CN105073909B - 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物 - Google Patents

包含具有紫外线吸收基团的低聚物的含氟聚合物组合物 Download PDF

Info

Publication number
CN105073909B
CN105073909B CN201380067092.9A CN201380067092A CN105073909B CN 105073909 B CN105073909 B CN 105073909B CN 201380067092 A CN201380067092 A CN 201380067092A CN 105073909 B CN105073909 B CN 105073909B
Authority
CN
China
Prior art keywords
composition
group
oligomer
carbon atoms
divalent unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380067092.9A
Other languages
English (en)
Chinese (zh)
Other versions
CN105073909A (zh
Inventor
戴维·B·奥尔森
帕特丽夏·M·萨武
蒂莫西·J·埃布林克
黛安娜·诺思
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN105073909A publication Critical patent/CN105073909A/zh
Application granted granted Critical
Publication of CN105073909B publication Critical patent/CN105073909B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16Homopolymers or copolymers of esters containing halogen atoms
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/80Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • B29C48/08Flat, e.g. panels flexible, e.g. films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2027/00Use of polyvinylhalogenides or derivatives thereof as moulding material
    • B29K2027/12Use of polyvinylhalogenides or derivatives thereof as moulding material containing fluorine
    • B29K2027/16PVDF, i.e. polyvinylidene fluoride
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/14Methyl esters, e.g. methyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2327/16Homopolymers or copolymers of vinylidene fluoride
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2433/12Homopolymers or copolymers of methyl methacrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08J2433/16Homopolymers or copolymers of esters containing halogen atoms
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photovoltaic Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
CN201380067092.9A 2012-12-20 2013-12-20 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物 Active CN105073909B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261740135P 2012-12-20 2012-12-20
US61/740,135 2012-12-20
PCT/US2013/076914 WO2014100580A1 (en) 2012-12-20 2013-12-20 Fluoropolymer composition including an oligomer having an ultraviolet absorbing group

Publications (2)

Publication Number Publication Date
CN105073909A CN105073909A (zh) 2015-11-18
CN105073909B true CN105073909B (zh) 2019-05-21

Family

ID=49943581

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380067092.9A Active CN105073909B (zh) 2012-12-20 2013-12-20 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物

Country Status (8)

Country Link
US (1) US10577467B2 (enExample)
EP (1) EP2935472B1 (enExample)
JP (2) JP6632378B2 (enExample)
KR (1) KR102194159B1 (enExample)
CN (1) CN105073909B (enExample)
SG (1) SG11201504889VA (enExample)
TW (1) TWI624519B (enExample)
WO (1) WO2014100580A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014100551A1 (en) * 2012-12-20 2014-06-26 3M Innovative Properties Company Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them
WO2015200655A1 (en) 2014-06-25 2015-12-30 3M Innovative Properties Company Fluoropolymer composition including at least one oligomer
JP6224277B2 (ja) * 2014-06-25 2017-11-01 スリーエム イノベイティブ プロパティズ カンパニー 紫外線吸収オリゴマーを含む感圧性接着剤組成物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
KR101947421B1 (ko) * 2014-10-20 2019-02-14 (주)엘지하우시스 표면코팅용 수성 조성물 및 이를 적용한 자동차용 시트
US10519350B2 (en) * 2015-06-25 2019-12-31 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
JP6949048B2 (ja) 2016-04-01 2021-10-13 スリーエム イノベイティブ プロパティズ カンパニー 多層フルオロポリマーフィルム
TWI656199B (zh) * 2016-06-29 2019-04-11 臺灣永光化學工業股份有限公司 聚氨酯型高分子紫外線吸收劑
EP3290451B1 (fr) * 2016-09-01 2021-08-18 The Swatch Group Research and Development Ltd. Substrat comprenant une surface recouverte d'un agent épilame et procédé d'épilamage d'un tel substrat
JP7282032B2 (ja) 2016-12-09 2023-05-26 スリーエム イノベイティブ プロパティズ カンパニー 多層フィルムを含む物品
CN110049871B (zh) 2016-12-09 2021-05-14 3M创新有限公司 聚合物多层膜
CN110049870B (zh) 2016-12-09 2021-07-16 3M创新有限公司 聚合物多层膜
US10953574B2 (en) 2016-12-09 2021-03-23 3M Innovative Properties Company Polymeric multilayer film
EP3551457A1 (en) 2016-12-09 2019-10-16 3M Innovative Properties Company Polymeric multilayer film
CN108531063B (zh) * 2018-04-12 2020-07-28 太仓中化环保化工有限公司 一种阴极电泳涂料及其制备方法和应用
US20220315807A1 (en) 2019-09-09 2022-10-06 3M Innovative Properties Company Coextruded polymeric adhesive article
CN114058142B (zh) * 2020-08-04 2023-05-12 浙江省化工研究院有限公司 一种透明含氟聚合物薄膜
WO2022039120A1 (ja) 2020-08-21 2022-02-24 富士フイルム株式会社 重合性組成物、重合体、紫外線遮蔽材料、積層体、化合物、紫外線吸収剤及び化合物の製造方法
KR20230112104A (ko) * 2020-11-25 2023-07-26 에이지씨 가부시키가이샤 테트라플루오로에틸렌계 폴리머의 조성물, 적층체 및 필름

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1291214A (zh) * 1998-04-03 2001-04-11 美国3M公司 含有含氟聚合物和酰胺官能紫外光吸收剂的组合物
JP2001123107A (ja) * 1999-10-25 2001-05-08 Honny Chem Ind Co Ltd 電着塗料用水溶性樹脂組成物およびこれを用いて構成した電着塗料ならびにこれにより形成された電着塗膜
CN1217421C (zh) * 1999-06-30 2005-08-31 佳能株式会社 太阳能电池组件
CN101107280A (zh) * 2004-12-29 2008-01-16 3M创新有限公司 包含感光氟化物的组合物及其用途
WO2011081847A1 (en) * 2009-12-30 2011-07-07 Maven Technologies, Llc. Biological testing with a substrate having a bottom surface including sawtooth - shaped prisms
CN102811857A (zh) * 2010-03-12 2012-12-05 美国圣戈班性能塑料公司 用于光电应用的多层膜

Family Cites Families (144)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT610737A (enExample) 1955-11-18 1900-01-01
US2803615A (en) 1956-01-23 1957-08-20 Minnesota Mining & Mfg Fluorocarbon acrylate and methacrylate esters and polymers
CH485484A (de) 1964-12-04 1970-02-15 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviollettstrahlung für organische Materialien ausserhalb der Textilindustrie
US3553179A (en) 1968-05-06 1971-01-05 Du Pont Acrylate-type esters of perfluoropoly-oxa-alkaneamidoalkyl alcohols and their polymers
GB1407670A (en) 1973-06-29 1975-09-24 Oreal Anti-sunburn polymers
JPS5176345A (ja) 1974-12-27 1976-07-01 Kureha Chemical Ind Co Ltd Horifutsukabiniridennoshinkinasoseibutsu
US4329384A (en) 1980-02-14 1982-05-11 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine
US4330590A (en) 1980-02-14 1982-05-18 Minnesota Mining And Manufacturing Company Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine
JPS56163140A (en) 1980-05-21 1981-12-15 Kureha Chem Ind Co Ltd Vinylidene fluoride resin composition
US4379201A (en) 1981-03-30 1983-04-05 Minnesota Mining And Manufacturing Company Multiacrylate cross-linking agents in pressure-sensitive photoadhesives
US4508882A (en) 1981-08-24 1985-04-02 Asahi Glass Company Ltd. Benzotriazole compound and homopolymer or copolymers thereof
CS231209B1 (sk) 1981-11-25 1984-10-15 Andrej Romanov Polypropylénová zmes vhodná pre výrobu vláken alebo fólii
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5125138A (en) 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5097800A (en) 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5018048A (en) 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US4722515A (en) 1984-11-06 1988-02-02 Spectrum Control, Inc. Atomizing device for vaporization
EP0242460A1 (en) 1985-01-18 1987-10-28 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Monomer atomizer for vaporization
US5084537A (en) 1985-01-29 1992-01-28 Bausch & Lomb, Incorporated UV-absorbing extended-wear Lenses
US4737559A (en) 1986-05-19 1988-04-12 Minnesota Mining And Manufacturing Co. Pressure-sensitive adhesive crosslinked by copolymerizable aromatic ketone monomers
US4954371A (en) 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4804717A (en) 1987-05-28 1989-02-14 Ferro Corporation Polymeric hindered amine light stabilizers
US5157091A (en) * 1987-10-07 1992-10-20 Murahara Masataka Ultraviolet-absorbing polymer material and photoetching process
DE3914374A1 (de) 1989-04-29 1990-10-31 Basf Ag Durch ultraviolette strahlung unter luftsauerstoffatmosphaere vernetzbare copolymerisate
US5254608A (en) 1989-10-19 1993-10-19 E. I. Du Pont De Nemours And Company Ultraviolet screener blends
US5198498A (en) 1990-02-06 1993-03-30 Ciba-Geigy Corporation Light-stabilized binders for coating compositions
CA2034274A1 (en) 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5324834A (en) 1990-06-13 1994-06-28 Ciba-Geigy Corporation Piperidine-triazine co-oligomers for use as stabilizers for organic materials
JP3133078B2 (ja) 1990-12-18 2001-02-05 旭化成工業株式会社 含フッ素樹脂及びこれを主成分とするフッ素系塗料
JP3137351B2 (ja) 1991-04-10 2001-02-19 旭硝子株式会社 フッ素樹脂組成物、および該組成物を成形した成形体
US5286781A (en) 1991-04-18 1994-02-15 Sekisui Chemical Co., Ltd. Pressure sensitive adhesive composition and pressure sensitive adhesive tape or sheet making use of the same
DE59203814D1 (de) 1991-07-29 1995-11-02 Ciba Geigy Ag Lichtstabilisierte Copolymer-Zusammensetzungen als Bindemittel für Lacke.
JPH07507152A (ja) 1992-02-25 1995-08-03 ミネソタ マイニング アンド マニュファクチャリング カンパニー 全ポリマー紫外線反射フィルム
JPH06299132A (ja) 1993-04-20 1994-10-25 Otsuka Chem Co Ltd 粘着剤組成物
JPH073242A (ja) 1993-06-18 1995-01-06 Asahi Glass Co Ltd 含フッ素紫外線吸収剤、およびその用途
JP2825736B2 (ja) 1993-07-30 1998-11-18 京セラ株式会社 誘電体磁器組成物および半導体素子収容用パッケージ
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
ATE233939T1 (de) 1993-10-04 2003-03-15 3M Innovative Properties Co Vernetztes acrylatbeschichtungsmaterial zur herstellung von kondensatordielektrika und sauerstoffbarrieren
JP3730266B2 (ja) 1994-05-19 2005-12-21 一方社油脂工業株式会社 遮光フィルム
US5672704A (en) 1994-10-04 1997-09-30 Ciba-Geigy Corporation 2-Hydroxyphenyl-s-Triazines substituted with ethylenically unsaturated moieties
US6083628A (en) 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
JP3404160B2 (ja) 1995-01-06 2003-05-06 旭電化工業株式会社 メタクリル系ラッカー組成物
FR2731943B1 (fr) 1995-03-24 1997-07-18 Atochem Elf Sa Materiau complexe a proprietes ameliorees constitue de polyfluorure de vinylidene et d'un thermoplastique non compatible
JPH0952916A (ja) 1995-08-11 1997-02-25 Asahi Denka Kogyo Kk 紫外線吸収性組成物
JPH0959560A (ja) 1995-08-17 1997-03-04 Asahi Glass Co Ltd 水性塗料用組成物
US5637646A (en) 1995-12-14 1997-06-10 Minnesota Mining And Manufacturing Company Bulk radical polymerization using a batch reactor
JPH09239921A (ja) 1996-03-13 1997-09-16 Toray Ind Inc 積層フイルム
JP3638727B2 (ja) 1996-06-05 2005-04-13 株式会社日本触媒 熱可塑性樹脂組成物およびそのフィルム
JPH107998A (ja) 1996-06-26 1998-01-13 Sekisui Chem Co Ltd 装飾用粘着シート
JPH10168408A (ja) 1996-12-13 1998-06-23 Oji Paper Co Ltd 粘着テープまたはシート
US5807635A (en) 1997-01-24 1998-09-15 Union Carbide Chemicals & Plastics Technology Corporation Telephone cables
DE19807209A1 (de) 1997-02-20 1998-08-27 Mitsubishi Paper Mills Ltd Träger für Abbildungsmaterial
JP3988201B2 (ja) 1997-04-02 2007-10-10 旭硝子株式会社 紫外線硬化型被覆剤組成物およびその用途
IT1290462B1 (it) 1997-04-08 1998-12-03 Ausimont Spa Polimeri idrogenati modificati
US6008302A (en) 1997-04-29 1999-12-28 3M Innovative Properties Company Polyolefin bound ultraviolet light absorbers
JP3035774B2 (ja) * 1997-11-18 2000-04-24 敏二 木下 空気調節2サイクルエンジン
US6045864A (en) 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
JPH11317475A (ja) 1998-02-27 1999-11-16 Canon Inc 半導体用封止材樹脂および半導体素子
JP4895413B2 (ja) 1998-04-06 2012-03-14 新日本製鐵株式会社 耐候性及び耐汚染性に優れたプレコート塗装鋼板用塗料とプレコート塗装鋼板及びその製造方法とその用途
JPH11293181A (ja) 1998-04-06 1999-10-26 Nippon Steel Corp 耐候性に優れたプレコート塗装鋼板用塗料及びプレコート塗装鋼板とその用途
JP3920460B2 (ja) 1998-06-10 2007-05-30 株式会社日本触媒 紫外線吸収性複合フィルム
JP2000123621A (ja) 1998-10-13 2000-04-28 Otsuka Chem Co Ltd 蛍光灯被覆材
WO2000026973A1 (en) 1998-11-02 2000-05-11 Presstek, Inc. Transparent conductive oxides for plastic flat panel displays
JP2000154497A (ja) 1998-11-13 2000-06-06 Nicca Chemical Co Ltd インクジェット記録用紙用耐水性向上剤及びインクジェット記録用紙
EP1094094A4 (en) * 1999-04-12 2002-07-24 Asahi Denka Kogyo Kk POLYMERIC COMPOSITION
JP2001001478A (ja) 1999-06-22 2001-01-09 Nakae Bussan Kk ポリカーボネート又はポリエチレンテレフタレートの成形物
JP2001019895A (ja) 1999-07-05 2001-01-23 Nakae Bussan Kk フッ素樹脂含有コーティング用組成物
JP4220620B2 (ja) 1999-07-09 2009-02-04 株式会社日本触媒 高耐光性ポリウレタン繊維および該繊維の製造方法
US6251521B1 (en) 1999-08-09 2001-06-26 3M Innovative Properties Company Polymeric compositions
JP4855616B2 (ja) 1999-10-27 2012-01-18 スリーエム イノベイティブ プロパティズ カンパニー フルオロケミカルスルホンアミド界面活性剤
US6352778B1 (en) 1999-12-20 2002-03-05 General Electric Company Coating compositions containing silylated aroylresorcinols, method, and articles coated therewith
JP2001323209A (ja) 2000-05-12 2001-11-22 Mitsubishi Rayon Co Ltd 水性被覆組成物
US7236290B1 (en) 2000-07-25 2007-06-26 E Ink Corporation Electrophoretic medium with improved stability
JP2002060575A (ja) 2000-08-17 2002-02-26 Asahi Glass Co Ltd 水性樹脂組成物
JP5220978B2 (ja) 2000-08-18 2013-06-26 スリーエム イノベイティブ プロパティズ カンパニー フルオロアルキル(メタ)アクリレートコポリマーコーティング組成物
JP2002146155A (ja) 2000-11-16 2002-05-22 Daicel Chem Ind Ltd 水性樹脂分散液及びそれを含む水性塗料
JP3723546B2 (ja) 2000-12-01 2005-12-07 スリーエム イノベイティブ プロパティズ カンパニー 架橋型感圧接着剤組成物、および高温での用途に有用な架橋型感圧接着剤組成物ベースの接着製品
JP2002194266A (ja) 2000-12-26 2002-07-10 Mitsubishi Rayon Co Ltd 被覆組成物
JP4843846B2 (ja) 2000-12-28 2011-12-21 旭硝子株式会社 紫外線吸収剤を含有する水性塗料用組成物およびその製造方法
JP4843852B2 (ja) 2001-02-28 2011-12-21 旭硝子株式会社 塗料用組成物
JP2003040937A (ja) 2001-07-27 2003-02-13 Ipposha Oil Ind Co Ltd 高分子光安定剤
JP2003129033A (ja) 2001-10-23 2003-05-08 Otsuka Chem Co Ltd 紫外線吸収性重合体、ポリオレフィン系材料及び該材料からなるシート、フィルム
JP4142306B2 (ja) 2002-02-18 2008-09-03 株式会社日本触媒 紫外線遮蔽層形成用樹脂組成物および紫外線遮蔽性積層体
JP2003266449A (ja) 2002-03-15 2003-09-24 Matsushita Electric Works Ltd 人造大理石の製造方法
DE10239422A1 (de) 2002-08-28 2004-03-18 Hartmetall-Werkzeugfabrik Paul Horn Gmbh Werkzeug zur spanenden Bearbeitung
JP2004148542A (ja) 2002-10-28 2004-05-27 Sekisui Chem Co Ltd 光学フィルムおよび偏光板
JP2004161800A (ja) 2002-11-08 2004-06-10 Toray Ind Inc 2軸配向ポリエステルフィルム
US6923921B2 (en) 2002-12-30 2005-08-02 3M Innovative Properties Company Fluorinated polyether compositions
JP4163520B2 (ja) 2003-01-09 2008-10-08 株式会社日本触媒 水系紫外線吸収性樹脂組成物およびその製造方法
US20040191550A1 (en) 2003-03-27 2004-09-30 Sumitomo Chemical Company, Limited Resin plate
US7018713B2 (en) 2003-04-02 2006-03-28 3M Innovative Properties Company Flexible high-temperature ultrabarrier
JP2005042019A (ja) 2003-07-23 2005-02-17 Ipposha Oil Ind Co Ltd フッ素塗料添加用高分子紫外線吸収剤およびそれを含む塗料組成物
CN1875061A (zh) 2003-11-04 2006-12-06 Cytec技术有限公司 紫外稳定添加剂组合物
US20050129569A1 (en) 2003-12-15 2005-06-16 Becton, Dickinson And Company Terminal sterilization of prefilled containers
JP2005187662A (ja) 2003-12-25 2005-07-14 Panac Co Ltd 紫外線吸収性粘着剤および紫外線吸収性粘着シート
JP2005290269A (ja) 2004-04-01 2005-10-20 Sekisui Chem Co Ltd 硬化性組成物、シーリング材及び接着剤
US7101618B2 (en) 2004-05-07 2006-09-05 3M Innovative Properties Company Article comprising fluorochemical surface layer
US20050277729A1 (en) 2004-05-26 2005-12-15 Nippon Shokubai Co., Ltd. Pressure-sensitive adhesive composition
EP1798253B8 (en) * 2004-08-11 2014-06-18 Kaneka Corporation Method for producing a vinylidene fluoride-based resin multilayered film
JP4678577B2 (ja) 2004-11-05 2011-04-27 株式会社日立プラントテクノロジー 廃水処理システム
JP4604048B2 (ja) 2005-05-26 2010-12-22 三菱レイヨン株式会社 水性樹脂組成物及びそれを用いた水性塗料用耐候性向上材、熱可塑性樹脂用耐候性向上材、溶剤系塗料用耐候性向上材
JP2007047863A (ja) 2005-08-05 2007-02-22 Hitachi Ltd 記憶装置の記憶領域を構成する各記憶領域単位毎にアクセス排他制御を行うストレージシステム及び記憶制御方法
US7901778B2 (en) 2006-01-13 2011-03-08 Saint-Gobain Performance Plastics Corporation Weatherable multilayer film
JP4947764B2 (ja) 2006-02-03 2012-06-06 三菱レイヨン株式会社 水性被覆材
CA2644773C (en) * 2006-03-10 2015-01-27 Teijin Chemicals Ltd. Laminate
JP2007297619A (ja) 2006-04-06 2007-11-15 Nippon Shokubai Co Ltd 熱可塑性樹脂組成物、及び、押出しフィルム又はシート
CN101437916B (zh) 2006-05-11 2011-08-03 汉高股份两合公司 丙烯酸热熔粘合剂
US20090202792A1 (en) 2006-06-29 2009-08-13 Avery Dennison Corporation Polyvinylidene fluoride films and laminates thereof
US20100055418A1 (en) 2006-12-18 2010-03-04 Yorinobu Takamatsu (meth)acrylic resin composition and films of same
DE102007029263A1 (de) 2007-06-22 2008-12-24 Evonik Röhm Gmbh PMMA/PVDF-Folie mit besonders hoher Witterungsbeständigkeit und hoher UV-Schutzwirkung
KR20090089088A (ko) 2008-02-18 2009-08-21 한국세라믹기술원 벤조트리아졸계 아크릴 공중합체를 포함하는 자외선 흡수제및 이의 제조를 위한 자외선 흡수제 조성물
US20090283144A1 (en) 2008-05-14 2009-11-19 3M Innovative Properties Company Solar concentrating mirror
KR101346872B1 (ko) 2008-06-10 2014-01-02 가부시키가이샤 가네카 불소 수지 필름 및 불소 수지 적층 아크릴계 수지 필름
US8003132B2 (en) 2008-06-30 2011-08-23 Johnson & Johnson Consumer Companies, Inc. Compositions comprising an ultraviolet radiation-absorbing polymer
JP2010126690A (ja) 2008-11-28 2010-06-10 Nippon Shokubai Co Ltd 電気絶縁性付与用樹脂組成物
EP2382427A4 (en) 2008-12-30 2017-06-21 3M Innovative Properties Company Broadband reflectors, concentrated solar power systems, and methods of using the same
TW201043460A (en) 2009-04-30 2010-12-16 Mitsubishi Plastics Inc Solar cell sheet and solar cell module
TWI448492B (zh) 2009-07-30 2014-08-11 Dainichiseika Color Chem Masterbatch, and such a liquid composition of use
JP5583376B2 (ja) 2009-09-15 2014-09-03 富士フイルム株式会社 インクジェット用インク組成物
JP2011068708A (ja) 2009-09-24 2011-04-07 Nippon Kayaku Co Ltd 耐光性に優れたレンズシート用エネルギー線硬化型樹脂組成物及びその硬化物
EP2502281A4 (en) 2009-11-18 2013-09-04 3M Innovative Properties Co FLEXIBLE ARRANGEMENT AND PROCESS FOR THEIR MANUFACTURE AND USE
KR101752178B1 (ko) 2009-11-30 2017-06-29 덴카 주식회사 폴리불화비닐리덴계 수지조성물, 필름, 백시트 및 태양전지 모듈
US20110297228A1 (en) * 2009-12-07 2011-12-08 Rongfu Li Uv blocking fluoropolymer film
SG186894A1 (en) 2010-07-02 2013-02-28 3M Innovative Properties Co Barrier assembly with encapsulant and photovoltaic cell
US9254506B2 (en) 2010-07-02 2016-02-09 3M Innovative Properties Company Moisture resistant coating for barrier films
JP5798727B2 (ja) * 2010-09-29 2015-10-21 富士フイルム株式会社 重合体、高分子組成物、紫外線吸収剤、塗料及び樹脂成形物
JP5685424B2 (ja) 2010-11-22 2015-03-18 Agcコーテック株式会社 Led装置用塗料組成物、それを用いたled装置及びledランプ
JP5722090B2 (ja) 2011-03-14 2015-05-20 日東電工株式会社 粘着剤組成物、及び、粘着シート
CA2848980C (en) 2011-09-16 2020-01-14 Benz Research And Development Corp. Ultraviolet light absorbing materials for intraocular lens and uses thereof
JP2015508557A (ja) 2011-12-20 2015-03-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company 閉じ込め層およびそれを使って製造されるデバイスを製造するための方法および材料
MX2014011559A (es) 2012-03-30 2015-02-10 Lintec Corp Pelicula adhesiva para proteger rueda automotriz.
WO2013172930A1 (en) 2012-05-15 2013-11-21 Illinois Tool Works Inc. Replaceable solar wavelength - converting film
CN104755562B (zh) 2012-06-19 2017-05-17 3M创新有限公司 包含低表面能基团和羟基基团的添加剂以及涂料组合物
TWI610806B (zh) 2012-08-08 2018-01-11 3M新設資產公司 障壁膜,製造該障壁膜之方法,及包含該障壁膜之物件
CN103627056B (zh) 2012-08-23 2018-01-12 普立万聚合体(上海)有限公司 紫外稳定的聚烯烃混合物
JP2014111715A (ja) 2012-10-31 2014-06-19 Nitto Denko Corp 紫外線硬化型アクリル系粘着剤層を有する粘着シートの製造方法
KR20140074581A (ko) 2012-12-10 2014-06-18 동우 화인켐 주식회사 아크릴계 공중합체, 이를 함유하는 점착제 조성물 및 이를 이용한 편광판
WO2014100551A1 (en) * 2012-12-20 2014-06-26 3M Innovative Properties Company Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them
CN105612210A (zh) 2013-08-14 2016-05-25 三菱丽阳株式会社 含有偏氟乙烯系树脂的膜和层叠膜、以及层叠体
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
WO2015200655A1 (en) 2014-06-25 2015-12-30 3M Innovative Properties Company Fluoropolymer composition including at least one oligomer
JP6224277B2 (ja) 2014-06-25 2017-11-01 スリーエム イノベイティブ プロパティズ カンパニー 紫外線吸収オリゴマーを含む感圧性接着剤組成物
US10519350B2 (en) 2015-06-25 2019-12-31 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1291214A (zh) * 1998-04-03 2001-04-11 美国3M公司 含有含氟聚合物和酰胺官能紫外光吸收剂的组合物
CN1217421C (zh) * 1999-06-30 2005-08-31 佳能株式会社 太阳能电池组件
JP2001123107A (ja) * 1999-10-25 2001-05-08 Honny Chem Ind Co Ltd 電着塗料用水溶性樹脂組成物およびこれを用いて構成した電着塗料ならびにこれにより形成された電着塗膜
CN101107280A (zh) * 2004-12-29 2008-01-16 3M创新有限公司 包含感光氟化物的组合物及其用途
WO2011081847A1 (en) * 2009-12-30 2011-07-07 Maven Technologies, Llc. Biological testing with a substrate having a bottom surface including sawtooth - shaped prisms
CN102811857A (zh) * 2010-03-12 2012-12-05 美国圣戈班性能塑料公司 用于光电应用的多层膜

Also Published As

Publication number Publication date
US10577467B2 (en) 2020-03-03
EP2935472B1 (en) 2018-09-12
JP6632378B2 (ja) 2020-01-22
JP2016509617A (ja) 2016-03-31
CN105073909A (zh) 2015-11-18
KR20150096731A (ko) 2015-08-25
WO2014100580A1 (en) 2014-06-26
US20150337096A1 (en) 2015-11-26
JP2020023697A (ja) 2020-02-13
SG11201504889VA (en) 2015-07-30
JP6752951B2 (ja) 2020-09-09
EP2935472A1 (en) 2015-10-28
TW201439239A (zh) 2014-10-16
TWI624519B (zh) 2018-05-21
KR102194159B1 (ko) 2020-12-22

Similar Documents

Publication Publication Date Title
CN105073909B (zh) 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物
JP6074059B2 (ja) 紫外線吸収基を含むコポリマー、及びそれを含むフルオロポリマー組成物
EP3161078B1 (en) Extruded film comprising a fluoropolymer composition including at least one oligomer
WO2015200657A1 (en) Copolymers including a triazine group and compositions including them
JP6940418B2 (ja) 紫外線吸収基を含むコポリマー及びそれを含む組成物
US10836883B2 (en) Light transparent fluoropolymer composition and article

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant