manufacturing the same |
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| JP2012004349A (ja) | 2010-06-17 | 2012-01-05 | Az Electronic Materials Kk | シリコンオキシナイトライド膜の形成方法およびそれにより製造されたシリコンオキシナイトライド膜付き基板 |
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| JP5531892B2 (ja) * | 2010-10-04 | 2014-06-25 | コニカミノルタ株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法、及び該ガスバリア性フィルムを有する有機電子デバイス |
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| JP5803937B2 (ja) * | 2010-12-06 | 2015-11-04 | コニカミノルタ株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス |
| EP2660042B1 (en) * | 2010-12-27 | 2015-04-29 | Konica Minolta, Inc. | Method for manufacturing gas-barrier film, gas-barrier film, and electronic device |
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| WO2012160624A1 (ja) * | 2011-05-20 | 2012-11-29 | パイオニア株式会社 | 絶縁膜形成方法 |
| US9312155B2 (en) | 2011-06-06 | 2016-04-12 | Asm Japan K.K. | High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules |
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- 2010-07-12 JP JP2011522711A patent/JP5646478B2/ja active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| IN2012DN00642A (enExample) | 2015-08-21 |
| US20120107607A1 (en) | 2012-05-03 |
| CN102470637B (zh) | 2016-04-06 |
| EP2455220B1 (en) | 2015-11-25 |
| JPWO2011007543A1 (ja) | 2012-12-20 |
| EP2455220A1 (en) | 2012-05-23 |
| CN102470637A (zh) | 2012-05-23 |
| EP2455220A4 (en) | 2012-12-26 |
| TW201113152A (en) | 2011-04-16 |
| KR20120031228A (ko) | 2012-03-30 |
| MY158201A (en) | 2016-09-15 |
| TWI499505B (zh) | 2015-09-11 |
| KR101687049B1 (ko) | 2016-12-15 |
| WO2011007543A1 (ja) | 2011-01-20 |
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