KR102164337B1 - Pattern exposure device - Google Patents

Abstract

In order to supply the light beam whose intensity is modulated according to the drawing data to each of the plurality of drawing units, the on state of setting the intensity of the light beam to a first intensity suitable for pattern drawing, based on the drawing data, and a first intensity lower than the first intensity. 2 In order to sequentially supply a light source device including an optical modulator that switches to an off state with intensity, and a light beam from the light source device to any one of a plurality of drawing units in time division, it is provided corresponding to each of the plurality of drawing units. In addition, a plurality of acousto-optic modulation elements that are arranged so that the light beam from the light source device passes in series, and generate an exit beam in which the light beam from the light source device is deflected at a predetermined diffraction angle in response to a driving signal, A light source device comprising a plurality of reflecting mirrors disposed along the traveling direction of the light beam, each reflecting an exit beam generated from each of the plurality of acoustooptic modulation elements toward a corresponding drawing unit, and each of the plurality of acoustooptic modulation elements 1st, 2nd, ... The direction of deflection of the exit beam by the odd-numbered acousto-optic modulating element and the direction of deflection of the exit beam by the even-numbered acousto-optic modulation element are defined as the acousto-optic modulation element of Do it in the reverse direction.

Description

Pattern exposure device {PATTERN EXPOSURE DEVICE}

The present invention relates to a pattern exposure apparatus that scans spot light of a beam and projects it onto an object to be irradiated.

As disclosed in Japanese Patent Laid-Open Publication No. 61-134724 and Japanese Patent Laid-Open Publication No. 2001-133710, the laser beam from one laser oscillator (laser beam light source) is divided into two by a half mirror. In addition, a laser irradiation apparatus and a laser drawing apparatus that scan two laser beams on an object to be drawn by injecting each of the divided laser beams onto two polygon mirrors (polygon mirrors) are known. . In addition, in Japanese Unexamined Patent Application Publication No. 2001-133710, each of the divided two laser beams incident on the two polygon mirrors is modulated by an AOM (acoustic optical element) that turns on/off in response to drawing data. ) Is also disclosed.

However, in the beam scanning by the polygon mirror, the incident laser beam is effectively directed toward the object to be drawn during rotation of the polygon mirror depending on the number of reflection surfaces of the polygon mirror and the incident conditions of the optical system (fθ lens, etc.) behind the polygon mirror. There are times when there are periods that cannot be reflected. Therefore, as in the prior art, even if the laser beam is divided into two by a half mirror and incident on two polygon mirrors, there may be a period in which the laser beam cannot be effectively irradiated to the object to be drawn, that is, a non-drawing period. , The laser beam from the light source cannot be effectively utilized.

In a first aspect of the present invention, from each of a plurality of drawing units arranged along a second direction orthogonal to the first direction in which the substrate to be pattern-exposed moves, the light beam whose intensity is modulated according to the drawing data of the pattern is transmitted on the substrate. A pattern exposure apparatus for projecting to, in order to supply the light beam whose intensity is modulated according to the drawing data to each of the plurality of drawing units, based on the drawing data, on which the intensity of the light beam is set as a first intensity. A light source device including an (On) state and an optical modulator that switches to an Off state with a second intensity lower than the first intensity, and one of the plurality of drawing units to transmit the light beam from the light source device. In order to sequentially supply to each of the plurality of drawing units in time division, it is provided corresponding to each of the plurality of drawing units, and is arranged so that the light beam from the light source device passes in series, and the light beam from the light source device is supplied in response to a driving signal. A plurality of acoustooptic modulation elements for generating an emission beam deflected at a predetermined diffraction angle, and the emission beams generated from each of the plurality of acousto-optic modulation elements, disposed along a traveling direction of the light beam from the light source device, A plurality of reflection mirrors each reflecting toward the corresponding drawing unit are provided, and each of the plurality of acousto-optic modulation elements is first, second, and so on in the order in which the light beam from the light source device passes. The direction of deflection of the exit beam by the odd-numbered acousto-optic modulation element and the direction of deflection of the exit beam by the even-numbered acousto-optic modulation element are defined as the optical path of the light beam. It goes in the reverse direction with the in between.

1 is a diagram showing a schematic configuration of a device manufacturing system including an exposure apparatus for performing exposure processing on a substrate according to a first embodiment.
FIG. 2 is a diagram showing a support frame for supporting the drawing head and the rotating drum shown in FIG. 1.
3 is a diagram showing the configuration of a drawing head in FIG. 1.
4 is a detailed configuration diagram of the optical system shown in FIG. 3.
5 is a diagram showing a drawing line through which spot light is scanned by each of the scanning units shown in FIG. 3.
6 is a diagram showing a relationship between a polygon mirror of each scanning unit shown in FIG. 3 and a scanning direction of a drawing line.
FIG. 7 is a diagram for explaining a rotation angle of a polygon mirror capable of deflecting (reflecting) laser light so that the reflective surface of the polygon mirror shown in FIG. 3 enters the f-? lens.
FIG. 8 is a diagram schematically illustrating the optical path of the optical introduction system and a plurality of scanning units shown in FIG. 3.
9 is a diagram showing a configuration of a drawing head in a modification example of the first embodiment.
10 is a detailed configuration diagram of the optical system shown in FIG. 9.
11 is a diagram showing a configuration of a drawing head according to a second embodiment.
Fig. 12 is a diagram showing the optical system shown in Fig. 11;
FIG. 13 is a diagram schematically illustrating the optical path of the optical introduction system shown in FIG. 12 and a plurality of scanning units.
14 is a block diagram showing an example of a control circuit for rotationally driving each polygon mirror of a plurality of scanning units shown in FIG. 13.
15 is a timing chart diagram showing an example of the operation of the control circuit shown in FIG. 14.
16 is a block diagram showing an example of a circuit for generating drawing bit string data supplied to the drawing optical elements shown in FIGS. 11 to 13.
17 is a diagram showing a configuration of a light source device in a modification example of the second embodiment.
18 is a block diagram showing a configuration of a control unit for drawing control according to a third embodiment.
FIG. 19 is a diagram showing a time chart showing a signal state of each part and an oscillation state of a laser beam at the time of pattern drawing in the control unit of FIG. 18.
Fig. 20 is a time chart diagram showing a clock signal for oscillation of pulsed light produced by the control circuit of the light source device of Fig. 17;
Fig. 21 is a time chart diagram explaining a state in which the clock signal of Fig. 20 is corrected in order to correct the drawing magnification.
Fig. 22 is a diagram for explaining a method of correcting a drawing magnification in one drawing line (scan line).
23 is a diagram showing a schematic configuration of a device manufacturing system including an exposure apparatus for performing exposure processing on a substrate according to a fourth embodiment.
Fig. 24 is a detailed view of the rotating drum of Fig. 23 on which the substrate is wound.
25 is a diagram showing a drawing line of spot light and an alignment mark formed on a substrate.
26 is a configuration diagram of a beam switching member.
FIG. 27A is a diagram showing the switching of the optical path of the beam by the selection optical element as viewed from the +Z direction, and FIG. 27B is a diagram showing the switching of the beam by the selection optical element from the -Y direction.
28 is a diagram showing the optical configuration of a scanning unit.
FIG. 29 is a diagram showing the configuration of an origin sensor provided around the polygon mirror of FIG. 28.
30 is a time chart showing the relationship between the generation timing of the origin signal and the drawing start timing.
Fig. 31 is a configuration diagram of a sub-origin generation circuit for generating a sub-origin signal in which the origin signal is thinned out and the timing of its generation is delayed by a predetermined time.
FIG. 32 is a diagram showing a time chart of a sub-origin signal generated by the sub-origin generating circuit of FIG. 31;
33 is a block diagram showing an electrical configuration of an exposure apparatus.
34 is a time chart showing timings at which an origin signal, a sub-origin signal, and serial data are output.
FIG. 35 is a diagram showing the configuration of a drawing data output control unit shown in FIG. 33;
36 is a configuration diagram of a beam switching member according to a fifth embodiment.
FIG. 37 is a diagram illustrating an optical path when the position of the arrangement switching member in FIG. 36 is at a first position.
38 is a diagram showing a configuration of a beam switching control unit in a fifth embodiment.
39 is a diagram showing the configuration of the logic circuit of FIG. 38;
40 is a diagram illustrating a timing chart for explaining the operation of the logic circuit in FIG. 39.
41 is a configuration diagram of a beam switching member according to a sixth embodiment.
Fig. 42 is a diagram showing a configuration in a case where the arrangement of the selection optical element (acoustic optical modulation element) in the sixth embodiment is rotated by 90 degrees.
43 is a diagram showing a relationship between a transfer mode of a substrate and an arrangement of drawing lines according to Modification Example 3;
Fig. 44 is a diagram showing the configuration of a driver circuit of a selection optical element (acoustic optical modulation element) according to Modification Example 5. [Fig.
45 is a diagram showing a modified example of the driver circuit in FIG. 44;

A pattern drawing apparatus, a pattern drawing method, a beam scanning apparatus, a beam scanning method, a device manufacturing method, and a laser light source apparatus according to an aspect of the present invention will be described in detail below with reference to the accompanying drawings, showing preferred embodiments. do. In addition, aspects of the present invention are not limited to these embodiments, and include various modifications or improvements. That is, the constituent elements described below include those that can be easily assumed by a person skilled in the art, substantially the same, and the constituent elements described below can be appropriately combined. In addition, various omissions, substitutions, or changes of constituent elements can be made without departing from the gist of the present invention.

[First embodiment]

FIG. 1 is a diagram showing a schematic configuration of a device manufacturing system 10 including an exposure apparatus EX that exposes a substrate (irradiated object) FS according to a first embodiment. In the following description, unless otherwise noted, an XYZ orthogonal coordinate system in which the gravity direction is the Z direction is set, and the X, Y, and Z directions are described according to the arrows shown in the drawings do.

The device manufacturing system 10 is, for example, a manufacturing system in which a manufacturing line for manufacturing a flexible display as an electronic device, a flexible wiring, a flexible sensor, and the like is established. Hereinafter, it demonstrates on the premise of a flexible display as an electronic device. Examples of flexible displays include organic EL displays and liquid crystal displays. In the device manufacturing system 10, the substrate FS is delivered and delivered from a supply roll (not shown) in which a flexible sheet-like substrate (sheet substrate) FS is wound in a roll shape. Structure of a so-called roll-to-roll method in which various treatments are continuously performed on the substrate FS, and then the substrate FS after various treatments is wound with a recovery roll (not shown). Have. The substrate FS has a strip-shaped shape in which the moving direction of the substrate FS becomes a long direction (long), and the width direction becomes a short direction (short length). The substrate FS sent from the supply roll is sequentially subjected to various treatments by a process device PR1, an exposure device (pattern drawing device, a beam scanning device) EX, and a process device PR2, and the recovery roll Is wound up.

In addition, the X direction is a direction (carrying direction) from the process device PR1 to the process device PR2 via the exposure device EX in the horizontal plane. The Y direction is a direction orthogonal to the X direction in the horizontal plane, and is the width direction (short direction) of the substrate FS. The Z direction is a direction orthogonal to the X and Y directions (upward direction), and is parallel to the direction in which gravity acts.

As the substrate FS, for example, a resin film or a foil (foil) made of a metal such as stainless steel or an alloy is used. As the material of the resin film, for example, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, Among polystyrene resin and vinyl acetate resin, you may use what contained at least 1 or more. In addition, the thickness or rigidity (Young's modulus) of the substrate FS is a fold or irreversible mark on the substrate FS due to buckling when passing through the conveyance path of the exposure apparatus EX. It is just as long as it is within the range where no wrinkles occur. A film such as PET (polyethylene terephthalate) or PEN (polyethylene naphthalate) having a thickness of about 25 µm to 200 µm as a base material of the substrate FS is a typical example of a sheet substrate.

The substrate FS may receive heat in each process performed by the process device PR1, the exposure device EX, and the process device PR2, so that the substrate FS It is desirable to select ). For example, the thermal expansion coefficient can be suppressed by mixing an inorganic filler with a resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, or silicon oxide. In addition, the substrate FS may be a single-layer body of ultrathin glass with a thickness of about 100 μm manufactured by a float method or the like, and the resin film, foil, etc. It may also be a laminated body which bonded together.

By the way, the flexibility of the substrate FS does not mean shearing or breaking even when a force of about its own weight is applied to the substrate FS, but the substrate FS It refers to a property capable of bending. In addition, flexibility is also included in the property of bending by a force of about its own weight. Further, the degree of flexibility varies depending on the material, size, and thickness of the substrate FS, the layer structure formed on the substrate FS, and the environment such as temperature and humidity. Anyway, when the substrate FS is correctly wound on a member for changing the conveying direction such as various conveying rollers and rotating drums provided in the conveying path in the device manufacturing system 10 according to the first embodiment, it is buckled. If the board|substrate FS can be conveyed smoothly, it can be said that it is the range of flexibility, without causing a crease or breakage (a tear or crack occurs).

The process device PR1 performs a pre-process processing on the substrate FS exposed by the exposure device EX. The process apparatus PR1 sends the board|substrate FS which processed the previous process toward the exposure apparatus EX. The substrate FS sent to the exposure apparatus EX is a substrate (photosensitive substrate) in which a photosensitive functional layer (photosensitive layer, photosensitive layer) is formed on its surface by the treatment in the previous step.

This photosensitive functional layer is applied as a solution on the substrate FS and dried to form a layer (film). Typical of the photosensitive functional layer is photoresist (liquid or dry film shape), but it is a material that does not require development treatment, and the liquid repellency of the part irradiated with ultraviolet rays is modified. There is a photosensitive silane coupling agent (SAM) to be used, or a photosensitive reducing agent (還元劑) in which a plating reducing group is exposed on a part exposed to ultraviolet rays. When a photosensitive silane coupling agent is used as the photosensitive functional layer, the portion of the pattern exposed with ultraviolet rays on the substrate FS is modified from liquid repellency to lyophilic property. Therefore, by selectively applying a conductive ink (an ink containing conductive nanoparticles such as silver or copper) or a liquid containing a semiconductor material on the lyophilic portion, electrodes constituting a thin film transistor (TFT), etc. , Insulation, or a pattern layer to serve as a wiring or electrode for connection can be formed. When a photosensitive reducing agent is used as the photosensitive functional layer, a plating reducing group is exposed in the pattern portion exposed with ultraviolet rays on the substrate. Therefore, after exposure, the substrate FS is immediately immersed in a plating solution containing palladium ions or the like for a certain period of time, whereby a pattern layer made of palladium is formed (precipitated). Such plating treatment is an additive process, but in the case of an etching treatment as a subtractive process other than that, the substrate FS sent to the exposure apparatus EX is made of PET B PEN, a metallic thin film such as aluminum (Al) or copper (Cu) may be deposited on the entire surface or selectively, and a photoresist layer may be laminated thereon.

In the first embodiment, the exposure apparatus EX is an exposure apparatus of a straight drawing system without using a mask, and an exposure apparatus of a so-called raster scan system. The exposure apparatus EX irradiates a light pattern according to a predetermined pattern for an electronic device for a display, a circuit, or a wiring, on the irradiated surface (photosensitive surface) of the substrate FS supplied from the process apparatus PR1. . Although it will be described in detail later, the exposure apparatus EX conveys the substrate FS in the +X direction (sub-scan direction), while the spot light SP of the exposure beam (laser light, irradiation light) LB is transferred to the substrate. While scanning one-dimensionally in a predetermined scanning direction (Y direction) on the (FS) image (on the irradiated surface of the substrate FS), the intensity of the spot light SP is high-speed according to the pattern data (drawing data, drawing information). Modulate (on/off) with As a result, a light pattern according to a predetermined pattern such as an electronic device, a circuit, or a wiring is drawn and exposed on the surface (photosensitive surface) of the substrate FS as the irradiated surface. That is, with the sub-scan of the substrate FS and the main scan of the spot light SP, the spot light SP is relatively two-dimensionally scanned on the irradiated surface of the substrate FS, and a predetermined pattern is drawn on the substrate FS. Exposed. In addition, since the substrate FS is conveyed along the conveyance direction (+X direction), the exposure area W to which the pattern is exposed by the exposure apparatus EX has a predetermined interval along the long direction of the substrate FS. A plurality of pieces are provided (see Fig. 5). Since an electronic device is formed in this exposure region W, the exposure region W is also an electronic device formation region. Further, since the electronic device is constituted by overlapping a plurality of pattern layers (layers on which patterns are formed), patterns corresponding to each layer may be exposed by the exposure apparatus EX.

The process apparatus PR2 performs post-process processing (for example, a plating process, a developing/etching process, etc.) on the substrate FS exposed by the exposure apparatus EX. Subsequently, a pattern layer of the device is formed on the substrate FS by processing in the subsequent process.

As described above, since the electronic device is constructed by overlapping a plurality of pattern layers with each other, one pattern layer is generated through at least each process of the device manufacturing system 10. Therefore, in order to generate an electronic device, each process of the device manufacturing system 10 as shown in Fig. 1 must be performed at least twice. For this reason, the pattern layer can be laminated|stacked by attaching to the other device manufacturing system 10 using the recovery roll on which the board|substrate FS was wound up as a supply roll. By repeating such an operation, an electronic device is formed. Therefore, the substrate FS after processing is in a state in which a plurality of electronic devices (exposure regions W) are connected along the long direction of the substrate FS at predetermined intervals. That is, the board|substrate FS is a board|substrate for multi-faceted use.

The recovery roll from which the substrate FS formed in a continuous state of the electronic device may be collected on a dicing apparatus (not shown). The dicing apparatus equipped with the recovery roll divides (dices) the processed substrate FS for each electronic device (electronic device formation region W) to obtain a plurality of electronic devices. The dimensions of the substrate FS are, for example, about 10 cm to 2 m in the width direction (the direction in which it becomes short), and the dimension in the long direction (in the direction in which it becomes long) is 10 m or more. In addition, the dimensions of the substrate FS are not limited to the above dimensions.

Next, the exposure apparatus EX will be described in detail. The exposure apparatus EX is stored in a temperature control chamber ECV. By maintaining the inside of the temperature control chamber ECV at a predetermined temperature, a change in shape due to the temperature of the substrate FS conveyed therein is suppressed. The temperature control chamber ECV is disposed on the installation surface E of the manufacturing plant via the passive or active vibration isolation units SU1 and SU2. The vibration isolation units SU1 and SU2 reduce vibration from the installation surface E. This mounting surface E may be the floor surface itself of the factory, or may be a surface on a mounting table (pedestal) provided on the floor surface to make a horizontal surface. The exposure apparatus EX is the substrate transfer mechanism 12 ), a light source device (pulse light source device, laser light source device) 14, a drawing head 16, and a control device 18.

The substrate conveyance mechanism 12 conveys the substrate FS conveyed from the process apparatus PR1 at a predetermined speed in the exposure apparatus EX, and then delivers it to the process apparatus PR2 at a predetermined speed. The substrate transport mechanism 12 defines a transport path of the substrate FS transported in the exposure apparatus EX. The substrate conveyance mechanism 12 is, in order, from the upstream side (-X direction side) of the conveyance direction of the substrate FS, the edge position controller EPC, the drive roller R1, the tension adjustment roller RT1, and the rotating drum ( It has a cylindrical drum (DR), a tension adjustment roller RT2, a drive roller R2, and a drive roller R3.

The edge position controller EPC adjusts the position in the width direction of the board|substrate FS conveyed from the process apparatus PR1 (a Y direction, the short direction of the board|substrate FS). That is, the edge position controller EPC has a position at the end (edge) in the width direction of the substrate FS being conveyed in a state where a predetermined tension is applied, with respect to the target position. The substrate FS is moved in the width direction so as to fall within a range (permissible range) of about µm, and the position of the substrate FS in the width direction is adjusted. The edge position controller (EPC) has a roller over which the board (FS) spans, and an edge sensor (end detection part) (not shown) that detects the position of the edge (edge) in the width direction of the board (FS), and the edge sensor detects it. Based on one detection signal, the roller of the edge position controller EPC is moved in the Y direction, and the position of the substrate FS in the width direction is adjusted. The drive roller R1 rotates while maintaining both the front and back sides of the substrate FS conveyed from the edge position controller EPC, and conveys the substrate FS toward the rotating drum DR. In addition, the edge position controller EPC is the substrate FS so that the long direction of the substrate FS wound around the rotating drum DR is always orthogonal to the central axis (rotation axis) AXo of the rotating drum DR. The parallelism between the rotational axis and the Y axis of the roller of the edge position controller (EPC) is adjusted so as to properly adjust the position in the width direction of and to correct the inclination error in the traveling direction of the substrate FS. You may adjust as appropriate.

The rotating drum DR has a central axis AXo extending in the Y direction and intersecting the direction in which gravity acts, and a cylindrical outer circumferential surface having a certain radius from the central axis AXo, While supporting a part of the substrate FS along the outer circumferential surface (circumferential surface) in a long direction, the substrate FS is transported in the +X direction by rotating about the central axis AXo. The rotating drum DR supports an exposure area (part) on the substrate FS on which the beam LB (spot light SP) from the drawing head 16 is projected with its circumferential surface. Shafts Sft supported by annular bearings are provided on both sides of the rotary drum DR in the Y direction so that the rotary drum DR rotates around the central axis AXo. This shaft (Sft) rotates around the central axis (AXo) by being given a rotational torque from an unillustrated rotation drive source (e.g., composed of a motor or a reduction mechanism) controlled by the control device 18. . In addition, for convenience, a plane including the central axis AXo and parallel to the YZ plane is called a central plane Poc.

The drive rollers R2 and R3 are disposed at predetermined intervals along the conveyance direction (+X direction) of the substrate FS, and give a predetermined sag (space) to the substrate FS after exposure. Like the drive roller R1, the drive rollers R2 and R3 rotate while maintaining both the front and back sides of the board|substrate FS, and convey the board|substrate FS toward the process apparatus PR2. The drive rollers R2 and R3 are provided on the downstream side (+X direction side) of the conveyance direction with respect to the rotary drum DR, and this drive roller R2 is the upstream side of the conveyance direction with respect to the drive roller R3 ( It is provided in the -X direction side). The tension adjustment rollers RT1 and RT2 are pressed in the -Z direction, and give a predetermined tension in the elongated direction to the substrate FS wound around and supported by the rotating drum DR. As a result, the length applied to the substrate FS applied to the rotating drum DR stabilizes the tension in the elongated direction within a predetermined range. Further, the control device 18 rotates the drive rollers R1 to R3 by controlling a rotation drive source (eg, constituted by a motor or a speed reducer) not shown.

The light source device 14 has a light source (pulse light source) and emits a pulsed beam (pulse light, laser light) LB. This beam LB is ultraviolet light having a peak wavelength in a wavelength band of 370 nm or less, and the oscillation frequency (emission frequency) of the beam LB is referred to as Fs. The beam LB emitted from the light source device 14 is incident on the drawing head 16. The light source device 14 emits light and emits the beam LB at the emission frequency Fs under the control of the control device 18. The configuration of this light source device 14 will be described in detail later, but a semiconductor laser element that generates pulsed light in the infrared wavelength band, a fiber amplifier, and converts the amplified pulsed light in the infrared wavelength band into pulsed light in the ultraviolet wavelength band. It is also possible to use a fiber amplifier laser light source that is constituted of a wavelength conversion element (harmonic generating element) or the like, the oscillation frequency Fs is several hundred MHz, and a pulsed light of high luminance ultraviolet rays having an emission time of one pulse light of about picoseconds is obtained.

The drawing head 16 is provided with a plurality of scanning units Un(U1 to U6) to which the beams LB are respectively incident. The drawing head 16 is on a part of the substrate FS supported by the circumferential surface of the rotating drum DR of the substrate transfer mechanism 12 by a plurality of scanning units (drawing units) U1 to U6, A predetermined pattern is drawn. The drawing head 16 is a so-called multi-beam type drawing head 16 in which a plurality of scanning units U1 to U6 of the same configuration are arranged. Since the drawing head 16 repeatedly exposes the electronic device pattern to the substrate FS, the exposure area (electronic device formation area) W to which the pattern is exposed is determined along the long direction of the substrate FS. A plurality of pieces are provided at intervals of (see Fig. 5). The control device 18 controls each unit of the exposure apparatus EX, and causes each unit to perform processing. The control device 18 includes a computer and a storage medium in which a program is stored, and functions as the control device 18 of the first embodiment by the computer executing a program stored in the storage medium.

FIG. 2 is a diagram showing a support frame (device column) 30 that supports a plurality of scanning units (drawing units) Un and rotating drum DR of the drawing head 16. The support frame 30 has a main body frame 32, a three-point support part 34, and a drawing head support part 36. The support frame 30 is stored in the temperature control chamber ECV. The main body frame 32 rotatably supports the rotating drum DR and the tension adjustment rollers RT1 (not shown) and RT2 via an annular bearing. The three-point support portion 34 is provided on the upper end of the main frame 32 and supports the drawing head support portion 36 provided above the rotary drum DR at three points.

The drawing head support part 36 supports the scanning units Un(U1 to U6) of the drawing head 16. The drawing head support 36 is a downstream side (+X direction side) in the conveying direction of the scanning units U1, U3, U5 with respect to the central axis AXo of the rotating drum DR, and in the width direction of the substrate FS. It is supported in parallel according to (see Fig. 1). Moreover, the drawing head support part 36 is the upstream side (-X direction side) of the conveyance direction with respect to the central axis AXo of the scanning units U2, U4, U6, and the width direction (Y direction) of the board|substrate FS ) In parallel (see Fig. 1). Here, the drawing width in the Y direction (the scanning range of the spot light SP, the drawing line SLn) by one scanning unit Un is about 20 to 50 mm, as an example, the odd-numbered scanning unit U1 , U3, U5) and three even-numbered scanning units (U2, U4, U6) in total, 6 scanning units (Un) are arranged in the Y direction, so that the width in the Y direction that can be drawn is widened to about 120 to 300 mm All.

3 is a diagram showing the configuration of the drawing head 16. In the first embodiment, the exposure apparatus EX includes two light source devices 14 (14a, 14b). The drawing head 16 is a light introduction optical system (beam switching member) that guides a plurality of scanning units U1 to U6 and a beam LB from the light source device 14a to the plurality of scanning units U1, U3, U5 ) 40a and a light introduction optical system (beam switching member) 40b for guiding the beam LB from the light source device 14b to the plurality of scanning units U2, U4, and U6.

First, the light introduction optical system (beam switching member) 40a will be described with reference to FIG. 4. In addition, since the light introduction optical systems 40a and 40b have the same configuration, the description of the light introduction optical system 40a is described here, and the description of the light introduction optical system 40b is omitted.

The light introduction optical system 40a is from the light source device 14 (14a) side, the condensing lens 42, collimating lens 44, reflection mirror 46, condensing lens 48, and selection optics Element 50, reflection mirror 52, collimating lens 54, condensing lens 56, selection optical element 58, reflecting mirror 60, collimating lens 62, condensing lens 64 , An optical element 66 for selection, a reflection mirror 68, and an absorber 70.

The condensing lens 42 and the collimating lens 44 expand the beam LB emitted from the light source device 14a. Specifically, first, the condensing lens 42 converges the beam LB to a focal position on the rear side of the condensing lens 42, and the collimating lens 44 diverges after converging by the condensing lens 42. The beam LB is made into parallel light having a predetermined beam diameter (for example, several mm).

The reflecting mirror 46 reflects the beam LB that has become parallel light by the collimating lens 44 and irradiates the optical element 50 for selection. The condensing lens 48 condenses (converges) the beam LB incident on the selection optical element 50 so as to become a beam waist within the selection optical element 50. The optical element for selection 50 has transmittance with respect to the beam LB, and, for example, an acousto-optic modulator (AOM: Acousto-Optic Modulator) is used. When an ultrasonic signal (high frequency signal) is applied, the AOM diffracts the incident beam (LB) (0th order) at a diffraction angle according to the frequency of the high frequency, and diffracts the first order diffracted light (beam LBn) It is generated by Further, in the first embodiment, the beam LBn emitted from each of the plurality of optical elements for selection 50, 58, 66 as first-order diffracted light and incident on the corresponding scanning units U1, U3, U5 Is represented by LB1, LB3, and LB5, and each of the selection optical elements 50, 58, and 66 is handled as achieving a function of deflecting the optical path of the beam LB from the light source device 14 (14a). Each of the optical elements for selection 50, 58, 66 may have the same configuration, function, operation, and the like. The selection optical elements 50, 58, 66 turn on/off the generation of diffracted light by diffracting the incident beam LB in accordance with the on/off of the driving signal (high frequency signal) from the control device 18.

In detail, when the driving signal (high frequency signal) from the control device 18 is off, the selection optical element 50 irradiates the incident beam LB to the selection optical element 58 in the next stage. do. On the other hand, when the driving signal (high frequency signal) from the control device 18 is on, the selection optical element 50 diffracts the incident beam LB, and reflects the beam LB1 as the first-order diffracted light. We investigate (52). The reflection mirror 52 reflects the incident beam LB1 and irradiates the collimated lens 100 of the scanning unit U1. That is, the control device 18 switches (drives) the selection optical element 50 on and off, so that the selection optical element 50 switches whether or not the beam LB1 is incident on the scanning unit U1. .

Between the selection optical element 50 and the selection optical element 58, a collimating lens 54 for returning the beam LB irradiated to the selection optical element 58 into parallel light, and a collimating lens A condensing lens 56 for condensing (converging) the beam LB which has become a parallel light by 54 to become a beam west in the selection optical element 58 is provided in the above order.

Like the selection optical element 50, the selection optical element 58 has transmittance to the beam LB, and, for example, an acousto-optic modulation element AOM is used. When the driving signal (high frequency signal) sent from the control device 18 is turned off, the optical element for selection 58 transmits the incident beam LB as it is and irradiates the optical element for selection 66 to control. When the drive signal (high frequency signal) sent from the device 18 is on, the incident beam LB is diffracted, and the beam LB3, which is the first order diffracted light, is irradiated onto the reflection mirror 60. The reflection mirror 60 reflects the incident beam LB3 and irradiates the collimated lens 100 of the scanning unit U3. That is, the control device 18 switches the selection optical element 58 on and off, so that the selection optical element 58 switches whether or not the beam LB3 is incident on the scanning unit U3.

Between the selection optical element 58 and the selection optical element 66, a collimating lens 62 for returning the beam LB irradiated to the selection optical element 66 to parallel light, and a collimating lens The condensing lens 64 for condensing (converging) the beam LB which has become a parallel light by 62 to become a beam west in the selection optical element 66 is provided in the above order.

Like the selection optical element 50, the selection optical element 66 has transmittance to the beam LB, and, for example, an acousto-optic modulation element AOM is used. When the driving signal (high frequency signal) from the control device 18 is off, the selection optical element 66 irradiates the incident beam LB toward the absorber 70, and the control device 18 When the driving signal (high frequency signal) of is turned on, the incident beam LB is diffracted, and the beam LB5, which is the first order diffracted light, is irradiated toward the reflection mirror 68. The reflection mirror 68 reflects the incident beam LB5 and irradiates the collimated lens 100 of the scanning unit U5 with it. That is, the control device 18 switches the selection optical element 66 on and off, so that the selection optical element 66 switches whether or not the beam LB5 is incident on the scanning unit U5. The absorber 70 is a light trap that absorbs the beam LB for suppressing leakage of the beam LB to the outside.

Briefly explaining the light introduction optical system 40b, whether the optical elements 50, 58, and 66 for selection of the light introduction optical system 40b cause the beam LB to be incident on the scanning units U2, U4, and U6. Switch. In this case, the reflecting mirrors 52, 60, 68 of the optical system 40b reflect the beams LB2, LB4, LB6 emitted from the optical elements 50, 58, 66 for selection, and the scanning unit U2, The collimated lens 100 of U4 and U6 is irradiated.

In addition, since the actual acousto-optic modulation element (AOM) has an efficiency of generating the first-order diffracted light about 80% of the zero-order light, the beams (LB1 (LB2) deflected in each of the optical elements for selection 50, 58, 66) , LB3 (LB4), LB5 (LB6)) are lower than the intensity of the original beam LB In addition, when any one of the optical elements 50, 58, 66 for selection is on, diffraction The zero-shielding light that does not go straight ahead remains about 20%, but it is finally absorbed by the absorber 70.

Next, a plurality of scanning units Un(U1 to U6) shown in FIG. 3 will be described. The scanning unit Un projects the beam LBn from the light source device 14 (14a, 14b) to converge to the spot light SP on the irradiated surface of the substrate FS, and transmits the spot light SP. On the irradiated surface of the substrate FS, along a predetermined linear drawing line (scanning line) SLn, scanning is performed in one dimension by a rotating polygon mirror PM. Moreover, the drawing line SLn of the scanning unit U1 is denoted by SL1, and similarly, the drawing line SLn of the scanning units U2 to U6 is denoted by SL2 to SL6.

FIG. 5 is a diagram showing drawing lines SLn (SL1 to SL6) on which spot light SP is scanned by each scanning unit Un(U1 to U6). As shown in Fig. 5, each scanning unit Un(U1 to U6) covers the scanning area so that all of the plurality of scanning units Un(U1 to U6) cover all of the width direction of the exposure area W. I share. Thereby, each scanning unit Un(U1 to U6) can draw a pattern for each of a plurality of regions divided in the width direction of the substrate FS. In principle, the length of each drawing line SLn (SL1 to SL6) is the same. That is, the scanning distance of the spot light SP of the beam LBn scanned along each of the drawing lines SL1 to SL6 is in principle the same. In addition, when it is desired to increase the width of the exposure region W, it can be coped with by increasing the length of the drawing line SLn itself or by increasing the number of scanning units Un provided in the Y direction.

Further, each of the actual drawing lines SLn (SL1 to SL6) is set slightly shorter than the maximum length at which the spot light SP can actually scan the irradiated surface. For example, when the drawing magnification in the main scanning direction (Y direction) is the initial value (no magnification correction), if the maximum length of the drawing line SLn capable of drawing a pattern is 30 mm, the maximum length of the spot light SP on the irradiated surface is The scanning length is set to about 31 mm by providing a margin of about 0.5 mm in each of the scanning start point side and the scanning end point side of the drawing line SLn. By setting in this way, it becomes possible to finely adjust the position of the drawing line SLn of 30 mm in the main scanning direction or to finely adjust the drawing magnification within the range of the maximum scanning length of the spot light SP. The maximum scanning length of the spot light SP is not limited to 31 mm, and the aperture of the fθ lens FT (see Fig. 3) mainly provided behind the polygon mirror (rotating polygon mirror) PM in the scanning unit Un It is determined by (口徑), and may be 31 mm or more.

The plurality of drawing lines (scan lines) SL1 to SL6 are arranged in two rows in the circumferential direction of the rotating drum DR with the center surface Poc therebetween. The drawing lines SL1, SL3, and SL5 are located on the substrate FS on the downstream side (+X direction side) in the conveyance direction with respect to the center plane Poc. The drawing lines SL2, SL4, SL6 are located on the substrate FS on the upstream side (-X direction side) in the conveyance direction with respect to the central plane Poc. Each drawing line SLn (SL1 to SL6) is substantially parallel along the width direction of the substrate FS, that is, along the central axis AXo of the rotating drum DR, and the length in the width direction of the substrate FS Shorter than

Drawing lines SL1, SL3, SL5 are arranged at predetermined intervals along the width direction (scanning direction, Y direction) of the substrate FS, and the drawing lines SL2, SL4, SL6 are similarly arranged on the substrate FS. Are arranged at predetermined intervals along the width direction (scanning direction, Y direction). At this time, the drawing line SL2 is disposed between the drawing line SL1 and the drawing line SL3 in the width direction of the substrate FS. Likewise, the drawing line SL3 is disposed between the drawing line SL2 and the drawing line SL4 in the width direction of the substrate FS. The drawing line SL4 is disposed between the drawing line SL3 and the drawing line SL5 in the width direction of the substrate FS. The drawing line SL5 is disposed between the drawing line SL4 and the drawing line SL6 in the width direction of the substrate FS. That is, the drawing lines SL1 to SL6 are arranged to cover all of the width direction of the exposure area W drawn on the substrate FS.

The scanning direction of the spot light SP of the beam LBn (LB1, LB3, LB5) scanned along each of the odd-numbered drawing lines SL1, SL3, SL5 is a one-dimensional direction, and is in the same direction. Has been. The scanning direction of the spot light SP of the beam LBn (LB2, LB4, LB6) scanned along each of the even-numbered drawing lines SL2, SL4, and SL6 is a one-dimensional direction, and is in the same direction. Has been. The scanning direction of the beam LBn (spot light SP) scanned along the drawing lines SL1, SL3 and SL5, and the beam LBn (spot light) scanned along the drawing lines SL2, SL4, SL6 The scanning directions of (SP)) are opposite to each other. Specifically, the scanning direction of the beam LBn (spot light SP) scanned along the drawing lines SL2, SL4 and SL6 is the +Y direction, and is scanned along the drawing lines SL1, SL3, SL5. The scanning direction of the beam LBn (spot light SP) is the -Y direction. This is due to the use of a polygon mirror PM rotating in the same direction as the polygon mirror PM of the scanning units U1 to U6. Thereby, the drawing start position (the drawing start point (the position of the scanning start point)) of the drawing lines SL1, SL3, SL5 and the drawing start position of the drawing lines SL2, SL4, SL6 are adjacent in the Y direction. (Or some overlap). In addition, the drawing end position (position of the drawing end point (scan end point)) of the drawing lines SL3 and SL5 and the drawing end position of the drawing lines SL2 and SL4 are adjacent (or partially overlapped) in the Y direction. When each drawing line SLn is arranged so that the ends of the drawing lines SLn adjacent to each other in the Y direction partially overlap each other, for example, the drawing start position with respect to the length of each drawing line SLn Or, it is good to overlap within a range of several percent or less in the Y direction including the drawing end position.

In addition, the width of the drawing line SLn in the sub-scan direction is a thickness corresponding to the size (diameter) φ of the spot light SP. For example, when the size φ of the spot light SP is 3 μm, the width of the drawing line SLn in the sub-scan direction is also 3 μm. The spot light SP may be projected along the drawing line SLn so as to overlap by a predetermined length (for example, half of the size φ of the spot light SP). In addition, when drawing lines SLn (e.g., drawing lines SL1 and SL2) adjacent to each other in the Y direction are adjacent to each other (connected), a predetermined length (for example, It is good to overlap by half of the size φ of the spot light SP).

In the case of the first embodiment, since the beam LB from the light source device 14 is a pulsed light, the spot light SP projected on the drawing line SLn during the main scanning is the oscillation of the beam LB. It becomes discrete according to the frequency Fs. Therefore, it is necessary to overlap the spot light SP projected by one pulse light of the beam LB and the spot light SP projected by the next one pulse light in the main scanning direction. The amount of overlap is set by the size φ of the spot light SP, the scanning speed Vs of the spot light SP, and the oscillation frequency Fs of the beam LB, but the intensity distribution of the spot light SP is Gauss distribution. In the case of approximation by φ/2, it is good to overlap the effective diameter size φ determined by 1/e ² (or 1/2) of the peak intensity of the spot light SP. Therefore, in the sub-scan direction (direction orthogonal to the drawing line SLn), the substrate FS is the spot light SP between one scan and the next scan of the spot light SP along the drawing line SLn. It is desirable to set it to move by a distance of approximately 1/2 or less of the effective size φ of ). In addition, the exposure amount to the photosensitive functional layer on the substrate FS can be set by adjusting the peak value of the beam LB (pulse light), but in a situation where the intensity of the beam LB cannot be increased, it is desired to increase the exposure amount. In the case, by any one of a decrease in the scanning speed Vs in the main scanning direction of the spot light SP, an increase in the oscillation frequency Fs of the beam LB, or a decrease in the conveyance speed in the sub-scan direction of the substrate FS, etc. The amount of overlap in the main or sub-scan direction of the spot light SP may be increased to 1/2 or more of the effective size ?.

Next, the configuration of the scanning unit Un shown in FIG. 3 will be described. In addition, since each of the scanning units U1 to U6 has the same configuration, only the scanning unit U1 will be described here. The scanning unit U1 is a collimating lens 100 behind the reflecting mirror 52 shown in FIG. 4, a reflecting mirror 102, a condensing lens 104, an optical element 106 for drawing, and a collimating lens. 108), reflective mirror 110, cylindrical lens (CYa), reflective mirror 114, polygon mirror (light scanning member, deflecting member) (PM), fθ lens (FT), cylindrical lens (CYb) And a reflection mirror 122. The collimating lenses 100 and 108, the reflecting mirrors 102, 110, 114, 122, the condensing lens 104, the cylindrical lenses CYa and CYb, and the f? lens FT constitute an optical lens system.

The reflection mirror 102 reflects the beam LB1 incident from the collimating lens 100 in the -Z direction in FIG. 3, and makes it incident on the drawing optical element 106 as a drawing optical modulator. The condensing lens 104 condenses (converges) the beam LB1 (parallel beam) incident on the drawing optical element 106 to become a beam west within the drawing optical element 106. The optical element 106 for drawing has transparency to the beam LB1, and, for example, an acousto-optic modulation element (AOM) is used. When the driving signal (high frequency signal) from the control device 18 is in the off state, the drawing optical element 106 irradiates the incident beam LB1 onto a shielding plate or absorber (not shown), and the control device 18 ) When the driving signal (high frequency signal) is turned on, the incident beam LB1 is diffracted, and the first-order diffracted light (writing beam, that is, the intensity modulated beam LB1 according to the pattern data) is reflected. The mirror 110 is irradiated. The shielding plate and the absorber are for suppressing leakage of the beam LB1 to the outside.

A collimating lens 108 is provided between the reflection mirror 110 and the optical element 106 for drawing, which makes the beam LB1 incident on the reflection mirror 110 a parallel light. The reflection mirror 110 reflects the incident beam LB1 toward the reflection mirror 114 in the -X direction, and the reflection mirror 114 reflects the incident beam LB1 toward the polygon mirror PM. The polygon mirror (rotating polyhedron) PM reflects the incident beam LB1 toward the f? lens FT having an optical axis parallel to the X axis in the -X direction. The polygon mirror PM deflects (reflects) the incident beam LB1 in a plane parallel to the XY plane in order to scan the spot light SP of the beam LB1 on the irradiated surface of the substrate FS. Specifically, the polygon mirror PM includes a rotation axis AXp extending in the Z direction and a plurality of reflection surfaces RP formed around the rotation axis AXp (in the first embodiment, eight reflection surfaces RP). ). By rotating this polygon mirror PM about the rotation axis AXp in a predetermined rotation direction, the reflection angle of the pulse-shaped beam LB1 irradiated to the reflection surface RP can be continuously changed. Thereby, the reflection direction of the beam LB1 is deflected by one reflection surface RP, and the spot light SP of the beam LB1 irradiated on the irradiated surface of the substrate FS is transmitted in the scanning direction (substrate (FS) can be scanned in the width direction and Y direction). That is, the polygon mirror PM deflects the incident beam LB1, and scans the spot light SP along the drawing line (scan line) SL1 shown in FIG. 5. Further, the polygon mirror PM rotates at a constant speed by a rotation drive source (eg, constituted by a motor or a deceleration mechanism) not shown. This rotation drive source is controlled by the control device 18.

Since the spot light SP of the beam LB1 can be scanned along the drawing line SL1 by one reflection surface RP of the polygon mirror PM, with one rotation of the polygon mirror PM, The number of drawing lines SL1 on which the spot light SP is scanned on the irradiated surface of the substrate FS is maximally equal to the number of reflection surfaces RP of eight. As described above, the effective length (e.g., 30 mm) of the drawing line SL1 is the maximum scanning length (e.g., 31 mm) capable of scanning the spot light SP by the polygon mirror PM It is set to the following length, and in the initial setting (design), the center point of the drawing line SL1 is set at the center of the maximum scanning length.

In addition, as an example, the effective length of the drawing line SL1 is set to 30 mm, and the spot light SP having an effective size φ of 3 μm is overlapped by 1.5 μm, and the drawing line SL1 is formed. Therefore, in the case of irradiation on the irradiated surface of the substrate FS, the number of spot lights SP irradiated in one scan (the number of pulses of the beam LB from the light source device 14) is 20000 (30 mm/ 1.5㎛). In addition, if the scanning time of the spot light SP along the drawing line SL1 is set to 200 μsec, since 20000 times of the pulse-shaped spot light SP must be irradiated during this time, the emission frequency Fs of the light source device 14 is Fs≥20000 times/200μsec=100MHz.

Returning to the description of the configuration of the scanning unit U1, the cylindrical lens CYa provided between the reflecting mirror 110 and the reflecting mirror 114 relates to the Z direction (non-scanning direction) orthogonal to the scanning direction. The beam LB1 is condensed (converged) in a long elliptical shape (slit shape) extending in a direction parallel to the XY plane on the reflective surface RP of the polygon mirror PM. With this cylindrical lens CYa, even when the reflective surface RP is inclined with respect to the Z direction (Z axis) (when there is a plane tilt error), the effect can be suppressed. , It is suppressed that the irradiation position of the spot light by the beam LB1 irradiated on the substrate FS shifts in the conveyance direction (X direction) of the substrate FS.

The beam LB1 reflected by the polygon mirror PM is irradiated to the f? lens FT including a condensing lens. The fθ lens FT having an optical axis extending in the X-axis direction transmits the beam LB1 reflected by the polygon mirror PM to be parallel to the X-axis in a plane parallel to the XY plane. It is a telecentric (telecentric) scanning lens that projects on ). The incident angle θ of the beam LB1 to the fθ lens FT changes according to the rotation angle θ/2 of the polygon mirror PM. The fθ lens FT projects the beam LB1 at an image height position on the irradiated surface of the substrate FS in proportion to the incident angle θ. If the focal length is fo and the image height position is y, the fθ lens FT has a relationship of y=fo·θ. Therefore, by this f? lens FT, it becomes possible to scan the beam LB1 (spot light SP) accurately in the Y direction at a constant velocity. When the angle of incidence to the fθ lens FT is 0 degrees, the beam LB1 incident on the fθ lens FT travels along the optical axis of the fθ lens FT.

The beam LB1 irradiated from the f? lens FT is irradiated as a spot light SP on the substrate FS through the reflection mirror 122. The cylindrical lens CYb provided between the fθ lens FT and the reflective mirror 122 transmits the spot light SP of the beam LB1 condensed on the substrate FS to about several μm in diameter (for example, For example, 3 µm) is a fine circle, and the bus line is parallel to the Y direction. Thereby, the drawing line SL1 (refer FIG. 5) extending in the Y direction by the spot light (scanning spot) SP is defined on the substrate FS. When there is no cylindrical lens CYb, spot light SP condensed on the substrate FS by the action of the cylindrical lens CYa in front of the polygon mirror PM is in the scanning direction (Y direction) ) And it becomes a long elliptical elongated in the direction perpendicular to (X direction).

In this way, with the substrate FS being conveyed in the X direction, the spot light SP of the beam LB is scanned in the scanning direction (Y direction) by each of the scanning units U1 to U6, thereby The pattern of is drawn on the substrate FS. Each of these scanning units U1 to U6 is disposed on the drawing head support 36 so as to scan different regions on the substrate FS. In addition, the dimension (length of the drawing line) in the scanning direction of the spot light SP on the substrate FS is Ds, and the scanning speed (the relative scanning speed) of the spot light SP on the substrate FS is Vs. In this case, the oscillation frequency Fs of the beam LB needs to satisfy the relationship Fs≥Vs/Ds. Since the beam LB is a pulsed light, if the oscillation frequency Fs does not satisfy the relationship Fs≥Vs/Ds, the spot light SP of the beam LB on the substrate FS at a predetermined interval (gap) ) Is being investigated. If the oscillation frequency Fs satisfies the relationship of Fs≥Vs/Ds, the spot light SP can be irradiated onto the substrate FS so that they overlap each other with respect to the scanning direction. As a result, a continuous linear pattern can be well drawn on the substrate FS. Further, the scanning speed Vs of the spot light SP increases as the rotational speed of the polygon mirror PM increases.

6 is a diagram showing the relationship between the polygon mirror PM of each scanning unit U1 to U6 and the scanning direction of a plurality of drawing lines SLn (SL1 to SL6). In a plurality of scanning units (U1, U3, U5) and a plurality of scanning units (U2, U4, U6), the reflecting mirror 114, the polygon mirror (PM), and the fθ lens (FT) is a central plane (Poc) It has a symmetrical configuration with respect to. For this reason, by rotating the polygon mirror PM of each of the scanning units U1 to U6 in the same direction (counterclockwise), each of the scanning units U1, U3, U5 moves from the drawing start position toward the drawing end position- The spot light SP of the beam LB is scanned in the Y direction, and each of the scanning units U2, U4, U6 is the spot light SP of the beam LB in the +Y direction from the drawing start position toward the drawing end position. Is injected. In addition, by making the rotation direction of the polygon mirror PM of each scanning unit U2, U4, U6 reverse to the rotation direction of the polygon mirror PM of each scanning unit U1, U3, U5, each scanning unit The scanning direction of the spot light SP of the beams LB of (U1 to U6) may be aligned in the same direction (+Y direction or -Y direction).

Here, since the polygon mirror PM is rotating, the angle of the reflective surface RP also changes with the passage of time. Therefore, the rotation angle α of the polygon mirror PM that can cause the beam LB incident on the specific reflective surface RP of the polygon mirror PM to be incident on the f? lens FT is limited.

7 is a rotation angle of the polygon mirror PM capable of deflecting (reflecting) the beam LBn so that the reflective surface RP of the polygon mirror PM of the scanning unit Un is incident on the fθ lens FT. It is a figure for explaining α. This rotation angle α is the polygon mirror PM of the scanning unit Un capable of scanning the spot light SP on the irradiated surface of the substrate FS by one reflective surface RP. The maximum scanning rotation angle range. Hereinafter, the rotation angle α is referred to as the maximum scanning rotation angle range. The period during which the polygon mirror PM rotates by the maximum scanning rotation angle range α becomes the effective scanning period (maximum scanning time) of the spot light SP. This maximum scanning rotation angle range α corresponds to the maximum scanning length of the above-described drawing line SLn, and the larger the maximum scanning rotation angle range α becomes, the longer the maximum scanning length becomes. The rotation angle β is from the angle of the polygon mirror PM when the incidence of the beam LB to the specific reflective surface RP starts, and when the incidence to the specific reflective surface RP ends. The rotation angle up to the angle of the polygon mirror PM is shown. That is, the rotation angle β is an angle at which the polygon mirror PM rotates for one side of the reflective surface RP. The rotation angle β is defined by the number Np of the reflective surfaces RP of the polygon mirror PM, and can be expressed as β≒360/Np. Therefore, the specific reflection surface RP of the polygon mirror PM of the scanning unit Un is unable to scan the spot light SP on the irradiated surface of the substrate FS, that is, the polygon mirror PM. The non-scanning rotation angle range γ of the polygon mirror PM in which the reflected light reflected from the specific reflection surface RP cannot be incident on the fθ lens FT is represented by a relational expression of γ=β-α. The period in which the polygon mirror PM rotates by the non-scanning rotation angle range γ becomes an invalid scanning period of the spot light SP. In this non-scanning rotation angle range γ, the scanning unit Un cannot irradiate the beam LBn onto the substrate FS. This rotation angle α and the non-scanning rotation angle range γ have the relationship of Equation (1).

γ=(360 degrees/Np)-α… (One)

(However, N is the number of reflective surfaces (RP) of the polygon mirror (PM))

In this first embodiment, since the polygon mirror PM has eight reflective surfaces RP, N=8. Therefore, Equation (1) can be expressed as Equation (2).

γ=45 degrees -α… (2)

The maximum scanning rotation angle range α changes depending on conditions such as the distance between the polygon mirror PM and the fθ lens FT. For example, if the maximum scanning rotation angle range α is 15 degrees, the non-scan rotation angle range γ is 30 degrees, and the scanning efficiency of the polygon mirror PM is α/β=1/3 in FIG. . That is, while the polygon mirror PM of the scanning unit Un rotates by the non-scan rotation angle range γ (30 degrees), the beam LBn incident on the polygon mirror PM is discarded.

Accordingly, in the first embodiment, the scanning unit Un for incidence of the beam LB from one light source device 14 is switched to periodically convert the beam LB into three scanning units Un. By distributing, the scanning efficiency is improved. That is, by shifting the drawing period of the three scanning units Un (the scanning period for scanning the spot light SP) from each other, the scanning efficiency can be improved without wasting the beam LB from the light source device 14. Try to improve.

In addition, the maximum scanning rotation angle range α, which is the effective scanning period (effective drawing period), is the range in which the beam LBn is incident on the fθ lens FT and the spot light SP can effectively scan the drawing line SLn. However, the maximum scanning rotation angle range α also changes depending on the focal length of the front side of the fθ lens FT. In the case where the maximum scanning rotation angle range α is 10 degrees in the eight-sided polygon mirror PM as described above, from Equation (2), the non-scanning rotation angle range γ is 35 degrees, and the scanning efficiency of the drawing at this time Becomes about 1/4 (10/45). Conversely, when the maximum scanning rotation angle range α is 20 degrees, from Equation (2), the non-scanning rotation angle range γ is 25 degrees, and the scanning efficiency of the drawing at this time is about 1/2 (20/45). Becomes. Further, when the scanning efficiency is 1/2 or more, the number of scanning units Un that distributes the beam LB may be two. That is, the number of scanning units Un capable of distributing the beam LB is limited by the scanning efficiency.

8 is a diagram schematically illustrating the optical paths of the optical introduction optical system 40a and a plurality of scanning units U1, U3, and U5. When the drive signal (high frequency signal) applied from the control device 18 to the selection optical element (AOM) 50 is on and the drive signal applied to the selection optical elements 58 and 66 is off, selection The optical element 50 diffracts the incident beam LB. Thereby, the beam LB1, which is the first-order diffracted light diffracted by the optical element 50 for selection, is incident to the scanning unit U1 via the reflection mirror 52, and to the scanning units U3 and U5. The beam LB is not incident. Similarly, when the driving signal applied from the control device 18 to the selection optical element (AOM) 58 is on, and the driving signal applied to the selection optical elements 50 and 66 is off, The beam LB transmitted through the selection optical element 50 is incident on the selection optical element 58, and the selection optical element 58 diffracts the incident beam LB. Accordingly, the beam LB3, which is the first-order diffracted light diffracted by the selection optical element 58, is incident to the scanning unit U3 via the reflecting mirror 60, and to the scanning units U1 and U5. The beam LB is not incident. In addition, when the driving signal applied from the control device 18 to the selection optical element (AOM) 66 is on, and the driving signal applied to the selection optical elements 50, 58 is off, The beam LB transmitted through the selection optical elements 50 and 58 is incident on the selection optical element 66, and the selection optical element 66 diffracts the incident beam LB. Thereby, the beam LB5, which is the first-order diffracted light diffracted by the selection optical element 66, is incident on the scanning unit U5 by the reflecting mirror 68, and the beam LB5 is applied to the scanning units U1 and U3. LB) does not enter.

In this way, a plurality of selections by arranging the plurality of selection optical elements 50, 58, 66 of the light introduction optical system 40a in series along the traveling direction of the beam LB from the light source device 14a The optical elements 50, 58, 66 for use select whether to cause the beam LBn (LB1, LB3, LB5) to be incident on which one of the plurality of scanning units U1, U3, and U5. Can be switched. In the control device 18, the scanning unit Un to which the beam LB is incident is, for example, in the same order as the scanning unit U1 → the scanning unit U3 → the scanning unit U5 → the scanning unit U1. The plurality of optical elements 50, 58, and 66 for selection are controlled so as to switch periodically. That is, the beams LBn (LB1, LB3, LB5) are switched to each of the plurality of scanning units U1, U3, and U5 in order for a predetermined scanning time.

The polygon mirror PM of the scanning unit U1 is rotated so that the incident beam LB1 can be reflected toward the fθ lens FT during the period in which the beam LB1 is incident on the scanning unit U1. It is controlled by this control device 18. That is, the period in which the beam LB1 is incident on the scanning unit U1 and the scanning period of the spot light SP of the beam LB1 by the scanning unit U1 (maximum scanning rotation angle range α in FIG. 7) are I am motivated. In other words, the polygon mirror PM of the scanning unit U1 synchronizes with the period in which the beam LB1 is incident, and draws the spot light SP of the beam LB1 incident on the scanning unit U1. The beam LB1 is deflected to scan along SL1. Similarly to the polygon mirror PM of the scanning units U3 and U5, in the period in which the beams LB3 and LB5 are incident on the scanning units U3 and U5, the incident beams LB3 and LB5 are converted to the fθ lens FT. The rotation is controlled by the control device 18 so that it can be reflected. That is, the period in which the beams LB3 and LB5 are incident on the scanning units U3 and U5 and the scanning period of the spot light SP of the beams LB3 and LB5 by the scanning units U3 and U5 are synchronized. . In other words, the polygon mirror PM of the scanning units U3 and U5 synchronizes with the period in which the beams LB3 and LB5 are incident, and the spot light of the beam LB incident on the scanning units U3 and U5 ( The beams LB3 and LB5 are deflected to scan SP along the drawing lines SL3 and SL5.

In this way, since the beam LB from one light source device 14a is time-divisionally supplied to any one of the three scanning units U1, U3, U5, the scanning unit U1 Each of the polygon mirrors PM of U3, U5 is controlled to rotate so that the rotational angular position maintains a constant angular difference (to maintain a phase difference) while matching the rotational speed. A specific example of the control will be described later.

In addition, the control device 18 is a pattern defining a pattern to be drawn on the substrate FS by the spot light SP of the beams LB1, LB3, LB5 irradiated from each of the scanning units U1, U3, U5. Based on the data (writing data), the on-off of the driving signal (high frequency signal) supplied to the drawing optical element 106 of each of the scanning units U1, U3, U5 is controlled. Thereby, the optical element 106 for drawing of each scanning unit U1, U3, U5 diffracts the incident beams LB1, LB3, LB5 based on this on-off driving signal, and spot light The intensity of (SP) can be modulated. This pattern data is, for example, "1" when one dot (pixel) of the drawing pattern is set to 3 × 3 μm, and the driving signal is turned on (drawing) every dot, and the driving signal is turned off. In the case of (non-drawing), binary data of "0" is generated as bit map data, and is temporarily stored in the memory RAM for each scanning unit Un.

When the pattern data provided for each scanning unit Un will be described in further detail, the pattern data (drawing data) refers to the direction along the scanning direction (main scanning direction, Y direction) of the spot light SP in the row direction. A bit consisting of data (hereinafter, referred to as pixel data) of a plurality of pixels divided into two dimensions in which the direction along the transport direction (sub-scan direction, X direction) of the substrate FS is the column direction. Map data. This pixel data is data of 1 bit of "0" or "1". The pixel data of "0" means that the intensity of the spot light SP irradiated to the substrate FS is at a low level, and the pixel data of "1" is the spot light that is irradiated on the substrate FS. It means setting the intensity of (SP) to a high level. The pixel data for one column of pattern data corresponds to one drawing line SLn (SL1 to SL6), and is a spot projected onto the substrate FS along one drawing line SLn (SL1 to SL6). The intensity of the light SP is modulated according to the pixel data for one column. The pixel data for one column is called serial data (drawing information) DLn. That is, the pattern data is bit map data in which the serial data DLn is arranged in the column direction. The serial data DLn of the pattern data of the scanning unit U1 is represented by DL1, and similarly, the serial data DLn of the pattern data of the scanning units U2 to U6 is represented by DL2 to DL6 in some cases.

The control device 18 is a scanning unit into which the beam LBn is incident, based on the pattern data (serial data DLn consisting of "0" and "1") of the scanning unit Un to which the beam LBn is incident. An on-off driving signal is input to the (Un) drawing optical element (AOM) 106. The drawing optical element 106 diffracts the incident beam LBn when an ON driving signal is input and irradiates the incident beam LBn to the reflection mirror 110, and when an OFF driving signal is input, the incident beam LBn is not shown. The shielding plate or the absorber is irradiated. As a result, the scanning unit Un to which the beam LBn is incident, when the ON driving signal is input to the drawing optical element 106, the spot light SP of the beam LBn is transmitted on the substrate FS. After irradiation (the intensity of the spot light SP increases), and when the off driving signal is input to the drawing optical element 106, the spot light of the beam LBn is not irradiated on the substrate FS (spot light ( The strength of SP) becomes 0). Accordingly, the scanning unit Un to which the beam LBn is incident can draw a pattern based on the pattern data on the substrate FS along the drawing line SLn.

For example, when the beam LB3 is incident on the scanning unit U3, the control device 18 is based on the pattern data of the scanning unit U3, and the optical element for drawing of the scanning unit U3 ( 106) is switched on and off (driving). Thereby, the scanning unit U3 can draw a pattern based on the pattern data on the substrate FS along the drawing line SL3. In this way, each of the scanning units U1, U3, and U5 modulates the intensity of the spot light (scanning spot) SP along the drawing lines SL1, SL3, and SL5, and applies a pattern based on the pattern data to the substrate FS) can be drawn on.

In addition, although the operation of the optical introduction optical system 40a and the plurality of scanning units U1, U3, and U5 has been described using FIG. 8, the optical introduction optical system 40b and the plurality of scanning units U2, U4, and U6 have been described. The same is true for ). Briefly, the control device 18 has an even-numbered scanning unit Un into which the beam LBn from the light source device 14b is incident, for example, the scanning unit U2 → the scanning unit U4 → The plurality of optical elements for selection 50, 58 and 66 are controlled so as to switch in the same order as the scanning unit U6 → the scanning unit U2. That is, it is switched so that the beam LB is incident on each of the plurality of scanning units U2, U4, and U6 sequentially for a predetermined scanning time. The polygon mirror PM of each of the scanning units U2, U4, U6 is synchronized with the period in which the beam LBn is incident under control by the control device 18, and the spot light of the incident beam LBn ( The beam LBn is deflected so that SP) scans along the drawing lines SL2, SL4 and SL6. In addition, the control device 18 allows each scanning unit (U2, U4, U6) to draw a pattern based on the pattern data on the substrate FS along the drawing lines (SL2, SL4, SL6). Pattern data (serial data consisting of ``0'' and ``1'' (DLn (DL2, DL4, DL6))) of the scanning unit (Un(U2, U4, U6)) into which LBn (LB2, LB4, LB6)) is incident) Based on this, the optical element (AOM) 106 for drawing of the scanning unit Un(U2, U4, U6) is controlled.

As described above, in the first embodiment, a plurality of optical elements for selection 50, 58, 66 are arranged in series along the traveling direction of the beam LB from the light source device 14a (14b). With the plurality of optical elements for selection (50, 58, 66), the beam LBn is transmitted to one of the plurality of scanning units U1, U3, U5 (scanning units U2, U4, U6) It is possible to selectively enter Un) by time division, thereby improving the utilization efficiency of the beam LB without wasting the beam LB.

In addition, while synchronizing the rotational speed and rotational phase of each polygon mirror PM of a plurality (here, three) of the scanning units Un, the plurality of optical elements for selection 50, 58, 66 As a result, the polygon mirror PM deflects the beam LBn so that the spot light SP scans the substrate FS in synchronization with the period in which the beam LBn is incident on each scanning unit Un. Without wasting LB), the scanning efficiency can be improved.

In addition, if the selection optical element (AOM) 50, 58, 66 is turned on only during one scan period of the spot light SP by each polygon mirror PM of the scanning unit Un do. For example, if the number of reflection surfaces of the polygon mirror PM is Np and the rotational speed Vp of the polygon mirror PM is (rpm), the rotation angle β for one side of the reflection surface RP of the polygon mirror PM The corresponding time Tss becomes Tss=60/(Np·Vp) [second]. For example, when the number of reflection surfaces Np is 8 and the rotational speed Vp is 30,000, one rotation of the polygon mirror PM is 2 milliseconds, and the time Tss is 0.25 milliseconds. This is 4 kHz in terms of frequency, and a significantly lower response compared to an acousto-optic modulating element (optical element for drawing 106) for modulating a beam (LB) of a wavelength in the ultraviolet band at high speed around several tens of MHz in response to pattern data. It means a good thing as a frequency acousto-optic modulation element. Therefore, the optical element for selection (AOM) 50, 58, 66 can use one having a large diffraction angle of LBn (LB1 to LB6), which is the first order diffracted light deflected with respect to the incident beam LB (0th order light). have. Therefore, with respect to the path of the beam LB that passes straight through the selection optical elements 50, 58, 66, the reflection mirror 52, which guides the deflected beams LBn (LB1 to LB6) to the scanning unit Un. 60, 68) (see Figs. 3 and 4) can be easily arranged.

[Modified example of the first embodiment]

The first embodiment may be modified as follows. In the first embodiment, the beam LB is distributed to three scanning units Un, but in this modification, the beam LB from one light source device 14 is divided into five scanning units Un. Distribute to.

9 is a diagram showing a configuration of a drawing head 16 in a modified example of the first embodiment. In this modification, there is one light source device 14, and the drawing head 16 has five scanning units Un (U1 to U5). In addition, the same reference numerals are given to the same components as those in the first embodiment, or illustration is omitted, and only other parts are described. In addition, in FIG. 9, the illustration of the cylindrical lens CYb shown in FIG. 3 is omitted.

In this modified example, the light introduction optical system (beam switching member) 130 is used instead of the light introduction optical systems 40a and 40b. As shown in FIG. 10, the light introduction optical system 130 includes a condensing lens 42, a collimating lens 44, a reflecting mirror 46, a condensing lens 48, and a selection optics as shown in FIG. Element 50, reflection mirror 52, collimating lens 54, condensing lens 56, selection optical element 58, reflecting mirror 60, collimating lens 62, condensing lens 64 , In addition to the selection optical element 66, the reflection mirror 68, and the absorber 70, in addition to the selection optical element 132, the reflection mirror 134, the collimating lens 136, the condensing lens ( 138), an optical element for selection 140, a reflective mirror 142, a collimating lens 144 and a condensing lens 146 are provided.

The selection optical element 132, the collimating lens 136, and the condensing lens 138 are provided between the condensing lens 56 and the selection optical element 58 in the above order. Therefore, in this modified example, when the driving signal (high frequency signal) from the control device 18 is off, the optical element for selection 50 transmits the incident beam LB as it is, and the optical element for selection 132 is And the condensing lens 56 condenses the beam LB incident on the selection optical element 132 so as to become a beam west within the selection optical element 132.

The optical element for selection 132 has transmittance to the beam LB, and, for example, an acousto-optic modulation element (AOM) is used. When the drive signal from the control device 18 is off, the selection optical element 132 transmits the incident beam LB as it is and irradiates the selection optical element 58, and the control device 18 When the driving signal (high frequency signal) of is turned on, the beam LB2, which is the first-order diffracted light obtained by diffracting the incident beam LB, is irradiated onto the reflection mirror 134. The reflection mirror 134 reflects the incident beam LB2 and makes it incident on the collimating lens 100 of the scanning unit U2. That is, the control device 18 switches the selection optical element 132 on and off, so that the selection optical element 132 switches whether or not the beam LB2 is incident on the scanning unit U2. The collimating lens 136 is a beam LB irradiated to the selection optical element 58 as parallel light, and the condensing lens 138 is a beam LB that is converted into parallel light by the collimating lens 136 Is condensed so as to become a beam west in the optical element 58 for selection.

The selection optical element 140, the collimating lens 144, and the condensing lens 146 are provided between the condensing lens 64 and the selection optical element 66 in the above order. Therefore, in this modified example, when the drive signal from the control device 18 is off, the optical element for selection 58 transmits the incident beam LB as it is and irradiates the optical element for selection 140, The condensing lens 64 condenses the beam LB incident on the selection optical element 140 so as to become a beam west within the selection optical element 140.

The selection optical element 140 has transmittance to the beam LB, and, for example, an acousto-optic modulation element (AOM) is used. When the driving signal from the control device 18 is off, the selection optical element 140 irradiates the incident beam LB to the selection optical element 66, and a driving signal from the control device 18 When the (high frequency signal) is turned on, the beam LB4, which is the first order diffracted light obtained by diffracting the incident beam LB, is irradiated onto the reflection mirror 142. The reflection mirror 142 reflects the incident beam LB4 and irradiates the collimated lens 100 of the scanning unit U4 with it. That is, the control device 18 switches the selection optical element 140 on and off, so that the selection optical element 140 switches whether or not the beam LB4 is incident on the scanning unit U4. The collimating lens 144 is a beam LB irradiated to the optical element 66 for selection as a parallel light, and the condensing lens 146 is a beam LB made of parallel light by the collimating lens 144 Is condensed so as to become a beam west in the optical element 66 for selection.

By arranging the plurality of optical elements for selection (AOM) (50, 58, 66, 132, 140) in serial (serial), one of the plurality of scanning units (U1 to U5), one scanning unit (Un) The beam LBn may be incident. In the control device 18, the scanning unit Un to which the beam LBn is incident is, for example, a scanning unit U1 → a scanning unit U2 → a scanning unit U3 → a scanning unit U4 → a scanning unit. (U5) → The plurality of optical elements for selection 50, 132, 58, 140, 66 are controlled so as to periodically switch in the same order as in the scanning unit U1. That is, it is switched so that the beam LBn is incident on each of the plurality of scanning units U1 to U5 in order for a predetermined scanning time. Further, the polygon mirror PM of each of the scanning units U1 to U5 is synchronized with the period in which the beam LBn is incident under control by the control device 18, and the spot light of the incident beam LBn ( The beam LBn is deflected so that SP is scanned along the drawing lines SL1 to SL5. Further, the control device 18 is a scanning unit to which the beam LBn is incident so that each scanning unit Un can draw a pattern based on the pattern data on the substrate FS along the drawing line SLn. Based on the pattern data of Un) (serial data DLn consisting of "0" and "1"), the drawing optical element (AOM) 106 of the scanning unit Un is controlled.

That is, in the case of the present modification, each polygon mirror PM of the five scanning units U1 to U5 rotates synchronously so that the rotation angle position is shifted in phase by a constant angle. In addition, in the case of this modified example, since the beam (laser light) LB is divided by time division to the five scanning units U1 to U5, the beam LBn is formed on one reflective surface RP of the polygon mirror PM. The range of angles that can be irradiated (rotation angle β in Fig. 7) and the maximum deflection angle at which the beam LBn reflected from the reflective surface RP enters the fθ lens FT (angle in Fig. 7 The focal length at the front side of the f? lens FT and the number of reflection surfaces Np of the polygon mirror PM are set so that 2?) satisfies ?≥5?.

In this way, also in the present modified example, the utilization efficiency of the beam LB from the light source device 14 can be increased and the scanning efficiency can be improved without wasting the beam LB. In addition, in this modified example, the beam LB from one light source device 14 is distributed to five scanning units Un, but two beams LB from one light source device 14 are scanned. It may be distributed to units Un, or may be distributed to four or six or more scanning units Un. In this case, if the number of scanning units Un to be distributed is n, the angle range in which the beam LBn can be irradiated onto one reflective surface RP of the polygon mirror PM (rotation angle β in FIG. 7) ), and the maximum deflection angle (angle 2α in FIG. 7) at which the beam LB reflected from the reflective surface RP is incident on the fθ lens FT satisfies β≥n×α, and the fθ lens FT The focal length in front of and the number of reflection surfaces Np of the polygon mirror PM are set. In addition, as described in the first embodiment, the case of distributing the beams LB from the two light source devices 14 (14a, 14b) to a plurality of scanning units Un is not limited to three, You may make it allocate to the number of scan units Un. For example, the beam LB from the light source device 14a may be distributed to five scanning units Un, and the beam LB from the light source device 14b may be distributed to four scanning units Un. .

[2nd embodiment]

In the first embodiment, since the drawing optical elements (AOM) 106 are provided in front of the polygon mirrors PM in each scanning unit Un, the number of the drawing optical elements 106 to be used increases, and the cost is high. Becomes. Accordingly, in the second embodiment, a single writing optical modulator AOM is provided on the optical path of the beam LB from one light source device 14, and a plurality of the writing optical modulators are used. The intensity of the beam LBn irradiated onto the substrate FS from the scanning unit Un of is modulated to draw a pattern. That is, in the second embodiment, only one optical modulator (AOM) for drawing, which requires high responsiveness, is placed in front of the plurality of scanning units Un, and on the side of each scanning unit Un, the responsiveness is low and good selection. Place the optical element (AOM)

FIG. 11 is a diagram illustrating a configuration of a drawing head 16 according to a second embodiment, and FIG. 12 is a diagram illustrating a light introduction optical system 40a shown in FIG. 11. The same reference numerals are assigned to the same configurations as those of the first embodiment, and only other parts will be described. In addition, in FIG. 11, since the illustration of the cylindrical lens CYb shown in FIG. 3 is omitted, and the optical introduction optical systems 40a and 40b have the same configuration, here, the optical introduction optical system 40a The description will be made, and the description of the optical system 40b will be omitted. As shown in Fig. 12, the light introducing optical system 40a includes a condensing lens 42, a collimating lens 44, a reflecting mirror 46, a condensing lens 48, and an optical element for selection shown in Fig. 4 described above. (50), a reflecting mirror 52, a collimating lens 54, a condensing lens 56, a selection optical element 58, a reflecting mirror 60, a collimating lens 62, a condensing lens 64, In addition to the selection optical element 66, the reflective mirror 68, and the absorber 70, an optical element for drawing (AOM) 150 as an optical modulator for drawing, a collimating lens 152, and a condensing lens ( 154) and an absorber 156. In the second embodiment, as shown in Fig. 11, the optical element 106 for drawing as in the first embodiment is not provided in each of the scanning units U1 to U6.

The drawing optical element 150, the collimating lens 152, and the condensing lens 154 are provided between the condensing lens 48 and the selection optical element 50 in the above order. Accordingly, in the second embodiment, the reflecting mirror 46 reflects the beam LB that has become parallel light by the collimating lens 44 so that it faces the optical element 150 for drawing. The condensing lens 48 condenses (converges) the beam LB incident on the drawing optical element 150 so as to become a beam west within the drawing optical element 150.

The drawing optical element 150 has transmittance with respect to the beam LB, and, for example, an acousto-optic modulation element AOM is used. The optical element for drawing 150 is a light source device than the optical element 50 for selection at the very shortest position on the side of the light source device 14 (14a) among the optical elements 50, 58, and 66 for selection. It is provided on the 14(14a)) side. When the driving signal (high frequency signal) from the control device 18 is off, the drawing optical element 150 irradiates the incident beam LB to the absorber 156 and drives it from the control device 18 When the signal (high-frequency signal) is turned on, a beam (writing beam) LB, which is a first-order diffracted light obtained by diffracting the incident beam LB, is irradiated onto the optical element 50 for selection at the first stage. The collimating lens 152 is a beam LB irradiated to the optical element 50 for selection as a parallel light, and the condensing lens 154 is a beam LB made of parallel light by the collimating lens 152 Is condensed (converged) to become a beam west within the optical element 50 for selection.

As shown in Fig. 11, the scanning units U1 to U6 are collimated lenses 100, reflective mirrors 102, reflective mirrors 110, cylindrical lenses CYa, reflective mirrors 114, and polygon mirrors. (PM), f? lens (FT), cylindrical lens (CYb) (not shown in Fig. 11), and a reflective mirror 122, further, a first shaping lens 158a as a beam shaping lens, and It has a second molded lens 158b. That is, in the second embodiment, the first molded lens 158a and the second molded lens 158b are replaced with the condensing lens 104 and collimating lens 108 of the first embodiment. It is provided in U1 to U6).

FIG. 13 is a diagram schematically illustrating the optical paths of the optical introduction optical system 40a of FIG. 12 and a plurality of scanning units U1, U3, and U5. The control device 18 includes pattern data that defines a pattern drawn on the substrate FS by the spot light SP of the beams LB1, LB3, LB5 irradiated from the respective scanning units U1, U3, U5 ( Based on the serial data (DL1, DL3, DL6) consisting of "0" and "1", an on-off driving signal (high frequency signal) is output to the drawing optical element 150 of the optical introduction optical system 40a. . Thereby, the optical element 150 for drawing of the optical system 40a diffracts the incident beam LB based on this ON/OFF driving signal, and modulates the intensity of the spot light SP (On /Off).

In detail, the control device 18 inputs an on-off driving signal to the drawing optical element 150 based on the pattern data of the scanning unit Un to which the beam LBn is incident. When the ON driving signal (high frequency signal) is input to the drawing optical element 150, the incident beam LB is diffracted and irradiated to the selection optical element 50 (incident to the selection optical element 50). The intensity of the beam LB becomes high). On the other hand, the drawing optical element 150 irradiates the incident beam LB to the absorber 156 (FIG. 12) when an off driving signal (high frequency signal) is input (incident to the optical element 50 for selection). The intensity of the beam LB becomes 0). Accordingly, the scanning unit Un to which the beam LBn is incident can irradiate the beam LB whose intensity has been modulated onto the substrate FS along the drawing line SLn, and thus the pattern based on the pattern data is applied to the substrate. It can be drawn on (FS).

For example, when the beam LB3 is incident on the scanning unit U3, the control device 18 is based on the pattern data of the scanning unit U3, and the optical element for drawing of the light introduction optical system 40a ( 150) is switched on and off. Thereby, the scanning unit U3 can irradiate the beam LB whose intensity is modulated to the substrate FS along the drawing line SL3, so that a pattern based on the pattern data can be applied on the substrate FS. I can draw. The scanning unit Un to which the beam LBn is incident is sequentially switched, such as, for example, the scanning unit U1 → the scanning unit U3 → the scanning unit U5 → the scanning unit U1. Accordingly, the control device 18 similarly has the pattern data of the scanning unit U1 → the pattern data of the scanning unit U3 → the pattern data of the scanning unit U5 → the pattern data of the scanning unit U1. The pattern data for determining the on-off signal to be sent to the drawing optical element 150 of 40a) is sequentially switched. Then, the control device 18 controls the optical element 150 for drawing of the light introduction optical system 40a based on the sequentially switched pattern data. Thereby, each scanning unit (U1, U3, U5) irradiates the substrate FS with the beam LB whose intensity is modulated along the drawing lines SL1, SL3, SL5, and thereby provides a pattern according to the pattern data. It can be drawn on the substrate FS.

As described above, a configuration of a part of the control system applied to the second embodiment and its operation will be described in detail with reference to FIGS. 14 to 16. In addition, the configuration and operation described below are applicable also to the first embodiment. 14 is a block diagram of a rotation control system of a polygon mirror PM provided in each of the three scanning units U1, U3, and U5 in FIGS. 11 and 13 as an example, and the scanning units U1, U3, and U5 Since the configuration of is the same, the same reference numerals are assigned to the same members. In each of the scanning units U1, U3, U5, the scanning start timing of the drawing lines (scanning lines) SL1, SL3, SL5 generated on the substrate FS by the polygon mirror PM is photoelectrically adjusted. The origin sensors OP1, OP3, and OP5 are provided for detection by 的). The origin sensors OP1, OP3, and OP5 are photoelectric detectors that project light onto the reflective surface RP of the polygon mirror PM and receive the reflected light, and the spot light SP is the drawing lines SL1, SL3, and SL5. Each time it comes to the position immediately before the scan start point of ), pulse-shaped origin signals SZ1, SZ3, and SZ5 are respectively output.

The timing measurement unit 180 inputs the origin signals SZ1, SZ3, SZ5, measures whether the timing of each occurrence of the origin signals SZ1, SZ3, SZ5 falls within a predetermined allowable range (time interval), When an error occurs from the allowable range, deviation information corresponding thereto is output to the servo control device 182. The servo control device 182 outputs a command value based on the deviation information to each servo drive circuit part of the motor Mp that rotates the polygon mirror PM in each of the scanning units U1, U3, U5. Each servo drive circuit unit of the motor Mp receives an up/down pulse signal (hereinafter, an encoder signal) from the encoder EN mounted on the rotation shaft of the motor Mp, and according to the rotation speed of the polygon mirror PM. A servo that drives the motor Mp so that the rotational speed according to the command value is received by receiving a feedback circuit unit (FBC) outputting a speed signal and a command value from the servo control device 182 and a speed signal from the feedback circuit unit (FBC) It is composed of a drive circuit (amplifier) (SCC). In addition, the servo drive circuit part (feedback circuit part FBC, servo drive circuit SCC), the timing measurement part 180, and the servo control device 182 constitute a part of the control device 18.

In the second embodiment, it is necessary to rotate each polygon mirror PM in the three scanning units U1, U3, U5 at the same speed while maintaining a constant phase difference at the rotation angle position. , The timing measurement unit 180 inputs the origin signals SZ1, SZ3, SZ5, and performs measurement as shown in the timing chart of FIG. 15, for example.

Fig. 15 schematically shows various signal waveforms generated when the three polygon mirrors PM rotate with a phase difference within a predetermined allowable range with respect to the rotation angle. Immediately after rotating each polygon mirror PM, the relative phase difference of the origin signals SZ1, SZ3, SZ5 is different, but the timing measurement unit 180, for example, based on the origin signal SZ1, The origin signals (SZ3, SZ5) are generated at the same frequency (period) as the origin signal (SZ1), and the time intervals (Ts1, Ts2, Ts3) between the three origin signals (SZ1, SZ3, SZ5) are all the same. As a reference value, correction information according to the error is measured. The timing measurement unit 180 outputs the correction information to the servo control device 182, and accordingly, each motor Mp of the scanning units U3, U5 is servo-controlled, and three origin signals SZ1, SZ3, SZ5 The timing of occurrence of) is controlled so that Ts1 = Ts2 = Ts3 is stabilized as shown in FIG. 15.

When the generation timing of the origin signals SZ1, SZ3, SZ5 is stabilized, the timing measurement unit 180 draws on each of the selection optical elements 50, 58 and 66 shown in Figs. Outputs an enable (On) signal (SPP1, SPP3, SPP5). The drawing enable (On) signals SPP1, SPP3, and SPP5 cause the corresponding selection optical elements 50, 58, 66 to perform a modulation operation (light deflection switching operation) only for a period of H level here. . Since the three origin signals (SZ1, SZ3, SZ5) are stabilized and maintained at a constant phase difference (here, 1/3 of the period of the origin signal (SZ1)), each rising of the drawing enable signals (SPP1, SPP3, SPP5) (L→H) also has a constant phase difference. These drawing enable signals SPP1, SPP3, and SPP5 correspond to drive signals (high frequency signals) for switching the selection optical elements 50, 58, and 66.

The timing of the falling (H→L) of the drawing enable signals (SPP1, SPP3, SPP5) is a clock signal (CLK) for turning on/off the spot light within each drawing line (SL1, SL3, SL5). It is set by measuring with a counter in the measurement unit 180. The clock signal CLK manages the on/off timing of the drawing optical element 150 (or the drawing optical element 106 in FIG. 3), and the drawing lines SLn (SL1, SL3, SL5) It is determined by the length of the spot light SP, the size of the spot light SP on the substrate FS, and the scanning speed Vs of the spot light SP. For example, when the length of the drawing line is 30 mm, the dimension (diameter) of the spot light SP is 6 μm, and the spot light SP is overlapped by 3 μm in the scanning direction and is turned on/off, the timing measurement unit 180 ), if the clock signal CLK counts 10000 (30 mm/3 µm), the drawing enable signals SPP1, SPP3, and SPP5 may be lowered (H→L).

Further, assuming that the reflective surface of the polygon mirror PM is 10 and the rotational speed is Vp (rpm), the frequency of each origin signal SZ1, SZ3, SZ5 is 10 Vp/60 (Hz). Therefore, when the time interval is stabilized at Ts1 = Ts2 = Ts3, the time interval Ts1 becomes 60/(30Vp) seconds. As an example, if the reference rotational speed Vp of the polygon mirror PM is 8000 rpm, the time interval Ts1 is 60/(30·8000) seconds = 250 μs.

As shown in Fig. 15, the On time (H level duration) Toa of the drawing enable signals SPP1, SPP3, SPP5 is the beam (laser light) LB from the polygon mirror PM on the substrate FS. Although it is a period (projection period) which is projected as a spot light to a spot light, it needs to be set shorter than the time interval Ts1. Thus, for example, if the On time Toa is set to 200 μs, the frequency of the clock signal CLK for counting 10000 during that time is 10000/200 = 50 (MHz). In synchronization with such a clock signal CLK, drawing bit string data or serial data DLn corresponding to the drawing line SLn generated from pattern data ("0" or "1" on the bit map) (for example, 10000 bits) (Sdw) is output to the drawing optical element 150. In addition, as shown in FIG. 3, in the configuration in which the optical element 106 for drawing is provided in each of the scanning units U1, U3, U5, the drawing bit string data Sdw corresponding to the drawing line SL1 or serial The data DL1 is sent to the drawing optical element 106 of the scanning unit U1, and the drawing bit string data Sdw or serial data DL3 corresponding to the drawing line SL3 is transmitted to the scanning unit U3. It is sent to the drawing optical element 106, and the drawing bit string data Sdw or serial data DL5 corresponding to the drawing line SL5 is sent to the drawing optical element 106 of the scanning unit U5.

In the second embodiment, the drawing bit string data Sdw or serial data DLn generated from pattern data corresponding to each of the three drawing lines SL1, SL3, SL5 is a drawing enable signal SPP1, SPP3, SPP5) (or origin signals SZ1, SZ3, SZ5) are supplied in order to turn on/off the drawing optical element 150 in sequence.

Fig. 16 shows an example of a circuit for generating such drawing bit string data Sdw, and the circuit has a generation circuit (pattern data generation circuit) 301, 303, 305 and an OR circuit GT8. The generation circuit 301 includes a memory unit BM1, a counter unit CN1, and a gate unit GT1, and the generation circuit 303 includes a memory unit BM3, a counter unit CN3, and a gate unit GT3. And the generation circuit 305 includes a memory portion BM5, a counter portion CN5, and a gate portion GT5. The generation circuits 301, 303, 305 and the OR circuit GT8 constitute a part of the control device 18.

The memory units BM1, BM3, and BM5 are memories for primary storage of bitmap data (pattern data) corresponding to patterns to be drawn and exposed by each of the scanning units U1, U3, and U5. The counter unit CN1, CN3, CN5 is a bit string (e.g., 10000 bits) for one drawing line to be drawn next among bit map data (pattern data) in each memory unit BM1, BM3, BM5 Is the serial data DL1, DL3, and DL5 synchronized with the clock signal CLK one bit at a time, and is a counter for outputting during the period when the drawing enable signals SPP1, SPP3, and SPP5 are on.

The map data in each of the memory units BM1, BM3, and BM5 is shifted by data for one drawing line by an address counter (not shown) or the like. The shift is, for example, the timing at which the origin signal SZ3 of the scanning unit U3, which becomes active next, occurs after all the serial data DL1 for one drawing line has been output in the memory unit BM1. Is done on Similarly, the shift of the map data in the memory unit BM3 is performed at the timing at which the origin signal SZ5 of the scanning unit U5 to be activated next occurs after all the serial data DL3 is output, and the memory unit ( The shift of the map data in the BM5) is performed at the timing when the origin signal SZ1 of the scanning unit U1 to be activated next occurs after all the serial data DL5 are output.

Each serial data (DL1, DL3, DL5) that is sequentially generated in this way is an OR of three inputs through the gate units (GT1, GT3, GT5) that are opened during the On period of the drawing enable signals (SPP1, SPP3, SPP5). It is applied to the circuit GT8. The OR circuit (GT8) is serial data DL1→DL3→DL5→DL1... The bit data sequence synthesized by repeating the sequence of is outputted as drawing bit sequence data Sdw for On/Off of the drawing optical element 150. In addition, as shown in Fig. 3, in the configuration in which the optical element 106 for drawing is provided in each of the scanning units U1, U3, U5, the serial data DL1 output from the gate unit GT1 is transferred to the scanning unit ( It sends to the optical element 106 for drawing in U1), and sends the serial data DL3 output from the gate part GT3 to the drawing optical element 106 in the scanning unit U3, and outputs it from the gate part GT5. It is sufficient to send the serial data DL5 used to the optical element 106 for drawing in the scanning unit U5.

As described above, the on/off of the drawing optical element 150 (or 106) needs to respond to the high-speed clock signal CLK (for example, 50 MHz), but the selection optical elements 50, 58, 66) is synchronous to the drawing enable signal (SPP1, SPP3, SPP5) (or the origin signal (SZ1, SZ3, SZ5)) and may be turned on/off, and the response frequency is the time interval Toa in the case of the previous numerical example (Or Ts1) is 200 μs, so it is good at about 10 kHz, and inexpensive ones with high transmittance can be used. Further, the frequency of the clock signal CLK, which is counted by a counter in the timing measurement unit 180 or by the counter units CN1, CN3, CN5 in FIG. 16, is Fcc, and the beam LB from the light source device 14 is Assuming that the fundamental frequency of pulse oscillation is Fs, it is good to set n to satisfy the relationship of n·Fcc=Fs, with n as an integer of 1 or more (preferably n≧2).

As described above, the operation of the optical introduction optical system 40a and the plurality of scanning units U1, U3, U5 using Fig. 13, and the drawing timing by each of the scanning units U1, U3, U5 using Figs. 14 to 16, etc. Although described, the same applies to the optical introduction optical system 40b and the plurality of scanning units U2, U4, and U6. Briefly, the scanning unit Un to which the beam LB is incident is sequentially, for example, the scanning unit U2 → the scanning unit U4 → the scanning unit U6 → the scanning unit U2. Is converted. Therefore, the control device 18 similarly has the same as the pattern data of the scanning unit U2 → the pattern data of the scanning unit U4 → the pattern data of the scanning unit U6 → the pattern data of the scanning unit U2. The pattern data for determining the on-off signal sent to the drawing optical element 150 of 40b) is sequentially switched. Then, the control device 18 controls the optical element 150 for drawing of the light introduction optical system 40b based on the sequentially switched pattern data. Alternatively, drawing bit string data Sdw obtained by synthesizing pattern data for three drawing lines in a circuit configuration as shown in FIG. 16 is generated and supplied to the drawing optical element 150. Thereby, each scanning unit (U2, U4, U6) irradiates the beam LB whose intensity is modulated to the substrate FS along the drawing lines SL2, SL4, SL6, and the pattern based on the pattern data Can be drawn on the substrate FS.

In the above second embodiment, in addition to the effects of the first embodiment, the following effects are obtained. That is, one optical element for drawing 150 is provided in the light introduction optical system 40a, and the drawing optical element 150 is disposed on the side of the light source device 14a than the first optical element 50 for selection, , With one drawing optical element 150, the intensity of the beams LB1, LB3, LB5 irradiated to the substrate FS from the plurality of scanning units U1, U3, U5 is modulated according to the pattern. Similarly, one optical element for drawing 150 is provided in the light introduction optical system 40b, and the drawing optical element 150 is disposed on the side of the light source device 14b rather than the first optical element 50 for selection, , With one drawing optical element 150, the intensity of the beams LB2, LB4 and LB6 irradiated to the substrate FS from the plurality of scanning units U2, U4, U6 is modulated according to the pattern. Thereby, the number of acousto-optic modulation elements can be reduced, and the cost becomes low.

In the second embodiment, a drawing head 16 that divides the beam LB by three is described, but as described in the modified example of the first embodiment, the drawing head 16 divides the beam LB by five. ) May be used (see Figs. 9 and 10). In addition, in the case of FIG. 9 and FIG. 10, since there is one light source device 14, the drawing optical element 150 is also one.

[Modified example of the second embodiment]

The second embodiment may be modified as follows. In the second embodiment, the drawing optical element 150 is provided in the light introduction optical systems 40a and 40b as the drawing optical modulator, but in this modification, instead of the drawing optical element 150, a light source device In (14 (14a, 14b)), each optical modulator for drawing is provided. In addition, the same reference numerals are given to the same components as those of the second embodiment, or illustration is omitted, and only other parts will be described. In addition, the light source devices provided with the light modulator for drawing in the light source devices 14a and 14b are referred to as light source devices 14A and 14B, respectively, and since the light source device 14A and the light source device 14B have the same configuration, the light source device Only (14A) will be described.

Fig. 17 is a diagram showing the configuration of a light source device (pulse light source device, laser light source device) 14a of the present modification. The light source device 14A as a fiber laser device includes a DFB semiconductor laser element 200, a DFB semiconductor laser element 202, a polarization beam splitter 204, an electro-optical element 206 as an optical modulator for drawing, and the electro-optical element Driving circuit 206a of 206, polarization beam splitter 208, absorber 210, excitation light source 212, combiner 214, fiber optical amplifier 216, wavelength conversion optical element 218 ), a wavelength conversion optical element 220, a plurality of lens elements GL, and a control circuit 222 including a clock generator 222a.

DFB semiconductor laser element (first solid state laser element, first semiconductor laser light source) 200 is a sharp or sharp pulsed heald (laser light) at a predetermined frequency (oscillation frequency, fundamental frequency) Fs (S1) Is generated, and the DFB semiconductor laser element (second solid state laser element, second semiconductor laser light source) 202 generates a pulse-shaped heald (laser light) S2 in a gentle (temporal) pulse at a predetermined frequency Fs. . One pulse of the seed light S1 generated by the DFB semiconductor laser element 200 and 1 pulse of the seed light S2 generated by the DFB semiconductor laser element 202 have substantially the same energy, but different polarization states, As for the peak intensity, the heald (S1) is strong. In this modified example, the polarization state of the seed light S1 generated by the DFB semiconductor laser element 200 is referred to as S-polarized light, and the polarization state of the seed light S2 generated by the DFB semiconductor laser element 202 is referred to as P-polarized light. Explain. The DFB semiconductor laser elements 200 and 202 are controlled by electrical control of the control circuit 222 in response to the clock signal LTC (prescribed frequency Fs) generated by the clock generator 222a, and thus the oscillation frequency Fs. It is controlled to emit light of the healds S1 and S2. This control circuit 222 is controlled by the control device 18.

In addition, this clock signal LTC becomes the base of the clock signal CLK supplied to each of the counter units CN1, CN3, CN5 shown in Fig. 16, and the clock signal LTC is divided by n. ) (n is preferably an integer greater than or equal to 2) is the clock signal CLK. Further, the clock generator 222a also has a function of adjusting the fundamental frequency Fs of the clock signal LTC by ±ΔF, that is, a function of finely adjusting the time interval of the pulse oscillation of the beam LB. Thereby, even if the scanning speed Vs of the spot light SP slightly fluctuates, the dimension (drawing magnification) of the pattern drawn over the drawing line can be precisely maintained by finely adjusting the fundamental frequency Fs.

The polarization beam splitter 204 transmits the S-polarized light and reflects the P-polarized light, and the seed light S1 from which the DFB semiconductor laser element 200 is generated and the seed light from which the DFB semiconductor laser element 202 is generated S2) is guided to the electro-optical element 206. Specifically, the polarization beam splitter 204 guides the seed light S1 to the electro-optical element 206 by transmitting the seed light S1 of the S-polarized light generated by the DFB semiconductor laser element 200, The seed light S2 is guided to the electro-optical element 206 by reflecting the seed light S2 of the P-polarized light generated by 202. The DFB semiconductor laser elements 200 and 202 and the polarization beam splitter 204 constitute a laser light source unit (light source unit) 205 that generates seed lights S1 and S2.

The electro-optic element 206 has transmittance with respect to the seed beams S1 and S2, and for example, an electro-optic modulator (EOM: Electro-Optic Modulator) is used. The EOM responds to the On/Off state (high/low) of the drawing bit string data Sdw (or serial data DLn) shown in FIG. 16 described above, and the heald passing through the polarization beam splitter 204 ( The polarization states of S1 and S2 are switched by the driving circuit 206a. Since the longitudinal beams S1 and S2 from each of the DFB semiconductor laser element 200 and DFB semiconductor laser element 202 have a long wavelength band of 800 nm or more, as the electro-optical element 206, the responsiveness of switching the polarization state is You can use something of about GHz.

When the 1-bit pixel data of the drawing bit string data Sdw (or serial data DLn) input to the driving circuit 206a is in the Off state (low “0”), the electro-optical element 206 is incident It guides to the polarization beam splitter 208 as it is without changing the polarization state of the seed light (S1 or S2). On the other hand, when the drawing bit string data Sdw (or serial data DLn) input to the driving circuit 206a is in the On state (high ``1''), the electro-optical element 206 receives the incident heald S1 or The polarization state of S2) is changed (the polarization direction is changed by 90 degrees), and the polarization beam splitter 208 is guided. In this way, by driving the electro-optical element 206, the electro-optical element 206 is of S-polarized light when the pixel data of the drawing bit string data Sdw (or serial data DLn) is on (high). The seed light S1 is converted into a seed light S1 of P-polarized light, and the seed light S2 of P-polarized light is converted into a seed light S2 of S-polarized light.

The polarization beam splitter 208 transmits the P-polarized light and guides it to the combiner 214 through the lens element GL, and reflects the S-polarized light to guide the absorber 210. The excitation light source 212 generates excitation light, and the generated excitation light is guided to the combiner 214 via the optical fiber 212a. The combiner 214 combines the seed light irradiated from the polarization beam splitter 208 and the excitation light, and outputs it to a fiber optical amplifier (optical amplifier) 216. The fiber optical amplifier 216 is doped with a laser medium that is excited by excitation light. Accordingly, in the fiber optical amplifier 216 through which the synthesized seed light and excitation light are transmitted, the seed light is amplified by the excitation light excited by the laser medium. As the laser medium doped in the fiber optical amplifier 216, rare earth elements such as erbium (Er), ytterbium (Yb), and thulium (Tm) are used. The amplified seed light is radiated from the exit end 216a of the fiber optical amplifier 216 along a predetermined divergence angle, and is converged or collimated by the lens element GL, and the wavelength conversion optical element 218 ).

The wavelength conversion optical element (first wavelength conversion optical element) 218 uses second harmonic generation (SHG) to determine the incident seed light (wavelength λ) and a second wavelength of 1/2 of λ. Convert to harmonics. As the wavelength conversion optical element 218, a PPLN (Periodically Poled LiNbO ₃ ) crystal, which is a Quasi Phase Matching (QPM) crystal, is suitably used. In addition, it is also possible to use PPLT (Periodically Poled LiTaO ₃ ) crystal or the like.

The wavelength conversion optical element (second wavelength conversion optical element) 220 remains unconverted by the second harmonic (wavelength λ/2) converted by the wavelength conversion optical element 218 and the wavelength conversion optical element 218 The third harmonic with a wavelength of 1/3 of λ is generated by sum frequency generation (SFG) of the (殘留) heald (wavelength λ). This third harmonic becomes ultraviolet light (beam LB) having a peak wavelength in a wavelength band of 370 nm or less.

As described above, in the case of applying the drawing bit string data Sdw (or DLn) transmitted from the pattern data generating circuit shown in Fig. 16 to the electro-optical element 206 shown in Fig. 17, the drawing bit string data When the 1-bit pixel data of (Sdw) (or DLn) is in the Off state (low "0"), the electro-optical element 206 is a polarization beam splitter without changing the polarization state of the incident seed light (S1 or S2). Guide to (208). Therefore, the seed light transmitted through the polarization beam splitter 208 becomes the seed light S2 from the DFB semiconductor laser element 202. Therefore, the beam LB finally output from the light source device 14A has the same oscillation profile (time characteristic) as the seed light S2 from the DFB semiconductor laser element 202. That is, in this case, the beam LB has a low pulse peak intensity and a temporally broad dull characteristic. Since the fiber optical amplifier 216 has a low amplification efficiency for the heald S2 having such a low peak intensity, the beam LB output from the light source device 14A becomes light that has not been amplified up to the energy required for exposure. Therefore, in this case, from the viewpoint of exposure, substantially the same result as that the light source device 14A does not emit the beam LB. That is, the intensity of the spot light SP irradiated to the substrate FS is at a low level. However, in the period in which pattern drawing is not performed along each drawing line SLn (SL1 to SL6) (non-projection period, non-exposure period), the beam LB in the ultraviolet band derived from the heald S2 has a slight intensity. Even if it continues to be emitted, if the drawing line SLn (SL1 to SL6) continues to be at the same position on the substrate FS for a long time (e.g., emergency stop of the substrate FS due to a trouble in the transport system, etc.) When) occurs, a movable shutter may be provided in the exit window of the beam LB of the light source device 14A to close the exit window.

On the other hand, when 1-bit pixel data of the drawing bit string data Sdw (or DLn) applied to the electro-optical element 206 of FIG. 17 is in the On state (high "1"), the electro-optical element 206 is The polarization state of the incident seed light S1 or S2 is changed and guided to the polarization beam splitter 208. Therefore, the seed light transmitted through the polarization beam splitter 208 becomes the seed light S1 from the DFB semiconductor laser element 200. Accordingly, the beam LB output from the light source device 14A is generated from the seed light S1 from the DFB semiconductor laser element 200. Since the seed light S1 from the DFB semiconductor laser element 200 has a strong peak intensity, it is efficiently amplified by the fiber optical amplifier 216, and the beam LB output from the light source device 14A is the substrate FS. It has the energy required for exposure. That is, the intensity of the spot light SP irradiated to the substrate FS becomes high.

In this way, since the electro-optical element 206 as an optical modulator for drawing is provided in the light source device 14A, the electro-optical element 206 is similar to controlling the drawing optical element 150 in the second embodiment. By controlling ), the same effect as in the second embodiment can be obtained. That is, based on the pattern data of the scanning unit Un to which the beam LB is incident (or the drawing bit string data Sdw in FIGS. 15 and 16), the electro-optical element 206 is switched on and off (driving ), the intensity of the beam LB incident on the first-stage selection optical element 50, that is, of the beam LB irradiated on the substrate FS by each scanning unit Un(U1 to U6). The intensity of the spot light SP can be modulated according to the pattern to be drawn.

In the configuration of FIG. 17, the DFB semiconductor laser element 202 and the polarization beam splitter 204 are omitted, and only the seed light S1 from the DFB semiconductor laser element 200 is based on pattern data (drawing data). It is also conceivable to guide the fiber optical amplifier 216 in the form of a burst wave by switching the electro-optical element 206. However, if this configuration is employed, the incident periodicity of the heald S1 to the fiber optical amplifier 216 is greatly confused depending on the pattern to be drawn. That is, after the state in which the seed light S1 from the DFB semiconductor laser element 202 is not incident on the fiber optical amplifier 216 continues, when the seed light S1 is incident on the fiber optical amplifier 216, immediately after the incident The seed light S1 is amplified at a higher amplification factor than usual, and there is a problem that a beam having a greater intensity than the specified intensity is generated from the fiber optical amplifier 216. Therefore, in this modification, as a preferred embodiment, in a period in which the seed light S1 is not incident on the fiber optical amplifier 216, the seed light S2 from the DFB semiconductor laser element 202 (a broad pulse with low peak intensity) Light) is incident on the fiber optical amplifier 216, thereby solving this problem.

Further, although the electro-optical element 206 is switched, the DFB semiconductor laser elements 200 and 202 may be driven based on pattern data (writing bit string data Sdw or serial data DLn). That is, the control circuit 222 controls the DFB semiconductor laser elements 200 and 202 on the basis of the pattern data (drawing bit string data Sdw or DLn), and oscillates in a pulse shape at a predetermined frequency Fs. S1, S2) are generated selectively (alternatively). In this case, the polarization beam splitters 204 and 208, the electro-optical element 206, and the absorber 210 are unnecessary, and the seed light (S1, S1, which is selectively pulse oscillated from one of the DFB semiconductor laser elements 200, 202) is One of S2) enters the combiner 214 directly. At this time, the control circuit 222 is so that the seed light S1 from the DFB semiconductor laser element 200 and the seed light S2 from the DFB semiconductor laser element 202 do not enter the fiber optical amplifier 216 at the same time. Controls the driving of the DFB semiconductor laser elements 200 and 202. That is, when the spot light SP of each beam LBn is irradiated onto the substrate FS, the DFB semiconductor laser element 200 is controlled so that only the seed light S1 is incident on the fiber optical amplifier 216. In addition, in the case where the spot light SP of the beam LBn is not irradiated to the substrate FS (the intensity of the spot light SP is very low), only the seed light S2 is incident on the fiber optical amplifier 216. The DFB semiconductor laser element 202 is controlled as possible. In this way, whether or not to irradiate the beam LBn onto the substrate FS is determined based on the pixel data (high/low) of the pattern data (H or L of the drawing bit string data Sdw). In addition, the deflection states of the healds S1 and S2 in this case may be P deflection.

In this way, also in the present modified example, the number of acousto-optic modulation elements can be reduced, and the cost is reduced.

Further, the light source devices 14a and 14b of the present modification may be used for the light source devices 14a and 14b of the first embodiment. In this case, the timing of the output of the heald S1 from the DFB semiconductor laser element 200 output from the light source devices 14a and 14b and the switching of the drawing optical element 106 of each scanning unit U1 to U6 are performed. , You may control based on pattern data (drawing bit string data (Sdw)).

[Third embodiment]

Next, a third embodiment will be described with reference to Fig. 18, but in the third embodiment, it is assumed that the light source devices 14a (refer to Fig. 17) and 14b described in the modified example of the second embodiment are used. do. However, in order to suit the third embodiment, the clock generator 222a in the control circuit 222 of the light source device 14A of FIG. 17 from the control unit (control circuit 500) for drawing control shown in FIG. It has a function of partially (discretely) expanding and contracting the time interval of the clock signal LTC according to the magnification correction information CMg of. Similarly, the clock generator 222a in the control circuit 222 of the light source device 14B has a function of partially (discretely) expanding and contracting the time interval of the clock signal LTC according to the magnification correction information CMg. do. In addition, the operation of the light source device 14B, the light introduction optical system 40b, and the scanning units U2, U4, U6 is performed by the light source device 14A, the light introduction optical system 40a, and the scanning units U1, U3, U5. The operation of the light source device 14B, the optical introduction optical system 40b, and the scanning units U2, U4, and U6 is omitted since the operation is the same. In addition, for the same configuration as the modified example of the second embodiment, the same reference numerals are given or illustrations are omitted, and only other parts will be described.

In Fig. 18, the beam (laser light) LB from one light source device 14A is via the selection optical elements 50, 58, 66, similar to the configurations of Figs. 12 and 13 described above. Thus, they are supplied to each of the three scanning units U1, U3, and U5. Each of the selection optical elements 50, 58, and 66 selectively deflects (switches) the beam LB in response to the drawing enable (On) signals SPP1, SPP3, and SPP5 described in FIGS. 14 and 15 ), and guides the beam LB to any one of the scanning units U1, U3, and U5. In addition, as described above, in a period in which pattern drawing is not performed along each drawing line (non-projection period), the beam LB in the ultraviolet band derived from the heald S2 continues to be radiated even with a slight intensity, and each drawing line Considering the case where the irradiation occurs at the same position on the substrate FS over this long period of time, a movable shutter SST is provided in the exit window of the beam LB of the light source device 14a.

As shown in Fig. 14, the origin signals SZ1, SZ3, SZ5 from the origin sensors OP1, OP3, OP5 of each scanning unit U1, U3, U5 are for each scanning unit U1, U3, U5. It is supplied to the generation circuit (pattern data generation circuit) 301, 303, 305 that generates the pattern data of. The generation circuit 301 includes a gate portion GT1, a memory portion BM1, a counter portion CN1, and the like in FIG. 16, and the counter portion CN1 is a control circuit 222 of the light source device 14a ( It is configured to count the clock signal CLK1 made based on the clock signal LTC output from the clock generator 222a.

Similarly, the generation circuit 303 includes a gate part GT3, a memory part BM3, a counter part CN3, etc. in FIG. 16, and the counter part CN3 is made based on the clock signal LTC. It is configured to count the clock signal CLK3, and the generation circuit 305 includes a gate part GT5, a memory part BM5, a counter part CN5, etc. in FIG. 16, and the counter part CN5 is a clock signal It is configured to count a clock signal CLK5 made based on (LTC).

Such clock signals CLK1, CLK3, CLK5 are controlled by a control circuit 500 that functions as an interface between each generation circuit 301, 303, 305 and the light source device 14A. It is made by dividing /n (n is an integer of 2 or more). The supply of the clock signals CLK1, CLK3, CLK5 to each of the counter units CN1, CN3, CN5 is in response to a drawing enable (On) signal SPP1, SPP3, SPP5 (see Fig. 15), and any one Limited to dogs. That is, when the drawing enable signal SPP1 is On (high), only the clock signal CLK1 obtained by dividing the clock signal LTC by 1/n is supplied to the counter unit CN1, and the drawing enable signal SPP3 When is On (high), only the clock signal CLK3 obtained by dividing the clock signal LTC by 1/n is supplied to the counter unit CN3, and when the drawing enable signal SPP5 is On (high), the clock signal is Only the clock signal CLK5 obtained by dividing the signal LTC by 1/n is supplied to the counter unit CN5.

Thereby, the serial data DL1, DL3, and DL5 sequentially output from each of the generation circuits 301, 303, 305 are respectively via the gate units GT1, GT3, and GT5, and the control circuit 500 ) Is added by a three-input OR circuit GT8 (refer to FIG. 16) (see Fig. 16), and is supplied to the electro-optical element 206 in the light source device 14A as drawing bit string data Sdw. Further, the generation circuits 301, 303, 305 and the control circuit 500 constitute a part of the control device 18.

The above configuration is basically the same as the method of using the light source device 14A described with reference to FIG. 17, but in the present embodiment, each drawing line (scan line) SL1 of the three scanning units U1, U3, U5 , SL3, SL5), a function of individually fine-tuning the drawing magnification in the spot scanning direction (Y direction) of the pattern drawn is provided. For that function, in this embodiment, for each scanning unit (U1, U3, U5), the memory units (BM1a, BM3a, BM5a) temporarily storing information (mg1, mg3, mg5) about the correction amount of the drawing magnification It is prepared. Although these memory units BM1a, BM3a, and BM5a are shown as being independent in FIG. 18, they may be part of the memory units BM1, BM3, and BM5 provided in each of the generation circuits 301, 303, and 305. Information about this correction amount (mg1, mg3, mg5) also constitutes part of the drawing information.

The information on the correction amount (mg1, mg3, mg5) is, for example, the rate at which the Y-direction dimension of the pattern drawn by each drawing line SL1, SL3, SL5 is stretched and contracted at a rate ( ppm). As an example, if the length of the area in the Y direction that can be drawn by each drawing line (SL1, SL3, SL5) is 30 mm, and you want to stretch it by ±200 ppm (corresponding to ±6 μm), information (mg1, mg3) ,mg5) is set to a value such as ±200. In addition, the information (mg1, mg3, mg5) may be set as a direct stretching amount (±ρµm) rather than a rate. In addition, the information (mg1, mg3, mg5) may be set again in order for each pattern data (serial data DLn) for one line along each of the drawing lines SL1, SL3, and SL5, or a pattern for a plurality of lines. You may set it again for each transmission of data (serial data DLn). As described above, in the present embodiment, while the substrate FS is sent in the X direction (longitudinal direction), while pattern drawing is being performed along each of the drawing lines SL1, SL3, SL5, the drawing magnification in the Y direction is dynamically drawn. When it becomes possible to change and, when the deformation|transformation of the board|substrate FS or in-plane distortion becomes clear, the deterioration of the drawing position accuracy caused by this can be suppressed. In addition, when performing exposure by overlapping each other, the overlapping accuracy can be greatly improved in response to deformation of the already formed underlying pattern.

FIG. 19 is a diagram showing a time chart of a signal state of each unit and an oscillation state of the beam LB at the time of drawing a standard pattern by the scanning unit U1 as a representative of the drawing apparatus shown in FIG. 18. In Fig. 19, a two-dimensional matrix Gm represents a bit pattern PP of pattern data to be drawn, and one grid (in units of one pixel (pixel)) on the substrate FS is, for example, Y The dimension Py in the direction is set to 3 μm, and the dimension Px in the X direction is set to 3 μm. In addition, in FIG. 19, SL1-1, SL1-2, SL1-3, ... indicated by arrows. , SL1-6 denotes a drawing line sequentially drawn by the drawing line SL1 according to the movement of the substrate FS in the X direction (sub-scan in the long direction), and each drawing line SL1-1, SL1- The transfer speed of the substrate FS is set so that the distance in the X direction of 2, SL1-3, ..., SSL1-6) is, for example, 1/2 of the dimension Px (3 µm) in units of one pixel.

In addition, the dimension (spot size φ) in the XY direction of the spot light SP projected on the substrate FS is about the same as or slightly larger than that of one pixel unit. Therefore, the size φ of the spot light SP is set to about 3 to 4 μm as an effective diameter (the width of 1/e ² of the Gaussian distribution, or the full width at half the peak intensity), and the drawing line SL1 is Therefore, when the spot light SP is continuously projected, for example, the oscillation frequency Fs (pulse time interval) of the beam LB and the polygon mirror are overlapped by 1/2 of the effective diameter of the spot light SP. The scanning speed Vs of the spot light SP by PM) is set. That is, suppose that the seed light emitted from the polarization beam splitter 208 in the light source device 14A shown in Fig. 17 is referred to as a beam Lse (Fig. 18), this seed light beam Lse is the control circuit 222 (clock generator In response to each clock pulse of the clock signal LTC output from (222a)), it is emitted as shown in FIG.

The clock signal LTC and the clock signal CLK1 supplied to the counter unit CN1 in the generation circuit 301 in Fig. 18 are set at a frequency ratio of 1:2, and the clock signal LTC is 100 MHz. , The clock signal CLK1 is set to 50 MHz by a 1/2 divider by the control circuit 500 in FIG. In addition, the frequency ratio between the clock signal LTC and the clock signal CLK1 may be an integer multiple. For example, the set frequency of the clock signal CLK1 is reduced to 1/4, which is 25 MHz, and the spot light SP is scanned You can also set the speed Vs to be lowered in half.

The drawing bit string data Sdw shown in Fig. 19 corresponds to the serial data DL1 output from the generation circuit 301, and here, for example, on the drawing line SL1-2 of the pattern PP. Corresponds to the pattern. Since the electro-optical element 206 in the light source device 14a switches the polarization state in response to the drawing bit string data Sdw, the seed beam Lse has the drawing bit string data Sdw turned on (high ``1''). ) Is generated by the seed light S1 from the DFB semiconductor laser element 200 in FIG. 17, and while the drawing bit string data Sdw is in the Off state (low "0"), the DFB of FIG. It is generated by the seed light S2 from the semiconductor laser element 202. The operation of the drawing exposure of the scanning unit U1 shown in FIG. 19 above is the same for the other scanning units U2 to U6.

In addition, in the control circuit 222 of the light source device 14a, while the drawing bit string data Sdw is in the On state (high "1"), the DFB semiconductor laser element 200 is responsive to the clock signal LTC. A heald S1 (sharp pulsed light) is generated from the DFB semiconductor laser element 202 in response to the clock signal LTC while the drawing bit string data Sdw is in the Off state (low "0"). When a driving circuit for generating seed light S2 (broad pulsed light) is provided, the electro-optical element 206 shown in Figs. 17 and 18, the polarizing beam splitter 208 shown in Fig. 17, and the absorber ( 210) can be omitted.

As described above, since each pulsed light of the seed beam Lse is output in response to each clock pulse of the clock signal LTC generated by the clock generator 222a shown in FIG. 17, in this embodiment, the clock generator ( In 222a), a circuit configuration for partially increasing or decreasing the time (period) between pulses of the clock signal LTC is provided. In the circuit configuration, a reference (standard) clock generator that serves as a source of the clock signal LTC, a division counter circuit, and a variable delay circuit are provided.

FIG. 20 is a time chart showing the relationship between the reference clock signal TC0 from the reference clock generator in the clock generator 222a and the clock signal LTC, and the magnification correction information CMg shown in FIGS. 17 and 18 It indicates a state in which no based correction has been performed. The variable delay circuit in the clock generator 222a always delays the reference clock signal TC0, which is generated at a constant frequency Fs (constant time Td0), by a delay time DT0 according to the preset value, and outputs it as a clock signal LTC. . Therefore, for example, if the reference clock signal TC0 is 100 MHz (Td0 = 10 nS), the clock signal LTC will continue at 100 MHz (Td0 = 10 nS) as long as there is no change in the preset value (delay time DT0). Is created.

Accordingly, the reference clock signal TC0 is counted by the frequency division counter circuit in the clock generator 222a, and when the counting value reaches a predetermined value Nv, the preset value set in the variable delay circuit is changed by a certain amount. do. The mode will be described by the time chart of Fig. 21. In Fig. 21, the preset value set in the variable delay circuit is the delay time DT0 until the reference clock signal TC0 is counted up to Nv by the division counter circuit. After that, when the division counter circuit counts up to Nv by one clock pulse Kn of the reference clock signal TC0, the preset value set in the variable delay circuit is immediately changed to the delay time DT1. Therefore, each clock pulse (after K'n+1) of the clock signal LTC generated based on the clock pulse after the clock pulse (Kn+1) that occurs after the clock pulse (Kn) of the reference clock signal (TC0) is uniformly It is generated with a delay time DT1.

As a result, only when the preset value set in the variable delay circuit is changed by a certain amount, that is, the time interval Td1 changes only between the clock pulse K'n and the clock pulse K'n+1 of the clock signal LTC. Then, the time interval of the clock pulse of the clock signal LTC thereafter becomes Td0. In Fig. 21, the delay time DT1 is increased from the delay time DT0, and the time between two clock pulses of the clock signal LTC is increased from Td0, but it is also possible to decrease it. Further, the division counter circuit is reset to zero when the reference clock signal TC0 is counted up to Nv, and starts counting up to Nv again.

The initial value of the preset value set in the variable delay circuit is the delay time DT0, the amount of change in the delay time is ±ΔDh, the number of times the division counter circuit is reset to zero is called Nz, and when the division counter circuit counts up to Nv (when zero reset) If the delay time of the preset values sequentially set in the variable delay circuit for each) is DTm, the delay time DTm is set in the relationship of DTm = DT0 + Nz·(±ΔDh). Accordingly, as shown in Fig. 21, the delay time DT1 at which the number of zero reset times Nz is set to 1 (m=1) is DTm=DT1=DT0±ΔDh, and the next zero reset (Nz=2,m=2). The delay time DT2 set after this occurs is DTm=DT2=DT0+2·(±ΔDh). Therefore, the variation of the delay time ±ΔDh corresponds to the difference from the reference time Td0 of the time Td1 between the clock pulse K'n and the clock pulse K'n+1 of the clock signal LTC.

As described above, the operation of changing the time interval between two specific clock pulses of the clock signal LTC is performed by the one drawing line SL1 to SL6 according to the predetermined value Nv set in the division counter circuit. It is performed discretely at multiple points in the entire length. The state is shown in FIG. 22. Fig. 22 shows a plurality of positions that are reset to zero whenever the count value of the division counter circuit reaches a predetermined value Nv over the entire length of the drawing line SL1 as correction points CPP. At each of the correction points CPP, the time between the two specific clock pulses of the clock signal LTC is stretched and contracted in time by ±ΔDh with respect to the time Td0.

Accordingly, the reference clock signal TC0 is set to 100 MHz (Td0 = 10 nS), the effective size of the spot light SP in the main scanning direction is set to 3 μm, and the length of the drawing line (SL1 (also SL2 to SL6)) is set to 30 mm. , Assuming that the spot light SP projected onto the substrate FS by the continuous pulsed light of the two beams LB overlaps about half (1.5 μm) in the main scanning direction and is drawn, the length of the drawing line SL1 The number of clocks of the reference clock signal TC0 generated over time is 20,000. In addition, it is assumed that the change amount ΔDh of the delay time is set sufficiently small, for example, about 2% with respect to the reference time interval Td0. Under this condition, when the pattern to be drawn along the drawing line SL1 is stretched and contracted in the main scanning direction (Y direction) by 150 ppm, 150 ppm of the drawing line SL1 with a length of 30 mm corresponds to 4.5 μm. Information about the rate of these drawing magnifications of 150 ppm or the actual dimension length of 4.5 µm is stored as information mg1 in the memory unit BM1a in FIG. 18.

Therefore, among the 20,000 clock pulse trains of the clock signal LTC, the number of correction points (CPP) (Fig. 22) that stretches and contracts by ΔDh with respect to time Td0 is 4.5 μm/(1.5 μm×2%)=150, The maximum predetermined value Nv set in the division counter circuit shown in Fig. 22 is about 133 from 20000/150.

In addition, when the change amount ΔDh of the delay time is 5%, the number of correction points (CPP) is 4.5 μm/(1.5 μm×5%) = 60, and the maximum predetermined value (Nv ) Becomes about 333 from 20000/60. As described above, since the variation ΔDh of the delay time is less than 10%, even if there is a pattern to be drawn at the correction point CPP, the size of the pattern is larger than the size of the spot light SP. The drawing error due to a slight positional shift in the main scanning direction of the spot light SP in (CPP) is negligible.

The amount of change ΔDh in the delay time as described above, the number of correction points (CPP), setting of the predetermined value Nv by the division counter circuit, etc. are determined by the magnification correction information CMg output from the control circuit 500 of FIG. ppm), it is calculated in the control circuit 222 shown in FIG.

According to the above embodiment, the beam LB from the light source device 14A can be sequentially supplied to each of the three scanning units U1, U3, and U5 in time division, for example, and each scanning unit U1, Since the drawing operation along the drawing lines SL1, SL3, SL5 of U3, U5 can be individually performed serially, the correction amount of the drawing magnification for each scanning unit U1, U3, U5 is adjusted as shown in FIG. Information about (mg1, mg3, mg5) can be set. Accordingly, even if the stretching ratio in the Y direction of the substrate FS is not the same and the stretching ratio is different for several areas divided in the Y direction, the correction amount of the drawing magnification optimal for each scanning unit Un can be set corresponding thereto. In addition, the advantage of being able to cope with the nonlinear deformation of the substrate FS is obtained.

As described above, a light source that is connected to a device for drawing a pattern by scanning spot light SP condensed on an irradiated object (substrate FS) and emitting a beam (laser light) LB that becomes the spot light SP In the device 14A, as shown in Figs. 17 and 18, in response to a clock pulse (clock signal LTC) of a predetermined period Td0, the first sharp light emission time is short for a predetermined period and a peak intensity is high. In response to the first semiconductor laser light source 200 generating the pulsed light (heard light S1) and the clock pulse, the light emission time is shorter than the predetermined period, and more than the light emission time of the first pulsed light (heard light S1). A second semiconductor laser light source 202 that generates a long, low-peak intensity broad second pulsed light (Heald S2), and a first pulsed light (Heald S1) or a second pulsed light (Heald S2). ), based on the incident fiber optical amplifier 216 and information on the pattern to be drawn (writing bit string data (Sdw)), when drawing to project spot light SP on the irradiated object, the first pulse When the light (heard light S1) is incident on the fiber optical amplifier and the spot light SP is not projected on the object to be irradiated, the second pulsed light (heard light S2) is applied to the fiber optical amplifier 216. A switching device for switching to be incident on is provided. The switching device is an electro-optical element 206 selected on the basis of pattern information to be drawn on either of the first pulsed light (heard light S1) and the second pulsed light (heard light S2), or the first The first semiconductor laser light source 200 and the second semiconductor laser light source 202 based on the pattern information to be drawn so that either one of the pulsed light (seeding light S1) and the second pulsed light (seeding light S2) is generated. ) Is composed of a circuit that controls the drive.

This third embodiment can also be applied to the first embodiment, a modification thereof, or the second embodiment. That is, the clock generator 222a in the control circuit 222 of the light source device 14A described in the third embodiment is the magnification correction information from the control unit (control circuit 500) for drawing control shown in FIG. According to (CMg), the function of partially (discretely) expanding and contracting the time interval of the clock signal LTC, the light source device 14 of the first embodiment or a modified example thereof, or the light source device of the second embodiment. Applicable to (14). In this case, the light source device 14 does not have to have the DFB semiconductor laser element 202, the polarization beam splitter 204, the electro-optical element 206, the polarization beam splitter 208, and the absorber 210, that is, The light source device 14 preferably amplifies the pulsed heald S1 emitted by the DFB semiconductor laser element 200 with a fiber optical amplifier 216 and emits it as a beam LB. In this case, since the light source device 14 does not have the electro-optical element 206, the serial data DL1, DL3, and DL5 generated by the generation circuits 301, 303, and 305 are It is sent to the optical element 106 for drawing or the optical element 150 for drawing.

[4th embodiment]

FIG. 23 is a diagram showing a schematic configuration of a device manufacturing system 10 including an exposure apparatus EX that performs exposure processing on a substrate (irradiated object) FS according to the fourth embodiment. In addition, the same reference numerals are given to the same components as those of the first to third embodiments (including modified examples) unless otherwise noted, and only other parts thereof will be described.

In this fourth embodiment, as in the first to third embodiments (including modified examples), the exposure device EX as a beam scanning device is a direct-drawing exposure device that does not use a mask, so-called raster scan. It is a type exposure apparatus. The exposure apparatus EX includes a beam switching member 20 and an exposure head 22 in place of the drawing head 16 described in the first to third embodiments (including modified examples). Moreover, the exposure apparatus EX is also equipped with a plurality of alignment microscopes AMm (AM1 to AM4). Although not described in particular in the first to third embodiments (including modified examples), the exposure apparatus EX of the first to third embodiments is also provided with a plurality of alignment microscopes AMm (AM1 to AM4). . In addition, it goes without saying that the exposure apparatus EX of the fourth embodiment also includes the substrate transfer mechanism 12, the light source device 14', and the control device 18. In addition, it is assumed that the light source device 14' of this fourth embodiment has the same configuration (see Fig. 17) as the light source device 14 (light source devices 14a, 14b) described in the modification example of the second embodiment To The beam LB emitted by this light source device 14' enters the exposure head 22 via the beam switching member 20.

The beam switching member 20 is, among a plurality of scanning units Un (U1 to U6) constituting the exposure head 22, to one scanning unit Un that performs one-dimensional scanning of the spot light SP, The optical path of the beam LB is switched so that the beam LB from the device 14' is incident. This beam switching member 20 will be described in detail later.

The exposure head 22 is provided with a plurality of scanning units Un(U1 to U6) to which each beam LB is incident. The exposure head 22 draws a pattern on a part of the substrate FS supported by the circumferential surface of the rotating drum DR by a plurality of scanning units Un(U1 to U6). The exposure head 22 is a so-called multi-beam type exposure head in which a plurality of scanning units Un (U1 to U6) having the same configuration are arranged. As shown in Fig. 23, the odd-numbered scanning units U1, U3, and U5 are arranged on the upstream side (-X direction side) of the conveyance direction of the substrate FS with respect to the center plane Poc, and further Are arranged along the lines. The even-numbered scanning units U2, U4, and U6 are disposed on the downstream side (+X direction side) of the conveyance direction of the substrate FS with respect to the central plane Poc, and are further disposed along the Y direction. The odd-numbered scanning units U1, U3, and U5 and the even-numbered scanning units U2, U4, U6 are provided symmetrically with respect to the central plane Poc. That is, in the fourth embodiment, the arrangement of the odd-numbered scanning units (U1, U3, U5) and the even-numbered scanning units (U2, U4, U6) is the first to third embodiments (including modified examples). It is the opposite of what was described in.

The scanning unit Un projects the beam LB from the light source device 14' on the irradiated surface of the substrate FS to converge to the spot light SP, and transmits the spot light SP to the substrate FS. Along the predetermined linear drawing line (scanning line) SLn on the irradiated surface of, it is scanned in one dimension by a rotating polygon mirror PM (see Fig. 28).

The plurality of scanning units Un(U1 to U6) are arranged in a predetermined arrangement relationship. In the fourth embodiment, the plurality of scanning units Un(U1 to U6) is a drawing line SLn (SL1 to SL6) of the plurality of scanning units Un(U1 to U6). As shown in Fig. 25, in the Y direction (the width direction of the substrate FS, the main scanning direction), they are arranged to be connected to each other without being separated from each other. In addition, as described in the first to third embodiments (modified example), the beams LB incident on each scanning unit Un(U1 to U6) may be represented by LB1 to LB6, respectively. The beam LB incident on this scanning unit Un is a beam of linearly polarized light (P-polarized or S-polarized) polarized in a predetermined direction, and in the fourth embodiment, a beam of P-polarized light. Further, the beams LB1 to LB6 incident on each of the six scanning units U1 to U6 are sometimes represented by the beam LBn.

As shown in FIG. 25, each scanning unit Un(U1 to U6) is so as to cover all of the plurality of scanning units Un(U1 to U6) in the width direction of the exposure region W. , The injection area is allocated. Thereby, each scanning unit Un(U1 to U6) can draw a pattern for each of a plurality of regions divided in the width direction of the substrate FS. For example, if the scanning length in the Y direction (the length of the drawing line SLn) by one scanning unit Un is about 30 to 60 mm, three of the odd-numbered scanning units U1, U3, U5, and By arranging three total six scanning units Un of the even-numbered scanning units U2, U4, and U6 in the Y direction, the width in the Y direction that can be drawn is widened to about 180 to 360 mm. In principle, the lengths (scanning length, writing width in the main scanning direction) of each of the drawing lines SL1 to SL6 are the same in principle.

Further, as described above, the actual drawing lines SLn (SL1 to SL6) are set slightly shorter than the maximum length at which the spot light SP can actually scan the irradiated surface. By setting in this way, the position of the drawing line SLn (for example, the scanning length is 30 mm) within the range of the maximum scanning length (for example, 31 mm) of the spot light SP is finely adjusted in the main scanning direction, or , It becomes possible to finely adjust the drawing magnification. The maximum scanning length of the spot light SP is mainly determined by the aperture of the f? lens FT (see Fig. 28) provided behind the polygon mirror (rotating polygon mirror) PM in the scanning unit Un.

The plurality of drawing lines SLn (SL1 to SL6) are arranged in two rows in the circumferential direction of the rotating drum DR with the center surface Poc therebetween. The odd-numbered drawing lines SL1, SL3 and SL5 are located on the irradiated surface of the substrate FS on the upstream side (the -X direction side) of the substrate FS in the conveyance direction of the central plane Poc. The even-numbered drawing lines SL2, SL4, SL6 are located on the irradiated surface on the substrate FS on the downstream side (+X direction side) in the conveyance direction of the substrate FS with respect to the central plane Poc. The drawing lines SL1 to SL6 are substantially parallel to the width direction of the substrate FS, that is, the central axis AXo of the rotating drum DR.

Drawing lines SL1, SL3, SL5 are arranged on a straight line at predetermined intervals along the width direction (scanning direction) of the substrate FS. Similarly, the drawing lines SL2, SL4, and SL6 are arranged on a straight line at predetermined intervals along the width direction (scanning direction) of the substrate FS. The scanning direction of the spot light SP of the beam LBn scanned along each of the odd-numbered drawing lines SL1, SL3, and SL5 is a one-dimensional direction and a -Y direction. The scanning direction of the spot light SP of the beam LBn scanned along each of the even-numbered drawing lines SL2, SL4, and SL6 is a one-dimensional direction and a +Y direction.

In the fourth embodiment, the plurality of scanning units Un(U1 to U6) repeatedly scans the spot light SP of the beam LBn in accordance with a predetermined order (a predetermined order). For example, when the order of the scanning unit Un that scans the spot light SP is U1 → U2 → U3 → U4 → U5 → U6, first, the scanning unit U1 is the spot light ( SP) is injected once. And when the scanning of the spot light SP of the scanning unit U1 is finished, the scanning unit U2 scans the spot light SP once, and when the scanning is finished, the scanning unit U3 is In a system in which (SP) is scanned once, a plurality of scanning units Un(U1 to U6) scan the spot light SP once in a predetermined order. Then, when scanning of the spot light SP of the scanning unit U6 is finished, the scanning of the spot light SP of the scanning unit U1 returns. In this way, the plurality of scanning units Un(U1 to U6) repeats the scanning of the spot light SP in a predetermined order.

Each scanning unit Un(U1 to U6) passes each beam LBn to the substrate FS so that each beam LBn travels toward the central axis AXo of the rotating drum DR in at least the XZ plane. Investigate towards ). Thereby, the optical path (beam central axis) of the beam LBn traveling from each scanning unit Un(U1 to U6) toward the substrate FS is in the XZ plane of the irradiated surface of the substrate FS. It becomes the same axis (parallel) with the normal line. In addition, each scanning unit Un(U1 to U6) has a beam LBn that is irradiated to the drawing line SLn (SL1 to SL6) on the irradiated surface of the substrate FS in a plane parallel to the YZ plane The beam LBn is irradiated toward the substrate FS so that it is perpendicular to the relative position. That is, with respect to the main scanning direction of the spot light SP on the irradiated surface, the beams LBn (LB1 to LB6) projected onto the substrate FS are scanned in a telecentric state. Here, a line perpendicular to the irradiated surface of the substrate FS through each midpoint of the drawing line SLn (SL1 to SL6) defined by each scanning unit Un(U1 to U6) (also called an optical axis) Is referred to as the irradiation central axis (Len (Le1 to Le6)) (see Fig. 24).

Each of these irradiation central axes Len (Le1 to Le6) is a line connecting the drawing lines SL1 to SL6 and the central axis AXo in the XZ plane. The irradiation central axes (Le1, Le3, Le5) of the odd-numbered scanning units (U1, U3, U5) are in the same direction in the XZ plane, and each of the even-numbered scanning units (U2, U4, U6) The irradiation central axes Le2, Le4 and Le6 are in the same direction in the XZ plane. In addition, the irradiation central axes (Le1, Le3, Le5) and the irradiation central axes (Le2, Le4, Le6) are set to have an angle of ±θ with respect to the central plane (Poc) in the XZ plane (see FIG. ).

The alignment microscope (AMm (AM1 to AM4)) shown in FIG. 23 is for detecting alignment marks (MKm (MK1 to MK4)) formed on the substrate FS, as shown in FIG. 25, along the Y direction A plurality (four in the fourth embodiment) are provided. The alignment marks MKm (MK1 to MK4) are a predetermined pattern drawn on the exposed area W of the irradiated surface of the substrate FS and a reference mark for relatively aligning (aligning) the substrate FS. to be. The alignment microscope AMm (AM1 to AM4) detects alignment marks MKm (MK1 to MK4) on the substrate FS supported by the circumferential surface of the rotating drum DR. The alignment microscope (AMm (AM1-AM4)) is the irradiated area on the substrate FS by the spot light SP of the beam LBn (LB1-LB6) from the exposure head 22 (drawing line SL1- It is provided on the upstream side (-X direction side) of the conveyance direction of the board|substrate FS rather than the area|region surrounded by SL6).

The alignment microscope (AMm (AM1 to AM4)) includes a light source that projects illumination light for alignment onto the substrate FS, and a local area (observation) including alignment marks (MKm (MK1 to MK4)) on the surface of the substrate FS. An observation optical system (including an objective lens) for obtaining an enlarged image of the area), and an image pickup device such as a CCD or CMOS that captures the enlarged image with a high-speed shutter while the substrate FS is moving in the conveyance direction. The imaging signal (image data) (ig(ig1-ig4)) imaged by the alignment microscope (AMm (AM1-AM4)) is sent to the control device 18. The control device 18 is an encoder that analyzes the image of the imaging signal ig (ig1 to ig4) and reads information on the rotation position of the rotating drum DR at the moment of image capture (scale unit SD shown in FIG. 24 ). Based on (measured values by EN1a, EN1b)), the position of the alignment mark MKm (MK1 to MK4) is detected, and the position of the substrate FS is measured with high accuracy. Further, the illumination light for alignment is light in a wavelength band that has little sensitivity to the photosensitive functional layer on the substrate FS, for example, light having a wavelength of about 500 to 800 nm.

Alignment marks MK1 to MK4 are provided around each exposure area W. A plurality of alignment marks MK1 to MK4 are formed on both sides of the substrate FS in the width direction of the exposure region W at regular intervals DI along the long direction of the substrate FS. The alignment mark MK1 is formed on the -Y direction side of the width direction of the substrate FS, and the alignment mark MK4 is formed on the +Y direction side of the width direction of the substrate FS. These alignment marks MK1 to MK4 are arranged so that they are at the same position with respect to the long direction (X direction) of the substrate FS when the substrate FS is not deformed due to a large tension or thermal process. . In addition, the alignment marks MK2 and MK3 are between the alignment marks MK1 and the alignment marks MK4, in the blank portion between the +X direction side and the -X direction side of the exposure area W. It is formed along the width direction (short direction) of the substrate FS. The alignment marks MK2 and MK3 are formed between the exposure area W and the exposure area W. The alignment mark MK2 is formed on the -Y direction side of the width direction of the substrate FS, and the alignment mark MK3 is formed on the +Y direction side of the substrate FS.

In addition, the distance in the Y direction between the alignment marks MK1 and the alignment marks MK2 arranged at the -Y-direction side end of the substrate FS, the alignment marks MK2 and the alignment marks at the margins. The distance in the Y direction of (MK3) and the distance in the Y direction of the alignment mark MK4 and the alignment mark MK3 arranged at the +Y direction side end of the substrate FS are all set to the same distance. . These alignment marks MKm (MK1 to MK4) may be formed together at the time of forming the pattern layer as the first layer. For example, when exposing the pattern of the first layer, an alignment mark pattern may also be exposed around the exposure region W to which the pattern is exposed. Further, the alignment mark MKm may be formed in the exposure area W. For example, it may be formed in the exposure region W along the outline of the exposure region W. In addition, in the case of forming the alignment mark MKm in the exposure area W, the pattern portion at a specific position or a portion of a specific shape in the pattern of the electronic device formed in the exposure area W is used as the alignment mark MKm. You may use it.

The alignment microscope AM1 is arranged to capture an image of the alignment mark MK1 existing in the observation area (detection area) Vw1 by the objective lens. Similarly, the alignment microscopes AM2 to AM4 are arranged to capture the alignment marks MK2 to MK4 existing in the observation regions Vw2 to Vw4 by the objective lens. Accordingly, the plurality of alignment microscopes AM1 to AM4 are provided in the order of the alignment microscopes AM1 to AM4 from the -Y direction side of the substrate FS, corresponding to the positions of the plurality of alignment marks MK1 to MK4. In the alignment microscope (AMm (AM1 to AM4)), the distance between the exposure position (drawing line (SL1 to SL6)) and the observation area (Vw (Vw1 to Vw4)) of the alignment microscope (AMm) is exposure in the X direction. It is provided so as to be shorter than the length of the region W in the X direction. The number of alignment microscopes AMm provided in the Y direction can be changed according to the number of alignment marks MKm formed in the width direction of the substrate FS. In addition, the size on the irradiated surface of the substrate FS of the observation areas Vw1 to Vw4 is set according to the size of the alignment marks MK1 to MK4 and the alignment accuracy (position measurement accuracy), but is approximately 100 to 500 μm. Size. In addition, although not specifically described in the first to third embodiments (including modified examples), a plurality of alignment marks MKm are also formed on the substrate FS used in the first to third embodiments.

As shown in Fig. 24, at both ends of the rotary drum DR, scale portions SD(SDa, SDb) having scales formed in an annular shape over the entire circumferential direction of the outer peripheral surface of the rotary drum DR are provided. The scale part SD (SDa, SDb) is a diffraction prepared by engraving a concave or convex grid line at a constant pitch (for example, 20 μm) in the circumferential direction of the outer circumferential surface of the rotating drum DR. It is a lattice, and is constructed as an incremental scale. This scale portion SD(SDa, SDb) rotates integrally with the rotating drum DR around the central axis AXo. Further, a plurality of encoders (scale read heads) ENn are provided so as to face this scale unit SD(SDa, SDb). This encoder ENn optically detects the rotational position of the rotating drum DR. Three encoders ENn (EN1a, EN2a, EN3a) are provided to face the scale portion SDa provided at the end of the rotary drum DR on the -Y direction side. Similarly, three encoders ENn (EN1b, EN2b, EN3b) are provided opposite to the scale portion SDb provided at the end of the rotating drum DR on the +Y direction side. In addition, although not specifically described in the first to third embodiments (including modified examples), scale portions SD (SDa, SDb) are provided at both ends of the rotating drum DR of the first to third embodiments. And a plurality of encoders ENn (EN1a to EN3a, EN1b to EN3b) are provided so as to face them.

The encoder (ENn (EN1a to EN3a, EN1b to EN3b)) projects a measurement light beam toward the scale unit (SD (SDa, SDb)) and photoelectrically detects the reflected light beam (diffracted light) to detect a detection signal that is a pulse signal Is output to the control device 18. The control device 18 counts the detection signal (pulse signal) with a counter circuit 356a (refer to Fig. 33) to measure the rotational angle position and angle change of the rotating drum DR with submicron resolution. can do. The counter circuit 356a individually counts detection signals of each encoder ENn (EN1a to EN3a, EN1b to EN3b). The control device 18 can also measure the conveyance speed of the board|substrate FS from the angle change of the rotating drum DR. In the counter circuit 356a that individually counts each detection signal of each encoder (ENn (EN1a to EN3a, EN1b to EN3b)), each encoder (ENn (EN1a to EN3a, EN1b to EN3b)) is a scale unit SDa , SDb) When the origin mark (origin pattern) ZZ formed in a part of the circumferential direction is detected, the count value corresponding to the encoder ENn is reset to zero.

The encoders EN1a and EN1b are arranged on the installation direction line Lx1. The installation direction line Lx1 is the projection position (reading position) and the central axis AXo on the scale part SD(SDa, SDb) of the measurement light beam of the encoders EN1a and EN1b in the XZ plane. It is a connecting line. In addition, the mounting orientation line Lx1 is a line connecting the observation area Vw (Vw1 to Vw4) of each alignment microscope (AMm (AM1 to AM4)) and the central axis (AXo) in the XZ plane.

The encoders EN2a and EN2b are provided on the upstream side (-X direction side) of the transfer direction of the substrate FS with respect to the central plane Poc, and are more in the transfer direction of the substrate FS than the encoders EN1a and EN1b. It is provided on the downstream side (+X direction side). The encoders EN2a and EN2b are arranged on the installation direction line Lx2. The installation direction line Lx2 is a line connecting the projection position on the scale part SD(SDa, SDb) of the measurement light beam of the encoder EN2a and EN2b on the XZ plane and the central axis AXo. have. This installation direction line Lx2 is at the same angular position as the irradiation central axes Le1, Le3, and Le5 in the XZ plane and overlaps.

The encoders EN3a and EN3b are provided on the downstream side (+X direction side) of the conveyance direction of the board|substrate FS with respect to the center plane Poc. The encoders EN3a and EN3b are arranged on the installation direction line Lx3. The installation direction line Lx3 is a line connecting the projection position on the scale part SD(SDa, SDb) of the measurement light beam of the encoder EN3a, EN3b on the scale part SD(SDa, SDb) in the XZ plane and the central axis AXo. have. This installation direction line Lx3 is at the same angular position as the irradiation central axes Le2, Le4, and Le6 in the XZ plane and overlaps.

The count value (rotation angle position) of the detection signal from this encoder (EN1a, EN1b), the count value (rotation angle position) of the detection signal from encoders (EN2a, EN2b), and detection from the encoders EN3a, EN3b The count value (rotation angle position) of the signal is reset to zero at the instant when each encoder ENn detects the origin mark ZZ attached to one point in the circumferential direction of the rotary drum DR. Therefore, when the count value based on the encoders EN1a and EN1b is the first value (e.g., 100), on the installation direction line Lx1 of the substrate FS wound around the rotating drum DR, When the position of (the position of each observation area (Vw1 to Vw4) of alignment microscopes (AM1 to AM4)) is the first position, the first position on the substrate FS is the position on the installation direction line (Lx2) (drawing line) When conveyed to (positions of SL1, SL3, SL5), the count value based on the encoders EN2a and EN2b becomes a first value (eg, 100). Similarly, when the first position on the substrate FS is conveyed to the position on the installation direction line Lx3 (positions of the drawing lines SL2, SL4, SL6), the count value of the detection signal based on the encoders EN3a and EN3b is It becomes the first value (for example, 100).

However, the substrate FS is wound inside the scale portions SDa and SDb at both ends of the rotating drum DR. In FIG. 23, the radius from the central axis AXo of the outer peripheral surface of the scale part SD(SDa, SDb) is set smaller than the radius from the central axis AXo of the outer peripheral surface of the rotating drum DR. However, as shown in FIG. 24, the outer peripheral surface of the scale part SD(SDa, SDb) may be set to be the same surface as the outer peripheral surface of the board|substrate FS wound around the rotating drum DR. That is, the radius (distance) from the central axis AXo of the outer circumferential surface of the scale unit SD (SDa, SDb) and the central axis of the outer circumferential surface (irradiated surface) of the substrate FS wound around the rotating drum DR ( You may set so that the radius (distance) from AXo) may become the same. Thereby, the encoder (ENn (EN1a, EN1b, EN2a, EN2b, EN3a, EN3b)) is the scale part SD (SDa , SDb)), and the Abbe error caused by the difference between the measurement position and the processing position (drawing lines SL1 to SL6) by the encoder ENn in the radial direction of the rotating drum DR is reduced. can do.

From the above, based on the position of the alignment mark (MKm (MK1-MK4)) detected by the alignment microscope (AMm (AM1-AM4)) (count value by encoders EN1a, EN1b), the control device 18 The starting position of the drawing exposure of the exposure area W in the long direction (X direction) of the substrate FS is determined, and the count value based on the encoders EN1a and EN1b at that time is set to a first value (e.g. For example, it is set to 100). In this case, when the count value based on the encoders EN2a and EN2b becomes the first value (e.g., 100), the drawing exposure start position of the exposure area W in the long direction of the substrate FS Is located on the drawing lines SL1, SL3 and SL5. Accordingly, the scanning units U1, U3, and U5 can start scanning the spot light SP based on the count values of the encoders EN2a and EN2b. In addition, when the count value based on the encoders EN3a and EN3b becomes the first value (e.g., 100), the drawing of the exposure area W in the long direction of the substrate FS is drawn. It is located on the lines SL2, SL4 and SL6. Therefore, the scanning units U2, U4, and U6 can start scanning of the spot light SP based on the count values of the encoders EN3a and EN3b. In addition, although not specifically described in the first to third embodiments (including modified examples), the exposure apparatus EX of the first to third embodiments also includes encoders ENn (EN1a to EN3a, EN1b to EN3b) and It is provided with a scale part SD(SDa, SDb).

26 is a configuration diagram of the beam switching member 20. The beam switching member 20 includes a plurality of optical elements for selection (AOMn (AOM1 to AOM6)), a plurality of condensing lenses (CD1 to CD6), a plurality of reflection mirrors (M1 to M12), and a plurality of unit side incidents. It has mirrors IM1 to IM6, a plurality of collimating lenses CL1 to CL6, and an absorber TR. The optical elements for selection (AOMn (AOM1 to AOM6)) are an acousto-optic modulator (AOM: Acousto-Optic Modulator) that has transparency to the beam LB and is driven by an ultrasonic signal. These optical members (optical elements for selection (AOM1 to AOM6), condensing lenses (CD1 to CD6), reflective mirrors (M1 to M12), unit side incident mirrors (IM1 to IM6), collimating lenses (CL1 to CL6), and The absorber TR is supported by the plate-shaped support member IUB. This support member IUB supports these optical members from below (the -Z direction side) above the plurality of scanning units Un(U1 to U6). Therefore, the support member (IUB) also functions to insulate between the selection optical element (AOMn (AOM1 to AOM6)) serving as a heat source and a plurality of scanning units (Un (U1 to U6)). We have.

The beam LB from the light source device 14' is guided to the absorber TR by bending the optical path of the beam LB into a sphere shape by the reflecting mirrors M1 to M12. Hereinafter, a case in which all of the selection optical elements AOMn (AOM1 to AOM6) are in an off state (a state in which an ultrasonic signal is not applied) will be described in detail. The beam LB (parallel light flux) from the light source device 14' travels in the +Y direction parallel to the Y axis, passes through the condensing lens CD1, and enters the reflection mirror M1. The beam LB reflected from the reflection mirror M1 toward the -X direction passes straight through the first optical element AOM1 for selection disposed at the focal position (beam west position) of the condensing lens CD1, It becomes a parallel light beam again by the mate lens CL1, and it reaches the reflection mirror M2. The beam LB reflected by the reflection mirror M2 toward the +Y direction is reflected by the reflection mirror M3 toward the +X direction after passing through the condensing lens CD2.

The beam LB reflected by the reflection mirror M3 passes straight through the second selection optical element AOM2 disposed at the focal position (beam west position) of the condensing lens CD2, and the collimating lens CL2 ), it becomes a parallel light beam again, and reaches the reflection mirror M4. The beam LB reflected in the +Y direction by the reflection mirror M4 passes through the condensing lens CD3 and then is reflected by the reflection mirror M5 in the -X direction. The beam LB reflected from the reflection mirror M5 toward the -X direction passes straight through the third optical element AOM3 for selection disposed at the focal position (beam west position) of the condensing lens CD3, and It becomes a parallel light beam again by the mate lens CL3, and it reaches the reflection mirror M6. The beam LB reflected in the +Y direction by the reflection mirror M6 passes through the condensing lens CD4 and then is reflected in the +X direction by the reflection mirror M7.

The beam LB reflected by the reflection mirror M7 passes straight through the fourth selection optical element AOM4 disposed at the focal position (beam west position) of the condensing lens CD4, and the collimating lens CL4 ), it becomes a parallel light beam again, and reaches the reflection mirror M8. The beam LB reflected by the reflection mirror M8 toward the +Y direction is reflected by the reflection mirror M9 toward the -X direction after passing through the condensing lens CD5. The beam LB reflected from the reflection mirror M9 toward the -X direction passes straight through the fifth selection optical element AOM5 disposed at the focal position (beam west position) of the condensing lens CD5, and It becomes a parallel light beam again by the mate lens CL5, and it reaches the reflection mirror M10. The beam LB reflected in the +Y direction by the reflection mirror M10 passes through the condensing lens CD6 and then is reflected in the +X direction by the reflection mirror M11. The beam LB reflected by the reflection mirror M11 straightly passes through the sixth optical element AOM6 for selection disposed at the focal position (beam west position) of the condensing lens CD6, and the collimating lens CL6 ) Again becomes a parallel beam of light, is reflected in the -Y direction by the reflection mirror M12, and then reaches the absorber TR. This absorber TR is a light trap that absorbs the beam LB in order to suppress leakage of the beam LB to the outside.

As described above, the selection optical elements AOM1 to AOM6 are arranged to sequentially transmit the beam LB from the light source device 14', and the condensing lenses CD1 to CD6 and collimating lenses CL1 to CL6 As a result, it is arranged so that the beam west of the beam LB is formed inside each of the selection optical elements AOM1 to AOM6. As a result, the diameter of the beam LB incident on the selection optical elements AOM1 to AOM6 (acoustic optical modulation elements) is reduced, the diffraction efficiency is increased, and responsiveness is improved.

Each optical element for selection (AOMn(AOM1~AOM6)) diffracts the incident beam (LB) (0th order light) at a diffraction angle according to the frequency of the high frequency when an ultrasonic signal (high frequency signal) is applied. Is generated as an exit beam (beam LBn). In the fourth embodiment, the beams LBn emitted as first-order diffracted light from each of the plurality of optical elements for selection (AOMn (AOM1 to AOM6)) are referred to as beams LB1 to LB6, and each optical element for selection (AOMn (AOM1 to AOM6)) is handled as achieving a function of deflecting the optical path of the beam LB from the light source device 14'. However, as described above, since the actual acousto-optic modulation element has an efficiency of generating the first-order diffracted light about 80% of the zero-order light, the beams LB1 to LB6 deflected in each of the optical elements for selection (AOMn (AOM1 to AOM6)). ) Is lower than the intensity of the original beam LB. Further, when any one of the optical elements for selection (AOMn (AOM1 to AOM6)) is turned on, about 20% of the zero-order light that is not diffracted and goes straight remains, but it is finally absorbed by the absorber TR.

In addition, since the optical element for selection (AOMn) is a diffraction grating that causes a periodic dense change of the refractive index in a predetermined direction in the transmissive member by ultrasonic waves, the incident beam LB is linearly polarized (P polarized light or S polarized light). ), the polarization direction and the periodic direction of the diffraction grating are set such that the generation efficiency (diffraction efficiency) of the first order diffracted light is highest. As shown in FIG. 26, when the optical element for selection AOMn is installed to diffractively deflect the incident beam LB in the Z direction, the periodic direction of the diffraction grating generated in the optical element AOMn for selection is also in the Z direction , The polarization direction of the beam LB from the light source device 14' is set (adjusted) to match it.

In addition, as shown in Fig. 26, each of the plurality of optical elements for selection (AOMn (AOM1 to AOM6)) transmits the deflected beams LB1 to LB6 (first order diffracted light) with respect to the incident beam LB. It is installed to deflect in the -Z direction. The beams LB1 to LB6 deflected and emitted from each of the selection optical elements (AOMn (AOM1 to AOM6)) are units provided at a position separated by a predetermined distance from each of the selection optical elements (AOMn (AOM1 to AOM6)). It is projected onto the side incidence mirrors IM1 to IM6, and is reflected so as to be parallel to the irradiation central axes Le1 to Le6 (the same axis) in the -Z direction. The beams LB1 to LB6 reflected by the unit-side incident mirrors IM1 to IM6 (hereinafter, also referred to as simply mirrors IM1 to IM6), each of the openings TH1 to TH6 formed in the support member IUB. Passing through, it is incident on each of the scanning units Un (U1 to U6) along the irradiation central axes Le1 to Le6.

The configuration, function, action, etc. of each optical element for selection (AOMn (AOM1 to AOM6)) may be the same. The plurality of optical elements for selection (AOMn (AOM1 to AOM6)) turns on/off the generation of diffracted light by diffracting the incident beam LB in accordance with the on/off of the driving signal (high frequency signal) from the control device 18. /Off. For example, when the driving signal (high frequency signal) from the control device 18 is not applied and is in the off state, the optical element AOM1 for selection transmits the incident beam LB without diffracting it. Accordingly, the beam LB that has passed through the selection optical element AOM1 passes through the collimating lens CL1 and enters the reflective mirror M2. On the other hand, when the driving signal from the control device 18 is applied to the selection optical element AOM1, the incident beam LB is diffracted to face the mirror IM1. That is, the selection optical element AOM1 is switched by this drive signal. The mirror IM1 reflects the beam LB1 diffracted by the selection optical element AOM1 to the scanning unit U1 side. The beam LB1 reflected by the mirror IM1 passes through the opening TH1 of the support member IUB and enters the scanning unit U1 along the irradiation central axis Le1. Therefore, the mirror IM1 reflects the incident beam LB1 so that the optical axis of the reflected beam LB1 becomes the same axis as the irradiation central axis Le1. In addition, when the optical element for selection (AOM1) is turned on, the zero-order light (intensity of about 20% of the incident beam) of the beam LB that passes straight through the optical element for selection (AOM1) is The mate lenses CL1 to CL6, the condensing lenses CD2 to CD6, the reflective mirrors M2 to M12, and the selection optical elements AOM2 to AOM6 pass through to reach the absorber TR.

Fig. 27A is a diagram showing the switching of the optical path of the beam LB by the selection optical element AOM1 as viewed from the +Z direction, and Fig. 27B is a view showing the switching of the optical path of the beam LB by the selection optical element AOM1. It is a view seen from the Y direction side When the drive signal is in the off state, the selection optical element AOM1 transmits toward the reflection mirror M2 as it is without diffracting the incident beam LB. On the other hand, when the driving signal is in the ON state, the selection optical element AOM1 generates a beam LB1 in which the incident beam LB is diffracted toward the -Z direction, and directs it to the mirror IM1. Therefore, in the XY plane, without changing the traveling directions of the beam LB (0th order) and the deflected beam LB1 (first order diffracted light) emitted from the selection optical element AOM1, the beam ( The advancing direction of LB1) (first-order diffracted light) is being changed. In this way, the control device 18 switches the selection optical element AOM1 by turning the driving signal (high frequency signal) to be applied to the selection optical element AOM1 on/off (high/low) to It switches whether (LB) is directed toward the subsequent selection optical element AOM2 or the deflected beam (LB1) is directed toward the scanning unit U1.

Similarly, when the driving signal (high frequency signal) from the control device 18 is off, the optical element for selection (AOM2) is transmitted through the incident beam LB (not diffracted by the optical element for selection (AOM1)). The beam LB is transmitted through the collimating lens CL2 side (reflecting mirror M4 side) without diffracting, and when the driving signal from the control device 18 is turned on, the incident beam LB is The beam LB2, which is the diffracted light, is directed toward the mirror IM2. This mirror IM2 reflects the beam LB2 diffracted by the selection optical element AOM2 to the scanning unit U2 side. The beam LB2 reflected by the mirror IM2 passes through the opening TH2 of the support member IUB, becomes the same axis as the irradiation central axis Le2, and enters the scanning unit U2. In addition, the selection optical elements AOM3 to AOM6 are collimated lenses CL3 to CL6 without diffracting the incident beam LB when the driving signal (high frequency signal) from the control device 18 is off. The beams LB3 to LB6, which are the first-order diffracted light of the incident beam LB, transmitted through the side (reflecting mirrors M6, M8, M10, M12) and when the drive signal from the control device 18 is on ) To the mirror (IM3~IM6). These mirrors IM3 to IM6 reflect the beams LB3 to LB6 diffracted by the selection optical elements AOM3 to AOM6 to the scanning units U3 to U6. The beams LB3 to LB6 reflected from the mirrors IM3 to IM6 become the same axis as the irradiation central axes Le3 to Le6, and are scanned through each of the openings TH3 to TH6 of the support member IUB. It is incident on the units U3 to U6. In this way, the control device 18 turns on/off (high/low) the driving signal (high frequency signal) to be applied to each of the selection optical elements AOM2 to AOM6, so that the selection optical elements AOM2 to AOM6 ) By switching any one of, and whether the beam LB is directed to the subsequent optical elements for selection (AOM3 to AOM6) or the absorber TR, one of the deflected beams LB2 to LB6 is determined by the corresponding scanning unit ( Switches whether to face U2~U6).

As described above, the beam switching member 20 includes a plurality of optical elements for selection (AOMn (AOM1 to AOM6)) arranged in series along the traveling direction of the beam LB from the light source device 14'. , One scanning unit Un to which the beam LBn is incident can be selected by switching the optical path of the beam LB. For example, when a beam LB1 is to be incident on the scanning unit U1, the selection optical element AOM1 is turned on and the beam LB3 is to be incident on the scanning unit U3. , It is sufficient to turn on the selection optical element (AOM3). The plurality of optical elements for selection (AOMn (AOM1 to AOM6)) are provided corresponding to the plurality of scanning units Un (U1 to U6), and whether or not the beam LBn is incident on the corresponding scanning unit Un is determined. Switching.

Since the plurality of scanning units Un(U1 to U6) repeats the operation of scanning the spot light SP in a predetermined order, the beam switching member 20 also corresponds to this, and the beams LB1 to LB6 Switches the scanning units U1 to U6 to which any one of) is incident. For example, the order of the scanning unit Un that scans the spot light SP is: U1→U2→... → In the case of U6, the beam switching member 20 also applies the scanning unit Un to which the beam LBn is incident to U1 → U2 → ... → Switch in the order of U6.

From the above, each selection optical element (AOMn (AOM1 to AOM6)) of the beam switching member 20 is the spot light SP by each polygon mirror PM of the scanning unit (Un(U1 to U6)). It only needs to be turned on for one injection period. Although described in detail later, if the number of reflective surfaces of the polygon mirror PM is Np and the rotational speed of the polygon mirror PM is Vp (rpm), the rotation angle for one side of the reflective surface RP of the polygon mirror PM The time Tss corresponding to is Tss=60/(Np·Vp) [second]. For example, when the number of reflection surfaces Np is 8 and the rotational speed Vp is 30,000, one rotation of the polygon mirror PM is 2 milliseconds, and the time Tss is 0.25 milliseconds. This is 4 kHz in terms of frequency, and compared to an acousto-optic modulating device that modulates a beam (LB) of a wavelength in the ultraviolet band at a high speed of about several tens of MHz in response to the drawing data, it is a good acousto-optic modulating device with a significantly lower response frequency it means. Therefore, one having a large diffraction angle of the beams LB1 to LB6 (first order diffracted light) deflected with respect to the incident beam LB (0th order light) can be used, and the optical elements for selection (AOM1 to AOM6) are straightened. With respect to the path of the beams LB passing through, the arrangement of the mirrors IM1 to IM6 (Figs. 26, 27A, and 27B) separating the deflected beams LB1 to LB6 becomes easy.

In addition, since the plurality of scanning units U1 to U6 repeat the operation of scanning the spot light SP once in a predetermined order, the serial data of the pattern data of each scanning unit Un ( DLn) is output to the driving circuit 206a of the light source device 14' in a predetermined order. The serial data DLn sequentially output to this drive circuit 206a is called drawing bit string data Sdw. For example, the predetermined order is U1→U2→... → In the case of U6, first, serial data DL1 for one column is output to the driving circuit 206a, and then serial data DL2 for one column is output to the driving circuit 206a. , Serial data DL1 to DL6 for one column constituting the drawing bit string data Sdw are sequentially output to the driving circuit 206a. After that, the serial data DL1 to DL6 of the next column are sequentially output to the driving circuit 206a as drawing bit string data Sdw. A specific configuration for outputting the drawing bit string data Sdw to the driving circuit 206a will be described later in detail.

The configuration of the scanning units Un(U1 to U6) may be those used in the first to third embodiments, but in the fourth embodiment, the scanning unit Un having a configuration as shown in FIG. 28 is used. Use. Further, the scanning unit Un described below may be used as the scanning unit of the first to third embodiments.

Hereinafter, the optical configuration of the scanning units Un(U1 to U6) used in the fourth embodiment will be described with reference to FIG. 28. In addition, since each of the scanning units Un (U1 to U6) has the same configuration, only the scanning unit U1 is described, and the description of the other scanning units Un is omitted. In addition, in FIG. 28, the direction parallel to the irradiation central axis Len (Le1) is the Zt direction, and as a plane perpendicular to the Zt direction, the substrate FS is from the process device PR1 to the exposure device EX. ), the direction toward the process device PR2 is the Xt direction, the plane orthogonal to the Zt direction, and the direction orthogonal to the Xt direction is the Yt direction. That is, the three-dimensional coordinates of Xt, Yt, and Zt of FIG. 28 are the three-dimensional coordinates of X, Y, and Z of FIG. 23, and the Z-axis direction is parallel to the irradiation center axis (Len) (Le1) around the Y-axis. It is a three-dimensional coordinate rotated as much as possible.

As shown in Fig. 28, in the scanning unit U1, the reflecting mirror M20 and the beam expander along the traveling direction of the beam LB1 from the incident position of the beam LB1 to the irradiated surface of the substrate FS (BE), reflection mirror (M21), polarization beam splitter (BS), reflection mirror (M22), image shift optical member (SR), field aperture (FA), reflection mirror (M23), λ/4 A wave plate QW, a cylindrical lens CYa, a reflective mirror M24, a polygon mirror PM, an fθ lens FT, a reflective mirror M25, and a cylindrical lens CYb are provided. In addition, in the scanning unit U1, an optical lens system G10 and a photodetector DTS for detecting reflected light from the irradiated surface of the substrate FS through the polarization beam splitter BS are provided.

The beam LB1 incident on the scanning unit U1 travels in the -Zt direction and is incident on the reflection mirror M20 inclined at 45° with respect to the XtYt plane. The axis of the beam LB1 incident on the scanning unit U1 is incident on the reflection mirror M20 so as to be the same axis as the irradiation central axis Le1. The reflecting mirror M20 functions as an incident optical member for injecting the beam LB1 into the scanning unit U1, and directs the incident beam LB1 toward the reflecting mirror M21 along an optical axis set parallel to the Xt axis. Reflects in the -Xt direction. Therefore, the optical axis of the beam LB1 traveling parallel to the Xt axis is orthogonal to the irradiation central axis Le1 in a plane parallel to the XtZt plane. The beam LB1 reflected by the reflection mirror M20 passes through the beam expander BE disposed along the optical axis of the beam LB1 traveling in parallel with the Xt axis and is incident on the reflection mirror M21. The beam expander BE enlarges the diameter of the transmitted beam LB1. The beam expander BE has a condensing lens Be1 and a collimating lens Be2 that makes a beam LB1 diverging after converging by the condensing lens Be1 as parallel light.

The reflection mirror M21 is disposed at an angle of 45° with respect to the YtZt plane, and reflects the incident beam LB1 toward the polarization beam splitter BS in the -Yt direction. The polarization splitting surface of the polarization beam splitter (BS) is arranged at an angle of 45° with respect to the YtZt plane, reflects the P-polarized beam, and transmits a linearly polarized (S-polarized) beam polarized in a direction orthogonal to the P-polarized light. Is to do. Since the beam LB1 incident on the scanning unit U1 is a P-polarized beam, the polarization beam splitter BS reflects the beam LB1 from the reflection mirror M21 in the -Xt direction, and the reflection mirror M22 Guide to the side.

The reflection mirror M22 is disposed at an angle of 45° with respect to the XtYt plane, and reflects the incident beam LB1 from the reflection mirror M22 toward the reflection mirror M23 separated in the -Zt direction in the -Zt direction. The beam LB1 reflected by the reflection mirror M22 passes through the image shift optical member SR and the field aperture (field aperture) FA along an optical axis parallel to the Zt axis, and passes through the reflection mirror M23. Enter. The image shift optical member SR two-dimensionally adjusts the center position in the cross section of the beam LB1 in a plane (XtYt plane) perpendicular to the traveling direction of the beam LB1. The image shift optical member SR is composed of two quartz parallel plates Sr1 and Sr2 arranged along the optical axis of the beam LB1 traveling parallel to the Zt axis, and the parallel plate Sr1 is the Xt axis. It can be inclined around the periphery, and the parallel plate Sr2 can be inclined around the Yt axis. Since the parallel plates Sr1 and Sr2 are inclined around the Xt and Yt axes, respectively, in the XtYt plane perpendicular to the traveling direction of the beam LB1, the center position of the beam LB1 is two-dimensionally Shift. These parallel plates Sr1 and Sr2 are driven by an actuator (drive unit) (not shown) under the control of the control device 18.

The beam LB1 that has passed through the image shift optical member SR passes through the circular opening of the field aperture FA, and reaches the reflection mirror M23. The circular opening of the field aperture FA is a stop that cuts out a gentle portion of the intensity distribution in the cross section of the beam LB1 enlarged by the beam expander BE. When the aperture of the circular opening of the field aperture FA is set to a variable iris stop, the intensity (luminance) of the spot light SP can be adjusted.

The reflection mirror M23 is disposed at an angle of 45° with respect to the XtYt plane, and reflects the incident beam LB1 in the +Xt direction toward the reflection mirror M24 separated from the reflection mirror M23 in the +Xt direction. The beam LB1 reflected by the reflection mirror M23 passes through the λ/4 wave plate QW and the cylindrical lens CYa, and is incident on the reflection mirror M24. The reflection mirror M24 reflects the incident beam LB1 toward a polygon mirror (a rotating polyhedron, a deflecting member for scanning) PM. The polygon mirror PM reflects the incident beam LB1 toward the f? lens FT having an optical axis AXf parallel to the Xt axis in the +Xt direction. The polygon mirror PM deflects (reflects) the incident beam LB1 in a plane parallel to the XtYt plane in order to scan the spot light SP of the beam LB1 on the irradiated surface of the substrate FS. Specifically, the polygon mirror PM has a rotation axis AXp extending in the Zt axis direction, and a plurality of reflection surfaces RP formed around the rotation axis AXp (in this fourth embodiment, eight reflection surfaces RP )). By rotating the polygon mirror PM about the rotation axis AXp in a predetermined rotation direction, the reflection angle of the pulse-shaped beam LB1 irradiated to the reflective surface RP can be continuously changed. Thereby, the reflection direction of the beam LB1 is deflected by one reflection surface RP, and the spot light SP of the beam LB1 irradiated on the irradiated surface of the substrate FS is transmitted in the scanning direction (substrate It can scan along the (FS) width direction, Yt direction).

The spot light SP of the beam LB1 can be scanned along the drawing line SL1 by one reflecting surface RP. For this reason, with one rotation of the polygon mirror PM, the number of drawing lines SL1 on which spot light SP is scanned on the irradiated surface of the substrate FS is maximally equal to the number of reflection surfaces RP. There are eight. The polygon mirror PM rotates at a constant speed by a polygon driving unit RM including a motor or the like. The rotation of the polygon mirror PM by the polygon driver RM is controlled by the control device 18. As described above, the effective length (for example, 30 mm) of the drawing line SL1 is less than or equal to the maximum scanning length (for example, 31 mm) capable of scanning the spot light SP by the polygon mirror PM. Is set, and in the initial setting (by design), the center point of the drawing line SL1 (the irradiation central axis Le1 passes) is set at the center of the maximum scanning length.

In addition, as an example, the effective length of the drawing line SL1 is set to 30 mm, and the spot light SP having an effective size φ of 3 μm is overlapped by 1.5 μm, and the drawing line SL1 is formed. Therefore, in the case of irradiation on the irradiated surface of the substrate FS, the number of spot lights SP irradiated with one scan (the number of pulses of the beam LB from the light source device 14') is 20000 (30 mm). /1.5㎛). In addition, if the scanning time of the spot light SP along the drawing line SL1 is 200 μsec, the pulse-shaped spot light SP must be irradiated 20,000 times during that time, so the emission frequency Fs of the light source device 14' Is, Fs≥20000 times/200 μsec=100MHz.

With respect to the non-scanning direction (Zt direction) orthogonal to the scanning direction (rotation direction) by the polygon mirror PM, the cylindrical lens CYa transfers the incident beam LB1 to the reflective surface of the polygon mirror PM ( RP) in a slit shape. When the reflective surface RP is inclined with respect to the Zt direction by the cylindrical lens CYa in which this bus line is parallel to the Yt direction (inclination of the reflective surface RP to the normal line of the XtYt plane) Even if there is, the influence can be suppressed, and it is suppressed that the irradiation position of the beam LB1 irradiated on the irradiated surface of the substrate FS is shifted in the Xt direction.

The fθ lens FT having an optical axis AXf extending in the Xt axis direction makes the beam LB1 reflected by the polygon mirror PM parallel to the optical axis AXf in the XtYt plane. M25) is a telecentric scanning lens. The incident angle θ of the beam LB1 to the fθ lens FT changes according to the rotation angle θ/2 of the polygon mirror PM. The fθ lens FT projects the beam LB1 to an image elevation position on the irradiated surface of the substrate FS in proportion to the incident angle θ through the reflection mirror M25 and the cylindrical lens CYb. If the focal length is fo and the image height position is y, the fθ lens FT is designed to satisfy the relationship y=fo·θ. Therefore, with this f? lens FT, it becomes possible to accurately scan the beam LB1 (spot light SP) in the Yt direction (Y direction) at constant speed. When the incident angle θ to the fθ lens FT is 0 degrees, the beam LB1 incident on the fθ lens FT travels along the optical axis AXf.

The reflecting mirror M25 reflects the incident beam LB1 toward the substrate FS in the -Zt direction via the cylindrical lens CYb. By the fθ lens FT and the cylindrical lens CYb in which the bus line is parallel to the Yt direction, the beam LB1 projected onto the substrate FS is about several μm in diameter on the irradiated surface of the substrate FS ( For example, it converges into minute spot light SP of 3 mu m). Further, the spot light SP projected onto the irradiated surface of the substrate FS is one-dimensionally scanned by the polygon mirror PM by the drawing line SL1 extending in the Yt direction. Further, the optical axis AXf of the f? lens FT and the irradiation central axis Le1 are on the same plane, and the plane is parallel to the XtZt plane. Accordingly, the beam LB1 traveling on the optical axis AXf is reflected in the -Zt direction by the reflection mirror M25, and is projected onto the substrate FS in the same axis as the irradiation central axis Le1. In this fourth embodiment, at least the f? lens FT functions as a projection optical system that projects the beam LB1 deflected by the polygon mirror PM onto the irradiated surface of the substrate FS. In addition, at least the reflecting member (reflecting mirrors M21 to M25) and the polarizing beam splitter BS function as an optical path deflecting member that bends the optical path of the beam LB1 from the reflecting mirror M20 to the substrate FS. do. With this optical path deflecting member, the incident axis of the beam LB1 incident on the reflective mirror M20 and the irradiation central axis Le1 can be made substantially the same axis. Regarding the XtZt plane, the beam LB1 passing through the inside of the scanning unit U1 passes through an almost U-shaped or U-shaped optical path, and then proceeds in the -Zt direction and is projected onto the substrate FS.

In this way, in a state in which the substrate FS is conveyed in the X direction, the spot light SP of the beam LBn is one-dimensional in the scanning direction (Y direction) by each scanning unit Un(U1 to U6). By scanning in a direction, the spot light SP can be two-dimensionally scanned relative to the irradiated surface of the substrate FS. Accordingly, a predetermined pattern can be drawn and exposed on the exposure region W of the substrate FS.

The photodetector DTS has a photoelectric conversion element that photoelectrically converts incident light. On the surface of the rotating drum DR, a predetermined reference pattern is formed. The portion on the rotating drum DR on which the reference pattern is formed is made of a material having a low reflectance (10 to 50%) with respect to the wavelength band of the beam LB1, and The other part is composed of a material having a reflectance of 10% or less or a material that absorbs light. Therefore, in a state in which the substrate FS is not wound (or a state passing through the transparent portion of the substrate FS), the beam LB1 from the scanning unit U1 is in the region where the reference pattern of the rotating drum DR is formed. When spot light SP is irradiated, the reflected light is a cylindrical lens (CYb), a reflective mirror (M25), a fθ lens (FT), a polygon mirror (PM), a reflective mirror (M24), and a cylindrical lens (CYa). ), the λ/4 wave plate QW, the reflection mirror M23, the field aperture FA, the image shift optical member SR, and the reflection mirror M22, and are incident on the polarization beam splitter BS. Here, between the polarization beam splitter BS and the substrate FS, specifically, between the reflection mirror M23 and the cylindrical lens CYa, a λ/4 wave plate QW is provided. Thereby, the beam LB1 irradiated to the substrate FS is converted from P-polarized light to circularly polarized light by this λ/4 wave plate QW, and the polarization beam splitter BS Reflected light incident on) is converted from circularly polarized light to S-polarized light by this λ/4 wave plate QW. Accordingly, the reflected light from the substrate FS passes through the polarization beam splitter BS and enters the photodetector DTS through the optical lens system G10.

At this time, while the pulse-shaped beam LB1 (preferably, the beam LB1 derived from the heald S1) is continuously incident on the scanning unit U1, the rotating drum DR is rotated to When (U1) scans the spot light SP, the spot light SP is irradiated two-dimensionally on the outer peripheral surface of the rotating drum DR. Therefore, the image of the reference pattern formed on the rotating drum DR can be acquired by the photodetector DTS. Specifically, in response to a change in the intensity of the photoelectric signal output from the photodetector DTS, in response to a clock pulse signal (made in the light source device 14') for pulse emission of the spot light SP, each scan By digital sampling every time, it is acquired as one-dimensional image data in the Yt direction, and in response to the measured value of the encoder ENn that measures the rotational angle position of the rotating drum DR, For example, by arranging one-dimensional image data in the Yt direction in the Xt direction for every 1/2 of the size φ of the spot light SP), two-dimensional image information on the surface of the rotating drum DR is obtained. The control device 18 measures the inclination of the drawing line SL1 of the scanning unit U1 based on the acquired two-dimensional image information of the reference pattern of the rotating drum DR. The inclination of the drawing line SL1 may be a relative inclination between the scanning units Un(U1 to U6) or may be an inclination (absolute inclination) with respect to the central axis AXo of the rotating drum DR. In addition, it goes without saying that the slope of each drawing line SL2 to SL6 can also be measured in the same manner.

An origin sensor (origin detector) OP1 is provided around the polygon mirror PM of the scanning unit U1 as shown in FIG. 29. The origin sensor OP1 outputs a pulse-shaped origin signal SZ indicating the start of scanning of the spot light SP by each reflective surface RP. The origin sensor OP1 outputs the origin signal SZ when the rotational position of the polygon mirror PM comes to a predetermined position immediately before scanning of the spot light SP by the reflective surface RP is started. Since the polygon mirror PM can deflect the beam LB1 projected onto the substrate FS in the scanning angle range θs, the reflection direction (deflection direction) of the beam LB1 reflected from the polygon mirror PM is scanned. When it is within the angular range θs, the reflected beam LB1 is incident on the fθ lens FT. Therefore, the origin sensor OP1 returns the origin signal SZ when the rotation position of the polygon mirror PM comes to a predetermined position just before the reflection direction of the beam LB1 reflected from the reflection surface RP enters within the scanning angle range θs. Prints. In addition, the scanning angle range θs and the maximum scanning rotation angle range α shown in Fig. 7 have a relationship of θs=2×α.

Since the polygon mirror PM has eight reflective surfaces RP, the origin sensor OP1 outputs the origin signal SZ eight times in a period in which the polygon mirror PM rotates once. The origin signal SZ detected by this origin sensor OP1 is sent to the control device 18. After the origin sensor OP1 outputs the origin signal SZ, scanning along the drawing line SL1 of the spot light SP is started.

The origin sensor OP1 is from now on the reflection surface RP adjacent to the reflection surface RP for scanning the spot light SP (deflection of the beam LB1) (in the fourth embodiment, the polygon mirror PM Using the reflective surface (RP) in front of one of the rotational directions of ), the origin signal SZ is output. In order to distinguish each reflective surface RP, for convenience, in FIG. 29, the reflective surface RP currently deflecting the beam LB1 is represented by RPa, and the other reflective surfaces RP are rotated counterclockwise. It is (rotation in a direction opposite to the rotation direction of the polygon mirror PM), and is represented by RPb to RPh.

The origin sensor OP1 reflects a light source unit 312 that emits a laser beam Bga in a non-photosensitive wavelength band such as a semiconductor laser, and a laser beam Bga from the light source unit 312 to reflect the polygon mirror PM. It has a beam transmission system (Opa) provided with mirrors 314 and 316 projecting on the reflective surface (RPb). In addition, the origin sensor OP1 is a light receiving unit 318 and mirrors 320 and 322 guiding the reflected light (reflected beam Bgb) of the laser beam Bga reflected from the reflective surface RPb to the light receiving unit 318 And, it has a beam light receiving system Opb including a lens system 324 that condenses the reflected beam Bgb reflected by the mirror 322 into minute spot light. The light receiving unit 318 has a photoelectric conversion element that converts the spot light of the reflected beam Bgb condensed by the lens system 324 into an electric signal. Here, the position at which the laser beam Bga is projected onto each reflective surface RP of the polygon mirror PM is set to be the same surface (position of focus) of the lens system 324.

When the rotational position of the polygon mirror PM becomes a predetermined position just before the scanning of the spot light SP by the reflective surface RP starts, in the beam transmitting system Opa and the beam receiving system Opb, It is provided at a position where the beam receiving system Opb can receive the reflected beam Bgb of the laser beam Bga emitted by the beam transmitting system Opa. That is, the beam transmitting system Opa and the beam receiving system Opb are the reflected beams of the laser beam Bga emitted by the beam transmitting system Opa when the angle of the reflective surface RP becomes a predetermined angular position. It is provided in a position that can receive (Bgb) light. In addition, reference numeral Msf in FIG. 29 denotes the shaft of the rotation motor of the polygon drive unit RM (see FIG. 28) disposed on the same axis as the rotation shaft AXp.

In front of the light-receiving surface of the photoelectric conversion element in the light-receiving portion 318, a light-shielding body having a narrow slit opening is provided (not shown). While the angular position of the reflective surface RPb is within a predetermined angular range, the reflected beam Bgb is incident on the lens system 324, and the spot light of the reflected beam Bgb is on the light shielding body in the light receiving unit 318. Is injected in a certain direction. During the scanning, the spot light of the reflected beam Bgb, which has passed through the slit opening of the light shielding body, is received by the photoelectric conversion element of the light receiving unit 318, and the received signal is amplified by an amplifier to form a pulse-shaped origin signal SZ Is output as.

The origin sensor OP1, as described above, from the reflective surface RPa that deflects the beam LB1 (scans the spot light SP), and uses one reflective surface RPb in front of the rotation direction. The origin signal SZ is detected. Therefore, the angle ηj formed by each of the adjacent reflective surfaces RP (e.g., reflective surfaces RPa and reflective surfaces RPb) is a design value (when the reflective surfaces RP are 8, 135 degrees), the timing of generation of the origin signal SZ may vary for each reflective surface RP, as shown in FIG. 30 due to the deviation of the error.

In Fig. 30, the origin signal SZ generated using the reflective surface RPb is referred to as SZb. Similarly, the origin signal SZ generated by using the reflective surfaces RPc, RPd, RPe, ... is SZc, SZd, SZe, ... It is called. When each ηj formed by the adjacent reflective surfaces RP of the polygon mirror PM is a design value, the interval between the generation timing of each origin signal SZ (SZb, SZc, SZd, ...) is the time Tpx. do. This predetermined time Tpx is a time required for the polygon mirror PM to rotate for one plane of the reflective surface RP. However, in FIG. 30, the timing of the origin signals SZc and SZd generated using the reflective surfaces RPc and RPd is normal due to the error of each ηj formed by the reflective surface RP of the polygon mirror PM. There is a shift in the timing of occurrence. Further, the time intervals Tp1, Tp2, Tp3, ... at which the origin signals SZb, SZc, SZd, SZe, ... Silver is not constant in the µ second order due to the manufacturing error of the polygon mirror PM. In the time chart shown in FIG. 30, Tp1<Tpx, Tp2>Tpx, and Tp3<Tpx are made. Further, if the number of reflective surfaces RP is Np and the rotational speed of the polygon mirror PM is Vp, Tpx is represented by Tpx = 60/(Np×Vp) [seconds]. For example, if Vp is 30,000 rpm and Np is 8, Tpx is 250 μs.

Therefore, the substrate FS of the spot light SP drawn by each reflecting surface RP (RPa to RPh) by an error of each ηj made by each of the adjacent reflective surfaces RP of the polygon mirror PM The position of the drawing start point (scan start point) of the drawing line SL1 on the irradiated surface of) is disturbed in the main scan direction. Thereby, the position of the drawing end point of the drawing line SL1 is also disturbed in the main scanning direction. That is, since the position of the drawing line SL1 of the spot light SP drawn by each reflective surface RP is shifted along the scanning direction (Y direction), the drawing start point and the drawing of each drawing line SLn The position of the end point is not linear along the X direction. The factors in which the positions of the drawing start point and the drawing end point of the drawing line SL1 of the spot light SP are disturbed in the main scanning direction are Tp1, Tp2, Tp3, ... This is because =Tpx does not work.

Accordingly, in the fourth embodiment, as in the time chart shown in Fig. 30, after the time Tpx after the generation of one pulse-shaped origin signal SZ is used as the drawing start point, the spot light SP is drawn. Start. That is, the control device 18 controls the beam switching member 20 so that the beam LB1 is incident on the scanning unit U1 after time Tpx after the origin signal SZ is generated, and is shown in FIG. To the driving circuit 206a of one light source device 14', drawing bit string data Sdw, that is, serial data DL1, of the scanning unit U1 that performs scanning from now on is output. Thereby, the reflection surface RPb used for detection of the origin signal SZ and the reflection surface RP that actually scans the spot light SP can be the same reflection surface.

Specifically, the control device 18 is the optical element AOM1 for selection of the beam switching member 20 after time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZb. E, a driving signal of ON for a certain time (on time Ton) is output. The predetermined time (on time Ton) for this selection optical element AOM1 to be turned on is a predetermined time, and the spot light SP is drawn by one reflecting surface RP of the polygon mirror PM. SL1) is set to cover a period (scan period) to be scanned once. Then, the control device 18 outputs the serial data DL1 of a specific column, for example, the first column to the driving circuit 206a of the light source device 14'. Accordingly, during the scanning time during which the scanning unit U1 scans the spot light SP, the beam LB1 enters the scanning unit U1, so that the scanning unit U1 is in a certain row (for example, , The first column) of the serial data DL1. In this way, after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZb, the scanning unit U1 scans the spot light SP after time Tpx, so that the origin signal SZb is On the reflective surface RPb used for detection, the spot light SP resulting from the origin signal SZb can be scanned.

Next, the control device 18 to the optical element AOM1 for selection of the beam switching member 20 after time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZd, Outputs a driving signal of ON for a certain time (on time Ton). Then, the control device 18 outputs the serial data DL1 of the next column, for example, the second column, to the driving circuit 206a of the light source device 14'. Accordingly, during the time period including the time required for the scanning unit U1 to scan the spot light SP, the beam LB1 enters the scanning unit U1, so that the scanning unit U1 is in the next column. A pattern according to the serial data DL1 (for example, the second column) can be drawn. In this way, after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZd, the scanning unit U1 scans the spot light SP after time Tpx, so that the origin signal SZd The spot light SP resulting from the origin signal SZd can be scanned on the reflective surface RPb used for detection of. In addition, when scanning of the spot light SP is performed by skipping one surface instead of for each reflective surface RP in which the polygon mirror PM is continuous, skipping one origin signal SZ (one Filtering) to perform drawing treatment. The reason for such a drawing process by skipping one will be described in detail next.

In this way, after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZ, the control device 18 so that the scanning unit U1 scans the spot light SP. While controlling the beam switching member 20, serial data DL1 is output to the driving circuit 206a of the light source device 14'. In addition, the control device 18 sets the column of the serial data DL1 to be output each time the scanning by the scanning unit U1 starts, the first column, the second column, the third column, the fourth column, ... As shown, it moves in the column direction In addition, during the first scan of the spot light SP by the scan unit U1 to the next scan, the scan of the spot light SP by another scan unit Un (scan units U2 to U6) is performed. It is done in order. The scanning of the spot light SP by the other scanning units Un (U2 to U6) is the same as the scanning of the scanning unit U1. In addition, the origin sensor OPn (OP1-OP6) is provided for each scanning unit Un (U1-U6).

As described above, by scanning the spot light SP using the reflection surface RP used for detection of the origin signal SZb of the scanning unit U1, the reflection surfaces adjacent to each other of the polygon mirror PM ( Even when there is an error in each ηj formed by each of RP), the drawing start point and the drawing end point of the irradiated surface of the substrate FS of the spot light SP drawn by each reflective surface RP (RPa to RPh) It is possible to suppress the distraction of the position of the main scanning direction.

In order to do this, the time Tpx for the polygon mirror PM to rotate 45 degrees is required to be accurate in the order of μ seconds, that is, the polygon mirror PM needs to be rotated at a uniform and precisely constant speed. In this case, when the polygon mirror PM is rotated at a constant velocity, the reflective surface RP used to generate the origin signal SZ is always rotated exactly 45 degrees after the time Tpx to rotate the beam LB1. It is an angle reflected toward the fθ lens FT. Therefore, since the rotational constant property of the polygon mirror PM is increased and the speed unevenness during one rotation is reduced as much as possible, the spot light by deflecting the position of the reflection surface RP and the beam LB1 used to generate the origin signal SZ The position of the reflective surface RP used to scan (SP) can be changed. That is, since the generation timing of the origin signal SZ is delayed by time Tpx, as a result, it has the same effect as detecting the origin signal SZ using the reflection surface RP for scanning the spot light SP. Have. Thereby, the degree of freedom in the arrangement of the origin sensor OP1 (OPn) is improved, and the origin sensor having a high rigidity and a stable configuration can be provided. In addition, the reflection surface RP, which is a detection target by the origin sensor OP1 (OPn), is in front of one of the rotational directions of the reflection surface RP for deflecting the beam LB1 (LBn), but the polygon mirror PM ) May be in front of the direction of rotation, and is not limited to one forward. In this case, when the origin sensor OP forwards the reflective surface RP as a detection target by n (an integer greater than 1) in the rotation direction of the reflective surface RP that deflects the beam LB1 (LBn) , After the origin signal SZ is generated, a drawing start point may be set n×hour Tpx.

In addition, for each of the origin signals (SZb, SZd, ...) generated every other one from the origin sensor (OP1 (OPn)), the drawing start point is set after n × time Tpx to correspond to each drawing line (SL1). There is a margin for processing time such as reading operation of one pixel data column, data transfer (communication) operation, or correction calculation. For this reason, it is possible to reliably avoid transmission errors of the pixel data string and errors or partial loss of the pixel data string.

In addition, as shown in Fig. 29 above, the reflection surface RP adjacent to the reflection surface RP for scanning the spot light SP (deflection of the beam LB1) from now on (in this fourth embodiment, the polygon mirror A half that scans the spot light SP (deflection of the beam LB1) from now on without providing the origin sensor OPn that detects the reflection surface RP in front of the rotation direction of (PM). An origin sensor for detecting the reflective surface RP that is the same as the slope RP may be provided. In that case, as described in FIG. 30, since the time interval of the origin signal (pulse shape) SZ generated for each reflective surface Rpa to RPh of the polygon mirror PM is disturbed, each reflective surface Rpa to Rph ), it is necessary to add a temporal offset according to the deviation.

Here, as described in FIG. 7, when the number Np of the reflective surfaces RP of the polygon mirror PM is 8 and the maximum scanning rotation angle range α is 15 degrees, the scanning efficiency (α/β) is 1/3 Becomes. For example, while the scanning unit U1 scans the spot light SP until the next scan is performed, the beam LBn is distributed to two scanning units Un other than the scanning unit U1. , The spot light SP can be scanned. That is, while the polygon mirror PM of the scanning unit U1 rotates by one side, the corresponding beam LBn is distributed to each of the three scanning units Un including the scanning unit U1, and the spot It is possible to scan the light SP.

However, since the scanning efficiency of the polygon mirror PM is 1/3, in the case where each scanning unit Un scans the spot light SP in the maximum scanning rotation angle range α (15 degrees), the scanning unit U1 ) While the polygon mirror PM rotates for one side of the reflective surface RP (β = 45 degrees), the beam LBn is transferred to three or more scanning units (Un(U2 to U6) other than the scanning unit U1). ) Cannot be allocated. That is, in the period from the start of scanning of the spot light SP of the scanning unit U1 to the start of the scanning of the next spot light SP, three or more beams LBn are scanned other than the scanning unit U1. It cannot be distributed to units (Un(U2~U6)). Thus, the beam LBn is distributed to each of the other five scanning units Un(U2 to U6) in the period from the start of scanning by the spot light SP of the scanning unit U1 to the start of the next scanning. In addition, in order to perform scanning by spot light SP, the following method can be considered.

Even when the maximum scanning rotation angle range α is 15 degrees, the scanning rotation angle range α'of the polygon mirror PM that can actually scan the spot light SP is smaller than the maximum scanning rotation angle range α (α = 15 degrees). Set. Specifically, while each polygon mirror PM of the scanning unit Un(U1 to U6) rotates for one side of the reflective surface RP (β = 45 degrees), the scanning to which the beam LBn is to be distributed is performed. Since the number of units Un is 6, the scanning rotation angle range α'is set to α'=45/6=7.5 degrees. That is, the angle of deviation around the optical axis AXf of the beam LBn incident on the f? lens FT in FIG. 28 is limited to ±7.5 degrees. Thereby, while the polygon mirror PM of each scanning unit Un is rotated by 45 degrees (while rotating by one side of the reflective surface RP), the beam LBn is converted into six scanning units (Un(U1)). -U6)) can be sequentially distributed and incident, and the scanning units Un (U1-U6) can sequentially perform scanning by spot light SP. However, in this case, the scanning rotation angle range α'in which the spot light SP can actually be scanned becomes too small, so the maximum scanning range length in which the spot light SP is scanned, that is, the maximum scanning length of the drawing line SLn. There is a problem that the is too short. To avoid such a problem, an fθ lens (FT) having a long focal length is prepared so as not to change the maximum scanning length at which the spot light SP is scanned, and the fθ lens (FT) from the reflective surface (RP) of the polygon mirror (PM). ) To a long distance (operating distance). In this case, there is a concern that the stability of the beam scanning may be deteriorated due to an increase in the size of the fθ lens FT and an increase in the dimensions of the scanning units Un(U1 to U6) in the Xt direction, and a long working distance. .

On the other hand, it is conceivable to reduce the number of reflective surfaces RP of the polygon mirror PM and increase the rotation angle β at which the polygon mirror PM rotates for one side of the reflective surface RP. In this case, the polygon mirror PM of the scanning unit Un(U1 to U6) is reduced to the reflective surface ( During rotation of one side of the RP (rotation angle β), the beam LBn is distributed so that the six scanning units Un (U1 to U6) can sequentially scan the spot light SP. For example, when the number of reflective surfaces RP of the polygon mirror PM is 4, that is, when the shape of the polygon mirror PM is square, the reflective surface RP of the polygon mirror PM The rotation angle β rotated for one side is 90 degrees. Therefore, while the polygon mirror PM of the scanning unit U1 rotates for one side of the reflective surface RP, the beam LBn is distributed and the spot light SP is divided into six scanning units Un(U1 to U6). When scanning is performed, the scanning rotation angle range α′ of the polygon mirror PM capable of actually scanning the spot light SP becomes α′=90/6=15 degrees, and the above-described maximum scanning rotation angle range α Becomes equal to

However, if a polygonal polygon mirror (PM) with a small number of reflection surfaces Np such as a triangle or a square is rotated at high speed, the air resistance (wind loss) becomes too large, and the rotation speed and rotation number decrease (the rule of law). . For example, even if you want to rotate the polygon mirror (PM) at high speed at tens of thousands of rpm (rotation per minute), the rotation speed is reduced by 2-3% due to the air resistance, and the desired high speed rotation speed and high rotation speed can be obtained. none. Further, a method of increasing the size of the outer shape of the polygon mirror PM is also conceivable, but the weight of the polygon mirror PM becomes too large, and a desired high speed rotation speed and high rotation speed cannot be obtained. In addition, as a method of reducing wind loss during rotation even if the number of reflective surfaces Np of the polygon mirror PM is reduced, the entire polygon mirror PM is installed in a vacuum environment or in an environment of gas (such as helium) having a molecular weight smaller than that of air. You can also think of installing it. In that case, an airtight structure for creating such an environment is provided around the polygon mirror PM, which leads to enlargement of the scanning units Un (U1 to U6) by that amount.

Accordingly, in the fourth embodiment, a polygon mirror PM that can actually scan the spot light SP while using a polygon having a relatively large number of reflection surfaces Np, that is, an octagonal polygon mirror PM closer to a circle. ) As the maximum scanning rotation angle range α (α = 15 degrees), and the reflection surface of the polygon mirror PM performing scanning (deflection of the beam LBn) of the spot light SP ( RP) is set every other one. That is, the scanning of the spot light SP by each scanning unit Un(U1 to U6) is repeated for every single-sided filtering (one-sided skip) of the reflective surface RP of the polygon mirror PM. Therefore, while the scanning unit U1 scans the spot light SP until the next scan is performed, each of the five scanning units U2 to U6 other than the scanning unit U1 is sequentially sent to the beams LB2 to U6. By distributing LB6), the spot light SP can be scanned. That is, while the polygon mirror PM of one scanning unit Un of interest among the six scanning units Un(U1 to U6) rotates by two sides, the six scanning units Un(U1 to U6) By distributing the beams LB1 to LB6 to each, it becomes possible for all of the six scanning units Un (U1 to U6) to scan the spot light SP. In this case, from the start of scanning of the spot light SP to each scanning unit Un(U1 to U6), until the scanning of the next spot light SP is started, the polygon mirror PM has two sides (90). Fig.) It will rotate. In order to perform such a drawing operation, each of the polygon mirrors PM of the six scanning units Un(U1 to U6) is synchronously controlled so that the rotational speed becomes the same, and the reflection surface of each polygon mirror PM ( It is synchronously controlled so that the angular positions of RP) have a predetermined phase relationship with each other.

In addition, since the reflection surface RP of the polygon mirror PM for scanning the spot light SP (deflection of the beam LBn) is performed on every other surface, the polygon of each scanning unit Un(U1 to U6) During one rotation of the mirror PM, the number of scans of the spot light SP according to each of the drawing lines SLn (SL1 to SL6) is 4 times. Therefore, when the scanning of the spot light SP (deflection of the beam LBn) is repeated for each reflection surface RP in which the polygon mirror PM is successive, that is, each reflection surface of the polygon mirror PM ( Compared to the case performed by RP), since the number of drawing lines SLn becomes half, it is preferable that the conveyance speed of the substrate FS is also reduced to half. When it is not desired to make the transfer speed of the substrate FS in half, the rotational speed and oscillation frequency Fs of the polygon mirror PM of each scanning unit Un(U1 to U6) are doubled. For example, the rotation speed of the polygon mirror PM when repeating the scanning of the spot light SP (deflection of the beam LBn) for each reflective surface RP in which the polygon mirror PM is continuous is 20,000 rpm. And, when the oscillation frequency Fs of the beam LB from the light source device 14' is 200 MHz, scanning of the spot light SP for each reflective surface RP that is filtered from one surface of the polygon mirror PM (beam LBn) Deflection) is repeated, the rotational speed of the polygon mirror PM is set to 40,000 rpm, and the oscillation frequency Fs of the beam LB from the light source device 14' is set to 400 MHz.

Here, the control device 18 manages which scanning unit Un among the plurality of scanning units Un (U1 to U6) performs the scan of the spot light SP based on the origin signal SZ. . However, the origin sensor OPn of each scanning unit Un(U1 to U6) generates the origin signal SZ when each reflective surface RP reaches a predetermined angular position, so that the origin signal SZ as it is. If used, the control device 18 determines that each scanning unit Un(U1 to U6) scans the spot light SP for each continuous reflective surface RP. Therefore, the beam LBn cannot be distributed to the other five scanning units Un from one scanning unit Un scanning the spot light SP to the next scanning. Therefore, in order to set every other reflective surface RP of the polygon mirror PM for scanning the spot light SP, the sub-origin signal (sub-origin pulse signal) (ZP) from which the origin signal SZ is thinned out. ) Need to be created. In addition, as described above, detection of the origin signal SZ is performed using the reflective surface RP in front of the rotational direction of the reflective surface RP for scanning (deflection) of the spot light SP. Therefore, it is necessary to generate the sub-origin signal ZP in which the generation timing of the origin signal SZ is delayed by a time Tpx. Hereinafter, the configuration of the sub-origin generating circuit CA for generating the sub-origin signal ZP will be described.

FIG. 31 is a configuration diagram of a sub-origin generating circuit CA for generating a sub-origin signal ZP in which the origin signal SZ is thinned and the timing of its occurrence is delayed by a time Tpx. It is a figure which shows the time chart of the sub-origin signal ZP generated by the circuit CA. This sub-origin generation circuit CA has a divider 330 and a delay circuit 332. The frequency divider 330 divides the frequency of the generation timing of the origin signal SZ by 1/2 and outputs it to the delay circuit 332 as the origin signal SZ'. The delay circuit 332 delays the transmitted origin signal SZ' by a time Tpx, and outputs it as a sub-origin signal ZP. A plurality of sub-origin generating circuits CA are provided corresponding to the origin sensors OPn of each scanning unit Un (U1 to U6).

In addition, the sub-origin generating circuit CA corresponding to the origin sensor OPn of the scanning unit Un may be indicated by CAn. That is, the sub-origin generating circuit CA corresponding to the origin sensor OP1 of the scanning unit U1 is denoted by CA1, and the sub-origin generating circuit corresponding to the origin sensors OP2 to OP6 of the scanning units U2 to U6. (CA) may be represented by CA2 to CA6. Further, the origin signal SZ output from the origin sensor OPn of the scanning unit Un may be represented by SZn. That is, the origin signal SZ output from the origin sensor OP1 of the scanning unit U1 is represented by SZ1, and the origin signal SZ output from the origin sensors OP2 to OP6 of the scanning units U2 to U6 is represented. It may be represented by SZ2 to SZ6. In addition, the origin signal SZ' and the sub-origin signal ZP generated based on the origin signal SZn may be represented by SZn' and ZPn. That is, the origin signal SZ' generated based on the origin signal SZ1 and the sub-origin signal ZP are represented by SZ1' and ZP1, and similarly, the origin signal SZ generated based on the origin signals SZ2 to SZ6. '), the sub-origin signal ZP is sometimes represented by SZ2' to SZ6' and ZP2 to ZP6.

33 is a block diagram showing the electrical configuration of the exposure apparatus EX, and FIG. 34 is a block diagram showing the timing at which the origin signals SZ1 to SZ6, the sub-origin signals ZP1 to ZP6, and the serial data DL1 to DL6 are output. It's a time chart. The control device 18 of the exposure apparatus EX includes a rotation control unit 350, a beam switching control unit 352, a drawing data output control unit 354, and an exposure control unit 356. Further, the exposure apparatus EX includes motor drive circuits Drm1 to Drm6 for driving the polygon driver RM including a motor of each of the scanning units Un(U1 to U6) or the like.

The rotation control unit 350 controls the rotation of the polygon mirror PM of each scanning unit Un(U1 to U6) by controlling the motor driving circuits Drm1 to Drm6. The rotation control unit 350 controls the motor driving circuits Drm1 to Drm6 so that the rotation angle positions of the polygon mirrors PM of the plurality of scanning units Un(U1 to U6) become a predetermined phase relationship with each other. The polygon mirror PM of the scanning units Un (U1 to U6) of is rotated in synchronization. In detail, the rotation control unit 350 is such that the rotational speed (number of rotations) of the polygon mirrors PM of the plurality of scanning units U1 to U6 are equal to each other, and the phase of the rotation angle position is shifted by a predetermined angle The rotation of the polygon mirror PM of the plurality of scanning units Un (U1 to U6) is controlled. In addition, reference numerals PD1 to PD6 in FIG. 33 denote control signals output from the rotation control unit 350 to the motor drive circuits Drm1 to Drm6.

In the fourth embodiment, the rotational speed Vp of the polygon mirror PM is 39,000 rpm (650 rpm). In addition, since the number of reflection surfaces Np is set to 8, the scanning efficiency (α/β) is set to 1/3, and the reflection surface (RP) for scanning the spot light SP is set for every other surface, the six polygon mirrors PM The phase difference of the rotation angle position is set to the maximum scanning rotation angle range α, that is, 15 degrees. The scanning of the spot light SP is from U1→U2→... → It shall be performed in the order of U6 Accordingly, in this order, the rotation control unit 350 is synchronously controlled so that the phase of the rotational angular position of each of the polygon mirrors PM of the six scanning units U1 to U6 is rotated at a constant speed in a state shifted by 15 degrees. Thereby, the phase shift of the rotation angle position of the scan unit U1 and the scan unit U4 becomes exactly 45 degrees corresponding to the rotation angle for one side. Therefore, the phases of the rotational angle positions of the scanning unit U1 and the scanning unit U4, that is, the timing of generation of the origin signals SZ1 and SZ4 may be coincident. Similarly, since the rotational angle positions of the scanning unit U2 and the scanning unit U5 and the phase shift of the rotational angular positions of the scanning unit U3 and the scanning unit U6 are all 45 degrees, the scanning unit U2 and the scanning Even though the timing of generation of the origin signals SZ2 and SZ5 from each of the units U5 and the generation timing of the origin signals SZ3 and SZ6 from each of the scanning unit U3 and the scanning unit U6 coincide on the time axis. do.

Specifically, the rotation control unit 350 rotates the polygon mirror PM of the scanning unit U1 and the scanning unit U4, the rotation of the polygon mirror PM of the scanning unit U2 and the scanning unit U5, And rotation of the polygon mirror PM of each scanning unit U1 to U6 so that each rotation of the polygon mirror PM of the scanning unit U3 and the scanning unit U6 is in a first control state. It is controlled through the circuit (Drm1~Drm6). This first control state is a state in which the phase difference of the circumferential pulse signal output each time the polygon mirror PM rotates is 0 (zero). In other words, the scanning unit U1 and the scanning unit U4 so that the phase difference of the revolving pulse signal output each time the polygon mirror PM of the scanning unit U1 and the scanning unit U4 becomes 0 (zero). Controls the rotation of the polygon mirror PM of ). Similarly, the phase difference of the circumferential pulse signal output each time the scan unit U2 and the scan unit U5 and the polygon mirror PM of the scan unit U3 and the scan unit U6 rotate is 0 (zero). As much as possible, rotation of the scanning unit U2 and the scanning unit U5, and the polygon mirror PM of the scanning unit U3 and the scanning unit U6 is controlled.

This circumferential pulse signal may be a signal that is output once every eight times the origin signal SZn of the scanning unit Un is output by a frequency divider (not shown). Further, the circumferential pulse signal may be a signal output from an encoder (not shown) provided in the polygon driver RM of each scanning unit Un (U1 to U6). A sensor for detecting the circumferential pulse signal may be provided in the vicinity of the polygon mirror PM. In the example shown in Fig. 34, it is assumed that once every time the origin signal SZn of the scanning unit Un is outputted eight times, a revolving pulse signal is generated, and an origin signal corresponding to the generation of the revolving pulse signal ( SZn) is shown by a dotted line. In addition, each origin signal (SZ1) and each origin signal (SZ4) is an error of each ηj formed by each of the adjacent reflective surfaces (RP) (e.g., reflective surfaces (RPa) and reflective surfaces (RPb)). If (refer to Fig. 29) is not considered, all phases are consistent on the time axis. Similarly, each origin signal (SZ2) and each origin signal (SZ5), and each origin signal (SZ3) and each origin signal (SZ6) is an error of each ηj formed by each of the adjacent reflective surfaces (RP) (Fig. 29), all phases are consistent on the time axis. In addition, in FIG. 34, in order to make the explanation easier to understand, it is assumed that there is no error in each ηj formed by the adjacent reflective surfaces RP.

And the rotation control unit 350 maintains the first control state, with respect to the rotation angle position of the polygon mirror PM of the scanning units U1 and U4, the polygon mirror PM of the scanning units U2 and U5. The rotation of the polygon mirror PM of the scanning units U2 and U5 is controlled so that the phase of the rotation angle position of is shifted by 15 degrees. Likewise, the rotation control unit 350 maintains the first control state, with respect to the rotation angle position of the polygon mirror PM of the scanning units U1 and U4. The rotation of the scanning units U3 and U6 is controlled so that the phase of the rotation angular position is shifted by 30 degrees. The time (the maximum scanning time of the beam LBn) that this polygon mirror PM rotates 15 degrees is taken as Ts.

Specifically, the rotation control unit 350 generates the circumferential pulse signals obtained by the scanning units U2 and U5 as late as time Ts with respect to the circumferential pulse signals obtained by the scanning units U1 and U4. The rotation of the polygon mirror PM of U2 and U5 is controlled (see Fig. 34). Similarly, the rotation control unit 350 generates the circumferential pulse signals obtained by the scanning units U3 and U6 as late as 2×Ts with respect to the circumferential pulse signals obtained by the scanning units U1 and U4. The rotation of the polygon mirror PM of U3 and U6 is controlled (see Fig. 34). Assuming that the rotational speed Vp of the polygon mirror (PM) is 39,000 rpm (650 rpm), the time Ts is Ts = (1/(Vp × Np)) × (α/β) = 1/(650 × 8 × 3) seconds [About 64.1 μsec]. In this way, by controlling the rotation of the polygon mirror PM of each of the scanning units U1 to U6, U1 → U2 → ... In the order of →U6, it becomes possible for each scanning unit U1 to U6 to perform time-division scanning of the spot light SP.

The beam switching control unit 352 controls the selection optical element (AOMn (AOM1 to AOM6)) of the beam switching member 20, so that from one scanning unit Un starts scanning, until the next scanning starts, The beam LB from the light source device 14' is distributed to six scanning units Un(U1 to U6). Therefore, the beam switching control unit 352 determines that the scanning (deflection) of the beam LBn of the polygon mirror PM of each scanning unit Un(U1 to U6) is a reflection surface of the polygon mirror PM Any one of the beams (LB1 to LB6) generated from the beam (LB) by the selection optical elements (AOM1 to AOM6) is time-divided to each scanning unit (Un(U1 to U6)) so that it is repeated for each (RP). Let him enter.

Specifically, the beam switching control unit 352 is a sub-origin generating circuit as shown in FIG. 31 that generates a sub-origin signal ZPn (ZP1-ZP6) based on the origin signal SZn (SZ1-SZ6). (CAn(CA1-CA6)) is provided. When the sub-origin signal ZPn (ZP1 to ZP6) is generated by the sub-origin generating circuit CAn (CA1 to CA6), the scanning unit Un The optical element for selection (AOMn (AOM1 to AOM6)) corresponding to (U1 to U6)) is turned on for a certain period of time (on time Ton). For example, when the sub-origin signal ZP1 is generated, the selection optical element AOM1 corresponding to the scanning unit U1 resulting from the generation of the sub-origin signal ZP1 is turned on for a certain period of time (on time Ton). do. This sub-origin signal (ZPn) is generated based on the origin signal (SZn) output from the origin sensor (OPn), and the frequency of the origin signal (SZn) is divided by half, that is, the origin signal (SZn). Is thinned in half and delayed by time Tpx. This constant time (on time Ton) is a period from the time when the sub-origin signal ZPn occurs to the time when the sub-origin signal ZPn from the scanning unit Un performing the next scan occurs, that is, the polygon mirror ( PM) corresponds to the time Ts required to rotate by 15 degrees. If the ON time Ton of the selection optical element (AOMn) is set longer than the time Ts, there is a period in which two of the selection optical elements (AOMn) are turned on at the same time, and drawing operation by spot light (SP) is required. The beams LB1 to LB6 cannot be correctly introduced into the scanning unit Un. Therefore, the on time Ton is set to Ton≤Ts.

At this time, each origin signal (SZ1) and each origin signal (SZ4) is an error of each ηj formed by each of the adjacent reflective surfaces (RP) (e.g., reflective surfaces (RPa) and reflective surfaces (RPb)). If not taken into account, all are synchronized on the time axis, and the phases of the sub-origin signal ZP1 and the sub-origin signal ZP4 are set to shift by about half a period (see Fig. 34). The shift of about half the phase of the sub-origin signal ZP1 and the sub-origin signal ZP4 is performed by the divider 330 of the sub-origin generating circuit CAn (CA1 to CA6). That is, the frequency divider 330 delays the timing of thinning out the origin signal SZ1 and the timing of thinning out the origin signal SZ4 by approximately half a period.

Similarly, the relationship between the sub-origin signal ZP2 and the sub-origin signal ZP5 is set so that the phase of the sub-origin signal ZP2 and the sub-origin signal ZP5 is shifted by about half a period by the divider 330 (Fig. 34). Also, the relationship between the sub-origin signal ZP3 and the sub-origin signal ZP6 is similarly set by the divider 330 so that the phase of the sub-origin signal ZP3 and the sub-origin signal ZP6 is shifted by about half a period. (See Fig. 34).

Accordingly, as shown in Fig. 34, the timing of generation of the sub-origin signals ZP1 to ZP6 generated for each of the scanning units U1 to U6 is shifted by time Ts. In this fourth embodiment, the order of the scanning unit Un for scanning the spot light SP is U1→U2→... → U6, so that the sub-origin signal (ZPn) also generates the sub-origin signal (ZP2) after time Ts after the sub-origin signal (ZP1) occurs, ZP1→ZP2→… → Occurs at intervals of time Ts in the order of ZP6. Accordingly, the beam switching control unit 352 controls the optical element for selection of the beam switching member 20 (AOMn (AOM1 to AOM6)) in accordance with the generated sub-origin signal (ZPn (ZP1 to ZP6)), thereby U1 → U2 → … The corresponding beams LB1 to LB6 can be incident on each of the scanning units Un in the order of →U6. That is, the scanning (deflection) of the beam LBn by the polygon mirror PM of each scanning unit (Un(U1 to U6)) is repeated for each of the reflective surfaces RP of the polygon mirror PM. The beam LBn incident on the scanning units Un(U1 to U6) can be converted into time division.

The drawing data output control unit 354 draws serial data DLn for one column corresponding to the pattern of one drawing line SLn into which the spot light SP is scanned by the scanning unit Un, and draws bit string data Sdw. As an output, it is output to the drive circuit 206a of the light source device 14'. The order of the scanning unit Un for scanning the spot light SP is: U1→U2→... → U6, so that the drawing data output control unit 354 reads the serial data DLn for one column from DL1→DL2→... → Outputs the drawing bit string data (Sdw) repeated in the order of DL6.

The configuration of the drawing data output control unit 354 will be described in detail with reference to FIG. 35. The drawing data output control unit 354 has six generation circuits 360, 362, 364, 366, 368, 370 and an OR circuit GT8 corresponding to each of the scanning units U1 to U6. The generation circuits 360 to 370 have the same configuration. Specifically, the generation circuit 360 includes a memory unit BM1, a counter unit CN1, and a gate unit GT1, and the generation circuit 362 ) Includes a memory unit BM2, a counter unit CN2, and a gate unit GT2. The generation circuit 364 includes a memory unit BM3, a counter unit CN3, and a gate unit GT3, and the generation circuit 366 includes a memory unit BM4, a counter unit CN4, and a gate unit GT4. It is equipped with. The generation circuit 368 includes a memory unit BM5, a counter unit CN5, and a gate unit GT5, and the generation circuit 370 includes a memory unit BM6, a counter unit CN6, and a gate unit GT6. It is equipped with. The configuration of the generation circuits 360 to 370 may be the same configuration as the generation circuits 301, 303, and 305 shown in FIG. 16.

The memory units BM1 to BM6 are memories for storing pattern data (bit maps) according to patterns to be drawn and exposed by each scanning unit Un(U1 to U6). The counter units CN1 to CN6 receive serial data (DL1 to DL6) for one drawing line SLn to be drawn next among the pattern data stored in each memory unit BM1 to BM6, and a clock signal for each pixel. This is a counter for output in synchronization with (CLK). As shown in Fig. 34, the counter units CN1 to CN6 output one serial signal after the sub-origin signals ZP1 to ZP6 are output from the sub-origin generation circuits CA1 to CA6 of the beam switching control unit 352. Output data (DL1 to DL6).

As for the pattern data stored in each of the memory units BM1 to BM6, the output serial data DL1 to DL6 are shifted in the column direction by an address counter or the like (not shown). That is, the columns read by the address counter (not shown) are the first, second, third, ... Shifted like this. The shift is, for example, in the case of the memory unit BM1 corresponding to the scanning unit U1, after outputting all the serial data DL1, the sub-origin signal corresponding to the scanning unit U2 that performs the next scan ( It is performed at the timing when ZP2) occurs. Similarly, the shift of the serial data DL2 of the pattern data stored in the memory unit BM2 is the sub-origin signal corresponding to the scanning unit U3 that performs the next scan after all the serial data DL2 has been output. It is performed at the timing when ZP3) occurs. Similarly, the shift of the serial data DL3 to DL6 of the pattern data stored in the memory units BM3 to BM6 is performed by the scan units U4 to U6 that perform the next scan after all the serial data DL3 to DL6 are output. , U1) at the timing when the sub-origin signals ZP4 to ZP6 and ZP1 are generated. In addition, the scanning of the spot light SP is: U1→U2→U3→... →It is done in the same order as U6.

In this way, serial data (DL1 to DL6) sequentially output is input 6 via the gate units (GT1 to GT6) opened during a certain period of time (on time Ton) after the sub-origin signal (ZP1 to ZP6) is applied. It is applied to the OR circuit (GT8) of. The OR circuit (GT8) is serial data DL1→DL2→DL3→DL4→DL5→DL6→DL1... The serial data DLn synthesized by repeating in the order of is output as drawing bit string data Sdw to the driving circuit 206a of the light source device 14'. In this way, each of the scanning units Un(U1 to U6) can perform the scan of the spot light SP and draw and expose a pattern according to the pattern data.

In the fourth embodiment, pattern data is prepared for each scanning unit (Un(U1 to U6)), and scanning of spot light SP is performed among the pattern data of each scanning unit (Un(U1 to U6)). Serial data (DL1 to DL6) are output according to the order of the unit (Un). However, since the order of the scanning units Un for scanning the spot light SP is determined in advance, a combination of the serial data DL1 to DL6 of the pattern data of each scanning unit Un(U1 to U6) is 1 Pattern data may be prepared. That is, serial data (DLn (DL1 to DL6)) of each column of pattern data of each scanning unit (Un (U1 to U6)) are arranged in the order of the scanning unit (Un) that scans the spot light (SP). It is also possible to construct one set of pattern data. In this case, according to the sub-origin signal ZPn (ZP1-ZP6) based on the origin sensor OPn of each scanning unit Un (U1-U6), the serial data DLn of one pattern data is 1 Just print them in order from the tenth.

By the way, the exposure control part 356 shown in FIG. 33 controls the rotation control part 350, the beam conversion control part 352, the drawing data output control part 354, etc. The exposure control unit 356 analyzes the image pickup signal ig (ig1 to ig4) imaged by the alignment microscope (AMm (AM1 to AM4)), and the position on the substrate FS of the alignment mark (MKm (MK1 to MK4)) Is detected. Then, the exposure control unit 356 detects (determines) the start position of the drawing exposure of the exposure region W on the substrate FS based on the position of the detected alignment mark MKm (MK1 to MK4). . The exposure control unit 356 includes a counter circuit 356a, and the counter circuit 356a counts detection signals detected by the encoders EN1a to EN3a and EN1b to EN3b shown in FIG. 24. The exposure control unit 356 includes a count value (mark detection position) based on the encoders EN1a, EN1b when the start position of the drawing exposure is detected, and a count value based on the encoders EN2a, EN2b (odd drawing Based on the position of the line SLn), it is determined whether the starting position of the drawing exposure of the substrate FS is located on the drawing lines SL1, SL3 and SL5. When the exposure control unit 356 determines that the starting position of the drawing exposure is located on the drawing lines SL1, SL3 and SL5, the exposure control unit 356 controls the drawing data output control unit 354 to spot the scanning units U1, U3 and U5. The scanning of light SP is started. Further, the rotation control unit 350 and the beam switching control unit 352, under the control of the exposure control unit 356, based on the circumferential pulse signal and the sub-origin signal ZPn (ZP1 to ZP6), each scanning unit Un( It is assumed that the rotation of the polygon mirror PM of U1 to U6) and distribution of the beam LBn by the beam switching member 20 are controlled.

The exposure control unit 356 includes a count value (mark detection position) based on the encoders EN1a and EN1b when the starting position of the drawing exposure is detected, and a count value based on the encoders EN3a and EN3b (even-numbered drawing). Based on the position of the line), it is determined whether the starting position of the drawing exposure of the substrate FS is located on the drawing lines SL2, SL4, and SL6. If the exposure control unit 356 determines that the starting position of the drawing exposure is located on the drawing lines SL2, SL4 and SL6, the exposure control unit 356 controls the drawing data output control unit 354 to transmit the drawing exposure to the scanning units U2, U4, and U6. Scanning of the spot light SP is started.

As shown in Fig. 25 described above, drawing exposure in each of the drawing lines SL1, SL3, and SL5 precedes along the transfer direction (+X direction) of the substrate FS, and the substrate FS is at a predetermined distance. After being conveyed by the amount, the drawing exposure in each of the drawing lines SL2, SL4, SL6 is performed. On the other hand, since the polygon mirrors PM of the six scanning units U1 to U6 are rotated by maintaining a constant angular phase with each other, the sub-origin signals ZP1 to ZP6 are sequentially time Ts as shown in FIG. It occurs continuously with a phase difference. Therefore, the sub-origin signal ZP2, ZP4 is also during the period from the start of the drawing exposure in the drawing lines SL1, SL3, and SL5 to just before the start of the drawing exposure in the drawing lines SL2, SL4, SL6. , ZP6) opens the gate portions GT2, GT4, and GT6 in FIG. 35, and the selection optical elements AOM2, AOM4, and AOM6 are repeatedly turned on for a predetermined time Ton. Here, in the configuration of Fig. 33, in the beam switching control unit 352, based on the count values of the encoders EN1a and EN1b determined by the exposure control unit 356 or the count values of the encoders EN2a and EN2b. , It is preferable to provide a selection gate circuit for selecting whether to send or prohibit each of the generated sub-origin signals ZP1 to ZP6 to the drawing data output control unit 354. In addition, each driver circuit (DRVn (DRV1 to DRV6)) (see Fig. 38) of the selection optical elements AOM1 to AOM6 corresponding to each of the scanning units U1 to U6 (see Fig. 38), via the selection gate circuit, It is better to give the sub-origin signal (ZP1~ZP6).

Here, as described above, since the drawing lines SL1, SL3, and SL5 are positioned upstream of the transfer direction of the substrate FS than the drawing lines SL2, SL4, SL6, the exposure area W of the substrate FS The starting position of the drawing exposure of) first reaches onto the drawing lines SL1, SL3 and SL5, and then reaches onto the drawing lines SL2, SL4, SL6 after a certain period of time. Therefore, until the starting position of the drawing exposure reaches the drawing lines SL2, SL4, SL6, the drawing exposure of the pattern is performed only by the scanning units U1, U3, and U5. Therefore, when the selection gate circuit of the sub-origin signals ZP1 to ZP6 as described above is not provided in the beam switching control unit 352, the exposure control unit 356 outputs the output to the driving circuit 206a of the light source device 14'. By setting all pixel data of the portion corresponding to the serial data DL2, DL4, and DL6 among the writing bit string data Sdw to be "(0)", substantially drawing by the scanning units U2, U4, U6 Exposure is canceled. During the cancel period, the rows of the serial data DL2, DL4, and DL6 output from the memory units BM2, BM4, and BM6 are not shifted and remain in the first column. Then, after the start position of the drawing exposure in the exposure area W reaches the drawing lines SL2, SL4, SL6, the serial data DL2, DL4, and DL6 are started to be output, and the serial data DL2, DL4, and DL6) is shifted in the column direction.

Similarly, the end position of the drawing exposure of the exposure area W first reaches on the drawing lines SL1, SL3, SL5, and then reaches on the drawing lines SL2, SL4, SL6 after a certain period of time. . Therefore, after the end position of the drawing exposure reaches the drawing lines SL1, SL3, and SL5, until the drawing lines SL2, SL4, SL6 are reached, only the scanning units U2, U4, and U6 are used. Drawing exposure is performed. Accordingly, when the selection gate circuit for the sub-origin signals ZP1 to ZP6 as described above is not provided in the beam switching control unit 352, the exposure control unit 356 is connected to the driving circuit 206a of the light source device 14'. By setting all the pixel data of the portion corresponding to the serial data DL1, DL3, and DL5 among the output drawing bit string data Sdw to be "(0)", the scanning units U1, U3, and U5 substantially The drawing exposure is canceled. In addition, in the case where the selection gate circuit is not provided, the beams LB1, LB3, LB5 are introduced into the scanning units U1, U3, and U5 in which the drawing exposure is canceled, even if the drawing exposure is being cancelled. The devices AOM1, AOM3, and AOM5 are selectively turned on for a certain amount of time in response to the sub-origin signals ZP1, ZP3, and ZP5.

As described above, in the fourth embodiment, the deflection (scan) of the polygon mirror PM is repeated for every other reflective surface RP of the polygon mirror PM of the scanning unit Un (U1 to U6). The beam switching control unit 352 controls the beam switching member 20 to sequentially perform one-dimensional scanning of the spot light SP to each of the plurality of scanning units Un(U1 to U6). Thereby, one beam LB is divided into a plurality of scanning units Un(U1 to U6) without shortening the length of the drawing line SLn (SL1 to SL6) through which the spot light SP is scanned. It is possible, and the beam LB can be effectively utilized. In addition, since the shape (polygonal shape) of the polygon mirror PM can be brought close to a circle, it is possible to prevent the rotation speed of the polygon mirror PM from decreasing, and thus the polygon mirror PM can be rotated at high speed. have.

The beam switching member 20 is arranged n in series along the traveling direction of the beam LB from the light source device 14 ′, and diffracts the beam LB to diffract any one of the n beams LBn deflected. It has a selection optical element (AOMn (AOM1-AOM6)) which is selected and introduced into the corresponding scanning unit Un. Therefore, it is possible to easily select any one of the scanning units Un(U1 to U6) to which the beam LBn should be incident, and the light source device 14' for one scanning unit Un to be drawn and exposed. The beam LB of can be concentrated efficiently, and a high exposure amount is obtained. For example, the beam LB emitted from the light source device 14' is amplitude-divided into six using a plurality of beam splitters, and each of the divided six beams LBn (LB1 to LB6) is drawn. When guided to six scanning units (U1 to U6) via an acousto-optic modulation element for drawing modulated by the serial data (DL1 to DL6) of the data, the beam intensity of the acousto-optic modulation element for drawing Assuming that the attenuation is 20% and the attenuation of the beam intensity in the scanning unit Un is 30%, the intensity of the spot light SP in one scanning unit Un is the intensity of the original beam LB. If it is 100%, it is about 9.3%. On the other hand, as in the fourth embodiment, the beam LB from the light source device 14' is deflected by the selection optical element AOMn, so that it enters any one of the six scanning units Un. In this case, when the attenuation of the beam intensity in the selection optical element AOMn is 20%, the intensity of the spot light SP in one scanning unit Un is about the intensity of the original beam LB. 56%.

The rotation control unit 350 controls the rotation of the polygon mirrors PM of the plurality of scanning units Un(U1 to U6) so that the rotation speed is the same and the phase of the rotation angle position is shifted by a predetermined angle. Thereby, during the one-dimensional scanning of the spot light SP by one scanning unit Un until the next one-dimensional scanning is performed, the spot light SP by the other plurality of scanning units Un It becomes possible to make it possible to perform one-dimensional scanning of in order.

In addition, in the fourth embodiment described above, one beam LB is divided into six scanning units Un, but one beam LB from the light source device 14' is divided into nine scanning units. It may be allocated to (Un) (U1 to U9). In this case, if the scanning efficiency (α/β) of the polygon mirror PM is set to 1/3, while the polygon mirror PM rotates for three reflective surfaces RP, nine scanning units U1 to U9 ), the beam LBn can be distributed, so that the spot light SP is scanned for every other reflective surface RP. Thereby, from the scanning of the spot light SP by one scanning unit Un to the scanning of the next spot light SP, the spot light ( SP) can be injected in order. In addition, if the scanning efficiency of the polygon mirror PM is set to 1/3, the polygon mirror PM rotates for three reflective surfaces RP, and one beam LB is divided into nine scanning units Un. Therefore, the frequency divider 330 of the sub-origin generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/3. In this case, the circumferential pulse signals of the scanning units U1, U4, and U7 are synchronized (they are in the same phase on the time axis). Similarly, the circumferential pulse signals of the scanning units U2, U5, and U8 are synchronized, and the circumferential pulse signals of the scanning units U3, U6 and U9 are synchronous. And the circumferential pulse signal of the scanning units U2, U5, U8 is generated late by the time Ts with respect to the circumferential pulse signal of the scanning units U1, U4, U7, and the circumferential pulse of the scanning units U3, U6, U9 The signal is generated as late as 2 x time Ts with respect to the circumferential pulse signal of the scanning units U1, U4, and U7. In addition, the generation timing of the sub-origin signals ZP1, ZP4, and ZP7 of the scanning units U1, U4, and U7 is out of phase by 1/3 of one cycle, and similarly, the scanning units U2, U5, and U8 The timing of generation of the sub-origin signals (ZP2, ZP5, ZP8) and the generation timing of the sub-origin signals (ZP3, ZP6, ZP9) of the scanning units (U3, U6, U9) are also out of phase by 1/3 of one cycle. . In addition, the time Ts is the time during which the polygon mirror PM rotates by the scanning rotation angle range α'of the polygon mirror PM capable of scanning the spot light SP, and the polygon mirror PM has one reflective surface (RP). The value obtained by multiplying the scanning efficiency by the rotation angle β for) minutes becomes the scanning rotation angle range α'.

When the scanning efficiency of the polygon mirror PM is 1/3, and one beam LB is distributed to 12 scanning units (Un(U1 to U12)), the polygon mirror PM has four reflective surfaces ( During RP) minute rotation, since the beam LBn can be distributed to the twelve scanning units U1 to U12, the spot light SP is scanned for every other three reflective surfaces RP. In addition, when the scanning efficiency of the polygon mirror PM is set to 1/3, the polygon mirror PM rotates for four reflective surfaces RP, and the beams LB from the light source device 14' are arranged in series. A beam (LBn (LB1 to LB12)) that is selectively deflected to the 12 optical elements for selection (AOMn (AOM1 to AOM12)) can be incident on a corresponding scanning unit (Un(U1 to U12)). Therefore, the frequency divider 330 of the sub-origin generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/4. In this case, the circumferential pulse signals of the scanning units U1, U4, U7, and U10 are synchronized (they are in the same phase on the time axis). Similarly, the circumferential pulse signals of the scanning units U2, U5, U8, and U11 are synchronized, and the circumferential pulse signals of the scanning units U3, U6, U9, and U12 are synchronous. And the circumferential pulse signals of the scanning units U2, U5, U8, U11 are generated late by time Ts with respect to the circumferential pulse signals of the scanning units U1, U4, U7, U10, and the scanning units U3, U6, U9 , U12) is generated as late as 2×time Ts with respect to the circumferential pulse signal of the scanning units U1, U4, U7, U10. In addition, the generation timing of the sub-origin signals ZP1, ZP4, ZP7, ZP10 of the scanning units U1, U4, U7, U10 is out of phase by 1/4 of one cycle, and similarly, the scanning units U2, U5 , U8, U11) of the sub-origin signal (ZP2, ZP5, ZP7, ZP11) generation timing and the scanning unit (U3, U6, U9, U12) sub-origin signal (ZP3, ZP6, ZP9, ZP12) generation timing diagram , The phase is shifted by 1/4 of 1 cycle.

Further, in the fourth embodiment, the scanning efficiency of the polygon mirror PM of the scanning unit Un is described as 1/3, but the scanning efficiency may be 1/2 or 1/4. When the scanning efficiency is 1/2, since the beam LBn can be distributed to two scanning units Un while the polygon mirror PM rotates for one reflection surface RP, one beam LBn In the case of wanting to distribute) to six scanning units Un, the spot light SP is scanned for every other reflection surface RP of the polygon mirror PM. That is, when the scanning efficiency of the polygon mirror PM is 1/2, the beam LBn can be distributed to the six scanning units Un while the polygon mirror PM rotates for three reflective surfaces RP. have. Thereby, from the scanning of the spot light SP by one scanning unit Un until the next spot light SP is scanned, the spot light ( SP) can be injected in order. In addition, when the scanning efficiency of the polygon mirror PM is set to 1/2, the polygon mirror PM rotates for three reflective surfaces RP, and one beam LB is divided into six scanning units Un. Therefore, the frequency divider 330 of the sub-origin generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/3. In this case, the circumferential pulse signals of the scanning units U1, U3, and U5 are synchronized. Similarly, the circumferential pulse signals of the scanning units U2, U4, and U6 are synchronized. Then, the circumferential pulse signals of the scanning units U2, U4, and U6 are generated as late as time Ts with respect to the circumferential pulse signals of the scanning units U1, U3 and U5. In addition, the generation timing of the sub-origin signals ZP1, ZP3, and ZP5 of the scanning units U1, U3, and U5 is out of phase by 1/3 of one period, and the sub-origin of the scanning units U2, U4, and U6 The timing of generation of the point signals ZP2, ZP4, and ZP6 is also out of phase by 1/3 of one cycle.

When the scanning efficiency of the polygon mirror PM is 1/4, the beam LBn can be distributed to the four scanning units Un while the polygon mirror PM rotates for one reflective surface RP. , When it is desired to distribute one beam LB to eight scanning units Un, the spot light SP is scanned for every other reflection surface RP of the polygon mirror PM. That is, when the scanning efficiency of the polygon mirror PM is 1/4, the beam LBn can be distributed to the eight scanning units Un while the polygon mirror PM rotates for two reflective surfaces RP. have. Thereby, from the scanning of the spot light SP by one scanning unit Un, until the next spot light SP is scanned, the spot light ( SP) can be injected in order. In addition, when the scanning efficiency of the polygon mirror PM is set to 1/4, the polygon mirror PM rotates for two reflective surfaces RP, and one beam LB is divided into eight scanning units Un. Therefore, the frequency divider 330 of the sub-origin generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by half. In this case, the circumferential pulse signals of the scanning units U1 and U5 are synchronized, and the circumferential pulse signals of the scanning units U2 and U6 are synchronized. Similarly, the circumferential pulse signals of the scanning units U3 and U7 are synchronized, and the circumferential pulse signals of the scanning units U4 and U8 are synchronous. Then, the circumferential pulse signals of the scanning units U2 and U6 are generated late by time Ts with respect to the circumferential pulse signals of the scanning units U1 and U5. The circumferential pulse signals of the scanning units U3 and U7 are generated 2×time Ts late with respect to the circumferential pulse signals of the scanning units U1 and U5, and the circumferential pulse signals of the scanning units U4 and U8 are the scanning units. It occurs 3×time Ts late with respect to the circumferential pulse signal of (U1, U5). In addition, the generation timing of the sub-origin signals ZP1 and ZP5 of the scanning units U1 and U5 is out of phase by 1/2 of one cycle, and the sub-origin signals ZP2 and ZP6 of the scanning units U2 and U6 are out of phase. The timing of occurrence of) is also out of phase by 1/2 of one cycle. Similarly, the generation timing of the sub-origin signals ZP3 and ZP7 of the scanning units U3 and U7 and the sub-origin signals ZP4 and ZP8 of the scanning units U4 and U8 are respectively shifted in phase by 1/2 of one cycle. There is a deviation.

Further, in the fourth embodiment, the polygon mirror PM has an octagonal shape (eight reflective surfaces RP), but may be a hexagonal, a seventh, or a hexagonal or more. This also changes the scanning efficiency of the polygon mirror PM. In general, as the number of reflection surfaces Np of the polygonal mirror PM increases, the scanning efficiency in one reflection surface RP of the polygon mirror PM increases, and the decrease in the number of reflection surfaces Np, the polygon The scanning efficiency of the mirror PM decreases.

The maximum scanning rotation angle range α of the polygon mirror PM capable of scanning by projecting spot light SP on the substrate FS is the incident angle of view of the fθ lens FT (scanning angle range θs in FIG. Corresponding to the angle of incidence, the polygon mirror PM having the optimum number of reflection surfaces Np can be selected. As in the previous example, in the case of an fθ lens (FT) with an incident angle of view (θs) of less than 30 degrees, a 24-sided polygon mirror (PM) or 30 degrees in which the reflective surface (RP) is changed by rotation of 15 degrees, which is half It is good also as a 12-sided polygon mirror PM in which the reflective surface RP is changed by rotation. In this case, in the 24-sided polygon mirror PM, the scanning efficiency (α/β) is greater than 1/2 and less than 1.0, so each 24-sided polygon mirror of the six scanning units U1 to U6 (PM) is controlled so as to scan the spot light SP by skipping five planes. In addition, in the 12-sided polygon mirror PM, the scanning efficiency is greater than 1/3 and less than 1/2, so that each 12-sided polygon mirror PM of the six scanning units U1 to U6 is It is controlled to scan the spot light SP by skipping two surfaces.

[Fifth embodiment]

In the fourth embodiment, scanning (deflection) of the spot light SP is always repeated for every other surface of the reflective surface RP of the polygon mirror PM. However, in the fifth embodiment, whether the scanning (deflection) of the spot light SP is in the first state in which the polygon mirror PM is repeated for each continuous reflection surface RP, or the reflection surface of the polygon mirror PM It was possible to arbitrarily switch whether or not the second state repeats every other side of the (RP). That is, whether the beam LB is divided into three scanning units Un by time division from the scanning unit U1 starts scanning of the spot light SP until the next scanning is started, or the six scanning units Un ), you can switch whether or not to allocate by time division.

Since the scanning efficiency of the polygon mirror PM is 1/3, when the scanning of the spot light SP is repeated for each reflective surface RP in which the polygon mirror PM is continuous, for example, the scanning unit U1 From scanning this spot light SP until the next scanning is performed, only the two scanning units Un other than the scanning unit U1 can distribute the beam LB. Accordingly, two beams LB are prepared, the first beam LB is distributed to three scanning units Un by time division, and the second beam LB is distributed to the remaining three scanning units Un. Allocate by time division. Therefore, the scanning of the spot light SP is performed by the two scanning units Un in parallel. Two beams LB may be generated by providing two light source devices 14', or two beams LB are divided by dividing the beam LB from one light source device 14' by a beam splitter or the like. You may create it. In the exposure apparatus EX of the fifth embodiment shown in Figs. 36 to 40, it is assumed that two light source devices 14' (14A', 14B') are provided (see Fig. 38). In addition, in the fifth embodiment, the same reference numerals are assigned to the configurations similar to those of the fourth embodiment, and only other parts will be described.

36 is a configuration diagram of a beam switching member (beam delivery unit) 20A of the fifth embodiment. The beam switching member 20A is similar to the beam switching member 20 of FIG. 26, a plurality of optical elements for selection (AOMn (AOM1 to AOM6)), a plurality of condensing lenses (CD1 to CD6), and a plurality of reflection mirrors (M1). -M12), a plurality of mirrors IM1 -IM6, and a plurality of collimating lenses CL1 -CL6, and in addition, reflective mirrors M13 and M14 and absorbers TR1 and TR2 are provided. In addition, the absorber TR1 is equivalent to the absorber TR of FIG. 26 shown in the fourth embodiment, and absorbs the beam LB reflected by the reflecting mirror M12.

Selection optical elements (AOM1 to AOM3) constitute an optical element module (first optical element module) (OM1), and the selection optical elements (AOM4 to AOM6) are optical element modules (second optical element module) (OM2) Configure. The optical elements AOM1 to AOM3 for selection of the first optical element module OM1 are in a state arranged in series along the traveling direction of the beam LB as described in the fourth embodiment. Similarly, the optical elements AOM4 to AOM6 for selection of the second optical element module OM2 are also in a state arranged in series along the traveling direction of the beam LB. Further, the scanning units U1 to U3 corresponding to the selection optical elements AOM1 to AOM3 of the first optical element module OM1 are referred to as first scanning modules. Further, the scanning units U4 to U6 corresponding to the optical elements AOM4 to AOM6 for selection of the second optical element module OM2 are referred to as a second scanning module. The scanning units U1 to U3 of the first scanning module and the scanning units U4 to U6 of the second scanning module are arranged in a predetermined arrangement relationship as described in the fourth embodiment.

In the fifth embodiment, the reflection mirrors M6, M13, M14 are the first optical element module OM1 and the second optical element module OM2 arranged in parallel with respect to the traveling direction of the beam LB. An arrangement switching member (movable member) SWE for switching to an arrangement state and a second arrangement state in which the first optical element module OM1 and the second optical element module OM2 are arranged in series is configured. This arrangement switching member SWE has a slide member SE that supports the reflection mirrors M6, M13, and M14, and the slide member SE is movable in the X direction with respect to the support member IUB. The movement of the slide member SE (batch switching member SWE) in the X direction is performed by the actuator AC (see Fig. 38). This actuator AC is driven under the control of the drive control unit 352a (see Fig. 38) of the beam switching control unit 352.

In the first arrangement state, the beams LB from the two light source devices 14' (14A', 14B') are parallel to each of the first optical element module OM1 and the second optical element module OM2. And in the second arrangement state, the beam LB from one light source device 14' (14A') is transmitted to the first optical element module OM1 and the second optical element module OM2. Enters into That is, in the second arrangement state, the beam LB transmitted through the first optical element module OM1 is incident on the second optical element module OM2. Fig. 36 shows a state in which the first optical element module OM1 and the second optical element module OM2 are arranged in series by the arrangement switching member SWE in a second arrangement state. That is, in this second arrangement state, all the selection optical elements AOM1 to AOM6 of the first optical element module OM1 and the second optical element module OM2 are in series along the traveling direction of the beam LB. It is in the arranged state, and is the same as in Fig. 26 shown in the fourth embodiment. Therefore, as in the fourth embodiment, the first scanning is performed by the optical elements for selection (AOMn (AOM1 to AOM6)) of the first optical element module OM1 and the second optical element module OM2 arranged in series. Among the module and the second scanning modules U1 to U6, one scanning unit Un to which any one deflected beam LBn is incident may be selected. In addition, the position of the arrangement switching member SWE in FIG. 36 is called a 2nd position. In addition, in the first arrangement state, the beam LB incident on the first optical element module OM1 (AOM1 to AOM3) is referred to as a beam LBa from the first light source device 14A', and the first arrangement In the state, the beam incident on the second optical element module OM2 (AOM4 to AOM6) is referred to as a beam LBb from the second light source device 14B'.

When the arrangement switching member SWE moves in the -X direction and comes to the first position, the first optical element module OM1 and the second optical element module OM2 are in a first arrangement state arranged in parallel. 37 is a diagram showing the optical paths of the beams LBa and LBb when the position of the arrangement switching member SWE is at the first position. In the first arrangement state, the beam LBa is incident on the first optical element module OM1 and the beam LBb is incident on the second optical element module OM2, respectively. In order to distinguish the beam LB incident on each of the first optical element module OM1 and the second optical element module OM2, the beam LB incident on the first optical element module OM1 is denoted by LBa. , The beam LB directly incident on the second optical element module OM2 is denoted by LBb.

As shown in Fig. 37, when the arrangement switching member SWE moves to the first position, the position of the reflection mirror M6 is shifted in the -X direction, so the beam LBa reflected by the reflection mirror M6 is , It is incident on the absorber TR2, not the reflection mirror M7. Therefore, the beam Lba from the first light source device 14A' incident on the first optical element module OM1 is incident only on the first optical element module OM1 (optical elements for selection (AOM1 to AOM3)). , Does not enter the second optical element module OM2. That is, the beam LBa may transmit only the selection optical elements AOM1 to AOM3. Further, when the position of the arrangement switching member SWE becomes the first position, the beam LBb that is emitted from the second light source device 14B' and proceeds in the +Y direction toward the reflecting mirror M13 is transferred to the reflecting mirror M13, It is guided to the reflection mirror M7 by M14. Therefore, the beam LBb can transmit only the second optical element module OM2 (optical elements for selection AOM4 to AOM6).

Accordingly, the first optical element module OM1 is applied to one of the three scanning units U1 to U3 constituting the first scanning module by means of the three optional optical elements AOM1 to AOM3 arranged in series. Any one of the beams LB1 to LB3 deflected from (LBa) can be incident. In addition, the second optical element module OM2 is provided to one of the three scanning units U4 to U6 constituting the second scanning module by means of three optical elements for selection (AOM4 to AOM6) arranged in series. Any one of the beams LB4 to LB6 deflected from (LBb) can be incident. Therefore, by the first optical element module (OM1 (AOM1 to AOM3)) and the second optical element module (OM2 (AOM4 to AOM6)) arranged in parallel, the first scanning module (U1 to U3) and the second scanning module ( Among U4 to U6), one scanning unit Un to which the beam LB is incident can be selected, respectively. In this case, by scanning along the drawing line SLn of the spot light SP by any one scanning unit Un of the first scanning module and any one scanning unit Un of the second scanning module. The exposure operation is performed in parallel.

When the scanning (deflection) of the spot light SP is in the first state (first drawing mode) in which the polygon mirror PM is repeated for each continuous reflecting surface RP, the actuator ( AC) is controlled, and the arrangement switching member SWE is placed in the first position. In addition, in the case of the second state (second drawing mode) repeated for every other surface of the reflective surface RP of the polygon mirror PM, the beam switching control unit 352 controls and arranges the actuator AC. The switching member SWE is placed in the second position.

38 is a diagram showing a configuration of a beam switching control unit 352 in the fifth embodiment. In Fig. 38, the selection optical elements AOM1 to AOM6 and light source devices 14' (14A', 14B') to be controlled by the beam switching control unit 352 are also shown. A light source device 14' into which the beam LBa is incident from the first optical element module OM1 is denoted by 14A', and a light source device 14' in which the direct beam LBb is incident only on the second optical element module OM2. ) Is denoted by 14b'.

When the arrangement switching member SWE is in the second position, as shown in Fig. 38, the beam LBa(LB) from the light source device 14A' is AOM1 → AOM2 → AOM3 → ... → The selection optical element AOMn can be passed (transmitted) in the order of AOM6, and the beam LBa passing through the selection optical element AOM6 is incident on the absorber TR1. In addition, when the arrangement switching member SWE moves to the first position, the beam LBa from the light source device 14A' can pass through the selection optical element AOMn in the order of AOM1 → AOM2 → AOM3, and selection The beam LBa that has passed through the optical element AOM3 is incident on the absorber TR2. In addition, when the arrangement switching member SWE has moved to the first position, the beam LBb from the light source device 14B' can pass through the selection optical element AOMn in the order of AOM4→AOM5→AOM6. Then, the beam LB that has passed through the selection optical element AOM6 is incident on the absorber TR1. In addition, the arrangement switching member SWE in FIG. 38 is a conceptual diagram and is different from the actual configuration of the arrangement switching member SWE shown in FIGS. 36 and 37. In the example shown in Fig. 38, the arrangement switching member SWE is in the second position, that is, the second arrangement state in which the first optical element module OM1 and the second optical element module OM2 are arranged in series. And the case where the optical element for selection (AOM5) is turned on is shown. Thereby, the beam LB5 deflected by diffraction from the beam LBa from the light source device 14A' enters the scanning unit U5.

The beam switching control unit 352 includes a driver circuit (DRVn (DRV1 to DRV6)) for driving each of the selection optical elements (AOM1 to AOM6) with an ultrasonic (high frequency) signal, and each scanning unit (Un(U1 to U6)). It has a sub-origin generating circuit CAan (CAa1-CAa6) that generates a sub-origin signal ZPn (ZP1-ZP6) according to the origin signal SZn (SZ1-SZ6) from the origin sensor OPn of. The driver circuit (DRVn (DRV1 to DRV6)) is exposed to the ON time Ton information for turning on the selection optical elements (AOM1 to AOM6) for a certain period of time after receiving the sub-origin signal (ZPn (ZP1 to ZP6)). It is sent from the control unit 356. When the sub-origin signal ZP1 is sent from the sub-origin generating circuit CAa1, the driver circuit DRV1 turns on the selection optical element AOM1 for the ON time Ton. Similarly, when the sub-origin signal ZP2-ZP6 is sent from the sub-origin generating circuits CAa2-CAa6, the driver circuits DRV2-DRV6 turn on the selection optical elements AOM2-AOM6 for the ON time Ton. do. When the rotational speed of the polygon mirror PM is changed, the exposure control unit 356 changes the length of the on-time Ton accordingly. Further, the driver circuits DRVn (DRV1 to DRV6) are similarly provided in the beam switching control unit 352 of Fig. 33 in the fourth embodiment described above.

The sub-origin generation circuit CAan (CAa1 to CAa6) has a logic circuit LCC and a delay circuit 332. In the logic circuit LCC of the sub-origin generation circuit CAan (CAa1 to CAa6), the origin signal SZn (SZ1 to SZ6) from the origin sensor OPn of each scanning unit Un (U1 to U6) is Is entered. That is, the origin signal SZ1 is input to the logic circuit LCC of the sub-origin generating circuit CAa1, and similarly, the origin signals SZ2 to SZ6 are input to the logic circuit LCC of the sub-origin generating circuit CAa2 to CAa6. Is entered. Further, the status signal STS is input to the logic circuit LCC of each sub-origin generating circuit CAan (CAa1 to CAa6). This status signal (logical value) (STS) is set to ``1'' in the case of the first state in which the polygon mirror PM is repeated for each successive reflective surface RP, and is set to ``1'', and the reflective surface RP of the polygon mirror PM In the case of the second state, which repeats for every other side of ), it is set to "0". This status signal STS is sent from the exposure control unit 356.

Each logic circuit LCC generates an origin signal SZn' (SZ1' to SZ6') based on the input home signal SZn (SZ1 to SZ6), and outputs it to each delay circuit 332. . Each delay circuit 332 delays the input home signal SZn' (SZ1' to SZ6') by a time Tpx, and outputs a sub home signal ZPn (ZP1 to ZP6).

Fig. 39 is a diagram showing the configuration of a logic circuit LCC for inputting an origin signal SZn (SZ1 to SZ6) and a status signal STS. The logic circuit LCC is composed of a 2-input OR gate LC1, a 2-input AND gate LC2, and a one-shot pulse generator LC3. The status signal STS is applied as an input signal to one of the OR gates LC1. The output signal (logical value) of the OR gate LC1 is applied as an input signal on one side of the AND gate LC2, and the origin signal SZn is applied as an input signal on the other side of the AND gate LC2. The output signal (logical value) of the AND gate LC2 is input to the delay circuit 332 as an origin signal SZn'. The one-shot pulse generator LC3 normally outputs a signal SDo with a logical value of "1", but when the origin signal SZn' (SZ1' to SZ6') is generated, the logic value is "0" for a certain time Tdp. Outputs the signal SDo. That is, when the origin signal SZn' (SZ1' to SZ6') is generated, the one-shot pulse generator LC3 inverts the logic value of the signal SDo by a predetermined time Tdp. The time Tdp is set in the relationship of 2×Tpx>Tdp>Tpx, and preferably, Tdp≒1.5×Tpx.

40 is a diagram showing a timing chart for explaining the operation of the logic circuit LCC in FIG. 39; The left half of Fig. 40 shows the case of the first state in which the scanning of the spot light SP by each scanning unit Un(U1 to U6) is performed for each successive reflective surface RP without surface skipping. The right half shows a case in the second state in which the scanning of the spot light SP by each scanning unit Un(U1 to U6) is performed by skipping the reflective surface RP by one surface. In addition, in FIG. 40, in order to make the explanation easier to understand, the angles formed by the adjacent reflective surfaces RP of the polygon mirror PM (for example, reflective surfaces RPa and reflective surfaces RPb) It is assumed that there is no error in ηj, and the origin signal SZn is accurately generated at intervals of time Tpx.

In the first state in which the spot light SP is scanned for each reflective surface RP without surface skipping, since the status signal STS is "1", the output signal of the OR gate LC1 is a signal ( SDo) is always set to "1" regardless of the state. Therefore, the output signal (origin signal SZn') output from the AND gate LC2 is output at the same timing as the origin signal SZn. That is, in the first state, the origin signal SZn and the origin signal SZn' can be regarded as the same. In the first state, the time interval Tpx of the origin signal SZn' applied to the one-shot pulse generator LC3 is smaller than the time Tpd. Therefore, the signal SDo from the one-shot pulse generator LC3 remains "0". Further, even when there is an error in each ηj formed by the reflective surfaces RP of the polygon mirror PM, there is no change in the time interval of the origin signal SZn' being smaller than the time Tpd.

When the spot light SP is scanned in a second state in which one surface is skipped of the reflective surface RP, the status signal STS is switched to "0". Therefore, the output signal of the OR gate LC1 becomes "1" only when the signal SDo is "1". In the state where the signal SDo is "1" (in this case, the output signal of the OR gate LC1 is also "1"), the origin signal SZn (for convenience, this origin signal SZn) is When the origin signal (referred to as SZn) is applied, the AND gate LC2 also outputs the origin signal SZn' in response thereto. However, when the origin signal SZn' is generated, the signal SDo from the one-shot pulse generator LC3 changes to "0" by the time Tpd. Therefore, during the time Tpd, since both inputs of the OR gate LC1 become "0" signals, the output signal of the OR gate LC1 remains "0". Thereby, the output signal of the AND gate LC2 also remains "0" during the time Tpd. Therefore, even if the second origin signal SZn is applied to the AND gate LC2 before the time Tpd elapses, the AND gate LC2 does not output the origin signal SZn'.

And when the time Tpd elapses, since the signal SDo from the one-shot pulse generator LC3 is inverted to “1”, as in the case of the first home signal SZn, the third applied after the time Tpd has elapsed. The origin signal SZn' according to the origin signal SZn of is output from the AND gate LC2. By repetition of this operation, the logic circuit LCC converts the origin signal SZn, which is repeatedly generated every time Tpx, into an origin signal SZn', which is repeatedly generated every 2×time Tpx. From another perspective, the logic circuit LCC generates the origin signal SZn', which is thinned out by filtering every other pulse of the origin signal SZn repeatedly generated every time Tpx, that is, the origin signal SZn. The frequency of occurrence timing is divided by half. Further, the logic circuit LCC of the sub-origin generating circuit CAan may be replaced with the divider 330 (Fig. 31) of the sub-origin generating circuit CAn described in the fourth embodiment. When replacing with the divider 330, the divider 330 divides the origin signal SZn by 1/2 in the second state, and does not divide the origin signal SZn in the first state. Good to do. In addition, the sub-origin generating circuit CAn of the fourth embodiment may be substituted with the sub-origin generating circuit CAan of the fifth embodiment. In the second state, the origin signal SZ1' output from the logic circuit LCC of the sub-origin generation circuit CAa1 and the origin output from the logic circuit LCC of the sub-origin generation circuit CAa4 The signal SZ4' is shifted in half-cycle phase. Similarly, the origin signals SZ2' and SZ3' output from the logic circuit LCC of the sub-origin generation circuits CAa2 and CAa3, and the origin output from the logic circuit LCC of the sub-origin generation circuits CAa5 and CAa6 The signals SZ5' and SZ6' are shifted in half-cycle phase.

In this way, only by inverting the value of the status signal STS input to the logic circuit LCC of the sub-origin generation circuits CAa1 to CAa6 of the beam switching control unit 352, the polygon mirror PM is continuous. Whether the drawing exposure is repeated by scanning the spot light SP for each reflecting surface RP, or scanning the spot light SP for every other surface of the reflecting surface RP of the polygon mirror PM Whether or not the drawing exposure is repeated by the second state can be arbitrarily switched.

Also in the fifth embodiment, rotation control of the polygon mirror PM of each scanning unit Un(U1 to U6) is the same as in the fourth embodiment. That is, each scanning unit (SZn (SZ1 to SZ6)) output from the origin sensor OPn of each scanning unit (Un(U1 to U6)) has a relationship as shown in FIG. The rotation of the polygon mirror PM of Un (U1 to U6) is controlled. Therefore, when the scanning of the spot light SP is performed for each reflective surface RP without surface skipping, the scanning units U1 to U3 are in the order of U1 → U2 → U3. Scanning of can be performed repeatedly, and the scanning units U4 to U6 can repeatedly scan the spot light SP in the order of U4→U5→U6.

It is preferable that the time Tpd set in this one-shot pulse generator LC3 can be changed according to the information of the rotational speed of the polygon mirror PM from the exposure control unit 356. In addition, in the case of scanning the spot light SP by skipping one side, and scanning the spot light SP with skipping two sides, the time Tpd is (n+1)×Tpx>Tdp>n×Tpx in the same configuration as in FIG. You can respond only by setting the relationship. In addition, n represents the number of skipped reflection surfaces RP. For example, when n is 2, it means that the scanning of spot light SP is performed by skipping two sides of the reflective surface RP, and when n is 3, scanning of spot light SP Means that is performed by skipping three surfaces of the reflective surface RP.

Next, when the spot light SP is scanned in the first state in which the scanning of the spot light SP is performed for each reflection surface RP without surface skipping, the drawing data output control unit 354 uses the light source devices 14A' and 14B'. The output control of the drawing bit string data Sdw to the driving circuit 206a of is briefly described. In the first state, the spot light SP is scanned in parallel by the first scanning module (scanning units U1 to U3) and the second scanning module (scanning units U4 to U6). Therefore, the drawing data output control unit 354 corresponds to each of the scanning units U1 to U3 to the driving circuit 206a of the light source device 14A' that emits the beam LBa incident on the first scanning module. The driving circuit 206a of the light source device 14B' outputs the drawing bit string data Sdw obtained by synthesizing one serial data DL1 to DL3 in time series and emits a beam LBb incident on the second scanning module. ), the drawing bit string data Sdw obtained by synthesizing serial data DL4 to DL6 corresponding to each of the scanning units U4 to U6 in time series is output.

In addition, the drawing data output control unit 354 shown in Fig. 35 can be used as it is in any case where the status signal STS is "1" or "0". In the first state in which the spot light SP is scanned for each reflective surface RP without surface skipping, the sub-origin signal ZP2 is generated after time Ts after the generation of the sub-origin signal ZP1. , In addition, the sub-origin signal ZP3 is generated after time Ts. Accordingly, the serial data DL1 to DL3 are repeatedly output by the counter units CN1 to CN3 in the order of DL1 to DL2 to DL3. Serial data (DL1 to DL3) sequentially outputted through the gates (GT1 to GT3) opened during a certain period of time (on time Ton) after the sub-origin signal (ZP1 to ZP3) is applied are drawn bit string data (Sdw) As input to the drive circuit 206a of the first light source device 14A'. Similarly, in the first state in which the spot light SP is scanned for each reflection surface RP without surface skipping, the sub-origin signal ZP5 is generated after time Ts after the sub-origin signal ZP4 is generated. Occurs, and additionally after time Ts, the sub-origin signal ZP6 is generated. Therefore, the serial data DL4 to DL6 are repeatedly outputted in the order of DL4 to DL5 to DL6 by the counter units CN4 to CN6. Serial data (DL4 to DL6) sequentially outputted through the gate units (GT4 to GT6) opened during a certain period of time (on time Ton) after the sub-origin signal (ZP4 to ZP6) is applied is the drawing bit string data (Sdw ) To the driving circuit 206a of the second light source device 14B'.

Next, the shift of the serial data DL1 to DL6 in the first state will be briefly described. The shift in the column direction of the serial data DL1 is performed at the timing when the sub-origin signal ZP2 corresponding to the scanning unit U2, which performs the next scanning, after all the serial data DL1 is outputted. The shift in the column direction of the serial data DL2 is performed at a timing at which the sub-origin signal ZP3 corresponding to the scanning unit U3 to perform the next scan occurs after all of the serial data DL2 are output. The shift in the column direction of the serial data DL3 is performed at the timing when the sub-origin signal ZP1 corresponding to the scanning unit U1, which performs the next scan, after all the serial data DL3 is outputted. In addition, the shift in the column direction of the serial data DL4 is performed at the timing at which the sub-origin signal ZP5 corresponding to the scanning unit U5 to perform the next scan occurs after all the serial data DL4 are output. . The shift in the column direction of the serial data DL5 is performed at the timing at which the sub-origin signal ZP6 corresponding to the scanning unit U6 that performs the next scan occurs after all the serial data DL5 is output. The shift in the column direction of the serial data DL6 is performed at the timing at which the sub-origin signal ZP4 corresponding to the scanning unit U4 that performs the next scan occurs after all the serial data DL6 are output. In addition, since the output control of the drawing bit string data Sdw in the second state is the same as in the fourth embodiment, a description thereof is omitted. In addition, the output control of the drawing bit string data Sdw in the first state is the same as the control principle of the first to third embodiments, and only the order of the output serial data DLn is different. In other words, whether to output serial data (DLn) in the order of DL1→DL3→DL5, DL2→DL4→DL6, or output serial data (DLn) in the order of DL1→DL2→DL3, DL4→DL5→DL6. It's the difference.

Further, in the case of the second state in which the spot light SP is scanned by skipping one surface of the reflective surface RP, compared to the first state performed for each reflective surface RP without skipping, The scanning start interval of the spot light SP of each scanning unit Un(U1 to U6) is long. For example, when the spot light SP is scanned by skipping one surface of the reflective surface RP, the spot of each scanning unit Un(U1 to U6) is compared to the case where the surface skipping is not performed. The scanning start interval of the light SP is doubled. Further, when the reflection surface RP is performed by skipping two surfaces, the scanning start interval of the spot light SP is three times as compared to the case where the surface skipping is not performed. Therefore, if the rotational speed of the polygon mirror PM and the conveyance speed of the substrate FS are made equal in the first state and the second state, the exposure result will be different in the first state and the second state.

Accordingly, at least one of the rotation speed of the polygon mirror PM and the transfer speed of the substrate FS is changed (corrected) in the first state and the second state, and the exposure results in the first state and the second state are the same. The exposure control unit 356 may have a control mode set to the state. For example, when the scanning start interval of the spot light SP in the first state and the scanning start interval of the spot light SP in the second state are 1:2, the exposure control unit 356 is The rotation control unit 350 is controlled so that the ratio of the rotation speed of the polygon mirror PM in the one state and the rotation speed of the polygon mirror PM in the second state becomes 1:2. Specifically, the rotational speed of the polygon mirror PM in the first state is 20,000 rpm, and the rotational speed of the polygon mirror PM in the second state is 40,000 rpm. In addition, the emission frequency Fs of the beams LB (LBa, LBb) of the light source device 14' (14A', 14B') is set to 200 MHz in the first state, for example, 400 MHz in the second state. do. Thereby, the interval between the generation timing of the sub-origin signal ZPn in the first state and the generation timing of the sub-origin signal ZPn in the second state can be made substantially the same.

Further, for example, when the scanning start interval of the spot light SP in the first state and the scanning start interval of the spot light SP in the second state are 1:2, in the first state Control to control the rotation speed of the drive rollers R1 to R3 and the rotating drum DR so that the ratio of the transfer speed of the substrate FS in the second state to the transfer speed of the substrate FS in the second state is 2:1 The exposure control unit 356 may have a mode. As described above, a control mode (scan correction mode) for correcting the rotational speed of the polygon mirror PM or the emission frequency Fs (frequency of the clock signal LTC), or a control mode for correcting the transfer speed of the substrate FS ( Transfer correction mode), the distance in the X direction of the drawing lines SLn (SL1 to SL6) on the substrate FS in the first state and the substrate FS in the second state ), the X-direction spacing of the drawing lines SLn (SL1 to SL6) on the) can be made the same spacing (for example, 1.5 μm). In addition, in the first state and the second state, the pattern data (bitmap) stored in each of the memory units BM1 to BM6 in the drawing data output control unit 354 does not need any correction and can be used as it is. have.

In addition, using both the scanning correction mode and the transfer correction mode described above, the pattern drawn on the substrate FS in the first state and the pattern drawn on the substrate FS in the second state are made equal. You can correct it. For example, in the first state (in the case of beam scanning for each reflection surface RP of the polygon mirror PM), the rotational speed of the polygon mirror PM is 20,000 rpm, and the light source device 14' (14A) ', 14B')), when the emission frequency Fs of the beam LB is 200 MHz and the transport speed of the substrate FS is 5 mm/sec, the second state (1 reflective surface RP of the polygon mirror PM) is skipped. In the case of beam scanning), the transfer speed of the substrate FS is set to 3.75 mm/sec, which is reduced by -25% rather than half, and the rotation speed of the polygon mirror PM is 1.5 times 30,000 rpm, and the beam (LB ), the emission frequency Fs may also be set to 300 MHz, which is 1.5 times. In this way, when both the scanning correction mode and the transport correction mode are combined, in the case of the second state, it is not necessary to reduce the transport speed of the substrate FS by half, and thus an extreme decrease in productivity is suppressed.

Also in the fifth embodiment, as described in the fourth embodiment, the number of scanning units Un that distributes the beams LBa and LBb may be arbitrarily changed. Further, the scanning efficiency of the polygon mirror PM may also be arbitrarily changed. Further, in the fifth embodiment, since the scanning efficiency of the polygon mirror PM is 1/3 and the number of scanning units Un is 6, 6 optical elements for selection (AOMn (AOM1 to AOM6)) are The optical element modules OM1 and OM2 were divided, and the six scanning units Un(U1 to U6) were divided into two scanning modules corresponding thereto. However, when the scanning efficiency of the polygon mirror (PM) is 1/M and the number of scanning units (Un) and selection optical elements (AOMn) is Q, Q/M optical elements (AOMn) for selection It is sufficient to divide into element modules (OM1, OM2, ...), and to divide Q scan units Un into Q/M scan modules. In this case, the number of selection optical elements AOMn included in each of the optical element modules OM1, OM2, ... is the same, and the number of scanning units Un included in each of the Q/M scan modules It is desirable to do the same. In addition, it is preferable that this Q/M is an integer. That is, it is preferable that Q is a multiple of M.

For example, when the scanning efficiency of the polygon mirror PM is 1/2, and the number of scanning units Un and selection optical elements (AOMn) is 6, 6 optical elements for selection (AOMn) are used as 3 optical elements. Divide the device modules OM1, OM2, OM3 equally, and divide the six scanning units Un into three scanning modules equally. And in the case of the first state, three optical element modules (OM1, OM2, OM3) are arranged in parallel, and each of the three optical element modules (OM1, OM2, OM3) from the three light source devices 14' Beams LB (in this case, LBa, LBb, LBc) are incident in parallel, and in the second state, three optical element modules (OM1, OM2, OM3) are arranged in series, and one light source The beam LB from the device 14' is incident so that the three optical element modules OM1, OM2, OM3 pass serially.

As described above, in the fifth embodiment, the deflection (scan) of the beam LBn (spot light SP) by the polygon mirror PM of the scanning unit Un is a half continuous polygon mirror PM. Switching to one of a first state (first drawing mode) repeated for each slope (RP) and a second state (second drawing mode) repeated for each reflective surface (RP) that filters at least one of the polygon mirrors (PM) Thus, the beam switching control unit 352 controls the beam switching member 20A to sequentially perform one-dimensional scanning of the spot light SP by each of the plurality of scanning units Un. As a result, while the same effect as in the fourth embodiment can be obtained, the spot light SP can be scanned by surface skipping, or the spot light SP can be scanned without surface skipping. Can be switched.

In the first state, when the scanning efficiency (α/β) of the polygon mirror PM becomes less than 1/2, the number of scanning units Un corresponding to the reciprocal of the scanning efficiency is grouped as one scanning module. Then, using a plurality of the grouped scanning modules, one scanning unit Un among them performs one-dimensional scanning of the spot light SP for each scanning module. Thereby, among the plurality of drawing lines SLn, the number of drawing lines SLn equal to the number of scanning modules can be simultaneously scanned with the spot light SP. In addition, in the case of the second state, since it is controlled to perform beam scanning for each reflective surface RP of at least one of the polygon mirrors PM, the scanning efficiency (α/β) of the polygon mirror PM Even if there are a plurality of scanning units Un than the number, all of the plurality of scanning units Un can scan the spot light SP along the drawing line SLn while effectively utilizing the beam LB. have.

In the case of the above first state, the beams LBa and LBb from each of the light source devices 14A' and 14B' are incident in parallel to the grouped two scanning modules, so that the selection in the beam switching member 20A is used. Each of the optical elements AOM1 to AOM6 is turned on by the beam switching control unit 352 so that the beams LB1 to LB6 are time-divisionally incident on the corresponding scanning units U1 to U6 in a grouped scanning module unit. /Off state is switched.

The arrangement switching member SWE provided in the beam switching member 20A receives the beam LBa from the first light source device 14A' and three scanning units U1 to U3 out of the six scanning units U1 to U6. ) To each of the beams LB1 to LB3, and the beam LBb from the second light source device 14B' to each of the remaining three scanning units U4 to U6. ), three optical elements for selection (AOM1 to AOM3) are arranged in series along the optical path of the beam LBa, and optical elements for selection (AOM4 to AOM6) are serially arranged along the optical path of the beam LBb. The beam LBa is distributed to each of the six scanning units U1 to U6 as beams LB1 to LB6 in a first arrangement state arranged in a row and the beam LBa from one light source device 14A'. ) To switch the second arrangement state in which six optional optical elements (AOM1 to AOM6) are arranged in series along the optical path.

Accordingly, in the case of the first state, by setting it to the first arrangement state by the arrangement switching member SWE, each of the scanning units U1 to U6 is a reflective surface ( The scanning by the spot light SP can be repeated for each RP), and two of the six scanning units U1 to U6 can perform scanning by the spot light SP almost simultaneously. Moreover, in the case of the second state, by setting it to the second arrangement state by the arrangement switching member SWE, it is a beam scan for each reflective surface RP that has at least one of the polygon mirrors PM, but six scanning units Scanning by spot light SP can be repeated with all of (U1 to U6).

Therefore, according to the fifth embodiment, in the setup at the time of initial installation of the drawing device, the arrangement switching member SWE is set so as to be in the second arrangement state using one light source device 14A', and then the substrate When it is desired to increase the conveyance speed of the (FS), the second light source device 14B' may be extended, and the arrangement switching member SWE may be set so that the first arrangement state is achieved. The drawing apparatus can be upgraded by a simple operation such as switching of the switching member SWE.

In addition, in each of the above embodiments, one reflective surface RP in front of the rotation direction of the polygon mirror PM is used for the reflective surface RP that deflects the beam LBn of the polygon mirror PM. Thus, although the origin signal SZn was detected, the origin signal SZn may be detected using the reflection surface RP itself that deflects the beam LBn. In this case, since it is not necessary to delay the origin signal SZn or the origin signal SZn' obtained from the origin signal SZn by a time Tpx, the origin signal SZn or the origin signal SZn' is sub-originated. The signal ZPn may be used.

Further, in the fourth and fifth embodiments, the electro-optical element 206 as an optical modulator for drawing of the light source device 14' (14A', 14B') is switched using the drawing bit string data (Sdw). Although it was made so, like the 2nd embodiment, you may use the drawing optical element (AOM) as a drawing optical modulator. This drawing optical element (AOM) is an acousto-optic modulator (AOM: Acousto-Optic Modulator). That is, in the fourth embodiment, an optical element for drawing (AOM) is disposed between the light source device 14' and the optical element for selection of the first stage (AOM1), and the optical element for drawing (AOM) The beam LB from the light source device 14' that has transmitted through may be made to be incident on the selection optical element AOM1. In this case, the drawing optical element AOM is switched according to the drawing bit string data Sdw. Even in this case, the same effects as in the fourth embodiment can be obtained.

Further, in the fifth embodiment, between the first light source device 14A' and the first-stage selection optical element AOM1 of the first optical element module OM1, and the second light source device 14B' An optical element for drawing (AOM (AOMa, AOMb)) is disposed between the optical element AOM4 for selection at the first stage of the second optical element module OM2, respectively. That is, the beam LBa from the light source device 14A' that has passed through the drawing optical element AOMa is incident on the selection optical element AOM1, and has passed through the drawing optical element AOMb. The beam LBb from') is incident on the selection optical element AOM4. In this case, in the case of the first state, the drawing optical element AOMa is switched according to the drawing bit string data Sdw composed of serial data DL1 to DL3, and the drawing optical element AOMb is serial It is switched according to the drawing bit string data Sdw composed of data DL4 to DL6. In addition, in the case of the second state, only the drawing optical element AOMa is switched according to the drawing bit string data Sdw composed of the serial data DL1 to DL6.

In addition, as in the first embodiment, a drawing optical element AOM as an optical modulator for drawing may be provided for each scanning unit Un. In this case, the optical element AOM for drawing may be provided in front of the reflection mirror M20 (refer FIG. 28) of each scanning unit Un. The drawing optical element AOM of each of the scanning units Un(U1 to U6) is switched according to each serial data DLn (DL1 to DL6). For example, the drawing optical element AOM of the scanning unit U3 is switched according to the serial data DL3.

[6th embodiment]

Fig. 41 shows the configuration of the beam switching member (beam delivery unit) 20B according to the sixth embodiment, and here, a beam emitted from one light source device 14' and incident on the beam switching member 20B ( It is assumed that LBw(LB)) is a parallel beam of circularly polarized light. The beam switching member 20B includes 6 optional optical elements (AOM1 to AOM6), 2 absorbers (TR1, TR2), 6 lens systems (CG1 to CG6), mirrors (M30, M31, M32), and condensing lens (CG0). ), and a polarization beam splitter BS1 and two writing optical elements (acoustic optical modulation elements) AOMa and AOMb. In addition, the same reference numerals are assigned to the configurations similar to those of the fourth embodiment or the fifth embodiment.

The beam LBw incident on the beam switching member 20B is separated into a straight P-polarized beam LBp and a straight S-polarized beam LBs by a polarizing beam splitter BS1 through a condensing lens CG0. do. The S-polarized beam LBs reflected by the polarization beam splitter BS1 is incident on the drawing optical element AOMa. The beams LBs incident on the drawing optical element AOMa are converged to become a beam west in the drawing optical element AOMa by the condensing action of the condensing lens CG0. Drawing bit string data Sdw(DLn) as shown in Fig. 19 is applied to the drawing optical element AOMa via the driver circuit DRVn. The drawing bit string data Sdw is composed of serial data DL1, DL3, and DL5 corresponding to each of the odd-numbered scanning units U1, U3, and U5 here. Therefore, when the drawing bit string data Sdw(DLn) is ``1'', the drawing optical element AOMa turns on, and the first-order diffracted light of the incident beam LBs is deflected and the drawing beam (intensity modulation Beam), which is emitted toward the mirror M31. The drawing beam reflected by the mirror M31 is incident on the selection optical element AOM1 through the lens system CG1. Further, when the drawing bit string data Sdw (DLn) is "0", the zero-order light LBs emitted from the drawing optical element AOMa is reflected by the mirror M31, but is reflected by the subsequent lens system CG1. Proceed at an angle that does not enter. Further, the lens system CG1 condenses the drawing beam emitted and emitted from the drawing optical element AOMa at the diffraction portion of the selection optical element AOM1 to form a beam west.

The drawing beam that has passed through the selection optical element (AOM1) is incident on the selection optical element (AOM3) via the same lens system (CG3) as the lens system (CG1), and is drawn through the selection optical element (AOM3). The beam is incident on the selection optical element AOM5 via the same lens system CG5 as the lens system CG1. In Fig. 41, three optical elements for selection (AOM1, AOM3, AOM5) are arranged in series along the beam optical path, and only the optical element for selection (AOM3) is turned on, and the optical element for drawing (AOMa) A state in which the intensity-modulated drawing beam is incident on the corresponding scanning unit U3 as the beam LB3 is shown. In addition, the lens systems CG1, CG3, and CG5 correspond to a combination of one collimating lens CL and one condensing lens CD in FIGS. 26 and 36.

On the other hand, the P-polarized beam LBp that has passed through the polarization beam splitter BS1 is reflected by the mirror M30 and is incident on the drawing optical element AOMb. The beam LBp incident on the drawing optical element AOMb is converged to become a beam west in the drawing optical element AOMb by the condensing action of the condensing lens CG0. Drawing bit string data Sdw(DLn) as shown in Fig. 19 is applied to the drawing optical element AOMb via the driver circuit DRVn. The drawing bit string data Sdw is a combination of serial data DL2, DL4, and DL6 corresponding to each of the even-numbered scanning units U2, U4, and U6. Therefore, when the drawing bit string data Sdw(DLn) is "1", the drawing optical element AOMb is turned on, and the first order diffracted light of the incident beam LBp is deflected and the drawing beam (intensity As a modulated beam). The drawing beam reflected by the mirror M32 passes through the same lens system CG2 as the lens system CG1 and enters the selection optical element AOM2. Further, when the drawing bit string data Sdw (DLn) is "0", the zero-order light LBp emitted from the drawing optical element AOMb is reflected by the mirror M32, but is reflected by the subsequent lens system CG2. Proceed at an angle that does not enter. Further, the lens system CG2 condenses the drawing beam emitted and emitted from the drawing optical element AOMb to the diffractive portion of the selection optical element AOM2 to form a beam west.

The drawing beam that has passed through the selection optical element (AOM2) is incident on the selection optical element (AOM4) via the same lens system (CG4) as the lens system (CG1), and passes through the selection optical element (AOM4). The beam is incident on the selection optical element AOM6 via the same lens system CG6 as the lens system CG1. In Fig. 41, three optical elements for selection (AOM2, AOM4, AOM6) are arranged in series along the beam optical path, and only the optical element for selection (AOM2) is turned on, and the optical element for drawing (AOMb) A state in which the intensity-modulated drawing beam is incident on the corresponding scanning unit U2 as the beam LB2 is shown. In addition, the lens systems CG2, CG4, and CG6 correspond to a combination of one collimating lens CL and one condensing lens CD in FIGS. 26 and 36.

When the beam switching member (beam delivery unit) 20B as shown in FIG. 41 is used, the beam LBw from one light source device 14' is divided into two by a polarizing beam splitter BS1, and one of the The drawing beams LB1, LB3, LB5 generated by the drawing optical element AOMa from the beams LBs are sequentially incident on one of the odd-numbered scanning units U1, U3, U5, and polarized beams The drawing beams LB2, LB4, LB6 generated by the drawing optical element AOMb from the other beam LBp divided by the splitter BS1 are selected from the even-numbered scanning units U2, U4, and U6. You can enter one in order.

In this sixth embodiment, after dividing the beam LBw from the light source device 14' into two by the polarizing beam splitter BS1, the beam LB based on the pattern data in the drawing optical elements AOMa and AOMb ), the intensity of the spot light SP by each of the six scanning units U1 to U6 is -50% attenuation in the polarization beam splitter BS1, and the optical element for drawing ( AOMa, AOMb) and each optional optical element (AOMn) by -20%, and by setting the attenuation in each scanning unit (U1 to U6) to -30%, the intensity of the original beam (LBw) (100%) ) Is about 22.4%. However, when the scanning efficiency of each polygon mirror PM of the six scanning units U1 to U6 is 1/3 or less, and the beam LBw from one light source device 14' is used, the polygon It is possible to perform pattern drawing by scanning the spot light SP in each of the six drawing lines SLn without beam scanning by skipping one surface of the reflective surface RP of the mirror PM.

[Modified Example 1]

As in the sixth embodiment, the beam LBs incident on the odd-numbered selection optical elements AOM1, AOM3, and AOM5, and the beam LBp incident on the even-numbered selection optical elements AOM2, AOM4, AOM6. In the case where the polarization directions are orthogonal, the odd-numbered selection optical elements AOMn and the even-numbered selection optical elements AOMn need to be rotated by 90 degrees relative to the circumference of the beam incidence axis to be disposed. Fig. 42 is a configuration in which, for example, the selection optical element AOM3 among odd-numbered selection optical elements AOM1, AOM3, and AOM5 is rotated 90 degrees with respect to the even-numbered selection optical element AOMn. Represents. In the selection optical element AOM3, since the drawing beam of S-polarized light that has passed through the lens system CG3 is incident, the direction having high diffraction efficiency becomes the Y direction parallel to the XY plane. That is, the selection optical element AOM3 is rotated by 90 degrees so that the periodic direction of the diffraction grating generated in the selection optical element AOM3 becomes the Y direction.

Due to the arrangement of the selection optical element AOM3, the beam LB3 that is deflected and emitted when the selection optical element AOM3 is turned on is inclined in the Y direction with respect to the traveling direction of the 0-th order light. . Therefore, the beam LB3 is separated from the optical path of the 0-shielding light, and the beam LB3 from the selection optical element AOM3 is separated so that the beam LB3 passes through the opening TH3 of the support member IUB in the Z direction. A mirror IM3a reflecting) in the XY plane, and a mirror IM3b reflecting in the -Z direction so that the beam LB3 reflected from the mirror IM3a passes through the opening TH3 are provided. Also for each of the other odd-numbered selection optical elements AOM1 and AOM5, a set of mirrors IM1a and IM1b and a set of mirrors IM5a and IM5b are similarly provided. In addition, in the configuration of Fig. 41, since the polarization directions of the beams LBs and LBp incident on the drawing optical elements AOMa and AOMb are orthogonal, the drawing optical elements AOMa and AOMb are around the beam incident axis. It is placed in a relationship rotated 90 degrees relative to.

However, in the case where the polarization beam splitter BS1 in FIG. 41 is an amplitude-divided beam splitter or a half mirror, when the polarization direction of the beam LBw is set to only one direction (for example, P polarization), the optical element for drawing It is not necessary to arrange one of (AOMa, AOMb) and one of the odd-numbered selection optical element AOMn and the even-numbered selection optical element AOMn relatively 90 degrees as shown in FIG.

[Modified Example 2]

In the sixth embodiment, all of the scanning units U1 to U6 corresponding to each of the six selection optical elements AOM1 to AOM6 are drawn lines SL1 for every reflective surface RP of the polygon mirror PM. It has a configuration capable of scanning the spot light SP along each of -SL6). Thus, the selection optical element (AOM5) of FIG. 41 and the beam (beam modulated by the drawing optical element (AOMa)) sequentially passing through the odd-numbered selection optical elements (AOM1, AOM3, AOM5) are incident. Between the absorber TR2, three additional optical elements for selection (AOM7, AOM9, AOM11) are provided in series, and the beam that has passed through the even-numbered optical elements for selection (AOM2, AOM4, AOM6) in order ( An additional three optional optical elements (AOM8, AOM10, AOM12) are connected in series between the selection optical element (AOM6) and the absorber (TR1) so that the beam modulated by the drawing optical element (AOMb) is incident. Prepare. In addition, six scanning units (U7 to U12) into which beams (LB7 to LB12) deflected (switched) from each of the optical elements for selection (AOM7 to AOM12) are introduced were expanded, and a total of 12 scanning units (U1 to U12) Are arranged in the width direction (Y direction) of the substrate FS. Thereby, continuous drawing exposure of the 12 drawing lines SL1 to SL12 is possible, and the maximum exposure width in the Y direction can be doubled.

In this case, when the scanning efficiency of each polygon mirror PM of the scanning units U1 to U12 is 1/3 or less, odd numbered scanning units U1, U3, U5, U7, U9, grouped as the first drawing module, U11) and the even-numbered scanning units U2, U4, U6, U8, U10, U12 grouped as the second drawing module are all beams on the opposite side of the reflective surface RP of the polygon mirror PM ( LBn) is injected. In this way, even when the width of the substrate FS in the Y direction is increased, only adding the scanning units U7 to U12, the optical elements for selection (AOM7 to AOM12), etc., the large exposure area W (Fig. 5, pattern drawing for FIG. 25) becomes possible. In this way, the configuration in which the six scanning units U7 to U12 and the selection optical elements AOM7 to AOM12 are expanded to form twelve scanning units U1 to U12 is the fifth embodiment (Figs. 36 to 36). The same can be applied to the case of using the two light source devices 14A' and 14B' described in FIG. 38).

[Modified Example 3]

FIG. 43 shows the arrangement relationship between the transfer mode of the substrate FS and the scanning unit Un (drawing line SLn) according to the modification example 3, and here, as in the modification example 2, 12 scan units U1 to U12 ) Is provided, and the drawing lines SL1 to SL12 of each scanning unit Un are disposed on the rotating drum DR so that joint drawing exposure can be performed in the Y direction. In addition, the length in the rotation axis direction (Y direction) of the rotating drum DR and various rollers (R1 to R3, RT1, RT2) in the substrate transfer mechanism 12 shown in Fig. 23 is Hd, 12 scans. The maximum drawing width in the Y direction that can be exposed by the joint drawing by the unit Un is called Sh (Sh<Hd), and the maximum support width of the exposed substrate FS0 is called Tf. Each of the twelve scanning units U1 to U12 corresponding to each of the twelve drawing lines SL1 to SL12 in the modified example 3 is one light source device 14 as shown in FIG. 41 (6th embodiment). A beam switching member (beam delivery unit) 20B of a method of dividing the beam LBw from') into two by a beam splitter or a half mirror, or, as shown in FIG. 38 (Fifth Embodiment), two light source devices ( 14A', 14B') from the beam switching member (beam delivery unit) 20A of a method using the beams LBa and LBb respectively, it is configured to enter the corresponding 12 beams LB1 to LB12 in time division. . Therefore, for example, when the length of each drawing line (SL1 to SL12) in the Y direction is 50 mm, the maximum drawing width Sh is 600 mm, as an example, the width of the substrate FS0, which is the maximum support width Tf, is 650 mm, and the rotating drum The length Hd of (DR) can be about 700 mm.

When the substrate FS0 having the same width as the maximum support width Tf is exposed by the drawing apparatus as shown in Fig. 43, the four alignment microscopes AM1 to AM4 shown in Figs. 24 and 25 described above (observation area ( Vw1 to Vw4)), three alignment microscopes (AM5 to AM7) (observation regions (Vw5 to Vw7)) are expanded in the Y direction. In that case, the alignment microscope AM1 (observation region Vw1) and alignment microscope AM7 (observation region Vw7) positioned on both sides in the width direction of the substrate FS0 are on both sides of the substrate FS0, An alignment mark formed at a constant pitch in the X direction is detected. Moreover, the alignment microscope AM4 (observation area Vw4) is arrange|positioned so that it may be located almost in the center of the maximum support width Tf.

In addition, in the case of the substrate FS1 capable of pattern drawing on the exposure area W by the drawing lines SL1 to SL6 by each of the six scanning units U1 to U6 as described in each of the previous embodiments, Since the width Tf1 is about half of the maximum support width Tf of the rotating drum DR, the substrate FS1 is conveyed, for example, attached to the -Y direction side of the outer peripheral surface of the rotating drum DR. At that time, each of the alignment marks MK1 to MK4 (FIG. 25) on the substrate FS1 can be detected by the respective observation regions Vw1 to Vw4 of the four alignment microscopes AM1 to AM4. In the case of exposure of the substrate FS1, since only six scanning units U1 to U6 need to be used, each of the scanning units U1 to U6 is a reflective surface RP in which a polygon mirror PM is connected. Spot scanning along each of the drawing lines SL1 to SL6 is possible in either mode of each beam scan or the beam scan of the polygon mirror PM across one reflection surface RP.

For example, as in the fifth embodiment, when the beams LBa and LBb from each of the two light source devices 14A' and 14B' are set to be used together, the beam from the light source device 14A' (LBa) so that the optical elements for selection (AOM1, AOM3, AOM5, AOM7, AOM9, AOM11) corresponding to each of the odd-numbered scanning units (U1, U3, U5, U7, U9, U11) are transmitted in series, A selection optical element that is grouped within the beam switching member 20A and corresponds to each of the even-numbered scanning units U2, U4, U6, U8, U10, U12, and the beam LBa from the light source device 14A' (AOM2, AOM4, AOM6, AOM8, AOM10, AOM12) are grouped within the beam diverting member 20A so as to transmit in series. And when the substrate FS1 is exposed, the polygon mirror PM is based on only the three origin signals SZ1, SZ3, SZ5 output for each continuous reflective surface RP, and the odd-numbered scanning units U1, U3, In the order of U5), the polygon mirror PM is controlled to repeat the beam scanning for each continuous reflecting surface RP, and the polygon mirror PM is controlled to repeat the three origin signals ( On the basis of only SZ2, SZ4, SZ6, it is controlled so that the beam scanning for each reflection surface RP in which the polygon mirror PM is successive is repeated in the order of the even-numbered scanning units U2, U4, U6.

In addition, when exposure is performed on the substrate FS2 having a width Tf2 smaller than the maximum support width Tf and greater than the width Tf1 of the substrate FS1, the substrate FS2 is placed at the center of the maximum support width Tf of the rotating drum DR. Return it by fitting it to the part. At that time, the exposure region W on the substrate FS2 is assumed to be drawn by drawing lines SL3 to SL10 by each of the eight scanning units U3 to U10 connected in the Y direction. In this case, the odd-numbered four selection optical elements AOM3, AOM5, AOM7, and AOM9 into which the beam LBa (intensity modulated beam) from the light source device 14A' is incident, is the beam LB3, One of LB5, LB7, LB9) is sequentially generated, and the even-numbered four optical elements for selection (AOM4, AOM6) into which the beam LBb (intensity modulated beam) from the light source device 14B' is incident. , AOM8, AOM10) are controlled to sequentially generate any one of the time division beams LB4, LB6, LB8, and LB10. Accordingly, each of the at least eight scanning units U3 to U10 is set to a mode of beam scanning across the one reflecting surface RP of the polygon mirror PM.

And when the substrate FS2 is exposed, the four sub-origin signals ZP3 and ZP5 are output through every other reflective surface RP of each polygon mirror PM of the odd-numbered scanning units U3, U5, U7, U9. , ZP7, ZP9) only, in the order of odd-numbered scanning units (U3, U5, U7, U9), the beam scanning is controlled to be repeated for every other surface of the polygon mirror (PM) except for one reflective surface (RP), and Based on only the four sub-origin signals (ZP4, ZP6, ZP8, ZP10) output through every other reflective surface (RP) of each polygon mirror (PM) of the second scanning unit (U4, U6, U8, U10), the even number In the order of the scanning units U4, U6, U8, U10, it is controlled so that the beam scanning is repeated across the one reflecting surface RP of the polygon mirror PM. In addition, in FIG. 43, alignment marks (corresponding to alignment marks MK1 and MK4 in FIG. 25) formed on both sides of the substrate FS2 in the width direction are respectively observed areas Vw2 and Vw2 of the alignment microscopes AM2 and AM6. Although they are arranged in a relation detected by Vw6), depending on the size of the exposure region W in the Y direction, there are cases in which arrangements cannot be made in such a relation. In that case, it is sufficient to provide a configuration in which some of the seven alignment microscopes AM1 to AM7 can be moved in the Y direction, so that the positional intervals of the observation regions Vw1 to Vw7 in the Y direction can be adjusted.

According to the above modification 3, effective exposure using only the necessary scanning units Un can be performed depending on the width of the substrate FS to be exposed or the dimension of the exposure region W in the Y direction. Further, as shown in FIG. 43, when the scanning efficiency of each polygon mirror PM of the 12 scanning units U1 to U12 is 1/3 or less, for example, 3 reflective surfaces RP of each polygon mirror PM ) If the beam scan is performed by filtering, even if it is a beam from one light source device 14', pattern drawing can be satisfactorily over the maximum drawing width Sh.

In the case of configuring a drawing device with nine scanning units (U1 to U9), the odd-numbered five scanning units (U1, U3, U5, U7, U9) and the even-numbered four scanning units (U2, U4, U6, U8) are used. Therefore, when drawing a pattern on the exposure area W by drawing lines SL1 to SL9 by all of the nine scanning units U1 to U9, the scanning efficiency of the polygon mirror PM is 1/3 or less. , For example, beam scanning may be performed on every other reflective surface RP of each polygon mirror PM. However, in this case, only the sub-origin signals (ZP1, ZP3, ZP5, ZP7, ZP9) generated from the respective origin signals SZn of the odd-numbered scanning units (U1, U3, U5, U7, U9) are ordered. Repeatedly referring to the same, spot scanning is performed on each of the odd-numbered drawing lines SL1, SL3, SL5, SL7, and SL9, and the respective origin signals of the even-numbered scanning units U2, U4, U6, and U8 Repeatedly referencing only the sub-origin signals ZP2, ZP4, ZP6, and ZP8 generated from (SZn) in that order, spot scanning at each of the even-numbered drawing lines SL2, SL4, SL6, and SL8 is performed. Just do it.

As described above, in the modified example 3, a plurality of scanning units Un for scanning the spot light SP of the beam from the light source device 14' along the drawing line SLn are drawn by each drawing line SLn. A drawing device is arranged so that the pattern is connected on the substrate FS in the direction of the drawing line SLn (the main scanning direction), and relatively moves the plurality of scanning units and the substrate FS in the sub-scanning direction intersecting the main scanning direction. As the pattern drawing method used, it corresponds to the width in the main scanning direction of the substrate FS, the width in the main scanning direction of the exposure area to be patterned on the substrate FS, or the position of the exposure area among a plurality of scanning units Un. By selecting one specific scanning unit and via a beam delivery unit that delivers the beam from the light source device 14', the intensity-modulated beam is generated based on the pattern data to be drawn by each of the specific scanning units. A pattern drawing method is provided which includes selectively sequentially supplying each of a specific scanning unit. Accordingly, in Modified Example 3, even if the width of the substrate FS is changed or the width or position of the exposure region W on the substrate FS is changed, the transport position of the substrate FS in the Y direction is appropriately adjusted. By setting, precise pattern drawing with high continuation accuracy is possible. In addition, at that time, the rotation speed and rotation angle phase are not synchronized between all the polygon mirrors PM of the plurality of scanning units, but only between the polygon mirrors PM of a specific scanning unit that contribute to pattern drawing, The rotation speed and rotation angle phase may be synchronized.

[Modified Example 4]

In addition, as another configuration of the drawing apparatus using nine scanning units (U1 to U9), it is not divided into odd-numbered and even-numbered groups, but simply divided into two groups in the order in which the scanning units (Un) are arranged. May be. That is, it is divided into a first scanning module by six scanning units (U1 to U6) and a second scanning module by three scanning units (U7 to U9), and for the first scanning module, the first light source device 14A The beam LBa from') may be supplied, and the beam LBb from the second light source device 14B' may be supplied to the second scanning module. In that case, if the scanning efficiency α/β of the polygon mirror PM is 1/4<(α/β)≦1/3, each of the six scanning units U1 to U6 in the first scanning module is: As in the previous fourth embodiment (Fig. 33), the spot light SP along each drawing line SL1 to SL6 is scanned by beam scanning across one reflection surface RP of the polygon mirror PM. do.

In contrast, each of the three scanning units U7 to U9 in the second scanning module can perform beam scanning for every reflective surface RP of the polygon mirror PM. Therefore, if each of the three scanning units U7 to U9 performs beam scanning for all reflective surfaces RP of the polygon mirror PM as it is, each drawing line by each of the six scanning units U1 to U6 The time interval ΔTc1 at which the scanning of the spot light SP in (SL1 to SL6) is repeated, and the spot light in each of the drawing lines SL7 to SL9 by each of the three scanning units U7 to U9 ( The time interval ΔTc2 at which the scanning of SP) is repeated becomes a relationship of ΔTc1 = 2ΔTc2, and the pattern drawn on the substrate FS by the drawing lines SL1 to SL6 and the substrate by the drawing lines SL7 to SL9 The pattern drawn on the (FS) becomes different, and good continuous exposure cannot be performed.

Accordingly, even in each of the three scanning units U7 to U9 capable of scanning beams for all reflective surfaces RP of the polygon mirror PM, beam scanning across one reflective surface RP of the polygon mirror PM is performed. Control to do. In this control, the origin signals SZ7 to SZ9 generated from each of the scanning units U7 to U9 are input to the circuit in Fig. 31 or the sub-origin generating circuit CAan in Fig. 38, and the sub-origin signals ZP7 to In response to generating ZP9) and its sub-origin signals ZP7 to ZP9, each of the corresponding selection optical elements AOM7 to AOM9 is sequentially turned on for a predetermined time Ton, and the drawing line SL7 Each of the serial data DL7 to DL9 for drawing corresponding to the pattern to be drawn in each of ~SL9) is sequentially transmitted to the driving circuit 206a of the electro-optical element 206 in the second light source device 14B'. It can be realized by doing.

[Modified Example 5]

44 shows the configuration of the driver circuit DRVn of the selection optical element AOMn according to the fifth modification. As described in each of the foregoing embodiments and modifications, when each of the plurality of scanning units Un performs beam scanning through every other than one reflection surface RP of the polygon mirror PM, the light source device 14' (14A') , 14B')) or the beams (LBs, LBp) emitted from the drawing optical elements (AOMa, AOMb) are a plurality of optional optics arranged along the optical path. It passes through the element AOMn. In Fig. 44, after the beam LB passes through the selection optical elements AOM1 and AOM2, the selection optical element AOM3 is switched to generate a beam LB3 directed to the scanning unit U3. . In general, the optical material in the optical element AOMn for selection has a relatively high transmittance for the beam LB (for example, a wavelength of 355 nm) in the ultraviolet wavelength band, but has an attenuation rate of about several percent.

When the transmittance of each optical element for selection (AOMn) is 95%, as shown in FIG. 44, when the optical element for selection (AOM3) is turned on, the beam LB incident on the optical element for selection (AOM3) The intensity of is attenuated by the two optical elements for selection (AOM1, AOM2), so about 90% (0.95 ² ) for the original beam intensity (100%) incident on the optical element for selection (AOM1) do. In addition, when six optional optical elements (AOM1 to AOM6) are lined up, the intensity of the beam LB incident on the last optical element for selection (AOM6) is applied to the five optional optical elements (AOM1 to AOM5). Because of the attenuation by the original beam intensity (100%), it is about 77% (0.95 ⁵ ).

From this, the intensity of the beam LB incident on each of the six selection optical elements AOM1 to AOM6 is, in order, 100%, 95%, 90%, 85%, 81%, and 77%. This means that the intensity of the beams LB1 to LB6 deflected and emitted from each of the optical elements AOM1 to AOM6 for selection is also changed at the ratio. Therefore, in this modification 5, in each driver circuit DRVn of the plurality of selection optical elements AOMn shown in FIG. 38, the driving conditions of the selection optical elements AOM1 to AOM6 are adjusted, Control to reduce fluctuations in the intensity of (LB1 to LB6).

In Fig. 44, the driver circuits DRV1 to DRV6 (DRV5 and DRV6 are not shown) are all the same configuration, and thus detailed description is made only for the driver circuit DRV1. As shown in Fig. 38 described above, in each of the driver circuits (DRV1 to DRV6), the respective ON states of the selection optical elements AOM1 to AOM6 (in Fig. 44, AOM5 and AOM6 are omitted) are turned on. Information for setting the time Ton and sub-origin signals ZP1 to ZP6 are input In the configuration of Fig. 44, a high-frequency source 400 for applying ultrasonic waves to each of the selection optical elements AOM1 to AOM6 is provided. The driver circuit DRV1 receives a high-frequency signal from the high-frequency source 400 and transmits it to an amplifier 402 that amplifies the high-voltage amplitude at a high speed. Optical for selection by adjusting the amplification factor (gain) of the switching element 401 and the logic circuit 403 that controls the opening and closing of the switching element 401 based on the information for setting the ON time Ton and the sub-origin signal (ZP1). A gain adjuster 404 for adjusting the amplitude of a high-pressure high-frequency signal applied to the element AOM1 is provided.

By changing the amplitude of the high-pressure high-frequency signal applied to the selection optical element (AOM1) within the allowable range, the diffraction efficiency of the selection optical element (AOM1) can be finely adjusted, and the deflected beam (LB1) (primary It is possible to change the intensity of diffracted light). Therefore, in this modification 5, from the driver circuit DRV1 of the selection optical element AOM1 on the side close to the light source device 14 ′, the selection optical element AOM6 on the side away from the light source device 14 ′. In the order of the driver circuit DRV6, the gain adjuster 404 is adjusted so that the amplitude of the high-voltage high-frequency signal applied to each selection optical element AOMn increases. For example, the amplitude of the high-pressure high-frequency signal applied to the optical element AOM6 for selection of the end of the optical path of the beam LB is set to a value Va6 having the highest diffraction efficiency, and the beam LB The amplitude of the high-pressure high-frequency signal applied to the first selection optical element AOM1 of the optical path is set to a value Va1 at which the diffraction efficiency is lowered within an allowable range. The amplitudes Va2 to Va5 of the high-pressure high-frequency signals applied to the selection optical elements AOM2 to AOM5 in the meantime are set so that Va1<Va2<Va3<Va4<Va5<Va6.

By the above setting, it is possible to alleviate or suppress the intensity imbalance of the beams LB1 to LB6 emitted from each of the six selection optical elements AOM1 to AOM6. Thereby, the unbalance in the exposure amount of the pattern drawn by each of each of the drawing lines SL1 to SL6 can be suppressed, and high-precision pattern drawing becomes possible. In addition, the amplitudes Va1 to Va6 of the high-pressure high-frequency signals set by the respective driver circuits (DRV1 to DRV6) do not need to be gradually increased in that order, for example, Va1 = Va2 <Va3 = Va4 < The relationship of Va5 = Va6 may be used. Further, for each scanning unit (U1 to U6), the method of adjusting the intensity of the drawing beams (LB1 to LB6) that becomes the spot light SP is the same method as in Modification Example 5. , A method of providing a photosensitive filter (ND filter) having a predetermined transmittance in the optical path in each of the scanning units U1 to U6 may be employed.

In addition, in the driver circuit DRVn in FIG. 44, it is assumed that whether or not the high-frequency signal from the high-frequency source 400 is transmitted to the amplifier 402 by the switching element 401 is switched. However, in order to increase the responsiveness (starting characteristic) at the time of switching on/off of the selection optical element (AOMn), the diffraction efficiency can be regarded as substantially zero, for example, the intensity of the first order diffracted light A low-level high-frequency signal that is less than 1/1000 of the intensity at ON is always applied to the selection optical element (AOMn), and an appropriate high-level high-frequency signal is applied to the selection optical element (AOMn) only when it is turned on. You can do it. Fig. 45 shows the configuration of such a driver circuit DRVn, and representatively here shows the configuration of the driver circuit DRV1, and the same reference numerals are assigned to the same members as in Fig. 44.

In the configuration of Fig. 45, two resistors RE1 and RE2 connected in series are added. The series circuit of the resistors RE1 and RE2 is inserted in parallel to the high-frequency source 400 in front of the switching element 401, and a high-frequency signal from the high-frequency source 400 divided by the resistance ratio RE2/(RE1+RE2), It is always applied to the amplifier 402. When the resistance RE2 is a variable resistor and the switching element 401 is in an off (non-conductive) state, the first-order diffracted light emitted from the selection optical element AOM1, that is, the intensity of the beam LB1 is sufficient. The level of the high-frequency signal applied to the selection optical element AOM1 is adjusted so as to be a small value (for example, 1/1000 or less of the original intensity). In this way, by applying the high-frequency signal bias (rising) to the selection optical element AOM1 by the resistors RE1 and RE2, responsiveness can be improved. Further, in this case, even while the switching element 401 is in the off (non-conductive) state, although the intensity is very weak, since the beam LB1 is incident on the corresponding scanning unit U1, due to some trouble, during the drawing operation When the conveyance speed of the substrate FS decreases or stops, the shutter provided at the exit of the light source device 14' (14A', 14B') is closed or a photosensitive filter is inserted.

[Modified Example 6]

In each of the above embodiments and modifications, the surface of the substrate FS curved in a cylindrical shape while the sheet-shaped substrate FS is in close contact with the outer circumferential surface of the rotating drum DR. Thus, pattern drawing was performed along the drawing line SLn by each of the plurality of scanning units Un. However, for example, as disclosed in the pamphlet of International Publication No. 2013/150677, the substrate FS may be supported in a planar shape while being fed in a long direction while performing exposure treatment. In this case, assuming that the surface of the substrate FS is set parallel to the XY plane, for example, the irradiation central axis Le1 of the odd-numbered scanning units U1, U3, U5 shown in Figs. 23 and 24 , Le3, Le5) and the irradiation central axes (Le2, Le4, Le6) of the even-numbered scanning units (U2, U4, U6) are parallel to the Z axis when viewed in a plane parallel to the XZ plane, and A plurality of scanning units U1 to U6 may be disposed so as to be positioned at regular intervals in the X direction.

Claims (10)

A pattern exposure apparatus for projecting an intensity modulated light beam on the substrate according to the drawing data of the pattern from each of a plurality of drawing units disposed along a second direction orthogonal to a first direction in which the pattern-exposed substrate moves,
In order to supply the light beam whose intensity is modulated according to the drawing data to each of the plurality of drawing units, an On state in which the intensity of the light beam is a first intensity based on the drawing data, and the second A light source device including a light modulator that switches to an off state with a second intensity lower than 1 intensity,
In order to sequentially supply the light beam from the light source device to any one of the plurality of drawing units in time division, it is provided corresponding to each of the plurality of drawing units, and the light beam from the light source device passes in series. A plurality of acoustooptic modulation elements disposed and generating an exit beam in which the light beam from the light source device is deflected at a predetermined diffraction angle in response to a driving signal;
A plurality of reflecting mirrors disposed along the traveling direction of the light beam from the light source device and reflecting the exit beams generated from each of the plurality of acousto-optic modulation elements, respectively, toward the corresponding drawing unit,
Each of the plurality of acousto-optic modulation elements is first, second, ... in the order in which the light beam from the light source device passes. The direction of deflection of the exit beam by the odd-numbered acousto-optic modulation element and the direction of deflection of the exit beam by the even-numbered acousto-optic modulation element are defined as the optical path of the light beam. The pattern exposure apparatus which made it in the reverse direction through The method according to claim 1,
Provided between the odd-numbered acoustooptic modulation elements and the even-numbered acoustooptic modulation elements, and focus the odd-numbered acoustooptic modulation elements and the even-numbered acoustooptic modulation elements together A pattern exposure apparatus comprising a condensing lens and a collimating lens arranged to be positioned. The method according to claim 2,
When the gravity direction is the Z direction and the plane orthogonal to the Z axis extending in the Z direction is the XY plane, the light beam from the light source device is in a state parallel to the XY plane and the plurality of acousto-optic modulations Is set to pass through each of the elements in series,
A direction of deflection of the exit beam by the odd-numbered acousto-optic modulation element and a direction of deflection of the exit beam by the even-numbered acousto-optic modulation element include the XY plane with the optical path interposed therebetween. A pattern exposure apparatus set so as to be opposite to each other in a parallel plane. The method of claim 3,
The light source device,
A laser that outputs a sharp pulse-shaped first heald generated in response to each clock pulse of frequency Fs, and a gentle pulse-shaped second heald generated in response to each of the clock pulses with the same energy as the first heald A light source unit,
An electro-optical element provided as the optical modulator and configured to input the first seed light and the second seed light together, to switch polarization states of the first seed light and the second seed light and output the same,
A polarization beam splitter that selectively outputs any one of the first seed light and the second seed light from the electro-optical element according to a polarization state,
A fiber amplifier in which the first or second seed rays from the polarization beam splitter are incident,
The first seed light amplified by the fiber amplifier is converted into a wavelength range of ultraviolet light, and the light beam is output as a pulsed light in an ON state having the first intensity, and the second seed light amplified by the fiber amplifier is converted into a wavelength of ultraviolet light. A pattern exposure apparatus comprising a wavelength conversion element that converts inversely and outputs the light beam as pulsed light in an off state that becomes the second intensity. The method of claim 4,
Each of the plurality of drawing units,
A rotating polygonal mirror for reflecting the exit beam deflected from the acousto-optic modulation element within a predetermined deflection angle range,
A projection optical system that enters the exit beam reflected from the rotating polygonal mirror and condenses it as a scanning spot light on the substrate;
A pattern exposure apparatus having an origin sensor that outputs a pulse-shaped origin signal indicating a scanning start timing of the scanning spot light to each reflective surface of the rotating polygonal mirror. The method of claim 5,
The drawing data is binary data representing an on state in which the scanning spot light is irradiated to a pixel corresponding to one dot of a pattern to be drawn, and an off state in which the scanning spot light is not irradiated with respect to the pixel. Is bitmap data,
The electro-optical element of the light source device switches the polarization directions of the first seed light and the second seed light according to a value of binary data of the pixel of the bit map data. The method of claim 6,
When the dimension of the scanning spot light on the substrate is Ds, and the scanning speed of the scanning spot light on the substrate by the rotating polygonal mirror is Vs, the frequency Fs of the clock pulse is the relationship of Fs≥Vs/Ds The pattern exposure apparatus set to become. The method of claim 7,
The pattern exposure apparatus in which the frequency Fs is set to any one of 100 MHz, 200 MHz, 300 MHz, and 400 MHz. The method according to any one of claims 3 to 8,
With respect to the Z direction, a plate-shaped plate disposed above the plurality of drawing units and supporting each of the plurality of acoustooptic modulation elements, the plurality of reflection mirrors, the condensing lens and the collimating lens on the XY plane A pattern exposure apparatus including a support member. The method of claim 9,
The reflective mirror includes a first mirror that reflects the exit beam from the acousto-optic modulation element in the XY plane, and corresponds to the exit beam reflected by the first mirror through an opening formed in the support member. A pattern exposure apparatus comprising a second mirror that reflects toward the writing unit in the Z direction.

Images