SG152187A1 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method - Google Patents

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Info

Publication number
SG152187A1
SG152187A1 SG200807879-2A SG2008078792A SG152187A1 SG 152187 A1 SG152187 A1 SG 152187A1 SG 2008078792 A SG2008078792 A SG 2008078792A SG 152187 A1 SG152187 A1 SG 152187A1
Authority
SG
Singapore
Prior art keywords
lithographic
beams
device manufacturing
processing cell
substrate
Prior art date
Application number
SG200807879-2A
Inventor
Straaijer Alexander
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG152187A1 publication Critical patent/SG152187A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. [Fig.5]
SG200807879-2A 2007-10-25 2008-10-22 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method SG152187A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US99602407P 2007-10-25 2007-10-25

Publications (1)

Publication Number Publication Date
SG152187A1 true SG152187A1 (en) 2009-05-29

Family

ID=40280773

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807879-2A SG152187A1 (en) 2007-10-25 2008-10-22 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Country Status (8)

Country Link
US (1) US8115926B2 (en)
EP (1) EP2053349A3 (en)
JP (1) JP4871943B2 (en)
KR (1) KR20090042195A (en)
CN (1) CN101482702A (en)
IL (1) IL194839A0 (en)
SG (1) SG152187A1 (en)
TW (1) TW200925794A (en)

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EP3611569A1 (en) 2018-08-16 2020-02-19 ASML Netherlands B.V. Metrology apparatus and photonic crystal fiber
KR20210040134A (en) 2018-09-04 2021-04-12 에이에스엠엘 네델란즈 비.브이. Measuring device
EP3627226A1 (en) 2018-09-20 2020-03-25 ASML Netherlands B.V. Optical system, metrology apparatus and associated method
EP3629086A1 (en) * 2018-09-25 2020-04-01 ASML Netherlands B.V. Method and apparatus for determining a radiation beam intensity profile
US11087065B2 (en) 2018-09-26 2021-08-10 Asml Netherlands B.V. Method of manufacturing devices
EP3870547A1 (en) 2018-10-24 2021-09-01 ASML Netherlands B.V. Optical fibers and production methods therefor
EP3650941A1 (en) 2018-11-12 2020-05-13 ASML Netherlands B.V. Method of determining the contribution of a processing apparatus to a substrate parameter
WO2020114684A1 (en) 2018-12-03 2020-06-11 Asml Netherlands B.V. Method of manufacturing devices
EP3696606A1 (en) 2019-02-15 2020-08-19 ASML Netherlands B.V. A metrology apparatus with radiation source having multiple broadband outputs
EP3702840A1 (en) 2019-03-01 2020-09-02 ASML Netherlands B.V. Alignment method and associated metrology device
EP3705942A1 (en) 2019-03-04 2020-09-09 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
CN116643348A (en) 2019-03-25 2023-08-25 Asml荷兰有限公司 Frequency widening device and method
WO2020200637A1 (en) 2019-04-03 2020-10-08 Asml Netherlands B.V. Optical fiber
EP3739389A1 (en) 2019-05-17 2020-11-18 ASML Netherlands B.V. Metrology tools comprising aplanatic objective singlet
CN114008499A (en) 2019-06-21 2022-02-01 Asml荷兰有限公司 Mounted hollow core optical fiber arrangement
EP3758168A1 (en) 2019-06-25 2020-12-30 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
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JP2022542070A (en) 2019-07-24 2022-09-29 エーエスエムエル ネザーランズ ビー．ブイ． source of radiation
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CN114514465A (en) 2019-09-18 2022-05-17 Asml荷兰有限公司 Improved broadband radiation generation in hollow core optical fibers
EP4365653A2 (en) 2019-10-24 2024-05-08 ASML Netherlands B.V. Hollow-core photonic crystal fiber based optical component for broadband radiation generation
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EP3851904B1 (en) 2020-01-15 2023-02-01 ASML Netherlands B.V. Method, assembly, and apparatus for improved control of broadband radiation generation
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Also Published As

Publication number Publication date
EP2053349A2 (en) 2009-04-29
TW200925794A (en) 2009-06-16
IL194839A0 (en) 2009-08-03
KR20090042195A (en) 2009-04-29
EP2053349A3 (en) 2009-06-24
CN101482702A (en) 2009-07-15
US20090168062A1 (en) 2009-07-02
JP2009177134A (en) 2009-08-06
JP4871943B2 (en) 2012-02-08
US8115926B2 (en) 2012-02-14

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