CN100504610C - 光刻装置和器件制造方法 - Google Patents
光刻装置和器件制造方法 Download PDFInfo
- Publication number
- CN100504610C CN100504610C CNB2005100542275A CN200510054227A CN100504610C CN 100504610 C CN100504610 C CN 100504610C CN B2005100542275 A CNB2005100542275 A CN B2005100542275A CN 200510054227 A CN200510054227 A CN 200510054227A CN 100504610 C CN100504610 C CN 100504610C
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- China
- Prior art keywords
- immersion liquid
- electric field
- bubble
- space
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
Claims (27)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/773461 | 2004-02-09 | ||
US10/773,461 US7050146B2 (en) | 2004-02-09 | 2004-02-09 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1683999A CN1683999A (zh) | 2005-10-19 |
CN100504610C true CN100504610C (zh) | 2009-06-24 |
Family
ID=34679392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100542275A Expired - Fee Related CN100504610C (zh) | 2004-02-09 | 2005-02-08 | 光刻装置和器件制造方法 |
Country Status (8)
Country | Link |
---|---|
US (2) | US7050146B2 (zh) |
EP (1) | EP1562080B1 (zh) |
JP (3) | JP4444135B2 (zh) |
KR (1) | KR100665383B1 (zh) |
CN (1) | CN100504610C (zh) |
DE (1) | DE602005002155T2 (zh) |
SG (1) | SG114712A1 (zh) |
TW (1) | TWI266948B (zh) |
Families Citing this family (143)
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US7969548B2 (en) | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
US9013672B2 (en) | 2007-05-04 | 2015-04-21 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US8947629B2 (en) | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US7916269B2 (en) | 2007-07-24 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus and contamination removal or prevention method |
US20090025753A1 (en) | 2007-07-24 | 2009-01-29 | Asml Netherlands B.V. | Lithographic Apparatus And Contamination Removal Or Prevention Method |
-
2004
- 2004-02-09 US US10/773,461 patent/US7050146B2/en not_active Expired - Lifetime
-
2005
- 2005-02-04 SG SG200500722A patent/SG114712A1/en unknown
- 2005-02-05 TW TW094103847A patent/TWI266948B/zh not_active IP Right Cessation
- 2005-02-07 KR KR1020050011358A patent/KR100665383B1/ko not_active IP Right Cessation
- 2005-02-07 JP JP2005030038A patent/JP4444135B2/ja not_active Expired - Fee Related
- 2005-02-08 CN CNB2005100542275A patent/CN100504610C/zh not_active Expired - Fee Related
- 2005-02-08 EP EP05250691A patent/EP1562080B1/en active Active
- 2005-02-08 DE DE602005002155T patent/DE602005002155T2/de active Active
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2008
- 2008-05-22 US US12/153,717 patent/USRE42849E1/en not_active Expired - Fee Related
- 2008-12-02 JP JP2008307465A patent/JP4834055B2/ja not_active Expired - Fee Related
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2010
- 2010-12-27 JP JP2010290462A patent/JP2011066452A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4569739A (en) * | 1984-12-31 | 1986-02-11 | Dorr-Oliver Incorporated | Electrofilter using an improved electrode assembly |
Also Published As
Publication number | Publication date |
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JP2011066452A (ja) | 2011-03-31 |
SG114712A1 (en) | 2005-09-28 |
DE602005002155T2 (de) | 2008-10-30 |
TW200538858A (en) | 2005-12-01 |
TWI266948B (en) | 2006-11-21 |
US20050174549A1 (en) | 2005-08-11 |
JP2005223342A (ja) | 2005-08-18 |
JP4444135B2 (ja) | 2010-03-31 |
DE602005002155D1 (de) | 2007-10-11 |
EP1562080A1 (en) | 2005-08-10 |
USRE42849E1 (en) | 2011-10-18 |
KR100665383B1 (ko) | 2007-01-04 |
CN1683999A (zh) | 2005-10-19 |
JP4834055B2 (ja) | 2011-12-07 |
KR20060041834A (ko) | 2006-05-12 |
EP1562080B1 (en) | 2007-08-29 |
JP2009088552A (ja) | 2009-04-23 |
US7050146B2 (en) | 2006-05-23 |
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