EP1081818A3 - Halbleiterlaser-Vorrichtungen - Google Patents

Halbleiterlaser-Vorrichtungen Download PDF

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Publication number
EP1081818A3
EP1081818A3 EP00122472A EP00122472A EP1081818A3 EP 1081818 A3 EP1081818 A3 EP 1081818A3 EP 00122472 A EP00122472 A EP 00122472A EP 00122472 A EP00122472 A EP 00122472A EP 1081818 A3 EP1081818 A3 EP 1081818A3
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EP
European Patent Office
Prior art keywords
semiconductor material
semiconductor laser
laser devices
substrate
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP00122472A
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English (en)
French (fr)
Other versions
EP1081818B1 (de
EP1081818A2 (de
Inventor
Toshiaki Tanaka
Shigeru Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
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Hitachi Ltd
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Publication of EP1081818A2 publication Critical patent/EP1081818A2/de
Publication of EP1081818A3 publication Critical patent/EP1081818A3/de
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Publication of EP1081818B1 publication Critical patent/EP1081818B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/025Physical imperfections, e.g. particular concentration or distribution of impurities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
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    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02378Silicon carbide
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    • H01L21/02381Silicon, silicon germanium, germanium
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    • H01L33/16Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
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    • H01S5/227Buried mesa structure ; Striped active layer
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    • H01S5/2054Methods of obtaining the confinement
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    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
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    • H01S5/32341Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
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    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity

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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
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  • Geometry (AREA)
  • Electromagnetism (AREA)
  • Semiconductor Lasers (AREA)
  • Recrystallisation Techniques (AREA)
EP00122472A 1995-09-18 1996-09-17 Halbleiterlaser-Vorrichtungen Expired - Lifetime EP1081818B1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP23814295 1995-09-18
JP23814295 1995-09-18
JP23165896 1996-09-02
JP23165896 1996-09-02
EP96930428A EP0852416B1 (de) 1995-09-18 1996-09-17 Halbleitermaterial, verfahren zur herstellung des halbleitermaterials und eine halbleitervorrichtung

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP96930428.6 Division 1997-03-27

Publications (3)

Publication Number Publication Date
EP1081818A2 EP1081818A2 (de) 2001-03-07
EP1081818A3 true EP1081818A3 (de) 2001-08-08
EP1081818B1 EP1081818B1 (de) 2004-08-18

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Application Number Title Priority Date Filing Date
EP00122472A Expired - Lifetime EP1081818B1 (de) 1995-09-18 1996-09-17 Halbleiterlaser-Vorrichtungen
EP96930428A Expired - Lifetime EP0852416B1 (de) 1995-09-18 1996-09-17 Halbleitermaterial, verfahren zur herstellung des halbleitermaterials und eine halbleitervorrichtung

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Application Number Title Priority Date Filing Date
EP96930428A Expired - Lifetime EP0852416B1 (de) 1995-09-18 1996-09-17 Halbleitermaterial, verfahren zur herstellung des halbleitermaterials und eine halbleitervorrichtung

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US (2) US6377596B1 (de)
EP (2) EP1081818B1 (de)
JP (1) JP3830051B2 (de)
AU (1) AU6946196A (de)
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JP3830051B2 (ja) 2006-10-04
EP1081818B1 (de) 2004-08-18
DE69633203T2 (de) 2005-09-01
US6459712B2 (en) 2002-10-01
US6377596B1 (en) 2002-04-23
AU6946196A (en) 1997-04-09
DE69622277D1 (de) 2002-08-14
DE69622277T2 (de) 2003-03-27
EP0852416A4 (de) 1999-04-07
EP0852416A1 (de) 1998-07-08
EP1081818A2 (de) 2001-03-07
DE69633203D1 (de) 2004-09-23
WO1997011518A1 (en) 1997-03-27
US20010038655A1 (en) 2001-11-08

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