SG114712A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG114712A1
SG114712A1 SG200500722A SG200500722A SG114712A1 SG 114712 A1 SG114712 A1 SG 114712A1 SG 200500722 A SG200500722 A SG 200500722A SG 200500722 A SG200500722 A SG 200500722A SG 114712 A1 SG114712 A1 SG 114712A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200500722A
Other languages
English (en)
Inventor
Paulus Cornelis Duineveld
Peter Dirksen
Aleksey Yurievic Kolesnychenko
Santen Helmar Van
Original Assignee
Koninkl Philips Electronics Nv
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Asml Netherlands Bv filed Critical Koninkl Philips Electronics Nv
Publication of SG114712A1 publication Critical patent/SG114712A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
SG200500722A 2004-02-09 2005-02-04 Lithographic apparatus and device manufacturing method SG114712A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/773,461 US7050146B2 (en) 2004-02-09 2004-02-09 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG114712A1 true SG114712A1 (en) 2005-09-28

Family

ID=34679392

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200500722A SG114712A1 (en) 2004-02-09 2005-02-04 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (2) US7050146B2 (de)
EP (1) EP1562080B1 (de)
JP (3) JP4444135B2 (de)
KR (1) KR100665383B1 (de)
CN (1) CN100504610C (de)
DE (1) DE602005002155T2 (de)
SG (1) SG114712A1 (de)
TW (1) TWI266948B (de)

Families Citing this family (143)

* Cited by examiner, † Cited by third party
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US20050174549A1 (en) 2005-08-11
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