CN109343214A - Pattern plotter device - Google Patents

Pattern plotter device Download PDF

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Publication number
CN109343214A
CN109343214A CN201811075026.7A CN201811075026A CN109343214A CN 109343214 A CN109343214 A CN 109343214A CN 201811075026 A CN201811075026 A CN 201811075026A CN 109343214 A CN109343214 A CN 109343214A
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CN
China
Prior art keywords
light
light beam
scanning
substrate
scanning element
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Granted
Application number
CN201811075026.7A
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Chinese (zh)
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CN109343214B (en
Inventor
加藤正纪
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Nikon Corp
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Nikon Corp
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Priority claimed from JP2014092862A external-priority patent/JP6349924B2/en
Priority claimed from JP2015083669A external-priority patent/JP6569281B2/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN109343214A publication Critical patent/CN109343214A/en
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Publication of CN109343214B publication Critical patent/CN109343214B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A kind of pattern plotter device is depicted defined pattern by the scanning element of laser on irradiated body, is had: light supply apparatus (14), projects above-mentioned laser；Multiple delineation units (U1~U6), it is used for incident above-mentioned laser to generate above-mentioned scanning element, comprising the optical scanning component being scanned with above-mentioned laser and optical lens system, and it is arranged to be scanned different zones of the above-mentioned scanning element on above-mentioned irradiated body；With multiple selections with optical element (50,58,66), whether it configures along the direction of travel of the above-mentioned laser from above-mentioned light supply apparatus in-linely in order to switching over the above-mentioned delineation unit incidence selected of the above-mentioned laser from above-mentioned light supply apparatus into above-mentioned multiple delineation units.

Description

Pattern plotter device
The present patent application be international filing date be on 04 27th, 2015, international application no PCT/JP2015/062692, National application number into National Phase in China is 201580034744.8, entitled " pattern plotter device, pattern plotter The division Shen of the patent application of method, device making method, laser light-source device, light-beam scanner and beam scanning method " Please.
Technical field
The present invention relates to the light-beam scanners and light beam that are scanned the point light for the light beam being radiated on irradiated body Scan method, the pattern plotter device for being scanned light and depicting predetermined pattern on irradiated body and pattern plotter side Swash used in method, the device making method for having used the pattern plotter method and pattern plotter device and light-beam scanner Radiant device.
Background technique
As disclosing Japanese Unexamined Patent Application 61-134724 bulletin and Japanese Unexamined Patent Publication 2001-133710 bulletin, it is known to Following laser irradiation device, laser description device: a laser oscillator (laser beam source) will be come from by half-reflecting mirror Laser beam is divided into two, and the laser beam for obtaining segmentation is respectively to two polygonal mirrors (polygon mirror) (polygonal rotating mirror) Incidence is scanned two beam laser beams on being depicted body.In addition, in Japanese Unexamined Patent Publication 2001-133710 bulletin Also disclose the two beam laser beams by obtaining the segmentation to two polygonal mirror incidences each by AOM (acoustooptic modulation element) And modulated, wherein AOM response describes the data and turns on/off (On/Off).
Summary of the invention
But in the light beam scanning carried out based on polygonal mirror, according to the light after the reflecting surface number of polygonal mirror, polygonal mirror The incident condition etc. of system (f θ lens etc.), and can not be by incident laser beam direction with existing in the rotation of polygonal mirror The case where being depicted during body effectively reflects.Therefore, even if being as in the past divided into laser beam by half-reflecting mirror Two and two polygonal mirrors are incident upon, there is also can not effectively be irradiated in laser beam during being depicted body, i.e. sometimes During non-description, so that the laser beam from light source can not be effectively utilized.
1st scheme of the invention is a kind of pattern plotter device, is depicted on irradiated body by the scanning element of laser Defined pattern, has: light supply apparatus, projects above-mentioned laser；Multiple delineation units are used for incident above-mentioned laser to generate Above-mentioned scanning element comprising the optical scanning component being scanned with above-mentioned laser and optical lens system, and is arranged to make above-mentioned sweep Different zones of the described point on above-mentioned irradiated body are scanned；With multiple selection optical elements, in order to whether make come It is cut from the above-mentioned delineation unit incidence selected of the above-mentioned laser of above-mentioned light supply apparatus into above-mentioned multiple delineation units It changes, and is configured in-linely along the direction of travel of the above-mentioned laser from above-mentioned light supply apparatus.
2nd scheme of the invention is a kind of pattern plotter device, is depicted on irradiated body by the scanning element of laser Defined pattern, has: light supply apparatus, projects above-mentioned laser；Multiple delineation units, in order to which incident above-mentioned laser generates Above-mentioned scanning element, and include the optical scanning component being scanned with above-mentioned laser and optical lens system, and be arranged to above-mentioned sweep Different zones of the described point on above-mentioned irradiated body are scanned；Multiple selection optical elements, in order to make from above-mentioned light The above-mentioned laser selective of source device it is incident to above-mentioned multiple delineation units, and swash along above-mentioned from above-mentioned light supply apparatus The direction of travel of light configures in-linely；With description optical modulator, based on to will be by above-mentioned scanning element in above-mentioned irradiated body Above-mentioned multiple delineation units are respective as defined in the pattern progress of upper description describes the data, and uses up to modulate to above-mentioned multiple selections Learn the intensity of the above-mentioned laser of element incidence.
3rd scheme of the invention has: light-pulse generator device, generates the light that can adjust the pulse type of cycle of oscillation Beam；1st delineation unit, using the light beam from above-mentioned light-pulse generator device as point light projection to irradiated body on, and with Make the light to above-mentioned irradiated body during projection and during non-projection by the defined period repeatedly in the way of make above-mentioned light beam Deflection is scanned above-mentioned light along the 1st description line on above-mentioned irradiated body；2nd describes Unit, it is and so that above-mentioned using the light beam from above-mentioned light-pulse generator device as in point light projection to above-mentioned irradiated body During projection and during above-mentioned non-projection by the defined period repeatedly in the way of deflect above-mentioned light beam, during above-mentioned projection It is scanned above-mentioned light along the 2nd description line on the above-mentioned irradiated body different from above-mentioned 1st description line；1st control System, above-mentioned 1st delineation unit of synchronously control and above-mentioned 2nd delineation unit, so that the above-mentioned projection of above-mentioned 1st delineation unit Period is corresponding with during the above-mentioned non-projection of above-mentioned 2nd delineation unit, during the above-mentioned projection of above-mentioned 2nd delineation unit with it is above-mentioned It is corresponding during the above-mentioned non-projection of 1st delineation unit；With the 2nd control system, above-mentioned light-pulse generator device is controlled, so that upper During stating the above-mentioned projection in the 1st delineation unit, the 1st delineation information based on the pattern to be drawn by above-mentioned 1st description line drawing The oscillation of above-mentioned light beam is controlled, the above-mentioned projection of above-mentioned 2nd delineation unit during, based on describing line by the above-mentioned 2nd 2nd delineation information of the pattern of description controls the oscillation of above-mentioned light beam.
4th scheme of the invention is a kind of pattern plotter device, on one side according to describing the data to being focused on irradiated body The point light of ultraviolet laser carry out intensity modulated, so that above-mentioned light and above-mentioned irradiated body is carried out relative scanning on one side, thus exist Depict pattern on above-mentioned irradiated body, have: laser light-source device, it includes the sources generated as above-mentioned ultraviolet laser The light source portion of kind of light, incident above-mentioned kind of light and the image intensifer amplified and from the above-mentioned purple of amplified above-mentioned kind of photogenerated The wavelength converting optical element of outer laser；With description modulating device, in order to carry out intensity modulated to above-mentioned light, and according to It is above-mentioned to describe the data to modulate the intensity of the above-mentioned kind of light generated from above-mentioned light source portion.
5th scheme of the invention is a kind of pattern plotter method, on one side according to describing the data to being focused on irradiated body The point light of ultraviolet laser carry out intensity modulated, so that above-mentioned light and above-mentioned irradiated body is carried out relative scanning on one side, thus exist Pattern is depicted on above-mentioned irradiated body, includes: converting process, it will be as the source of above-mentioned ultraviolet laser by image intensifer Kind light amplification, and amplified above-mentioned kind of light is converted by above-mentioned ultraviolet laser by wavelength converting optical element；With modulation work Sequence in order to carry out intensity modulated to above-mentioned light, and is modulated according to above-mentioned describe the data to incident upper of above-mentioned image intensifer State the intensity of kind of light.
6th scheme of the invention is a kind of device making method, includes: making to prepare as above-mentioned irradiated body on one side The substrate of photoinduction is moved along the 1st direction, on one side by the pattern plotter method of above-mentioned 5th scheme aforesaid substrate light sensation Answer description device pattern on layer；With the irradiation part according to above-mentioned light of above-mentioned photoinduction layer with non-irradiated part not Together, it is formed selectively defined pattern material.
7th scheme of the invention is a kind of laser light-source device, is described with by the point light being focused on irradiated body The device connection of pattern out, and the light beam for becoming above-mentioned light is projected, have: the 1st semiconductor light source, in response to specified period Clock pulses, generate fluorescent lifetime is short relative to above-mentioned specified period and peak strength is high steep 1st pulsed light； 2nd semiconductor light source, in response to above-mentioned clock pulses, generation fluorescent lifetime is shorter than above-mentioned specified period and than above-mentioned 1st arteries and veins Wide 2nd pulsed light that the fluorescent lifetime washed off is long, peak strength is low；Optical amplifier fiber, incident above-mentioned 1st pulsed light Or above-mentioned 2nd pulsed light；And switching part carries out optics switching, above-mentioned based on the input of the pattern-information to be described Point light keeps above-mentioned 1st pulsed light incident to above-mentioned optical amplifier fiber when projecting on above-mentioned irradiated body, above-mentioned light not When projecting on above-mentioned irradiated body, keep above-mentioned 2nd pulsed light incident to above-mentioned optical amplifier fiber.
8th scheme of the invention is a kind of light-beam scanner, is configured with multiple scanning elements with defined positional relationship, The scanning element has the polygonal rotating mirror for deflecting the light beam from light supply apparatus repeatedly and the incident above-mentioned light beam deflected And it is made to be converged to the projection optics system for carrying out the point light of one-dimensional scanning on irradiated body, the light-beam scanner tool It is standby: light beam switching part, so that the above-mentioned light beam from above-mentioned light supply apparatus is carried out into multiple above-mentioned scanning elements The mode for stating an above-mentioned scanning element incidence of the one-dimensional scanning of light, switches the optical path of above-mentioned light beam；Switch with light beam and controls Portion processed controls above-mentioned light beam switching part, so that the above-mentioned light that the above-mentioned polygonal rotating mirror based on above-mentioned scanning element is realized The deflection of beam is repeated by the reflecting surface every at least one of above-mentioned polygonal rotating mirror, makes multiple above-mentioned scanning elements respectively The one-dimensional scanning of above-mentioned light is carried out in order.
9th scheme of the invention is a kind of light-beam scanner, have it is multiple with defined positional relationship configured with multiple The scan module of scanning element, the scanning element have in order to deflect the light beam from light supply apparatus repeatedly and with certain rotation The polygonal rotating mirror of rotary speed rotation and the incident above-mentioned light beam deflected and being converged to carries out one-dimensional on irradiated body The projection optics system of the point light of scanning, the light-beam scanner have: light beam switching part, so as to come from above-mentioned light source The above-mentioned scanning element of the one-dimensional scanning of progress above-mentioned light of the above-mentioned light beam of device into multiple above-mentioned scanning elements is incident Mode, switch the optical path of above-mentioned light beam；With light beam switch control portion, above-mentioned light beam switching part is controlled, so that based on each The deflection for the above-mentioned light beam that the above-mentioned polygonal rotating mirror of above-mentioned scanning element is realized is switched to by the continuous of above-mentioned polygonal rotating mirror The 1st state that is repeated of each reflecting surface and be repeated by the reflecting surface every at least one of above-mentioned polygonal rotating mirror The 2nd state in one party, so that multiple above-mentioned scanning elements is respectively carried out the one-dimensional scanning of above-mentioned light in order.
10th scheme of the invention is a kind of beam scanning method, single configured with multiple scannings with defined positional relationship Member carries out light beam scanning to irradiated body, which has the light beam incidence for being deflected repeatedly by polygonal rotating mirror and will It is converged to the projection optics system that the point light of one-dimensional scanning is carried out on irradiated body, and the beam scanning method includes: with The rotary angle position of the respective above-mentioned polygonal rotating mirror of above-mentioned multiple scanning elements is set to be each defined phase relation Mode makes multiple above-mentioned polygonal rotating mirror synchronous rotaries；With in order to make the above-mentioned point respectively carried out based on multiple above-mentioned scanning elements The one-dimensional scanning of light carries out in order, and so that above-mentioned rotation is pressed in the deflection of the above-mentioned light beam based on the realization of above-mentioned polygonal rotating mirror The mode of polygonal mirror being repeated every the reflecting surface of at least one switches the above-mentioned scanning element of above-mentioned light beam incidence.
11st scheme of the invention is a kind of beam scanning method, by being configured with multiple scannings with defined positional relationship The light-beam scanner of unit carries out light beam scanning to irradiated body, and multiple scanning element has for use by with certain rotation The polygonal rotating mirror of speed rotation and the light beam that deflects repeatedly is incident and be converged to it on irradiated body to carry out one-dimensional scanning Point light projection optics system, the beam scanning method includes: so that the respective above-mentioned rotation of above-mentioned multiple scanning elements The mode that the rotary angle position of polygonal mirror is each defined phase relation makes multiple above-mentioned polygonal rotating mirror synchronous rotaries； 1st scanning process, so as to press the continuous of above-mentioned polygonal rotating mirror based on the deflecting for above-mentioned light beam that above-mentioned polygonal rotating mirror is realized The mode that is repeated of each reflecting surface, switch the above-mentioned scanning element of above-mentioned light beam incidence, thus multiple above-mentioned scanning lists First one-dimensional scanning for respectively carrying out above-mentioned light in order；2nd scanning process, so as to be realized based on above-mentioned polygonal rotating mirror upper The deflection of light beam is stated in such a way that the reflecting surface every at least one of above-mentioned polygonal rotating mirror is repeated, switches above-mentioned light beam Incident above-mentioned scanning element, thus multiple above-mentioned scanning elements respectively carry out the one-dimensional scanning of above-mentioned light in order；Switching Process switches above-mentioned 1st scanning process and above-mentioned 2nd scanning process.
12nd scheme of the invention is a kind of pattern plotter method, has used drawing apparatus, which will make to come from The point light of the light beam of light supply apparatus is configured to be drawn according to each description line drawing along the multiple scanning elements for describing line progress main scanning Pattern on substrate along above-mentioned description line main scanning direction engage, make above-mentioned multiple scanning elements and aforesaid substrate with it is upper It states and is relatively moved on the sub-scanning direction of main scanning direction intersection, the pattern plotter method includes: is single in above-mentioned multiple scannings In member, the exposure of wanting depicting pattern of the selected and aforesaid substrate on the width or aforesaid substrate on above-mentioned main scanning direction The corresponding specific scanning element of width or position on above-mentioned main scanning direction in region；With based on will be by above-mentioned specific After the pattern data that scanning element is respectively described carries out intensity modulated to above-mentioned light beam, via transmission from above-mentioned light supply apparatus The light beam of above-mentioned light beam dispenses unit, alternatively respectively successively supplies to above-mentioned specific scanning element.
Detailed description of the invention
Fig. 1 is the device inspection apparatus for indicating the exposure device comprising implementing exposure-processed to substrate of the 1st embodiment Outline structure figure.
Fig. 2 is the figure for indicating to support the bearing support of description head and rotating cylinder shown in FIG. 1.
Fig. 3 is the figure for indicating the structure of description head of Fig. 1.
Fig. 4 is the detailed structure view of smooth import optical system shown in Fig. 3.
Fig. 5 is the figure for indicating the description line obtained by each scanning element scanning element light shown in Fig. 3.
Fig. 6 is the figure for indicating the relationship between the polygonal mirror of each scanning element shown in Fig. 3 and the scanning direction of description line.
Fig. 7 is for illustrating that the reflecting surface of polygonal mirror shown in Fig. 3 can make laser deflection (reflection) to be incident upon The figure of the rotation angle of the polygonal mirror of f- θ lens.
Fig. 8 is the figure for obtaining the optical path signalization between smooth import optical system shown in Fig. 3 and multiple scanning elements.
Fig. 9 is the figure of the structure of the description head in the variation for indicate the first embodiment described above.
Figure 10 is the detailed structure view of smooth import optical system shown in Fig. 9.
Figure 11 is the figure for indicating the structure of description head of the 2nd embodiment.
Figure 12 is the figure for indicating light import optical system shown in Figure 11.
Figure 13 is to obtain the optical path signalization between light import optical system and multiple scanning elements shown in Figure 12 Figure.
Figure 14 is the control circuit example for indicating the rotation driving of each polygonal mirror of multiple scanning elements shown in Figure 13 Block diagram.
Figure 15 is the timing diagram for indicating the action example of control circuit shown in Figure 14.
Figure 16 is to indicate to generate description position (bit) string data to description optics component feeding shown in Figure 11~Figure 13 Circuit example block diagram.
Figure 17 is the figure of the structure of the light supply apparatus in the variation for indicate the 2nd embodiment.
Figure 18 is the block diagram for indicating the structure of the control unit of description control of the 3rd embodiment.
Figure 19 is the signal condition for indicating each section of the control unit of Figure 18 in depicting pattern and the oscillation of laser The time diagram of state.
Figure 20 be indicate by the light supply apparatus of Figure 17 control circuit generate pulse light generation clock signal when Between scheme.
Figure 21 is the time diagram for illustrating the situation being modified to correct description multiplying power to the clock signal of Figure 20.
Figure 22 is the figure for the revised law for illustrating that is described the description multiplying power in line (scan line).
Figure 23 is the device inspection apparatus for indicating the exposure device comprising implementing exposure-processed to substrate of the 4th embodiment Outline structure figure.
Figure 24 is the detailed figure for being wound with the rotating cylinder of Figure 23 of substrate.
Figure 25 is the figure for indicating the description line and the alignment mark being formed on substrate of light.
Figure 26 is the structure chart of light beam switching part.
Figure 27 A is the figure that the optical path of the light beam carried out based on selection with optical element from +Z direction side is switched, Figure 27 B It is the figure that the optical path of the light beam carried out based on selection with optical element from -Y direction side is switched.
Figure 28 is the figure for indicating the optical texture of scanning element.
Figure 29 is the figure for indicating to be located at the structure of the origin sensor on polygonal mirror periphery of Figure 28.
Figure 30 is the time diagram for indicating the relationship for generating timing and describing beginning timing of origin signal.
Figure 31 is will to remove between origin signal for generating and it is made to generate the secondary origin signal of fixed response time late stipulated time Secondary origin generative circuit structure chart.
Figure 32 is the time diagram for indicating the secondary origin signal generated by the secondary origin generative circuit of Figure 31.
Figure 33 is the block diagram for indicating the electrical structure of exposure device.
Figure 34 is the time diagram for indicating the timing of output origin signal, secondary origin signal and serial data.
Figure 35 is the figure for indicating to describe the data the structure of output control unit shown in Figure 33.
Figure 36 is the structure chart of the light beam switching part of the 5th embodiment.
Figure 37 is the figure for indicating the optical path when position of the configuration switching part of Figure 36 is 1 position.
Figure 38 is the figure for indicating the structure of the light beam switch control portion in the 5th embodiment.
Figure 39 is the figure for indicating the structure of logic circuit of Figure 38.
Figure 40 is the timing diagram of the movement of the logic circuit of explanatory diagram 39.
Figure 41 is the structure chart of the light beam switching part of the 6th embodiment.
Figure 42 is that the selection indicated make in the 6th embodiment is rotated by 90 ° with the configuration of optical element (acoustooptic modulation element) In the case where structure figure.
Figure 43 is the figure for indicating the conveying form of the substrate of variation 3 and describing the configuration relation of line.
Figure 44 is the structure for indicating the drive circuit of selection optical element (acoustooptic modulation element) of variation 5 Figure.
Figure 45 is the figure for indicating the variation of the drive circuit in Figure 44.
Specific embodiment
Hereinafter, for the pattern plotter device of mode of the present invention, pattern plotter method, light-beam scanner, light beam scanning Method, device making method and laser light-source device, enumerate preferred embodiment, are described in detail referring to attached drawing.In addition, Mode of the invention is not limited to these embodiments, the embodiment also obtained comprising applying various changes and modifications.Also It is to say, in the structural element of following record, the element that can be readily contemplated by one that comprising those skilled in the art and substantially identical Element, the structural element recorded below can be appropriately combined.In addition, being able to carry out without departing from the scope of the gist of the present invention Various omissions, displacement or the change of structural element.
[the 1st embodiment]
Fig. 1 is the exposure device EX comprising implementing exposure-processed to substrate (irradiated body) FS for indicating the 1st embodiment Device inspection apparatus 10 outline structure figure.In addition, in the following description, as long as no being particularly limited to, setting is with weight Power direction is the XYZ orthogonal coordinate system of Z-direction, and illustrates X-direction, Y-direction and Z-direction in accordance with arrow shown in figure.
Device inspection apparatus 10 is the flexible display, flexible wired, flexible for for example constructing manufacture as electronic device The manufacture system of the production line of sensor etc..Hereinafter, being illustrated premised on flexible display as electronic device.As Flexible display has such as organic el display, liquid crystal display.Device inspection apparatus 10 has so-called roll-to-roll The construction of (Roll ToRoll) mode, i.e., from the (not shown) of substrate (plate shape substrates) FS for being wound with flexible laminar in web-like Supply roller is sent out substrate FS and is rolled up after continuously implementing various processing to the substrate FS of submitting by recycling roll (not shown) Receive various treated substrate FS.Moving direction of the substrate FS with substrate FS is longitudinal direction (long side), width direction is short The belt like shape of edge direction (short side).The substrate FS sent out from above-mentioned supply roller passes sequentially through processing unit PR1, exposure device After (pattern plotter device, light-beam scanner) EX and processing unit PR2 carries out various processing, furled by above-mentioned recycling roll.
In addition, X-direction is in the horizontal plane from processing unit PR1 via exposure device EX and towards processing unit PR2 Direction (conveyance direction).Y-direction is direction orthogonal with X-direction in the horizontal plane, is width direction (the short side side of substrate FS To).Z-direction is the direction orthogonal with X-direction and Y-direction (upper direction), parallel with the direction of gravity.
Substrate FS uses the foil (foil) etc. constituted such as resin film or the metal or alloy by stainless steel.As tree The material of adipose membrane can be used including, for example, polyvinyl resin, acrylic resin, polyester resin, ethylene vinyl alcohol copolymer tree Rouge, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin And material more than at least one of vinyl acetate resin.In addition, the thickness of substrate FS and rigidity (Young's modulus) as long as For by that will not be generated on substrate FS when the transport path of exposure device EX based on the caused folding line of bending or can not overfold Range as wrinkling.As the base material of substrate FS, with a thickness of PET (the poly terephthalic acid second two of 25 μm~200 μm degree Alcohol ester) and PEN (polyethylene naphthalate) etc. film be preferred plate shape substrates typical case.
Substrate FS have by processing unit PR1, exposure device EX and processing unit PR2 implement everywhere in reason in be heated Situation, it is therefore preferable that the substrate FS of the not significant big material of selected thermal expansion coefficient.For example, by the way that inorganic filler is mixed in Thermal expansion coefficient is able to suppress in resin film.Inorganic filler can be such as titanium oxide, zinc oxide, aluminium oxide or silica Deng.In addition, substrate FS can be the individual layers by manufactures such as float method with a thickness of 100 μm or so of very thin glass, it can also To be to be bonded laminate made of above-mentioned resin film, foil etc. on the very thin glass.
In addition, the flexibility (flexibility) of substrate FS will not referring to the power for applying self weight degree even if to substrate FS The property cut or be broken and substrate FS is enable to bend.In addition, the curved property of power for passing through self weight degree also includes In flexibility.In addition, according to the material of substrate FS, size, thickness, film forming in environment such as layer construction, temperature, humidity on substrate FS Deng flexible degree can change.No matter which kind of situation, as long as substrate FS is correctly wound in this 1st embodiment Device inspection apparatus 10 in the conveyance direction conversion component such as various conveying rollers, the rotating cylinder being located in transport path when It will not buckle and generate folding line or swimmingly transport substrate FS with generating damaged (generating rupture, crackle), can be referred to as scratching Within the scope of property.
Processing of the processing unit PR1 to process before being carried out by the substrate FS of exposure device EX exposure-processed.Processing unit The substrate FS that PR1 will carry out the processing of preceding process is conveyed to exposure device EX.By the processing of the preceding process, to exposure device The substrate FS of EX conveying becomes substrate (the photosensitive base for being formed with photonasty functional layer (photoinduction layer, photosensitive layer) on the surface thereof Plate).
The photonasty functional layer is as solution coating on substrate FS and by drying as layer (film).Photonasty function Ergosphere is typically photoresist (liquid or dry film shape), but as the material for not needing development treatment, exists by ultraviolet light Photonasty silane coupling agent (SAM) that the close and distant fluidity of the part of irradiation is modified or on the part being irradiated with ultraviolet radiation Show the photonasty reducing agent etc. of plating also former base.In the feelings for using photonasty silane coupling agent as photonasty functional layer Under condition, lyophily is modified as from lyophobicity by the pattern part after ultraviolet exposure on substrate FS.Therefore, by becoming parent Selectively applying conductive ink (ink of the conductive nanometer particle containing silver, copper etc.) or contain half on the part of fluidity The liquid etc. of conductor material, and be capable of forming the electrode for constituting thin film transistor (TFT) (TFT) etc., semiconductor, insulation or become company The pattern layer of the wiring or electrode that connect.In the case where using photonasty reducing agent as photonasty functional layer, in substrate On shown plating also former base on the pattern part after ultraviolet exposure.Therefore, after exposure, by the way that substrate FS is soaked immediately Stain certain time into the plating solution containing palladium ion etc., and form (precipitation) pattern layer based on palladium.Such plating processing For addition (additive) technique, but in addition to this, premised on using as the etching process for subtracting (subtractive) technique In the case where, the base material PET or PEN to the exposure device EX substrate FS conveyed can also be made, and on the surface thereof by entire surface Or the selectively metallic diaphragm of AM aluminum metallization (Al) or copper (Cu) etc., and then lamination photoresist layer on it.
In this 1st embodiment, exposure device EX is exposure device, the i.e. institute without using the direct description mode of light shield The exposure device of raster scanning (raster scan) mode of meaning.Exposure device EX is to the substrate FS's supplied from processing unit PR1 Plane of illumination (photosurface) irradiates light figure corresponding with the predetermined pattern of the electronic device of display, circuit or wiring etc. Case.Although later will describe in detail in detail it is bright, exposure device EX on one side by substrate FS to +X direction (sub-scanning direction) transport, make on one side The point light SP of light beam (laser, irradiation light) LB of exposure is on substrate FS along defined scanning (on the plane of illumination of substrate FS) Direction (Y-direction) carries out one-dimensional scanning, while modulating (On/Off) at high speed according to pattern data (describing the data, delineation information) The intensity of point light SP.As a result, on the surface (photosurface) as plane of illumination of substrate FS describe expose out with electronic device, The corresponding light pattern of predetermined pattern of circuit or wiring etc..That is, being swept by the subscan of substrate FS and the master of point light SP It retouches, invocation point light SP is made relatively to carry out two-dimensional scanning on the plane of illumination of substrate FS, exposed out to describe on substrate FS Predetermined pattern.In addition, substrate FS is along conveyance direction (+X direction) due to being transported, so being exposed out by exposure device EX The exposure area W of pattern is equipped with multiple (referring to Fig. 5) along the longitudinal direction of substrate FS at intervals.Due in the exposure Electronic device is formed in the W of light region, so exposure area W is also electronic device forming region.In addition, electronic device be pass through by Multiple pattern layers (forming figuratum layer) are overlapped and constitute, thus can also be exposed by exposure device EX it is right with each layer out The pattern answered.
Processing unit PR2 carries out the processing (example of subsequent handling to the substrate FS for having carried out exposure-processed by exposure device EX Such as plating processing or development/etching process).By the processing of the subsequent handling, the pattern of device is formed on substrate FS Layer.
As described above, multiple pattern layers are overlapped and are constituted by then passing through by electronic device, so manufacturing via device System 10 at least respectively handles and generates a pattern layer.Therefore, in order to generate electronic device, it is necessary to make as shown in Figure 1 It manages and is at least carried out twice everywhere in device inspection apparatus 10.For this purpose, passing through the recycling roll that will be wound with substrate FS as supply roller And other device inspection apparatus 10 are installed to, it being capable of lamination pattern layer.Electronics device is formed and such movement is repeated Part.Therefore, treated, and substrate FS becomes multiple electronic devices (exposure area W) at intervals along the length of substrate FS The connected state of edge direction.That is, substrate FS is that substrate is used in processing to more than one piece simultaneously.
The recycling roll for having recycled the morphogenetic substrate FS of shape being connected with electronic device also may be mounted at (not shown) cut It cuts on device.The cutter device of recycling roll is installed by each electronic device (electronic device forming region W) to treated base Plate FS is split (cutting), thus becomes multiple electronic devices.About the size of substrate FS, for example, width direction (at For the direction of short side) size be 10cm~2m degree, the size of length direction (direction as long side) is 10m or more.This Outside, the size of substrate FS is not limited to above-mentioned size.
Next, exposure device EX is described in detail.Exposure device EX is accommodated in temperature adjustment chamber ECV.Temperature adjustment chamber ECV By the way that inside is remained predetermined temperature, and inhibit the change in shape caused by the substrate FS that inside is transported is because of temperature.Temperature adjustment On the setting face E that chamber ECV configured via Anti-vibration unit SU1, SU2 being passively or actively in production plant.Anti-vibration unit SU1, SU2 reduce the vibration from setting face E.Setting face E can be ground of factory itself, be also possible to form water Plane and the face in setting table (pedestal: pedestal) on the ground is set.Exposure device EX have substrate transport mechanism 12, Light supply apparatus (light-pulse generator device, laser light-source device) 14 describes head 16 and control device 18.
Substrate transport mechanism 12 transports the substrate moved from processing unit PR1 in exposure device EX with fixing speed Then FS is sent out with fixing speed to processing unit PR2.Through the substrate transport mechanism 12, it is specified that in exposure device EX The transport path of the substrate FS of conveying.Substrate transport mechanism 12 from the upstream side (-X direction side) of the conveyance direction of substrate FS successively With marginal position controller EPC, driven roller R1, tension adjustment roller RT1, rotating cylinder (cylinder roller) DR, tension adjustment roller RT2, driven roller R2 and driven roller R3.
Marginal position controller EPC adjusts width direction (Y-direction, substrate FS from the processing unit PR1 substrate FS transported Short side direction) on position.That is, marginal position controller EPC in the state of being applied with regulation tension so as to remove Position at the end (edge) of the width direction of the substrate FS sent converges on ± more than ten μm~tens μm relative to target position Mode in the range (permissible range) of degree, is moved in the width direction substrate FS, in the width direction to adjust substrate FS Position.Marginal position controller EPC has the roller of substrate FS lodge and the end (edge) of the width direction to substrate FS The edge sensor (not shown) (end test section) that is detected of position, the detection letter detected based on edge sensor Number, move the above-mentioned roller of marginal position controller EPC along Y-direction, the position in width direction to adjust substrate FS.Driving Roller R1 rotates while keeping from the front and back sides of the marginal position controller EPC substrate FS transported, and substrate FS direction is revolved Rotating cylinder DR conveying.In addition, marginal position controller EPC can also be so as to be wound in the longitudinal direction phase of the substrate FS of rotating cylinder DR Central axis (rotary shaft) AXo for rotating cylinder DR orthogonal always mode, the position in the width direction of appropriate adjustment substrate FS It sets, also, in such a way that the heeling error on the direction of travel to substrate FS is modified, appropriate adjustment marginal position controller The rotary shaft of the above-mentioned roller of EPC and the depth of parallelism of Y-axis.
Rotating cylinder DR have along Y-direction extend and along and gravity action direction intersects direction extension central axis AXo, With the cylindric outer peripheral surface away from central axis AXo certain radius, rotating cylinder DR copies outer peripheral surface (periphery) to prop up along the long side direction A part of substrate FS is held, while being rotated centered on central axis AXo and transporting substrate FS to +X direction.Rotating cylinder DR is with its circle All surface bearings supply the exposure area (part) on the substrate FS of light beam LB (point light SP) projection for describing head 16.In rotating cylinder The two sides of the Y-direction of DR, equipped with by make rotating cylinder DR around central axis AXo rotation in a manner of the axis Sft that is supported by cricoid bearing. Axis Sft is by being endowed the rotary driving source (not shown) come the control of free control device 18 (for example, by motor and speed reducer Structure etc. constitute) torque and around central axis AXo rotate.In addition, for ease of description, will comprising central axis AXo and with YZ plane Parallel plane is known as median plane Poc.
Driven roller R2, R3 configures at intervals along the conveyance direction (+X direction) of substrate FS, after exposure Substrate FS relaxes (clearance) as defined in assigning.Driven roller R2, R3 keep the table back two of substrate FS in the same manner as driven roller R1 on one side Face rotates on one side, transports substrate FS towards processing unit PR2.Driven roller R2, R3 is located at conveying side relative to rotating cylinder DR To downstream side (+X direction side), driven roller R2 is located at the upstream side (-X direction of conveyance direction relative to driven roller R3 Side).Tension adjustment roller RT1, RT2 is exerted a force to -Z direction, to winding and be supported on the substrate FS of rotating cylinder DR along the long side direction Assign regulation tension.Thereby, it is possible to make the tension to the substrate FS hung on rotating cylinder DR the longitudinal direction assigned in regulation model Enclose interior stabilisation.In addition, control device 18 is by controlling rotary driving source (not shown) (for example, by structures such as motor and speed reducers At) come make driven roller R1~R3 rotate.
Light supply apparatus 14 has light source (light-pulse generator), projects light beam (pulsed light, laser) LB of pulse type.Light beam LB It is the ultraviolet in 370nm wave band below with peak wavelength, making the frequency of oscillation (luminous frequency) of light beam LB is Fs. The light beam LB that light supply apparatus 14 projects is incident to head 16 is described.Light supply apparatus 14 in accordance with control device 18 control, with shine frequency Rate Fs issues light beam LB and projects.The structure of the light supply apparatus 14 will be in rear detailed description, but by the pulse of generation infrared band The semiconductor Laser device of light, fiber amplifier, the pulse that the pulsed light of amplified infrared band is converted into ultraviolet band Wavelength changing element (higher hamonic wave generating element) of light etc. is constituted, and also can be used to obtain frequency of oscillation Fs to be hundreds of MHz, one The fluorescent lifetime of a pulsed light is the fiber amplifier laser light source of the pulsed light of the high brightness ultraviolet light of picosecond degree.
Describe head 16 and has the multiple scanning element Uns (U1~U6) incident for light beam LB difference.Description head 16 passes through multiple Scanning element (delineation unit) U1~U6 carrys out the substrate FS in the circumference surface bearing of the rotating cylinder DR by substrate transport mechanism 12 Describe predetermined pattern in a part.Describing head 16 is the so-called multiple beam for being arranged with the identical multiple scanning element U1~U6 of structure The description head 16 of type.Describe 16 couples of substrate FS of head and the pattern exposure of electronic device is repeated, therefore is exposed the exposure of pattern Light region (electronic device forming region) W is equipped with multiple (referring to Fig. 5) along the longitudinal direction of substrate FS at intervals. Control device 18 controls each section of exposure device EX, and each section is made to execute processing.The control device 18 includes computer and deposits The storage medium of program is contained, which is stored in the program of storage medium by executing, and as this 1st embodiment Control device 18 functions.
Fig. 2 is to indicate that the bearing support (dress of multiple scanning elements (delineation unit) Un and rotating cylinder DR of head 16 are described in bearing Set column) 30 figure.Bearing support 30 has main frame 32, three-point support portion 34 and describes head supporting part 36.Bearing support 30 is accommodated in In temperature adjustment chamber ECV.Main frame 32 supports rotating cylinder DR, tension adjustment roller RT1 via annular bearings in a manner of it can rotate (not shown), RT2.Three-point support portion 34 is located at the upper end of main frame 32, is set to the description above rotating cylinder DR with three-point support Head supporting part 36.
Describe head supporting part 36 to be used to support the scanning element Un (U1~U6) for describing head 16.It is opposite to describe head supporting part 36 In rotating cylinder DR central axis AXo and the downstream side of conveyance direction (+X direction side) and along the width direction of substrate FS arrange Column ground bearing scanning element U1, U3, U5 (referring to Fig.1).It is being transported in addition, describing head supporting part 36 relative to central axis AXo The upstream side (-X direction side) in direction and supported in a row along the width direction of substrate FS (Y-direction) scanning element U2, U4, U6 (referring to Fig.1).In addition, here, if the sweep length in the Y-direction realized based on a scanning element Un (puts sweeping for light SP Retouch range, describe line SLn) as an example for 20~50mm degree, then by by three scanning elements U1, U3, U5 of odd number This total six scanning element Un is configured along Y-direction with three scanning elements U2, U4, U6 of even number, and can be described Y-direction width expansion be 120~300mm degree.
Fig. 3 is the figure for indicating to describe the structure of head 16.In this 1st embodiment, exposure device EX has two light sources Device 14 (14a, 14b).Describe head 16 there are multiple scanning element U1~U6, by the light beam LB from light supply apparatus 14a to more Light import optical system (light beam switching part) 40a of a scanning element U1, U3, U5 guidance and will be from light supply apparatus 14b's Light import optical system (light beam switching part) 40b that light beam LB is guided to multiple scanning element U2, U4, U6.
Firstly, using Mingguang City's import optical system for Fig. 4 (light beam switching part) 40a.In addition, light import optical system There is identical structure to be therefore illustrated at this to light import optical system 40a and omit light import optical system by 40a, 40b The explanation of 40b.
Light import optical system 40a has collector lens 42, collimation lens 44, reflection from the side light supply apparatus 14 (14a) Mirror 46, collector lens 48, selection optical element 50, reflecting mirror 52, collimation lens 54, collector lens 56, selection optics member Part 58, reflecting mirror 60, collimation lens 62, collector lens 64, selection optical element 66, reflecting mirror 68 and absorber 70.
Collector lens 42 and collimation lens 44 are used to amplify the light beam LB projected from light supply apparatus 14a.In detail, first First, light beam LB is converged on the focal position of the rear side of collector lens 42 by collector lens 42, and collimation lens 44 makes by collector lens The light beam LB dissipated after 42 convergences becomes the directional light of regulation beam diameter (for example, number mm).
Reflecting mirror 46 makes to become the light beam LB reflection of directional light by collimation lens 44 and to selection optical element 50 Irradiation.Collector lens 48 makes to the incident light beam LB of selection optical element 50 to become light beam in selection optical element 50 The mode of waist assembles (convergence).Selection has transmittance relative to light beam LB with optical element 50, for example, using acousto-optic modulation Element (AOM:Acousto-Optic Modulator).If AOM is applied ultrasonic signal (high-frequency signal), generation make into The light beam LB (zero degree light) penetrated is with a diffraction light of angle of diffraction diffraction corresponding with higher frequency as outgoing beam (light beam LBn).In addition, in this 1st embodiment, it will be from multiple selection optical elements 50,58,66 respectively as a diffraction light It projects and is indicated to the light beam LBn of corresponding scanning element U1, U3, U5 incidence with LB1, LB3, LB5, by each selection optics member Part 50,58,66 is handled as the element for playing the function of optical path-deflecting of making the light beam LB from light supply apparatus 14 (14a). Structure, function, the effect etc. of each selection optical element 50,58,66 can be mutually the same.Selection optical element 50,58,66 In accordance with the On/Off for the driving signal (high-frequency signal) for carrying out self-control device 18, and the diffraction light that incident light beam LB diffraction will be made Generation On/Off.
Be described in detail, select with optical element 50 the driving signal (high-frequency signal) for carrying out self-control device 18 for In the case where Off, incident light beam LB is irradiated to the selection optical element 58 of next stage.On the other hand, from control In the case that the driving signal (high-frequency signal) of device 18 is On, selection optical element 50 makes incident light beam LB diffraction, will Light beam LB1 as its diffraction light is irradiated to reflecting mirror 52.Reflecting mirror 52 makes incident light beam LB1 reflection, and to scanning The collimation lens 100 of unit U1 irradiates.That is, by the way that selection optical element 50 is switched (driving) into On/ by control device 18 Off, whether selection is with optical element 50 to switching over light beam LB1 to scanning element U1 incidence.
Between selection optical element 50 and selection optical element 58, being equipped in the following order will be to selection optics The light beam LB that element 58 irradiates reverts to the collimation lens 54 of directional light and makes the light for becoming directional light by collimation lens 54 Beam LB in a manner of becoming beam waist in optical element 58 again to assemble the collector lens 56 of (convergence) in selection.
Selection in the same manner as selection optical element 50, has transmittance, example relative to light beam LB with optical element 58 Such as, using acoustooptic modulation element (AOM).Selection optical element 58 is in the driving signal (high frequency sent from control device 18 Signal) be Off in the case where, so that incident light beam LB is directly transmitted and is irradiated to selection optical element 66, filled from control In the case where the driving signal (high-frequency signal) that 18 send is set as On, make incident light beam LB diffraction, and will be primary as it The light beam LB3 of diffraction light is irradiated to reflecting mirror 60.Reflecting mirror 60 makes incident light beam LB3 reflection, and to the standard of scanning element U3 Straight lens 100 irradiate.That is, by the way that selection optical element 58 is switched to On/Off, selection optics member by control device 18 Whether part 58 is to switching over light beam LB3 to scanning element U3 incidence.
Between selection optical element 58 and selection optical element 66, being equipped in the following order will be to selection optics The light beam LB that element 66 irradiates reverts to the collimation lens 62 of directional light and makes the light for becoming directional light by collimation lens 62 Beam LB in a manner of becoming beam waist in optical element 66 again to assemble the collector lens 64 of (convergence) in selection.
Selection in the same manner as selection optical element 50, has transmittance, example relative to light beam LB with optical element 66 Such as, using acoustooptic modulation element (AOM).Selection is with optical element 66 in the driving signal (high-frequency signal) for carrying out self-control device 18 In the case where for Off state, incident light beam LB is irradiated towards absorber 70, in the driving signal for carrying out self-control device 18 In the case that (high-frequency signal) is On state, make incident light beam LB diffraction, and by the light beam LB5 court as its diffraction light It is irradiated to reflecting mirror 68.Reflecting mirror 68 makes incident light beam LB5 reflection, and irradiates to the collimation lens of scanning element U5 100. That is, by the way that selection optical element 66 is switched to On/Off by control device 18, whether selection optical element 66 is to making light Beam LB5 is switched over to scanning element U5 incidence.Absorber 70 is for inhibiting light beam LB to leak into external absorption light beam LB Absorber of light (lighttrap).
It is simply illustrated for light import optical system 40b, the selection optical element of light import optical system 40b 50, switch over light beam LB to scanning element U2, U4, U6 incidence for 58,66 pairs.In this case, light import optical system The reflecting mirror 52,60,68 of 40b by light beam LB2, LB4, LB6 for being projected from selection optical element 50,58,66 reflect and to sweeping The collimation lens 100 for retouching unit U2, U4, U6 irradiates.
In addition, the generation efficiency of a diffraction light of acoustooptic modulation element (AOM) in practice is 80% left side of zero degree light The right side, therefore, light beam LB1 (LB2), LB3 (LB4), LB5 (LB6) and the original that selection optical element 50,58,66 is respectively deflected The intensity of the light beam LB come is compared to reduction.In addition, when selecting with some in optical element 50,58,66 as On state, no Diffraction and straight zero degree light residual 20% or so, but it is eventually absorbed the absorption of body 70.
Next, being illustrated for multiple scanning element Un (U1~U6) shown in Fig. 3.Scanning element Un will come from light The light beam LBn of source device 14 (14a, 14b) is projected in a manner of converging a light SP on the plane of illumination in substrate FS, together When by the polygonal mirror PM of rotation sweep this light SP (on the plane of illumination of substrate FS along defined linear description line Retouch line) SLn progress one-dimensional scanning.In addition, the description line SLn of scanning element U1 is indicated with SL1, similarly, by scanning element The description line SLn of U2~U6 is indicated with SL2~SL6.
Fig. 5 is to indicate to make a description line SLn (SL1~SL6) for light SP scanning by each scanning element Un (U1~U6) Figure.As shown in figure 5, to cover the entire of exposure area W by whole scanning elements of multiple scanning element Un (U1~U6) The mode of width direction shares scanning area by each scanning element Un (U1~U6).Each scanning element Un (U1~U6) energy as a result, Each region description pattern of enough multiple regions being split to form by the width direction along substrate FS.It is each describe line SLn (SL1~ SL6 length) is identical in principle.That is, putting sweeping for light SP along the light beam LBn for describing each self-scanning of line SL1~SL6 It retouches identical on distance principle.In addition, in the case where wanting to increase the width of exposure area W line SLn can be described by increasing The length of itself increases the quantity for the scanning element Un being arranged in the Y direction to be coped with.
In addition, actual each description line SLn (SL1~SL6) is configured to and point light SP can be real on plane of illumination The maximum length of border scanning is compared to slightly shorter.For example, if assuming, in the description multiplying power of main scanning direction (Y-direction) be initial value (nothing Multiplying power amendment) in the case where can depicting pattern description line SLn maximum length be 30mm, then make describe line SLn opened in scanning Initial point side and end of scan point side are respectively provided with the ampleness of 0.5mm or so and make maximum scan of the invocation point light SP on plane of illumination Length is set to 31mm or so.It, can be in the range of the maximum scan length 31mm of light SP by being set like this It is interior, the position of the description line SLn of 30mm is finely adjusted on main scanning direction, or is finely adjusted to multiplying power is described.Point light SP Maximum scan length be not limited to 31mm, mainly according in scanning element Un be located at polygonal mirror (polygonal rotating mirror) PM it The aperture of f θ lens FT (referring to Fig. 3) afterwards determines, or 31mm or more.
A plurality of description line (scan line) SL1~SL6 is configured to two column across median plane Poc in the circumferential direction of rotating cylinder DR. Describe line SL1, SL3, SL5 to be located on the substrate FS in downstream side (+X direction side) of conveyance direction relative to median plane Poc.Describe Line SL2, SL4, SL6 are located on the substrate FS of upstream side (-X direction side) of conveyance direction relative to median plane Poc.It is each to describe line SLn (SL1~SL6) along the width direction of substrate FS, i.e. the central axis AXo of rotating cylinder DR and it is substantially parallel, than substrate FS's The length of width direction is short.
Describe line SL1, SL3, SL5 to match at intervals along the width direction (scanning direction, Y-direction) of substrate FS It sets, describes line SL2, SL4, SL6 similarly, separate specified interval along the width direction (scanning direction, Y-direction) of substrate FS Ground configuration.Describe line SL1 at this point, describing line SL2 and being configured in the width direction of substrate FS and describe between line SL3.Equally Ground describes line SL3 and is configured at description line SL2 in the width direction of substrate FS and describes between line SL4.Describe line SL4 in base It is configured in the width direction of plate FS and describes line SL3 and describe between line SL5.Describe line SL5 in the width direction of substrate FS It is configured at and describes line SL4 and describe between line SL6.It is configured to describe on substrate FS that is, describing line SL1~SL6 The entire width direction of exposure area W covers.
Along the point of description line SL1, SL3, SL5 of odd number light beam LBn (LB1, LB3, LB5) being respectively scanned The scanning direction of light SP is one-dimensional square, and is the same direction.It is respectively carried out along description line SL2, SL4, SL6 of even number The scanning direction of the point light SP of the light beam LBn (LB2, LB4, LB6) of scanning is one-dimensional square, and is the same direction.It should be along retouching The scanning direction for the light beam LBn (point light SP) that line drawing SL1, SL3, SL5 are scanned is carried out with along description line SL2, SL4, SL6 The scanning direction of the light beam LBn (point light SP) of scanning opposite direction each other.It in detail, should be along description line SL2, SL4, SL6 The scanning direction for the light beam LBn (point light SP) being scanned is +Y direction, the light being scanned along description line SL1, SL3, SL5 The scanning direction of beam LBn (point light SP) is -Y direction.It is because using the polygonal mirror PM rotated in the same direction single as scanning Caused by the polygonal mirror PM of first U1~U6.(describing starting point, (scanning is opened for the description starting position of description line SL1, SL3, SL5 as a result, Initial point) position) it is adjacent in the Y direction (or a part repeats) with the description starting position of describing line SL2, SL4, SL6.Separately Outside, describe the description end position (position for describing end point (end of scan point)) and description line SL2, SL4 of line SL3, SL5 It is adjacent in the Y direction (or a part repeats) to describe end position.So that along Y-direction it is adjacent description line SLn end that In the case that this part of duplicate mode configures each description line SLn, as long as example, relative to it is each describe line SLn length, It is repeated in the Y direction with several % range below inside comprising describing starting position or describing end position.
In addition, the width for describing the sub-scanning direction of line SLn is and a size of light SP (diameter)Corresponding size.Example Such as, in a size of light SPIn the case where 3 μm, the width for describing the sub-scanning direction of line SLn is also 3 μm.Point light SP It can be with overlapping (overlap) specific length (for example, the size of point light SPHalf) mode, along describe line SLn throw It penetrates.In addition, making the situation adjacent to each other along the adjacent description line SLn of Y-direction (for example, describe line SL1 and describe line SL2) Under (the case where connecting), as long as being also overlapped specific length (for example, the size of point light SPHalf).
In the case where this 1 embodiment, since the light beam LB from light supply apparatus 14 is pulsed light, so being swept in master It is correspondingly in discrete that the frequency of oscillation Fs for putting light SP and light beam LB described on line SLn is projeced into during retouching.Therefore, it is necessary to make by The point of a pulse light projection of light beam LB and is overlapped light SP on main scanning direction by the point light SP of next pulse light projection. Its lap is according to a size of light SPIt puts the scan velocity V s of light SP, the frequency of oscillation Fs of light beam LB and sets, but In the case where the intensity distribution approximate Gaussian distribution of light SP, as long as relative to by a 1/e for the peak strength of light SP2(or 1/2) diameter dimension of the actual effect determinedAnd it is overlappedLeft and right.Therefore, (orthogonal with line SLn is described in sub-scanning direction Direction) on, it is also desirable to be set to along describe line SLn point light SP single pass and next time scanning between, substrate The size of the actual effect of FS transfer point light SPSubstantially 1/2 distance below.In addition, about to the photosensitive sexual function on substrate FS The setting of the light exposure of layer is not improving light beam although can be realized with the adjustment of the peak value to light beam LB (pulsed light) When wanting to increase light exposure under the situation of the intensity of LB, as long as the drop of the scan velocity V s on the main scanning direction for passing through point light SP It is a certain in reduction of conveying speed in the increase of low, light beam LB frequency of oscillation Fs and the sub-scanning direction of substrate FS etc. Side, makes a lap of the light SP on main scanning direction or sub-scanning direction increase to the size of actual effect1/2 or more.
Next, the structure for scanning element Un shown in Fig. 3 is illustrated.In addition, each scanning element U1~U6 tool There is identical structure, therefore, only scanning element U1 is illustrated herein.Scanning element U1 have reflecting mirror 52 shown in Fig. 4 it Collimation lens 100, reflecting mirror 102, collector lens 104, description optical element 106, collimation lens 108, reflecting mirror afterwards 110, cylindrical lens CYa, reflecting mirror 114, polygonal mirror (optical scanning component, deflection component) PM, f θ lens FT, cylindrical lens CYb And reflecting mirror 122.Collimation lens 100,108, reflecting mirror 102,110,114,122, collector lens 104, cylindrical lens CYa, CYb And f θ lens FT constitutes optical lens system.
Reflecting mirror 102 will be reflected from the incident light beam LB1 of collimation lens 100 to -Z direction in Fig. 3, and to as description It is incident with optical element 106 with the description of optical modulator.Collector lens 104 makes the light beam incident to description optical element 106 LB1 (collimated light beam) is to assemble (convergence) in a manner of becoming beam waist in optical element 106 in description.Optical element is used in description 106 have transmittance relative to light beam LB1, for example, using acoustooptic modulation element (AOM).Description is being come with optical element 106 When the driving signal (high-frequency signal) of self-control device 18 is Off state, by incident light beam LB1 to barricade (not shown) or Absorber irradiation makes incident light beam LB1 spread out when the driving signal (high-frequency signal) for carrying out self-control device 18 is On state It penetrates, and by its diffraction light (describing light beam, that is, the light beam LB1 after carrying out intensity modulated according to pattern data) to reflecting mirror 110 irradiations.Above-mentioned barricade and above-mentioned absorber are for inhibiting light beam LB1 to leak to the outside.
In reflecting mirror 110 and description between optical element 106, equipped with making to become to the incident light beam LB1 of reflecting mirror 110 The collimation lens 108 of directional light.Reflecting mirror 110 reflects incident light beam LB1 towards reflecting mirror 114 along -X direction, reflecting mirror 114 reflect incident light beam LB1 towards polygonal mirror PM.Polygonal mirror (polygonal rotating mirror) PM has incident light beam LB1 direction There is the f θ lens FT of the optical axis parallel with X-axis along -X direction lateral reflection.Polygonal mirror PM is in order to make the point light SP of light beam LB1 in substrate It is scanned on the plane of illumination of FS, and makes incident light beam LB1 in the face intrinsic deflection (reflection) parallel with X/Y plane.Specifically It says, polygonal mirror PM is with the rotary shaft AXp extended along Z-direction and the multiple reflecting surface RP formed around rotary shaft AXp (the originally the 1st It is eight reflecting surface RP in embodiment).By revolving polygonal mirror PM to defined direction of rotation centered on rotary shaft AXp Turn, and the angle of reflection of the light beam LB1 for the pulse type being irradiated on reflecting surface RP can be made continuously to change.Pass through one as a result, Reflecting surface RP deflects the reflection direction of light beam LB1, can make the point light for the light beam LB1 being radiated on the plane of illumination of substrate FS SP is scanned in scanning direction (width direction of substrate FS, Y-direction).That is, polygonal mirror PM makes incident light beam LB1 deflection, is scanned a light SP along description line (scan line) SL1 shown in fig. 5.In addition, polygonal mirror PM is not by scheming The rotary driving source (for example, being made of motor and deceleration mechanism etc.) that shows and rotated with certain speed.The rotary driving source is by controlling Device 18 processed controls.
Since the point light SP of light beam LB1 can be made to carry out along line SL1 is described by a reflecting surface RP of polygonal mirror PM Scanning, so in the case where one the week of polygonal mirror PM rotates, the description line SL1 that is scanned on the plane of illumination of substrate FS by light SP Quantity be up to quantity identical with reflecting surface RP i.e. eight.As described above, describe line SL1 actual effect length (for example, 30mm) it is configured to the maximum scan length (for example, 31mm) that a light SP can be made to be scanned by polygonal mirror PM below Length, initially setting (in design) in, the center of maximum scan length be set with describe line SL1 central point.
In addition, as an example, the actual effect length for describing line SL1 is being set as 30mm, and make the size of actual effect on one sideIt is 3 μm point light SP every time 1.5 μm of overlappings, so that a light SP is irradiated in feelings on the plane of illumination of substrate FS along line SL1 is described on one side Under condition, the quantity (umber of pulse of the light beam LB from light supply apparatus 14) of the point light SP irradiated in single pass is 20000 (30mm/1.5μm).In addition, if the sweep time of the point light SP along description line SL1 is set as 200 μ sec, it must be in the phase Between irradiate 20000 times pulse type point light SP, therefore the luminous frequency Fs of light supply apparatus 14 become Fs >=20000 time/200 μ Sec=100MHz.
Back to the explanation of the structure of scanning element U1, the cylindrical lens being located between reflecting mirror 110 and reflecting mirror 114 CYa assembles light beam LB1 on the reflecting surface RP of polygonal mirror PM in the Z-direction (non-scan direction) orthogonal with scanning direction (convergence) is at the long ellipticity (slit-shaped) extended along the direction parallel with the face XY.By cylindrical lens CYa, even if reflecting Under the case where face RP is tilted relative to Z-direction (Z axis) (the case where toppling over error there are face), it is also able to suppress its influence, is inhibited The irradiation position of point light based on the light beam LB1 being irradiated on substrate FS is staggered in the conveyance direction (X-direction) of substrate FS.
From the light beam LB1 that polygonal mirror PM reflects to the f θ lens FT irradiation comprising collector lens.With extending along the x axis The f θ lens FT of optical axis be to make the light beam LB1 reflected by polygonal mirror PM in the plane parallel with X/Y plane with parallel with X-axis The scanning lens of telecentricity class that is projected to reflecting mirror 122 of mode.The incidence angle θ to f θ lens FT of light beam LB1 is according to multi-panel The rotation angle (θ/2) of mirror PM and change.F θ lens FT projects light beam LB1 with the directly proportional substrate FS's of the incidence angle θ Image height position on plane of illumination.If focal length is set as fo, image height position is set as y, then f θ lens FT has y=fo The relationship of θ.Therefore, light beam LB1 (point light SP) can be made to be swept to accurate and constant speed in the Y direction by f θ lens FT It retouches.When being 0 degree to the incidence angle of f θ lens FT, the light beam LB1 of f θ lens FT is incident on along the optical axis uplink of f θ lens FT Into.
The light beam LB1 irradiated from f θ lens FT is with becoming point light SP via reflecting mirror 122 and on substrate FS illuminated.If Cylindrical lens CYb between f θ lens FT and reflecting mirror 122 makes the point light SP for the light beam LB1 being focused on substrate FS become straight Diameter is the small circle of several μm of degree (for example, 3 μm), and bus is parallel with Y-direction.It defines and is based on substrate FS as a result, The description line SL1 of point light (scanning element) SP extended along Y-direction (referring to Fig. 5).In the case where no cylindrical lens CYb, lead to The effect for crossing the cylindrical lens CYa nearby of polygonal mirror PM, the point light SP being focused on substrate FS can become edge and scanning direction The oblong that (Y-direction) orthogonal direction (X-direction) extends.
Like this, in the state that substrate FS is transported in X direction, make light beam LB's by each scanning element U1~U6 Point light SP is scanned in scanning direction (Y-direction), and defined pattern is thus depicted on substrate FS.Each scanning element U1~U6 is configured in such a way that the different zones on substrate FS are scanned describes head supporting part 36.In addition, by substrate The size length of line (describe) of the scanning direction of point light SP on FS is set as Ds, by a scanning speed of the light SP on substrate FS When (speed of relative scanning) is set as Vs, the frequency of oscillation Fs of light beam LB needs to meet the relationship of Fs >=Vs/Ds.This is because Light beam LB is pulsed light, so the point light SP of light beam LB can separate rule if frequency of oscillation Fs is unsatisfactory for the relationship of Fs >=Vs/Ds It is irradiated on substrate FS to fixed interval (gap).If frequency of oscillation Fs meets the relationship of Fs >=Vs/Ds, put light SP can with Overlapped mode is irradiated on substrate FS on scanning direction, therefore even if being the light beam LB of impulse hunting, also can be in base It is depicted well on plate FS along the substantially continuous straight-line pattern in scanning direction.In addition, the rotation speed of polygonal mirror PM becomes to get over Scan velocity V s that is fast then putting light SP becomes faster.
Fig. 6 is the polygonal mirror PM for indicating each scanning element U1~U6 and a plurality of scanning side for describing line SLn (SL1~SL6) The figure of relationship between.Multiple scanning element U1, U3, U5 and the reflecting mirror 114 in multiple scanning element U2, U4, U6, multi-panel Mirror PM and f θ lens FT are about median plane Poc symmetrical structure.Therefore, by making the polygonal mirror PM of each scanning element U1~U6 It is rotated to the same direction (to the left), each scanning element U1, U3, U5 make the point light SP of light beam LB from starting position is described towards description End position is scanned along -Y direction, and each scanning element U2, U4, U6 make the point light SP of light beam LB from description starting position direction Describe end position to be scanned along +Y direction.In addition it is also possible to polygonal mirror PM by making each scanning element U2, U4, U6 The direction of rotation of the polygonal mirror PM of direction of rotation and each scanning element U1, U3, U5 are opposite direction, and make each scanning element U1~ The scanning direction blending of the point light SP of the light beam LB of U6 is the same direction (+Y direction or -Y direction).
Here, since polygonal mirror PM rotates, so the angle of reflecting surface RP is passed through also with the time and changed.Therefore, energy The rotation angle [alpha] for enough making the light beam LB for the specific reflection face RP for being incident on polygonal mirror PM be incident on the polygonal mirror PM of f θ lens FT is deposited It is limiting.
Fig. 7 be reflecting surface RP for illustrating the polygonal mirror PM of scanning element Un can make light beam LBn deflection (reflection) with It is incident upon the figure of the rotation angle [alpha] of the polygonal mirror PM of f θ lens FT.The rotation angle [alpha] is the polygonal mirror PM of scanning element Un The maximum scan of the reflecting surface RP polygonal mirror PM for being scanned a light SP on the plane of illumination of substrate FS can be passed through Rotation angle range.Hereinafter, rotation angle [alpha] is known as maximum scan rotation angle range.Polygonal mirror PM is rotated with maximum scan For during the effective scanning of point light SP (maximum scan time) during angular extensions alpha rotation.The maximum scan rotates angle model It is corresponding with the above-mentioned description maximum scan length of line SLn to enclose α, maximum scan rotation angle range α becomes more big, and maximum is swept Retouching length becomes longer.Rotate polygonal mirror PM of the angle beta expression since light beam LB is to specific one reflecting surface RP when incidence Angle to the incidence to above-mentioned specific reflecting surface RP at the end of polygonal mirror PM angle until rotation angle.Namely It says, rotation angle beta is the angle that polygonal mirror PM is rotated with the amount in a face of reflecting surface RP.Angle beta is rotated by polygonal mirror PM's The quantity Np of reflecting surface RP is provided, can be indicated with β ≈ 360/Np.Therefore, the polygonal mirror PM's of scanning element Un is above-mentioned specific Reflecting surface RP can not make that a light SP is scanned on the plane of illumination of substrate FS, i.e. by the above-mentioned specific of polygonal mirror PM Reflecting surface RP reflection reflected light can not be incident on f θ lens FT, polygonal mirror PM Non-scanning mode rotation angle range γ with γ= The relational expression of β-α indicates.Polygonal mirror PM becomes sweeping in vain for point light SP during rotating with Non-scanning mode rotation angle range γ During retouching.In Non-scanning mode rotation angle range γ, light beam LBn can not be irradiated on substrate FS by scanning element Un.The rotation Gyration α and Non-scanning mode rotation angle range γ has the relationship of formula (1).
γ=(360 degree/Np)-α ... (1)
(wherein, the quantity that N is reflecting surface RP possessed by polygonal mirror PM)
In this 1st embodiment, since polygonal mirror PM has eight reflecting surface RP, so N=8.Therefore, formula (1) It can be indicated with formula (2).
γ=45 degree-α ... (2)
Maximum scan rotation angle range α changes according to the conditions such as at a distance from polygonal mirror PM and f θ lens FT.For example, if Maximum scan rotation angle range α is set as 15 degree, then Non-scanning mode rotation angle range γ is 30 degree, and the scanning of polygonal mirror PM is imitated Rate is α/β=1/3 in Fig. 7.That is, scanning element Un polygonal mirror PM with Non-scanning mode rotation angle range γ (30 Degree) amount rotation during, the light beam LBn for being incident on polygonal mirror PM is useless.
Therefore, in this 1st embodiment, scanning element of the switching for the light beam LB incidence from a light supply apparatus 14 Un, and light beam LB is periodically allocated to three scanning element Un, thus seek the raising of scan efficiency.That is, logical It mutually staggers, and makes from light source (during the scanning for being scanned a light SP) during crossing the description for making three scanning element Un The light beam LB of device 14 will not become useless, to seek the raising of scan efficiency.
In addition, although maximum scan rotation angle range α is can to make light (during effectively describing) i.e. during effective scanning Beam LBn is to the range that f θ lens FT is incident and is scanned a light SP effectively on describing line SLn, but maximum scan rotation angle Degree range α also changes according to focal length of front side of f θ lens FT etc..In the polygonal mirror PM of octahedral same as described above It is that Non-scanning mode rotates angle model according to formula (2), during non-description in the case that maximum scan rotation angle range α is 10 degree γ is enclosed as 35 degree, and the scan efficiency of description at this time is about 1/4 (10/45).On the contrary, rotating angle model in maximum scan It encloses in the case that α is 20 degree, is Non-scanning mode rotation angle range γ as 25 degree according to formula (2), during non-description, at this time The scan efficiency of description is about 1/2 (20/45).In addition, in the case where scan efficiency is 1/2 or more, distribution light beam LB's The quantity of scanning element Un is also possible to two.I.e. it is capable to which the quantity for distributing the scanning element Un of light beam LB is scanned Efficiency is limited.
Fig. 8 is that the optical path signalization imported light between optical system 40a and multiple scanning element U1, U3, U5 obtains Figure.From control device 18 to select with optical element (AOM) 50 apply driving signal (high-frequency signal) be On, to selection use In the case that the driving signal that optical element 58,66 applies is Off, selection optical element 50 makes incident light beam LB diffraction. As a result, from selecting a diffraction light i.e. light beam LB1 with 50 diffraction of optical element to enter via reflecting mirror 52 to scanning element U1 It penetrates, light beam LB will not be incident on scanning element U3, U5.Similarly, from control device 18 to selection with optical element (AOM) 58 The driving signal of application be On, to select with optical element 50,66 apply driving signal for Off in the case where, from Off state Selection with optical element 50 transmitted through light beam LB it is incident to selection optical element 58, selection optical element 58 makes incidence Light beam LB diffraction.As a result, from a diffraction light, that is, light beam LB3 of selection 58 diffraction of optical element via reflecting mirror 60 and to Scanning element U3 is incident, and light beam LB will not be incident on scanning element U1, U5.In addition, from control device 18 to selection optics The driving signal that element (AOM) 66 applies is On, to selecting the case where driving signal applied with optical element 50,58 is Off Under, from the selection of Off state with optical element 50,58 transmitted through light beam LB it is incident to selection optical element 66, selection is used Optical element 66 makes incident light beam LB diffraction.As a result, by a diffraction light, that is, light beam LB5 of selection 66 diffraction of optical element Incident to scanning element U5 by reflecting mirror 68, light beam LB will not be incident on scanning element U1, U3.
Like this, by importing light into multiple selection optical elements 50,58,66 of optical system 40a along from light The direction of travel of the light beam LB of source device 14a configures in-linely, and multiple selection optical elements 50,58,66 allow hand over ground Some scanning element Un for choosing whether to make light beam LBn (LB1, LB3, LB5) into multiple scanning element U1, U3, U5 is incident. Control device 18 is with the scanning element Un of light beam LB incidence according to such as scanning element U1 → scanning element U3 → scanning element U5 The mode that the such sequence of → scanning element U1 is periodically switched controls multiple selection optical elements 50,58,66.That is, with Light beam LBn (LB1, LB3, LB5) is in order respectively to the mode of sweep time as defined in multiple scanning element U1, U3, U5 incidences It switches over.
For the polygonal mirror PM of scanning element U1 during light beam LB1 is incident to scanning element U1, rotation is controlled dress 18 controls are set, make it possible to reflect incident light beam LB1 towards f θ lens FT.That is, light beam LB1 is to scanning element U1 incident (maximum scan in Fig. 7 rotates angle model during the scanning of period and the point light SP based on the scanning element U1 light beam LB1 realized Enclose α) it is synchronous.In other words, synchronously make light beam LB1 inclined during the polygonal mirror PM of scanning element U1 and light beam LB1 is incident Turn, so that the point light SP for being incident on the light beam LB1 of scanning element U1 is scanned along line SL1 is described.Scanning element U3, U5 Polygonal mirror PM is also that similarly, in light beam LB3, LB5 to during the incidence of scanning element U3, U5, rotation is controlled device 18 controls make it possible to reflect incident light beam LB3, LB5 to f θ lens FT.That is, light beam LB3, LB5 to scanning element U3, During U5 is incident be synchronous during the scanning for putting light SP of light beam LB3, LB5 for being realized based on scanning element U3, U5.It changes Yan Zhi synchronously deflects light beam LB3, LB5 during the polygonal mirror PM and light beam LB3, LB5 of scanning element U3, U5 are incident, with It is scanned the point light SP for the light beam LB for being incident on scanning element U3, U5 along line SL3, SL5 is described.
Like this, certain into three scanning elements U1, U3, U5 of light beam LB timesharing from light supply apparatus 14a ground One scanning element Un supply, therefore, the respective polygonal mirror PM of scanning element U1, U3, U5 is by control rotation driving, so that multi-panel The rotation speed of mirror PM is consistent and its rotary angle position keeps certain angle poor (keeping phase difference).Tool about its control Body example will be described later.
In addition, control device 18 is based on pattern data (describing the data), to control retouching to each scanning element U1, U3, U5 The On/Off of the driving signal (high-frequency signal) supplied with optical element 106 is drawn, the pattern data is to by from each scanning element The pattern that the point light SP of light beam LB1, LB3, LB5 of U1, U3, U5 irradiation describe on substrate FS is provided.Each scanning as a result, The description optical element 106 of unit U1, U3, U5 can based on the driving signal of the On/Off, make incident light beam LB1, LB3, LB5 diffraction carry out the intensity of modulation point light SP.It is a point (pixel) for example by depicting pattern about the pattern data 3 × 3 μm are set as, is " 1 " in the case where making driving signal On (description) by each point, makes driving signal Off (non-description) In the case where generated for 2 Value Datas of " 0 " as bitmap (bit map) data, and temporarily stored by each scanning element Un In memory (RAM).
Be further described by each scanning element Un setting pattern data, pattern data (describing the data) be with It is line direction, along the conveyance direction of substrate FS along the direction of a scanning direction of light SP (main scanning direction, Y-direction) The direction of (sub-scanning direction, X-direction) is for column direction by data (the hereinafter referred to as pixel number of multiple pixels of two-dimensional decomposition According to) bitmap data that is constituted.The pixel data is 1 data of " 0 " or " 1 ".The pixel data of " 0 " is indicated to substrate FS The intensity of the point light SP of irradiation is low-level (lowlevel), and the pixel data of " 1 " indicates the point light SP irradiated on substrate FS Intensity be high-level (high level).The pixel data of the amount of one column of pattern data and the description line SLn of one amount (SL1~SL6) is corresponding, describes line SLn (SL1~SL6) along one and is projeced into the intensity of the point light SP of substrate FS according to one The pixel data of the amount of column and modulated.The pixel data of one amount arranged is known as serial data (serial data) (to describe Information) DLn.That is, pattern data is serial data DLn bitmap data made of column direction arrangement.In the presence of will scan The serial data DLn of the pattern data of unit U1 is indicated with DL1, similarly, by the string of the pattern data of scanning element U2~U6 The case where row data DLn is indicated with DL2~DL6.
Pattern data (the serial number being made of " 0 ", " 1 " of scanning element Un of the control device 18 based on light beam LBn incidence According to DLn), to the driving signal of the description input of optical element (AOM) 106 On/Off of the scanning element Un of light beam LBn incidence. Description optical element 106 makes incident light beam LBn diffraction if the driving signal for being entered On and irradiates to reflecting mirror 110, Incident light beam LBn is irradiated to above-mentioned barricade (not shown) or above-mentioned absorber if the driving signal for being entered Off.Its As a result it is, it, will if describing the driving signal with input On in optical element 106 about the scanning element Un of light beam LBn incidence The point light SP of light beam LBn is irradiated on substrate FS (intensity of point light SP is got higher), if description inputs Off in optical element 106 Driving signal, then the point illumination of light beam LBn is not mapped on substrate FS to (intensity of point light SP becomes 0).Therefore, light beam LBn Incident scanning element Un can depict the pattern based on pattern data along line SLn is described on substrate FS.
For example, control device 18 is in the case where light beam LB3 is incident to scanning element U3, the pattern based on scanning element U3 The description of scanning element U3 optical element 106 is switched (driving) into On/Off by data.Scanning element U3 being capable of edge as a result, Describe line SL3 the pattern based on pattern data is depicted on substrate FS.Like this, each scanning element U1, U3, U5 being capable of edges Description line SL1, SL3, SL5 carry out the intensity of modulation point light (scanning element) SP, and depict on substrate FS based on pattern data Pattern.
Although in addition, illustrate the movement of light import optical system 40a and multiple scanning element U1, U3, U5 using Fig. 8, It but is also same for light import optical system 40b and multiple scanning element U2, U4, U6.It is simply illustrated, control dress 18 are set with the scanning element Un of the even number of the light beam LBn incidence from light supply apparatus 14b according to such as scanning element U2 → sweep The mode for retouching the such sequence switching of unit U4 → scanning element U6 → scanning element U2 controls multiple selections and uses optical element 50,58,66.That is, so that light beam LB is in order respectively to the side of sweep time as defined in multiple scanning element U2, U4, U6 incidences Formula switches over.The polygonal mirror PM of each scanning element U2, U4, U6 are incident with light beam LBn under the control based on control device 18 During synchronously deflect light beam LBn so that the point light SP of incident light beam LBn is carried out along line SL2, SL4, SL6 is described Scanning.In addition, control device 18 can be retouched on substrate FS with each scanning element U2, U4, U6 along line SL2, SL4, SL6 is described Draw the mode of the pattern based on pattern data, based on light beam LBn (LB2, LB4, LB6) incidence scanning element Un (U2, U4, U6) pattern data (by " 0 ", " 1 " constitute serial data DLn (DL2, DL4, DL6)) come control scanning element Un (U2, U4, U6) description optical element (AOM) 106.
As described above, in the first embodiment described above, due to along the light beam LB's from light supply apparatus 14a (14b) Direction of travel is in-linely configured with multiple selection optical elements 50,58,66, so can pass through multiple selection optics member Part 50,58,66 is by light beam LBn timesharing selectively in multiple scanning element U1, U3, U5 (scanning element U2, U4, U6) Some scanning element Un is incident, light beam LB will not be made to become useless, it is possible to realize the raisings of the utilization efficiency of light beam LB.
In addition, make the respective polygonal mirror PM of multiple (being herein three) scanning element Un rotation speed and rotatable phase that This is synchronized, also, with by multiple selections with optical element 50,58,66 by light beam LBn to during each scanning element Un incidence Synchronously, polygonal mirror PM deflects light beam LBn in a manner of being scanned a light SP on substrate FS, therefore, will not make light Beam LB becomes useless, and it is possible to realize the raisings of scan efficiency.
In addition, selection is with optical element (AOM) as long as 50,58,66 are only being based on the respective polygonal mirror PM of scanning element Un It is On state during the single pass of the point light SP of realization.For example, if the reflecting surface number of polygonal mirror PM is set as Np, it will be more The rotation speed Vp of face mirror PM is set as (rpm) system, then corresponding with the rotation angle beta of amount of one side of reflecting surface RP of polygonal mirror PM Time Tss become Tss=60/ (NpVp) (second).For example, the case where reflecting surface number Np is 8, rotation speed Vp is 30,000 Under, polygonal mirror PM's once rotates to be 2 milliseconds, and time Tss is 0.25 millisecond.Being converted into frequency is then 4kHz, this expression If with the acousto-optic modulation for modulating the light beam LB of ultraviolet region wavelength at high speed with tens MHz degree in response to pattern data Element (describing optical element 106) is compared, then can be the acoustooptic modulation element of rather low response frequency.Therefore, it selects The diffraction light deflected relative to incident light beam LB (zero degree light) is able to use with optical element (AOM) 50,58,66 i.e. The big selection optical element of the angle of diffraction of LBn (LB1~LB6).It therefore, will be relative to from selection optical element 50,58,66 Linearly transmitted through light beam LB travelling route and the light beam LBn (LB1~LB6) that has deflected guide to scanning element Un it is anti- The configuration for penetrating mirror 52,60,68 (referring to Fig. 3, Fig. 4) becomes easy.
[variation of the first embodiment described above]
The first embodiment described above can deform as described below.In the first embodiment described above, light beam LB is distributed to Three scanning element Un, but in this variation, the light beam LB from a light supply apparatus 14 is distributed into five scanning elements Un。
Fig. 9 is the figure of the structure of the description head 16 in the variation for indicate the first embodiment described above.In this variation, Light supply apparatus 14 is one, and describing the tool of head 16, there are five scanning element Un (U1~U5).In addition, to the first embodiment described above Identical structure marks identical appended drawing reference or illustration omitted, only illustrates different piece.In addition, Fig. 3 is omitted in Fig. 9 Shown in cylindrical lens CYb diagram.
In this variation, replace light import optical system 40a, 40b and use light import optical system (light beam switching part Part) 130.As shown in Figure 10, light import optical system 130 in addition to previous collector lens shown in Fig. 4 42, collimation lens 44, Reflecting mirror 46, collector lens 48, selection optical element 50, reflecting mirror 52, collimation lens 54, collector lens 56, selection are used up Learn element 58, reflecting mirror 60, collimation lens 62, collector lens 64, selection optical element 66, reflecting mirror 68 and absorber 70 with Outside, selection optical element 132, reflecting mirror 134, collimation lens 136, collector lens 138, selection optical element are also equipped with 140, reflecting mirror 142, collimation lens 144 and collector lens 146.
Selection optical element 132, collimation lens 136 and collector lens 138 are located at collector lens 56 and choosing in the order It selects between optical element 58.Therefore, in this variation, selection is believed with optical element 50 in the driving for carrying out self-control device 18 In the case that number (high-frequency signal) is Off, incident light beam LB directly transmit into backward selection optical element 132 and is irradiated, it is poly- Optical lens 56 makes to the incident light beam LB of selection optical element 132 to become beam waist in selection optical element 132 Mode is assembled.
Selection has transmittance relative to light beam LB with optical element 132, for example, using acoustooptic modulation element (AOM). It selects with optical element 132 in the case where the driving signal for carrying out self-control device 18 is Off, incident light beam LB is directly saturating Penetrate backward selection optical element 58 irradiation, when come self-control device 18 driving signal (high-frequency signal) be On when, will make into The a diffraction light i.e. light beam LB2 for the light beam LB diffraction penetrated is irradiated to reflecting mirror 134.Reflecting mirror 134 keeps incident light beam LB2 anti- It penetrates, and it is incident to the collimation lens of scanning element U2 100.That is, by the way that selection optical element 132 is switched by control device 18 At On/Off, and make selection with optical element 132 to whether switching over light beam LB2 to scanning element U2 incidence.Collimation is saturating Mirror 136 makes the light beam LB irradiated to selection optical element 58 become directional light, and collector lens 138 makes through collimation lens 136 And the light beam LB for becoming directional light is assembled in a manner of becoming beam waist in optical element 58 by selection.
Selection optical element 140, collimation lens 144 and collector lens 146 are located at collector lens 64 and choosing in the order It selects between optical element 66.Therefore, in this variation, selection is believed with optical element 58 in the driving for carrying out self-control device 18 Number incident light beam LB directly to be transmitted backward selection optical element 140 and is irradiated, collector lens 64 makes in the case where Off It is assembled in a manner of becoming beam waist in optical element 140 to selection with the incident light beam LB of optical element 140 by selection.
Selection has transmittance relative to light beam LB with optical element 140, for example, using acoustooptic modulation element (AOM). It selects with optical element 140 in the case where the driving signal for carrying out self-control device 18 is Off, by incident light beam LB to selection It is irradiated with optical element 66, when the driving signal (high-frequency signal) for carrying out self-control device 18 is On, incident light beam LB will be made A diffraction light, that is, light beam LB4 of diffraction is irradiated to reflecting mirror 142.Reflecting mirror 142 makes incident light beam LB4 reflection, and to sweeping The collimation lens 100 for retouching unit U4 irradiates.That is, by the way that selection optical element 140 is switched to On/Off by control device 18, And make selection with optical element 140 to whether switching over light beam LB4 to scanning element U4 incidence.Collimation lens 144 make to The light beam LB that selection optical element 66 irradiates becomes directional light, and collector lens 146 makes to become parallel by collimation lens 144 The light beam LB of light is assembled in a manner of becoming beam waist in optical element 66 by selection.
It, can by configuring multiple selection optical element (AOM) 50,58,66,132,140 series connection (array) Keep some scanning element Un of the light beam LBn into multiple scanning element U1~U5 incident.Control device 18 is incident with light beam LBn Scanning element Un according to such as scanning element U1 → scanning element U2 → scanning element U3 → scanning element U4 → scanning element The mode that the such sequence of U5 → scanning element U1 is periodically switched, control multiple selections optical element 50,132,58, 140,66.That is, by light beam LBn in order respectively to sweep time as defined in multiple scanning element U1~U5 incidence in a manner of cut It changes.In addition, phase of the polygonal mirror PM of each scanning element U1~U5 under the control based on control device 18, with light beam LBn incidence Between synchronously deflect light beam LBn so that the point light SP of incident light beam LBn is scanned along line SL1~SL5 is described.Separately Outside, control device 18 can depict the figure based on pattern data along line SLn is described with each scanning element Un on substrate FS The mode of case, the scanning element Un based on light beam LBn incidence pattern data (by " 0 ", " 1 " constitute serial data DLn) come Control the description optical element (AOM) 106 of scanning element Un.
That is, in the case of this variation, each polygonal mirror PM of five scanning element U1~U5 is every with rotary angle position The mode synchronous rotary of secondary phase shifting certain angle amount.In addition, in the case of this variation, by light beam (laser) LB timesharing Five scanning element U1~U5 are distributed on ground, therefore, the angle of a reflecting surface RP of polygonal mirror PM can be irradiated to light beam LBn Spend range (the rotation angle beta in Fig. 7) with from the light beam LBn that reflecting surface RP reflects to the maximum deflection angle of f θ lens FT incidence (2 α of angle in Fig. 7) meets the mode of the α of β >=5, come set f θ lens FT front side focal length and/or polygonal mirror PM it is anti- Penetrate face number Np.
Like this, in this variation, light beam LB will not be made to become useless, can be improved the light from light supply apparatus 14 The utilization efficiency of beam LB, and seek the raising of scan efficiency.It, will be from light supply apparatus 14 in addition, in this variation Light beam LB distributes to five scanning element Un, but the light beam LB from a light supply apparatus 14 can also be distributed to two scannings Unit Un can also assign them to four or six or more scanning element Un.In this case, if the scanning list that will be distributed The quantity of first Un is set as n, then the angular range of a reflecting surface RP of polygonal mirror PM can be irradiated to light beam LBn (in Fig. 7 Rotation angle beta) with from the light beam LB that reflecting surface RP reflects to the maximum deflection angle (angle 2 in Fig. 7 of f θ lens FT incidence Meet β >=n × α mode, α) to set the front side focal length of f θ lens FT and/or the reflecting surface number Np of polygonal mirror PM.Separately Outside, as the explanation in the first embodiment described above, in the light beam LB distribution that will come from two light supply apparatus 14 (14a, 14b) In the case where to multiple scanning element Un, it is also not necessarily limited to distribute to three scanning element Un, any number of sweep can be distributed to Retouch unit Un.For example, the light beam LB from light supply apparatus 14a can be distributed to five scanning element Un, will be filled from light source The light beam LB for setting 14b distributes to four scanning element Un.
[the 2nd embodiment]
In the first embodiment described above, since the nearby setting description of the polygonal mirror PM in each scanning element Un is used up Element (AOM) 106 is learned, so the quantity of the description used optical element 106 becomes more, and cost is got higher.Then, the originally the 2nd In embodiment, a description is set in the optical path of the light beam LB from a light supply apparatus 14 with optical modulator (AOM), is made The intensity of the light beam LBn irradiated from multiple scanning element Un to substrate FS is modulated with optical modulator with a description and makes it Depict pattern.That is, in the 2nd embodiment, nearby only configuring one and require high responsiveness in multiple scanning element Un Describe and use optical modulator (AOM), the selection that configuration response can be low in the side each scanning element Un is with optical element (AOM).
Figure 11 is the figure for indicating the structure of description head 16 of the 2nd embodiment, and Figure 12 is to indicate that light shown in Figure 11 imports The figure of optical system 40a.Identical appended drawing reference is marked to structure identical with the first embodiment described above, and only illustrates difference Part.In addition, the diagram of cylindrical lens CYb shown in Fig. 3, light import optical system 40a, 40b tool is omitted in Figure 11 There is identical structure, therefore, light import optical system 40a is illustrated at this, and omit saying for light import optical system 40b It is bright.As shown in figure 12, light import optical system 40a is in addition to previous collector lens shown in Fig. 4 42, collimation lens 44, reflection Mirror 46, collector lens 48, selection optical element 50, reflecting mirror 52, collimation lens 54, collector lens 56, selection optics member Part 58, reflecting mirror 60, collimation lens 62, collector lens 64, selection are used other than optical element 66, reflecting mirror 68 and absorber 70, Be also equipped with the description optical element (AOM) 150 as description optical modulator, collimation lens 152, collector lens 154 and Absorber 156.In this 2nd embodiment, as shown in figure 11, do not have the 1st embodiment in each scanning element U1~U6 Such describe uses optical element 106.
Description optical element 150, collimation lens 152 and collector lens 154 are located at collector lens 48 and choosing in the order It selects between optical element 50.Therefore, in this 2nd embodiment, reflecting mirror 46 makes to become parallel by collimation lens 44 The light beam LB of light reflect and towards description optical element 150.Collector lens 48 makes the light incident to description optical element 150 Beam LB is to assemble (convergence) in a manner of becoming beam waist in optical element 150 in description.
Description has transmittance relative to light beam LB with optical element 150, for example, using acoustooptic modulation element (AOM). The primary being located near the side light supply apparatus 14 (14a) in description optical element 150 and selection optical element 50,58,66 Selection optical element 50 compared to being located at the side light supply apparatus 14 (14a).Description is carrying out self-control device 18 with optical element 150 Driving signal (high-frequency signal) be Off in the case where, incident light beam LB is irradiated to absorber 156, when from control dress When the driving signal (high-frequency signal) for setting 18 is On, retouch the light beam as a diffraction light of incident light beam LB diffraction ( Draw light beam) selection optical element 50 irradiation of the LB to primary.Collimation lens 152 makes the light irradiated to selection optical element 50 Beam LB becomes directional light, and collector lens 154 makes to become the light beam LB of directional light in selection optics by collimation lens 152 Mode in element 50 as beam waist assembles (convergence).
As shown in figure 11, scanning element U1~U6 has collimation lens 100, reflecting mirror 102, reflecting mirror 110, cylindrical lens CYa, reflecting mirror 114, polygonal mirror PM, f θ lens FT, cylindrical lens CYb (illustration omitted in Figure 11) and reflecting mirror 122, and And also have as the 1st molded lens 158a of beam shaping lens and the 2nd molded lens 158b.That is, the originally the 2nd In embodiment, replace the collector lens 104 and collimation lens 108 of the 1st embodiment, and is equipped in scanning element U1~U6 1st molded lens 158a and the 2nd molded lens 158b.
Figure 13 is by the optical path signalization between the light import optical system 40a of Figure 12 and multiple scanning element U1, U3, U5 Obtained figure.Control device 18 is based on pattern data (serial data DL1, DL3, DL6 for being made of " 0 ", " 1 "), imports to light The description of optical system 40a exports the driving signal (high-frequency signal) of On/Off with optical element 150, and the pattern data is to passing through The pattern described on substrate FS from the point light SP of light beam LB1, LB3, LB5 of each scanning element U1, U3, U5 irradiation is advised It is fixed.The description optical element 150 of light import optical system 40a can make incidence based on the driving signal of the On/Off as a result, Light beam LB diffraction carry out the intensity (making its On/Off) of modulation point light SP.
It is described in detail, the pattern data of scanning element Un of the control device 18 based on light beam LBn incidence, to description The driving signal of On/Off is inputted with optical element 150.If the driving signal that description optical element 150 is entered On is (high Frequency signal) then make incident light beam LB diffraction, and irradiate to selection optical element 50 (to 50 incidence of selection optical element The intensity of light beam LB is got higher).On the other hand, if description optical element 150 is entered driving signal (the high frequency letter of Off Number), then it is incident light beam LB is (strong with the incident light beam LB of optical element 50 to selection to absorber 156 (Figure 12) irradiation 0) degree becomes.Therefore, the scanning element Un of light beam LBn incidence can along describe line SLn by the light beam LB through intensity modulated to Substrate FS irradiation, can describe the pattern based on pattern data on substrate FS.
For example, in the case where light beam LB3 is incident to scanning element U3, pattern of the control device 18 based on scanning element U3 Data, the description optical element 150 for importing light into optical system 40a switch to On/Off.Scanning element U3 being capable of edge as a result, Describe line SL3 to substrate FS irradiate the light beam LB through intensity modulated, can depict on substrate FS based on pattern data Pattern.The scanning element Un of light beam LBn incidence is with such as scanning element U1 → scanning element U3 → scanning element U5 → scanning list The mode of first U1 successively switches over.Therefore, control device 18 similarly, with pattern data → scanning element of scanning element U1 The mode of the pattern data of U3 → scanning element U5 pattern data → scanning element U1 pattern data, directional light of fighting to the finish import The pattern data for the On/Off signal that the description of optical system 40a is sent with optical element 150 successively switches over.Then, it controls Device 18 processed controls the description optical element 150 of light import optical system 40a based on the pattern data successively switched. Each scanning element U1, U3, U5 can be by irradiating to substrate FS through intensity modulated along description line SL1, SL3, SL5 as a result, Light beam LB, to depict pattern corresponding with pattern data on substrate FS.
More than, referring to Fig.1 4~Figure 16 be described in detail be suitable for the 2nd embodiment control system a part of structure and It is acted.In addition, structure described below and movement can also be suitable for the 1st embodiment.Figure 14 is being located at as an example Three scanning elements U1, U3, U5 in Figure 11, Figure 13 respectively in polygonal mirror PM Rotable Control System block diagram, due to sweeping The structure for retouching unit U1, U3, U5 is identical, so being labelled with identical appended drawing reference to same parts.Scanning element U1, U3, U5 respectively in be equipped with the scanning that description line (scan line) SL1, SL3, SL5 on substrate FS is generated by polygonal mirror PM is opened Origin sensor OP1, OP3, the OP5 for the timing progress Photoelectric Detection that begins.Origin sensor OP1, OP3, OP5 are to polygonal mirror PM Reflecting surface RP projection light and the photoelectric detector for receiving its reflected light describe sweeping for line SL1, SL3, SL5 whenever light SP comes When retouching the tight front position of starting point, origin signal SZ1, SZ3, SZ5 of pulse type are exported respectively.
Timing measurement unit 180 inputs origin signal SZ1, SZ3, SZ5, to the respective generation of origin signal SZ1, SZ3, SZ5 Whether timing is measured in defined permissible range (time interval), if generating the error deviateed from the permissible range, Corresponding deviation information is exported to Servocontrol device 182.(motor Mp is to each to motor Mp for Servocontrol device 182 Polygonal mirror PM in scanning element U1, U3, U5 carries out rotation driving) each servo drive circuit portion export based on deviation information Instruction value.Each servo drive circuit portion of motor Mp is made of feed circuit portion FBC and servo drive circuit (amplifier) SCC, Wherein, encoder EN of the feed circuit portion FBC input in the rotary shaft for being mounted on motor Mp lifting pulse signal (with Under, referred to as code device signal), and speed signal corresponding with the rotation speed of polygonal mirror PM is exported, which (puts Big device) SCC inputs the instruction value from Servocontrol device 182 and carrys out the speed signal of self-feedback ciucuit portion FBC, and drives horse Up to Mp to become rotation speed corresponding with instruction value.In addition, servo drive circuit portion (feed circuit portion FBC, servo-drive electricity Road SCC), timing measurement unit 180 and Servocontrol device 182 constitute a part of control device 18.
In this 2nd embodiment, each polygonal mirror PM in three scanning elements U1, U3, U5 needs to rotate angle at it Certain phase difference is kept in position and is rotated with identical speed, and in order to realize the purpose, timing measurement unit 180 inputs origin signal SZ1, SZ3, SZ5, for example, carrying out such measurement shown in the timing diagram of Figure 15.
Figure 15 is schematically illustrated in three polygonal mirror PM about rotation angle with the phase difference rotation in defined permissible range The various signal waveforms generated in the case where turning.After just rotating each polygonal mirror PM, the phase of origin signal SZ1, SZ3, SZ5 Pair phase difference it is respectively different, but timing measurement unit 180 is for example on the basis of origin signal SZ1, with identical as origin signal SZ1 Frequency (period) generate other origin signals SZ3, SZ5, and with the time interval between three origin signals SZ1, SZ3, SZ5 It is worth on the basis of the state that Ts1, Ts2, Ts3 are equal, measurement and update information corresponding to the error relative to the value.Timing ga(u)ge Survey portion 180 exports the update information to Servocontrol device 182, and thus each motor Mp of scanning element U3, U5 carries out servo The generation timing of control, three origin signals SZ1, SZ3, SZ5 is controlled so as to stablize with Ts1=Ts2=Ts3 as shown in Figure 15.
After the generation timing of origin signal SZ1, SZ3, SZ5 are stablized, timing measurement unit 180 is to previous Figure 11~Figure 13 Shown in selection with optical element 50,58,66, respectively enabled (On) signal SPP1, SPP3, SPP5 are described in output.Describe enabled (On) signal SPP1, SPP3, SPP5 herein only during H level in carry out corresponding selection with optical element 50,58,66 Modulation acts (the deflection switching action of light).Since certain phase can be maintained after three origin signals SZ1, SZ3, SZ5 stablize Potential difference (being herein the 1/3 of the period of origin signal SZ1), thus describe enable signal SPP1, SPP3, SPP5 it is each rise (L → H) also there is certain phase difference.Description enable signal SPP1, SPP3, the SPP5 correspond to for switching selection optical element 50,58,66 driving signal (high-frequency signal).
The timing for describing the decline (H → L) of enable signal SPP1, SPP3, SPP5 is by timing measurement unit 180 Counter is set to for being measured a clock signal clk of light On/Off in each description line SL1, SL3, SL5. The clock signal clk administers the timing of the On/Off of description optical element 150 (or description optical element 106 in Fig. 3), It is size, the scan velocity V s for putting light SP etc. by the length, point light SP of description line SLn (SL1, SL3, SL5) on substrate FS Determining.For example, the length for describing line is 30mm, the size (diameter) of point light SP is 6 μm, makes a light SP in a scanning direction Every time in the case where 3 μm of ground On/Off of overlapping, as long as clock signal clk is count down to by the counter in timing measurement unit 180 After 10000 (30mm/3 μm) are secondary, make to describe enable signal SPP1, SPP3, SPP5 decline (H → L).
In addition, if the reflecting surface of polygonal mirror PM being set as ten faces, its rotation speed is set as to Vp (rpm), each origin The frequency of signal SZ1, SZ3, SZ5 are 10Vp/60 (Hz).Therefore, the case where time interval is stable at Ts1=Ts2=Ts3 Under, time interval Ts1 became for 60/ (30Vp) second.As an example, if the rotation speed Vp of the benchmark of polygonal mirror PM is set as 8000rpm, then time interval Ts1 becomes 60/ (308000) second=250 μ S.
As shown in Figure 15, it is next for describing On time (duration of H level) Toa of enable signal SPP1, SPP3, SPP5 During being used as in point light projection to substrate FS from light beam (laser) LB of polygonal mirror PM (during projection), but need to be set to compare Time interval Ts1 is short.Then, for example, if On time Toa is set as 200 μ S, for counting during this period 10000 times The frequency of clock signal clk becomes 10000/200=50 (MHz).Synchronously with such clock signal clk, from pattern data Description bit string data Sdw or serial data DLn corresponding to the description line SLn that (" 0 " or " 1 " on bitmap) generates (for example, 10000 amounts) it is output to description optical element 150.In addition, as shown in Figure 3, scanning element U1, U3, U5 respectively in In structure equipped with description with optical element 106, description bit string data Sdw corresponding with line SL1 is described or serial data DL1 quilt It is sent to the description optical element 106 of scanning element U1, description bit string data Sdw corresponding with line SL3 is described or serial number The description optical element 106 of scanning element U3 is sent to according to DL3, with describe the corresponding description bit string data Sdw of line SL5 or Serial data DL5 is sent to the description optical element 106 of scanning element U5.
In this 2nd embodiment, describing line SL1, SL3, SL5 from three, respectively corresponding pattern data generation is retouched It draws bit string data Sdw or serial data DLn and describes enable signal SPP1, SPP3, SPP5 (or origin signal SZ1, SZ3, SZ5) Synchronously successively it is supplied to the On/Off for description optical element 150.
Figure 16 shows an example for generating such circuit for describing bit string data Sdw, which has generative circuit (pattern Data generation circuitry) 301,303,305 and OR circuit GT8.Generative circuit 301 have memory portion BM1, counter unit CN1 and Lock portion GT1, generative circuit 303 has memory portion BM3, counter unit CN3 and lock portion GT3, generative circuit 305 have memory Portion BM5, counter unit CN5 and lock portion GT5.The generative circuit 301,303,305 and OR circuit GT8 constitutes the one of control device 18 Part.
Memory portion BM1, BM3, BM5 are for temporarily storing the pattern that describe exposure with each scanning element U1, U3, U5 The memory of corresponding bitmap data (pattern data).Counter unit CN1, CN3, CN5 be for make each memory portion BM1, Then to be described one in bitmap data (pattern data) in BM3, BM5 describes the bit string of the amount of line (for example, 10000 Position) bit by bit as serial data DL1, DL3, the DL5 synchronous with clock signal clk and description enable signal SPP1, SPP3, The counter of middle output during SPP5 is On.
Bitmap data in each memory portion BM1, BM3, BM5 presses a description line by address counter (not shown) etc. Amount data and deviate.For example, if memory portion BM1, then the serial data DL1 for the amount for describing line at one is defeated for the offset After out, then carried out as the origin signal SZ3 of the scanning element U3 of the active timing generated.Similarly, memory portion The offset of bitmap data in BM3 is after serial data DL3 end of output, then as the origin letter of the scanning element U5 of active The timing that number SZ5 is generated carries out, and the offset of the bitmap data in memory portion BM5 is after serial data DL5 end of output, then The timing that the origin signal SZ1 of scanning element U1 as active is generated carries out.
Each serial data DL1, DL3, the DL5 sequentially generated in this way is from description enable signal SPP1, SPP3, SPP5 On During lock portion GT1, GT3, GT5 of middle opening pass through, and be applied to the OR circuit GT8 of three inputs.OR circuit GT8 will be by serial Data DL1 → DL3 → DL5 → DL1 reiteration synthesis position data column as describe bit string data Sdw output with For the description On/Off of optical element 150.In addition, as shown in Figure 3, scanning element U1, U3, U5 respectively in be equipped with describe In structure with optical element 106, as long as description of the serial data DL1 exported from lock portion GT1 into scanning element U1 is used The transmission of optical element 106, the description optical element 106 by the serial data DL3 exported from lock portion GT3 into scanning element U3 It sends, send description optical element 106 of the serial data DL5 exported from lock portion GT5 into scanning element U5.
As described above, describe the clock signal needed with the On/Off of optical element 150 (or 106) in response to high speed CLK (such as 50MHz), as long as but selection with optical element 50,58,66 with to describe enable signal SPP1, SPP3, SPP5 (or former Point signal SZ1, SZ3, SZ5) it is synchronously carried out On/Off, response frequency is previous in the case where numerical example, the time Being spaced Toa (or Ts1) is 200 μ S, therefore can be 10KHz or so, being capable of and cheap element high using transmissivity.In addition, If the clock that counter unit CN1, CN3, CN5 that the counter in timing measurement unit 180 is counted or in Figure 16 are counted The frequency of signal CLK is set as Fcc, the basic frequency of the impulse hunting of the light beam LB from light supply apparatus 14 is set as Fs, then by n It is set as the integer of 1 or more (preferably n >=2), and is set to meet the relationship of nFcc=Fs.
This concludes the description of using Figure 13 light import optical system 40a and multiple scanning element U1, U3, U5 movement and Using the description timing of each scanning element U1, U3, U5 etc. of Figure 14~Figure 16, but for light import optical system 40b and multiple Scanning element U2, U4, U6 are also same.It is simply illustrated, the scanning element Un of light beam LB incidence is for example to scan list First U2 → scanning element U4 → scanning element U6 → scanning element U2 mode successively switches over.Therefore, control device 18 is same Sample, with the pattern data of scanning element U2 → scanning element U4 pattern data → scanning element U6 pattern data → scanning The mode of the pattern data of unit U2, the On/ that the description for the directional light import optical system 40b that fights to the finish is sent with optical element 150 The pattern data of Off signal successively switches over.Moreover, control device 18 is controlled based on the pattern data successively switched The description optical element 150 of light import optical system 40b.Alternatively, being generated by circuit structure as shown in Figure 16 by three Item is described the description bit string data Sdw of the pattern data synthesis of the amount of line and is supplied to description optical element 150.It is each as a result, Scanning element U2, U4, U6 are by irradiating the light beam LB through intensity modulated, and energy to substrate FS along describing line SL2, SL4, SL6 It is enough that the pattern based on pattern data is depicted on substrate FS.
In above above-mentioned 2nd embodiment, other than the effect of the first embodiment described above, moreover it is possible to obtain following Effect.That is, a description optical element 150 is arranged in light import optical system 40a, by the description optical element 150 configure compared with primary selection optical element 50 by the side light supply apparatus 14a, and are described with one and use optical element 150 The intensity of light beam LB1, LB3, LB5 for irradiating from multiple scanning element U1, U3, U5 to substrate FS are modulated according to pattern.Equally A description optical element 150 is arranged in ground in light import optical system 40b, by description optical element 150 and primary Selection with optical element 50 compare by the side light supply apparatus 14b configure, adjusted with a description with optical element 150 according to pattern Make the intensity of light beam LB2, LB4, LB6 for irradiating from multiple scanning element U2, U4, U6 to substrate FS.Thereby, it is possible to reduce acousto-optic The quantity of modulation element, cost reduce.
In addition, the light beam LB description head 16 for being distributed into three is illustrated in above-mentioned 2nd embodiment, but It can also be (the ginseng of description head 16 that light beam LB is distributed into five as illustrating in the variation of the first embodiment described above According to Fig. 9 and Figure 10).In addition, light supply apparatus 14 is one, therefore describes and use optical element 150 in the case where Fig. 9 and Figure 10 It also is one.
[variation of the 2nd embodiment]
Above-mentioned 2nd embodiment can deform as described below.In above-mentioned 2nd embodiment, tune is used up as description Device processed and description optical element 150 is set to light import optical system 40a, 40b, but in this variation, replace to describe and use Optical element 150 and description optical modulator is respectively set in the light supply apparatus 14 (14a, 14b).In addition, to it is the above-mentioned 2nd real It applies the identical structure of mode and marks identical appended drawing reference or illustration omitted, only different piece is illustrated.In addition, will be in light Light supply apparatus in source device 14a, 14b equipped with description optical modulator is referred to as light supply apparatus 14A, 14B, since light source fills Setting 14A has identical structure with light supply apparatus 14B, so being only illustrated to light supply apparatus 14A.
Figure 17 is the figure for indicating the structure of light supply apparatus (light-pulse generator device, laser light-source device) 14A of this variation. Light supply apparatus 14A as fiber laser device have dfb semiconductor laser diode 200, dfb semiconductor laser diode 202, partially Shake beam splitter 204, as the electrooptic element 206 of description optical modulator, the driving circuit of the electrooptic element 206 206a, polarising beam splitter 208, absorber 210, excitation light source 212, combiner 214, optical amplifier fiber 216, wavelength convert Optical element 218, wavelength converting optical element 220, multiple lens element GL and the control circuit comprising clock generator 222a 222。
Dfb semiconductor laser diode (the 1st Solid State Laser element, the 1st semiconductor laser light resource) 200 is with assigned frequency (vibration Swing frequency, basic frequency) Fs generate rapid take-off and landing (steep) or sharp (sharp) pulse type kind light (laser) S1, DFB Semiconductor Laser device (the 2nd Solid State Laser element, the 2nd semiconductor laser light resource) 202 generates the gentle (time with assigned frequency Fs Upper broadness) pulse type kind light (laser) S2.The pulse for the kind light S1 that dfb semiconductor laser diode 200 generates and DFB The energy of the pulse for the kind light S2 that semiconductor Laser device 202 generates is roughly the same, but polarization state is mutually different, peak value Intensity is that kind of light S1 is stronger.In this variation, the polarization state of the kind light S1 generated with dfb semiconductor laser diode 200 is S The polarization state for the kind light S2 that polarization, dfb semiconductor laser diode 202 generate is illustrated for P polarization.The dfb semiconductor swashs Optical element 200,202 passes through control electricity in response to the clock signal LTC (assigned frequency Fs) that is generated by clock generator 222a The electrical control on road 222, and be controlled so as to issue kind of light S1, a S2 with frequency of oscillation Fs.The control circuit 222 is by control device 18 Control.
In addition, clock signal LTC becomes to the clock letter that counter unit CN1, CN3, CN5 are respectively automatically supplied shown in Figure 16 Clock signal LTC is carried out n frequency dividing (integer that preferably n is 2 or more) and becomes clock signal clk by the fundamental frequency of number CLK.In addition, Also the function that there is clock generator 222a the basic frequency Fs by clock signal LTC to be adjusted with ± Δ F, i.e. to light beam LB Impulse hunting the function that is finely adjusted of time interval.As a result, for example, even if the scan velocity V s of point light SP slightly changes, Also can critically ensure (to describe again in the size for describing the pattern described within the scope of line by being finely adjusted basic frequency Fs Rate).
Polarising beam splitter 204 makes the light transmission of S-polarization, reflects the light of P polarization, by dfb semiconductor laser diode 200 The kind light S2 that the kind light S1 and dfb semiconductor laser diode 202 of generation are generated is guided to electrooptic element 206.In detail, partially Vibration beam splitter 204 will plant light S1 to electricity by the kind light S1 for the S-polarization for generating dfb semiconductor laser diode 200 transmission Optical element 206 guide, by make dfb semiconductor laser diode 202 generate P polarization kind light S2 reflection and will kind light S2 to Electrooptic element 206 guides.Dfb semiconductor laser diode 200,202 and polarising beam splitter 204, which are constituted, generates kind of light S1, a S2 Laser light source unit (light source portion) 205.
Electrooptic element 206 relative to kind of light S1, S2 and have transmittance, for example, using electrooptics modulator (EOM: Electro-Optic Modulator).EOM is in response to description bit string data Sdw (or serial data shown in previous Figure 16 DLn On/Off state (high/low)), come by driving circuit 206a switching from polarising beam splitter 204 pass through come kind light The polarization state of S1, S2.From dfb semiconductor laser diode 200, dfb semiconductor laser diode 202 respective kinds of light S1, S2 Wave band be 800nm or more, longer, therefore as electrooptic element 206, the handoff response for being able to use polarization state is The electrooptic element of GHz degree.
In one pixel data for the description bit string data Sdw (or serial data DLn) for being input to driving circuit 206a When for Off state (low, " 0 "), electrooptic element 206 do not change the polarization state of incident kind light S1 or S2 and directly by its to Polarising beam splitter 208 guides.On the other hand, in description bit string data Sdw (or the serial data for being input to driving circuit 206a When DLn) being On state (high, " 1 "), electrooptic element 206 changes the polarization state of incident kind light S1 or S2 (by polarization direction Change 90 degree) guidance of polarising beam splitter 208 backward.Like this, by driving electrooptic element 206, electrooptic element 206 When the pixel data for describing bit string data Sdw (or serial data DLn) is On state (height), the kind light S1 of S-polarization is converted At the kind light S1 of P polarization, the kind light S2 of P polarization is converted into the kind light S2 of S-polarization.
Polarising beam splitter 208 makes the light transmission of P polarization and guides via lens element GL to combiner 214, makes S-polarization Light reflection and to absorber 210 guide.Excitation light source 212 generates exciting light, and the exciting light of the generation is via optical fiber 212a quilt It is guided to combiner 214.Combiner 214 is by the kind light irradiated from polarising beam splitter 208 and excitation photosynthesis, and to optical fiber light Amplifier (image intensifer) 216 exports.Optical amplifier fiber 216 is doped with can be by the laser medium of excitation.Therefore, In the optical amplifier fiber 216 that kind light and the exciting light of synthesis are transmitted, make to plant and by excitation laser medium Light amplification.As the laser medium adulterated in optical amplifier fiber 216, the terres rares such as erbium (Er), ytterbium (Yb), thulium (Tm) are used Element.The amplified kind of light is radiated from the ejecting end 216a of optical amplifier fiber 216 with the defined angle of divergence, by lens element It is incident to wavelength transfer optics 218 after GL convergence or collimationization.
Wavelength converting optical element (the 1st wavelength converting optical element) 218 passes through second_harmonic generation (Second Harmonic Generation:SHG), incident kind light (wavelength X) is converted into the second harmonic that wavelength is λ/2.As wave Long transfer optics 218 are suitably used as the PPLN of quasi-phase matched (Quasi Phase Matching:QPM) crystal (Periodically Poled LiNbO3: periodic polarized lithium niobate) crystal.It is further possible to use PPLT (Periodically Poled LiTaO3: periodically poled lithium tantalate) crystal etc..
Wavelength converting optical element (the 2nd wavelength converting optical element) 220 is converted by wavelength converting optical element 218 Second harmonic (wavelength is λ/2) and be not wavelength-converted optical element 218 convert and remaining kind of light (wavelength into λ's) and Frequency generates (Sum Frequency Generation:SFG), and generation wavelength is the triple-frequency harmonics of λ/3.The triple-frequency harmonics becomes With the ultraviolet (light beam LB) of peak wavelength in 370nm wave band below.
As described above, for the pattern data generative circuit shown in Figure 16 is sent out description bit string data Sdw (or DLn) in the case where the structure applied to the electrooptic element of Figure 17 206, describing one of bit string data Sdw (or DLn) When pixel data is Off state (low, " 0 "), electrooptic element 206 does not change the polarization state of incident kind light S1 or S2 and straight It connects to polarising beam splitter 208 and guides.Therefore, from polarising beam splitter 208 transmitted through kind light become from dfb semiconductor swash The kind light S2 of optical element 202.Therefore, have from the light beam LB of light supply apparatus 14A final output and come from dfb semiconductor laser member The identical oscillating curve (time response) of the kind light S2 of part 202.That is, in this case, light beam LB be pulse peak strength it is low and Wide relaxation characteristic on time.The amplification efficiency of the kind light S2 low to peak strength like this of optical amplifier fiber 216 is low, because This light beam LB exported from light supply apparatus 14A, which becomes, is not amplified to the light for exposing required energy.Therefore, in this case, from From the viewpoint of exposure, substantial result and light supply apparatus 14A not outgoing beam LB the case where it is identical.That is, to substrate The intensity of the point light SP of FS irradiation becomes low-level.However, not carrying out pattern plotter along each description line SLn (SL1~SL6) During (during non-projection, non-exposed period), the light beam LB even if from kind of the ultraviolet region of light S2 is that small intensity also can Therefore lasting radiation describes line SLn (SL1~SL6) long lasting for the state of the same position on substrate FS generating (for example, because conveyer failure caused by substrate FS emergent stopping etc.) in the case where, as long as in the light of light supply apparatus 14A Movable optical gate is set on the injection window of beam LB and is closed and projects window.
On the other hand, at one of the description bit string data Sdw (or DLn) applied to the electrooptic element 206 of Figure 17 When pixel data is On state (high, " 1 "), electrooptic element 206 changes after the polarization state of incident kind light S1 or S2 to inclined The beam splitter 208 that shakes guides.Therefore, from polarising beam splitter 208 transmitted through kind light become come from dfb semiconductor laser diode 200 kind light S1.Therefore, the light beam LB exported from light supply apparatus 14A is by the kind light S1 from dfb semiconductor laser diode 200 It generates.Kind light S1 from dfb semiconductor laser diode 200 is since peak strength is strong, so efficient by optical amplifier fiber 216 Ground amplification, energy needed for exposure of the light beam LB with substrate FS exported from light supply apparatus 14A.That is, to substrate FS The intensity of the point light SP of irradiation becomes high level.
Like this, due to being equipped with the electrooptic element 206 as description optical modulator in light supply apparatus 14A, so In the same manner as the case where controlling description optical element 150 in above-mentioned 2nd embodiment, by controlling electrooptic element 206, It can obtain effect identical with above-mentioned 2nd embodiment.That is, the pattern of the scanning element Un based on light beam LB incidence Electrooptic element 206 is switched (driving) at On/Off, as a result, by data (or description bit string data Sdw in Figure 15, Figure 16) The intensity to the primary selection incident light beam LB of optical element 50 can be modulated according to the pattern to be described, i.e. by each Scanning element Un (U1~U6) is irradiated to the intensity of the point light SP of the light beam LB on substrate FS.
In addition, in the structure of Figure 17, it is also considered that omission dfb semiconductor laser diode 202 and polarising beam splitter 204, dfb semiconductor laser will be only come under the switching of the electrooptic element 206 carried out based on pattern data (describing the data) The kind light S1 train of pulse (Burst) of element 200 is hummock guided to optical amplifier fiber 216.But according to the structure, then Incidence periodically according to the pattern to be described substantially disorder of the kind light S1 to optical amplifier fiber 216.That is, from DFB half After the kind light S1 of conductor Laser element 202 does not continue to the incident state of optical amplifier fiber 216, if kind light S1 is put to optical fiber light Big device 216 is incident, then the kind light S1 just after incidence is amplified compared with when usual with big magnifying power, exists from optical fiber light amplification Device 216 leads to the problem of the light beam with above big intensity of regulation.Then, in this variation, as preferred mode, lead to It crosses in kind of light S1 not to making (the peak kind light S2 from dfb semiconductor laser diode 202 during 216 incidence of optical amplifier fiber It is worth the low wide pulsed light of intensity) it is incident to optical amplifier fiber 216, and solve the problems, such as this.
In addition, though switching over to electrooptic element 206, but bit string data Sdw (can also be described based on pattern data Or serial data DLn) drive dfb semiconductor laser diode 200,202.That is, control circuit 222 is based on pattern data (describing bit string data Sdw or DLn) controls dfb semiconductor laser diode 200,202, generates to selectivity (selecting one) to provide Kind light S1, S2 that frequency Fs vibrates in a pulsed manner.In this case, not needing polarising beam splitter 204,208, electrooptic element 206 and absorber 210, from the kind light S1 of the alternatively pulsed oscillation of one party in dfb semiconductor laser diode 200,202, A side of S2 is directly incident to combiner 214.At this point, control circuit 222 is with the kind light from dfb semiconductor laser diode 200 S1 and kind light S2 from dfb semiconductor laser diode 202 will not be incident to optical amplifier fiber 216 simultaneously mode, control The driving of each dfb semiconductor laser diode 200,202.That is, in the case where irradiating the point light SP of each light beam LBn to substrate FS, Dfb semiconductor laser diode 200 is controlled in a manner of only planting light S1 to 216 incidence of optical amplifier fiber.In addition, not to substrate In the case where the point light SP (intensity of point light SP is extremely low) of FS illumination beam LBn, entered with only planting light S2 to optical amplifier fiber 216 The mode penetrated controls dfb semiconductor laser diode 202.Like this, based on pattern data (H or L that describe bit string data Sdw) Pixel data (high/low) decides whether to substrate FS illumination beam LBn.In addition, the polarization shape of kind light S1, S2 in this case State can also be P polarization.
Like this, in this variation, the quantity of acoustooptic modulation element can be also reduced, cost is lower.
In addition it is also possible to which light supply apparatus 14A, 14B of this variation to be used for the light supply apparatus of the first embodiment described above 14a,14b.In this case, can be exported according to pattern data (describing bit string data Sdw) to control from light supply apparatus 14A, 14B From dfb semiconductor laser diode 200 kind light S1 output timing and each scanning element U1~U6 description with optics member The switching of part 106.
[the 3rd embodiment]
Next, 8 the 3rd embodiment is illustrated referring to Fig.1, in the 3rd embodiment, implement so as to be used in the 2nd Premised on the light supply apparatus 14A (referring to Fig.1 7), the 14B that illustrate in the variation of mode.However, in order to be suitable for the 3rd embodiment, Clock generator 222a in the control circuit 222 of the light supply apparatus 14A of Figure 17 has describes control according to shown in from Figure 18 The multiplying power update information CMg of the control unit (control circuit 500) of system by the time interval of clock signal LTC locally (from With dissipating) flexible function.Similarly, the clock generator 222a in the control circuit 222 of light supply apparatus 14B also has according to again The function that rate update information CMg locally (discretely) stretches the time interval of clock signal LTC.In addition, light supply apparatus 14B, the movement of light import optical system 40b and scanning element U2, U4, U6 and light supply apparatus 14A, light import optical system 40a And the movement of scanning element U1, U3, U5 are identical, therefore for light supply apparatus 14B, light import optical system 40b and scanning element The movement of U2, U4, U6 omit the description.In addition, being marked to structure identical with the variation of above-mentioned 2nd embodiment identical attached Icon note or illustration omitted, are only illustrated different piece.
In Figure 18, light beam (laser) LB from a light supply apparatus 14A is same as the structure of previous Figure 12, Figure 13 Ground is supplied to three scanning elements U1, U3, U5 via selection with optical element 50,58,66 respectively.Selection optical element 50, 58,66 respectively in response to alternatively making light in Figure 14, enabled (On) signal SPP1, SPP3, the SPP5 of description illustrated in fig. 15 Beam LB deflects (switching), by some guidance of light beam LB into scanning element U1, U3, U5.In addition, as previously explained like that, During not carrying out pattern plotter along each description line (during non-projection), even if from kind of a light beam for the ultraviolet region of light S2 LB is that small intensity can also continue to radiate, it is contemplated that can generate the identical bits that each description line is irradiated in a long time on substrate FS The case where setting such situation, and movable optical gate SST is equipped on the injection window of the light beam LB of light supply apparatus 14A.
As shown in figure 14, the origin signal of origin sensor OP1, OP3, OP5 from each scanning element U1, U3, U5 The generative circuit (pattern data generative circuit) of SZ1, SZ3, SZ5 to the pattern data for generating each scanning element U1, U3, U5 301,303,305 supply.Generative circuit 301 includes lock portion GT1, memory portion BM1, counter unit CN1 etc. in Figure 16, is counted Device portion CN1 is configured to the clock signal LTC to export from the control circuit 222 (clock generator 222a) of light supply apparatus 14A The clock signal clk 1 generated for fundamental frequency is counted.
Similarly, generative circuit 303 includes lock portion GT3, memory portion BM3, the counter unit CN3 etc. in Figure 16, is counted Device portion CN3 is configured to count the clock signal clk 3 generated using clock signal LTC as fundamental frequency, and generative circuit 305 includes Lock portion GT5, memory portion BM5, counter unit CN5 in Figure 16 etc., counter unit CN5 be configured to be to clock signal LTC The clock signal clk 5 that fundamental frequency generates is counted.
These clock signal clks 1, CLK3, CLK5 are by as each generative circuit 301,303,305 and light supply apparatus Clock signal LTC is divided into 1/n (integer that n is 2 or more) and given birth to by the control circuit 500 that the interface between 14A functions At.The supply of the clock signal clk 1, CLK3, CLK5 to each counter unit CN1, CN3, CN5 enables (On) in response to describing Signal SPP1, SPP3, SPP5 (referring to Fig.1 5), and it is limited to some.That is, when describing enable signal SPP1 is On (height), Clock signal LTC is only divided into the clock signal clk 1 that 1/n is obtained to supply to counter unit CN1, is describing enable signal When SPP3 is On (height), clock signal LTC is only divided into the clock signal clk 3 that 1/n is obtained and is supplied to counter unit CN3, When to describe enable signal SPP5 be On (height), clock signal LTC is only divided into clock signal clk 5 that 1/n is obtained to counter Portion CN5 supply.
Serial data DL1, DL3, the DL5 being respectively sequentially output from each generative circuit 301,303,305 as a result, respectively via Lock portion GT1, GT3, GT5 and be located in control circuit 500 three input OR circuit GT8 (referring to Fig.1 6) be added, become and retouch Draw bit string data Sdw and the electrooptic element 206 into light supply apparatus 14A supplies.In addition, generative circuit 301,303,305 and A part of the composition control device 18 of control circuit 500.
The above structure is substantially identical as the utilization method of light supply apparatus 14A for using Figure 17 to illustrate, but in this embodiment party In formula, it is arranged the respective description discribed pattern of line (scan line) SL1, SL3, SL5 of three scanning elements U1, U3, U5 The function that the description multiplying power in spot scan direction (Y-direction) is individually finely tuned.In order to realize the function, in the present embodiment, press Scanning element U1, U3, U5 and the memory for being equipped with temporarily storage with the description correction amount of multiplying power related information mg1, mg3, mg5 Portion BM1a, BM3a, BM5a.BM1a, BM3a, BM5a are illustrated in Figure 18 as independent sector in the memory portion, but can also be with For set on generative circuit 301,303,305 respectively in memory portion BM1, BM3, BM5 a part.It should be related with correction amount Information mg1, mg3, mg5 also constitute a part of delineation information.
Information mg1, mg3, mg5 related with correction amount are for example corresponding to the figure described by each description line SL1, SL3, SL5 The ratio (ppm) that size in the Y-direction of case is stretched with how many ratio.As an example, will by each description line SL1, In the case that the length in the region for the Y-direction that SL3, SL5 describe is set as 30mm, its flexible ± 200ppm to be made (to be equivalent to ± 6 μm) when, ± 200 this numerical value are set in information mg1, mg3, mg5.In addition, information mg1, mg3, mg5 can not also pass through Ratio and by (± ρ μm) of direct stroke setting.In addition, information mg1, mg3, mg5 can by along describe line SL1, The pattern data (serial data DLn) of the amount of the respective line of SL3, SL5 is successively reset, can also be by a plurality of line The pattern data (serial data DLn) of amount sends out reset.Like this, in the present embodiment, on one side by substrate (longitudinal direction) conveying is on one side along describing during line SL1, SL3, SL5 respectively carry out pattern plotter in X direction by FS, Neng Goudong The description multiplying power for changing to state Y-direction is able to suppress and thus causes in the deformation and face for learning substrate FS in the case where skew Description position precision deterioration.And when being overlapped exposure, cope with both deformations of established bottom pattern and substantially Improve registration accuracy.
Figure 19 is to indicate in drawing apparatus shown in Figure 18, typically in the figure for carrying out standard based on scanning element U1 The time diagram of when case is described, each section signal condition and the oscillatory regime of light beam LB.In Figure 19, two-dimensional matrix Gm is shown A grid (1 pixel (pixel) unit) on the bit patterns PP of the pattern data to be described, substrate FS is set to such as side Y Upward size Py is 3 μm, and the size Px in X-direction is 3 μm.In addition, in Figure 19, SL1-1, SL1-2 shown in arrow, SL1-3, SL1-6 are shown with substrate FS movement (subscan of longitudinal direction) in the X direction and by description line SL1 The description line successively described, with each description line SL1-1, SL1-2, SL1-3, the interval in the X-direction of SL1-6 becomes Such as 1 pixel unit size Px (3 μm) 1/2 mode, set substrate FS conveying speed.
Moreover, size (the spot size on the direction XY for the point light SP being projected on substrate FS) be set as and 1 pixel list The identical degree or slightly larger in position.The size of light SP is put as a result,Diameter (the 1/e of Gaussian Profile as actual effect2Width, Or the half value full duration of peak strength) and be set to 3~4 μm or so, in incident point light SP continuous along description line SL1, For example in a manner of 1/2 overlapping of the diameter of the actual effect of light SP, to set the frequency of oscillation Fs of light beam LB (between the burst length Every) and based on polygonal mirror PM realize point light SP scan velocity V s.That is, if by the light supply apparatus 14A shown in Figure 17 The kind light that polarising beam splitter 208 projects is set as light beam Lse (Figure 18), then this kind of light beam Lse is in response to from control circuit 222 (clock generator 222a) output clock signal LTC each clock pulses and project as shown in Figure 19.
The clock signal clk 1 of counter unit CN1 supply in clock signal LTC and generative circuit 301 into Figure 18 It is configured to the frequency ratio of 1:2, in the case where clock signal LTC is 100MHz, passes through 1/ of the control circuit 500 in Figure 18 Clock signal clk 1 is set as 50MHz by 2 frequency dividers.In addition, as long as clock signal LTC and the frequency ratio of clock signal clk 1 are Integral multiple also can be set to that the setpoint frequency of clock signal clk 1 is for example dropped to 1/4 as 25MHz, and will put light The scan velocity V s of SP also drops to half.
Description bit string data Sdw shown in Figure 19 is equivalent to the serial data DL1 exported from generative circuit 301, here, example Such as corresponding to the pattern of pattern P P described on line SL1-2.Electrooptic element 206 in light supply apparatus 14A is in response to describing position String data Sdw switches polarization state, and therefore, kind light beam Lse is describing the phase that bit string data Sdw is On state (high, " 1 ") Between, it is generated by the kind light S1 of the dfb semiconductor laser diode 200 in Figure 17, is Off state describing bit string data Sdw During (low, " 0 "), generated by the kind light S2 of the dfb semiconductor laser diode 202 in Figure 17.Shown in above Figure 19 Scanning element U1 description exposure movement in other scanning elements U2~U6 be also it is identical.
In addition, being equipped with driving circuit in the control circuit 222 of light supply apparatus 14A, (driving circuit is describing bit string number During being On state (high, " 1 ") according to Sdw, kind of a light is generated from dfb semiconductor laser diode 200 in response to clock signal LTC S1 (steep pulsed light), during describing bit string data Sdw is Off state (low, " 0 "), in response to clock signal LTC and generate kind of light S2 (a wide pulsed light) from dfb semiconductor laser diode 202) in the case where, Figure 17, figure can be omitted Polarising beam splitter 208 shown in electrooptic element 206, Figure 17 shown in 18, absorber 210.
Like this, each pulsed light of light beam Lse is planted in response to clock generator 222a clock generated shown in Figure 17 Each clock pulses of signal LTC and export, therefore in the present embodiment, setting is for by clock in clock generator 222a The circuit structure that time (period) between the pulse of signal LTC locally increases and decreases.In the circuit structure, it is equipped with and believes as clock Benchmark (standard) clock generator, frequency counter circuit and the variable delay circuit in source etc. of number LTC.
Figure 20 is the reference clock signal TC0 and clock for indicating the reference clock generator in clock generator 222a The time diagram of relationship between signal LTC shows and does not carry out repairing based on multiplying power update information CMg shown in Figure 17, Figure 18 Positive state.Variable delay circuit in clock generator 222a makes always with fixed frequency Fs (regular time Td0) generation Reference clock signal TC0 postpone delay time DT0 corresponding with preset value, and as clock signal LTC output.Therefore, example Such as, if reference clock signal TC0 is 100MHz (Td0=10nS), as long as preset value (delay time DT0) does not change, Clock signal LTC is also continuously generated with 100MHz (Td0=10nS).
Therefore, it is set as such as flowering structure: by the frequency counter circuit in clock generator 222a to reference clock signal TC0 is counted, and after its count value reaches specified value Nv, makes the preset value set to variable delay circuit to fix quantitative change Change.Illustrate the situation by the time diagram of Figure 21.In Figure 21, pass through frequency counter circuit meter in reference clock signal TC0 It counts to before Nv, the preset value set to variable delay circuit is delay time DT0.Later, if passing through reference clock signal TC0 A clock pulses Kn and frequency counter circuit count to Nv, then to variable delay circuit setting preset value change at once For delay time DT1.Therefore, the clock pulses Kn+1 of the clock pulses Kn based on reference clock signal TC0 next generated Later clock pulses and each clock pulses (after K ' n+1) of clock signal LTC for generating is raw with delay time DT1 without exception At.
As a result, only when making the preset value set to variable delay circuit change a certain amount of, that is, only in clock signal Between clock pulses K ' n and clock pulses K ' n+1 of LTC, transformation period interval Td1, the clock of later clock signal LTC The time interval of pulse becomes Td0.In Figure 21, increases delay time DT1 compared with delay time DT0, make clock signal Time between two clock pulses of LTC increases compared with Td0, but similarly can also reduce.In addition, frequency counter circuit It is zeroed after counting down to Nv to reference clock signal TC0, starts again at the counting until Nv.
If the initial value of the preset value set to variable delay circuit is set as delay time DT0, by the change of delay time Change amount is set as ± Δ Dh, and the number that frequency counter circuit is zeroed is set as Nz, by frequency counter circuit whenever counting down to The delay time of the preset value successively set when Nv (whenever zero) to variable delay circuit is set as DTm, then delay time DTm is set The fixed relationship at DTm=DT0+Nz (± Δ Dh).Therefore, as shown in Figure 21, during the times N z of zero is 1 (m=1) The delay time DT1 of setting becomes DTm=DT1=DT0 ± Δ Dh, and what is set after next zero (Nz=2, m=2) generates prolongs Slow time DT2 becomes DTm=DT2=DT0+2 (± Δ Dh).Therefore, the variable quantity ± Δ Dh of delay time corresponds to clock Difference of the time Td1 relative to fiducial time Td0 between clock pulses K ' n and clock pulses K ' n+1 of signal LTC.
As described above, the movement for changing time interval, root According to the specified value Nv to frequency counter circuit configuration, multiple positions in the overall length that one is described line (SL1~SL6) are discrete Implement on ground.Figure 22 shows the situation.Figure 22, will be whenever the counting of frequency counter circuit in the length range for describing line SL1 Value reaches the multiple positions being zeroed when specified value Nv and is expressed as adjusting point CPP.Adjusting point CPP respectively under, only clock signal Relative to time Td0 contraction time ± Δ Dh between specific two clock pulses of LTC.
Therefore, if reference clock signal TC0 is set as 100MHz (Td0=10nS), by the main scanning direction of light SP The size of actual effect is set as 3 μm, the length for describing line SL1 (SL2~SL6 is also the same) is set as 30mm, if by two of light beam LB Continuous pulsed light, which projects the point light SP on substrate FS and is overlapped half or so (1.5 μm) on main scanning direction, to be described, The clock number of the reference clock signal TC0 then generated in the length range for describing line SL1 becomes 20000.In addition, when delay Between variation delta Dh it is very small relative to the time interval Td0 of benchmark, such as be configured to 2% or so.Under this condition, exist Make along the pattern for describing line SL1 description in the case where stretching 150ppm in main scanning direction (Y-direction), describes line SL1's The 150ppm of length 30mm is equivalent to 4.5 μm.Describe the ratio 150ppm or 4.5 μm of actual size of information of multiplying power about these It is stored in the memory portion BM1a in Figure 18 as information mg1.
Therefore, clock signal LTC 20000 clock pulses column in relative to time Td0 contraction time Δ Dh's The number of adjusting point CPP (Figure 22) becomes 4.5 μm/(1.5 μ m 2%)=150, sets to frequency counter circuit shown in Figure 22 Fixed maximum specified value Nv is about 133 by 20000/150.
In addition, the number of adjusting point CPP becomes 4.5 μ in the case where the variation delta Dh of delay time is set as 5% M/ (1.5 μ m 5%)=60, the maximum specified value Nv to frequency counter circuit configuration is about 333 by 20000/60.Picture In this way, the variation delta Dh of delay time is less than 10%, and it is smaller, therefore, even if there is the figure to be described at adjusting point CPP Case, since the size of the pattern is greater than the size of point light SP, so point light SP at because of adjusting point CPP can be ignored in main scanning Description error caused by slightly dislocation on direction.
The variation delta Dh of the above such delay time, the number of adjusting point CPP, to the regulation of frequency counter circuit The setting etc. of value Nv is controlled shown in Figure 17 according to the multiplying power update information CMg (ppm) exported from the control circuit 500 of Figure 18 Operation is carried out in circuit 222 processed, and frequency counter circuit, the variable delay circuit etc. in clock generator 222a are set It is fixed.
According to embodiment of above, the light beam LB from light supply apparatus 14A can be scanned successively to such as three to timesharing Unit U1, U3, U5 are respectively automatically supplied, sequentially can individually carry out each scanning element U1, U3, U5 along describe line SL1, SL3, The description of SL5 acts, and therefore, as shown in figure 18, can set by scanning element U1, U3, U5 has with the correction amount for describing multiplying power Information mg1, mg3, mg5 of pass.Even if the Y-direction of substrate FS as a result, it is flexible it is different, along several areas that Y-direction is split to form The respective expansion and contraction in domain is different, also can set optimal description multiplying power to each scanning element Un in corresponding mode and repair Positive quantity can get the advantages of also coping with the non-thread deformation of substrate FS.
More than, with make to converge on irradiated body (substrate FS) point light SP be scanned come depicting pattern device connect It connects and will become in the light supply apparatus 14A that light beam (laser) LB for putting light SP is projected, as shown in Figure 17, Figure 18, be equipped with: the 1st half Conductor Laser light source (200) generates fluorescent lifetime phase in response to the clock pulses (clock signal LTC) of specified period (Td0) Steep 1st pulsed light (kind light S1) short for specified period and high peak strength；2nd semiconductor laser light resource (202), in response to clock pulses, generate fluorescent lifetime it is shorter than specified period and than the 1st pulsed light (planting light S1) it is luminous when Between long, wide 2nd pulsed light that peak strength is low (kind light S2)；Optical amplifier fiber (216), for the 1st pulsed light (kind light S1) or the 2nd pulsed light (kind light S2) is incident；And switching device, the information based on the pattern to be described (describe bit string data Sdw), with make in the description of incident point light SP on irradiated body the 1st pulsed light (kind light S1) it is incident to optical amplifier fiber, Enter the 2nd pulsed light (kind light S2) to optical amplifier fiber (216) The mode penetrated switches over.The switching device is by selecting the 1st pulsed light (kind light S1) and the 2nd based on the pattern-information to be described The electrooptic element (206) of one party in pulsed light (kind light S2) or to generate the 1st pulsed light (kind light S1) and the 2nd arteries and veins The mode for washing the one party in (kind light S2) off controls the 1st semiconductor laser light resource (200) based on the pattern-information to be described It is constituted with the circuit of the driving of the 2nd semiconductor laser light resource (202).
This 3rd embodiment can also be suitable for the first embodiment described above or its variation, above-mentioned 2nd embodiment.? That is can be by the clock generator 222a root in control circuit 222 illustrate in the 3rd embodiment, light supply apparatus 14A Multiplying power update information CMg according to the control unit (control circuit 500) of description control shown in Figure 18 makes clock signal The function that the time interval of LTC locally (discretely) is stretched is suitable for the first embodiment described above or the light source dress of its variation Set the light supply apparatus 14 of 14, above-mentioned 2nd embodiment.In this case, light supply apparatus 14 can also not have dfb semiconductor laser Element 202, polarising beam splitter 204, electrooptic element 206, polarising beam splitter 208 and absorber 210, that is to say, that light The kind light S1 for the pulse type that source device 14 can also be such that dfb semiconductor laser diode 200 issues by optical amplifier fiber 216 is put Greatly, and as light beam LB it projects.In this case, since light supply apparatus 14 does not have electrooptic element 206, so generative circuit 301,303,305 serial data DL1, DL3, DL5 generated are sent to the description optical element 106 of scanning element Un or retouch It draws with optical element 150.
[the 4th embodiment]
Figure 23 is the exposure device EX comprising implementing exposure-processed to substrate (irradiated body) FS for indicating the 4th embodiment Device inspection apparatus 10 outline structure figure.In addition, in the case where being not particularly limited, to above-mentioned 1st~the 3rd embodiment (also including variation) identical structure marks identical appended drawing reference or illustration omitted, is only illustrated to its different piece.
In this 4th embodiment, in the same manner as above-mentioned 1st~the 3rd embodiment (also including variation), as light beam The exposure device EX of scanning means is exposure device, the i.e. so-called grating scanning mode without using the direct description mode of light shield Exposure device.Exposure device EX replaces the description head 16 illustrated in above-mentioned 1st~the 3 embodiment (also including variation) and has Standby light beam switching part 20 and photohead 22.In addition, exposure device EX is also equipped with multiple aligming microscope AMm (AM1~AM4). Although being not particularly illustrated in the 1st~the 3rd embodiment (also including variation), the exposure of above-mentioned 1st~the 3rd embodiment Electro-optical device EX also has multiple aligming microscope AMm (AM1~AM4).In addition, in the exposure device EX of the 4th embodiment, when So also have substrate transport mechanism 12, light supply apparatus 14 ' and control device 18.In addition, the light supply apparatus of this 4th embodiment 14 ' with the identical structure of light supply apparatus 14 (light supply apparatus 14A, 14B) that illustrates in the variation of above-mentioned 2nd embodiment Premised on (referring to Fig.1 7).The light beam LB that the light supply apparatus 14 ' projects is incident to photohead 22 via light beam switching part 20.
Light beam switching part 20 with it is into the multiple scanning element Un (U1~U6) for being constituted photohead 22, carry out a light SP A scanning element Un of one-dimensional scanning inject the mode of the light beam LB from light supply apparatus 14 ', to the optical path of light beam LB into Row switching.It will be in rear detailed description about the light beam switching part 20.
Photohead 22 has the multiple scanning element Uns (U1~U6) incident for light beam LB difference.Photohead 22 passes through multiple Scanning element Un (U1~U6) depicts pattern in a part for the substrate FS that the periphery of rotating cylinder DR is supported.Photohead 22 be the photohead for being arranged with the so-called Multibeam of mutually isostructural multiple scanning element Un (U1~U6).As shown in figure 23, Upstream side (the side-X for the conveyance direction that scanning element U1, U3, U5 of odd number configured relative to median plane Poc in substrate FS To side), and configure along the Y direction.Scanning element U2, U4, U6 of even number are configured relative to median plane Poc in substrate FS Conveyance direction downstream side (+X direction side), and configure along the Y direction.Scanning element U1, U3, U5 and even number of odd number Number scanning element U2, U4, U6 be symmetrically arranged about median plane Poc.That is, in the 4th embodiment, odd number The configuration of scanning element U1, U3, U5 and scanning element U2, U4, U6 of even number (also includes with above-mentioned 1st~the 3rd embodiment Variation) in the case where illustrating it is opposite.
Scanning element Un is so that the light beam LB from light supply apparatus 14 ' converges a light SP on the plane of illumination of substrate FS Mode project, while by rotation polygonal mirror PM (referring to Figure 28) make this light SP on the plane of illumination of substrate FS along Description line (scan line) SLn of defined straight line carries out one-dimensional scanning.
Multiple scanning element Un (U1~U6) are with the configuration of defined configuration relation.In this 4th embodiment, multiple scannings Unit Un (U1~U6) is configured to description line SLn (SL1~SL6) such as Figure 24, Tu25Suo of multiple scanning element Un (U1~U6) Show that (width direction of substrate FS, main scanning direction) does not engage separated from each other in the Y direction.In addition, such as the 1st~the 3rd embodiment party Described in formula (variation), existing will be expressed as LB1~LB6's to the light beam LB of each scanning element Un (U1~U6) incidence Situation.The light beam LB to scanning element Un incidence is the linear polarization (P polarization or S-polarization) polarized in specified directions Light beam is the light beam of P polarization in this 4th embodiment.In addition, there is also will respectively enter to six scanning element U1~U6 The case where light beam LB1~LB6 penetrated is expressed as light beam LBn.
As shown in figure 25, to cover exposure area W by whole scanning elements in multiple scanning element Un (U1~U6) Width direction entire scope mode, scanning area is shared by each scanning element Un (U1~U6).Each scanning element as a result, Depicting pattern is carried out in each region for the multiple regions that Un (U1~U6) can be split to form by the width direction along substrate FS.Example Such as, if the sweep length (length for describing line SLn) for the Y-direction realized based on a scanning element Un is set as the left side 30~60mm The right side, then by by scanning element U2, U4, U6 of these three scanning elements of scanning element U1, U3, U5 of odd number and even number this Three scanning elements, total six scanning element Un are configured along Y-direction, and the width for the Y-direction that will describe expands to 180 ~360mm or so.Each length (sweep length, the sweep length of main scanning direction) for describing line SL1~SL6 is essentially identical 's.
In addition, as described above, actual each description line SLn (SL1~SL6) is configured to be shone with point light SP The maximum length of actual scanning on face is penetrated compared to slightly shorter.It, can be in the maximum scan length (example of light SP by setting like this Such as, 31mm) in the range of, the position for describing line SLn (for example, sweep length is 30mm) is carried out on main scanning direction micro- It adjusts or is finely adjusted to multiplying power is described.The maximum scan length of point light SP is mainly by being located at polygonal mirror (rotation in scanning element Un Turning polygonal mirror) aperture of f θ lens FT (referring to Figure 28) after PM determines.
A plurality of description line SLn (SL1~SL6) is arranged in two column across median plane Poc in the circumferential direction of rotating cylinder DR.It is odd Several numbers description line SL1, SL3, SL5 upstream side (-X direction of the conveyance direction positioned at substrate FS relative to median plane Poc Side) substrate FS plane of illumination on.Description line SL2, SL4, SL6 of even number is located at substrate FS relative to median plane Poc Conveyance direction downstream side (+X direction side) substrate FS plane of illumination on.Describe the width of line SL1~SL6 and substrate FS Direction, i.e. the central axis AXo of rotating cylinder DR are substantially parallel.
Describe line SL1, SL3, SL5 to be configured at intervals along the width direction (scanning direction) of substrate FS straight On line.Describe line SL2, SL4, SL6 similarly, matches at intervals along the width direction (scanning direction) of substrate FS It sets on straight line.Along description line SL1, SL3, SL5 respectively scanning of the point light SP of the light beam LBn that is scanned of odd number Direction is one-dimensional square, is -Y direction.The light beam LBn being respectively scanned along description line SL2, SL4, SL6 of even number Point light SP scanning direction be one-dimensional square, be +Y direction.
In the 4th embodiment, multiple scanning element Un (U1~U6) are anti-according to predetermined order (regulation sequence) The scanning of the point light SP of light beam LBn is carried out again.For example, being U1 → U2 in the sequence for carrying out the scanning element Un of the scanning of light SP In the case where → U3 → U4 → U5 → U6, firstly, scanning element U1 carries out the scanning of primary point light SP.Then, work as scanning element When the end of scan of the point light SP of U1, scanning element U2 carries out the scanning of primary point light SP, when the end of scan, scanning element U3 carries out the scanning of primary point light SP, in this manner, multiple scanning element Un (U1~U6) are respectively carried out once by regulation sequence The scanning of point light SP.Moreover, putting light SP's back to scanning element U1 when the end of scan of the point light SP of scanning element U6 Scanning.Like this, multiple scanning element Un (U1~U6) carry out the scanning of light SP by regulation reiteration.
Each scanning element Un (U1~U6) is at least in XZ plane, with each light beam LBn towards the central axis AXo of rotating cylinder DR The mode of traveling irradiates each light beam LBn towards substrate FS.As a result, from each scanning element Un (U1~U6) towards substrate FS row Into light beam LBn optical path (beam center axis) it is coaxial (parallel) with the normal of the plane of illumination of substrate FS in XZ plane.Separately Outside, each scanning element Un (U1~U6) with to describe line SLn (SL1~SL6) irradiate light beam LBn in the face parallel with YZ plane The vertical mode of the interior plane of illumination relative to substrate FS irradiates light beam LBn towards substrate FS.That is, about light SP in quilt Main scanning direction on shadow surface, the light beam LBn (LB1~LB6) projected on substrate FS are scanned with telecentricity state.? This, will pass through from each midpoint by describing line SLn (SL1~SL6) as defined in each scanning element Un (U1~U6) and with substrate FS The vertical line (or also referred to as optical axis) of plane of illumination be referred to as and irradiate central axis L en (Le1~Le6) (referring to Figure 24).
Each irradiation central axis L en (Le1~Le6) will describe line SL1~SL6 and central axis AXo in XZ plane and connect Line made of knot.Respective irradiation central axis L e1, Le3, the Le5 of scanning element U1, U3, U5 of odd number is phase in XZ plane Equidirectional, respective irradiation central axis L e2, Le4, the Le6 of scanning element U2, U4, U6 of even number is phase Tongfang in XZ plane To.In addition, irradiation central axis L e1, Le3, Le5 and irradiation central axis L e2, Le4, Le6 be configured in XZ plane relative to The angle of median plane Poc is ± θ (referring to Figure 23).
Aligming microscope AMm (AM1~AM4) shown in Figure 23, as shown in figure 25, for the alignment to substrate FS is formed in Label MKm (MK1~MK4) is detected, and is equipped with multiple (being four in this 4th embodiment) along the Y direction.Alignment mark MKm (MK1~MK4) be for by the plane of illumination of substrate FS the predetermined pattern to be described of exposure area W and substrate FS Relatively align the reference mark of (alignment).Aligming microscope AMm (AM1~AM4) is supported in the periphery of rotating cylinder DR Alignment mark MKm (MK1~MK4) is detected on substrate FS.Aligming microscope AMm (AM1~AM4) with based on from photohead 22 The point light SP of light beam LBn (LB1~LB6) and the irradiated area being formed on substrate FS (describes line SL1~SL6 to be surrounded Region) compared to the upstream side (-X direction side) for the conveyance direction for being located at substrate FS.
Aligming microscope AMm (AM1~AM4) is included the light source projected to mutatis mutandis illumination light to substrate FS, is obtained base The observation light of the intensified image comprising the regional area (viewing area) including alignment mark MKm (MK1~MK4) on the surface of plate FS System (include object lens) and during substrate FS is moved along conveyance direction with high-speed shutter shoot the intensified image CCD, The photographing elements such as CMOS.Aligming microscope AMm (AM1~AM4) shooting obtain image pickup signal (image data) ig (ig1~ Ig4) it is sent to control device 18.Control device 18 is based on image analysis and the shooting wink of image pickup signal ig (ig1~ig4) Between rotating cylinder DR rotation position information (based on shown in Figure 24 read scale portion SD encoder EN1a, EN1b obtain Measured value), to detect the position of alignment mark MKm (MK1~MK4), thus accurately detect substrate FS position.This It outside, is the light for the wave band that hardly there is sensitivity to the photonasty functional layer on substrate FS to mutatis mutandis illumination light, for example, being wave The light of long 500~800nm or so.
Alignment mark MK1~MK4 is located at around each exposure area W.The substrate of alignment mark MK1, MK4 in exposure area W The two sides of the width direction of FS along substrate FS longitudinal direction at certain intervals DI be formed with it is multiple.Alignment mark MK1 shape At the -Y direction side of the width direction in substrate FS, alignment mark MK4 is formed in the +Y direction side of the width direction of substrate FS.This In the state that kind alignment mark MK1, MK4 are configured to deform in substrate FS not by big tension or by thermal process, It is located at same position in the longitudinal direction (X-direction) of substrate FS.Moreover, alignment mark MK2, MK3 alignment mark MK1 with it is right Fiducial mark remembers between MK4, and more than the +X direction side of exposure area W and the -X direction side white portion along substrate FS width direction (short side direction) and formed.Alignment mark MK2, MK3 are formed between exposure area W and exposure area W.Alignment mark MK2 shape At the -Y direction side of the width direction in substrate FS, alignment mark MK3 is formed in the +Y direction side of substrate FS.
Exist moreover, being arranged in the alignment mark MK1 of the side end of the -Y direction of the substrate FS and alignment mark MK2 in remaining white portion The interval in the Y direction the alignment mark MK2 and alignment mark MK3 at interval, remaining white portion in Y-direction and it is arranged in substrate FS The interval in the Y direction alignment mark MK3 in alignment mark MK4 and remaining white portion of side end of +Y direction be set to identical Distance.These alignment marks MKm (MK1~MK4) can be formed together in the formation of the 1st layer of pattern layer.For example, can be When being exposed to the 1st layer of pattern, alignment mark out is also exposed together around the exposure area W for wanting exposing patterns Pattern.In addition, alignment mark MKm can also be formed in the W of exposure area.For example, can be in the W of exposure area along exposure region The profile of domain W is formed.In addition, exposure region can also be will be formed in the case where forming alignment mark MKm in the W of exposure area The pattern part of specific position in the pattern of electronic device in the W of domain or the part of specific shape are utilized as alignment mark MKm.
Aligming microscope AM1 is configured to the alignment mark MK1 in viewing area (detection zone) Vw1 for being present in object lens It is shot.Similarly, aligming microscope AM2~AM4 is configured to pair in the viewing area Vw2~Vw4 for being present in object lens Fiducial mark note MK2~MK4 is shot.Therefore, the position of multiple aligming microscope AM1~AM4 and multiple alignment mark MK1~MK4 It sets accordingly, is arranged from the -Y direction side of substrate FS by the sequence of aligming microscope AM1~AM4.Aligming microscope AMm (AM1~ AM4) it is arranged to, the viewing area Vw (Vw1~Vw4) of exposure position (describing line SL1~SL6) and aligming microscope AMm are in the side X Upward distance is shorter than the length of exposure area W in the X direction.The quantity for the aligming microscope AMm being arranged in the Y direction can It is changed according to the quantity of the alignment mark MKm in the width direction for being formed in substrate FS.In addition, viewing area Vw1~Vw4 exists Size on the plane of illumination of substrate FS is according to the size and/or alignment precision (position measurement precision) of alignment mark MK1~MK4 And set, it is the size of 100~500 μm of square or so.Although in addition, in the 1st~the 3rd embodiment (also including variation) It is not particularly illustrated, but is also formed with multiple alignment mark MKm on the substrate FS used in above-mentioned 1st~the 3rd embodiment.
As shown in figure 24, at the both ends of rotating cylinder DR, equipped with the circumferential whole model having in the outer peripheral surface of rotating cylinder DR Be formed as the scale portion SD (SDa, SDb) of cricoid scale in enclosing.Scale portion SD (SDa, SDb) is in the periphery of rotating cylinder DR The diffraction grating for being equipped with grid line concavely or convexly is carved in the circumferential direction in face with a fixed spacing (for example, 20 μm), is configured to increment The scale of type.Scale portion SD (SDa, SDb) is integrally rotated around central axis AXo and rotating cylinder DR.In addition, with the scale portion SD (SDa, SDb) opposite mode is equipped with multiple encoders (scale read head) ENn.Rotation of the encoder ENn to rotating cylinder DR Carry out optical detection is set in indexing.Relatively with the scale portion SDa of the end for the -Y direction side for being located at rotating cylinder DR, if there are three compile Code device ENn (EN1a, EN2a, EN3a).Similarly, opposite with the scale portion SDb of end of +Y direction side of rotating cylinder DR is located at Ground, if there are three encoder ENn (EN1b, EN2b, EN3b).Although in addition, in the 1st~the 3rd embodiment (also comprising deformation Example) in be not particularly illustrated, but the both ends of the rotating cylinder DR of above-mentioned 1st~the 3rd embodiment be equipped with scale portion SD (SDa, SDb), multiple encoder En (EN1a~EN3a, EN1b~EN3b) is equipped in a manner of corresponding thereto.
Light of the encoder ENn (EN1a~EN3a, EN1b~EN3b) towards scale portion SD (SDa, SDb) projection measurement Beam by carrying out Photoelectric Detection to its reflected beams (diffraction light), and exports the detection as pulse signal to control device 18 Signal.Control device 18 detects signal (pulse signal) to it by counter circuit 356a (referring to Figure 33) and counts, by This can measure the rotary angle position and angle change of rotating cylinder DR with the resolution ratio of sub-micron.Counter circuit 356a points Individually the detection signal of each encoder ENn (EN1a~EN3a, EN1b~EN3b) is not counted.Control device 18 also can The enough conveying speed that substrate FS is measured according to the angle change of rotating cylinder DR.To each encoder ENn (EN1a~EN3a, EN1b ~EN3b) the respective counter circuit 356a that is individually counted of detection signal each encoder ENn (EN1a~EN3a, EN1b~EN3b) when detecting origin label (origin pattern) ZZ of the circumferential a part for being formed in scale portion SDa, SDb, it will be with The corresponding count value of encoder ENn resets to 0.
Encoder EN1a, EN1b configuration are on setting rhumb line Lx1.It is that will encode in XZ plane that rhumb line Lx1, which is arranged, Launching position (reading position) of the light beam of the measurement of device EN1a, EN1b on scale portion SD (SDa, SDb) and central axis AXo The line of connection.In addition, setting rhumb line Lx1 is in XZ plane by the viewing area of each aligming microscope AMm (AM1~AM4) The line of Vw (Vw1~Vw4) and central axis AXo connection.
Encoder EN2a, EN2b are located at the upstream side (-X direction of the conveyance direction of substrate FS relative to median plane Poc Side), also, it is located at compared with encoder EN1a, EN1b the downstream side (+X direction side) of the conveyance direction of substrate FS.Encoder EN2a, EN2b configuration are on setting rhumb line Lx2.It is in XZ plane by the meter of encoder EN2a, EN2b that rhumb line Lx2, which is arranged, The line of launching position of the light beam of survey on scale portion SD (SDa, SDb) and central axis AXo connection.Setting rhumb line Lx2 It is be overlapped for equal angular position with irradiation central axis L e1, Le3, Le5 in XZ plane.
Encoder EN3a, EN3b are located at the downstream side (+X direction of the conveyance direction of substrate FS relative to median plane Poc Side).Encoder EN3a, EN3b configuration are on setting rhumb line Lx3.It is in XZ plane by encoder that rhumb line Lx3, which is arranged, The line of launching position of the light beam of the measurement of EN3a, EN3b on scale portion SD (SDa, SDb) and central axis AXo connection.It should It is be overlapped for equal angular position with irradiation central axis L e2, Le4, Le6 in XZ plane that rhumb line Lx3 is set.
The count value (rotary angle position) of detection signal from the encoder EN1a, EN1b, come self-encoding encoder EN2a, The count value (rotary angle position) of the detection signal of EN2b and the count value for detecting signal for carrying out self-encoding encoder EN3a, EN3b (rotary angle position) detects the origin label ZZ's curled up at direction one for being attached to rotating cylinder DR in each encoder ENn Moment is reset as zero.Therefore, will based on the count value of encoder EN1a, EN1b be the 1st value (for example, 100) when, winding In position (each viewing area Vw1 of aligming microscope AM1~AM4 of the substrate FS on rotating cylinder DR on setting rhumb line Lx1 The position of~Vw4) be set as the 1st position in the case where, when the 1st position on substrate FS be transported to setting rhumb line Lx2 on When the position position of line SL1, SL3, SL5 (describe), the count value based on encoder EN2a, EN2b become the 1st value (such as 100).Similarly, when the 1st position on substrate FS be transported to setting rhumb line Lx3 on position (describe line SL2, SL4, The position of SL6) when, the count value of the detection signal based on encoder EN3a, EN3b becomes the 1st value (for example, 100).
However, substrate FS is wound compared with scale portion SDa, the SDb at the both ends of rotating cylinder DR in inside.In Figure 23, The radius from central axis AXo of the outer peripheral surface of scale portion SD (SDa, SDb) is set to the outer peripheral surface than rotating cylinder DR from The radius that central axis AXo rises is small.But as shown in figure 24, the outer peripheral surface and volume of scale portion SD (SDa, SDb) also be can be set to The outer peripheral surface for being wound on the substrate FS on rotating cylinder DR becomes coplanar.That is, also can be set to scale portion SD (SDa, SDb) Outer peripheral surface radius (distance) from central axis AXo and the outer peripheral surface of the substrate FS on rotating cylinder DR it is (illuminated Face) the radius (distance) from central axis AXo it is identical.As a result, encoder ENn (EN1a, EN1b, EN2a, EN2b, EN3a, EN3b) can radial position identical with the plane of illumination of substrate FS of rotating cylinder DR is wound in detect scale portion SD (SDa, SDb), the measurement position because of encoder ENn can be reduced and handle position (describing line SL1~SL6) in the radial direction of rotating cylinder DR Upper different and generation Abbe errors.
According to the above, based on detected by aligming microscope AMm (AM1~AM4) alignment mark MKm (MK1~ MK4 position (count value obtained based on encoder EN1a, EN1b)) determines the long side side of substrate FS by control device 18 The starting position of the description exposure of exposure area W in (X-direction), at this point, by the count value based on encoder EN1a, EN1b It is set as the 1st value (for example, 100).In this case, when the count value based on encoder EN2a, EN2b becomes the 1st value (for example, 100) When, the starting position of the description exposure of the exposure area W in the longitudinal direction of substrate FS, which is located at, to be described on line SL1, SL3, SL5. Therefore, scanning element U1, U3, U5 can the count value based on encoder EN2a, EN2b come the scanning of starting point light SP.In addition, Exposure region when the count value based on encoder EN3a, EN3b becomes the 1st value (for example, 100), on the length direction of substrate FS The starting position of the description exposure of domain W, which is located at, to be described on line SL2, SL4, SL6.Therefore, scanning element U2, U4, U6 can be based on The count value of encoder EN3a, EN3b carry out the scanning of starting point light SP.Although in addition, (also including in the 1st~the 3rd embodiment Variation) in be not particularly illustrated, but the exposure device EX of above-mentioned 1st~the 3rd embodiment also has encoder ENn (EN1a ~EN3a, EN1b~EN3b) and scale portion SD (SDa, SDb).
Figure 26 is the structure chart of light beam switching part 20.Light beam switching part 20 has multiple selection optical element AOMn (AOM1~AOM6), multiple collector lens CD1~CD6, multiple reflecting mirror M1~M12, multiple cell side incidence mirror IM1~IM6, Multiple collimation lens CL1~CL6 and absorber TR.Selection with optical element AOMn (AOM1~AOM6) relative to light beam LB and It is the acoustooptic modulation element (AOM:Acousto-Optic Modulator) driven by ultrasonic signal with transmittance.These Optical component (selection optical element AOM1~AOM6, collector lens CD1~CD6, reflecting mirror M1~M12, cell side incidence mirror IM1~IM6, collimation lens CL1~CL6 and absorber TR) it is supported by the bearing part IUB of plate.Bearing part IUB exists The top of multiple scanning element Un (U1~U6), (-Z direction side) supports these optical components from below.Therefore, bearing part IUB also has will be as selection optical element AOMn (AOM1~AOM6) and multiple scanning element Un (U1~U6) of pyrotoxin Spaced heat function.
The optical path of light beam LB bends to zigzag by reflecting mirror M1~M12 from light supply apparatus 14 ', and light beam LB is directed to suction Acceptor TR.Hereinafter, with optical element AOMn (AOM1~AOM6) being that Off state (is not applied ultrasonic signal in selection State) in the case where be described in detail.Light beam LB (collimated light beam) and Y-axis from light supply apparatus 14 ' are in parallel to +Y direction It advances, passes through from collector lens CD1 incident to reflecting mirror M1.Light beam LB from reflecting mirror M1 to -X direction lateral reflection linearly It is transmitted from the 1st selection optical element AOM1 of the focal position (beam waist position) for being configured at collector lens CD1, and passes through standard Straight lens CL1 becomes collimated light beam again and reaches reflecting mirror M2.Light beam LB from from reflecting mirror M2 to +Y direction lateral reflection is from poly- Optical lens CD2 pass through after by reflecting mirror M3 to +X direction lateral reflection.
The light beam LB reflected by reflecting mirror M3 is linearly from the focal position (beam waist position) for being configured at collector lens CD2 The 2nd selection transmitted with optical element AOM2, and collimated light beam is become by collimation lens CL2 again and reaches reflecting mirror M4. Light beam LB from from reflecting mirror M4 to +Y direction lateral reflection from collector lens CD3 pass through after by reflecting mirror M5 to -X direction lateral reflection. Light beam LB from from reflecting mirror M5 to -X direction lateral reflection is linearly from focal position (the beam waist position for being configured at collector lens CD3 Set) the 3rd selection transmitted with optical element AOM3, and collimated light beam is become by collimation lens CL3 again and reaches reflecting mirror M6.Light beam LB from from reflecting mirror M6 to +Y direction lateral reflection from collector lens CD4 pass through after it is anti-to +X direction side by reflecting mirror M7 It penetrates.
The light beam LB reflected by reflecting mirror M7 is linearly from the focal position (beam waist position) for being configured at collector lens CD4 The 4th selection transmitted with optical element AOM4, and collimated light beam is become by collimation lens CL4 again and reaches reflecting mirror M8. Light beam LB from from reflecting mirror M8 to +Y direction lateral reflection from collector lens CD5 pass through after by reflecting mirror M9 to -X direction lateral reflection. Light beam LB from from reflecting mirror M9 to -X direction lateral reflection is linearly from focal position (the beam waist position for being configured at collector lens CD5 Set) the 5th selection transmitted with optical element AOM5, and collimated light beam is become by collimation lens CL5 again and reaches reflecting mirror M10.Light beam LB from from reflecting mirror M10 to +Y direction lateral reflection from collector lens CD6 pass through after by reflecting mirror M11 to +X direction side Reflection.The light beam LB reflected by reflecting mirror M11 is linearly from the focal position (beam waist position) for being configured at collector lens CD6 6th selection is transmitted with optical element AOM6, and becomes collimated light beam again by collimation lens CL6, from reflecting mirror M12 to-Y After the lateral reflection of direction, absorber TR is reached.Absorber TR is to absorb light beam LB to inhibit light beam LB to leak to the outside Absorber of light.
As described above, selection optical element AOM1~AOM6 is so that the light beam LB from light supply apparatus 14 ' is successively saturating The mode penetrated configures, and with by collector lens CD1~CD6 and collimation lens CL1~CL6 in each selection optical element The mode that the inside of AOM1~AOM6 forms the beam waist of light beam LB configures.Reduce as a result, to selection optical element AOM1~ The diameter of the light beam LB of AOM6 (acoustooptic modulation element) incidence improves diffraction efficiency and improves responsiveness.
Each selection with optical element AOMn (AOM1~AOM6) when being applied ultrasonic signal (high-frequency signal), will make into The light beam LB (zero degree light) penetrated is using a diffraction light of angle of diffraction diffraction corresponding with higher frequency as outgoing beam (light beam LBn it) generates.It, will be from multiple selection optical element AOMn (AOM1~AOM6) respectively as one in this 4th embodiment The light beam LBn that secondary diffraction light projects is set as light beam LB1~LB6, if each selection is played with optical element AOMn (AOM1~AOM6) Handle the function of the optical path-deflecting of the light beam LB from light supply apparatus 14 '.However, as described above, actual sound The generation efficiency of diffraction light of optical modulation element is 80% or so of zero degree light, therefore, selection optical element AOMn Light beam LB1~LB6 that (AOM1~AOM6) is respectively deflected is reduced compared with the intensity of original light beam LB.In addition, selecting When with some of optical element AOMn (AOM1~AOM6) being On state, not diffraction and straight zero degree light residual 20% is left The right side, but it is finally absorbed body TR absorption.
In addition, selection generates refractive index in the prescribed direction that optical element AOMn is by ultrasonic wave in transmitting member Periodically thick close variation diffraction grating, therefore in the feelings that incident beam LB is rectilinearly polarized light (P-polarized light or S polarized light) Under condition, the period direction of polarization direction and diffraction grating is configured to the generation efficiency (diffraction efficiency) of a diffraction light most It is high.The case where deflecting incident light beam LB to Z-direction diffraction is configured to optical element AOMn in selection as shown in Figure 26 Under, it is selecting with the period direction of the diffraction grating generated in optical element AOMn to be also Z-direction, therefore, with matched Mode sets the polarization direction of the light beam LB of (adjustment) from light supply apparatus 14 '.
Moreover, as shown in figure 26, multiple selections are each configured to make deflection with optical element AOMn (AOM1~AOM6) Light beam LB1~LB6 (diffraction light) is deflected relative to incident light beam LB to -Z direction.From selection optical element AOMn (AOM1~AOM6) each self-deflection and the light beam LB1~LB6 projected, to be located at from selection optical element AOMn (AOM1~ AOM6) respectively leave predetermined distance position cell side incidence mirror IM1~IM6 projection, therefore to -Z direction with in irradiation The mode of mandrel Le1~Le6 parallel (coaxial) is reflected.By cell side incidence mirror IM1~IM6 (be also only called below mirror IM1~ IM6) the light beam LB1~LB6 reflected is from opening portion TH1~TH6 of bearing part IUB is formed in each by along irradiation The mode of central axis L e1~Le6 is respectively incident to scanning element Un (U1~U6).
Structure, function, effect of each selection optical element AOMn (AOM1~AOM6) etc. can be made mutually the same.It is multiple Selection carrys out the On/Off of the driving signal (high-frequency signal) of self-control device 18 with optical element AOMn (AOM1~AOM6) basis, It will make the generation On/Off of the diffraction light of incident light beam LB diffraction.For example, selection be not applied with optical element AOM1 Carry out the driving signal (high-frequency signal) of self-control device 18 when being Off state, does not make incident light beam LB diffraction and make it thoroughly It penetrates.Therefore, from selection with optical element AOM1 transmitted through light beam LB transmitted and incident to reflecting mirror M2 from collimation lens CL1. On the other hand, select with optical element AOM1 when being applied to the driving signal of self-control device 18 and for On state, make into The light beam LB diffraction penetrated and towards mirror IM1.That is, being cut to selection with optical element AOM1 by the driving signal It changes.Mirror IM1 will be from the light beam LB1 of selection optical element AOM1 diffraction to scanning element U1 lateral reflection.The light reflected by mirror IM1 Beam LB1 passes through incident to scanning element U1 along irradiation central axis L e1 from the opening portion TH1 of bearing part IUB.Therefore, mirror IM1 is reflected incident light beam LB1 with making the optical axis of the light beam LB1 of reflection become coaxial mode with irradiation central axis L e1.Separately Outside, when selecting with optical element AOM1 as On state, from selection with optical element AOM1 linearly transmitted through light beam LB Zero degree light (20% or so intensity of incident beam) is from collimation lens CL1~CL6, collector lens CD2~CD6, anti-thereafter It penetrates mirror M2~M12 and selection optical element AOM2~AOM6 transmission and reaches absorber TR.
Figure 27 A is switched based on selection with the optical path of the optical element AOM1 light beam LB carried out from +Z direction side Figure, Figure 27 B are the figures switched based on selection with the optical path of the optical element AOM1 light beam LB carried out from -Y direction side.It is driving When dynamic signal is Off state, selection optical element AOM1 do not make incident light beam LB diffraction and directly by it towards reflecting mirror The transmission of the side M2.On the other hand, when driving signal is On state, selection optical element AOM1, which is generated, makes incident light beam LB To the light beam LB1 of -Z direction side diffraction, and make it towards mirror IM1.Therefore, in X/Y plane, do not change from selection optics member The direction of travel of the light beam LB1 (diffraction light) of light beam LB (zero degree light) and deflection that part AOM1 is projected, change in z-direction The direction of travel of light beam LB1 (diffraction light).Like this, control device 18 is by making to be applied to selection with optical element AOM1 The driving signal (high-frequency signal) added becomes On/Off (high/low), to switch selection optical element AOM1, thus to being light beam LB is switched over the light beam LB1 of optical element AOM2 or deflection towards scanning element U1 towards subsequent selection.
Similarly, it selects with optical element AOM2 to be Off shape in the driving signal (high-frequency signal) for carrying out self-control device 18 When state, incident light beam LB is not made (not used up and learn element AOM1 diffraction and transmit the light beam LB come) diffraction by selection and make it It is transmitted to the side collimation lens CL2 (side reflecting mirror M4), when the driving signal for carrying out self-control device 18 is On state, makes incidence The diffraction light of light beam LB, that is, light beam LB2 is towards mirror IM2.Mirror IM2 by from the light beam LB2 of selection optical element AOM2 diffraction to Scanning element U2 lateral reflection.The light beam LB2 reflected by mirror IM2 passes through from the opening portion TH2 of bearing part IUB, with irradiation center Axis Le2 becomes coaxially incident to scanning element U2.Moreover, selection is carrying out self-control device 18 with optical element AOM3~AOM6 Driving signal (high-frequency signal) when being Off state, do not make incident light beam LB diffraction and make it to collimation lens CL3~CL6 Side (side reflecting mirror M6, M8, M10, M12) transmission makes incident light when the driving signal for carrying out self-control device 18 is On state A diffraction light, that is, light beam LB3~LB6 of beam LB is towards mirror IM3~IM6.Mirror IM3~IM6 will be by selection optical element Light beam LB3~LB6 of AOM3~AOM6 diffraction is to scanning element U3~U6 lateral reflection.The light beam LB3 reflected by mirror IM3~IM6 ~LB6 and irradiation central axis L e3~Le6 become coaxially, from opening portion TH3~TH6 of bearing part IUB each by and to Scanning element U3~U6 is incident.Like this, control device 18 is by making respectively to be applied to selection with optical element AOM2~AOM6 The driving signal (high-frequency signal) added becomes On/Off (high/low), to switch certain in selection optical element AOM2~AOM6 One, thus to being light beam LB towards subsequent selection optical element AOM3~AOM6 or absorber TR or the light of deflection One of beam LB2~LB6 switches over towards corresponding scanning element U2~U6.
As described above, light beam switching part 20 has straight along the direction of travel of the light beam LB from light supply apparatus 14 ' Multiple selections of configuration are arranged with optical element AOMn (AOM1~AOM6), thereby, it is possible to switch the optical path of light beam LB to select one A scanning element Un for light beam LBn incidence.For example, making to select in the case where light beam LB1 to be made is incident to scanning element U1 Become On state with optical element AOM1, in the case where light beam LB3 to be made is incident to scanning element U3, uses up selection Learning element AOM3 becomes On state.Multiple selection optical element AOMn (AOM1~AOM6) and multiple scanning element Un Whether (U1~U6) is arranged in correspondence with, to switching over light beam LBn to corresponding scanning element Un incidence.
Since multiple scanning element Un (U1~U6) carry out the movement that the scanning of light SP is put in implementation, institute by regulation reiteration Also correspondingly with light beam switching part 20, some incident scanning element U1~U6 for light beam LB1~LB6 is carried out Switching.For example, in the case where carrying out the sequence of scanning element Un of the scanning of light SP is U1 → U2 → → U6, light Beam switching part 20 also correspondingly, switches the scanning list for light beam LBn incidence by U1 → U2 → → U6 sequence First Un.
According to the above, each selection of light beam switching part 20 is with optical element AOMn (AOM1~AOM6) as long as only existing It is On state during the single pass of the respective point light SP carried out based on polygonal mirror PM of scanning element Un (U1~U6).In detail Feelings will be described later, if the reflecting surface number of polygonal mirror PM is set as Np, the rotation speed of polygonal mirror PM is set as Vp (rpm), then Time Tss corresponding with the rotation angle of amount of one side of reflecting surface RP of polygonal mirror PM becomes Tss=60/ (NpVp) (second).For example, polygonal mirror PM's once rotates to be 2 milliseconds in the case where reflecting surface number Np is 8, rotation speed Vp is 30,000, Time Tss is 0.25 millisecond.Being converted into frequency is then 4kHz, it means that if with for by the light of the wavelength of ultraviolet region Beam LB is compared in response to describing the data with the acoustooptic modulation element that tens MHz degree are modulated at high speed, then can be phase When the acoustooptic modulation element of low response frequency.Therefore, it is able to use and deflects relative to incident light beam LB (zero degree light) The big acoustooptic modulation element of the angle of diffraction of light beam LB1~LB6 (diffraction light), will be relative to from selection optical element AOM1 ~AOM6 linearly by light beam LB mirror IM1~IM6 (figure for being separated of light beam LB1~LB6 for deflecting of travelling route 26, Figure 27 A, Figure 27 B) configuration become easy.
In addition, the dynamic of the scanning for respectively carrying out once putting light SP by regulation sequence is repeated in multiple scanning element U1~U6 Make, therefore correspondingly, the serial data DLn of the pattern data of each scanning element Un is sequentially outputted to light supply apparatus by regulation 14 ' driving circuit 206a.It is known as the serial data DLn for being sequentially output driving circuit 206a to describe bit string data Sdw. For example, in the case where regulation sequence is U1 → U2 → → U6, firstly, the serial data DL1 of the amount of a column is output to Driving circuit 206a, then, the serial data DL2 of the amount of a column are output to driving circuit 206a, describe position in this manner, constituting Serial data DL1~DL6 of the amount of a column of string data Sdw is sequentially output driving circuit 206a.Then, next column is serial Data DL1~DL6 is sequentially output driving circuit 206a as bit string data Sdw is described.It is defeated about bit string data Sdw will be described The specific structure for arriving driving circuit 206a out will be in rear detailed description.
The structure of scanning element Un (U1~U6) can be the structure used in above-mentioned 1st~the 3rd embodiment, but In this 4th embodiment, the scanning element Un of structure as shown in Figure 28 is used.Alternatively, it is also possible to be swept described below Retouch the scanning element that unit Un is used as above-mentioned 1st~the 3rd embodiment.
Hereinafter, being carried out referring to optical texture of the Figure 28 to the scanning element Un (U1~U6) used in the 4th embodiment Explanation.Further, since each scanning element Un (U1~U6) has identical structure, so only scanning element U1 is illustrated, it is right In other scanning elements Un, the description thereof will be omitted.In addition, the direction parallel with irradiation central axis L en (Le1) is set as in Figure 28 The direction Zt, by the plane orthogonal with the direction Zt and substrate FS from processing unit PR1 via exposure device EX towards processing fill The direction for setting PR2 is set as the direction Xt, will be in the plane orthogonal with the direction Zt and the direction orthogonal with the direction Xt is set as the side Yt To.That is, the three-dimensional coordinate of Xt, Yt, Zt of Figure 28 be by the three-dimensional coordinate of X, Y, Z of Figure 23 centered on Y-axis so that Z Three-dimensional coordinate made of the axis direction mode parallel with irradiation central axis L en (Le1) rotates.
As shown in figure 28, in scanning element U1, the plane of illumination along the incoming position from light beam LB1 to substrate FS is The direction of travel of light beam LB1 only, be equipped with reflecting mirror M20, optical beam expander (beam expander) BE, reflecting mirror M21, partially Beam splitter BS, reflecting mirror M22, shifting shake as optical component SR, field stop FA, the wave plate of reflecting mirror M23, λ/4 QW, cylindrical lens CYa, reflecting mirror M24, polygonal mirror PM, f θ lens FT, reflecting mirror M25, cylindrical lens CYb.Moreover, also being set in scanning element U1 There are the optical lens system G10 and light of the reflected light of the plane of illumination for carrying out self-reference substrate FS via polarising beam splitter BS detection Detector DTS.
The light beam LB1 for being incident on scanning element U1 advances towards the direction-Zt, has tilted 45 ° to relative to XtYt plane Reflecting mirror M20 is incident.Be incident on scanning element U1 light beam LB1 axis and the coaxial mode of irradiation central axis L e1 to Reflecting mirror M20 is incident.Reflecting mirror M20 as functioning light beam LB1 to the beam incident optical component of scanning element U1 incidence, Incident light beam LB1 is reflected towards reflecting mirror M21 along the direction-Xt along the optical axis set in parallel with Xt axis.Therefore, with Xt The optical axis for the light beam LB1 that axis is advanced in parallel is orthogonal with irradiation central axis L e1 in the face parallel with XtZt plane.By reflecting mirror M20 reflection light beam LB1 from along the light beam LB1 to advance in parallel with Xt axis optical axis configure optical beam expander BE transmission and It is incident to reflecting mirror M21.Optical beam expander BE makes the enlarged-diameter of the light beam LB1 of transmission.Optical beam expander BE has optically focused saturating Mirror Be1 and the light beam LB1 that dissipates after being restrained by collector lens Be1 is made to become the collimation lens Be2 of directional light.
Reflecting mirror M21 tilts 45 ° of ground configurations relative to YtZt plane, by incident light beam LB1 towards polarising beam splitter BS is reflected along the direction-Yt.The polarised light parting surface of polarising beam splitter BS tilts 45 ° of ground configurations relative to YtZt plane, and P is inclined The light beam of vibration reflects, and transmits the light beam of the linear polarization (S-polarization) polarized on the direction orthogonal with P polarization.Be incident on to The light beam LB1 of scanning element U1 is the light beam of P polarization, therefore, the light beam LB1 of polarising beam splitter BS self-reflection in future mirror M21 It reflects to the direction-Xt and is guided to the side reflecting mirror M22.
Reflecting mirror M22 tilts 45 ° of ground configurations relative to XtYt plane, by incident light beam LB1 direction and reflecting mirror M22 Separated reflecting mirror M23 is reflected along the direction-Zt on the direction-Zt.The light beam LB1 reflected by reflecting mirror M22 is put down along with Zt axis Capable optical axis passes through as optical component SR and field stop (field stop) FA from moving, and incident to reflecting mirror M23.It moves as optics Component SR is in the plane (XtYt plane) orthogonal with the direction of travel of light beam LB1, two-dimensionally in the section of adjustment light beam LB1 Center.Move the two bauerite systems as optical component SR by the optical axis configuration along the light beam LB1 to advance in parallel with Zt axis Parallel flat Sr1, Sr2 constitute, parallel flat Sr1 can tilt around Xt axis, and parallel flat Sr2 can be tilted around Yt axis.It is logical Crossing tilts parallel flat Sr1, Sr2 rotating around Xt axis, Yt axis, and flat in the XtYt orthogonal with the direction of travel of light beam LB1 In face, make the center of light beam LB1 two-dimensionally microdisplacement.Parallel flat Sr1, Sr2 under the control of control device 18, Not shown actuator (driving portion) driving.
Reflecting mirror is reached as the light beam LB1 of optical component SR is penetrated from the circular open of field stop FA by moving M23.The circular open of field stop FA is to the intensity distribution in the section by the amplified light beam LB1 of optical beam expander BE The diaphragm that peripheral portion is covered.If the variable iris light that adjust the aperture of the circular open of field stop FA can Door screen can then adjust the intensity of light SP (brightness).
Reflecting mirror M23 tilts 45 ° of ground configurations relative to XtYt plane, and incident light beam LB1 direction is existed with reflecting mirror M23 The separated reflecting mirror M24 in the direction+Xt is reflected along the direction+Xt.The light beam LB1 reflected by reflecting mirror M23 is from the wave plate of λ/4 QW and cylinder Lens CYa transmission and it is incident to reflecting mirror M24.Reflecting mirror M24 by incident light beam LB1, towards polygonal mirror, (sweep by polygonal rotating mirror Retouch with deflection component) PM reflection.Polygonal mirror PM is saturating towards the f θ with the optical axis AXf parallel with Xt axis by incident light beam LB1 Mirror FT is reflected along the direction+Xt.Polygonal mirror PM in order to make light beam LB1 point light SP be scanned on the plane of illumination of substrate FS, And by incident light beam LB1 in the face intrinsic deflection (reflection) parallel with XtYt plane.Specifically, polygonal mirror PM has along Zt axis The rotary shaft AXp and (be eight anti-in this 4th embodiment around multiple reflecting surface RP that rotary shaft AXp is formed that direction extends Penetrate face RP).By rotating polygonal mirror PM to defined direction of rotation centered on rotary shaft AXp, and can make to be irradiated to The angle of reflection of the light beam LB1 of pulse type on reflecting surface RP continuously changes.Light beam LB1 is made by a reflecting surface RP as a result, Reflection direction deflection, the point light SP for the light beam LB1 being irradiated on the plane of illumination of substrate FS can be made along scanning direction (base The width direction of plate FS, the direction Yt) it is scanned.
The point light SP of light beam LB1 can be made to be scanned along line SL1 is described by a reflecting surface RP.Therefore, more Under the rotation in one week of face mirror PM, by the quantity maximum of the description line SL1 of light SP scanning and instead on the plane of illumination of substrate FS The quantity for penetrating face RP is mutually all eight.Polygonal mirror PM is revolved by the inclusion of the polygonal mirror driving portion RM of motor etc. with certain speed Turn.Rotation based on the polygonal mirror driving portion RM polygonal mirror PM carried out is controlled by control device 18.As described above, describing line SL1 Actual effect length (such as 30mm) be configured to the maximum scan length that a light SP can be made to be scanned by polygonal mirror PM (such as 31mm) length below (in design), is set in the center of maximum scan length in initial setting and describes line SL1 Central point (irradiation central axis L e1 pass through point).
In addition, as an example, the actual effect length for describing line SL1 being set as 30mm, is making virtual size on one sideIt is 3 μm Point light SP is overlapped 1.5 μm every time makes a light SP along describing in the case that line SL1 is irradiated on the plane of illumination of substrate FS on one side, The quantity (umber of pulse of the light beam LB from light supply apparatus 14 ') of the point light SP irradiated in single pass is 20000 (30mm/ 1.5μm).In addition, if must be irradiated 200 μ sec are set as along the sweep time for the point light SP for describing line SL1 in this period The point light SP of 20000 pulse types, therefore the luminous frequency Fs of light supply apparatus 14 ' becomes Fs >=20000 time/200 μ sec= 100MHz。
Cylindrical lens CYa is in the non-scan direction orthogonal with scanning direction (direction of rotation) realized based on polygonal mirror PM On (direction Zt), incident light beam LB1 is converged into slit-shaped on the reflecting surface RP of polygonal mirror PM.Pass through its bus and the side Yt To parallel cylindrical lens CYa, even if there are reflecting surface RP, relative to the inclination of the direction Zt, (reflecting surface RP is relative to XtYt plane Normal slope) the case where, it is also able to suppress its influence, is able to suppress the light beam LB1's being irradiated on the plane of illumination of substrate FS Irradiation position is staggered on the direction Xt.
F θ lens FT with the optical axis AXf extended along Xt axis direction is that the light beam LB1 that will be reflected by polygonal mirror PM exists The scanning lens of the telecentricity class projected in the mode parallel with optical axis AXf to reflecting mirror M25 in XtYt plane.Light beam LB1 is to f θ The incidence angle θ of lens FT changes according to the rotation angle (θ/2) of polygonal mirror PM.F θ lens FT is saturating via reflecting mirror M25 and cylinder Mirror CYb projects light beam LB1 and the image height position on the plane of illumination of the directly proportional substrate FS of its incidence angle θ.If by burnt Point distance is set as fo, image height position is set as y, then f θ lens FT is designed to meet the relationship of y=fo θ.Therefore, can pass through F θ lens FT is scanned light beam LB1 (point light SP) accurate and constant speed in the direction Yt (Y-direction).To f θ lens FT Incidence angle θ be 0 degree when, the light beam LB1 for being incident on f θ lens FT advances on optical axis AXf.
Reflecting mirror M25 reflects incident light beam LB1 via cylindrical lens CYb towards substrate FS along the direction-Zt.Pass through f θ The lens FT and bus cylindrical lens CYb parallel with the direction Yt, projects the light beam LB1 on substrate FS in the illuminated of substrate FS The small point light SP that diameter is several μm of degree (such as 3 μm) is converged on face.In addition, projecting on the plane of illumination of substrate FS Point light SP by polygonal mirror PM along the direction Yt extend description line SL1 carry out one-dimensional scanning.In addition, the light of f θ lens FT Axis AXf and irradiation central axis L e1 are in the same plane, and the plane is parallel with XtZt plane.Therefore, it advances on optical axis AXf Light beam LB1 by reflecting mirror M25 to the direction-Zt reflect, with irradiation central axis L e1 become coaxially to substrate FS project.? In this 4th embodiment, at least f θ lens FT is thrown as the light beam LB1 that will be deflected from polygonal mirror PM to the plane of illumination of substrate FS The projection optics system penetrated and function.In addition, at least reflection component (reflecting mirror M21~M25) and polarising beam splitter BS It is functioned as the optical path-deflecting component for bending the optical path of the light beam LB1 until from reflecting mirror M20 to substrate FS.Pass through The optical path-deflecting component can make to essentially become to the incident axis of the light beam LB1 of reflecting mirror M20 incidence with irradiation central axis L e1 Coaxially.In XtZt plane, it is being passed through from the optical path of substantially U-shaped or U-shaped by the light beam LB1 in scanning element U1 Afterwards, it advances to the direction-Zt and projects substrate FS.
Like this, in the state that substrate FS is transported in X direction, light beam is made by each scanning element Un (U1~U6) The point light SP of LBn carries out one-dimensional scanning in scanning direction (Y-direction), and thereby, it is possible to make a light SP in the illuminated of substrate FS Two-dimensional scanning is relatively carried out on face.Therefore, it can describe in the exposure area W of substrate FS and expose defined pattern out.
Photodetector DTS has the photo-electric conversion element that photoelectric conversion is carried out to incident light.On the surface of rotating cylinder DR It is formed with predetermined reference pattern.Formation on rotating cylinder DR has the part of the reference pattern by relative to light beam LB1's There is wave band the material of antiradar reflectivity (10~50%) to constitute, the other parts for not forming reference pattern on rotating cylinder DR by Reflectivity is that 10% material below or light absorbing material are constituted.Therefore, if no winding substrate FS state (or from base The state that the hyalomere of plate FS passes through) under, there is the area illumination light of reference pattern from scanning element U1 to the formation of rotating cylinder DR The point light SP of beam LB1, then its reflected light from cylindrical lens CYb, reflecting mirror M25, f θ lens FT, polygonal mirror PM, reflecting mirror M24, The wave plate of cylindrical lens CYa, λ/4 QW, reflecting mirror M23, field stop FA, move as optical component SR and reflecting mirror M22 by Polarising beam splitter BS is incident.Here, between polarising beam splitter BS and substrate FS, specifically, in reflecting mirror M23 and column Between the lens CYa of face, it is equipped with the wave plate of λ/4 QW.The light beam LB1 irradiated as a result, to substrate FS is inclined from P by the wave plate of the λ/4 QW Vibration light is converted into circularly polarized light, passes through the wave plate QW of the λ/4 from substrate FS to the reflected light of polarising beam splitter BS incidence, and from circle Polarised light is converted into S polarized light.Therefore, the reflected light for carrying out self-reference substrate FS is transmitted from polarising beam splitter BS, and via optical lens Mirror system G10 is incident to photodetector DTS.
At this point, pulse type light beam LB1 (preferably from kind of a light beam LB1 of light S1) continuously to scanning element U1 In the state of incidence, rotating cylinder DR rotates and scanning element U1 is scanned a light SP, puts light SP as a result, and is two-dimensionally radiated at On the outer peripheral surface of rotating cylinder DR.Therefore, the figure for the reference pattern being formed on rotating cylinder DR can be obtained by photodetector DTS Picture.Specifically, making the Strength Changes from the photodetector DTS photosignal exported in response to the pulsed illumination of light SP Clock pulse signal (generates) in light supply apparatus 14 ', carries out digital sample by each sweep time, is thus taken as the one of the direction Yt The image data of dimension, moreover, the measured value of the encoder ENn measured in response to the rotary angle position to rotating cylinder DR, By sub-scanning direction certain distance (such as point light SP size1/2) by the one-dimensional image data in the direction Yt in the side Xt Arrangement upwards obtains the two-dimensional image information on the surface of rotating cylinder DR as a result,.Rotating cylinder DR of the control device 18 based on the acquisition Reference pattern two-dimensional image information, come measure scanning element U1 description line SL1 gradient.The gradient of description line SL1 It can be the relative steepness between each scanning element Un (U1~U6), be also possible to the central axis Axo's relative to rotating cylinder DR Gradient (absolute gradient).In addition, similarly, can also measure each gradient for describing line SL2~SL6 certainly.
On the periphery of the polygonal mirror PM of scanning element U1, it is equipped with origin sensor (origin detector) OP1 as shown in figure 29. Origin sensor OP1 output indicates the origin signal SZ for the pulse type that the scanning of the point light SP based on each reflecting surface RP starts.It is former Point sensor OP1 is before the scanning that the point light SP carried out based on reflecting surface RP is come in the rotation position of polygonal mirror PM will start Specified position when, export origin signal SZ.Since polygonal mirror PM can make in scanning angle range Theta s to substrate FS projection Light beam LB1 deflection, so if by the reflection direction (deflection direction) of the polygonal mirror PM light beam LB1 reflected in scanning angle range Theta s Interior, then the light beam LB1 reflected is incident to f θ lens FT.Therefore, origin sensor OP1 the rotation position of polygonal mirror PM come by The reflection direction of the light beam LB1 of reflecting surface RP reflection will enter in scanning angle range Theta s before specified position when output it is former Point signal SZ.In addition, scanning angle range Theta s and maximum scan rotation angle range α shown in Fig. 7 has the pass of θ s=2 × α System.
Since polygonal mirror PM has eight reflecting surface RP, so the phase that origin sensor OP1 rotates a circle in polygonal mirror PM Between export eight origin signal SZ.The origin signal SZ that origin sensor OP1 is detected is sent to control device 18.In original After point sensor OP1 exports origin signal SZ, the scanning along description line SL1 of starting point light SP.
Origin sensor OP1 followed by carries out the reflecting surface RP's of the scanning of light SP (deflection of light beam LB1) using this Adjacent reflecting surface RP (being the previous reflecting surface RP on the direction of rotation of polygonal mirror PM in this 4th embodiment) comes defeated Origin signal SZ out.For the ease of distinguishing each reflecting surface RP, for convenience and by the current deflection for carrying out light beam LB1 in Figure 29 Reflecting surface RP indicated with RPa, by other reflectings surface RP counterclockwise (around the side opposite with the direction of rotation of polygonal mirror PM To) indicated with RPb~RPh.
There is origin sensor OP1 light beam to send photosystem Opa, which send photosystem Opa to have injection semiconductor laser The light source portion 312 of the laser beam B ga of the wave band of equal non-photosensitives and reflect the laser beam B ga from light source portion 312 and to more The mirror 314,316 of the reflecting surface RPb projection of face mirror PM.In addition, origin sensor OP1 has light beam receiving system Opb, the light beam Receiving system Opb have acceptance part 318, by the reflected light (the reflected beams Bgb) of the laser beam B ga reflected from reflecting surface RPb to The mirror 320,322 and the reflected beams Bgb by being reflected by mirror 322 that acceptance part 318 guides are converged to the lens system of small point light System 324.There is acceptance part 318 photoelectricity that the point light of the reflected beams Bgb assembled by lens system 324 is converted into electric signal to turn Change element.Here, the position that laser beam B ga is projected on each reflecting surface RP of polygonal mirror PM is configured to lens system 324 Pupil plane (position of focus).
Light beam, which send photosystem Opa and light beam receiving system Opb to be set to, to be become in the rotation position of polygonal mirror PM based on reflection Face RP carry out point light SP scanning will start before specified position when, light beam can be received by light beam receiving system Opb Send the position of the reflected beams Bgb of laser beam B ga emitted by photosystem Opa.That is, light beam send photosystem Opa and light Beam receiving system Opb is set to when the angle of reflecting surface RP becomes defined angle position, can be received light beam and be sent photosystem Opa The position of the reflected beams Bgb of emitted laser beam B ga.In addition, the appended drawing reference Msf of Figure 29 is coaxial with rotary shaft AXp The axis of the rotation motor of the polygonal mirror driving portion RM (referring to Figure 28) of ground configuration.
Before the light-receiving surface of the above-mentioned photo-electric conversion element close in acceptance part 318, equipped with having the narrow of minute widths Stitch the occulter of opening (diagram is omited).During the angle position of reflecting surface RPb is in defined angular range, the reflected beams Bgb is incident to lens system 324, and the point light of the reflected beams Bgb is swept in a certain direction on the above-mentioned occulter in acceptance part 318 It retouches.In the scanning, from the slit opening of occulter penetrate the reflected beams Bgb point light by acceptance part 318 above-mentioned photoelectricity Conversion element receives, and is amplified after device amplifies by optical signal and is exported as the origin signal SZ of pulse type.
Origin sensor OP1 as described above, by make light beam LB1 deflect (being scanned a light SP) reflecting surface RPa, and origin signal SZ is detected using the previous reflecting surface RPb on direction of rotation.Therefore, if adjacent reflecting surface RP (for example, reflecting surface RPa and reflecting surface RPb) each other formed angle η j relative to the design value (situation for being eight in reflecting surface RP Down it is 135 degree) there is error, then because of the deviation of the error, and as shown in figure 30, there are the generations of origin signal SZ periodically can be because Each reflecting surface RP and different situations.
In Figure 30, the origin signal SZ for using reflecting surface RPb to generate is set as SZb.Similarly, reflecting surface will be used RPc, RPd, RPe, generation origin signal SZ be set as SZc, SZd, SZe,.In the adjacent anti-of polygonal mirror PM The face RP of penetrating is in the case that formed angle η j is design value each other, and the generation of each origin signal SZ (SZb, SZc, SZd) is fixed When interval become time Tpx.When the defined time Tpx is needed for the amount of the one side of polygonal mirror PM rotary reflection surface RP Between.But in Figure 30, the error of angle η j as formed by the reflecting surface RP of polygonal mirror PM, and reflecting surface RPc, RPd is used to produce The timing of raw origin signal SZc, SZd is deviated relative to regular generation timing.In addition, origin signal SZb, SZc, SZd, SZe, time interval Tp1, Tp2 of generation, Tp3, due to the foozle of polygonal mirror PM in Microsecond grade It Shang and not be not fixed.It is Tp1 < Tpx, Tp2 > Tpx, Tp3 < Tpx in the time diagram shown in Figure 30.In addition, if will reflection The quantity of face RP is set as Np, and the rotation speed of polygonal mirror PM is set as Vp, then Tpx is indicated with Tpx=60/ (Np × Vp) (second). For example, then Tpx becomes 250 μ seconds if Vp is 30,000 rpm, Np 8.
Therefore, can due to the mutual respectively formed angle η j of the adjacent reflecting surface RP of polygonal mirror PM error and cause by The description starting point of description line SL1 of the point light SP that each reflecting surface RP (RPa~RPh) is described on the plane of illumination of substrate FS The position of (scanning starting point) generates offset along main scanning direction.The position for describing the description end point of line SL1 as a result, also can edge Main scanning direction generates offset.That is, the position of the description line SL1 of the point light SP described by each reflecting surface RP is along scanning Direction (Y-direction) displacement, thus the position of each descriptions starting point for describing line SLn and description end point will not along the X direction at For straight line.The description starting point of the description line SL1 of this light SP and the position for describing end point generate inclined along main scanning direction The main reason for shifting is invalid Tp1, Tp2, Tp3 ,=Tpx.
Therefore, in this 4th embodiment, time diagram as shown in figure 30 is such, will believe from the origin of a pulse type Number SZ generate after after time Tpx as describing starting point, and the description of starting point light SP.That is, control device 18 after origin signal SZ generation after time Tpx, by make light beam LB1 to scanning element U1 it is incident in a manner of control light beam Switching part 20, also, to the driving circuit 206a of light supply apparatus 14 ' shown in Figure 26 output followed by the scanning of scanning The description bit string data Sdw of unit U1, i.e. serial data DL1.Thereby, it is possible to be used in the reflecting surface of detection origin signal SZ The RPb and reflecting surface RP for being actually scanned a light SP becomes identical reflecting surface.
Be concretely demonstrated, control device 18 scanning element U1 origin sensor OP1 output origin signal SZb it Afterwards after time Tpx, exported in certain time (On time Ton) to the selection optical element AOM1 of light beam switching part 20 The driving signal of On.This selects to be predetermined time, quilt with optical element AOM1 for the certain time (On time Ton) of On Be set to covering makes a light SP along during describing line SL1 progress single pass by a reflecting surface RP of polygonal mirror PM (during scanning).Then, control device 18 by certain specific column, the such as the 1st column serial data DL1 to light supply apparatus 14 ' Driving circuit 206a output.It is carried out in a sweep time for the scanning of light SP in scanning element U1 as a result, light beam LB1 is to scanning Unit U1 is incident, and therefore, scanning element U1 can depict corresponding to the serial data DL1 of certain specific column (such as the 1st column) Pattern.Like this, due to passing through time Tpx after the origin sensor OP1 of scanning element U1 exports origin signal SZb Afterwards, scanning element U1 carries out the scanning of light SP, thus can with the reflecting surface RPb for detecting origin signal SZb carry out because The scanning for the point light SP that origin signal SZb causes.
Then, control device 18 passes through the time after the origin sensor OP1 of scanning element U1 exports origin signal SZd After Tpx, in certain time (On time Ton), the selection driving that optical element AOM1 exports On to light beam switching part 20 is believed Number.Then, control device 18 by next column, the such as the 2nd column driving circuit 206a from serial data DL1 to light supply apparatus 14 ' Output.As a result, as in carrying out the time including the time required for the scanning of light SP comprising scanning element U1, light beam LB1 is incident to scanning element U1, so scanning element U1 can depict the serial data DL1 with next column (such as the 2nd column) Corresponding pattern.Like this, due to passing through the time after the origin sensor OP1 of scanning element U1 exports origin signal SZd After Tpx, scanning element U1 carries out the scanning of light SP, so can be carried out with the reflecting surface RPb for detecting origin signal SZd Because of the scanning of the origin signal SZd point light SP caused.In addition, be not by continuous each reflecting surface RP of polygonal mirror PM and Be to skip in the case where carrying out the scanning of light SP on one side, in a manner of skipping one (every one) using origin signal SZ into Row drawing processing.It will be in rear detailed description about such the reasons why skipping a progress drawing processing.
Like this, after the origin sensor OP1 of scanning element U1 exports origin signal SZ after time Tpx, control Device 18 processed controls light beam switching part 20 in such a way that scanning element U1 is scanned a light SP, also, to light supply apparatus 14 ' driving circuit 206a exports serial data DL1.In addition, control device 18 whenever start based on scanning element U1 progress When scanning, make output serial data DL1 column by the 1st column, the 2nd column, the 3rd column, the 4th column, in a manner of in column direction On be staggered.In addition, based on scanning element U1 carry out point light SP single pass to next time scanning during, in order into Scanning of the row based on other scanning elements Un (scanning element U2~U6) the point light SP carried out.Based on other scanning elements Un (U2 ~U6) carry out point light SP scanning it is identical as the scanning of scanning element U1.In addition, origin sensor OPn (OP1~OP6) is pressed Each scanning element Un (U1~U6) and be arranged.
As described above, it is carried out a little by using the reflecting surface RP of the origin signal SZb for detecting scanning element U1 The scanning of light SP, even if the mutual respectively formed angle η j of adjacent reflecting surface RP in polygonal mirror PM has the case where error Under, being also able to suppress the point light SP described by each reflecting surface RP (RPa~RPh) in the description on the plane of illumination of substrate FS Point and the position for describing end point generate offset along main scanning direction.
Therefore, time Tpx that polygonal mirror PM rotates 45 degree needs to be accurate in μ seconds ranks, that is to say, that needs make The speed of polygonal mirror PM equably, critically with constant speed rotation.In the feelings for critically rotating polygonal mirror PM like this with constant speed Under condition, the reflecting surface RP for generating origin signal SZ becomes always with accurately only rotating 45 degree after time Tpx by light beam The angle that LB1 is reflected towards f θ lens FT.Therefore, it is socialized by improving the rotation constant speed of polygonal mirror PM, also strongly reducing by one Speed in turning is uneven, be able to use position in the reflecting surface RP for generating origin signal SZ with for deflecting light beam LB1 and The position for the reflecting surface RP for being scanned a light SP is different.That is, the generation constant time lag due to making origin signal SZ Time Tpx, so detecting the feelings of origin signal SZ as a result having with the reflecting surface RP for carrying out the scanning of light SP is used The same effect of condition.The configuration freedom of origin sensor OP1 (OPn) improves as a result, and rigidity height and stable structure can be arranged Origin sensor.In addition, as origin sensor OP1 (OPn) though the reflecting surface RP of test object be to make light beam LB1 (LBn) previous on the direction of rotation of the reflecting surface RP deflected, but as long as before the direction of rotation of polygonal mirror PM, no It is limited to previous.In this case, the reflecting surface RP of the test object of origin sensor OP will be used as to be set as making light beam LB1 (LBn) deflect reflecting surface RP direction of rotation on preceding n (1 or more integer) it is a in the case where, as long as in origin signal SZ Starting point is described in setting after n × time Tpx after generating.
Moreover, to from origin sensor OP1 (OPn) every one ground generate origin signal SZb, SZd, point Starting point is described in setting not after n × time Tpx, dynamic in the reading of pixel data array corresponding with each description line SL1 as a result, Ampleness is generated in the processing time of work, data transmission (communication) movement or corrected Calculation etc..Therefore, pixel can reliably be avoided The mistake and/or partial loss of error of transmission, pixel data array that data arrange.
In addition it is also possible to be arranged unlike above Figure 29 detection followed by the scanning of light SP (light beam LB1's Deflection) reflecting surface RP adjacent reflecting surface RP it is (previous on the direction of rotation of polygonal mirror PM in this 4th embodiment A reflecting surface RP) origin sensor OPn, and be arranged detection with followed by the scanning of light SP (deflection of light beam LB1) The identical reflecting surface RP of reflecting surface RP origin sensor.In this case, as explanation in Figure 30, due to pressing polygonal mirror PM Each reflecting surface RPa~RPh generate origin signal (pulse type) SZ time interval generate deviation, so needing by each reflection The additional time offset amount corresponding with its departure of face RPa~RPh.
Here, being eight, maximum scan in the quantity Np of the reflecting surface RP of polygonal mirror PM as also illustrating in Fig. 7 In the case that rotation angle range α is 15 degree, scan efficiency (α/β) becomes 1/3.For example, scanning element U1 make a light SP into During progress scanning next time is played in row scanning, two scannings that can be distributed to light beam LBn other than scanning element U1 are single First Un carries out the scanning of light SP.That is, during the amount of the polygonal mirror PM of scanning element U1 rotation one side, it can Corresponding light beam LBn is respectively distributed to comprising three scanning element Un including scanning element U1, to carry out the scanning of light SP.
But since the scan efficiency of polygonal mirror PM is 1/3, so rotating angle in each scanning element Un with maximum scan In the case that range α (15 degree) is scanned a light SP, in the one side of the polygonal mirror PM rotary reflection surface RP of scanning element U1 Amount (β=45 degree) during, light beam LBn can not be distributed to three or more scanning element Un other than scanning element U1 (U2~U6).That is, scanning element U1 point light SP scanning start to play next time put light SP scanning start During, light beam LBn can not be distributed to the scanning element Un (U2~U6) of three or more other than scanning element U1.Therefore, During the scanning of the point light SP of scanning element U1 starts to play scanning next time and starts, in order to which light beam LBn is distributed to Each of other five scanning element Un (U2~U6) is carried out based on the scanning of light SP, it is contemplated that following methods.
Even if also actually point light SP can be scanned in the case where maximum scan rotation angle range α is 15 degree The scanning rotation angle range α ' of polygonal mirror PM is set as being less than maximum scan rotation angle range α (α=15 degree).Specifically It says, during amount (β=45 degree) of the one side of the respective polygonal mirror PM rotary reflection surface RP of scanning element Un (U1~U6), The quantity for distributing the scanning element Un of light beam LBn is six, therefore scanning rotation angle range α ' is set as α '=45/6=7.5 Degree.That is, the hunting angle centered on the optical axis AXf of the light beam LBn to f θ lens FT incidence in Figure 28 is limited to ± 7.5 Degree.As a result, during the polygonal mirror PM of each scanning element Un rotates 45 degree (during reflecting surface RP rotates the amount of one side), energy Some for distributing light beam LBn in order and being incident in six scanning element Un (U1~U6), scanning element Un (U1~ U6 it) can carry out in order based on the scanning of light SP.But if the situation, then there is actually point light SP can scan Scanning rotation angle range α ' become too small, point light SP scanning maximum scan extent length and describe the maximum of line SLn to sweep Retouch the problem that length becomes too short.In order to avoid such problems, not change a side for the maximum scan length of light SP scanning Formula prepares the long f θ lens FT of focal length, will be from the distance (operating distance) of reflecting surface RP to the f θ lens FT of polygonal mirror PM It is set to grow.In this case, worrying to will lead to the enlargement of f θ lens FT, the ruler on the direction Xt of scanning element Un (U1~U6) Very little enlargement, and since the stability that operating distance is long and light beam is caused to scan reduces.
On the other hand, it is contemplated that reduce the quantity of the reflecting surface RP of polygonal mirror PM, increase polygonal mirror PM rotary reflection surface RP One side amount rotation angle beta.In this case, it is suppressed that description line SLn shortens, scanning element Un (U1~U6) is enlarged, It simultaneously can be in the phase of the amount (rotation angle beta) of the one side of the polygonal mirror PM rotary reflection surface RP of scanning element Un (U1~U6) Between, light beam LBn is distributed and is in order scanned a light SP by six scanning element Un (U1~U6).For example, will be more The quantity of the reflecting surface RP of face mirror PM is set as in the case where four, that is to say, that the shape of polygonal mirror PM is being set as square In the case where, the rotation angle beta of the amount of the reflecting surface RP rotation one side of polygonal mirror PM becomes 90 degree.Therefore, in scanning element U1 Polygonal mirror PM rotary reflection surface RP one side amount during light beam LBn is distributed and by six scanning element Un (U1~U6) In the case where carrying out the scanning of light SP, the scanning rotation angle range α ' of polygonal mirror PM that actually point light SP can be scanned at It is equal with above-mentioned maximum scan rotation angle range α for α '=90/6=15 degree.
But if the polygonal mirror PM high speed rotation for the polygon for keeping reflecting surface number Np as triangle, square few, Air drag (windage) becomes excessive, and rotation speed, rotation number reduce (rule).For example, even if want to make polygonal mirror PM with In the case where tens of thousands of rpm (rotation per minute) high speed rotations, also due to air drag and reduce rotation speed 2~3 one-tenth or so, it is unable to get desired high speed rotation speed, high rotation number.In addition, also allowing for the outer of polygonal mirror PM The method that shape size becomes larger, but the weight of polygonal mirror PM becomes excessive, and it is unable to get desired high speed rotation speed, Gao Xuan Revolution.In addition, the gimmick as windage when can reduce rotation reducing the reflecting surface number Np of polygonal mirror PM, it is also considered that will Polygonal mirror PM is integrally provided in vacuum environment, or is arranged in the environment of the molecular weight gas smaller than air (helium etc.).It should In the case of, the air tight construction body for generating such environment is set around polygonal mirror PM, correspondingly will lead to and sweep Retouch unit Un (U1~U6) enlargement.
Therefore, in this 4th embodiment, the more polygon of reflecting surface number Np, i.e. more approximate circular eight are used The polygonal mirror PM of side shape, and the scanning rotation angle range α ' of the actually point light SP polygonal mirror PM that can be scanned is set as maximum It scans rotation angle range α (α=15 degree), the reflection of the polygonal mirror PM of the scanning of light SP (deflection of light beam LBn) will be carried out Face RP is set to every one.That is, the scanning of the point light SP carried out based on each scanning element Un (U1~U6), Mei Geduo The reflecting surface RP's of face mirror PM is repeated when (when skipping).Therefore, it is scanned a light SP in scanning element U1 During playing progress scanning next time, light beam LB2~LB6 can be sequentially allocated to five other than scanning element U1 and swept Each of unit U2~U6 is retouched, to carry out the scanning of light SP.That is, in six scanning element Un (U1~U6) During the amount on the polygonal mirror PM rotation two sides of a scanning element Un of interest, light beam LB1~LB6 is assigned to six and is swept Each of unit Un (U1~U6) is retouched, thus six scanning element Un (U1~U6) are all able to carry out the scanning of light SP. In this case, each scanning element Un (U1~U6) starting point light SP scanning play start next time point light SP scanning be Only, polygonal mirror PM rotates the amount (90 degree) on two sides.In order to carry out such description movement, six scanning element Un (U1~U6) are each From polygonal mirror PM be in synchronized control into that rotation speed is identical, and the angle position of the reflecting surface RP of each polygonal mirror PM is synchronized It controls into each other as defined phase relation.
Further, since the reflecting surface RP for the polygonal mirror PM for carrying out the scanning of light SP (deflection of light beam LBn) is set as every Every one side, so during the polygonal mirror PM of each scanning element Un (U1~U6) rotation is primary, along describe line SLn (SL1~ SL6) scanning times of respective light SP become four times.Therefore, polygonal mirror is pressed with the scanning of light SP (deflection of light beam LBn) The case where continuous each reflecting surface RP of PM is repeated is compared, i.e., with the scanning of light SP (deflection of light beam LBn) with more The case where each reflecting surface RP of face mirror PM is carried out is compared, and the quantity for describing line SLn becomes half, therefore preferably removing substrate FS Speed is sent also to slow down for half.In the case where being not desired to the conveying speed by substrate FS and being kept to half, by each scanning element Un (U1 ~U6) polygonal mirror PM rotation speed and frequency of oscillation Fs be increased to twice.For example, by the continuous each of polygonal mirror PM The rotation speed of polygonal mirror PM when the scanning of light SP (deflection of light beam LBn) is repeated in reflecting surface RP is 20,000 rpm, comes In the case where being 200MHz from the frequency of oscillation Fs of the light beam LB of light supply apparatus 14 ', by polygonal mirror PM every the anti-of one side When the scanning of light SP (deflection of light beam LBn) is repeated in the face RP of penetrating, the rotation speed of polygonal mirror PM is configured to 40,000 rpm, The frequency of oscillation Fs of light beam LB from light supply apparatus 14 ' is configured to 400MHz.
Here, control device 18 manages the scanning of which of multiple scanning element Un (U1~U6) based on origin signal SZ Unit Un carries out the scanning of light SP.But since the origin sensor OPn of each scanning element Un (U1~U6) is in each reflecting surface RP generates origin signal SZ when becoming defined angle position, so if directly using origin signal SZ, control device 18 Judging into each scanning element Un (U1~U6) is scanned a light SP by continuous each reflecting surface RP.Therefore, at one Scanning element Un carries out the scanning of light SP and plays before carrying out scanning next time, can not distribute to light beam LBn in addition to this Five scanning element Un.Therefore, in order to be set to the reflecting surface RP for carrying out the polygonal mirror PM of the scanning of light SP every one It is a, need to generate by between origin signal SZ in addition to secondary origin signal (secondary origin pulse signal) ZP.In addition, as described above, by In carrying out origin using the previous reflecting surface RP carried out on a direction of rotation of the reflecting surface RP of the scanning of light SP (deflection) The detection of signal SZ, so needing to generate the secondary origin signal ZP for the generation constant time lag time Tpx for making origin signal SZ.With Under, the structure for the secondary origin generative circuit CA for generating pair origin signal ZP is illustrated.
Figure 31 is for generating the secondary origin signal ZP that its generation constant time lag time Tpx will be removed and made between origin signal SZ Secondary origin generative circuit CA structure chart, Figure 32 be indicate by Figure 31 secondary origin generative circuit CA generate secondary origin signal The time diagram of ZP.Pair origin generative circuit CA has frequency divider 330 and delay circuit 332.Frequency divider 330 is by origin signal SZ The frequency of generation timing be divided into 1/2 and exported as origin signal SZ ' to delay circuit 332.Delay circuit 332 makes to send Origin signal SZ ' the delay time Tpx come, and exported as secondary origin signal ZP.Pair origin generative circuit CA with respectively sweep Retouch unit Un (U1~U6) origin sensor OPn be accordingly equipped with it is multiple.
Additionally, there are indicate pair origin generative circuit CA corresponding with the origin sensor OPn of scanning element Un with CAn The case where.That is, in the presence of by pair origin generative circuit CA CA1 corresponding with the origin sensor OP1 of scanning element U1 It indicates, by pair origin generative circuit CA CA2~CA6 table corresponding with origin sensor OP2~OP6 of scanning element U2~U6 The case where showing.Additionally, there are the feelings for indicating the origin signal SZ exported from the origin sensor OPn of scanning element Un with SZn Condition.That is, in the presence of the origin signal SZ exported from the origin sensor OP1 of scanning element U1 is indicated with SZ1, will be from sweeping The case where origin signal SZ for retouching origin sensor OP2~OP6 output of unit U2~U6 is indicated with SZ2~SZ6.Moreover, depositing The case where will be indicated based on the origin signal SZ ', pair origin signal ZP SZn ', ZPn that origin signal SZn is generated.Namely It says, there is the origin signal SZ ' that will be generated based on origin signal SZ1, pair origin signal ZP SZ1 ', ZP1 is indicated, similarly will What origin signal SZ ', the pair origin signal ZP SZ2 ' generated based on origin signal SZ2~SZ6~SZ6 ', ZP2~ZP6 was indicated Situation.
Figure 33 is the block diagram for indicating the electrical structure of exposure device EX, Figure 34 be indicate output origin signal SZ1~SZ6, The time diagram of the timing of secondary origin signal ZP1~ZP6 and serial data DL1~DL6.The control device 18 of exposure device EX has Standby rotation control unit 350, light beam switch control portion 352 describe the data output control unit 354 and exposure control unit 356.In addition, Exposure device EX has the motor of the polygonal mirror driving portion RM including the motor of driving comprising each scanning element Un (U1~U6) etc. Driving circuit Drm1~Drm6.
Rotation control unit 350 controls each scanning element Un (U1~U6) by control motor drive circuit Drm1~Drm6 Polygonal mirror PM rotation.Rotation control unit 350 is by control motor drive circuit Drm1~Drm6, so that multiple scanning elements The rotary angle position of the polygonal mirror PM of Un (U1~U6) is each the mode of defined phase relation, makes multiple scanning elements The polygonal mirror PM of Un (U1~U6) synchronously rotates.In detail, rotation control unit 350 is so that multiple scanning element U1~U6 The rotation speed (rotation number) of polygonal mirror PM is mutually the same and the phase of rotary angle position is made to be staggered every time certain angle amount Mode controls the rotation of the polygonal mirror PM of multiple scanning element Un (U1~U6).In addition, appended drawing reference PD1~PD6 in Figure 33 Indicate the control signal exported from rotation control unit 350 to motor drive circuit Drm1~Drm6.
In this 4th embodiment, the rotation speed Vp of polygonal mirror PM is set as 3.9 ten thousand rpm (650rps).In addition, by In reflecting surface number Np is set as 8, scan efficiency (α/β) is set as to 1/3, is set as the reflecting surface RP for carrying out the scanning of light SP Every one side, so the phase difference maximum scan rotation angle range of the rotary angle position between six polygonal mirror PM can be made α i.e. 15 degree.The scanning of point light SP is carried out by U1 → U2 → → U6 sequence.Therefore, to make six scanning element U1 The phase of the rotary angle position of the respective polygonal mirror PM of~U6 is staggered constant speed rotation in the state of 15 degree every time in the order Mode synchronizes control by rotation control unit 350.The rotary angle position of scanning element U1 and scanning element U4 as a result, The deviation of phase be just 45 degree corresponding with the rotation angle of the amount of one side.Therefore, scanning element U1 and scanning element U4 The phase of rotary angle position, i.e. origin signal SZ1, SZ4 generation timing can also be consistent.Similarly, scanning element U2 And the deviation of the phase of the rotary angle position of the rotary angle position and scanning element U3 and scanning element U6 of scanning element U5 It is 45 degree, therefore, the generation from scanning element U2 and respective origin signal SZ2, SZ5 of scanning element U5 is periodically and next The generation timing of self-scanning unit U3 and respective origin signal SZ3, SZ6 of scanning element U6 can also be consistent on a timeline.
Specifically, rotation control unit 350 is single with the rotation of the polygonal mirror PM of scanning element U1 and scanning element U4, scanning The rotation of the polygonal mirror PM of the rotation of the polygonal mirror PM of first U2 and scanning element U5 and scanning element U3 and scanning element U6 are respectively As the mode of the 1st state of a control, the more of each scanning element U1~U6 are controlled via each motor drive circuit Drm1~Drm6 The rotation of face mirror PM.1st state of a control is the phase difference for curling up pulse signal exported when rotating one time polygonal mirror PM For the state of 0 (zero).That is, to be exported when rotating one time the polygonal mirror PM of scanning element U1 and scanning element U4 The phase difference for curling up pulse signal becomes the mode of 0 (zero), to control the polygonal mirror PM of scanning element U1 and scanning element U4 Rotation.Similarly, to be revolved whenever the polygonal mirror PM of scanning element U2 and scanning element U5 and scanning element U3 and scanning element U6 The phase difference for curling up pulse signal exported when turning one time becomes the mode of 0 (zero), to control scanning element U2 and scanning element The rotation of the polygonal mirror PM of U5 and scanning element U3 and scanning element U6.
This curls up pulse signal and is also possible to origin signal SZn by frequency divider (not shown) whenever scanning element Un Primary signal is exported when exporting eight times.It is also possible in addition, curling up pulse signal from being located at each scanning element Un (U1~U6) Polygonal mirror driving portion RM on encoder (diagram omit) output signal.The sensor for curling up pulse signal can also be will test It is located near polygonal mirror PM.In the example shown in Figure 34, when being exported eight times the origin signal SZn of scanning element Un, Generation once curls up pulse signal, and a part dotted line of the corresponding origin signal SZn of the generation of pulse signal will be curled up with this It indicates.If in addition, each origin signal SZ1 and each origin signal SZ4 do not consider adjacent reflecting surface RP (for example, reflecting surface RPa and Reflecting surface RPb) mutual respectively formed angle η j error (referring to Figure 29), then whole phases are consistent on a timeline.Equally Ground, if each origin signal SZ2 and each origin signal SZ5 and each origin signal SZ3 and each origin signal SZ6 do not consider it is adjacent The error (referring to Figure 29) of the mutual respectively formed angle η j of reflecting surface RP, then whole phases are consistent on a timeline.In addition, It in Figure 34, for ease of understanding is illustrated, it is assumed that there is no the mutual respectively formed angle η j's of adjacent reflecting surface RP Error is illustrated.
Then, rotation control unit 350 remains the 1st state of a control, with the rotation angle of the polygonal mirror PM of scanning element U2, U5 It spends the phase of position to be staggered 15 degree of mode relative to the rotary angle position of the polygonal mirror PM of scanning element U1, U4, to control The rotation of the polygonal mirror PM of scanning element U2, U5.Similarly, rotation control unit 350 remains the 1st state of a control, to scan list Rotation angle of the phase of the rotary angle position of the polygonal mirror PM of first U3, U6 relative to the polygonal mirror PM of scanning element U1, U4 Position is staggered 30 degree of mode, to control the rotation of scanning element U3, U6.Polygonal mirror PM is rotated to 15 degree of time (light beam The maximum scan time of LBn) it is set as Ts.
Specifically, rotation control unit 350 curls up pulse signal relative to by scanning with what is obtained by scanning element U2, U5 The mode that unit U1, U4 were obtained curl up pulse delay signal time Ts and generates, to control the polygonal mirror of scanning element U2, U5 The rotation of PM (referring to Figure 34).Similarly, rotation control unit 350 curls up pulse signal phase with what is obtained by scanning element U3, U6 For the mode curling up 2 × Ts of pulse delay signal time and generating obtained by scanning element U1, U4, to control scanning element The rotation of the polygonal mirror PM of U3, U6 (referring to Figure 34).If the rotation speed Vp of polygonal mirror PM is set as 3.9 ten thousand rpm (650rps), Then time Ts is Ts=(1/ (Vp × Np)) × (650 × 8 × 3) second of (α/β)=1/ (about 64.1 μ seconds).Like this, pass through control The rotation of the polygonal mirror PM of each scanning element U1~U6, and can be single by each scanning by U1 → U2 → → U6 sequence Carry out the scanning of light SP to first U1~U6 timesharing.
Light beam switch control portion 352 controls the selection of light beam switching part 20 with optical element AOMn (AOM1~AOM6), Before a scanning element Un starts to scan and plays beginning scanning next time, it will be distributed from the light beam LB of light supply apparatus 14 ' To six scanning element Un (U1~U6).Therefore, light beam switch control portion 352 is with the polygonal mirror of each scanning element Un (U1~U6) The scanning (deflection) of the light beam LBn of PM passes through choosing in such a way that the reflecting surface RP every a face of polygonal mirror PM is repeated Select made with optical element AOM1~AOM6 timesharing from light beam LB1~LB6 that light beam LB is generated certain it is a branch of to each scanning singly First Un (U1~U6) is incident.
It is concretely demonstrated, light beam switch control portion 352, which has, generates secondary original based on origin signal SZn (SZ1~SZ6) The secondary origin generative circuit CAn (CA1~CA6) as shown in Figure 31 of point signal ZPn (ZP1~ZP6).When raw by the pair origin When generating pair origin signal ZPn (ZP1~ZP6) at circuit CAn (CA1~CA6), make to originate from secondary origin signal ZPn (ZP1~ ZP6 the selection corresponding with scanning element Un (U1~U6) of generation) is with optical element AOMn (AOM1~AOM6) in a timing Between (On time Ton) be On.For example, when generating pair origin signal ZP1, make the generation for originating from secondary origin signal ZP1 with sweep Retouch that unit U1 is corresponding to be selected with optical element AOM1 to be On in certain time (On time Ton).Pair origin signal ZPn is based on It is generated from the origin signal SZn that origin sensor OPn is exported, the frequency of origin signal SZn is divided into 1/2, that is to say, that It will be removed between origin signal SZn as half and makes time delay Tpx.The certain time (On time Ton) with from secondary origin signal ZPn generate time point to from the scanning element Un being scanned next time secondary origin signal ZPn generation time point be It is corresponding during only, that is, time Ts needed for rotating 15 degree with polygonal mirror PM is corresponding.If by the selection On of optical element AOMn Time Ton is set to than time Ts long, then during generating two in selection optical element AOMn while becoming On state, Light beam LB1~LB6 can not correctly be imported into the scanning element Un that make a light SP carry out description movement.When therefore, by On Between Ton be set to Ton≤Ts.
At this point, if each origin signal SZ1 and each origin signal SZ4 do not consider adjacent reflecting surface RP (for example, reflecting surface The error of the mutual respectively formed angle η j of RPa and reflecting surface RPb), then it is fully synchronized on a timeline, it is set to secondary origin letter Phase shifting about half period between number ZP1 and secondary origin signal ZP4 (referring to Figure 34).The pair origin signal ZP1 and pair The deviation of the about half period of the phase of origin signal ZP4 is by the frequency divider of secondary origin generative circuit CAn (CA1~CA6) 330 progress.That is, frequency divider 330 makes to determine by the timing removed between origin signal SZ1 and by what is removed between origin signal SZ4 When be staggered substantially half period.
The relationship of secondary origin signal ZP2 and secondary origin signal ZP5 similarly, are set to secondary origin by frequency divider 330 The phase shifting about half period of signal ZP2 and secondary origin signal ZP5 (referring to Figure 34).In addition, pair origin signal ZP3 and pair The relationship of origin signal ZP6 similarly, the phase of secondary origin signal ZP3 with secondary origin signal ZP6 is set to by frequency divider 330 Dislocation opens about half period (referring to Figure 34).
Therefore, as shown in figure 34, every by the generation timing of scanning element U1~U6 secondary origin signal ZP1~ZP6 generated Secondary staggering time Ts.In this 4th embodiment, the sequence for carrying out the scanning element Un of the scanning of light SP is U1 → U2 → → U6, therefore, after secondary origin signal ZP1 generation after time Ts the case where generation pair origin signal ZP2 Under, secondary origin signal ZPn is also according to ZP1 → ZP2 → → ZP6 sequence with the generation of time Ts interval.Therefore, light beam is cut Change control unit 352 and the secondary origin signal ZPn (ZP1~ZP6) generated correspondingly, the selection of control light beam switching part 20 is used up Learn element AOMn (AOM1~AOM6), thus, it is possible to according to U1 → U2 → → U6 sequence make corresponding light beam LB1~ LB6 is respectively incident to scanning element Un.I.e. it is capable to be carried out with the polygonal mirror PM based on each scanning element Un (U1~U6) Light beam LBn scanning (deflection) in such a way that the reflecting surface RP every a face of polygonal mirror PM is repeated, cut to timesharing Commutate the light beam LBn of each scanning element Un (U1~U6) incidence.
Describe the data the description line SLn that output control unit 354 will be scanned a light SP by scanning element Un Pattern corresponding to one column amount serial data DLn as description driving circuit of the bit string data Sdw to light supply apparatus 14 ' 206a output.Since the sequence for the scanning element Un for carrying out the scanning of light SP is U1 → U2 → → U6, so describing The serial data DLn of the amount of one column of the output of data output control unit 354 is according to DL1 → DL2 → → DL6 reiteration Description bit string data Sdw.
The structure for describing the data output control unit 354 is described in detail using Figure 35.Describe the data output control unit 354 have and scanning element U1~U6 corresponding six generative circuits 360,362,364,366,368,370 and OR circuit GT8.The structure having the same of generative circuit 360~370, specifically, generative circuit 360 has memory portion BM1, counter Portion CN1 and lock portion GT1, generative circuit 362 have memory portion BM2, counter unit CN2 and lock portion GT2.Generative circuit 364 has Standby memory portion BM3, counter unit CN3 and lock portion GT3, generative circuit 366 have memory portion BM4, counter unit CN4 and lock Portion GT4.Generative circuit 368 has memory portion BM5, counter unit CN5 and lock portion GT5, generative circuit 370 have memory portion BM6, counter unit CN6 and lock portion GT6.The structure of the generative circuit 360~370 may be and generative circuit shown in Figure 16 301,303,305 identical structure.
Memory portion BM1~BM6 is that storage will describe that the pattern of exposure is corresponding to scheme with each scanning element Un (U1~U6) The memory of case data (bitmap).Counter unit CN1~CN6 is the pattern numbers for that will be stored in each memory portion BM1~BM6 Serial data DL1~DL6 of amount in, then to be described one description line SLn is by each pixel and clock signal The counter that CLK is synchronous and exports.Counter unit CN1~CN6 is as shown in figure 34, in the pair from light beam switch control portion 352 After origin generative circuit CA1~CA6 exports secondary origin signal ZP1~ZP6, a serial data DL1~DL6 is exported.
The pattern data of each memory portion BM1~BM6 is stored in by address counter (not shown) etc., makes the string of output Row data DL1~DL6 is displaced (shift) along column direction.That is, by column that address counter (not shown) is read with 1 column, the 2nd column, the 3rd column, mode are displaced.About the displacement, if for example, memory corresponding with scanning element U1 Portion BM1, then after serial data DL1 end of output, secondary origin signal ZP2 corresponding to the scanning element U2 that is then scanned The timing of generation carries out.Similarly, the displacement of the serial data DL2 of the pattern data of memory portion BM2 is stored in serial number After DL2 end of output, the timing that secondary origin signal ZP3 is generated corresponding to the scanning element U3 that is then scanned is carried out. Similarly, the displacement of serial data DL3~DL6 of the pattern data of memory portion BM3~BM6 is stored in serial data DL3 After~DL6 end of output, secondary origin signal ZP4~ZP6, ZP1 corresponding to the scanning element U4~U6, the U1 that are then scanned The timing of generation carries out.In addition, the scanning of point light SP is carried out according to U1 → U2 → U3 → → U6 sequence.
Like this, the serial data DL1~DL6 being sequentially output is by applying secondary origin signal ZP1~ZP6 later certain Lock portion GT1~GT6 for opening in time (On time Ton) and the OR circuit GT8 for being applied to six inputs.OR circuit GT8 will be according to The serial data DLn of serial data DL1 → DL2 → DL3 → DL4 → DL5 → DL6 → DL1 reiteration synthesis makees It is exported to describe bit string data Sdw to the driving circuit 206a of light supply apparatus 14 '.Like this, each scanning element Un (U1~U6) Can with carry out the scanning of light SP simultaneously, description expose pattern corresponding with pattern data out.
In this 4th embodiment, prepare pattern data by each scanning element Un (U1~U6), from each scanning element Un In the pattern data of (U1~U6) in accordance with the Sequential output serial data DL1 for the scanning element Un for carrying out the scanning of light SP~ DL6.But the sequence of the scanning element Un due to carrying out the scanning of light SP is predetermined, so can also prepare by The pattern data that each serial data DL1~DL6 of the pattern data of each scanning element Un (U1~U6) is composed.Also To say, can construct the serial data DLn (DL1~DL6) respectively arranged of the pattern data for making each scanning element Un (U1~U6) with Carry out the scanning element Un of the scanning of light SP sequence correspondingly arrange made of a pattern data.As long as in this case, According to the secondary origin signal ZPn (ZP1~ZP6) of the origin sensor OPn based on each scanning element Un (U1~U6), from first row Play the serial data DLn for exporting a pattern data in order.
In addition, exposure control unit 356 shown in Figure 33 for control rotation control unit 350, light beam switch control portion 352 and Describe the data output control unit 354 etc..Exposure control unit 356 shoots obtained camera shooting to aligming microscope AMm (AM1~AM4) Signal ig (ig1~ig4) is parsed, to detect position of the alignment mark MKm (MK1~MK4) on substrate FS.Then, it exposes The exposure region on (determination) substrate FS is detected in position of the photocontrol portion 356 based on the alignment mark MKm (MK1~MK4) detected The starting position of the description exposure of domain W.Exposure control unit 356 has counter circuit 356a, and counter circuit 356a is to by scheming The detection signal that encoder EN1a~EN3a, EN1b~EN3b shown in 24 are detected is counted.356 basis of exposure control unit It count value (label detection position) based on encoder EN1a, EN1b when detecting the starting position for describing exposure and is based on The count value (position of the description line SLn of odd number) of encoder EN2a, EN2b, to judge the beginning for describing exposure of substrate FS Whether position, which is located at, is described on line SL1, SL3, SL5.It is retouched if the starting position that exposure control unit 356 judges into description exposure is located at On line drawing SL1, SL3, SL5, then control describes the data output control unit 354, makes scanning element U1, U3, U5 starting point light SP's Scanning.In addition, rotation control unit 350 and light beam switch control portion 352 be under the control of exposure control unit 356, based on curling up arteries and veins Signal and pair origin signal ZPn (ZP1~ZP6) are rushed, rotation and the base of the polygonal mirror PM of each scanning element Un (U1~U6) are controlled In the distribution for the light beam LBn that light beam switching part 20 carries out.
Exposure control unit 356 according to detect describe exposure starting position when based on encoder EN1a, EN1b Numerical value (label detection position) and count value (position of the description line of even number) based on encoder EN3a, EN3b, judge base Whether the starting position of the description exposure of plate FS, which is located at, is described on line SL2, SL4, SL6.If exposure control unit 356 judges into description The starting position of exposure, which is located at, to be described on line SL2, SL4, SL6, then control describes the data output control unit 354, makes scanning element The scanning of U2, U4, U6 starting point light SP.
As shown in previous Figure 25, according to the conveyance direction (+X direction) of substrate FS, first carry out describing line SL1, SL3, SL5 Respective description exposure carries out describing the respective description exposure of line SL2, SL4, SL6 after substrate FS is by conveying predetermined distance Light.On the other hand, since each polygonal mirror PM of six scanning element U1~U6 is revolved with mutually keeping certain angle phase Turn control, is generated so secondary origin signal ZP1~ZP6 is successively with phase difference time Ts lasting as shown in Figure 34.Therefore, from Will open to the description exposure for describing line SL2, SL4, SL6 is put at the beginning of the description exposure for describing line SL1, SL3, SL5 During before beginning, lock portion GT2, GT4, GT6 in Figure 35 are opened also by secondary origin signal ZP2, ZP4, ZP6, is repeated It selects with optical element AOM2, AOM4, AOM6 to be On state This move in certain time interval T on.Therefore, in the structure of Figure 33 In, selection lock circuit can also be set in light beam switch control portion 352, which is based in exposure control unit 356 The count value of encoder EN1a, EN1b of middle judgement or the count value of encoder EN2a, EN2b, selection are the pair originals that will be generated Point signal ZP1~ZP6 respectively to describe the data output control unit 354 transmission still forbid sending.It together, can also be to scanning Respectively each drive circuit DRVn (DRV1~DRV6) of optical element AOM1~AOM6 is used in corresponding selection to unit U1~U6 (referring to Figure 38) assigns secondary origin signal ZP1~ZP6 via the selection lock circuit.
Here, as noted previously, as describe line SL1, SL3, SL5 is located at substrate FS compared with describing line SL2, SL4, SL6 Conveyance direction upstream side, so the exposure area W of substrate FS description exposure starting position first reaches description line SL1, On SL3, SL5, then after a certain time, reaches and describe on line SL2, SL4, SL6.Therefore, in the starting position for describing exposure It reaches before describing line SL2, SL4, SL6, the description exposure of pattern is only carried out by scanning element U1, U3, U5.Therefore, do not having There is the selection lock circuit by the such secondary origin signal ZP1~ZP6 of previous explanation to be set to the situation in light beam switch control portion 352 Under, exposure control unit 356 make to the driving circuit 206a of light supply apparatus 14 ' export description bit string data Sdw in it is serial The pixel data of data DL2, DL4, DL6 corresponding part all becomes low " (0) ", thus substantially cancels and is based on scanning element The description exposure that U2, U4, U6 are carried out.During cancellation, from memory portion BM2, BM4, BM6 export serial data DL2, DL4, The column of DL6 are not displaced and keep the 1st column.Then, exposure area W description exposure starting position reach describe line SL2, After SL4, SL6 are upper, start to export serial data DL2, DL4, DL6, carry out the position of serial data DL2, DL4, DL6 to column direction It moves.
In addition, similarly, the end position of the description exposure of exposure area W, which first reaches, to be described on line SL1, SL3, SL5, so Afterwards after a certain time, it reaches and describes on line SL2, SL4, SL6.Therefore, it is reached in the end position for describing exposure and describes line It after SL1, SL3, SL5, reaches before describing line SL2, SL4, SL6, the description of pattern is only carried out by scanning element U2, U4, U6 Exposure.Therefore, the selection lock circuit of the such secondary origin signal ZP1~ZP6 of previous explanation light beam switching control be not set to In the case where in portion 352 processed, exposure control unit 356 makes the description bit string number exported to the driving circuit 206a of light supply apparatus 14 ' All become low " (0) " according to the pixel data in Sdw with serial data DL1, DL3, DL5 corresponding part, substantially takes as a result, Disappear the description exposure carried out based on scanning element U1, U3, U5.In addition, in the case where being not provided with selection lock circuit, even if In the cancellation for describing exposure, also to import light beam LB1, LB3, LB5 to scanning element U1, U3, U5 for eliminating description exposure Mode, selection are repeated in response to secondary origin signal ZP1, ZP3, ZP5 and selectivity with optical element AOM1, AOM3, AOM5 Ground becomes the On state This move of certain time interval T on.
As described above in this 4th embodiment, by scanning element Un (U1~U6) polygonal mirror PM every one The reflecting surface RP in face controls light beam by light beam switch control portion 352 in a manner of the deflection (scanning) that polygonal mirror PM is repeated Switching part 20 makes multiple scanning element Un (U1~U6) respectively carry out an one-dimensional scanning of light SP in order.Thereby, it is possible to not A light beam LB is distributed into multiple scanning element Un with shortening the length of the description line SLn (SL1~SL6) of point light SP scanning (U1~U6) can efficiently use light beam LB.In addition, the approximate circle of shape (polygonal shape) since polygonal mirror PM can be made Shape can make polygonal mirror PM high speed rotation so can prevent the rotation speed of polygonal mirror PM reduces.
Light beam switching part 20 has selection with optical element AOMn (AOM1~AOM6), along coming from light supply apparatus For the direction of travel of 14 ' light beam LB in-linely configured with n, selection makes light beam LB diffraction and certain in n light beam LBn deflecting One, and imported to corresponding scanning element Un.Therefore, the scanning element Un (U1 that light beam LBn wants incident can be simply chosen ~U6) in some, the light beam LB from light supply apparatus 14 ' can be made relative to carrying out describing a scanning of exposure singly First Un is efficiently concentrated, and obtains high light exposure.For example, will be from the injection of light supply apparatus 14 ' using multiple beam splitters Six light beam LBn (LB1~LB6) that light beam LB carries out amplitude and is split to form as six light beams, and segmentation is obtained respectively via According to the acoustooptic modulation element of the serial data DL1~DL6 described the data the description being modulated to six scanning element U1 In the case that~U6 has been imported, if the decaying of the beam intensity in the acoustooptic modulation element of description is set as 20%, it will scan The decaying of beam intensity in unit Un is set as 30%, then the intensity of the midpoint a scanning element Un light SP is in original light beam LB Intensity be 100% when, become about 9.3%.On the other hand, as this 4th embodiment, make from light supply apparatus 14 ' light beam LB deflects some incident situation into six scanning element Un by selection optical element AOMn Under, the point light when selection is set as 20% with the decaying of the beam intensity in optical element AOMn, in a scanning element Un The intensity of SP becomes about the 56% of the intensity of original light beam LB.
Rotation control unit 350 is so that rotation speed is mutually the same and the phase of rotary angle position is staggered every time certain angle The mode of amount controls the rotation of the polygonal mirror PM of multiple scanning element Un (U1~U6).It is being based on a scanning element Un as a result, During the one-dimensional scanning of the point light SP of progress plays the one-dimensional scanning carried out next time, it can carry out in order more based on other The one-dimensional scanning for the point light SP that a scanning element Un is carried out.
In addition, illustrating the side that a light beam LB is distributed to six scanning element Un in above-mentioned 4th embodiment Formula, but nine scanning element Un (U1~U9) can also will be distributed to from a light beam LB of light supply apparatus 14 '.The situation Under, if the scan efficiency (α/β) of polygonal mirror PM is set as 1/3, during polygonal mirror PM rotates the amount of three reflecting surface RP, Light beam LBn can be distributed to nine scanning element U1~U9, therefore put the scanning of light SP by the reflecting surface RP every two faces It carries out.The scanning for putting light SP carried out next time is played in the scanning of the point light SP carried out based on a scanning element Un as a result, Before, other eight scanning element Un can be made to carry out the scanning of light SP in order.In addition, if the scanning of polygonal mirror PM is imitated Rate is set as 1/3, then a light beam LB is distributed to nine scanning elements by the amount that polygonal mirror PM can rotate three reflecting surface RP The frequency of the generation timing of origin signal SZn is divided into 1/3 by Un, therefore, the frequency divider 330 of secondary origin generative circuit CAn.It should In the case of, the pulse signal that curls up of scanning element U1, U4, U7 are synchronous (being on a timeline same-phase).Similarly, it scans Unit U2, U5, U8 curl up pulse signal be it is synchronous, the pulse signal that curls up of scanning element U3, U6, U9 are synchronous.And And the pulse signal that curls up of scanning element U2, U5, U8 curl up the pulse delay signal time relative to scanning element U1, U4, U7 Ts and generate, the pulse signal that curls up of scanning element U3, U6, U9 prolong relative to the pulse signal that curls up of scanning element U1, U4, U7 Slow 2 × time Ts and generate.In addition, the phase of the generation timing of secondary origin signal ZP1, ZP4, ZP7 of scanning element U1, U4, U7 Position is staggered the 1/3 of a period every time, and similarly, the generation of secondary origin signal ZP2, ZP5, ZP8 of scanning element U2, U5, U8 are fixed When phase and the phase of generation timing of secondary origin signal ZP3, ZP6, ZP9 of scanning element U3, U6, U9 be also staggered every time The 1/3 of one period.In addition, time Ts is polygonal mirror PM can be realized the scanning rotation angle of the polygonal mirror PM of the scanning of light SP The time for spending range α ' rotation rotates the angle beta of the amount of a reflecting surface RP multiplied by obtained from scan efficiency to polygonal mirror PM Value becomes scanning rotation angle range α '.
The scan efficiency of polygonal mirror PM is set as 1/3, a light beam LB is distributed to 12 scanning element Un (U1~ U12 in the case where), light beam LBn can be distributed into 12 scannings during polygonal mirror PM rotates the amount of four reflecting surface RP Unit U1~U12, therefore, the scanning of point light SP are carried out by the reflecting surface RP every three faces.In addition, if sweeping polygonal mirror PM It retouches efficiency and is set as 1/3, then polygonal mirror PM can rotate the amount of four reflecting surface RP to make light beam LBn (LB1~LB12, from light The light beam LB of source device 14 ' passes through the 12 selection optical element AOMn (AOM1~AOM12) configured in-linely alternatively partially Light beam obtained from turning) it is incident to a corresponding scanning element Un (U1~U12), therefore, point of secondary origin generative circuit CAn The frequency of the generation timing of origin signal SZn is divided into 1/4 by frequency device 330.In this case, scanning element U1, U4, U7, U10 Curling up pulse signal is synchronous (being on a timeline same-phase).Similarly, scanning element U2, U5, U8, U11 curls up arteries and veins Rush signal be it is synchronous, the pulse signal that curls up of scanning element U3, U6, U9, U12 are synchronous.Moreover, scanning element U2, U5, The pulse signal that curls up of U8, U11 are generated relative to the curling up pulse delay signal time Ts of scanning element U1, U4, U7, U10, The pulse signal that curls up of scanning element U3, U6, U9, U12 prolong relative to the pulse signal that curls up of scanning element U1, U4, U7, U10 Slow 2 × time Ts and generate.In addition, the generation of secondary origin signal ZP1, ZP4, ZP7, ZP10 of scanning element U1, U4, U7, U10 The phase of timing was staggered for 1/4 period one by one, similarly, secondary origin signal ZP2, ZP5 of scanning element U2, U5, U8, U11, ZP7, The generation of secondary origin signal ZP3, ZP6, ZP9, ZP12 of the phase and scanning element U3, U6, U9, U12 of the generation timing of ZP11 The phase of timing was also staggered for 1/4 period one by one.
In addition, being 1/3 progress with the scan efficiency of the polygonal mirror PM of scanning element Un in above-mentioned 4th embodiment Illustrate, but scan efficiency is also possible to 1/2, can also be 1/4.In the case where scan efficiency is 1/2, rotated in polygonal mirror PM During the amount of one reflecting surface RP, light beam LBn can be distributed to two scanning element Un, therefore, by a light beam In the case that LBn distributes to six scanning element Un, the reflecting surface RP every two faces of polygonal mirror PM is pressed in the scanning of point light SP It carries out.That is, rotating three reflecting surface RP's in polygonal mirror PM in the case where the scan efficiency of polygonal mirror PM is 1/2 During amount, light beam LBn can be distributed to six scanning element Un.As a result, in the point carried out based on a scanning element Un Before the scanning for carrying out the light SP of point next time is played in the scanning of light SP, other five scanning element Un can be made to carry out in order The scanning of point light SP.In addition, polygonal mirror PM can rotate three reflectings surface if the scan efficiency of polygonal mirror PM is set as 1/2 One light beam LB is distributed to six scanning element Un by the amount of RP, and therefore, the frequency divider 330 of secondary origin generative circuit CAn will The frequency of the generation timing of origin signal SZn is divided into 1/3.In this case, scanning element U1, U3, U5's curls up pulse signal It is synchronous.Similarly, the pulse signal that curls up of scanning element U2, U4, U6 is synchronous.Moreover, scanning element U2, U4, U6 The pulse signal that curls up generated relative to the curling up pulse delay signal time Ts of scanning element U1, U3, U5.In addition, scanning The phase of the generation timing of secondary origin signal ZP1, ZP3, ZP5 of unit U1, U3, U5 was staggered for 1/3 period one by one, scanning element The phase of the generation timing of secondary origin signal ZP2, ZP4, ZP6 of U2, U4, U6 was also staggered for 1/3 period one by one.
In the case where the scan efficiency of polygonal mirror PM is 1/4, the phase of the amount of a reflecting surface RP is rotated in polygonal mirror PM Between, light beam LBn can be distributed to four scanning element Un, therefore, a light beam LB is being distributed into eight scanning elements In the case where Un, the scanning of point light SP is carried out by the reflecting surface RP every a face of polygonal mirror PM.That is, in polygonal mirror It, can be by light beam LBn during polygonal mirror PM rotates the amount of two reflecting surface RP in the case that the scan efficiency of PM is 1/4 Distribute to eight scanning element Un.It is next that progress is played in the scanning of the point light SP carried out based on a scanning element Un as a result, Before the scanning of secondary light SP, other seven scanning element Un can be made to carry out the scanning of light SP in order.In addition, if by more The scan efficiency of face mirror PM is set as 1/4, then polygonal mirror PM rotates the amount of two reflecting surface RP, can distribute to a light beam LB Eight scanning element Un, therefore, the frequency divider 330 of secondary origin generative circuit CAn is by the frequency of the generation timing of origin signal SZn It is divided into 1/2.In this case, scanning element U1, U5 curl up pulse signal be it is synchronous, scanning element U2, U6 curls up arteries and veins It is synchronous for rushing signal.Similarly, scanning element U3, U7 curl up pulse signal be it is synchronous, scanning element U4, U8 is curled up Pulse signal is synchronous.Moreover, the pulse signal that curls up of scanning element U2, U6 curls up arteries and veins relative to scanning element U1, U5 Rush signal only delay time Ts and generate.Scanning element U3, U7 curls up pulse signal curling up relative to scanning element U1, U5 2 × time of pulse delay signal Ts and generate, scanning element U4, U8 curls up pulse signal relative to scanning element U1, U5 It curls up 3 × time of pulse delay signal Ts and generates.In addition, the generation of secondary origin signal ZP1, ZP5 of scanning element U1, U5 is fixed When phase be staggered one by one for 1/2 period, secondary origin signal ZP2, ZP6 of scanning element U2, U6 generation timing phase also by One was staggered for 1/2 period.Similarly, the phase of the generation timing of secondary origin signal ZP3, ZP7 of scanning element U3, U7 and scanning are single The phase of the generation timing of secondary origin signal ZP4, ZP8 of first U4, U8 was also staggered for 1/2 period one by one respectively.
In addition, the shape of polygonal mirror PM is set as octagon (reflecting surface RP is eight) in above-mentioned 4th embodiment, It may also be hexagon, heptagon, can also be nonagon or more.The scan efficiency of polygonal mirror PM can also change as a result,.It is logical Often, the reflecting surface number Np of the polygonal mirror PM of polygonal shape is more, then the scan efficiency in a reflecting surface RP of polygonal mirror PM Bigger, reflecting surface number Np is smaller, then the scan efficiency of polygonal mirror PM is smaller.
Light SP can be projected to the maximum scan rotation angle range α for the polygonal mirror PM being scanned on substrate FS It is determined by the incidence angle of f θ lens FT is (suitable with the scanning angle range Theta s in Figure 29), it therefore, can be corresponding with the incidence angle Ground selects the polygonal mirror PM of optimal reflecting surface number Np.It is being f θ of the incidence angle (θ s) less than 30 degree as previous example In the case where lens FT, or the polygonal mirror PM in 24 faces that reflecting surface RP is changed with the rotation of its half i.e. 15 degree, or The polygonal mirror PM in 12 faces that reflecting surface RP is changed with 30 degree of rotation.In this case, scanning effect in the polygonal mirror PM in 24 faces Rate (α/β) is the state greater than 1/2 and less than 1.0, therefore controls the multi-panel at respective 24 face six scanning element U1~U6 Mirror PM carries out the scanning of light SP with skipping five faces.In addition, scan efficiency is greater than 1/3 and not in the polygonal mirror PM in 12 faces The state of foot 1/2, therefore control carries out a little with skipping two sides at the polygonal mirror PM in respective 12 face six scanning element U1~U6 The scanning of light SP.
[the 5th embodiment]
In above-mentioned 4th embodiment, the scanning (deflection) of light SP is put always every a reflecting surface RP of polygonal mirror PM And it is repeated.But in the 5th embodiment, the scanning (deflection) of point light SP can be arbitrarily switched by polygonal mirror PM's Continuous each reflecting surface RP and the 1st state that is repeated or every polygonal mirror PM a reflecting surface RP and be repeated The 2nd state.That is, before beginning scanning next time is played in the scanning of scanning element U1 starting point light SP, Neng Goujin Row switching is to distribute to six scanning element Un while light beam LB timesharing is distributed to three scanning element Un or timesharing.
Since the scan efficiency of polygonal mirror PM is 1/3, thus make the scanning of light SP by the continuous every of polygonal mirror PM In the case that a reflecting surface RP is repeated, such as a light SP is set to be scanned to play and scanned next time in scanning element U1 During, light beam LB can only be distributed to two scanning element Un other than scanning element U1.Therefore, prepare two light beams LB, distributes to three scanning element Un for first light beam LB timesharing, its excess-three is distributed in second light beam LB timesharing A scanning element Un.Therefore, the scanning of light SP is concurrently carried out by two scanning element Un.It can be by the way that two light be arranged Source device 14 ' generates two light beam LB, can also by that will come from the light beam LB an of light supply apparatus 14 ' by beam splitter equal part It cuts to generate two light beam LB.In the exposure device EX of this 5th embodiment shown in Figure 36~Figure 40, have two light sources Device 14 ' (14A ', 14B ') (referring to Figure 38).In addition, in the 5th embodiment, to knot identical with above-mentioned 4th embodiment Structure marks identical appended drawing reference, is only illustrated to different piece.
Figure 36 is the structure chart of light beam switching part (light beam dispatching unit) 20A of this 5th embodiment.Light beam switching part Part 20A has multiple selections with optical element AOMn (AOM1~AOM6), multiple in the same manner as the light beam switching part 20 of Figure 26 Collector lens CD1~CD6, multiple reflecting mirror M1~M12, multiple mirror IM1~IM6 and multiple collimation lens CL1~CL6 remove this In addition, also there is reflecting mirror M13, M14 and absorber TR1, TR2.In addition, absorber TR1 is equivalent in above-mentioned 4th embodiment Shown in Figure 26 absorber TR, absorb the light beam LB that is reflected by reflecting mirror M12.
Selection constitutes optical element module (the 1st optical element module) OM1 with optical element AOM1~AOM3, and selection is used up It learns element AOM4~AOM6 and constitutes optical element module (the 2nd optical element module) OM2.The choosing of 1st optical element module OM1 Select with optical element AOM1~AOM3 as in above-mentioned 4th embodiment illustrate, in the direction of travel along light beam LB The state arranged in-linely.Similarly, the selection of the 2nd optical element module OM2 is also at edge with optical element AOM4~AOM6 The state that configures in-linely of direction of travel of light beam LB.In addition, by the optics member of the selection with the 1st optical element module OM1 The corresponding scanning element U1~U3 of part AOM1~AOM3 is set as the 1st scan module.In addition, by with the 2nd optical element module OM2's Selection is set as the 2nd scan module with the corresponding scanning element U4~U6 of optical element AOM4~AOM6.1st scan module is swept Scanning element U4~U6 of unit U1~U3 and the 2nd scan module is retouched as illustrating in above-mentioned 4th embodiment with defined Configuration relation configuration.
In the 5th embodiment, reflecting mirror M6, M13, M14 be configured to the 1st configuration status and the 2nd configuration status it Between configuration switching part (movable member) SWE for switching, in the 1st configuration status, by the 1st light on the direction of travel of light beam LB It learns component module OM1 and the 2nd optical element module OM2 to configure side by side, in the 2nd configuration status, in the traveling side of light beam LB The 1st optical element module OM1 and the 2nd optical element module OM2 is configured in-linely upwards.Configuration switching part SWE has The slide unit SE of reflecting mirror M6, M13, M14 are supported, slide unit SE can be mobile to X-direction relative to bearing part IUB. Movement of the slide unit SE (configuration switching part SWE) to X-direction is carried out by actuator AC (referring to Figure 38).Actuator AC It is driven by the control of the drive control part 352a (referring to Figure 38) of light beam switch control portion 352.
In 1 configuration status, become the light beam LB from two light supply apparatus 14 ' (14A ', 14B ') concurrently to the 1st Respectively incident state becomes in 2 configuration status from one optical element module OM1 and the 2nd optical element module OM2 Shape of the light beam LB of a light supply apparatus 14 ' (14A ') to the 1st optical element module OM1 and the 2nd optical element module OM2 incidence State.That is, in 2 configuration status, from the 1st optical element module OM1 transmitted through light beam LB to the 2nd optical element mould Block OM2 is incident.Figure 36, which is shown, becomes the 1st optical element module OM1 and the 2nd optical element mould and configuring switching part SWE State when 2 configuration status that block OM2 is configured in-linely.That is, becoming the 1st optics member in 2 configuration status Whole selections of part module OM1 and the 2nd optical element module OM2 are with optical element AOM1~AOM6 along the traveling side of light beam LB It is identical as Figure 26 shown in above-mentioned 4th embodiment to the state configured in-linely.Therefore, with above-mentioned 4th embodiment Similarly, it can be used up by each selection of the 1st optical element module OM1 and the 2nd optical element module OM2 that configure in-linely It learns element AOMn (AOM1~AOM6) and supplies some partially for selection one from the 1st scan module and the 2nd scan module (U1~U6) The scanning element Un of the light beam LBn incidence turned.In addition, the position of configuration switching part SWE when by Figure 36 is known as the 2nd position. In addition, will be known as coming to the light beam LB of the 1st optical element module OM1 (AOM1~AOM3) incidence in 1 configuration status The light beam LBa of 1 light supply apparatus 14A ' will be to the 2nd optical element module OM2 (AOM4~AOM6) incidence in 1 configuration status Light beam be known as coming from the light beam LBb of the 2nd light supply apparatus 14B '.
When configure switching part SWE it is mobile to -X direction side and when coming 1 position, the 1st optical element module OM1 and the 2 optical element module OM2 become the 1st configuration status configured side by side.Figure 37 is to indicate that the position for configuring switching part SWE is The figure of the optical path of light beam LBa, LBb when 1 position.In 1 configuration status, light beam LBa is to the 1st optical element module OM1 Incidence, light beam LBb are incident to the 2nd optical element module OM2.In order to distinguish to the 1st optical element module OM1 and the 2nd optics member The respective incident light beam LB of part module OM2, will be indicated to the light beam LB of the 1st optical element module OM1 incidence with LBa, will be to the 2nd Optical element module OM2 directly incident light beam LB is indicated with LBb.
As shown in figure 37, when configuring switching part SWE and being moved to 1 position, the position of reflecting mirror M6 is to -X direction position It moves, therefore the light beam LBa reflected from reflecting mirror M6 is incident and incident to absorber TR2 not to reflecting mirror M7.Therefore, to the 1st light The light beam LBa from the 1st light supply apparatus 14A ' of component module OM1 incidence is learned only to the 1st optical element module OM1 (selection use Optical element AOM1~AOM3) it is incident, without incident to the 2nd optical element module OM2.That is, light beam LBa can be only It is transmitted from selection optical element AOM1~AOM3.In addition, when the position for configuring switching part SWE becomes 1 position, from the 2 light supply apparatus 14B ' are projected and the light beam LBb that advances towards reflecting mirror M13 along +Y direction is from reflecting mirror M13, M14 to reflecting mirror M7 guidance.Therefore, light beam LBb can be only from the 2nd optical element module OM2 (selection optical element AOM4~AOM6) transmission.
Therefore, the 1st optical element module OM1 can by three selection optical element AOM1 configuring in-linely~ AOM3 make from light beam LBa deflect light beam LB1~LB3 in some to constitute the 1st scan module three scanning element U1 A scanning element incidence in~U3.In addition, the 2nd optical element module OM2 can be selected by three configured in-linely With optical element AOM4~AOM6 make from light beam LBb deflect light beam LB4~LB6 in some to constitute the 2nd scan module Three scanning element U4~U6 in a scanning element incidence.It therefore, can be by the 1st optical element that configures side by side Module OM1 (AOM1~AOM3) and the 2nd optical element module OM2 (AOM4~AOM6) is from the 1st scan module (U1~U3) and the 2nd A scanning element Un for light beam LB incidence is selected in scan module (U4~U6) respectively.In this case, passing through the 1st scanning mould Some scanning element Un in some scanning element Un and the 2nd scan module in block concurrently carries out a light SP along retouching Exposure actions under the scanning of line drawing SLn.
Light beam switch control portion 352 the scanning of light SP (deflection) by polygonal mirror PM continuous each reflecting surface RP and In the case where the 1st state (the 1st describe mode) being repeated, actuator AC is controlled, makes to configure switching part SWE configuration the 1 position.In addition, the 2nd state being repeated in light beam switch control portion 352 every a reflecting surface RP of polygonal mirror PM In the case where (the 2nd describes mode), actuator AC is controlled, makes to configure switching part SWE configuration in the 2nd position.
Figure 38 is the figure for indicating the structure of the light beam switch control portion 352 in the 5th embodiment.In Figure 38, also illustrate Selection optical element AOM1~AOM6 and light supply apparatus 14 ' as the control object of light beam switch control portion 352 out (14A',14B').It indicates light beam LBa from the 14A of light supply apparatus 14 ' ' of the 1st optical element module OM1 incidence, light will be made Beam LBb is only indicated to the directly incident 14B of light supply apparatus 14 ' ' of the 2nd optical element module OM2.
In the case where configuration switching part SWE is in 2 position, as shown in figure 38, the light of light supply apparatus 14A ' is come from Beam LBa (LB) can be logical from selection optical element AOMn according to AOM1 → AOM2 → AOM3 → → AOM6 sequence (transmission) is crossed, it is incident from the light beam LBa that selection optical element AOM6 has passed through to absorber TR1.In addition, when configuration switching part When part SWE is moved to 1 position, light beam LBa can from light supply apparatus 14A ' according to AOM1 → AOM2 → AOM3 sequence from choosing It selects and is passed through with optical element AOMn, it is incident from the light beam LBa that selection optical element AOM3 has passed through to absorber TR2.Moreover, In the state of configuring switching part SWE and being moved to 1 position, the light beam LBb from light supply apparatus 14B ' can be according to AOM4 → AOM5 → AOM6 sequence passes through from selection optical element AOMn, the light passed through from selection optical element AOM6 Beam LB is incident to absorber TR1.In addition, the configuration switching part SWE of Figure 38 is concept map, configured with shown in Figure 36, Figure 37 The practical structures of switching part SWE are different.In the example shown in Figure 38, show configuration switching part SWE be in the 2nd position, The 2nd configuration status configured in-linely in the 1st optical element module OM1 and the 2nd optical element module OM2, selection are used up Learn the case where element AOM5 is On state.The light beam deflected as a result, by the light beam LBa from light supply apparatus 14A ' by diffraction LB5 is incident to scanning element U5.
Light beam switch control portion 352 has each with optical element AOM1~AOM6 with the driving selection of ultrasonic wave (high frequency) signal From drive circuit DRVn (DRV1~DRV6) and according to come from each scanning element Un (U1~U6) origin sensor OPn Origin signal SZn (SZ1~SZ6) generate the secondary origin generative circuit CAan (CAa1 of secondary origin signal ZPn (ZP1~ZP6) ~CAa6).The secondary origin signal ZPn of receiving is sent in from exposure control unit 356 to drive circuit DRVn (DRV1~DRV6) Make the information of the On time Ton of selection optical element AOM1~AOM6 On state after (ZP1~ZP6) with certain time.It drives Dynamic device circuit DRV1 makes selection optical element AOM1 when sending secondary origin signal ZP1 from secondary origin generative circuit CAa1 Become On state with On time Ton.Similarly, drive circuit DRV2~DRV6 is from secondary origin generative circuit CAa2~CAa6 When sending secondary origin signal ZP2~ZP6, selection optical element AOM2~AOM6 is made to become On state with On time Ton.It exposes The length of On time Ton is correspondingly changed in the case where changing the rotation speed of polygonal mirror PM in photocontrol portion 356.This Outside, drive circuit DRVn (DRV1~DRV6) similarly sets the light beam switching of Figure 33 in the 4th embodiment previous In control unit 352.
Secondary origin generative circuit CAan (CAa1~CAa6) has logic circuit LCC and delay circuit 332.It is raw in secondary origin There is the sensing of the origin from each scanning element Un (U1~U6) at input in the logic circuit LCC of circuit CAan (CAa1~CAa6) The origin signal SZn (SZ1~SZ6) of device OPn.That is, being inputted in the logic circuit LCC of secondary origin generative circuit CAa1 There is origin signal SZ1, similarly, input has origin signal in the logic circuit LCC of secondary origin generative circuit CAa2~CAa6 SZ2~SZ6.In addition, inputting stateful signal in the logic circuit LCC of each pair origin generative circuit CAan (CAa1~CAa6) STS.The 1st state that the status signal (logical value) STS is repeated in continuous each reflecting surface RP by polygonal mirror PM In the case where be configured to " 1 ", quilt in the case where 2 state that a reflecting surface RP every polygonal mirror PM is repeated It is set to " 0 ".Status signal STS is sent from exposure control unit 356.
Each logic circuit LCC generates origin signal SZn ' (SZ1 ' based on the origin signal SZn (SZ1~SZ6) inputted ~SZ6 '), and exported to each delay circuit 332.Each delay circuit 332 makes inputted origin signal SZn ' (SZ1 '~SZ6 ') Delay time Tpx, and export secondary origin signal ZPn (ZP1~ZP6).
Figure 39 is the structure for indicating the logic circuit LCC of input origin signal SZn (SZ1~SZ6) and status signal STS Figure.Logic circuit LCC is made of the AND gate LC2 and single fraction irradiation pulse generator LC3 of the OR door LC1 of two inputs, two inputs. Status signal STS as a side of OR LC1 input signal and apply.The output signal (logical value) of OR LC1 is used as AND Door LC2 a side input signal and apply, origin signal SZn as another party of AND gate LC2 input signal and apply. The output signal (logical value) of AND gate LC2 input delay circuit 332 as origin signal SZn '.Single fraction irradiation pulse generates Device LC3 usually exports the signal SDo that logical value is " 1 ", but when generating origin signal SZn ' (SZ1 '~SZ6 '), only certain Time Tdp exports the signal SDo that logical value is " 0 ".That is, single fraction irradiation pulse generator LC3 is generating origin signal When SZn ' (SZ1 '~SZ6 '), only invert the logical value of signal SDo with certain time interval T dp.Time Tdp is set to 2 × Tpx > The relationship of Tdp > Tpx is preferably set to 1.5 × Tpx of Tdp ≈.
Figure 40 is the figure for indicating the timing of the movement of logic circuit LCC of explanatory diagram 39.The left-half of Figure 40 shows base The 1st not carried out by continuous each reflecting surface RP with not skipping in the scanning for the point light SP that each scanning element Un (U1~U6) carries out A reflection is skipped in the case where state, the scanning that right half part shows the point light SP carried out based on each scanning element Un (U1~U6) The case where 2 state carried out to face RP.In addition, for ease of understanding explanation, being set as the adjacent of polygonal mirror PM in Figure 40 The mutual respectively formed angle η j of reflecting surface RP (for example, reflecting surface RPa and reflecting surface RPb) does not have an error, origin signal SZn with Time Tpx interval accurately generates.
The scanning of light SP do not skip by each reflecting surface RP carry out 1 state when, status signal STS be " 1 ", Therefore, no matter how the state of signal SDo is always " 1 " to the output signal of OR LC1.Therefore, it is exported from AND gate LC2 defeated Signal (origin signal SZn ') is out with timing output identical with origin signal SZn.That is, can be incited somebody to action in 1 state Origin signal SZn and origin signal SZn ' is considered as identical.In 1 state, to the original of single fraction irradiation pulse generator LC3 application The time interval Tpx of point signal SZn ' is less than time Tpd.Therefore, the signal SDo dimension from single fraction irradiation pulse generator LC3 It holds as " 0 ".In addition, even if in the mutual respectively formed angle η j of the reflecting surface RP of polygonal mirror PM there are in the case where error, The time interval that origin signal SZn ' will not be changed is less than this case that time Tpd.
When 2 state that the scanning for becoming point light SP carries out with skipping a reflecting surface RP, status signal STS is switched to "0".Therefore, the output signal of OR LC1 only becomes " 1 " when signal SDo is " 1 ".In state (feelings that signal SDo is " 1 " Under condition, the output signal of OR LC1 is also the state of " 1 ") under, if applying origin signal SZn (for purposes of illustration only, by the origin Signal SZn is known as first origin signal SZn), then to response and AND gate LC2 also exports origin signal SZn '.But if Origin signal SZn ' is generated, then the signal SDo from single fraction irradiation pulse generator LC3 is changing into " 0 " in time Tpd.Cause This, during time Tpd, since two inputs of OR LC1 are the signal of " 0 ", so the output signal of OR LC1 maintains For " 0 ".As a result, during time Tpd, the output signal of AND gate LC2 is also maintained " 0 ".Therefore, by time Tpd it Even if preceding apply second origin signal SZn to AND gate LC2, AND gate LC2 will not export origin signal SZn '.
Then, after time Tpd, the signal SDo from single fraction irradiation pulse generator LC3 is inverted to " 1 ", therefore In the same manner as with first previous origin signal SZn the case where, from AND gate LC2 export in the applied after time Tpd The corresponding origin signal SZn ' of three origin signal SZn.By the way that such movement is repeated, logic circuit LCC will temporally The origin signal SZn that Tpx is iteratively produced is converted into the origin signal SZn ' being iteratively produced by 2 × time Tpx.Come from other viewpoints It sees, logic circuit LCC, which generates the origin for removing the pulse for the origin signal SZn that temporally Tpx is iteratively produced between one, to be believed Number SZn ', that is to say, that the frequency of the generation timing of origin signal SZn is divided into 1/2.In addition it is also possible to which secondary origin is raw At the frequency dividing of the logic circuit LCC of the circuit CAan secondary origin generative circuit CAn for being replaced as illustrating in above-mentioned 4th embodiment Device 330 (Figure 31).In the case where replacing divider 330, as long as frequency divider 330 is in 2 state by origin signal SZn points Frequency is at 1/2, in addition, not dividing to origin signal SZn in 1 state.Alternatively, it is also possible to which the above-mentioned 4th is implemented The secondary origin generative circuit CAan of secondary origin generative circuit CAn displacement the 5th embodiment of cost of mode.In addition, in the 2nd state In the case where, the origin signal SZ1 ' exported from the logic circuit LCC of secondary origin generative circuit CAa1 generates electricity with from secondary origin The origin signal SZ4 ' of the logic circuit LCC output of road CAa4 is staggered half period phase.Similarly, from secondary origin generative circuit Origin signal SZ2 ', the SZ3 ' of the logic circuit LCC output of CAa2, CAa3 and patrolling from secondary origin generative circuit CAa5, CAa6 Origin signal SZ5 ', the SZ6 ' of volume circuit LCC output are staggered half period phase.
Like this, only by making the logic to each secondary origin generative circuit CAa1~CAa6 of light beam switch control portion 352 The value reversion of the status signal STS of circuit LCC input, it will be able to which arbitrary switch is continuous each reflecting surface by polygonal mirror PM RP and the 1st state of the description exposure that the scanning based on light SP carries out or anti-every one of polygonal mirror PM is repeated It penetrates face RP and the 2nd state that the description that the scanning based on light SP carries out exposes is repeated.
In addition, in this 5th embodiment, the rotation control of the polygonal mirror PM of each scanning element Un (U1~U6) also with it is upper It is identical to state the 4th embodiment.That is, with the origin exported from the origin sensor OPn of each scanning element Un (U1~U6) Signal SZn (SZ1~SZ6) has the mode of relationship shown in Figure 34, controls the polygonal mirror PM of each scanning element Un (U1~U6) Rotation.Therefore, the scanning of light SP with not skipping face by each reflecting surface RP carry out 1 state when, scanning element U1 ~U3 can carry out the scanning of light SP according to U1 → U2 → U3 reiteration, and scanning element U4~U6 can be according to U4 → U5 The reiteration of → U6 carries out the scanning of light SP.
It preferably, can be according to from exposure control unit to the time Tpd of single fraction irradiation pulse generator LC3 setting The information of the rotation speed of 356 polygonal mirror PM and change.In addition, being not limited to skip one side, even if making a little with skipping two sides In the case that light SP is scanned, if for structure as Figure 39, also can only by by time Tpd be set to (n+1) × The relationship of Tpx > Tdp > n × Tpx is coped with.In addition, n indicates the quantity of the reflecting surface RP skipped.For example, being 2 in n In the case of, it indicates that the scanning of point light SP is carried out every two reflecting surface RP, in the case where n is 3, indicates the scanning of point light SP It is carried out every three reflecting surface RP.
Next, simpling illustrate the scanning in light SP with not skipping face by the 1st state of each reflecting surface RP progress When, based on the description bit string number for describing the data driving circuit 206a progress of the output control unit 354 to light supply apparatus 14A ', 14B ' It is controlled according to the output of Sdw.In 1 state, pass through the 1st scan module (scanning element U1~U3) and (scanning of the 2nd scan module Unit U4~U6) concurrently carry out the scanning of light SP.Therefore, 354 pairs of output control unit are described the data to project to the 1st scanning mould The driving circuit 206a of the light supply apparatus 14A ' of the light beam LBa of block incidence, output by scanning element U1~U3 respectively corresponding to The description bit string data Sdw that serial data DL1~DL3 is chronologically synthesized, to the light beam projected to the 2nd scan module incidence The driving circuit 206a of the light supply apparatus 14B ' of LBb, output by scanning element U4~U6 respectively corresponding to serial data DL4~ The description bit string data Sdw that DL6 is chronologically synthesized.
In addition, describing the data no matter output control unit 354 is " 1 " in status signal STS or is " 0 " shown in Figure 35 In the case of, almost can directly it use.In the 1st state that the scanning of light SP is carried out with not skipping face by each reflecting surface RP When, after secondary origin signal ZP1 generation, secondary origin signal ZP2 is generated after time Ts, and secondary origin is then generated after time Ts Signal ZP3.Therefore, by counter unit CN1~CN3 according to DL1 → DL2 → DL3 reiteration export serial data DL1~ DL3.Pass through lock portion GT1~GT3 after applying secondary origin signal ZP1~ZP3 in certain time (On time Ton) middle opening And the serial data DL1~DL3 being sequentially output, as description driving circuit of the bit string data Sdw to the 1st light supply apparatus 14A ' 206a input.Similarly, in 1 state that the scanning of light SP is not carried out by each reflecting surface RP with not skipping face, secondary former After point signal ZP4 is generated, secondary origin signal ZP5 is generated after time Ts, and secondary origin signal ZP6 is then generated after time Ts. Therefore, serial data DL4~DL6 is exported according to DL4 → DL5 → DL6 reiteration by counter unit CN4~CN6.Pass through It is sequentially output after applying secondary origin signal ZP4~ZP6 in certain time (On time Ton) the middle lock portion GT4~GT6 opened Serial data DL4~DL6, as describe bit string data Sdw to the driving circuit 206a of the 2nd light supply apparatus 14B ' input.
Next, the offset of serial data DL1~DL6 when simpling illustrate 1 state.Serial data DL1's is arranging The offset in direction, the secondary origin signal corresponding to the scanning element U2 that serial data DL1 end of output is followed by scanned The timing that ZP2 is generated carries out.The offset in column direction of serial data DL2 is followed by carried out in serial data DL2 end of output The timing that secondary origin signal ZP3 is generated corresponding to the scanning element U3 of scanning carries out.Serial data DL3 in the inclined of column direction It moves, what the secondary origin signal ZP1 corresponding to the scanning element U1 that serial data DL3 end of output is followed by scanned was generated Timing carries out.In addition, the offset in column direction of serial data DL4, is followed by scanned in serial data DL4 end of output Scanning element U5 corresponding to the timing that generates of secondary origin signal ZP5 carry out.The offset in column direction of serial data DL5, What the secondary origin signal ZP6 corresponding to the scanning element U6 that serial data DL5 end of output is followed by scanned was generated determines Shi Jinhang.The offset in column direction of serial data DL6, in the scanning that serial data DL6 end of output is followed by scanned The timing that secondary origin signal ZP4 is generated corresponding to unit U4.In addition, the output control of description bit string data Sdw when 2 state System is identical as the 4th embodiment, and and the description is omitted.In addition, the output control of description bit string data Sdw when 1 state with The control principle of above-mentioned 1st~the 3rd embodiment is identical, and the sequence of the serial data DLn only exported is different.That is, not It exists together and is that and exports serial data DLn respectively according to DL1 → DL3 → DL5, DL2 → DL4 → DL6 sequence, also according to DL1 → DL2 → DL3, DL4 → DL5 → DL6 sequence exports serial data DLn respectively.
In addition, in the case where 2 state that the scanning of light SP carries out with skipping a reflecting surface RP, and face is not skipped Ground is compared by the 1st state that each reflecting surface RP is carried out, and the scanning of the point light SP of each scanning element Un (U1~U6) starts to be spaced It is longer.For example, in the case where carrying out the scanning of a light SP with skipping a reflecting surface RP, compared with the case where not skipping face, The scanning of the point light SP of each scanning element Un (U1~U6), which starts interval, becomes 2 times.In addition, with skipping two reflecting surface RP into In the case where row, compared with the case where not skipping face, the scanning of point light SP, which starts interval, becomes 3 times.Therefore, if in the 1st state It is identical with the conveying speed of the rotation speed and substrate FS that make polygonal mirror PM under the 2nd state, then under the 1st state and the 2nd state, Exposure results become different.
Therefore, exposure control unit 356 also can have changes (amendment) polygonal mirror PM's under the 1st state and the 2nd state Rotation speed and at least one party in the conveying speed of substrate FS make the exposure results under the 1st state and the 2nd state become phase With the control model of state.For example, the scanning of the point light SP in 1 state starts interval and point light SP's when 2 state In the case that scanning is divided into 1:2 between starting, exposure control unit 356 so that polygonal mirror PM when 1 state rotation speed and the 2nd The ratio of the rotation speed of polygonal mirror PM when state becomes the mode of 1:2, to control rotation control unit 350.Specifically, making The rotation speed of polygonal mirror PM when 1 state is 20,000 rpm, 40,000 rpm of rotation speed of polygonal mirror PM when making 2 state. Accordingly for the luminous frequency Fs of the light beam LB (LBa, LBb) of light supply apparatus 14 ' (14A ', 14B '), if such as the 1st state When be 200MHz, then be set to 400MHz when 2 state.Thereby, it is possible to the generations of secondary origin signal ZPn when making 1 state The interval of timing is roughly the same with the generation interval of timing of secondary origin signal ZPn when 2 state.
In addition, for example, exposure control unit 356 also can have in 1 state point light SP scanning start interval with In the case that the scanning of point light SP when 2 state is divided into 1:2 between starting, so that the conveying speed of substrate FS when 1 state The rotation of driven roller R1~R3, rotating cylinder DR are controlled as the mode of 2:1 with the ratio between the conveying speed of substrate FS when 2 state The control model of rotary speed.Pass through above such, amendment polygonal mirror PM rotation speed and/or luminous frequency Fs (clock letter The frequency of number LTC) control model (scanning modification model) and the control model of conveying speed of amendment substrate FS (conveying is repaired Holotype) in one party, the interval of the X-direction of the description line SLn (SL1~SL6) on substrate FS when can make 1 state Become same intervals (for example, 1.5 μ with the interval of the X-direction of the description line SLn (SL1~SL6) on substrate FS when 2 state m).Moreover, under the 1st state and the 2nd state, memory portion BM1~BM6 in output control unit 354 respectively institute is described the data The pattern data (bitmap) of storage can be used directly without doing any amendment.
Alternatively, it is also possible to use both above-mentioned scanning modification model and conveying modification model, under the 1st state The pattern described on the substrate FS mode same with the pattern described on substrate FS under the 2nd state is modified.For example, It is 2 in the rotation speed of polygonal mirror PM under 1st state (the case where being scanned by the light beam that each reflecting surface RP of polygonal mirror PM is carried out) Ten thousand rpm, light supply apparatus 14 ' (14A ', 14B ') light beam LB luminous frequency Fs be 200MHz, the conveying speed of substrate FS is In the case where 5mm/ seconds, under the 2nd state (the case where skipping the light beam scanning of the reflecting surface RP progress of polygonal mirror PM), The conveying speed of substrate FS can be set to not to slow down half but slow down -25% and be 3.75mm/ seconds, by polygonal mirror PM Rotation speed be set to 1.5 times and be 30,000 rpm, the luminous frequency Fs of light beam LB is also set to 1.5 times and is 300MHz. Like this, it if combining both scanning modification model and conveying modification model, in the case where 2 state, does not need to make The conveying speed of substrate FS is reduced to half, therefore productivity is inhibited extremely to reduce.
In addition, illustrate in the 4th embodiment also described above like that in the 5th embodiment, distribution light beam LBa, LBb's The quantity of scanning element Un can be changed arbitrarily.In addition, the scan efficiency of polygonal mirror PM can also be changed arbitrarily.In addition, the 5th In embodiment, since the scan efficiency of polygonal mirror PM is set as 1/3, the quantity of scanning element Un is set as six, so will Six selections are divided into two optical element modules OM1, OM2 with optical element AOMn (AOM1~AOM6), and correspondingly will Six scanning element Un (U1~U6) are divided into two scan modules.But it is 1/M, scans list in the scan efficiency of polygonal mirror PM First Un and in the case where selecting with the quantity of optical element AOMn as Q, as long as Q selection is divided into Q/M with optical element AOMn A optical element module OM1, OM2, Q scanning element Un is divided into Q/M scan module.In this case, excellent Select each optical element module OM1, OM2, the selection that is respectively included it is equal with the quantity of optical element AOMn, in addition, The quantity for the scanning element Un that Q/M scan module is respectively included is also equal.In addition, the Q/M is preferably positive number (integer?). That is, it is preferred that Q is the multiple of M.
For example, the scan efficiency in polygonal mirror PM is 1/2, scanning element Un and select with the quantity of optical element AOMn for In six situations, as long as six selections are divided into three optical element modules OM1, OM2, OM3 with optical element AOMn, and will Six scanning element Un are divided into three scan modules.Moreover, in the case where 1 state, as long as by three optics members Part module OM1, OM2, OM3 are configured side by side, and make from three light supply apparatus 14 ' light beam LB (in this case, for LBa, LBb, LBc) it is concurrently respectively incident to three optical element modules OM1, OM2, OM3, in the case where 2 state, only Three optical element modules OM1, OM2, OM3 are configured in-linely, and make the light beam LB from a light supply apparatus 14 ' sequentially Ground is incident by ground from three optical element modules OM1, OM2, OM3.
As described above, in this 5th embodiment, the light beam LBn (point carried out with the polygonal mirror PM based on scanning element Un Light SP) deflection (scanning) be switched to the 1st state the (the 1st being repeated by continuous each reflecting surface RP of polygonal mirror PM Description mode) and by polygonal mirror PM the 2nd state (the 2nd describe mode) being repeated every the reflecting surface RP at least one face The mode of middle one party, light beam switch control portion 352 control light beam switching part 20A, carry out in order single based on multiple scannings The one-dimensional scanning for the point light SP that first Un is respectively carried out.Thereby, it is possible to obtain effect identical with above-mentioned 4th embodiment, and Carry out light SP scanning with allowing hand over the face of being to skip carries out the scanning of light SP with still not skipping face.
In the case where 1 state, when the scan efficiency (α/β) of polygonal mirror PM is less than 1/2, by with scan efficiency fall The scanning element Un of the corresponding quantity of number is grouped as a scan module, using multiple in the scan module being grouped as, presses Each scan module makes one of scanning element Un carry out an one-dimensional scanning of light SP.Thereby, it is possible to be swept simultaneously with a light SP Retouch the description line SLn of the quantity identical with the quantity of scan module in a plurality of description line SLn.In addition, 2 state the case where Under, carry out light beam scanning every the reflecting surface RP at least one face at by polygonal mirror PM due to controlling, so even if having than Multiple scanning element Un more than quantity corresponding with the inverse of the scan efficiency (α/β) of polygonal mirror PM, can also efficiently use light Beam LB, and multiple scanning element Un is scanned a light SP along line SLn is described.
In the case where 1 above-mentioned state, due to coming from light supply apparatus 14A ', 14B ' respective light beam LBa, LBb simultaneously Row ground to two scan module incidence made of grouping, so selection in light beam switching part 20A with optical element AOM1~ AOM6 is each by light beam switch control portion 352, with scan module unit made of grouping, with timesharing to light beam LB1~LB6 The mode of corresponding scanning element U1~U6 incidence switches On/Off state.
The configuration switching part SWE being located in light beam switching part 20A switches the 1st configuration status and the 2nd configuration status, In 1st configuration status, six scannings are distributed to using the light beam LBa for coming from the 1st light supply apparatus 14A ' as light beam LB1~LB3 Three scanning element U1~U3 in unit U1~U6 respectively and will from the 2nd light supply apparatus 14B ' light beam LBb as light beam LB4~LB6 distributes to the respective mode of its excess-three scanning element U4~U6, and the edge optical element AOM1~AOM3 is used in three selections The optical path of light beam LBa be connected in-linely, and selection with optical element AOM4~AOM6 along the in-line ground of optical path of light beam LBb It is connected, in the 2nd configuration status, the light beam LBa for coming from a light supply apparatus 14A ' is distributed to as light beam LB1~LB6 Six respective modes of scanning element U1~U6, six selections are straight along the optical path of light beam LBa with optical element AOM1~AOM6 Column ground is connected.
As a result, in the case where 1 state, it is set to the 1st configuration status and configuring switching part SWE, as a result, respectively Scanning element U1~U6 can be respectively repeated by continuous each reflecting surface RP of polygonal mirror PM based on the scanning of light SP, Also, two scanning elements in six scanning element U1~U6 can be carried out at substantially the same time based on the scanning of light SP.Separately Outside, in the case where 2 state, it is set to the 2nd configuration status and configuring switching part SWE, although being by multi-panel as a result, The light beam scanning that the reflecting surface RP every at least one face of mirror PM is carried out, but all six scanning element U1~U6 can be passed through It is repeated based on the scanning of light SP.
Therefore, according to this 5th embodiment, in the installation in the initial setting up of drawing apparatus, a light source is being used Device 14A ' sets configuration switching part SWE in a manner of becoming the 2nd configuration status, then wants the conveying speed for promoting substrate FS In the case where degree, as long as adding the 2nd light supply apparatus 14B ' and setting configuration switching part in a manner of becoming the 1st configuration status SWE, on hardware, can simple operations as the switching added, configure switching part SWE by light supply apparatus come Upgrade drawing apparatus.
In addition, in the respective embodiments described above, using the reflecting surface of the deflection of the progress light beam LBn relative to polygonal mirror PM RP and previous reflecting surface RP on the direction of rotation of polygonal mirror PM carry out the detection of origin signal SZn, but can also The detection of origin signal SZn is carried out to use the reflecting surface RP itself for the deflection for carrying out light beam LBn.In this case, not needing Origin signal SZn ' the delay time Tpx for making origin signal SZn or being found out from origin signal SZn, as long as therefore making origin signal SZn or origin signal SZn ' is secondary origin signal ZPn.
In addition, using in above-mentioned 4th and the 5th embodiment and describing bit string data Sdw to switch as light supply apparatus The electrooptic element 206 of optical modulator is used in the description of 14 ' (14A ', 14B '), but can also will be retouched as the 2nd embodiment It draws and is used as description optical modulator with optical element AOM.The description with optical element AOM be acoustooptic modulation element (AOM: Acousto-Optic Modulator).It, can also in light supply apparatus 14 ' and just that is, in above-mentioned 4th embodiment Grade selection between optical element AOM1 configure description optical element AOM, make from description optical element AOM transmitted through Light beam LB from light supply apparatus 14 ' is incident with optical element AOM1 to selection.Optical element AOM root is used in this case, describing It is switched over according to bit string data Sdw is described.Even if in this case, can also obtain effect identical with above-mentioned 4th embodiment Fruit.
In addition, in above-mentioned 5th embodiment, in the primary of the 1st light supply apparatus 14A ' and the 1st optical element module OM1 Selection between optical element AOM1, and in the primary choosing of the 2nd light supply apparatus 14B ' and the 2nd optical element module OM2 It selects between optical element AOM4, is each configured with description optical element AOM (AOMa, AOMb).That is, being used from describing Optical element AOMa transmitted through the light beam LBa from light supply apparatus 14A ' it is incident with optical element AOM1 to selection, from description With optical element AOMb transmitted through the light beam LBb from light supply apparatus 14B ' it is incident to selection optical element AOM4.The feelings Under condition, in 1 state, description is with optical element AOMa according to the description bit string data being made of serial data DL1~DL3 Sdw is switched over, and description is carried out with optical element AOMb according to the description bit string data Sdw being made of serial data DL4~DL6 Switching.In addition, only description is with optical element AOMa according to the description position being made of serial data DL1~DL6 in 2 state String data Sdw is switched over.
Alternatively, it is also possible to be provided as description optical modulator by each scanning element Un as the 1st embodiment Describe and uses optical element AOM.In this case, description optical element AOM can be located at the reflecting mirror M20 of each scanning element Un (referring to Figure 28) nearby.The description of each scanning element Un (U1~U6) is with optical element AOM according to each serial data DLn (DL1~DL6) is switched over.For example, the description of scanning element U3 is switched over optical element AOM according to serial data DL3.
[the 6th embodiment]
Figure 41 shows the structure of light beam switching part (light beam dispatching unit) 20B of the 6th embodiment, here, be set as from One light supply apparatus 14 ' projects and the collimated light beam to the light beam LBw (LB) of light beam switching part 20B incidence for circular polarization.? In light beam switching part 20B, if there are six selection optical element AOM1~AOM6, two absorber TR1, TR2, six lens System CG1~CG6, mirror M30, M31, M32, collector lens CG0 and polarising beam splitter BS1 and two descriptions optics member Part (acoustooptic modulation element) AOMa, AOMb.In addition, for knot identical with above-mentioned 4th embodiment or above-mentioned 5th embodiment Structure marks identical appended drawing reference.
Pass through from collector lens CG0 and to the light beam LBw of light beam switching part 20B incidence by polarising beam splitter BS1 And separate the light beam LBp for the P polarization that is in line and the light beam LBs of straight line S-polarization.By the polarising beam splitter BS1 S-polarization reflected Light beam LBs is incident with optical element AOMa to description.The light beam LBs for being incident on description optical element AOMa passes through collector lens The focusing light effect of CG0 restrains in a manner of becoming beam waist in optical element AOMa by description.In description optical element In AOMa, description bit string data Sdw (DLn) as shown in Figure 19 is applied with via drive circuit DRVn.The description position String data Sdw is by scanning element U1, U3, U5 of odd number respectively corresponding serial data DL1, DL3, DL5 synthesis herein It obtains.Therefore, description optical element AOMa is On state when describing bit string data Sdw (DLn) is " 1 ", by incidence A diffraction light of light beam LBs is projected as the description light beam (light beam through intensity modulated) deflected towards mirror M31.By mirror The description light beam of M31 reflection passes through incident with optical element AOM1 to selection from lens system CG1.In addition, describing bit string The zero degree light (LBs) that is projected from description with optical element AOMa is reflected by mirror M31 when data Sdw (DLn) is " 0 ", but with not to The angle of subsequent lens system CG1 incidence is advanced.In addition, lens system CG1 will be from description optical element AOMa divergently The light beam of describing of injection is assembled with the diffracted portion of optical element AOM1 in selection and becomes beam waist.
From selection with optical element AOM1 transmitted through description light beam via lens system identical with lens system CG1 CG3 and it is incident with optical element AOM3 to selection, from selection with optical element AOM3 transmitted through description light beam via with lens The identical lens system CG5 of system CG1 and it is incident with optical element AOM5 to selection.It is shown in FIG. 41 following state: three Selection optical element AOM1, AOM3, AOM5 is configured in-linely along beam path, only selection optical element AOM3 therein For On state, description light beam after using optical element AOMa intensity modulated from description is as light beam LB3 to corresponding scanning element U3 is incident.In addition, lens system CG1, CG3, CG5 are equivalent to a piece of collimation lens CL and a piece of optically focused in Figure 26 or Figure 36 Lens CD combination.
On the other hand, from polarising beam splitter BS1 transmitted through P polarization light beam LBp by mirror M30 reflect and to describe use Optical element AOMb is incident.The light beam LBp for being incident on description optical element AOMb passes through the focusing light effect of collector lens CG0, It is restrained in a manner of becoming beam waist in optical element AOMb by description.In description in optical element AOMb, via driving Device circuit DRVn and be applied with description bit string data Sdw (DLn) as shown in Figure 19.Describing bit string data Sdw is by even number Number scanning element U2, U4, U6 respectively corresponding serial data DL2, DL4, DL6 is synthesized.Therefore, describe and use optics Element AOMb is On state, a diffraction light of incident light beam LBp is made when describing bit string data Sdw (DLn) is " 1 " For deflection description light beam (light beam through intensity modulated) and towards mirror M32 project.The description light beam reflected by mirror M32 from it is saturating The identical lens system CG2 of mirror system CG1 passes through incident with optical element AOM2 to selection.In addition, describing bit string data The zero degree light (LBp) that Sdw (DLn) is projected from description with optical element AOMb when being " 0 " is reflected by mirror M32, but not to subsequent Lens system CG2 incidence angle advance.In addition, lens system CG2 will divergently be projected from description with optical element AOMb Light beam of describing assembled in selection with the diffracted portion of optical element AOM2 and become beam waist.
From selection with optical element AOM2 transmitted through description light beam via lens system identical with lens system CG1 CG4 and it is incident with optical element AOM4 to selection, from selection with optical element AOM4 transmitted through description light beam via with lens The identical lens system CG6 of system CG1 and it is incident with optical element AOM6 to selection.In Figure 41, it is shown below state: three Selection optical element AOM2, AOM4, AOM6 is configured in-linely along beam path, only selection optical element AOM2 therein For On state, description light beam after using optical element AOMb intensity modulated from description is as light beam LB2 to corresponding scanning element U2 is incident.In addition, lens system CG2, CG4, CG6 are equivalent to a piece of collimation lens CL and a piece of optically focused in Figure 26 or Figure 36 Lens CD combination.
If light beam switching part as Figure 41 more than use (light beam dispatching unit) 20B, can pass through polarised light Light beam LBw from a light supply apparatus 14 ' is divided into two beams by beam splitter BS1, and is made from the light beam LBs of one side by retouching The description light beam (LB1, LB3, LB5) generated with optical element AOMa is drawn in order to scanning element U1, U3, U5 of odd number In some is incident, make to pass through description optical element from the light beam LBp for the another party divided by polarising beam splitter BS1 Some into scanning element U2, U4, U6 of even number enters in order for AOMb and the description light beam (LB2, LB4, LB6) generated It penetrates.
In the 6th embodiment, it will divide from the light beam LBw of light supply apparatus 14 ' by polarising beam splitter BS1 After two beams, the intensity modulated of the light beam LB based on pattern data is carried out with optical element AOMa, AOMb with description, therefore, if Decaying of the intensity of respective light SP of six scanning element U1~U6 in polarising beam splitter BS1 is set as -50%, it will be Description is set as -20% with optical element AOMa, AOMb and each selection with the decaying in optical element AOMn, will be in each scanning element Decaying in U1~U6 is set as -30%, then about 22.4% as the intensity (100%) of original light beam LBw.But The scan efficiency of the respective polygonal mirror PM of six scanning element U1~U6 is 1/3 or less and using from a light supply apparatus 14 ' Light beam LBw in the case where, carry out light beam scanning while a reflecting surface RP of polygonal mirror PM will not be skipped, can with six describe Line SLn carries out the pattern plotter that the scanning based on light SP is realized respectively.
(variation 1)
As the 6th embodiment, in the light beam of optical element AOM1, AOM3, AOM5 incidence of the selection to odd number LBs and the selection to the even number orthogonal situation in the polarization direction of light beam LBp of optical element AOM2, AOM4, AOM6 incidence Under, it needs the selection of odd number with the selection of optical element AOMn and even number with optical element AOMn around light beam incidence axis phase To being rotated by 90 ° configure.Figure 42, which is shown, for example uses selection of the selection of odd number in optical element AOM1, AOM3, AOM5 Optical element AOM3 configured with being rotated by 90 ° relative to the selection of even number with optical element AOMn in the case where structure.Selection Make the description light beam for the S-polarization for having passed through lens system CG3 incident with optical element AOM3, therefore, the high direction of diffraction efficiency As the Y-direction parallel with X/Y plane.That is, with the selection diffraction grating generated in optical element AOM3 period direction at For the mode of Y-direction, selection is configured with being rotated by 90 ° with optical element AOM3.
The configuration of optical element AOM3 of selection in this way, the deflection when selecting with optical element AOM3 as On state Ground project light beam LB3, relative to zero degree light direction of travel and obliquely advance to Y-direction.Therefore, it is arranged with by light beam LB3 from the optical path of zero degree light separate and make light beam LB3 along Z-direction from the opening portion TH3 of bearing part IUB make by way of come From selection use up learn element AOM3 light beam LB3 X/Y plane internal reflection mirror IM3a and make the light beam by being reflected by mirror IM3a The mirror IM3b that LB3 is reflected in a manner of opening TH3 to -Z direction.For the selection optical element of other odd numbers Respectively, group, the group of mirror IM5a and IM5b of mirror IM1a and IM1b is similarly arranged in AOM1, AOM5.Moreover, in the structure of Figure 41 In, due to orthogonal with the polarization direction of light beam LBs, LBp of optical element AOMa, AOMb incidence to description, used up so describing Element AOMa, AOMb are learned to configure around 90 degree of relative rotation of light beam incidence axis of relationship.
But in the case where the beam splitter or half-reflecting mirror for dividing the polarising beam splitter BS1 amplitude in Figure 41, If making the polarization direction of light beam LBw is only a direction (such as P polarization), do not need to make description optical element AOMa, The selection of a side, odd number in AOMb use the side in optical element AOMn such as with the selection of optical element AOMn and even number The 90 degree of ground configurations of the such relative rotation of Figure 42.
(variation 2)
In the 6th embodiment, it is configured to six selection optical element AOM1~AOM6 respectively corresponding scanning list First U1~U6 can all be carried out by whole reflecting surface RP of polygonal mirror PM light SP along each item describe line SL1~SL6 Scanning.Therefore, with incidence sequentially through the selection of odd number with optical element AOM1, AOM3, AOM5 come light beam (by Describe and use the modulated light beam of optical element AOMa) mode, Figure 41 selection with optical element AOM5 and absorber TR2 it Between, further three selections optical element AOM7, AOM9, AOM11 are set in-linely, with incidence sequentially through even number Select with optical element AOM2, AOM4, AOM6 and come light beam (by the modulated light beam of description optical element AOMb) side Three selection optical elements are further arranged in selection between optical element AOM6 and absorber TR1 in formula in-linely AOM8,AOM10,AOM12.Selective the light beam after (switching) is respectively deflected with optical element AOM7~AOM12 moreover, adding Six scanning element U7~U12 that LB7~LB12 is imported, to configure total 12 in the width direction (Y-direction) of substrate FS A scanning element U1~U12.It, can be by Y-direction thereby, it is possible to carry out the engagement of 12 description line SL1~SL12 to describe exposure Maximum exposure width expansion at 2 times.
In this case, being grouped when the scan efficiency of the respective polygonal mirror PM of scanning element U1~U12 is 1/3 or less Scanning element U1, U3, U5, U7, U9, U11 of the odd number for describing module for the 1st and the even number for being grouped into the 2nd description module Number scanning element U2, U4, U6, U8, U10, U12 sweep light beam LBn every a reflecting surface RP of polygonal mirror PM It retouches.Like this, even if in the case where the width of the Y-direction of substrate FS becomes larger, only pass through additional scanning element U7~U12, choosing It selects with optical element AOM7~AOM12 etc., it will be able to which pattern plotter is carried out to biggish exposure area W (Fig. 5, Figure 25).As this Sample, add six scanning element U7~U12 and selection optical element AOM7~AOM12 and become 12 scanning element U1~ The structure of U12, two light sources of use that can be equally applicable to illustrate in the 5th previous embodiment (Figure 36~Figure 38) fill 14A ' is set, the case where 14B '.
(variation 3)
Figure 43 shows the conveying form of the substrate FS of variation 3 and the configuration relation of scanning element Un (describing line SLn), This, is arranged 12 scanning element U1~U12, and can with description line SL1~SL12 of each scanning element Un as variation 2 The mode that exposure is described in engagement in the Y direction configures on rotating cylinder DR.In addition, by substrate transport mechanism 12 shown in Figure 23 Rotating cylinder DR and various roller R1~R3, RT1, RT2 etc. rotary axis direction (Y-direction) on length be set as Hd, 12 will be passed through Maximum sweep width in the Y-direction that engages description and can expose of a scanning element Un is set as Sh (Sh < Hd), will The maximal support width of the substrate FS0 of exposure is set as Tf.12 in variation 3 describe line SL1~SL12 respectively corresponding to 12 scanning element U1~U12 are respectively structured as to be come from from as Figure 41 (the 6th embodiment) with beam splitter, half-reflecting mirror The light beam LBw of one light supply apparatus 14 ' be divided into two mode light beam switching part (light beam dispatching unit) 20B or from Using the mode from two light supply apparatus 14A ', 14B ' respective light beam LBa, LBb as Figure 38 (the 5th embodiment) Light beam switching part (light beam dispatching unit) 20A, the incident corresponding 12 light beam LB1~LB12 in timesharing ground.Therefore, for example each In the case where describing the length of the Y-direction of line SL1~SL12 as 50mm, maximum sweep width Sh becomes 600mm, as an example, The width that the substrate FS0 of maximal support width Tf can be become is 650mm, makes length Hd 700mm of rotating cylinder DR or so.
The drawing apparatus as through Figure 43 carries out the exposure of the substrate FS0 of width identical with maximal support width Tf In the case where, in addition to four aligming microscope AM1~AM4 (viewing area Vw1~Vw4) shown in previous Figure 24, Figure 25 with Outside, three aligming microscope AM5~AM7 (viewing area Vw5~Vw7) is added in the Y direction.In this case, being located at substrate FS0 Width direction two sides aligming microscope AM1 (viewing area Vw1) and aligming microscope AM7 (viewing area Vw7) detection exist The alignment mark that the two sides of substrate FS0 are formed in X direction with a fixed spacing.In addition, aligming microscope AM4 (viewing area Vw4) It is configured in a manner of the substantial middle positioned at maximal support width Tf.
In addition, that can be retouched by the way that six scanning element U1~U6 are respective as illustrating in previous each embodiment For line drawing SL1~SL6 in the case where carrying out the substrate FS1 of pattern plotter on the W of exposure area, width Tf1 is rotating cylinder DR's The half or so of maximal support width Tf, therefore, substrate FS1 are for example transported by the -Y direction side of the outer peripheral surface of rotating cylinder DR. At this point, alignment mark MK1~MK4 (Figure 25) on substrate FS1 respectively can be by each sight of four aligming microscope AM1~AM4 Examine region Vw1~Vw4 detection.Moreover, in the case where the exposure of substrate FS1, since six scanning element U1~U6 are used only , so scanning element U1~U6 is respectively either swept in the light beam carried out by continuous each reflecting surface RP of polygonal mirror PM Under the mode retouched, or under the mode of the light beam scanning carried out every a reflecting surface RP of polygonal mirror PM, it is able to carry out Along each spot scan for describing line SL1~SL6.
For example, being set to as the 5th embodiment simultaneously using respective from two light supply apparatus 14A ', 14B ' In the case where light beam LBa, LBb, with the light beam LBa from light supply apparatus 14A ' in-linely from scanning element U1, U3 of odd number, The side of respective corresponding selection optical element AOM1, AOM3, AOM5, AOM7, AOM9, AOM11 transmission of U5, U7, U9, U11 Formula is grouped in light beam switching part 20A, with the light beam LBa from light supply apparatus 14A ' in-linely from the scanning list of even number First U2, U4, U6, U8, U10, U12 respectively corresponding selection optical element AOM2, AOM4, AOM6, AOM8, AOM10, The mode of AOM12 transmission, is grouped in light beam switching part 20A.Moreover, in the exposure of substrate FS1, to be based only upon by multi-panel Three origin signals SZ1, SZ3, SZ5 of the continuous each reflecting surface RP output of mirror PM, according to the scanning element U1 of odd number, The reiteration of U3, U5 controlled in the way of the light beam scanning that continuous each reflecting surface RP of polygonal mirror PM is carried out System, to be based only upon three origin signals SZ2, SZ4, SZ6 of continuous each reflecting surface RP output by polygonal mirror PM, according to idol The reiteration of several numbers scanning element U2, U4, U6 carry out the light beam carried out by continuous each reflecting surface RP of polygonal mirror PM The mode of scanning is controlled.
Moreover, in the substrate to the width Tf2 with the width Tf1 less than maximal support width Tf and greater than substrate FS1 In the case that FS2 is exposed, makes the center portion pairing of the maximal support width Tf of substrate FS2 and rotating cylinder DR and removed It send.At this point, the exposure area W on substrate FS2 can be retouched by the eight scanning element U3~U10 connected in the Y direction are respective Line drawing SL3~SL10 describes.In this case, with the incident light beam LBa (light beam through intensity modulated) for coming from light supply apparatus 14A ' Odd number four selection optical element AOM3, AOM5, AOM7, AOM9 timesharing be sequentially generated light beam LB3, LB5, In LB7, LB9 some, the even number of the incident light beam LBb (light beam through intensity modulated) from light supply apparatus 14B ' four It is sequentially generated in light beam LB4, LB6, LB8, LB10 to a selection optical element AOM4, AOM6, AOM8, AOM10 timesharing The mode of some is controlled.Therefore, at least eight scanning element U3~U10 are respectively configured to one every polygonal mirror PM A reflecting surface RP carries out the mode of light beam scanning.
Moreover, in the exposure of substrate FS2, scanning element U3, U5, U7, U9 to be based only upon odd number it is respective every Four secondary origin signal ZP3, ZP5, ZP7, ZP9 of the reflecting surface RP output of polygonal mirror PM, according to the scanning list of odd number The reiteration of first U3, U5, U7, U9 carry out every the mode of a reflecting surface RP of the polygonal mirror PM light beam scanning carried out Control, the respective reflecting surface RP every polygonal mirror PM of scanning element U4, U6, U8, U10 to be based only upon even number are exported Four secondary origin signal ZP4, ZP6, ZP8, ZP10, according to even number scanning element U4, U6, U8, U10 reiteration into Row is controlled every the mode of a reflecting surface RP of the polygonal mirror PM light beam scanning carried out.In addition, being formed in Figure 43 The alignment mark (alignment mark MK1, MK4 for being equivalent in Figure 25) of width direction two sides on substrate FS2 is can be aligned The relationship configuration detected in each viewing area Vw2, Vw6 of microscope AM2, AM6, but the ruler of the Y-direction according to exposure area W Very little, there is also need not be configured with this relationship.If as long as in this case, will be in seven aligming microscope AM1~AM7 Dry be set as can be along the structure that Y-direction moves, and can adjust the location interval in the Y-direction of viewing area Vw1~Vw7 i.e. It can.
It, can be according to the width for the substrate FS to be exposed and/or the side Y of exposure area W according to above variation 3 To size carry out the efficient exposure using only necessary scanning element Un.In addition, single in such 12 scanning of Figure 43 The scan efficiency of first respective polygonal mirror PM of U1~U12 is in 1/3 situation below, as long as example, every each polygonal mirror PM's Three reflecting surface RP carry out light beam scanning also can be wide in maximum scan then even from the light beam of a light supply apparatus 14 ' Pattern plotter is carried out well in the range of degree Sh.
In addition, using five scannings of odd number in the case where constituting drawing apparatus by nine scanning element U1~U9 Four scanning elements U2, U4, U6, U8 of unit U1, U3, U5, U7, U9 and even number.Therefore, passing through nine scanning element U1 Description line SL1~SL9 of~U9 whole is 1/3 in the scan efficiency of polygonal mirror PM when carrying out pattern plotter on the W of exposure area In situation below, as long as example, a reflecting surface RP every each polygonal mirror PM carries out light beam scanning.But the feelings Under condition, as long as repeatedly raw only referring to the respective origin signal SZn of scanning element U1, U3, U5, U7, U9 from odd number in order At secondary origin signal ZP1, ZP3, ZP5, ZP7, ZP9, to carry out description line SL1, SL3, SL5, SL7, SL9 of odd number respectively On spot scan, generated in order only referring to the respective origin signal SZn of scanning element U2, U4, U6, U8 from even number repeatedly Secondary origin signal ZP2, ZP4, ZP6, ZP8, come carry out description line SL2, SL4, SL6, SL8 of even number respectively on spot scan ?.
More than, in variation 3, a kind of pattern plotter method is provided, it, will in the drawing apparatus using drawing apparatus Make the point light SP of the light beam from light supply apparatus 14 ' along describe multiple scanning element Un for being scanned of line SLn be configured to by Each direction (main scanning direction) engagement for describing pattern description line SLn in edge on substrate FS that line SLn describes, keeps multiple scannings single Member and substrate FS are relatively moved on the sub-scanning direction intersected with main scanning direction, which includes: multiple In scanning element Un, selected width on main scanning direction with substrate FS or pattern plotter is carried out on substrate FS Exposure area width on main scanning direction or specific scanning element corresponding with the position of the exposure area；With And unit is dispensed via the light beam dispensed to the light beam from light supply apparatus 14 ', it will be based on specific scanning element respectively The pattern data to be described and the light beam for having carried out intensity modulated is alternatively successively supplied to each of specific scanning element It is a.As a result, in variation 3, even if the width of substrate FS changes, the width or position change of exposure area W on substrate FS, By suitably determining the conveying position of the Y-direction of substrate FS, also it is able to carry out and maintains the accurate pattern of high joining accuracy Describe.In addition, at this point, can also not be to make rotation speed and rotation angle between the polygonal mirror PM of multiple scanning element wholes Phase synchronization, but only make rotation speed and rotation between the polygonal mirror PM for the specific scanning element for facilitating pattern plotter Angular phase is synchronous.
(variation 4)
Moreover, the other structures as the drawing apparatus for using nine scanning element U1~U9, can not also press odd number It is grouped with even number, and is merely divided into two groups according to the sequence that scanning element Un is arranged.It is swept that is, being also segmented into based on six It retouches the 1st scan module formed by unit U1~U6 and is based on the 2nd scan module formed by three scanning element U7~U9, to the 1st Scan module supply comes from the light beam LBa of the 1st light supply apparatus 14A ', comes from the 2nd light supply apparatus 14B ' to the supply of the 2nd scan module Light beam LBb.In this case, if the scan efficiency (α/β) of polygonal mirror PM is 1/4 < (α/β)≤1/3, in the 1st scan module Six scanning element U1~U6 respectively in the same manner as the 4th previous embodiment (Figure 33), by every the one of polygonal mirror PM The light beam scanning that a reflecting surface RP is carried out carries out the scanning along each description line SL1~SL6 of a light SP.
In contrast, three scanning element U7~U9 in the 2nd scan module respectively can be by all anti-of polygonal mirror PM Penetrate each progress light beam scanning of face RP.Therefore, if three scanning element U7~U9 respectively directly press the whole of polygonal mirror PM Reflecting surface RP each carry out light beam scanning, then put light SP the respective each description line SL1 of six scanning element U1~U6~ The reciprocal time interval delta T c1 of scanning in SL6 and point light SP the respective each description line SL7 of three scanning element U7~U9~ The reciprocal time interval delta T c2 of scanning in SL9 becomes the relationship of Δ Tc1=2 Δ Tc2, by describing line SL1~SL6 in base The pattern described on plate FS becomes different from by describing the pattern that line SL7~SL9 describes on substrate FS, can not carry out good Engagement exposure.
Therefore, three scanning elements of light beam scanning can carried out by each of whole reflecting surface RP of polygonal mirror PM U7~U9 respectively in, also by carry out every polygonal mirror PM a reflecting surface RP light beam scanning in a manner of controlled.In this way Control can be realized by following movement: the origin signal SZ7~SZ9 that will respectively generate from scanning element U7~U9 is to Figure 31 Circuit or Figure 38 in the input such as secondary origin generative circuit CAan and generate secondary origin signal ZP7~ZP9；In response to pair original It puts signal ZP7~ZP9 and makes corresponding selection optical element AOM7~AOM9 respectively successively as the On shape of certain time interval T on State, and will be distinguished with the serial data DL7~DL9 for describing description corresponding to the pattern that line SL7~SL9 respectively describes Successively the driving circuit 206a of the electrooptic element 206 into the 2nd light supply apparatus 14B ' is sent out.
(variation 5)
Figure 44 shows the selection of variation 5 structure of the drive circuit DRVn of optical element AOMn.As previous Illustrate in each embodiment and variation like that, in multiple scanning element Un respectively every the more than one reflection of polygonal mirror PM In the case that face RP carries out light beam scanning, the light beam LB (LBa, LBb) that is projected from light supply apparatus 14 ' (14A ', 14B '), from description Light beam LBs, LBp projected with optical element AOMa, AOMb, from the multiple selections optical element AOMn configured along its optical path Transmission.In Figure 44, light beam LB uses up element AOM3 by selection and cuts after being transmitted from selection with optical element AOM1, AOM2 It changes, and produces the light beam LB3 towards scanning element U3.Be typically chosen with the optical material in optical element AOMn relative to The light beam LB (such as wavelength 355nm) of ultraviolet band has relatively high transmissivity, but the attenuation rate with a few % degree.
In the case where each selection is set as 95% with the transmissivity of optical element AOMn, used in selection as shown in Figure 44 When optical element AOM3 becomes On state, bear to the selection intensity of the light beam LB of optical element AOM3 incidence based on two choosings The decaying caused by optical element AOM1, AOM2 is selected, therefore relative to the original light to selection with optical element AOM1 incidence Beam intensity (100%) and become about 90% (0.952).Moreover, be connected in six selections optical element AOM1~AOM6 In the case of, to last selection with the intensity of the light beam LB of optical element AOM6 incidence by based on five selection optical elements Decaying caused by AOM1~AOM5, therefore become about 77% (0.95 relative to original beam intensity (100%)5)。
As a result, to six select with optical element AOM1~AOM6 respectively incident light beam LB intensity in order for 100%, 95%, 90%, 85%, 81%, 77%.This means that by selecting to be penetrated with each self-deflection of optical element AOM1~AOM6 The intensity of light beam LB1~LB6 out is also altered in steps with the ratio.Therefore, multiple shown in Figure 38 in this variation 5 Selection adjusts the driving item of selection optical element AOM1~AOM6 in the respective drive circuit DRVn of optical element AOMn Part, control are reduced at the variation for the intensity for making light beam LB1~LB6.
In Figure 44, since drive circuit DRV1~DRV6 (DRV5, DRV6 illustration omitted) is identical structure, so Only drive circuit DRV1 is described in detail.As shown in previous Figure 38, drive circuit DRV1~DRV6 respectively in Input has to selection optical element AOM1~AOM6 (in Figure 44, omitting the diagram of AOM5, AOM6) respective On state The information and secondary origin signal ZP1~ZP6 that On time Ton is set.In addition, being commonly equipped with and using in the structure of Figure 44 In the high frequency transmission source 400 for respectively applying ultrasonic wave to selection optical element AOM1~AOM6.Drive circuit DRV1 has: Receive the high-frequency signal from high frequency transmission source 400 and switch whether to be transferred at high speed to be zoomed into putting for high voltage amplitude The switching element 401 of big device 402；Switching element 401 is controlled based on the information of setting On time Ton and pair origin signal ZP1 Opening and closing logic circuit 403；It is applied to adjust to selection with optical element AOM1 with the magnifying power (gain) of adjustment amplifier 402 The fader 404 of the amplitude of the high-frequency signal of the high pressure added.
If the amplitude of the high-frequency signal of the high pressure applied to selection optical element AOM1 changes in permissible range, can The diffraction efficiency of enough fine tuning selection optical element AOM1 changes deflection and the intensity of the light beam LB1 (diffraction light) of injection. Therefore, in this variation 5, according to the driver for using optical element AOM1 from the selection close to that side of light supply apparatus 14 ' Circuit DRV1 to far from that side of light supply apparatus 14 ' selection optical element AOM6 drive circuit DRV6 sequence make to The mode that each selection is got higher with the amplitude of the high-frequency signal of the optical element AOMn high pressure applied, adjust gain adjuster 404.Example Such as, it will be set to the selection of the terminal of the optical path of light beam LB with the amplitude of the high-frequency signal of the optical element AOM6 high pressure applied The highest value Va6 of diffraction efficiency, by the height of the initial selection optical element AOM1 high pressure applied to the optical path of light beam LB The amplitude of frequency signal, which is set to the diffraction efficiency in permissible range, becomes the value Va1 of reduction state.To selection optics therebetween Amplitude Va2~Va5 of the high-frequency signal for the high pressure that element AOM2~AOM5 applies is configured to Va1 < Va2 < Va3 < Va4 < Va5 < Va6.
By setting above, the light respectively projected from six selections with optical element AOM1~AOM6 can be mitigated or inhibited The strength variance of beam LB1~LB6.Thereby, it is possible to inhibit by the light exposure of each description line SL1~SL6 pattern respectively described Deviation is able to carry out high-precision pattern plotter.Furthermore, it is not necessary that making the high pressure set by each drive circuit DRV1~DRV6 Amplitude Va1~Va6 of high-frequency signal successively become larger in order, be also possible to such as Va1=Va2 < Va3=Va4 < Va5= The relationship of Va6.In addition, adjusting the intensity for becoming light beam LB1~LB6 of description of point light SP by each scanning element U1~U6 Mode other than the method for variation 5, being also possible in the optical path in each scanning element U1~U6 setting has regulation Transmissivity dim light filter (ND filter) method.
In addition, in the drive circuit DRVn of Figure 44, by switching element 401 to whether high frequency transmission source will be come from 400 high-frequency signal is switched over to the transmitting of amplifier 402.But in order to improve the On/Off of selection optical element AOMn Switching when responsiveness (rising characteristic), can also be in the state that diffraction efficiency be substantially considered as 0, for example, by primary The intensity when intensity of diffraction light is relative to On is that 1/1000 or less such low level high-frequency signal continues always to selection Applied with optical element AOMn, only applies the high-frequency signal of high level appropriate with optical element AOMn to selection in On state Add.Figure 45 shows the structure of such drive circuit DRVn, representatively shows the structure of drive circuit DRV1 herein, right Component identical with the component in Figure 44 marks identical appended drawing reference.
In the structure of Figure 45, additional two resistance RE1, RE2 being connected in series.The series circuit of resistance RE1, RE2 exist Switching element 401 is nearby inserted into high frequency transmission source 400 with switching element 401 in parallel, with resistance ratio RE2/ (RE1+RE2) point The high-frequency signal from high frequency transmission source 400 of pressure applies to amplifier 402 always.Resistance RE2 is being set as variable resistance And switching element 401 be Off (non-conduction) state when, with a diffraction light, the i.e. light projected from selection with optical element AOM1 The intensity of beam LB1 becomes the mode of sufficiently small value (such as 1/1000 or less original intensity), adjusts to selection optics The level for the high-frequency signal that element AOM1 applies.Like this, applied by resistance RE1, RE2 to selection optical element AOM1 high The bias (rising) of frequency signal, thus improves responsiveness.In addition, in this case, being Off (non-conduction) shape in switching element 401 It is also extremely weak intensity during state, but since light beam LB1 is incident to corresponding scanning element U1, so due to certain failures In the case that the conveying speed of substrate FS reduces or stops in description movement, light supply apparatus 14 ' (14A ', 14B ') will be located at The optical gate of outlet is closed, or insertion dim light filter.
(variation 6)
In above each embodiment, each variation, touch in the outer peripheral surface of the substrate FS and rotating cylinder DR that make sheet In the state of, based on multiple scanning element Un each along description line SLn on the surface for the substrate FS for bending to cylinder planar Carry out pattern plotter.It however, it can be that for example No. 2013/150677 pamphlet of International Publication No. discloses like that, by substrate FS The structure of processing is supported and is exposed while conveying along the long side direction planarly.In this case, if by substrate FS's Surface set is at parallel with X/Y plane, as long as then for example with scanning element U1, U3, U5 of odd number shown in Figure 23, Figure 24 Each irradiation central axis L e2, Le4, Le6 of each irradiation central axis L e1, Le3, Le5 and scanning element U2, U4, U6 of even number exist Parallel with Z axis each other and at certain intervals in the X-direction mode configures multiple sweep when observing in the face parallel with XZ plane Retouch unit U1~U6.

Claims (12)

1. a kind of pattern plotter device, which is characterized in that have:
Light-pulse generator device generates the light beam that can adjust the pulse type of cycle of oscillation；
1st delineation unit, using the light beam from the light-pulse generator device as point light projection to irradiated body on, and with Make the light to the irradiated body during projection and during non-projection by specified period repeatedly in the way of keep the light beam inclined Turn, is scanned described light along the 1st description line on the irradiated body；
2nd delineation unit, using the light beam from the light-pulse generator device as point light projection to the irradiated body on, and And during to make the projection and during the non-projection by specified period repeatedly in a manner of deflect the light beam, in the throwing It is scanned described light along the 2nd description line on the irradiated body different from the 1st description line；
1st control system, the 1st delineation unit and the 2nd delineation unit described in synchronously control so that the described 1st describe it is single , the throwing of 2nd delineation unit corresponding with during the non-projection of the 2nd delineation unit during the projection of member It is corresponding with during the non-projection of the 1st delineation unit during penetrating；With
2nd control system controls the light-pulse generator device, so that during the projection of the 1st delineation unit, The oscillation that the light beam is controlled based on the 1st delineation information of the pattern to be drawn by the 1st description line drawing, is retouched the described 2nd It is described to control based on the 2nd delineation information of the pattern to be drawn by the 2nd description line drawing during the projection for drawing unit The oscillation of light beam.
2. pattern plotter device as described in claim 1, which is characterized in that
1st delineation unit has the 1st deflection component for making light beam deflection, the 2nd delineation unit have make it is described 2nd deflection component of light beam deflection,
1st deflection component and the 2nd deflection component are respectively configured to, and the time during the non-projection is relative to institute Time during stating projection is 2 times or more.
3. pattern plotter device as claimed in claim 1 or 2, which is characterized in that
2nd control system has clock generator, and the size of described light is being set as Ds, by the scanning speed of described light When degree is set as Vs, the clock generator generation makes the light beam from the light-pulse generator device at least in the projection phase The interior basic frequency Fs with Vs/Ds or more carries out the clock signal of impulse hunting.
4. pattern plotter device as claimed in claim 3, which is characterized in that
1st delineation information includes for making the pattern to describe in the length range of the 1st description line along the point The 1st flexible multiplying power update information of the scanning direction of light, the 2nd delineation information include for making to describe line the described 2nd Length range in describe pattern along the scanning direction of described light stretch the 2nd multiplying power update information,
The clock generator makes the period of the clock signal locally stretch, so that described in the 1st delineation unit During projection, the cycle of oscillation that the light beam of the pulse type of impulse hunting is carried out with the basic frequency Fs is based on described the 1 multiplying power update information and locally stretch, during the projection of the 2nd delineation unit, with the basic frequency Fs The cycle of oscillation for carrying out the light beam of the pulse type of impulse hunting is based on the 2nd multiplying power update information and locally stretches.
5. pattern plotter device as described in claim 3 or 4, which is characterized in that
The light-pulse generator device is the fiber laser device comprising optical amplifier fiber and wavelength converting optical element.
6. pattern plotter device as claimed in claim 5, which is characterized in that
The fiber laser device includes:
1st Solid State Laser element generates steep pulse in response to the clock signal with the basic frequency Fs 1st kind of light of shape；
2nd Solid State Laser element generates the pulse type mitigated in response to the clock signal with the basic frequency Fs 2nd kind of light；With
Control circuit, based on it is corresponding with the pattern to be described on the irradiated body by the scanning element describe the data into Row switching, so that the one party in the 1st kind of light and the 2nd kind of light is selectively incident to the optical amplifier fiber.
7. pattern plotter device as claimed in claim 6, which is characterized in that
The light beam of the pulse type projected via the wavelength converting optical element of the fiber laser device is in 370mm Wave band below has the ultraviolet of peak wavelength.
8. pattern plotter device as claimed in claim 6, which is characterized in that
The control circuit with make the 1st kind of light energy and the 2nd kind of light energy become roughly the same mode, ring Clock signal described in Ying Yu and control shining for the 1st Solid State Laser element and the 2nd Solid State Laser element.
9. pattern plotter device as claimed in claim 8, which is characterized in that
The fiber laser device includes electrooptics modulator, the electrooptics modulator the 1st kind of light incident simultaneously and described 2nd kind of light, and controlled according to the switching of the polarization state based on the pattern data, so that the 1st kind of light and institute The one party stated in the 2nd kind of light is selectively incident to the optical amplifier fiber.
10. the pattern plotter device as described in any one of claim 5~9, which is characterized in that
The clock signal is set so that described in the impulse hunting of the light beam projected from the fiber laser device Basic frequency Fs is hundreds of MHz.
11. pattern plotter device as claimed in claim 10, which is characterized in that
The basic frequency Fs is set to the one party in 100MHz, 200MHz, 300MHz and 400MHz.
12. pattern plotter device as claimed in claim 5, which is characterized in that
1st deflection component and the 2nd deflection component are the rotating multisurface for making the light beam one-dimensionally deflection scanning respectively Mirror,
1st control system is with polygonal rotating mirror speed mutually rotating and the phase locked state of rotation angle to the rotation Turn polygonal mirror and carries out rotation control respectively.
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