DK3786703T3 - Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder - Google Patents
Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder Download PDFInfo
- Publication number
- DK3786703T3 DK3786703T3 DK20191997.4T DK20191997T DK3786703T3 DK 3786703 T3 DK3786703 T3 DK 3786703T3 DK 20191997 T DK20191997 T DK 20191997T DK 3786703 T3 DK3786703 T3 DK 3786703T3
- Authority
- DK
- Denmark
- Prior art keywords
- light sources
- mode control
- photonic crystal
- broadband light
- crystal fiber
- Prior art date
Links
- 239000000835 fiber Substances 0.000 title 1
- 239000004038 photonic crystal Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4219—Mechanical fixtures for holding or positioning the elements relative to each other in the couplings; Alignment methods for the elements, e.g. measuring or observing methods especially used therefor
- G02B6/422—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements
- G02B6/4225—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements by a direct measurement of the degree of coupling, e.g. the amount of light power coupled to the fibre or the opto-electronic element
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
- G01M11/35—Testing of optical devices, constituted by fibre optics or optical waveguides in which light is transversely coupled into or out of the fibre or waveguide, e.g. using integrating spheres
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0425—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using optical fibers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
- G01M11/33—Testing of optical devices, constituted by fibre optics or optical waveguides with a light emitter being disposed at one fibre or waveguide end-face, and a light receiver at the other end-face
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J2001/4247—Photometry, e.g. photographic exposure meter using electric radiation detectors for testing lamps or other light sources
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02295—Microstructured optical fibre
- G02B6/02309—Structures extending perpendicularly or at a large angle to the longitudinal axis of the fibre, e.g. photonic band gap along fibre axis
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/365—Non-linear optics in an optical waveguide structure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/32—Photonic crystals
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Electromagnetism (AREA)
- Crystallography & Structural Chemistry (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Lasers (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19194974.2A EP3786702A1 (en) | 2019-09-02 | 2019-09-02 | Mode control of photonic crystal fiber based broadband light sources |
EP19215183 | 2019-12-11 | ||
EP20152635 | 2020-01-20 | ||
EP20165824 | 2020-03-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
DK3786703T3 true DK3786703T3 (da) | 2023-07-10 |
Family
ID=72086881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK20191997.4T DK3786703T3 (da) | 2019-09-02 | 2020-08-20 | Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder |
Country Status (8)
Country | Link |
---|---|
US (3) | US11360396B2 (da) |
EP (2) | EP4224250A3 (da) |
KR (1) | KR20220044532A (da) |
CN (1) | CN114430875A (da) |
DK (1) | DK3786703T3 (da) |
IL (1) | IL289928A (da) |
TW (1) | TWI780475B (da) |
WO (1) | WO2021043593A1 (da) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102592778B1 (ko) * | 2017-01-09 | 2023-10-24 | 막스-플랑크-게젤샤프트 츄어 푀르더룽 데어 비쎈샤프텐 에.파우. | 광대역 광원장치 및 광대역 광 펄스 생성 방법 |
US11835842B2 (en) * | 2019-04-12 | 2023-12-05 | Regents of the Univ of Colorado, a body corporate | Processor-controlled high harmonic optimization with optimal gas handling |
US20220269077A1 (en) * | 2020-04-27 | 2022-08-25 | Google Llc | Systems, devices, and methods for inputting light from a scanning laser projector into a waveguide |
CA3190710A1 (en) | 2020-08-28 | 2022-03-03 | Amr Abdelmonem | Method and system for polarization adjusting in time-division duplexing (tdd) or frequency-division duplexing (fdd) |
EP4105696A1 (en) * | 2021-06-15 | 2022-12-21 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
WO2022233547A1 (en) * | 2021-05-03 | 2022-11-10 | Asml Netherlands B.V. | Optical element for generation of broadband radiation |
US11502404B1 (en) * | 2022-03-31 | 2022-11-15 | Isco International, Llc | Method and system for detecting interference and controlling polarization shifting to mitigate the interference |
US11476585B1 (en) | 2022-03-31 | 2022-10-18 | Isco International, Llc | Polarization shifting devices and systems for interference mitigation |
US11476574B1 (en) | 2022-03-31 | 2022-10-18 | Isco International, Llc | Method and system for driving polarization shifting to mitigate interference |
EP4258051A1 (en) | 2022-04-08 | 2023-10-11 | NKT Photonics A/S | Tunable supercontinuum system |
EP4258052A1 (en) | 2022-04-08 | 2023-10-11 | NKT Photonics A/S | Supercontinuum system with spectral detection |
US11509072B1 (en) | 2022-05-26 | 2022-11-22 | Isco International, Llc | Radio frequency (RF) polarization rotation devices and systems for interference mitigation |
US11515652B1 (en) | 2022-05-26 | 2022-11-29 | Isco International, Llc | Dual shifter devices and systems for polarization rotation to mitigate interference |
US11509071B1 (en) | 2022-05-26 | 2022-11-22 | Isco International, Llc | Multi-band polarization rotation for interference mitigation |
US11949489B1 (en) | 2022-10-17 | 2024-04-02 | Isco International, Llc | Method and system for improving multiple-input-multiple-output (MIMO) beam isolation via alternating polarization |
US11956058B1 (en) | 2022-10-17 | 2024-04-09 | Isco International, Llc | Method and system for mobile device signal to interference plus noise ratio (SINR) improvement via polarization adjusting/optimization |
US11990976B2 (en) | 2022-10-17 | 2024-05-21 | Isco International, Llc | Method and system for polarization adaptation to reduce propagation loss for a multiple-input-multiple-output (MIMO) antenna |
US11985692B2 (en) | 2022-10-17 | 2024-05-14 | Isco International, Llc | Method and system for antenna integrated radio (AIR) downlink and uplink beam polarization adaptation |
CN116502545B (zh) * | 2023-06-26 | 2023-09-26 | 国科大杭州高等研究院 | 一种面向广角耦合结构的遗传算法、应用及微结构光探针 |
Family Cites Families (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6690459B2 (en) * | 2001-03-05 | 2004-02-10 | Trex Enterprises, Corp. | Method and apparatus for fiber alignment using light leaked from cladding |
WO2003030409A1 (en) | 2001-09-28 | 2003-04-10 | Protodel International Limited | Monitor for an optical fibre and multi-guide optical fibre circuits and methods of making them |
US6829421B2 (en) | 2002-03-13 | 2004-12-07 | Micron Technology, Inc. | Hollow core photonic bandgap optical fiber |
DE60319462T2 (de) | 2002-06-11 | 2009-03-12 | Asml Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
SG121818A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN100555086C (zh) | 2003-01-14 | 2009-10-28 | Asml荷兰有限公司 | 用于光刻装置的水平传感器 |
WO2004106999A1 (en) * | 2003-05-28 | 2004-12-09 | Corning Incorporated | Methods of generating and transporting short wavelength radiation and apparati used therein |
US7265364B2 (en) | 2004-06-10 | 2007-09-04 | Asml Netherlands B.V. | Level sensor for lithographic apparatus |
US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
US7218440B2 (en) * | 2005-08-25 | 2007-05-15 | Northrop Grumman Corporation | Photonic bandgap fiber for generating near-diffraction-limited optical beam comprising multiple coaxial wavelengths |
US7791724B2 (en) | 2006-06-13 | 2010-09-07 | Asml Netherlands B.V. | Characterization of transmission losses in an optical system |
US7701577B2 (en) | 2007-02-21 | 2010-04-20 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
SG152187A1 (en) | 2007-10-25 | 2009-05-29 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
NL1036123A1 (nl) | 2007-11-13 | 2009-05-14 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036245A1 (nl) | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method of diffraction based overlay metrology. |
WO2009095023A2 (en) | 2008-01-31 | 2009-08-06 | Koheras A/S | System, device and method for stabilizing the optical output power of an optical system |
WO2009100113A1 (en) * | 2008-02-07 | 2009-08-13 | Imra America, Inc. | High power parallel fiber arrays |
NL1036684A1 (nl) | 2008-03-20 | 2009-09-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036685A1 (nl) | 2008-03-24 | 2009-09-25 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036734A1 (nl) | 2008-04-09 | 2009-10-12 | Asml Netherlands Bv | A method of assessing a model, an inspection apparatus and a lithographic apparatus. |
NL1036857A1 (nl) | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL2002883A1 (nl) | 2008-06-26 | 2009-12-29 | Asml Netherlands Bv | Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus. |
KR101295203B1 (ko) | 2008-10-06 | 2013-08-09 | 에이에스엠엘 네델란즈 비.브이. | 2차원 타겟을 이용한 리소그래피 포커스 및 조사량 측정 |
EP2228685B1 (en) | 2009-03-13 | 2018-06-27 | ASML Netherlands B.V. | Level sensor arrangement for lithographic apparatus and device manufacturing method |
NL2006229A (en) | 2010-03-18 | 2011-09-20 | Asml Netherlands Bv | Inspection method and apparatus, and associated computer readable product. |
JP2011215409A (ja) * | 2010-03-31 | 2011-10-27 | Fujikura Ltd | 調心方法および調心装置 |
NL2007176A (en) | 2010-08-18 | 2012-02-21 | Asml Netherlands Bv | Substrate for use in metrology, metrology method and device manufacturing method. |
NL2009004A (en) | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
JP2013057854A (ja) * | 2011-09-09 | 2013-03-28 | Olympus Corp | 光伝送装置 |
NL2010717A (en) | 2012-05-21 | 2013-11-25 | Asml Netherlands Bv | Determining a structural parameter and correcting an asymmetry property. |
US20130343748A1 (en) | 2012-05-23 | 2013-12-26 | Conolog Corporation | Apparatus and method for monitoring optical signal transmission in optical fibers |
US9606442B2 (en) | 2012-07-30 | 2017-03-28 | Asml Netherlands B.V. | Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method |
WO2015003715A1 (en) * | 2013-07-10 | 2015-01-15 | Nkt Photonics A/S | Microstructured optical fiber, supercontinuum light source comprising microstructured optical fiber and use of such light source |
CN203720405U (zh) * | 2013-12-18 | 2014-07-16 | 湖南理工学院 | 一种基于薄膜型空间滤波器的波导模式控制器 |
US9429467B2 (en) | 2014-04-11 | 2016-08-30 | Lockheed Martin Corporation | System for non-contact optical-power measurement |
US9160137B1 (en) | 2014-05-09 | 2015-10-13 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V. | Method and device for creating supercontinuum light pulses |
KR102294349B1 (ko) | 2014-11-26 | 2021-08-26 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법, 컴퓨터 제품 및 시스템 |
JP6462883B2 (ja) | 2014-12-22 | 2019-01-30 | エーエスエムエル ネザーランズ ビー.ブイ. | レベルセンサ、リソグラフィ装置、及びデバイス製造方法 |
AU2016276980B2 (en) | 2015-06-12 | 2021-09-23 | Pacific Biosciences Of California, Inc. | Integrated target waveguide devices and systems for optical coupling |
IL256196B (en) | 2015-06-17 | 2022-07-01 | Asml Netherlands Bv | Prescription selection based on inter-prescription composition |
EP3136143B1 (en) | 2015-08-26 | 2020-04-01 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Hollow-core fibre and method of manufacturing thereof |
CN206096546U (zh) * | 2016-08-26 | 2017-04-12 | 武汉锐科光纤激光技术股份有限公司 | 一种光纤高阶模式剥离器件 |
KR102592778B1 (ko) * | 2017-01-09 | 2023-10-24 | 막스-플랑크-게젤샤프트 츄어 푀르더룽 데어 비쎈샤프텐 에.파우. | 광대역 광원장치 및 광대역 광 펄스 생성 방법 |
US10436655B2 (en) * | 2017-07-14 | 2019-10-08 | Saudi Arabian Oil Company | Fluorophore enhanced multidimensional photonic sensors |
US10630043B1 (en) * | 2019-05-14 | 2020-04-21 | Ii-Vi Delaware, Inc. | Methods and devices for laser beam parameters sensing and control with fiber-tip integrated systems |
-
2020
- 2020-08-20 WO PCT/EP2020/073422 patent/WO2021043593A1/en active Application Filing
- 2020-08-20 EP EP23166047.3A patent/EP4224250A3/en active Pending
- 2020-08-20 CN CN202080061680.1A patent/CN114430875A/zh active Pending
- 2020-08-20 KR KR1020227007035A patent/KR20220044532A/ko active IP Right Grant
- 2020-08-20 EP EP20191997.4A patent/EP3786703B1/en active Active
- 2020-08-20 DK DK20191997.4T patent/DK3786703T3/da active
- 2020-08-27 US US17/004,140 patent/US11360396B2/en active Active
- 2020-09-01 TW TW109129832A patent/TWI780475B/zh active
-
2022
- 2022-01-17 IL IL289928A patent/IL289928A/en unknown
- 2022-05-11 US US17/741,545 patent/US11687009B2/en active Active
-
2023
- 2023-05-11 US US18/196,108 patent/US20230280660A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
EP3786703A1 (en) | 2021-03-03 |
US11360396B2 (en) | 2022-06-14 |
TWI780475B (zh) | 2022-10-11 |
CN114430875A (zh) | 2022-05-03 |
US20210063894A1 (en) | 2021-03-04 |
TW202115459A (zh) | 2021-04-16 |
US11687009B2 (en) | 2023-06-27 |
IL289928A (en) | 2022-03-01 |
EP3786703B1 (en) | 2023-05-17 |
EP4224250A3 (en) | 2023-09-06 |
WO2021043593A1 (en) | 2021-03-11 |
US20230280660A1 (en) | 2023-09-07 |
US20220269183A1 (en) | 2022-08-25 |
KR20220044532A (ko) | 2022-04-08 |
EP4224250A2 (en) | 2023-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK3786703T3 (da) | Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder | |
DK3485141T3 (da) | Udrulning af optiske fibre | |
DK3491441T3 (da) | Fleksibelt optisk fiberbånd | |
EP3698192A4 (en) | HOUSING FOR SPLICE OF OPTICAL FIBERS | |
DK3649090T3 (da) | Fremgangsmåde til fremstilling af en optisk fiberpræform | |
DK3740326T3 (da) | Fremgangsmåder til fremstilling af optiske effektlag | |
DK3289832T3 (da) | Opgradering af lyskilde | |
FR3042606B1 (fr) | Fibre optique | |
FR3069336B1 (fr) | Fibre optique | |
EP3842395A4 (en) | OPTICAL FIBER | |
EP3764133A4 (en) | OPTICAL FIBER | |
DK3764134T3 (da) | Optisk fiber | |
DK3435126T3 (da) | Optisk fiber | |
EP3822673A4 (en) | OPTICAL FIBER | |
EP3783409A4 (en) | OPTICAL FIBER | |
DK3425821T3 (da) | Optisk fiber-transmissionssystem | |
DK3647282T3 (da) | Fremgangsmåde til fremstilling af en glaspræform til optiske fibre | |
DK3655357T3 (da) | Optisk fiberspole | |
ES2975982T3 (es) | Microscopía óptica | |
EP3878880A4 (en) | OPTICAL FIBER | |
EP3762676A4 (en) | RETICLE WITH FIBER OPTICAL LIGHTING | |
EP4080163A4 (en) | LIGHT SOURCE DEVICE FOR FIBER OPTIC GYRO AND FIBER OPTIC GYRO THEREOF | |
DK3414604T3 (da) | Optiske fibre med få modi til multipleksering med modusdeling | |
EP3754393A4 (en) | OPTICAL FIBER | |
EP3715924A4 (en) | POLARIZATION PRESERVING OPTICAL FIBER |