KR20060050488A - 각도-분해 분광 리소그래피 특성화를 위한 방법 및 장치 - Google Patents
각도-분해 분광 리소그래피 특성화를 위한 방법 및 장치 Download PDFInfo
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- KR20060050488A KR20060050488A KR1020050074825A KR20050074825A KR20060050488A KR 20060050488 A KR20060050488 A KR 20060050488A KR 1020050074825 A KR1020050074825 A KR 1020050074825A KR 20050074825 A KR20050074825 A KR 20050074825A KR 20060050488 A KR20060050488 A KR 20060050488A
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
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Abstract
Description
Claims (56)
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,상기 렌즈의 상기 개구수는 0.9 이상인 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,상기 반사된 스펙트럼의 특성은, (a) 횡자기적 및 횡전기적 편광된 광의 세기, (b) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (a)와 (b) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 파장들에서의 반사된 스펙 트럼의 특성을 측정함으로써, 상기 기판의 특성이 측정되는 것을 특징으로 하는 스캐터로미터.
- 제4항에 있어서,상기 복수의 파장들 각각은 δλ의 대역폭 및 2δλ이상의 간격을 가지는 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,반사된 스펙트럼내의 비대칭성을 측정함으로써, 오정렬된 2개의 주기적 구조체들의 오버레이가 측정될 수 있으며, 상기 비대칭성은 상기 오버레이의 크기와 관련되는 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,방사선 빔을 제공하도록 구성된 방사선 소스와 상기 기판 사이의 파장 다중화기; 및상기 기판과 상기 검출기 사이의 비-다중화기를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제7항에 있어서,상기 파장 다중화기는, 각각 대역폭이 δλ이고 간격이 2δλ인 N개의 이산 파장들을 수용하도록 순응된 분산 요소, 예컨대 격자 또는 프리즘인 것을 특징으로 하는 스캐터로미터.
- 제6항에 있어서,상기 방사선 빔을 제공하도록 구성된 방사선 소스의 표면적이, 상기 파장 다중화기에 각각 커플링된 N개의 부분들로 분할되며, 여기서 N은 이산 파장들의 개수인 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,퓨필 평면에서의 각도-분해 스펙트럼들의 정의된 거리를 얻기 위해서, 대물 평면에 광학 에지를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제1항에 있어서,상기 검출기를 이용한 별도의 측정을 위해, 방사선 소스로부터 방출된 방사선 빔의 일부분을 커플링하도록 구성된 경사진 거울 및 비-편광 빔 분할기를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제11항에 있어서,상기 방사선 빔의 일부분은, 상기 방사선 빔의 세기를 측정하고, 상기 방사선 빔의 세기의 변동들을 보상하기 위해서 사용되는 것을 특징으로 하는 스캐터로 미터.
- 제11항에 있어서,상기 방사선 빔의 일부분의 크기를 제한하고 상기 방사선 빔의 일부분이 상기 방사선 빔의 나머지 부분에 대해 평행한 것을 보장하도록 구성된 퓨필 스톱을 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판과 상기 높은 개구수 렌즈 사이에 액체를 포함하는 공간을 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들 및 복수의 파장들에서, 상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제14항에 있어서,상기 반사된 스펙트럼의 특성은, (a) 횡자기적 및 횡전기적 편광된 광의 세기, (b) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (a)와 (b) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제14항에 있어서,방사선 빔을 제공하도록 구성된 방사선 소스와 상기 기판 사이의 파장 다중화기; 및반사된 스펙트럼의 특성을 측정하도록 구성된 검출기와 상기 기판 사이의 비-다중화기를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및중간 대물 평면의 반대 절반부들(opposite halves) 중 하나에 배치되도록 순응된 에지를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들 및 복수의 파장들에서, 상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제17항에 있어서,상기 반사된 스펙트럼의 특성은, (a) 횡자기적 및 횡전기적 편광된 광의 세기, (b) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (a)와 (b) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제17항에 있어서,방사선 빔을 제공하도록 구성된 방사선 소스와 상기 기판 사이의 파장 다중화기; 및반사된 스펙트럼의 특성을 측정하도록 구성된 검출기와 상기 기판 사이의 비-다중화기를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판의 표면으로부터 반사된 각도-분해 방사선 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들 및 파장들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써 기판의 특성이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제20항에 있어서,상기 반사된 스펙트럼의 특성은, (a) 횡자기적 및 횡전기적 편광된 광의 세기, (b) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (a)와 (b) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제20항에 있어서,방사선 빔을 제공하도록 구성된 방사선 소스와 상기 기판 사이의 파장 다중화기; 및상기 기판과 상기 검출기 사이의 비-다중화기를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 검사 방법에 있어서,기판상으로 패턴을 프린트하는 단계; 및높은 개구수 렌즈의 퓨필 평면에서 상기 패턴의 반사된 스펙트럼을 측정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 제23항에 있어서,상기 반사된 스펙트럼을 측정하는 단계는, (a) 복수의 각도들에서의 상기 반사된 스펙트럼의 특성, (b) 복수의 파장들에서의 상기 반사된 스펙트럼의 특성, 또는 (a)와 (b)를 동시에 측정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 제23항에 있어서,상기 반사된 스펙트럼의 특성은, (i) 횡자기적 및 횡전기적 편광된 광의 세기, (ii) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (i)와 (ii) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 검사 방법에 있어서,평행하게 층을 이루지만(layered in parallel) 오정렬된 2개의 격자들을 제공하여, 하나의 격자에 대해 다른 하나의 격자의 오버레이를 생성하는 단계;스캐터로미터를 이용하여 상기 격자들의 반사된 스펙트럼을 측정하는 단계;상기 반사된 스펙트럼의 비대칭성으로부터 상기 오버레이의 크기를 유도하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 제26항에 있어서,상기 반사된 스펙트럼을 측정하는 단계는, (a) 복수의 각도들에서의 상기 반사된 스펙트럼의 특성, (b) 복수의 파장들에서의 상기 반사된 스펙트럼의 특성, 또는 (a)와 (b)를 동시에 측정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 제27항에 있어서,상기 반사된 스펙트럼의 특성은, (i) 횡자기적 및 횡전기적 편광된 광의 세기, (ii) 횡자기적 편광된 광과 횡전기적 편광된 광간의 위상차, 또는 (i)와 (ii) 양자 모두를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 디바이스 제조방법에 있어서,기판의 타겟부상에 방사선의 빔을 투영하는 단계,스캐터로미터를 이용하여, 높은 개구수 렌즈의 퓨필 평면에서, 사전설정된 범위의 각도들 및 파장들을 통해 상기 빔의 반사된 스펙트럼을 동시에 측정하는 것을 특징으로 하는 디바이즈 제조방법.
- 격자 패턴의 각도-분해 분광적 이미지를 생성하는 방법에 있어서,상기 격자 패턴이 생성되는 때에, 리소그래피 노광 조건들과 흡사한 어퍼처들을 이용하는 단계를 포함하여 이루어지는 것을 특징으로 하는 방법.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있으며,1이상의 반사기;1이상의 거울으로부터 반사되는 2개 이상의 이미지들을 검출하고 조합하도록 구성된 검출기; 및방사선 빔의 조명 프로파일이 검출될 수 있는 상기 이미지들에 기초하여 미 분 방정식을 생성하도록 구성된 프로세서를 더 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,상기 조명 프로파일은, 보다 높은 회절 차수들에서의 반사된 스펙트럼의 특성의 측정들을 보정하는데 사용되는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,상기 반사기는 오목 거울을 포함하여 이루어지고, 상기 스캐터로미터는 상기 거울의 표면에 걸쳐 방사선 빔을 이동시키는 기구를 포함하여, 복수의 반사 각도들을 얻는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,상기 반사기는 볼록 거울을 포함하여 이루어지고, 상기 스캐터로미터는 상기 거울의 표면에 걸쳐 방사선 빔을 이동시키는 기구를 포함하여, 복수의 반사 각도들을 얻는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,상기 반사기들은 평탄한 거울을 포함하여 이루어지고, 상기 스캐터로미터는 복수의 각도들을 통해 상기 거울을 경사지게 하는 기구를 포함하여 이루어지는 것 을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,상이한 경사 각도들을 갖는 복수의 거울들을 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,측정된 반사 각도는 방사 방향내에 있는 것을 특징으로 하는 스캐터로미터.
- 제31항에 있어서,측정된 반사 각도는 방위각 방향내에 있는 것을 특징으로 하는 스캐터로미터.
- 검사 방법에 있어서,패터닝된 방사선 빔을 이용하여 기판상에 패턴을 프린트하는 단계;높은 개구수 렌즈의 퓨필 평면에서, 상기 패턴의 반사된 스펙트럼을 측정하는 단계;그것을 1이상의 거울들로 반사시켜 상기 방사선 빔을 정규화하는 단계;상기 1이상의 거울들로의 상기 방사선 빔의 상이한 반사 각도들로부터 생성된 2이상의 이미지들을 측정하고 조합하는 단계; 및미분 방정식을 생성하여, 상기 방사선 빔의 조명 프로파일을 재구성하는 단계를 특징으로 하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면으로부터, 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있으며,상기 방사선 빔을 선형으로 편광시키도록 구성된 제 1 편광기;상기 방사선 빔을 2개의 직교 성분들(ETE 및 ETH)로 분할시키도록 구성된 빔 분할기;스캐터링된 광을 편광시키도록 구성된 제 2 편광기;상기 제 1 편광기와 상기 제 2 편광기 사이에 위치되며, 직교 편광된 성분들간의 광학 경로차를 변화시키도록 구성된 가변 보상기; 및그 결과적인 빔 성분들의 사인곡선 세기 변화를 검출하는 2차원 검출기를 더 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제40항에 있어서,상기 보상기는 스캐터로미터의 조명 브랜치내에 위치되는 것을 특징으로 하는 스캐터로미터.
- 제40항에 있어서,상기 보상기는 상기 빔 분할기와 상기 높은 개구수 렌즈 사이에 위치되는 것을 특징으로 하는 스캐터로미터.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈; 및상기 기판의 표면으로부터 반사된 방사선의 빔의 각도-세기 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있으며,개략적 오버레이 측정들을 수행하는 제 2 검출기 브랜치를 더 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 제43항에 있어서,제 2 검출기 브랜치는 상기 기판의 이미지 평면내에 존재하는 것을 특징으로 하는 스캐터로미터.
- 제43항에 있어서,상기 제 2 검출기 브랜치는 기판상의 오버레이 오차들을 측정하도록 구성되며, 상기 오차들은 정수와 기판 격자의 피치의 곱과 같은 것을 특징으로 하는 스캐터로미터.
- 검사 방법에 있어서,평행하게 층을 이루지만 오정렬된 2개의 격자들을 제공하여, 하나의 격자에 대해 다른 하나의 격자의 오버레이를 생성하는 단계;스캐터로미터를 이용하여 상기 격자들의 반사된 스펙트럼을 측정하는 단계;상기 반사된 스펙트럼의 비대칭성으로부터 상기 오버레이의 크기를 유도하는 단계;상기 격자들의 개략적 오버레이 측정을 수행하여, 상기 오버레이가 격자 피치 폭보다 더 큰지를 결정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 제46항에 있어서,i) 방사선 빔의 2개의 이미지 평면 측정들을 수행하여, 격자 피치보다 더 큰 오버레이 오차의 존재를 결정하는 단계; 및ii) 결정된 오버레이가 사전설정된 임계값 이하인 경우, 방사선 빔의 퓨필 평면 측정을 수행하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 격자의 국부적 왜곡들을 검출하도록 구성된 스캐터로미터에 있어서,방사선 빔을 생성하는 조명 수단;높은 개구수 렌즈;상기 빔을 정방향으로 스캐터링하는 격자; 및상기 정방향 이외의 다양한 각도들에서의 스캐터링된 빔의 각도-분해 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 정반사 이외의 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 격자의 왜곡들이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제48항에 있어서,상기 방사선 빔은 고리형 조명을 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 기판상의 다수의 타겟들의 특성을 동시에 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈;기판상으로 복수의 조명 스폿들을 투영시키도록 구성된 투영기; 및상기 기판의 표면으로부터 반사된 복수의 방사선 스폿들의 각도-분해 스펙트 럼을 동시에 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들에서의 반사된 스펙트럼의 특성을 동시에 측정함으로써, 상기 기판의 특성이 측정될 수 있는 것을 특징으로 하는 스캐터로미터.
- 제50항에 있어서,동일하게 편광된 2개의 조명 스폿들을 생성하는 분리기(divider)를 포함하여 이루어지는 것을 특징으로 하는 스캐터로미터.
- 디바이스 제조방법에 있어서,기판의 타겟부상으로 방사선의 빔을 투영시키는 단계;상기 빔이 상기 기판에 도달하기 이전에, 상기 빔을 복수의 빔들로 분리하는 단계; 및스캐터로미터를 이용하여, 높은 개구수 렌즈의 퓨필 평면에서, 사전설정된 범위의 각도들 및 파장들을 통해 상기 복수의 빔들의 반사된 스펙트럼을 동시에 측정하여, 상기 기판상의 다수의 타겟들을 동시에 측정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 디바이스 제조방법.
- 기판의 특성을 측정하도록 구성된 스캐터로미터에 있어서,높은 개구수 렌즈;방사선 빔을 생성하는 방사선 소스; 및상기 기판의 표면으로부터 반사된 방사선 빔의 각도-분해 스펙트럼을 검출하도록 구성된 검출기를 포함하여 이루어지고,상기 높은 개구수 렌즈의 퓨필 평면에서, 복수의 각도들에서의 반사된 스펙트럼의 특성을 측정함으로써, 상기 기판의 특성이 측정될 수 있으며,상기 방사선 빔은 상기 기판과의 켤레면에서 고리형 세기 분포를 가지는 것을 특징으로 하는 스캐터로미터.
- 검사 방법에 있어서,상기 기판과의 켤레면에서의 고리형 세기 분포를 포함하는 방사선을 이용하여, 기판상에 패턴을 프린트하는 단계; 및높은 개구수 렌즈의 퓨필 평면에서, 상기 패턴의 반사된 스펙트럼을 측정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 검사 방법.
- 기판 경사의 변화들을 계산하는 장치에 있어서,상기 기판과의 켤레면에서 고리형 분포를 갖는 방사선 빔을 생성하도록 구성된 방사선 소스;방사선 빔내의 형상화된 차폐부;상기 기판 경사의 변동들로 인한 상기 기판상의 형상화된 차폐부의 폭 및 형상의 변화들을 검출하도록 구성된 검출기;상기 검출기에 의해 검출된 변화들에 기초하여 상기 기판 경사의 변화들을 계산하는 프로세서를 포함하여 이루어지는 것을 특징으로 하는 장치.
- 침지 리소그래피 장치의 버블 결함들을 검출하는 방법에 있어서,기판상에 패턴을 프린트하는 단계;높은 개구수 렌즈의 퓨필 평면내에, 상기 패턴의 반사된 스펙트럼을 측정하는 단계;상기 반사된 스펙트럼으로부터, 상기 침지 리소그래피 장치에 포함된 액체내의 버블들로 인한 결함들이 상기 패턴내에 존재하는지를 결정하는 단계를 포함하여 이루어지는 것을 특징으로 하는 방법.
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