JP2005503484A5 - - Google Patents

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JP2005503484A5
JP2005503484A5 JP2003530012A JP2003530012A JP2005503484A5 JP 2005503484 A5 JP2005503484 A5 JP 2005503484A5 JP 2003530012 A JP2003530012 A JP 2003530012A JP 2003530012 A JP2003530012 A JP 2003530012A JP 2005503484 A5 JP2005503484 A5 JP 2005503484A5
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reactant
metal
substrate
reaction
halide
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JP2003530012A
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JP2005503484A (ja
JP4938962B2 (ja
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Priority claimed from PCT/US2002/029032 external-priority patent/WO2003025243A2/fr
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JP2003530012A 2001-09-14 2002-09-10 ゲッタリング反応物を用いるａｌｄによる金属窒化物堆積 Expired - Lifetime JP4938962B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32238501P 2001-09-14 2001-09-14
US60/322,385 2001-09-14
PCT/US2002/029032 WO2003025243A2 (fr) 2001-09-14 2002-09-10 Depot de nitrure metallique par depot par couche atomique (ald) avec impulsion de reduction

Publications (3)

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JP2005503484A JP2005503484A (ja) 2005-02-03
JP2005503484A5 true JP2005503484A5 (fr) 2006-01-12
JP4938962B2 JP4938962B2 (ja) 2012-05-23

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JP2003530012A Expired - Lifetime JP4938962B2 (ja) 2001-09-14 2002-09-10 ゲッタリング反応物を用いるａｌｄによる金属窒化物堆積

Country Status (7)

Country Link
US (2) US6986914B2 (fr)
EP (1) EP1425435A2 (fr)
JP (1) JP4938962B2 (fr)
KR (1) KR101013231B1 (fr)
AU (1) AU2002333601A1 (fr)
TW (1) TW559890B (fr)
WO (1) WO2003025243A2 (fr)

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