KR101988825B1 - Light source device for pattern drawing and light source device for exposure - Google Patents

Abstract

A first laser light source part for generating a first quadrature in a first polarization state in which a pulse oscillates so as to have a first peak intensity at a predetermined frequency Fs and a second laser light source part for outputting a first laser light having the same energy as the first laser light, A second laser light source section for generating a pulse at a predetermined frequency Fs in synchronization with the first peak light at a second peak intensity and for generating a second peak light in a second polarization state in which the polarization direction is changed by 90 degrees with respect to the first polarization state, When the imaging information is in an off state, the first and second light beams are emitted without modulating the polarization state of the first and second light beams. When the imaging information indicates the on state, An electro-optical element for modulating the first to fourth polarized light states into a first polarized light state to a second polarized light state and modulating the second heptas from the second polarized light state to the first polarized light state, A polarized beam splitter for converting the wavelength of the first helix emitted from the optical amplifier when the optical amplifier is on, And a wavelength conversion optical member for converting the wavelength of the second helix emitted from the optical amplifier when it is in the OFF state and generating a drawing beam in the form of pulse light having an ultraviolet wavelength with a low peak intensity.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a light source device for patterning and a light source device for exposure,

BACKGROUND OF THE INVENTION Field of the Invention [0001] The present invention relates to a light source device for patterning and a light source device for exposure for scanning spot light of a beam to be irradiated onto an object to be irradiated

A laser beam from one laser oscillator (laser beam light source) is divided into two by a half mirror, and the laser beam is divided into two by a half mirror, as disclosed in Japanese Patent Laid-Open Nos. 61-134724 and 2001-133710, A laser irradiation apparatus and a laser beam drawing apparatus are known which allow two laser beams to be scanned on a drawing body by causing each of the two laser beams to enter a polygon mirror (polygonal mirror). Japanese Laid-Open Patent Publication No. 2001-133710 discloses that each of two divided laser beams incident on two polygon mirrors is modulated by an AOM (acoustooptic element) that turns on / off in response to rendering data .

However, in the beam scanning by the polygon mirror, the incident laser beam is effective toward the drawing body during the rotation of the polygon mirror in accordance with the number of reflection surfaces of the polygon mirror, the incident condition of the optical system (f? Lens or the like) behind the polygon mirror, There may be a period in which reflection is impossible. Therefore, even when the laser beam is split into two by the half mirror and incident on the two polygon mirrors as in the prior art, there may be a period in which the laser beam can not be effectively irradiated to the object, that is, a non- , The laser beam from the light source can not be utilized effectively.

According to a first aspect of the present invention, there is provided a projection exposure apparatus for projecting a spot light of a intensity-modulated imaging beam based on imaging information indicating an on state for drawing a pixel of a pattern and an off state for non- A light source device for patterning, which irradiates the imaging beam for drawing a pattern on an object to be irradiated by scanning, wherein when an effective size of the spot light in the scanning direction is Ds and a scanning speed of the spot light is Vs A first laser light source section for generating a first quadrature (seed light) in a first polarization state in which a pulse oscillates so as to have a first peak intensity at a predetermined frequency Fs higher than a frequency determined by Vs / Ds, A pulse oscillation is generated at the predetermined frequency Fs in synchronization with the first peak light at a second peak intensity lower than the first peak intensity, and a polarization direction is set at 90 degrees with respect to the first polarization state A second laser light source unit for generating a second laser light of a first polarization state and a second laser light of a second polarization state, and a second laser light source unit for entering the first and second heptas together, and when the drawing information indicates the off state, Modulates the first sheated light from the first polarization state to the second polarization state when the imaging information indicates the on state, and outputs the second sheated light to the second polarization state when the imaging information indicates the on state, An electro-optical element that modulates and emits light from the polarization state to the first polarization state and one of the first and second light beams that is emitted from the electro-optical element into the second polarization state, A first polarizing beam splitter for converting the wavelength of the first sheathed light emitted from the optical amplifier when the polarizing beam splitter is in the ON state, And a wavelength conversion optical member for converting the wavelength of the second light emitted from the optical amplifier when the light is off, to generate the imaging beam in the form of pulse light having an ultraviolet wavelength with a low peak intensity.

According to a second aspect of the present invention, there is provided a projection exposure apparatus which projects an imaging beam whose intensity is modulated based on imaging information indicating an ON state for imaging a pixel of a pattern and an OFF state for non-imaging, onto a substrate moving in one direction, A light source device for supplying said imaging beam to an exposure device for exposing a pattern on said substrate, said exposure light source device comprising: a first light source for emitting a first pulse light having a first peak intensity at a predetermined frequency Fs in a range of 100 MHz to 400 MHz A first laser light source unit for generating a laser beam having a first peak intensity and a second peak intensity lower than the first peak intensity, A second laser light source section for generating a second laser light of a second polarization state in which the polarization direction is changed by 90 degrees with respect to the first polarization state, And when the drawing information indicates the off state, the first and the second heights are emitted without modulating the polarization states of the first and second heights, and when the drawing information indicates the on state, An electro-optical element for modulating the first to fourth polarized light from the first polarization state into the second polarization state and modulating the second heptas from the second polarization state to the first polarization state, A polarization beam splitter for converting the wavelength of the first sheathed light emitted from the optical amplifier to a peak intensity when the light is emitted from the optical amplifier, And the wavelength of the second sheathed light emitted from the optical amplifier is switched when it is in the off state The greater strength is provided with the optical wavelength conversion member for generating the imaging beam in a pulsed ultraviolet light of low wavelength.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a diagram showing a schematic configuration of a device manufacturing system including an exposure apparatus for performing exposure processing on a substrate of the first embodiment. FIG.
Fig. 2 is a view showing a supporting frame for supporting the drawing head and the rotary drum shown in Fig. 1. Fig.
Fig. 3 is a view showing the construction of the imaging head shown in Fig.
4 is a detailed configuration diagram of the light introducing optical system shown in Fig.
Fig. 5 is a diagram showing a drawing line in which spot light is scanned by each scanning unit shown in Fig. 3; Fig.
Fig. 6 is a diagram showing the relationship between the polygon mirror of each scanning unit shown in Fig. 3 and the scanning direction of the drawing line. Fig.
Fig. 7 is a view for explaining the rotation angle of the polygon mirror that can deflect (reflect) the laser light so that the reflection surface of the polygon mirror shown in Fig. 3 is incident on the f-theta lens.
Fig. 8 is a schematic diagram of the light-introducing optical system shown in Fig. 3 and the optical paths of a plurality of scanning units.
FIG. 9 is a view showing a configuration of a writing head in a modification of the first embodiment. FIG.
10 is a detailed configuration diagram of the light introducing optical system shown in Fig.
11 is a view showing the configuration of the imaging head of the second embodiment.
12 is a view showing the light introducing optical system shown in Fig.
Fig. 13 is a diagram schematically showing the optical paths of the light-introducing optical system and the plurality of scanning units shown in Fig.
14 is a block diagram showing an example of a control circuit for rotationally driving each polygon mirror of the plurality of scan units shown in Fig.
15 is a timing chart showing an example of the operation of the control circuit shown in Fig.
16 is a block diagram showing an example of a circuit for generating rendering bit stream data supplied to the imaging optical elements shown in Figs. 11 to 13. Fig.
17 is a diagram showing a configuration of a light source device according to a modified example of the second embodiment.
18 is a block diagram showing a configuration of a control unit for drawing control according to the third embodiment.
Fig. 19 is a diagram showing a time chart showing the signal states of the respective parts and the oscillation state of the laser light during patterning in the control unit of Fig. 18; Fig.
20 is a time chart showing a clock signal for pulse light oscillation produced by the control circuit of the light source device of Fig.
FIG. 21 is a time chart for explaining a manner of correcting the clock signal of FIG. 20 for the imaging magnification correction.
Fig. 22 is a diagram for explaining a correction method of the imaging magnification in one imaging line (scanning line).
23 is a diagram showing a schematic configuration of a device manufacturing system including an exposure apparatus for performing exposure processing on the substrate of the fourth embodiment.
24 is a detailed view of the rotary drum of FIG. 23 with the substrate wound thereon.
Fig. 25 is a diagram showing alignment lines formed on a substrate and a drawing line of spot light. Fig.
26 is a configuration diagram of the beam switching member.
FIG. 27A of FIG. 27 is a view showing the switching of the optical path of the beam by the optical element for selection from the + Z direction side, and FIG. 27B is a view of switching of the optical path of the beam by the optical element for selection from the -Y direction side.
28 is a diagram showing an optical configuration of the scanning unit.
FIG. 29 is a view showing a configuration of an origin sensor provided around the polygon mirror of FIG. 28;
30 is a time chart showing the relationship between the origin timing of the origin signal and the drawing start timing.
31 is a configuration diagram of a minor point generating circuit for generating a sub origin signal in which the origin signal is extracted and the generation timing thereof is delayed by a predetermined time.
Fig. 32 is a diagram showing a time chart of the minor point signal generated by the minor point generation circuit of Fig. 31; Fig.
33 is a block diagram showing the electrical configuration of the exposure apparatus.
34 is a time chart showing the timing at which the origin signal, the minor point signal, and the serial data are output.
Fig. 35 is a diagram showing a configuration of the rendering data output control unit shown in Fig. 33. Fig.
36 is a configuration diagram of the beam switching member of the fifth embodiment.
37 is a view showing an optical path when the position of the arrangement switching member in Fig. 36 is set to the first position. Fig.
38 is a diagram showing a configuration of the beam switching control section in the fifth embodiment.
39 is a diagram showing the configuration of the logic circuit of Fig.
FIG. 40 is a timing chart illustrating the operation of the logic circuit of FIG. 39; FIG.
41 is a configuration diagram of the beam switching member according to the sixth embodiment.
Fig. 42 is a diagram showing the configuration when the arrangement of optical elements for selection (acoustooptic modulation elements) in the sixth embodiment is rotated by 90 degrees.
Fig. 43 is a diagram showing the transporting (transporting) form of the substrate and the arrangement relationship of the drawing lines according to Modification 3. Fig.
44 is a diagram showing the configuration of the driver circuit of the optical element for selection (acousto-optic modulation element) according to the fifth modification.
45 is a diagram showing a modification of the driver circuit in Fig.

A preferred embodiment of a pattern writing apparatus, a pattern drawing method, a beam scanning apparatus, a beam scanning method, a device manufacturing method, and a laser light source apparatus according to an aspect of the present invention will be described with reference to the accompanying drawings, do. Further, aspects of the present invention are not limited to these embodiments, but may include various modifications or improvements. That is, the constituent elements described below include those that can be easily assumed by those skilled in the art, substantially the same, and the constituent elements described below can be appropriately combined. In addition, various omissions, substitutions or alterations of the constituent elements can be made without departing from the gist of the present invention.

[First Embodiment]

Fig. 1 is a diagram showing a schematic configuration of a device manufacturing system 10 including an exposure apparatus EX for performing exposure processing on a substrate (object to be irradiated) FS of the first embodiment. In the following description, unless otherwise specified, an XYZ orthogonal coordinate system in which the gravity direction is the Z direction is set, and the X direction, the Y direction, and the Z direction are described along the arrows in the drawing do.

The device manufacturing system 10 is, for example, a manufacturing system in which a manufacturing line for manufacturing a flexible display, a flexible wiring, a flexible sensor or the like as an electronic device is built. Hereinafter, a description will be given assuming a flexible display as an electronic device. Examples of the flexible display include an organic EL display, a liquid crystal display, and the like. The device manufacturing system 10 is a system in which a substrate FS is fed (fed) from a feeding roll (not shown) wound in a roll shape to a flexible sheet-like substrate (sheet substrate) Called roll-to-roll system (hereinafter, referred to as " roll-to-roll system ") in which various processes are continuously performed on the substrate FS, . The substrate FS has a band-like shape in which the moving direction of the substrate FS is long (long) and the width direction is short (short). The substrate FS sent from the supply roll is subjected to various processes in turn by the processing apparatus PR1, the exposure apparatus (patterning apparatus, beam scanning apparatus) EX and the processing apparatus PR2, Is wound.

The X direction is a direction (conveyance direction) from the process apparatus PR1 to the process apparatus PR2 via the exposure apparatus EX in the horizontal plane. The Y direction is a direction orthogonal to the X direction within the horizontal plane, and is the width direction (short direction) of the substrate FS. The Z direction is a direction orthogonal to the X direction and the Y direction (upward direction (upper direction)) and parallel to the direction in which gravity acts.

As the substrate FS, for example, a resin film, a foil (foil) made of a metal such as stainless steel or an alloy, or the like is used. Examples of the material of the resin film include a resin such as a polyethylene resin, a polypropylene resin, a polyester resin, an ethylene vinyl copolymer resin, a polyvinyl chloride resin, a cellulose resin, a polyamide resin, a polyimide resin, a polycarbonate resin, Polystyrene resin, and vinyl acetate resin may be used. The thickness and stiffness (Young's modulus) of the substrate FS can be adjusted by passing the substrate FS through the conveying path of the exposure apparatus EX as a folded state due to buckling, So long as the wrinkles do not occur. A film of PET (polyethylene terephthalate) or PEN (polyethylene naphthalate) having a thickness of about 25 mu m to 200 mu m as a base material of the substrate FS is a typical typical of a sheet substrate.

Since the substrate FS is sometimes subjected to heat in each processing performed by the processing apparatus PR1, the exposure apparatus EX and the processing apparatus PR2, the substrate FS having a material with a remarkably low thermal expansion coefficient ) Is preferably selected. For example, the thermal expansion coefficient can be suppressed by mixing the inorganic filler with the resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide, or the like. The substrate FS may be a single layer body made of ultra thin glass having a thickness of about 100 mu m manufactured by a float method or the like and the above resin film, Or a laminate (laminate) obtained by joining the laminate.

The flexibility of the substrate FS is not limited to the fact that the substrate FS is subjected to a force of about its own weight and is not sheared or broken, It is possible to bend it. Also, the property of bending by the force of the degree of self weight is included in flexibility. The degree of flexibility varies depending on the material, size and thickness of the substrate FS, the layer structure formed on the substrate FS, the environment such as temperature and humidity, and the like. In any case, when the substrate FS is properly wound on the conveyance direction switching member such as various conveying rollers and rotary drums provided in the conveying path in the device manufacturing system 10 according to the first embodiment, buckling If it is possible to carry the substrate FS smoothly without causing a folded mark or causing breakage (tearing or cracking), the range of flexibility can be said.

The process apparatus PR1 performs the process of the previous process with respect to the substrate FS which is exposed by the exposure apparatus EX. The process apparatus PR1 sends the substrate FS which has undergone the previous process to the exposure apparatus EX. The substrate FS to be sent to the exposure apparatus EX by the processes of the previous steps is a substrate (photosensitive substrate) having a photosensitive functional layer (photosensitive layer, photosensitive layer) formed on its surface.

This photosensitive functional layer is applied as a solution onto the substrate FS and dried to form a layer (film). Typically, the photosensitive functional layer is a photoresist (liquid or dry film), but is a material which does not require developing treatment. The hydrophilic property of the portion irradiated with ultraviolet light is modified (SAM), or a photosensitive reductant in which a plating reductant is exposed to ultraviolet light. When a photosensitive silane coupling agent is used as the photosensitive functional layer, the pattern portion exposed by ultraviolet light on the substrate FS is modified from lyophobic to lyophilic. Therefore, by selectively applying a conductive ink (ink containing conductive nanoparticles such as silver or copper) or a liquid containing a semiconductor material onto a lyophilic area, an electrode constituting a thin film transistor (TFT) , A pattern layer which becomes an insulating or connecting wiring or an electrode can be formed. When a photosensitive reductant is used as the photosensitive functional layer, a plating reductant is exposed on a pattern portion exposed by ultraviolet rays on the substrate. Therefore, after the exposure, the substrate FS is immediately dipped (immersed) in the plating liquid containing palladium ions for a predetermined time to form (precipitate) a pattern layer of palladium. Such a plating process is an additive process, but in the case of etching treatment as a subtractive process, the substrate FS to be sent to the exposure apparatus EX is made of PET Or PEN, and a metallic thin film such as aluminum (Al) or copper (Cu) may be entirely or selectively deposited on the surface thereof, and a photoresist layer may further be laminated thereon.

In the first embodiment, the exposure apparatus EX is an exposure apparatus of a straight drawing type which does not use a mask, that is, a so-called raster scan type exposure apparatus. The exposure apparatus EX irradiates a light pattern corresponding to a predetermined pattern for an electronic device for display, a circuit, a wiring, or the like on a surface to be irradiated (photosensitive surface) of the substrate FS supplied from the process apparatus PR1 . The exposure apparatus EX conveys the spot light SP of the beam for exposure (laser beam, irradiation light) LB to the substrate (not shown) while transporting the substrate FS in the + X direction (Scanning direction) in the predetermined scanning direction (Y direction) in the scanning direction FS (on the surface to be irradiated with the substrate FS), and the intensity of the spot light SP is scanned (On / off). As a result, a light pattern corresponding to a predetermined pattern such as an electronic device, a circuit, or a wiring is drawn and exposed on the surface (photosensitive surface) to be irradiated on the substrate FS. That is, the spot light SP is scanned two-dimensionally relatively on the surface to be irradiated of the substrate FS by the sub-scanning of the substrate FS and the main scanning of the spot light SP, and a predetermined pattern is drawn on the substrate FS Is exposed. Since the substrate FS is transported along the transport direction (+ X direction), the exposure area W in which the pattern is exposed by the exposure apparatus EX has a predetermined interval along the longitudinal direction of the substrate FS (See FIG. 5). Since the electronic device is formed in the exposure region W, the exposure region W is also an electronic device formation region. Further, since the electronic device is formed by overlapping a plurality of pattern layers (layers formed with patterns), a pattern corresponding to each layer may be exposed by the exposure apparatus EX.

The processing apparatus PR2 performs post-processing (e.g., plating, development, etching, and the like) on the substrate FS exposed by the exposure apparatus EX. By the subsequent process, a pattern layer of the device is formed on the substrate FS.

As described above, since the electronic device is constituted by overlapping a plurality of pattern layers, one pattern layer is generated through at least each process of the device manufacturing system 10. [ Therefore, in order to create an electronic device, each processing of the device manufacturing system 10 as shown in Fig. 1 must be performed at least twice. Therefore, the pattern layer can be stacked by mounting the recovery roll on which the substrate FS is wound, as a supply roll, to another device manufacturing system 10. Such an operation is repeated to form an electronic device. Therefore, the processed substrate FS becomes a state in which a plurality of electronic devices (exposure regions W) are connected to each other along the longitudinal direction of the substrate FS with a predetermined gap therebetween. In other words, the substrate FS is a multi-surface-mounted substrate.

The recovery roll recovered from the substrate FS formed with the electronic device connected thereto may be mounted on a dicing device (not shown). The dicing apparatus equipped with the recovery rolls divides (dices) the processed substrate FS for each electronic device (electronic device formation region W) to obtain a plurality of electronic devices. The dimension of the substrate FS is, for example, about 10 cm to 2 m in the width direction (direction of shortening) and the dimension in the longitudinal direction (elongation direction) is 10 m or more. The dimensions of the substrate FS are not limited to the above dimensions.

Next, the exposure apparatus EX will be described in detail. The exposure apparatus EX is stored in a temperature control (temperature control) chamber (ECV). By maintaining the inside of the temperature chamber (ECV) at a predetermined temperature, the shape change due to the temperature of the substrate (FS) conveyed in the inside is suppressed. The temperature chamber (ECV) is disposed on the mounting surface (E) of the manufacturing factory via a passive or active vibration isolating unit (SU1, SU2). The vibration isolating units SU1 and SU2 reduce the vibration from the mounting surface E. The mounting surface E may be the bottom surface of the factory or may be a surface on a pedestal that is provided on a floor surface to form a horizontal surface. The exposure apparatus EX includes a substrate transport mechanism 12 A light source device (pulse light source device, laser light source device) 14, a drawing head 16, and a control device 18.

The substrate transport mechanism 12 transports the substrate FS transported from the process apparatus PR1 at a predetermined speed in the exposure apparatus EX and then sends it to the process apparatus PR2 at a predetermined speed. The substrate transport mechanism 12 defines a transport path for the substrate FS transported in the exposure apparatus EX. The substrate transport mechanism 12 includes an edge position controller EPC, a drive roller R1, a tension adjustment roller RT1, and a rotary drum (not shown) in this order from the upstream side (-X direction side) (Cylindrical drum) DR, a tension adjustment roller RT2, a drive roller R2, and a drive roller R3.

The edge position controller (EPC) adjusts the position in the width direction of the substrate FS conveyed from the processing apparatus PR1 (in the direction of the short side of the substrate FS as the Y direction). That is, the edge position controller (EPC) controls the position of the substrate FS in the width direction of the substrate FS, which is transported with a predetermined tension, The substrate FS is moved in the width direction to adjust the position of the substrate FS in the width direction so as to fall within the range (allowable range). The edge position controller EPC has a roller on which the substrate FS is wound and an edge sensor (end detecting portion) (not shown) for detecting the position of an end portion (edge) in the width direction of the substrate FS. The roller of the edge position controller EPC is moved in the Y direction based on a detection signal to adjust the position of the substrate FS in the width direction. The driving roller R1 rotates while holding both sides of the front and back sides of the substrate FS conveyed from the edge position controller EPC and conveys the substrate FS toward the rotary drum DR. The edge position controller EPC controls the position of the substrate FS so that the longitudinal direction of the substrate FS wound on the rotary drum DR is always orthogonal to the central axis (rotation axis) AXo of the rotary drum DR. The parallelism (parallelism) between the rotation axis of the roller and the Y axis of the edge position controller (EPC) is adjusted so as to correct the inclination error in the advancing direction of the substrate FS by appropriately adjusting the position in the width direction of the substrate It may be adjusted appropriately.

The rotary drum DR has a central axis AXo extending in the Y direction and extending in a direction intersecting the direction in which the gravity acts and a cylindrical outer circumferential surface having a certain radius from the central axis AXo, The substrate FS is rotated about the center axis AXo and the substrate FS is transported in the + X direction while supporting a part of the substrate FS in the longitudinal direction along the outer peripheral surface (circumferential surface). The rotary drum DR supports the exposure area (portion) on the substrate FS onto which the beam LB (spot light SP) from the imaging head 16 is projected on its circumferential surface. On both sides of the rotary drum DR in the Y direction, there is provided a shaft Sft supported by an annular bearing so that the rotary drum DR rotates about the central axis AXo. The shaft Sft rotates about the center axis AXo by giving a rotational torque from a rotation drive source (not shown) (for example, composed of a motor and a deceleration mechanism) controlled by the control device 18 . Also, for convenience, a plane including the central axis AXo and parallel to the YZ plane is referred to as a center plane Poc.

The drive rollers R2 and R3 are arranged at a predetermined interval along the transport direction (+ X direction) of the substrate FS, and give a predetermined slack (clearance) to the exposed substrate FS. The drive rollers R2 and R3 rotate with maintaining both the front and back surfaces of the substrate FS in the same manner as the drive roller R1 and transport the substrate FS toward the processing apparatus PR2. The drive rollers R2 and R3 are provided on the downstream side (+ X direction side) in the transport direction with respect to the rotary drum DR and the drive roller R2 is provided on the upstream side -X direction side). The tension adjustment rollers RT1 and RT2 are pressed in the -Z direction and give a predetermined tension in the longitudinal direction to the substrate FS held and supported by the rotary drum DR. As a result, the tension applied to the substrate FS held on the rotary drum DR is stabilized within a predetermined range in the longitudinal direction. Further, the control device 18 rotates the drive rollers R1 to R3 by controlling a rotation drive source (not shown) (for example, a motor, a speed reducer, etc.).

The light source device 14 has a light source (a pulsed light source) and emits a pulsed beam (pulse light, laser light) LB. The beam LB is ultraviolet light having a peak wavelength in a wavelength band of 370 nm or less and the oscillation frequency (emission frequency) of the beam LB is Fs. The beam LB emitted by the light source device 14 is incident on the imaging head 16. The light source device 14 emits and emits the beam LB at the light emission frequency Fs under the control of the control device 18. [ The configuration of the light source device 14 will be described later in detail. However, the configuration of the light source device 14 is not limited to the semiconductor laser device that generates the pulse light in the infrared wavelength band, the fiber amplifier, and the pulse light in the amplified infrared wavelength band into the pulse light in the ultraviolet wavelength band A fiber amplifier laser light source which is composed of a wavelength conversion element (harmonic generation element) or the like and can obtain high-intensity ultraviolet pulse light having an oscillation frequency Fs of several hundreds MHz and emission time of one pulse light is about picosecond may be used.

The imaging head 16 is provided with a plurality of scanning units Un (U1 to U6) through which the beams LB are respectively incident. The writing head 16 is formed by a plurality of scanning units (drawing units) U1 to U6 on a part of the substrate FS supported by the circumferential surface of the rotary drum DR of the substrate conveying mechanism 12, A predetermined pattern is drawn. The imaging head 16 is a so-called multi-beam type imaging head 16 in which a plurality of scanning units U1 to U6 of the same configuration are arranged. The exposure area (electronic device formation region) W where the pattern is exposed is formed in a predetermined direction along the longitudinal direction of the substrate FS because the patterning head 16 repeatedly performs pattern exposure for the electronic device with respect to the substrate FS (See Fig. 5). The control device 18 controls each section of the exposure apparatus EX to execute processing on each section. The control device 18 includes a computer and a storage medium storing a program. The control device 18 functions as the control device 18 of the first embodiment by executing the program stored in the storage medium.

2 is a diagram showing a support frame (apparatus column) 30 for supporting a plurality of scanning units (drawing units) Un of the drawing head 16 and a rotary drum DR. The support frame 30 has a main body frame 32, a three-point support portion 34, and a writing head support portion 36. [ The support frame 30 is accommodated in a temperature control chamber (ECV). The body frame 32 rotatably supports the rotary drum DR and the tension adjustment roller RT1 (not shown), RT2 via an annular bearing. The three-point supporting portion 34 is provided at the upper end of the main body frame 32 and supports the writing head supporting portion 36 provided above the rotary drum DR at three points.

The imaging head supporting portion 36 supports the scanning units Un (U1 to U6) of the imaging head 16. The writing head supporter 36 is disposed on the downstream side (+ X direction side) in the carrying direction with respect to the center axis AXo of the rotary drum DR and in the width direction of the substrate FS (See Fig. 1). The writing head supporter 36 is arranged to support the scanning units U2, U4 and U6 on the upstream side (-X direction side) in the carrying direction with respect to the central axis AXo and in the width direction (See Fig. 1). Here, assuming that the drawing width in the Y direction (the scanning range of the spot light SP, the drawing line SLn) by one scanning unit Un is about 20 to 50 mm as an example, the odd-numbered scanning units U1 , U3, and U5 and the three scanning units Un in the even-numbered scanning units U2, U4, and U6 are arranged in the Y direction, the width in the Y-direction that can be drawn is widened to about 120 to 300 mm All.

3 is a view showing a configuration of the imaging head 16. In the first embodiment, the exposure apparatus EX includes two light source devices 14 (14a, 14b). The imaging head 16 includes a plurality of scanning units U1 to U6 and a light introducing optical system for guiding the beam LB from the light source device 14a to the plurality of scanning units U1 to U5 And a light introducing optical system (beam switching member) 40b for guiding the beam LB from the light source device 14b to the plurality of scanning units U2, U4 and U6.

First, a light introducing optical system (beam switching member) 40a will be described with reference to Fig. Since the light introducing optical systems 40a and 40b have the same configuration, the light introducing optical system 40a will be described here and the description of the light introducing optical system 40b will be omitted.

The light introducing optical system 40a includes a condenser lens 42, a collimating lens 44, a reflection mirror 46, a condenser lens 48, A reflecting mirror 52, a collimator lens 54, a condenser lens 56, a selecting optical element 58, a reflecting mirror 60, a collimator lens 62, a condenser lens 64, An optical element 66 for selection, a reflection mirror 68, and an absorber 70.

The condenser lens 42 and the collimator lens 44 magnify the beam LB emitted from the light source device 14a. Specifically, first, the condenser lens 42 converges the beam LB to the focal position on the back side of the condenser lens 42, and the collimator lens 44 converges after converging by the condenser lens 42 And the beam LB is made into a parallel beam having a predetermined beam diameter (for example, several millimeters).

The reflecting mirror 46 reflects the beam LB, which is collimated by the collimator lens 44, and irradiates the beam LB to the optical element 50 for selection. The converging lens 48 converges (converges) the beam LB incident on the selecting optical element 50 so as to become a beam waist in the selecting optical element 50. The optical element 50 for selection has a transmissivity with respect to the beam LB and, for example, an acousto-optic modulator (AOM) is used. When the ultrasonic signal (high-frequency signal) is applied, the AOM irradiates the incident beam LB (zero-order light) with the first-order diffracted light which is diffracted by the diffraction angle (diffraction angle) As shown in FIG. In the first embodiment, a beam LBn that is emitted as first-order diffracted light from each of the plurality of selection optical elements 50, 58, and 66 and is incident on the corresponding scanning units U1, U3, and U5, LB3 and LB5 and each of the optical elements for selection 50, 58 and 66 treats it as achieving the function of deflecting the optical path of the beam LB from the light source device 14 (14a). The configuration, function, action, and the like of each of the optical elements for selection 50, 58, and 66 may be the same. The optical elements for selection 50, 58 and 66 turn on / off the generation of diffracted light by diffracting the incident beam LB in accordance with on / off of the drive signal (high frequency signal) from the control device 18.

More specifically, when the driving signal (high-frequency signal) from the control device 18 is off, the selection optical element 50 irradiates the incident beam LB to the next-stage selection optical element 58 do. On the other hand, when the drive signal (high-frequency signal) from the control device 18 is ON, the selection optical element 50 diffracts the incident beam LB and transmits the beam LB1, which is the first diffracted light, (Not shown). The reflecting mirror 52 reflects the incident beam LB1 and irradiates the collimator lens 100 of the scanning unit U1. That is, by switching (driving) the selection optical element 50 on and off by the control device 18, the selection optical element 50 switches whether or not to cause the beam LB1 to enter the scanning unit U1 .

Between the selecting optical element 50 and the selecting optical element 58 are provided a collimator lens 54 for returning the beam LB irradiated to the selecting optical element 58 to parallel light, A converging lens 56 for converging (converging) the beam LB, which has been collimated by the collimating lens 54, to be the beam waist in the selecting optical element 58 is provided in the above order.

Like the optical element 50 for selection, the optical element for selection 58 has transparency with respect to the beam LB, and for example, an acousto-optic modulation element AOM is used. When the drive signal (high-frequency signal) transmitted from the control device 18 is off, the selection optical element 58 transmits the incident beam LB as it is to the selection optical element 66, When the drive signal (high frequency signal) transmitted from the device 18 is ON, the incident beam LB is diffracted and the beam LB3, which is the first diffracted light, is irradiated to the reflection mirror 60. [ The reflecting mirror 60 reflects the incident beam LB3 and irradiates the collimate lens 100 of the scanning unit U3. That is, by switching the selection optical element 58 on and off by the control device 18, the selection optical element 58 switches whether or not to cause the beam LB3 to enter the scanning unit U3.

Between the selecting optical element 58 and the selecting optical element 66 are provided a collimator lens 62 for returning the beam LB irradiated to the selecting optical element 66 to parallel light, A converging lens 64 for converging (converging) the beam LB, which has been collimated by the collimating optical system 62, to become the beam waist in the selection optical element 66 is provided in the above order.

Like the optical element 50 for selection, the optical element for selection 66 has transparency with respect to the beam LB, and for example, an acousto-optic modulation element AOM is used. The selection optical element 66 irradiates the incident beam LB toward the absorber 70 when the drive signal (high-frequency signal) from the control device 18 is in the off state, The incident beam LB is diffracted and the beam LB5, which is the first diffracted beam, is irradiated toward the reflecting mirror 68. In the case where the drive signal (high-frequency signal) The reflecting mirror 68 reflects the incident beam LB5 and irradiates the collimator lens 100 of the scanning unit U5. That is, the control device 18 switches the selection optical element 66 on and off, and the selection optical element 66 switches whether or not to cause the beam LB5 to enter the scanning unit U5. The absorber 70 is a light trap that absorbs the beam LB for suppressing leakage of the beam LB to the outside.

The selection optical elements 50, 58 and 66 of the light introducing optical system 40b are used to determine whether or not to allow the beam LB to enter the scanning units U2, U4 and U6 . In this case, the reflecting mirrors 52, 60 and 68 of the light introducing optical system 40b reflect the beams LB2, LB4 and LB6 emitted from the optical elements for selection 50, 58 and 66, U3, U4, and U6.

The actual acousto-optic modulation device AOM has the first-order diffracted light generating efficiency of about 80% of the zero-order light, so that the deflected beams LB1 (LB2) , LB3 (LB4), and LB5 (LB6) are lower than the intensity of the original beam LB. When any one of the selection optical elements 50, 58, and 66 is on, But about 0% of the zero-order light remaining straight is left, and it is finally absorbed by the absorber 70.

Next, the plurality of scanning units Un (U1 to U6) shown in Fig. 3 will be described. The scanning unit Un projects the spot light SP while converging the beam LBn from the light source device 14 (14a, 14b) onto the surface to be irradiated of the substrate FS to converge the spot light SP Is scanned one-dimensionally by a rotating polygon mirror PM along a predetermined linear drawing line (scanning line) SLn on the surface to be irradiated of the substrate FS. The drawing line SLn of the scanning unit U1 is denoted by SL1 and the drawing line SLn of the scanning units U2 to U6 is denoted by SL2 to SL6.

5 is a diagram showing drawing lines SLn (SL1 to SL6) in which spotlights SP are scanned by the respective scanning units Un (U1 to U6). As shown in Fig. 5, each of the scanning units Un (U1 to U6) covers the entire scanning area Un (U1 to U6) in the width direction of the exposure area W, It is sharing. As a result, each of the scanning units Un (U1 to U6) can draw a pattern for each of a plurality of regions divided in the width direction of the substrate FS. The lengths of the rendering lines SLn (SL1 to SL6) are, in principle, the same. In other words, the scanning distance of the spot light SP of the beam LBn scanned along each of the rendering lines SL1 to SL6 is, in principle, the same. When it is desired to increase the width of the exposure area W, the length of the drawing line SLn itself may be increased or the number of the scanning units Un arranged in the Y direction may be increased.

The actual drawing lines SLn (SL1 to SL6) are set to be slightly shorter than the maximum length at which the spot light SP can actually be scanned on the surface to be irradiated. For example, assuming that the maximum length of the writing line SLn that can be patterned is 30 mm when the imaging magnification in the main scanning direction (Y direction) is the initial value (no magnification correction), the maximum value of the spot light SP on the surface to be irradiated The scan length is set to about 31 mm with a margin of about 0.5 mm on each of the scan start point side and the scan end point side of the drawing line SLn. By setting in this way, it is possible to finely adjust the position of the drawing line SLn of 30 mm in the main scanning direction within the range of the maximum scanning length 31 mm of the spot light SP, and finely adjust the imaging magnification. The maximum scanning length of the spot light SP is not limited to 31 mm and the maximum scanning length of the spot light SP is not limited to 31 mm and the maximum scanning length of the spot light SP is not limited to 31 mm, (Diameter), and may be 31 mm or more.

The plurality of drawing lines (scanning lines) SL1 to SL6 are arranged in two rows in the circumferential direction of the rotary drum DR with the center plane Poc therebetween. The drawing lines SL1, SL3 and SL5 are located on the substrate FS on the downstream side (the + X direction side) in the carrying direction with respect to the center plane Poc. The drawing lines SL2, SL4 and SL6 are positioned on the substrate FS on the upstream side (-X direction side) in the carrying direction with respect to the center plane Poc. Each of the drawing lines SLn (SL1 to SL6) is substantially parallel along the width direction of the substrate FS, that is, along the central axis AXo of the rotary drum DR, and the length in the width direction of the substrate FS .

The drawing lines SL1, SL3 and SL5 are arranged at predetermined intervals along the width direction (scanning direction, Y direction) of the substrate FS and the drawing lines SL2, Are arranged at predetermined intervals along the width direction (scanning direction, Y direction). At this time, the drawing line SL2 is disposed between the drawing line SL1 and the drawing line SL3 in the width direction of the substrate FS. Similarly, the drawing line SL3 is disposed between the drawing line SL2 and the drawing line SL4 in the width direction of the substrate FS. The drawing line SL4 is disposed between the drawing line SL3 and the drawing line SL5 in the width direction of the substrate FS. The drawing line SL5 is disposed between the drawing line SL4 and the drawing line SL6 in the width direction of the substrate FS. That is, the drawing lines SL1 to SL6 are arranged so as to cover all of the width direction of the exposure area W to be drawn on the substrate FS.

The scanning direction of the spot light SP of the beam LBn (LB1, LB3, LB5) to be scanned along each of the odd-numbered imaging lines SL1, SL3, SL5 is a one-dimensional direction, . The scanning direction of the spot light SP of the beam LBn (LB2, LB4, LB6) scanned along each of the even-numbered imaging lines SL2, SL4, SL6 is a one-dimensional direction, . The scanning direction of the beam LBn (spot light SP) scanned along the drawing lines SL1, SL3 and SL5 and the scanning direction of the beam LBn (spot light SP) scanned along the drawing lines SL2, SL4, (SP) have opposite scanning directions. More specifically, the scanning direction of the beam LBn (spot light SP) scanned along the drawing lines SL2, SL4 and SL6 is the + Y direction and is scanned along the drawing lines SL1, SL3 and SL5 The scanning direction of the beam LBn (spot light SP) is the -Y direction. This is because the polygon mirror PM that rotates in the same direction is used as the polygon mirror PM of the scanning units U1 to U6. As a result, the rendering start positions (the positions of the rendering start points (the scanning start points)) of the rendering lines SL1, SL3, and SL5 and the rendering start positions of the rendering lines SL2, SL4, and SL6 are adjacent (Or partially duplicated). The drawing end positions (positions of the drawing end points (the scanning end points) of the drawing lines SL3 and SL5 and the drawing end positions of the drawing lines SL2 and SL4 are adjacent (or partially overlap) with respect to the Y direction. In the case where the drawing lines SLn are arranged such that the end portions of the drawing lines SLn adjacent to each other in the Y direction are partially overlapped with each other, , Or in the range of several percent or less in the Y direction including the painting end position.

The width of the drawing line SLn in the sub-scan direction is a thickness corresponding to the size (diameter)? Of the spot light SP. For example, when the size? Of the spot light SP is 3 占 퐉, the width of the drawing line SLn in the sub-scan direction becomes 3 占 퐉. The spot light SP may be projected along the drawing line SLn so as to overlap by a predetermined length (for example, half of the size? Of the spot light SP). When the drawing lines SLn adjacent to each other in the Y direction (for example, the drawing line SL1 and the drawing line SL2) are adjacent to each other (for example, Half of the size? Of the spot light SP).

Since the beam LB from the light source device 14 is a pulse light, the spot light SP projected onto the imaging line SLn during the main scanning is incident on the beam LB of the beam LB, And becomes discrete according to the frequency Fs. Therefore, it is necessary to overlap the spot light SP projected by the one pulse light of the beam LB and the spot light SP projected by the next one pulse light in the main scanning direction. The amount of the overlap is set by the size? Of the spot light SP, the scanning speed Vs of the spot light SP and the oscillation frequency Fs of the beam LB, but the intensity distribution of the spot light SP is set to a Gaussian distribution It is preferable that the effective diameter size? Determined by 1 / e ² (or 1/2) of the peak intensity of the spot light SP is about? / 2. Therefore, also in regard to the sub-scanning direction (the direction orthogonal to the drawing line SLn), between the scanning of the spot light SP along the drawing line SLn and the next scanning, Of the effective size < RTI ID = 0.0 > of. ≪ / RTI > The setting of the amount of exposure to the photosensitive functional layer on the substrate FS can be performed by adjusting the peak value of the beam LB (pulse light). However, if the intensity of the beam LB can not be increased, The decrease of the scanning speed Vs of the spot light SP in the main scanning direction and the increase of the oscillation frequency Fs of the beam LB or the decrease of the conveying speed of the substrate FS in the sub scanning direction, The overlap amount of the spot light SP with respect to the main scanning direction or the sub scanning direction may be increased to not less than half of the effective size?.

Next, the configuration of the scanning unit Un shown in Fig. 3 will be described. In addition, since each of the scanning units U1 to U6 has the same configuration, only the scanning unit U1 will be described here. The scanning unit U1 includes a collimator lens 100, a reflecting mirror 102, a condenser lens 104, a drawing optical element 106, and a collimator lens (not shown) behind the reflecting mirror 52 shown in Fig. A reflecting mirror 110, a cylindrical mirror CYa, a reflecting mirror 114, a polygon mirror (optical scanning member, a deflecting member) PM, an f? Lens FT, a cylindrical mirror CYb, And a reflection mirror 122. The collimator lenses 100 and 108, the reflection mirrors 102, 110, 114 and 122, the condenser lens 104, the cylindrical lenses CYa and CYb and the f? Lens FT constitute an optical lens system.

The reflecting mirror 102 reflects the beam LB1 incident from the collimator lens 100 in the -Z direction in FIG. 3 and enters the imaging optical element 106 as a drawing light modulator. The converging lens 104 converges (converges) the beam LB1 (parallel beam (light beam)) incident on the imaging optical element 106 to be a beam waist in the imaging optical element 106. [ The imaging optical element 106 has transmittance with respect to the beam LB1, and for example, an acousto-optic modulation element (AOM) is used. The drawing optical element 106 irradiates the incident beam LB1 onto a shielding plate or absorber (not shown) when the drive signal (high-frequency signal) from the control device 18 is off, Diffracts the incident beam LB1 and reflects the primary diffracted light (the beam LB1, which is intensity-modulated according to the pattern data) when the drive signal (high-frequency signal) And irradiates the mirror 110. The shield plate and the absorber are intended to suppress leakage of the beam LB1 to the outside.

Between the reflecting mirror 110 and the imaging optical element 106 is provided a collimator lens 108 which collimates the beam LB1 incident on the reflecting mirror 110. [ The reflecting mirror 110 reflects the incident beam LB1 toward the reflecting mirror 114 in the -X direction and the reflecting mirror 114 reflects the incident beam LB1 toward the polygon mirror PM. The polygon mirror (rotary polygonal mirror) PM reflects the incident beam LB1 toward the -X direction toward the f? Lens FT having the optical axis parallel to the X axis. The polygon mirror PM deflects (reflects) the incident beam LB1 in a plane parallel to the XY plane in order to scan the spotlight SP of the beam LB1 on the surface to be irradiated on the substrate FS. Specifically, the polygon mirror PM includes a rotation axis AXp extending in the Z direction, a plurality of reflection surfaces RP (eight reflection surfaces RP in the first embodiment) formed around the rotation axis AXp, ). The reflection angle of the pulse-like beam LB1 irradiated on the reflection surface RP can be continuously changed by rotating the polygon mirror PM around the rotation axis AXp in the predetermined rotation direction. Thereby, the reflection direction of the beam LB1 is deflected by one reflection surface RP, and the spot light SP of the beam LB1 irradiated onto the surface to be irradiated on the substrate FS is projected in the scanning direction (Width direction of the focal plane FS, Y direction). That is, the polygon mirror PM deflects the incident beam LB1 and scans the spot light SP along the imaging line (scanning line) SL1 shown in Fig. The polygon mirror PM is rotated at a constant speed by a rotation driving source (for example, a motor, a deceleration mechanism or the like) (not shown). This rotation driving source is controlled by the control device 18. [

Since the spot light SP of the beam LB1 can be scanned along the drawing line SL1 by one reflecting surface RP of the polygon mirror PM, The number of the imaging lines SL1 on which the spot light SP is scanned on the surface to be irradiated of the substrate FS is eight equals to the number of the reflective surfaces RP at the maximum. The effective length (for example, 30 mm) of the imaging line SL1 is set to a maximum scanning length (for example, 31 mm) capable of scanning the spot light SP by the polygon mirror PM, And in the initial setting (design), the center point of the drawing line SL1 is set at the center of the maximum scanning length.

As an example, the effective length of the drawing line SL1 is 30 mm, the spot light SP is overlapped with the drawing line SL1 while overlapping the spot lights SP having an effective size of 3 m by 1.5 占 퐉 The number of spot lights SP irradiated in a single scan (the number of pulses of the beam LB from the light source device 14) is 20,000 (30 mm / second) when irradiated onto the surface to be irradiated on the substrate FS, 1.5 占 퐉). If the scanning time of the spot light SP along the drawing line SL1 is 200 mu sec, the pulse-like spot light SP must be irradiated 20,000 times in the meantime, so that the light emission frequency Fs of the light source device 14 becomes Fs > 20000 times / 200 mu sec = 100 MHz.

Returning to the description of the configuration of the scanning unit U1, the cylindrical lens CYa provided between the reflecting mirror 110 and the reflecting mirror 114 is arranged in the Z direction (non-scanning direction) orthogonal to the scanning direction Converges (converges) the beam LB1 on the reflecting surface RP of the polygon mirror PM in a long oval shape (slit shape) extending in a direction parallel to the XY plane. Even if the reflecting surface RP is inclined with respect to the Z direction (Z-axis) (plane tilt error) due to the cylindrical lens CYa, the influence can be suppressed , The irradiation position of the spot light by the beam LB1 irradiated onto the substrate FS is prevented from shifting in the carrying direction (X direction) of the substrate FS.

The beam LB1 reflected by the polygon mirror PM is irradiated to the f? Lens FT including the condenser lens. The f? Lens FT having the optical axis extending in the X-axis direction is a mirror of the reflection mirror 122 such that the beam LB1 reflected by the polygon mirror PM is parallel to the X- (Telecentric) scan lens system. The incident angle? Of the beam LB1 to the f? Lens FT changes in accordance with the rotation angle? / 2 of the polygon mirror PM. The f? lens FT projects the beam LB1 at an image height position on the surface to be irradiated of the substrate FS proportional to the incident angle?. Assuming that the focal length is fo and the image height is y, the f? Lens FT has a relationship of y = fo?. Therefore, the beam LB1 (spot light SP) can be accurately scanned at the uniform velocity (constant velocity) in the Y direction by the f? Lens FT. When the incident angle to the f? lens FT is 0 degree, the beam LB1 incident on the f? lens FT proceeds along the optical axis of the f? lens FT.

The beam LB1 irradiated from the f? lens FT is irradiated as a spot light SP on the substrate FS through the reflecting mirror 122. [ The cylindrical lens CYb provided between the f? lens FT and the reflecting mirror 122 is a cylindrical lens having a diameter of about several micrometers in diameter 3 mu m), and the busbars are parallel to the Y direction. Thus, on the substrate FS, a drawing line SL1 (see Fig. 5) extending in the Y direction by the spot light (scan spot) SP is defined. In the absence of the cylindrical lens CYb, the spot light SP converged on the substrate FS by the action of the cylindrical lens CYa in front of the polygon mirror PM is directed in the scanning direction Y (X direction) perpendicular to the longitudinal direction (X direction).

As described above, the spot light SP of the beam LB is scanned in the scanning direction (Y direction) by each of the scanning units U1 to U6 while the substrate FS is being transported in the X direction, Is patterned on the substrate FS. Each of the scanning units U1 to U6 is arranged in the imaging head supporter 36 so as to scan another area on the substrate FS. Ds represents the dimension of the spot light SP in the scanning direction on the substrate FS (the length of the imaging line), Vs represents the scanning speed (relative scanning speed) of the spot light SP on the substrate FS , The oscillation frequency Fs of the beam LB needs to satisfy the relation of Fs > Vs / Ds. Since the beam LB is a pulse light, when the oscillation frequency Fs does not satisfy the relation of Fs? Vs / Ds, the spot light SP (?) Of the beam LB is irradiated onto the substrate FS with a predetermined gap ) Will be investigated. If the oscillation frequency Fs satisfies the relation of Fs > Vs / Ds, the spot light SP can be irradiated onto the substrate FS so as to overlap with each other in the scanning direction, The straight line pattern continuous to the substrate FS can be satisfactorily drawn on the substrate FS. Further, the scanning speed Vs of the spot light SP becomes faster as the rotation speed of the polygon mirror PM increases.

6 is a diagram showing the relationship between the polygon mirror PM of each of the scanning units U1 to U6 and the scanning direction of a plurality of drawing lines SLn (SL1 to SL6). The reflection mirror 114, the polygon mirror PM and the f? Lens FT are disposed on the center plane Poc of the plurality of scanning units U1, U3, and U5 and the plurality of scanning units U2, U4, As shown in Fig. Therefore, by rotating the polygon mirror PM of each of the scanning units U1 to U6 in the same direction (counterclockwise), each of the scanning units U1, U3, U5 is moved from the drawing start position toward the drawing end position - The scanning units U2, U4 and U6 scan the spot lights SP of the beam LB in the + Y direction from the drawing start position to the drawing end position, . By making the direction of rotation of the polygon mirror PM of each of the scanning units U2, U4 and U6 reverse to the direction of rotation of the polygon mirror PM of each of the scanning units U1, U3 and U5, The scanning direction of the spot light SP of the beam LB of the light sources U1 to U6 may be set to the same direction (+ Y direction or -Y direction).

Here, since the polygon mirror PM is rotating, the angle of the reflecting surface RP also changes with the lapse of time. The rotation angle alpha of the polygon mirror PM capable of causing the beam LB incident on the specific reflection surface RP of the polygon mirror PM to enter the f? Lens FT is limited.

7 shows the rotation angle of the polygon mirror PM capable of deflecting (reflecting) the beam LBn so that the reflection surface RP of the polygon mirror PM of the scanning unit Un is incident on the f? Lens FT. Fig. This rotation angle? Is the angle of rotation of the polygon mirror PM of the scanning unit Un with which the polygon mirror PM can scan the spot light SP on the irradiated surface of the substrate FS The maximum scan rotation angle range. Hereinafter, the rotation angle? Is referred to as a maximum rotation rotation angle range. A period in which the polygon mirror PM rotates by the maximum scanning rotation angle range? Is the effective scanning period (maximum scanning time) of the spot light SP. The maximum scan rotation angle range? Corresponds to the maximum scan length of the above-described drawing line SLn, and the larger the maximum scan rotation angle range?, The longer the maximum scan length. The rotation angle beta is a value obtained from the angle of the polygon mirror PM at the time when the incidence of the beam LB to the specific one reflective surface RP is started to the time when the incidence to the specific reflective surface RP is finished The angle of rotation of the polygon mirror PM to the angle of the polygon mirror PM. That is, the rotation angle? Is an angle at which the polygon mirror PM is rotated by one surface (surface) of the reflection surface RP. The rotational angle? Is defined by the number Np of the reflecting surfaces RP of the polygon mirror PM, and can be expressed as?? 360 / Np. The specific reflecting surface RP of the polygon mirror PM of the scanning unit Un can not scan the spot light SP on the irradiated surface of the substrate FS, The non-scanning rotational angle range? Of the polygon mirror PM, in which the reflected light reflected by the specific reflecting surface RP can not be incident on the f? Lens FT, is represented by the following expression:? =? -? A period in which the polygon mirror PM rotates by the non-scanning rotation angle range? Is the invalid scanning period of the spot light SP. In this non-scanning rotation angle range?, The scanning unit Un can not irradiate the beam LBn onto the substrate FS. The rotation angle? And the non-scanning rotation angle range? Have the relationship of the equation (1).

? = (360 degrees / Np) -? (One)

(Where N is the number of reflecting surfaces RP of the polygon mirror PM)

In the first embodiment, since the polygon mirror PM has eight reflecting surfaces RP, N = 8. Therefore, equation (1) can be expressed by equation (2).

? = 45 degrees-? (2)

The maximum scanning rotation angle range? Is changed depending on conditions such as the distance between the polygon mirror PM and the f? Lens FT. For example, assuming that the maximum scanning rotation angle range? Is 15 degrees, the non-scanning rotation angle range? Is 30 degrees, and the scanning efficiency of the polygon mirror PM is? /? = 1/3 in FIG. . That is, while the polygon mirror PM of the scanning unit Un rotates by the non-scanning rotational angle range? (30 degrees), the beam LBn incident on the polygon mirror PM is discarded.

Thus, in the first embodiment, the scanning unit Un for inputting the beam LB from one light source device 14 is switched, and the beam LB is periodically transmitted to the three scanning units Un Thereby improving the scanning efficiency. That is, by shifting the imaging periods (the scanning period for scanning the spot light SP) of the three scanning units Un with each other, the beam LB from the light source device 14 is not wasted, Improvement.

The maximum scanning rotation angle range a that is the effective scanning period (effective imaging period) is a range in which the beam LBn is incident on the f? Lens FT and the spot light SP is in a range capable of effectively scanning the imaging line SLn However, the maximum scanning rotation angle range? Is also changed depending on the focal length or the like on the front side of the f? Lens FT. When the maximum scanning rotation angle range? Is 10 degrees in the eight-sided polygon mirror PM, the non-scanning rotation angle range? As the non-imaging period becomes 35 degrees from the equation (2), and the scanning efficiency Is about 1/4 (10/45). On the contrary, when the maximum scanning rotation angle range? Is 20 degrees, the non-scanning rotation angle range? As the non-imaging period becomes 25 degrees from the equation (2) . Further, when the scanning efficiency is 1/2 or more, the number of the scanning units Un for distributing the beam LB may be two. That is, the number of the scanning units Un capable of distributing the beam LB is limited by the scanning efficiency.

8 is a diagram schematically showing optical paths of the light introducing optical system 40a and the plurality of scanning units U1, U3, and U5. When the drive signal (high-frequency signal) applied to the selection optical element (AOM) 50 is ON from the control device 18 and the drive signal applied to the selection optical elements 58 and 66 is OFF, The optical element 50 diffracts the incident beam LB. As a result, the beam LB1 diffracted by the selection optical element 50 is incident on the scanning unit U1 via the reflecting mirror 52, and the scanning units U3 and U5 The beam LB is not incident. Likewise, when the drive signal applied to the selection optical element (AOM) 58 is ON from the control device 18 and the drive signal applied to the selection optical elements 50 and 66 is OFF, The beam LB transmitted through the selective optical element 50 is incident on the selective optical element 58 and the selective optical element 58 diffracts the incident beam LB. As a result, the beam LB3 diffracted by the selective optical element 58 is incident on the scanning unit U3 via the reflecting mirror 60, and the scanning units U1 and U5 The beam LB is not incident. When the drive signal applied to the selection optical element (AOM) 66 is ON from the control device 18 and the drive signal applied to the selection optical elements 50 and 58 is OFF, The beam LB transmitted through the selection optical elements 50 and 58 is incident on the selection optical element 66 and the selection optical element 66 diffracts the incident beam LB. As a result, the beam LB5 diffracted by the selective optical element 66 is incident on the scanning unit U5 by the reflecting mirror 68, and the scanning units U1 and U3 are irradiated with the beams LB) is not incident.

As described above, by arranging the plurality of selection optical elements 50, 58, 66 of the light introducing optical system 40a in series along the traveling direction of the beam LB from the light source device 14a, The optical elements 50, 58 and 66 select whether the beams LBn (LB1, LB3, LB5) are to be incident on any one of the plurality of scanning units U1, U3, U5 You can switch. The control device 18 determines whether or not the scanning unit Un to which the beam LB is incident is in the same sequence as the scanning unit U1 to the scanning unit U3 to the scanning unit U5 to the scanning unit U1 58, and 66 so as to periodically switch the optical elements 50, 58, and 66 as shown in Fig. That is, the beams LBn (LB1, LB3, LB5) are sequentially incident on the plurality of scanning units U1, U3, U5 for a predetermined scanning time.

The polygon mirror PM of the scanning unit U1 is rotated so that the incident beam LB1 can be reflected toward the f? Lens FT during the period in which the beam LB1 is incident on the scanning unit U1, Is controlled by the control device 18. That is, the period during which the beam LB1 is incident on the scanning unit U1 and the period during which the spotlight SP of the beam LB1 is scanned by the scanning unit U1 (maximum scanning rotational angle range? In FIG. 7) It is in sync. In other words, the polygon mirror PM of the scanning unit U1 is synchronized with the period in which the beam LB1 is incident, and the spot light SP of the beam LB1 incident on the scanning unit U1, And deflects the beam LB1 to scan along the slit SL1. Likewise, the polygon mirror PM of the scanning units U3 and U5 also transmits the incident beams LB3 and LB5 to the f? Lens FT during the time when the beams LB3 and LB5 are incident on the scanning units U3 and U5, The rotation of which is controlled by the control device 18. [0064] That is, the period in which the beams LB3 and LB5 enter the scanning units U3 and U5 and the scanning period of the spot lights SP of the beams LB3 and LB5 by the scanning units U3 and U5 are synchronous with each other . In other words, the polygon mirror PM of the scanning units U3 and U5 is synchronized with the period during which the beams LB3 and LB5 are incident, and the spot light of the beam LB incident on the scanning units U3 and U5 SP to scan along the imaging lines SL3, SL5.

As described above, since the beam LB from one light source device 14a is supplied to one of the three scanning units U1, U3, and U5 in a time-division manner, the scanning unit U1 , U3, and U5 are controlled so that the rotational angular positions of the respective polygon mirrors PM maintain the same angular difference (maintain the phase difference) while matching the rotational speeds. Specific examples of the control will be described later.

The control device 18 also includes a pattern defining patterns to be drawn on the substrate FS by the spot lights SP of the beams LB1, LB3 and LB5 emitted from the respective scanning units U1, U3 and U5 Off of the driving signals (high-frequency signals) supplied to the imaging optical elements 106 of the scanning units U1, U3, and U5 based on the data (rendering data). This allows the imaging optical element 106 of each of the scanning units U1, U3 and U5 to diffract the incident beams LB1, LB3 and LB5 based on the on / off drive signal, (SP) can be modulated. This pattern data is, for example, "1" when 1 dots (pixels) of a drawing pattern are set to 3 x 3 m and driving signals are turned on (drawn) every one dot, (Value) data of "0" is generated as bitmap data in the case of rendering the image data (non-rendering), and is temporarily stored in the memory (RAM) for each scanning unit Un.

The pattern data (drawing data) is obtained by dividing the direction along the scanning direction (main scanning direction, Y direction) of the spotlight SP in the row direction (Y direction) (Hereinafter, referred to as pixel data) of two-dimensionally decomposed pixels in which the direction along the conveying direction (sub-scanning direction, X direction) of the substrate FS is a column direction Map data. This pixel data is 1-bit data of "0" or "1". The pixel data of " 0 " means that the intensity of the spot light SP to be irradiated on the substrate FS is set to a low level, the pixel data of " 1 " (SP) is set to a high level. The pixel data corresponding to one column of the pattern data corresponds to one drawing line SLn (SL1 to SL6), and the pixel data on the spot FS1 projected onto the substrate FS along one drawing line SLn (SL1 to SL6) The intensity of the light SP is modulated in accordance with pixel data for one column. This one-column pixel data is called serial data (rendering information) DLn. That is, the pattern data is bitmap data in which the serial data DLn are arranged in the column direction. The serial data DLn of the pattern data of the scanning unit U1 may be denoted by DL1 and the serial data DLn of the pattern data of the scanning units U2 to U6 may be denoted by DL2 to DL6.

The control device 18 determines whether the beam LBn is incident or not based on the pattern data ("0", the serial data DLn consisting of "1") of the scanning unit Un to which the beam LBn is incident, Off drive signal to the optical element for drawing (AOM) 106 of the projection optical system Un. The imaging optical element 106 diffracts the incident beam LBn and applies it to the reflection mirror 110 when the ON drive signal is input. When the off-drive signal is input, the imaging optical element 106 does not show the incident beam LBn And irradiates the shield plate or the absorber. As a result, the scanning unit Un to which the beam LBn is incident receives the spot light SP of the beam LBn on the substrate FS when the ON driving signal is input to the imaging optical element 106 (The intensity of the spot light SP becomes high), and when the off-drive signal is inputted to the optical element for drawing 106, the spot light of the beam LBn is not irradiated onto the substrate FS SP) is 0). Therefore, the scanning unit Un in which the beam LBn is incident can draw a pattern based on the pattern data on the substrate FS along the drawing line SLn.

For example, in the case where the beam LB3 is incident on the scanning unit U3, the control device 18 determines whether or not the beam LB3 is incident on the scanning optical element U3 based on the pattern data of the scanning unit U3 106) is turned on and off. Thus, the scanning unit U3 can draw a pattern based on the pattern data on the substrate FS along the drawing line SL3. Thus, each of the scanning units U1, U3, and U5 modulates the intensity of the spot light (scanning spot) SP along the drawing lines SL1, SL3, and SL5, FS). ≪ / RTI >

Although the operation of the light introducing optical system 40a and the plurality of scanning units U1, U3 and U5 has been described with reference to Fig. 8, the operation of the light introducing optical system 40b and the plurality of scanning units U2, U4 and U6 ). The control unit 18 determines whether or not the even scan unit Un to which the beam LBn from the light source device 14b is incident is switched from the scan unit U2 to the scan unit U4, And controls the plurality of selection optical elements 50, 58, 66 so as to switch in the same order as the scanning unit U6 - > the scanning unit U2. That is, the beam is switched so that the beam LB is successively incident on each of the plurality of scanning units U2, U4, and U6 by a predetermined scanning time. Under the control of the controller 18, the polygon mirror PM of each of the scanning units U2, U4, and U6 is synchronized with the period in which the beam LBn is incident, and the spot light of the incident beam LBn SP) to scan along the imaging lines SL2, SL4, SL6. The control device 18 controls the control unit 18 so that the scanning units U2, U4 and U6 can draw a pattern based on the pattern data on the substrate FS along the drawing lines SL2, SL4 and SL6, The serial data DLn (DL2, DL4, DL6) consisting of the pattern data ("0", "1") of the scanning units Un (U2, U4, U6) in which LBn (LB2, LB4, LB6) (AOM) 106 of the scanning unit Un (U2, U4, U6) on the basis of the positional information of the scanning unit Un (U2, U4, U6).

As described above, in the first embodiment, since the plurality of selection optical elements 50, 58, and 66 are arranged in series along the traveling direction of the beam LB from the light source device 14a (14b) The beam LBn is scanned by any one of the plurality of scanning units U1, U3 and U5 (scanning units U2, U4 and U6) by the plurality of selection optical elements 50, 58 and 66 Un in a time-division manner, so that the utilization efficiency of the beam LB can be improved without wasting the beam LB.

It is also possible to synchronize the rotational speed and the rotational phase of each of the polygon mirrors PM of the plurality of (here, three) scanning units Un with each other, The polygon mirror PM deflects the beam LBn so that the spot light SP scans the substrate FS in synchronization with the period in which the beam LBn is incident on each scanning unit Un, The scanning efficiency can be improved without wasting LB.

When the optical elements for selection (AOM) 50, 58, and 66 are turned on only during one scanning period of the spotlight SP by the respective polygon mirrors PM of the scanning unit Un do. For example, when the number of reflection surfaces of the polygon mirror PM is Np and the rotation speed Vp of the polygon mirror PM is rpm, the rotation angle? Of one surface of the reflection surface RP of the polygon mirror PM The corresponding time Tss is Tss = 60 / (Np 占 Vp) [sec]. For example, when the number of reflection surfaces Np is 8 and the rotation speed Vp is 30,000, one rotation of the polygon mirror PM is 2 milliseconds, and the time Tss is 0.25 milliseconds. This is 4 kHz in terms of frequency, and compared with the acoustooptic modulation element (the optical element for imaging 106) for modulating the beam LB of the wavelength in the ultraviolet band at a high speed in the order of tens of MHz in response to the pattern data, It means that it is good as an acousto-optic modulator of frequency. For this reason, the optical elements for selection (AOM) 50, 58, and 66 can use a large diffraction angle of LBn (LB1 to LB6) which is first-order diffracted light deflected with respect to the incident beam LB have. The reflecting mirrors 52 and 53 for guiding the deflected beams LBn (LB1 to LB6) to the scanning unit Un with respect to the course of the beam LB passing through the optical elements 50, 58 and 66 for selection straightly, 60, and 68 (see Figs. 3 and 4).

[Modifications of the first embodiment]

The first embodiment may be modified as follows. In the first embodiment, the beam LB is distributed to the three scanning units Un. In this modification, the beam LB from one light source device 14 is divided into five scanning units Un, .

9 is a diagram showing the configuration of the imaging head 16 in the modified example of the first embodiment. In this modified example, the number of the light source devices 14 is one, and the imaging head 16 has five scanning units Un (U1 to U5). The same components as those in the first embodiment are denoted by the same reference numerals, and the description thereof is omitted. In Fig. 9, the cylindrical lens CYb shown in Fig. 3 is not shown.

In this modification, a light introducing optical system (beam switching member) 130 is used in place of the light introducing optical systems 40a and 40b. As shown in Fig. 10, the light introducing optical system 130 includes the condenser lens 42, the collimator lens 44, the reflection mirror 46, the condenser lens 48, A reflective mirror 52, a collimator lens 54, a condenser lens 56, a selecting optical element 58, a reflective mirror 60, a collimator lens 62, a condenser lens 64, In addition to the selection optical element 132, the reflection mirror 134, the collimator lens 136, and the condenser lens 70 (in addition to the selection optical element 66, the reflection mirror 68, 138, a selection optical element 140, a reflection mirror 142, a collimate lens 144, and a condenser lens 146.

The selection optical element 132, the collimator lens 136 and the condenser lens 138 are provided between the condenser lens 56 and the selection optical element 58 in the above order. Therefore, in this modification, when the driving signal (high-frequency signal) from the control device 18 is off, the selection optical element 50 transmits the incident beam LB as it is, And the condenser lens 56 condenses the beam LB incident on the selective optical element 132 to be a beam waist in the selective optical element 132. [

The optical element for selection 132 has transmittance with respect to the beam LB and, for example, an acousto-optic modulation element AOM is used. When the drive signal from the control device 18 is off, the optical element for selection 132 transmits the incident beam LB as it is to the selection optical element 58, (High-frequency signal) of the incident beam LB is turned on, the beam LB2 that is the first-order diffracted light by diffracting the incident beam LB is irradiated to the reflecting mirror 134. [ The reflecting mirror 134 reflects the incident beam LB2 and makes it incident on the collimator lens 100 of the scanning unit U2. That is, the control device 18 switches the selection optical element 132 on and off, and the selection optical element 132 switches whether or not to cause the beam LB2 to enter the scanning unit U2. The collimator lens 136 collimates the beam LB irradiated to the optical element 58 for selection and the collimator lens 138 collimates the beam LB collimated by the collimator lens 136, Is converged to be a beam waist in the optical element for selection (58).

The selection optical element 140, the collimator lens 144 and the condenser lens 146 are provided between the condenser lens 64 and the selection optical element 66 in the above order. Therefore, in this modification, when the drive signal from the control device 18 is off, the selection optical element 58 transmits the incident beam LB as it is to the selection optical element 140, The condensing lens 64 condenses the beam LB incident on the selecting optical element 140 to be a beam waist in the selecting optical element 140. [

The optical element for selection 140 is transmissive to the beam LB, for example, an acousto-optic modulation element AOM is used. The optical element for selection 140 irradiates the beam of light LB incident on the selection optical element 66 when the drive signal from the control device 18 is off, (High-frequency signal) is turned on, a beam LB4, which is first-order diffracted light obtained by diffracting the incident beam LB, is irradiated to the reflection mirror 142. [ The reflecting mirror 142 reflects the incident beam LB4 and irradiates the collimator lens 100 of the scanning unit U4. That is, by switching the selection optical element 140 on and off by the control device 18, the selection optical element 140 switches whether or not to cause the beam LB4 to enter the scanning unit U4. The collimator lens 144 converts the beam LB irradiated to the optical element for selection 66 into parallel light and the condenser lens 146 collimates the beam LB, which is collimated by the collimator lens 144, Is converged to be a beam waist in the optical element for selection 66. [

By disposing the plurality of selection optical elements (AOM) 50, 58, 66, 132 and 140 in a serial manner, it is possible to arrange any one of the plurality of scanning units U1 to U5 The beam LBn can be incident. The control device 18 determines whether or not the scanning unit Un to which the beam LBn is incident is a scanning unit such as a scanning unit U1, a scanning unit U2, a scanning unit U3, a scanning unit U4, 132, 58, 140, 66 so as to be periodically switched in the same sequence as the scanning unit U5 to the scanning unit U1. That is, the beam LBn is switched to be incident on each of the plurality of scanning units U1 to U5 sequentially for a predetermined scanning time. The polygon mirror PM of each of the scanning units U1 to U5 is synchronized with the period in which the beam LBn is incident under the control of the control device 18 and the spot light of the incident beam LBn SP to scan along the drawing lines SL1 to SL5. The controller 18 controls the scanning unit Un in which the beam LBn is incident so that each scanning unit Un can draw a pattern based on the pattern data on the substrate FS along the drawing line SLn (AOM) 106 of the scanning unit Un based on the pattern data ("0", "1" serial data DLn) of the scanning unit Un.

That is, in the case of this modification, each polygon mirror PM of the five scanning units U1 to U5 performs synchronous rotation so that the rotational angular position is shifted in phase by a predetermined angle. In this modification, since the beam (laser beam) LB is distributed to the five scanning units U1 to U5 in a time-division manner, the beam LBn is incident on one reflecting surface RP of the polygon mirror PM (The rotation angle beta in Fig. 7) and the beam LBn reflected by the reflection surface RP are the maximum deflection angles (the angles in Fig. 7) incident on the f? Lens FT, The front focal length of the f? Lens FT and the number of reflective surfaces Np of the polygon mirror PM are set so that?? 5α is satisfied.

As described above, also in the present modification, the utilization efficiency of the beam LB from the light source device 14 can be increased and the scanning efficiency can be improved without wasting the beam LB. In this modification, the beam LB from one light source device 14 is distributed to the five scanning units Un. However, the beam LB from one light source device 14 may be divided into two scanning units Un, May be distributed to the unit Un, or may be distributed to four or six or more scanning units Un. In this case, if the number of the scanning units Un to be distributed is n, the angle range (the rotation angle? In Fig. 7) in which the beam LBn can be irradiated onto one reflecting surface RP of the polygon mirror PM And the maximum deflection angle (angle 2? In FIG. 7) at which the beam LB reflected from the reflecting surface RP is incident on the f? Lens FT satisfies?? N x? The number of reflection surfaces Np of the polygon mirror PM is set. The number of cases in which the beam LB from the two light source devices 14 (14a and 14b) is distributed to the plurality of scanning units Un is not limited to three as described in the first embodiment, May be distributed to the scanning unit Un of the number of. For example, the beam LB from the light source device 14a may be distributed to the five scanning units Un, and the beam LB from the light source device 14b may be distributed to the four scanning units Un .

[Second Embodiment]

In the first embodiment, since the imaging optical element (AOM) 106 is provided in front of the polygon mirror PM in each scanning unit Un, the number of the imaging optical elements 106 to be used increases, . Thus, in the second embodiment, one drawing optical modulator (AOM) is provided on the optical path of the beam LB from one light source device 14, and a plurality of The intensity of the beam LBn irradiated onto the substrate FS from the scanning unit Un of the scanning unit Un is modulated to draw the pattern. That is, in the second embodiment, only one drawing optical modulator (AOM), which requires high responsiveness, is arranged in front of the plurality of scanning units (Un), and the respective scanning units (Un) (AOM) is disposed.

Fig. 11 is a view showing the structure of the imaging head 16 according to the second embodiment, and Fig. 12 is a view showing the light introducing optical system 40a shown in Fig. The same reference numerals are given to the same components as those of the first embodiment, and only different parts are described. In FIG. 11, the cylindrical lens CYb shown in FIG. 3 is not shown, and the light introducing optical systems 40a and 40b have the same configuration. And a description of the light introducing optical system 40b will be omitted. 12, the light introducing optical system 40a includes the condensing lens 42, the collimating lens 44, the reflecting mirror 46, the condensing lens 48, the selecting optical element A reflecting mirror 52, a collimator lens 54, a condenser lens 56, a selecting optical element 58, a reflecting mirror 60, a collimator lens 62, a condenser lens 64, (AOM) 150 as a light modulating optical modulator, a collimator lens 152, and a condenser lens (not shown) in addition to the optical element for selection 66, the reflection mirror 68 and the absorber 70 154 and an absorber 156. In the second embodiment, as shown in Fig. 11, each of the scanning units U1 to U6 has no optical element 106 for drawing as in the first embodiment.

The imaging optical element 150, the collimator lens 152 and the condenser lens 154 are provided between the condenser lens 48 and the selection optical element 50 in the above order. Therefore, in the second embodiment, the reflecting mirror 46 reflects the beam LB, which is collimated by the collimator lens 44, to direct the imaging optical element 150. The converging lens 48 converges (converges) the beam LB incident on the imaging optical element 150 so as to become a beam waist in the imaging optical element 150.

The imaging optical element 150 has transparency with respect to the beam LB and, for example, an acousto-optic modulation element (AOM) is used. The imaging optical element 150 is disposed in the light source device (the first optical element) 50 (the first stage) located on the side of the light source device 14 (14a) 14 (14a). The imaging optical element 150 irradiates the absorber 156 with the incident beam LB when the driving signal (high-frequency signal) from the control device 18 is off, When a signal (high-frequency signal) is turned on, a beam (imaging beam) LB, which is first-order diffracted light obtained by diffracting the incident beam LB, is irradiated onto the first-stage selection optical element 50. The collimator lens 152 converts the beam LB irradiated to the optical element 50 for selection into parallel light and the condenser lens 154 collimates the beam LB, which is collimated by the collimator lens 152, (Converges) to be a beam waist in the selection optical element 50. [

11, the scanning units U1 to U6 include a collimator lens 100, a reflecting mirror 102, a reflecting mirror 110, a cylindrical lens CYa, a reflecting mirror 114, (Not shown in Fig. 11), and a reflection mirror 122, and further includes a first shaping lens 158a as a beam shaping lens and a second shaping lens 158b as a beam shaping lens, And a second shaping lens 158b. That is, in the second embodiment, instead of the condenser lens 104 and the collimator lens 108 of the first embodiment, the first shaping lens 158a and the second shaping lens 158b are disposed in the scanning unit U1 to U6.

13 is a diagram schematically showing optical paths of the light introducing optical system 40a and the plurality of scanning units U1, U3, and U5 of FIG. The control device 18 controls the exposure of the substrate FS by pattern data (hereinafter referred to as " pattern data ") that defines a pattern to be drawn on the substrate FS by the spot lights SP of the beams LB1, LB3, and LB5 irradiated from the respective scanning units U1, (High frequency signal) to the imaging optical element 150 of the light introducing optical system 40a on the basis of the serial data DL1, DL3, and DL6 of "0" and "1" . The imaging optical element 150 of the light introducing optical system 40a thus diffracts the incident beam LB based on the on / off drive signal to modulate the intensity of the spot light SP / Off).

Described in detail, the control device 18 inputs on / off drive signals to the imaging optical element 150 based on the pattern data of the scanning unit Un on which the beam LBn is incident. The imaging optical element 150 diffracts the incident beam LB and irradiates the selected optical element 50 (when the on-driving signal (high-frequency signal) The intensity of the beam LB becomes higher). On the other hand, the imaging optical element 150 irradiates the absorber 156 (FIG. 12) with the incident beam LB (when the off-drive signal (high-frequency signal) The intensity of the beam LB becomes zero). The scanning unit Un in which the beam LBn is incident can irradiate the substrate FS with the intensity-modulated beam LB along the drawing line SLn, (FS).

For example, when the beam LB3 is incident on the scanning unit U3, the control device 18 controls the optical system for drawing the optical components of the light-guiding optical system 40a 150) is turned on and off. This allows the scanning unit U3 to irradiate the substrate FS with the beam LB whose intensity has been modulated along the drawing line SL3 so that a pattern based on the pattern data is irradiated onto the substrate FS . The scanning unit Un to which the beam LBn is incident is sequentially switched as in the scanning unit U1, the scanning unit U3, the scanning unit U5, and the scanning unit U1, for example. The control device 18 likewise controls the light amount of the light emitted from the light-introducing optical system (light source) U1, such as the pattern data of the scanning unit U1, the pattern data of the scanning unit U3, the pattern data of the scanning unit U5, Off signal to be sent to the imaging optical element 150 of the projection optical system 40a. Then, the control device 18 controls the imaging optical element 150 of the light introducing optical system 40a on the basis of the sequentially switched pattern data. As a result, each of the scanning units U1, U3, and U5 irradiates the substrate FS with the intensity-modulated beam LB along the drawing lines SL1, SL3, and SL5, And can be drawn on the substrate FS.

The configuration and operation of part of the control system applied to the second embodiment are described above with reference to Figs. 14 to 16. Fig. The configuration and operation described below are also applicable to the first embodiment. Fig. 14 is a block diagram of a rotation control system of a polygon mirror PM provided in each of the three scanning units U1, U3 and U5 in Figs. 11 and 13 as one example, and the scanning units U1, U3 and U5, The same components are denoted by the same reference numerals. The scanning start timing of the drawing lines (scanning lines) SL1, SL3, and SL5 generated on the substrate FS by the polygon mirror PM is set to each of the scanning units U1, U3, The home position sensors OP1, OP3 and OP5 are provided. The origin sensors OP1, OP3 and OP5 are photoelectric detectors for projecting light onto the reflection surface RP of the polygon mirror PM and receiving the reflected light. When the spot light SP is incident on the imaging lines SL1, SL3, SL5 SZ1, SZ3, and SZ5, respectively, every time when the position of the origin signal SZ1,

The timing measurement unit 180 receives the origin signals SZ1, SZ3 and SZ5 and measures whether or not the timing of generation of each of the origin signals SZ1, SZ3 and SZ5 is within a predetermined allowable range (time interval) And when there is an error from the allowable range, the deviation information corresponding thereto is outputted to the servo control device 182. [ The servo control device 182 outputs a command value based on the deviation information to each servo drive circuit portion of the motor Mp for rotationally driving the polygon mirror PM in each of the scan units U1, U3 and U5. Each servo drive circuit portion of the motor Mp receives an up / down pulse signal (hereinafter referred to as an encoder signal) from the encoder EN mounted on the rotation axis of the motor Mp, A servo circuit 182 for receiving a speed signal from an instruction value from the servo control device 182 and a feedback signal from the feedback circuit portion FBC and for driving the motor Mp to have a rotation speed corresponding to the set value, And a driving circuit (amplifier) (SCC). The servo drive circuit portion (feedback circuit portion (FBC), servo drive circuit (SCC)), timing measurement portion 180 and servo control device 182 constitute a part of the control device 18.

In the second embodiment, each of the polygon mirrors PM in the three scanning units U1, U3, and U5 needs to rotate at the same speed while maintaining a constant phase difference at the rotational angle position. In order to realize this, , The timing measurement unit 180 receives the origin signals SZ1, SZ3, and SZ5 and performs measurement as shown in the timing chart of Fig. 15, for example.

Fig. 15 schematically shows various signal waveforms generated when three polygon mirrors PM rotate with a phase difference within a predetermined allowable range with respect to the rotation angle. Immediately after each polygon mirror PM is rotated, the relative phase differences of the origin signals SZ1, SZ3, and SZ5 are different from each other. However, the timing measuring section 180 may determine, for example, the origin signal SZ1, The time intervals Ts1, Ts2, and Ts3 between the three origin signals SZ1, SZ3, and SZ5 are the same as the origin signals SZ3 and SZ5 at the same frequency (period) as the origin signal SZ1 And the correction information corresponding to the error is measured. The timing measurement section 180 outputs the correction information to the servo control device 182. The respective motors Mp of the scanning units U3 and U5 are servo-controlled according to the servo information and the three origin signals SZ1, SZ3, and SZ5 ) Is controlled to be stabilized at Ts1 = Ts2 = Ts3 as shown in Fig.

When the generation timings of the origin signals SZ1, SZ3 and SZ5 are stabilized, the timing measuring section 180 applies the timing signals to the selection optical elements 50, 58 and 66 shown in Figs. 11 to 13, And outputs an enable (On) signal (SPP1, SPP3, SPP5). The drawing enable signals SPP1, SPP3 and SPP5 cause the corresponding selection optical elements 50, 58 and 66 to perform a modulation operation (light deflection switching operation) only during a period of H level here . Since the three origin signals SZ1, SZ3 and SZ5 are stably kept at a constant phase difference (here, 1/3 of the cycle of the origin signal SZ1), the rise of the drawing enable signals SPP1, SPP3 and SPP5 (L - > H) has a constant phase difference. The drawing enable signals SPP1, SPP3 and SPP5 correspond to driving signals (high frequency signals) for switching the optical elements 50, 58 and 66 for selection.

The timing of the falling (H? L) of the drawing enable signals SPP1, SPP3 and SPP5 is controlled by the timing of the clock signal CLK for turning on / off the spot light in each of the drawing lines SL1, SL3 and SL5, And is measured by a counter in the measuring unit 180. [ The clock signal CLK manages the on / off timing of the optical element 150 for drawing (or the optical element 106 for drawing in Fig. 3), and the clock signal CLK controls the on / off timing of the drawing line SLn (SL1, SL3, SL5) The size of the spot light SP on the substrate FS, the scanning speed Vs of the spot light SP, and the like. For example, when the length of the drawing line is 30 mm, the dimension (diameter) of the spot light SP is 6 占 퐉, and the spot light SP is turned on / off by overlapping the spot light by 3 占 퐉 in the scanning direction, It is sufficient to lower the drawing enable signals SPP1, SPP3 and SPP5 (H to L) when the clock signal CLK is counted to 10,000 (30 mm / 3 mu m).

The frequency of the origin signals SZ1, SZ3, and SZ5 is 10 Vp / 60 (Hz) when the reflection plane of the polygon mirror PM is 10 planes and the rotation speed thereof is Vp (rpm). Therefore, when the time interval is stabilized at Ts1 = Ts2 = Ts3, the time interval Ts1 becomes 60 / (30 Vp) seconds. As an example, if the reference rotation speed Vp of the polygon mirror PM is 8000 rpm, the time interval Ts1 becomes 60 / (30.8000) seconds = 250 mu s.

As shown in Fig. 15, the ON time (continuation time of the H level) Toa of the drawing enable signals SPP1, SPP3 and SPP5 is set such that the beam (laser light) LB from the polygon mirror PM is on the substrate FS (Projection period) as the spot light, but it is necessary to set the period to be shorter than the time interval Ts1. For example, if the On time Toa is set to 200 mu s, the frequency of the clock signal CLK for 10000 counts during this period becomes 10000/200 = 50 (MHz). In synchronization with such a clock signal CLK, rendering bit stream data corresponding to the rendering line SLn generated from the pattern data ("0" or "1" on the bitmap) or serial data DLn (for example, 10000 bits) (Sdw) is output to the optical element 150 for drawing. 3, in the configuration in which the optical element for drawing 106 is provided in each of the scanning units U1, U3 and U5, the drawing bit stream data Sdw corresponding to the drawing line SL1, The data DL1 is sent to the optical element for drawing 106 of the scanning unit U1 and the drawing bit stream data Sdw or serial data DL3 corresponding to the drawing line SL3 is sent to the scanning optical element 106 of the scanning unit U3 The drawing bit stream data Sdw or the serial data DL5 corresponding to the drawing line SL5 is sent to the optical element for drawing 106 of the scanning unit U5.

The drawing bit stream data Sdw or the serial data DLn generated from the pattern data corresponding to each of the three drawing lines SL1, SL3 and SL5 are supplied to the drawing enable signal SPP1, In order to turn on / off the imaging optical element 150 in synchronization with the SPP3, SPP5 (or the origin signals SZ1, SZ3, SZ5).

Fig. 16 shows an example of a circuit for generating such drawing bit stream data Sdw. The circuit has generation circuits (pattern data generation circuits) 301, 303, and 305 and an OR circuit GT8. The generating circuit 301 includes a memory unit BM1, a counter unit CN1 and a gate unit GT1. The generating circuit 303 includes a memory unit BM3, a counter unit CN3, and a gate unit GT3. And the generating circuit 305 includes a memory unit BM5, a counter unit CN5, and a gate unit GT5. The generation circuits 301, 303, and 305 and the OR circuit GT8 constitute a part of the control device 18.

The memory units BM1, BM3 and BM5 are memories for primarily storing bitmap data (pattern data) corresponding to patterns to be drawn and exposed by the respective scanning units U1, U3 and U5. The counter units CN1, CN3 and CN5 store the bit stream (for example, 10000 bits) of one drawing line to be drawn next among bit map data (pattern data) in the memory units BM1, BM3, Is a counter for outputting the serial data DL1, DL3, DL5 synchronized with the clock signal CLK bit by bit during a period in which the drawing enable signals SPP1, SPP3, SPP5 are On.

The map data in each of the memory units BM1, BM3, and BM5 is shifted for each data of one drawing line by an address counter (not shown) or the like. For example, in the case of the memory unit BM1, after the serial data DL1 for one drawing line is completely output, the timing at which the origin signal SZ3 of the next active scanning unit U3 is generated Lt; / RTI > Similarly, the shift of the map data in the memory unit BM3 is performed at the timing when the origin signal SZ5 of the next active scanning unit U5 is generated after outputting all the serial data DL3, BM5 are performed at the timing at which the origin signal SZ1 of the next active scanning unit U1 is generated after all the serial data DL5 are outputted.

The serial data DL1, DL3, and DL5 sequentially generated in this way are input to the three-input OR gates GT1, GT3, and GT5 through the gate portions GT1, GT3, and GT5 that are opened during the On period of the drawing enable signals SPP1, SPP3, Circuit GT8. The OR circuit GT8 receives the serial data DL1? DL3? DL5? DL1 ... And outputs the bit data string repeatedly synthesized in the order of writing bit string data Sdw for On / Off of the imaging optical element 150. [ 3, the serial data DL1 output from the gate section GT1 is supplied to the scanning unit (scanning line) DL1 in the configuration in which the optical element 106 for drawing is provided in each of the scanning units U1, U3 and U5 To the imaging optical element 106 in the scanning unit U1 and sends the serial data DL3 outputted from the gate unit GT3 to the imaging optical element 106 in the scanning unit U3, The serial data DL5 may be sent to the imaging optical element 106 in the scanning unit U5.

As described above, on / off of the optical element for drawing 150 (or 106) is required to respond to the high-speed clock signal CLK (for example, 50 MHz) 66 may synchronize with the drawing enable signals SPP1, SPP3, SPP5 (or the origin signals SZ1, SZ3, SZ5) and turn on / off. The response frequency is, for example, the time interval Toa (Or Ts1) is 200 占 퐏, it is possible to use an inexpensive one with a high transmittance of about 10 kHz. The frequency of the clock signal CLK counted by the counter in the timing measurement unit 180 or counted by the counter units CN1, CN3 and CN5 in Fig. 16 is Fcc, the frequency of the clock signal CLK Assuming that the fundamental frequency of the pulse oscillation is Fs, it is preferable to set n to be an integer equal to or greater than 1 (preferably n? 2) so as to satisfy the relationship of n · Fcc = Fs.

The operation of the light introducing optical system 40a and the plurality of scanning units U1, U3, and U5 using FIG. 13 and the timing of drawing by each of the scanning units U1, U3, and U5 using FIGS. The same applies to the light introducing optical system 40b and the plurality of scanning units U2, U4 and U6. Briefly, the scanning unit Un to which the beam LB is incident is, for example, a scanning unit U2, a scanning unit U4, a scanning unit U6, and a scanning unit U2, . The control device 18 likewise supplies the pattern data of the scanning unit U2 to the light-introducing optical system (the pattern unit of the scanning unit U2), the pattern data of the scanning unit U2, the pattern data of the scanning unit U4, Off signal to be sent to the optical element for drawing 150 of the projection optical system 40b. Then, the control device 18 controls the imaging optical element 150 of the light introducing optical system 40b on the basis of the sequentially switched pattern data. Alternatively, drawing bit stream data Sdw obtained by synthesizing pattern data for three drawing lines in a circuit configuration as shown in Fig. 16 is generated and supplied to the drawing optical element 150. [ As a result, each of the scanning units U2, U4 and U6 irradiates the substrate FS with the intensity-modulated beam LB along the imaging lines SL2, SL4 and SL6, Can be imaged onto the substrate FS.

In the second embodiment described above, in addition to the effects of the first embodiment, the following effects can be obtained. That is, one imaging optical element 150 is provided in the light introducing optical system 40a and the imaging optical element 150 is disposed on the light source device 14a side of the first-stage selection optical element 50 Modulates the intensity of the beams LB1, LB3, and LB5 irradiated from the plurality of scanning units U1, U3, and U5 to the substrate FS with a pattern by one imaging optical element 150. Similarly, one imaging optical element 150 is provided in the light introducing optical system 40b, and the imaging optical element 150 is disposed on the light source device 14b side of the first-stage selection optical element 50 Modulates the intensity of the beams LB2, LB4 and LB6 irradiating the substrate FS from the plurality of scanning units U2, U4 and U6 with one patterning optical element 150 in accordance with the pattern. As a result, the number of the acousto-optic modulation elements can be reduced and the cost can be reduced.

In the second embodiment, the imaging head 16 for dividing the beam LB into three is described. However, as described in the modification of the first embodiment, the imaging head 16 for dividing the beam LB into five (See Figs. 9 and 10). In the case of Figs. 9 and 10, since the number of the light source devices 14 is one, the number of the drawing optical element 150 also becomes one.

[Modified example of the second embodiment]

The second embodiment may be modified as follows. The imaging optical element 150 is provided in the light introducing optical systems 40a and 40b as the light modulating optical modulator in the second embodiment. In this modification, instead of the imaging optical element 150, (14 (14a, 14b)), respectively. The same reference numerals are given to the same components as those of the second embodiment, or omitted from illustration, and only the other parts are described. The light source devices 14A and 14B are referred to as light source devices 14A and 14B and the light source devices 14B and 14B have the same configuration. (14A) will be described.

17 is a diagram showing the configuration of the light source device (pulse light source device, laser light source device) 14a of this modification. The light source device 14A as a fiber laser device includes a DFB semiconductor laser device 200, a DFB semiconductor laser device 202, a polarization beam splitter 204, an electro-optical element 206 as a light modulating optical modulator, A polarizing beam splitter 208, an absorber 210, an excitation light source 212, a combiner 214, a fiber optical amplifier 216, a wavelength conversion optical element 218 ), A wavelength conversion optical element 220, a plurality of lens elements GL, and a clock generator 222a.

The DFB semiconductor laser device (the first solid laser device, the first semiconductor laser light source) 200 has a pulse shape (laser beam) S1 of sharpness or sharpness at a predetermined frequency (oscillation frequency, fundamental frequency) Fs, And the DFB semiconductor laser element (second solid laser element, second semiconductor laser light source) 202 generates a pulsed sheathed laser light (laser light) S2 that gently (broadens in time) at a predetermined frequency Fs . One pulse of the sheathed light S1 generated by the DFB semiconductor laser device 200 and one pulse of the sheathed light S2 generated by the DFB semiconductor laser device 202 have substantially the same energy but different polarizations, The peak intensity is strong in the shear (S1). In this modification, the polarization state of the shear light S1 generated by the DFB semiconductor laser device 200 is referred to as S polarized light and the polarization state of the sheathed light S2 generated by the DFB semiconductor laser device 202 is referred to as P polarized light Explain. The DFB semiconductor laser devices 200 and 202 are controlled by the control circuit 222 in response to the clock signal LTC (predetermined frequency Fs) generated by the clock generator 222a to oscillate at an oscillation frequency Fs And is controlled to emit the heptas S1 and S2. The control circuit 222 is controlled by the control device 18.

This clock signal LTC serves as the base of the clock signal CLK supplied to each of the counter units CN1, CN3 and CN5 shown in Fig. 16 and divides the clock signal LTC by n ) (n is preferably an integer equal to or greater than 2) becomes the clock signal CLK. The clock generator 222a also has a function of adjusting the fundamental frequency Fs of the clock signal LTC by ± ΔF, that is, a function of finely adjusting the time interval of pulse oscillation of the beam LB. Thus, even if the scanning speed Vs of the spot light SP slightly fluctuates, the dimension (drawing magnification) of the pattern drawn over the drawing line can be finely adjusted by finely adjusting the fundamental frequency Fs.

The polarization beam splitter 204 transmits the S-polarized light and reflects the P-polarized light. The polarized beam splitter 204 reflects the S-polarized light and the P-polarized light, S2 to the electro-optical element 206, as shown in Fig. More specifically, the polarization beam splitter 204 transmits the S-polarized sheathed light S1 of the DFB semiconductor laser device 200 to guide the shear light S1 to the electro-optic element 206, and the DFB semiconductor laser element Optical element 206 by reflecting the P-polarized sheathed light S2 generated by the shearing light 202. [ The DFB semiconductor laser elements 200 and 202 and the polarization beam splitter 204 constitute a laser light source part (light source part) 205 that generates the heptas S1 and S2.

The electro-optical element 206 has transparency with respect to the heptas S1 and S2, for example, an electro-optic modulator (EOM) is used. In response to the On / Off state (high / low) of the rendering bit stream data Sdw (or serial data DLn) shown in FIG. 16 described above, the EOM is supplied to the polarized beam splitter 204 S1 and S2 are switched by the drive circuit 206a. Since the wavelength band of the heptas S1 and S2 from each of the DFB semiconductor laser device 200 and the DFB semiconductor laser device 202 is as long as 800 nm or longer, GHz can be used.

When the 1-bit pixel data of the rendering bit stream data Sdw (or serial data DLn) input to the driving circuit 206a is in the Off state (low "0"), the electro- And directs the polarized beam splitter 208 as it is without changing the polarization state of the helix S1 or S2. On the other hand, when the imaging bit stream data Sdw (or serial data DLn) input to the driving circuit 206a is in an On state (high "1"), the electro- S2 (polarized direction is changed by 90 degrees) and is guided to the polarization beam splitter 208. [ As described above, by driving the electro-optical element 206, the electro-optical element 206 outputs the S-polarized light when the pixel data of the rendering bit stream data Sdw (or the serial data DLn) is in an On state (high) Converts the shear light S1 into a shear light S1 of P polarized light and converts the shear light S2 of P polarized light into a sheated light S2 of S polarized light.

The polarized beam splitter 208 transmits the P-polarized light, guides it to the combiner 214 via the lens element GL, reflects the S-polarized light, and guides it to the absorber 210. The excitation light source 212 generates excitation light, and the generated excitation light is guided to the combiner 214 via the optical fiber 212a. The combiner 214 combines the excitation light and the helix emitted from the polarization beam splitter 208, and outputs the combined light to a fiber optical amplifier (optical amplifier) 216. The fiber optical amplifier 216 is doped with the laser medium excited by the excitation light. Therefore, in the fiber optical amplifier 216 to which the synthesized sheath and excitation light are transmitted, the excitation light excites the laser medium, thereby amplifying the sheath. A rare earth element such as erbium (Er), ytterbium (Yb), or thulium (Tm) is used as the laser medium doped into the optical fiber amplifier 216. The amplified helix is emitted from the emitting end 216a of the fiber optical amplifier 216 along a predetermined divergence angle and is converged or collimated by the lens element GL to be incident on the wavelength conversion optical element 218 .

The wavelength converting optical element (first wavelength converting optical element) 218 converts the incident shear light (wavelength?) Into a second harmonic wave by a second harmonic generation (SHG) To harmonics. As the wavelength converting optical element 218, a PPLN (Periodically Poled LiNbO ₃ ) crystal which is a quasi phase matching (QPM) determination is suitably used. It is also possible to use a PPLT (Periodically Poled LiTaO ₃ ) crystal or the like.

(Wavelength? / 2) converted by the wavelength-converting optical element 218 and the second harmonic (wavelength? / 2) converted by the wavelength-converting optical element 218, A third harmonic whose wavelength is 1/3 of? Is generated by the sum frequency generation (SFG) of the residual sheared (wavelength?). This third harmonic becomes ultraviolet light (beam LB) having a peak wavelength in a wavelength band of 370 nm or less.

As described above, when the drawing bit stream data Sdw (or DLn) sent from the pattern data generating circuit shown in Fig. 16 is applied to the electro-optical element 206 in Fig. 17, the drawing bit stream data Optical element 206 does not change the polarization state of the incident heptic light S1 or S2 when the 1-bit pixel data of the polarization beam splitter Sdw (or DLn) is in the Off state (low "0" (208). Therefore, the heptic light transmitted through the polarization beam splitter 208 becomes the hector light S2 from the DFB semiconductor laser element 202. [ The beam LB finally output from the light source device 14A has the same oscillation profile (time characteristic) as the sheathed light S2 from the DFB semiconductor laser device 202. [ That is, in this case, the beam LB has a muffled characteristic in which the peak intensity of the pulse is low and is temporally broad. The beam LB output from the light source device 14A becomes light that is not amplified to the energy required for exposure because the fiber optical amplifier 216 has a low amplification efficiency for the shear light S2 having such a low peak intensity. Therefore, in this case, from the viewpoint of exposure, substantially the light source device 14A has the same result as not emitting the beam LB. That is, the intensity of the spot light SP applied to the substrate FS becomes low. However, in a period (non-projection period, non-exposure period) during which patterning is not performed along each of the rendering lines SLn (SL1 to SL6), the beam LB of the ultraviolet band derived from the heptapillary S2, The drawing lines SLn (SL1 to SL6) continue to be at the same position on the substrate FS for a long time (for example, emergency stop of the substrate FS by the trouble of the transport system, etc.) , It is preferable to provide a movable shutter in the injection window of the beam LB of the light source device 14A to close the injection window.

On the other hand, when the 1-bit pixel data of the drawing bit stream data Sdw (or DLn) applied to the electro-optical element 206 in Fig. 17 is in an On state (high " 1 & And changes the polarization state of the incident shear light S1 or S2 to guide it to the polarization beam splitter 208. [ Therefore, the heptic light transmitted through the polarizing beam splitter 208 becomes the heptic ray S1 from the DFB semiconductor laser device 200. [ Therefore, the beam LB output from the light source device 14A is generated from the shear light S1 from the DFB semiconductor laser device 200. [ The beam LB output from the light source device 14A is efficiently amplified by the fiber optical amplifier 216 because the peak intensity of the shear light S1 from the DFB semiconductor laser device 200 is high, And the energy required for exposure of the exposure light. That is, the intensity of the spot light SP irradiated on the substrate FS becomes high.

Optical element 206 as the imaging optical modulator is provided in the light source device 14A as described above. As in the case of controlling the imaging optical element 150 in the second embodiment, the electro-optical element 206 , The same effects as those of the second embodiment can be obtained. That is, on the basis of the pattern data of the scanning unit Un (or the drawing bit stream data Sdw in Figs. 15 and 16) in which the beam LB is incident, the electro-optical element 206 is switched The intensity of the beam LB incident on the first-stage optical element 50 for selection, that is, the intensity of the beam LB irradiated onto the substrate FS by each of the scanning units Un (U1 to U6) The intensity of the spot light SP can be modulated according to a pattern to be imaged.

17, the DFB semiconductor laser element 202 and the polarization beam splitter 204 are omitted, and only the shear light S1 from the DFB semiconductor laser element 200 is based on the pattern data (imaging data) It is also conceivable to conduct the light in the form of a burst wave to the optical fiber amplifier 216 by the switching of the electro-optical element 206 to be performed. However, if this configuration is employed, the incidence periodicity of the heptas S1 into the fiber optic amplifiers 216 is greatly confused by the pattern to be drawn. That is, after the state in which the shear light S1 from the DFB semiconductor laser element 202 is not incident on the fiber optical amplifier 216, when the shear light S1 is incident on the fiber optical amplifier 216, There is a problem that the beam S1 is amplified at a larger amplification rate than that at the normal state and a beam having a larger strength than specified is generated from the fiber amplifier 216. [ Therefore, in the present modification, as a preferred embodiment, the period of time during which the shear light S1 is not incident on the fiber amplifier 216, the shearing light S2 from the DFB semiconductor laser element 202 (a broad pulse having a low peak intensity Light is incident on the optical fiber amplifier 216 to solve this problem.

Although the electro-optical element 206 is switched, the DFB semiconductor laser elements 200 and 202 may be driven based on the pattern data (the rendering bit stream data Sdw or the serial data DLn). That is, the control circuit 222 controls the DFB semiconductor laser elements 200 and 202 based on the pattern data (the rendering bit stream data Sdw or DLn) S1, S2) are selectively (alternatively) generated. In this case, the polarization beam splitters 204 and 208, the electro-optical element 206, and the absorber 210 become unnecessary, and the heptas S1 and S2, which are selectively pulsed from either of the DFB semiconductor laser elements 200 and 202, S2 are directly incident on the combiner 214. [ At this time, the control circuit 222 controls the optical fiber amplifier 216 so that the shear light S1 from the DFB semiconductor laser device 200 and the shear light S2 from the DFB semiconductor laser device 202 are not incident on the fiber optical amplifier 216 at the same time Thereby controlling the driving of the DFB semiconductor laser elements 200 and 202. That is to say, the DFB semiconductor laser device 200 is controlled so that only the shear light S1 is incident on the fiber optical amplifier 216 when the spot light SP of each beam LBn is irradiated onto the substrate FS. When the spot light SP of the beam LBn is not irradiated to the substrate FS (the intensity of the spot light SP is made very low), only the heptic light S2 enters the fiber optical amplifier 216 So as to control the DFB semiconductor laser device 202 as much as possible. Whether or not to irradiate the beam LBn to the substrate FS is determined based on the pixel data (high / low) of the pattern data (H or L of the rendering bit stream data Sdw). In this case, the deflection states of the heptas S1 and S2 may all be P deflection.

As described above, also in this modification, the number of the acousto-optic modulation elements can be reduced, and the cost can be reduced.

The light source devices 14a and 14b of the present modification may be used for the light source devices 14a and 14b of the first embodiment. In this case, the output timings of the heptas S1 from the DFB semiconductor laser elements 200 output from the light source devices 14a and 14b and the switching of the imaging optical elements 106 of the scanning units U1 to U6 , And pattern data (rendering bit stream data Sdw).

[Third embodiment]

Next, the third embodiment will be described with reference to Fig. 18, but in the third embodiment, it is assumed that the light source device 14a (see Fig. 17), 14b described in the modification of the second embodiment is used do. However, the clock generator 222a in the control circuit 222 of the light source apparatus 14A in Fig. 17 is controlled by the control unit (control circuit 500) for drawing control shown in Fig. 18 (Discrete) time intervals of the clock signal LTC in accordance with the magnification correction information CMg of the clock signal LTC. Likewise, the clock generator 222a in the control circuit 222 of the light source device 14B is also provided with a function of expanding and contracting the time interval of the clock signal LTC partially (discrete) in accordance with the magnification correction information CMg do. The operations of the light source device 14B, the light introducing optical system 40b and the scanning units U2, U4 and U6 are performed by the light source device 14A, the light introducing optical system 40a and the scanning units U1, U3 and U5, The description of the operation of the light source device 14B, the light introducing optical system 40b and the scanning units U2, U4 and U6 will be omitted. The same components as those of the modification of the second embodiment are denoted by the same reference numerals or omitting the illustration and only the other components are described.

18, the beam (laser beam) LB from one light source device 14A passes through the selection optical elements 50, 58, and 66 in the same manner as in the configurations of Figs. 12 and 13 described above And supplied to three scanning units U1, U3 and U5, respectively. Each of the optical elements for selection 50, 58 and 66 alternatively deflects the beam LB in response to the rendering enable signals SPP1, SPP3 and SPP5 described in Figs. 14 and 15 ), And guides the beam LB to any one of the scanning units U1, U3, and U5. As described above, the beam LB of the ultraviolet band originating from the heald (S2) continues to be radiated even at a slight intensity during a period in which no patterning operation is performed along each of the imaging lines (non-projection period) The movable shutter SST is provided in the injection window of the beam LB of the light source device 14a in consideration of a situation in which the same position on the substrate FS is irradiated for a long time.

As shown in Fig. 14, the origin signals SZ1, SZ3, and SZ5 from the origin sensors OP1, OP3, and OP5 of the respective scanning units U1, U3, and U5 are scanned in units of scanning units U1, U3, and U5 (Pattern data generation circuits) 301, 303, and 305 that generate pattern data of the pattern data. The counter circuit CN1 includes the control circuit 222 of the light source device 14a (see FIG. 16), the gate circuit GT1, the memory block BM1, The clock signal CLK1 generated based on the clock signal LTC output from the clock generator 222a.

Similarly, the generation circuit 303 includes a gate unit GT3, a memory unit BM3, a counter unit CN3, and the like in Fig. 16, and the counter unit CN3 includes a clock signal LTC And the counter section CN5 is constituted to count the clock signal CLK3 and the generation circuit 305 includes a gate section GT5, a memory section BM5, a counter section CN5, And counts the clock signal CLK5 made based on the LTC.

Such clock signals CLK1, CLK3 and CLK5 are controlled by a control circuit 500 functioning as an interface between each of the generating circuits 301, 303 and 305 and the light source device 14A so that the clock signal LTC is set to 1 / n (where n is an integer equal to or greater than 2). The supply of the clock signals CLK1, CLK3 and CLK5 to the respective counter units CN1, CN3 and CN5 is controlled in response to the rendering enable signals SPP1, SPP3 and SPP5 (see Fig. 15) . That is, when the drawing enable signal SPP1 is On, only the clock signal CLK1 obtained by dividing the clock signal LTC by 1 / n is supplied to the counter section CN1, and the drawing enable signal SPP3, Only the clock signal CLK3 obtained by dividing the clock signal LTC by 1 / n is supplied to the counter section CN3. When the drawing enable signal SPP5 is On (high) Only the clock signal CLK5 obtained by dividing the signal LTC by 1 / n is supplied to the counter section CN5.

The serial data DL1, DL3 and DL5 sequentially outputted from the respective generating circuits 301, 303 and 305 are supplied to the control circuit 500 via the gate portions GT1, GT3 and GT5, Input OR circuit GT8 (see Fig. 16) provided in the light source device 14A and supplied to the electro-optical element 206 in the light source device 14A as drawing bit stream data Sdw. The generation circuits 301, 303, and 305 and the control circuit 500 constitute a part of the control device 18.

The above configuration is basically the same as the method of using the light source device 14A described with reference to Fig. 17, but in this embodiment, each of the drawing lines (scanning lines) SL1 , SL3, and SL5 in the spot scanning direction (Y direction) of the pattern to be drawn by the respective pixels in the spot scanning direction (Y direction). In this embodiment, the memory units BM1a, BM3a, BM5a for temporarily storing the information (mg1, mg3, mg5) about the correction amount of the imaging magnification are provided for each of the scanning units U1, U3, U5 . 18, the memory units BM1a, BM3a, and BM5a may be a part of the memory units BM1, BM3, and BM5 provided in the generating circuits 301, 303, and 305, respectively. The information (mg1, mg3, mg5) concerning this correction amount also constitutes a part of the painting information.

The information about the amount of correction (mg1, mg3, mg5) is a rate (for example, a ratio of the degree to which the dimension in the Y direction of the pattern drawn by each of the drawing lines SL1, SL3, ppm). As an example, when the length of the Y directional area that can be drawn by each of the drawing lines SL1, SL3, and SL5 is 30 mm, and it is desired to expand and contract by ± 200 ppm (corresponding to ± 6 m) , mg5) is set to a value such as ± 200. Further, the information (mg1, mg3, mg5) may be set not to the rate but to the direct expansion and contraction amount (占 퐉 占 퐉). The information mg1, mg3, and mg5 may be set again in sequence for each pattern data (serial data DLn) for one line along each of the rendering lines SL1, SL3, and SL5, It may be set again for each transmission of the data (serial data DLn). As described above, in the present embodiment, while the substrate FS is being sent in the X direction (longitudinal direction) while the pattern drawing is performed along each of the drawing lines SL1, SL3, and SL5, It is possible to suppress the deterioration of the imaging position accuracy caused by the deformation of the substrate FS and the distortion in the plane. In addition, when overlapping exposure is performed, the overlapping accuracy can be greatly improved corresponding to the deformation of the base pattern already formed.

19 is a diagram showing time charts of the signal states of the respective parts and the oscillation state of the beam LB at the time of standard patterning by the scanning unit U1 among representations of the imaging apparatus shown in Fig. 19, a two-dimensional matrix Gm represents a bit pattern PP of pattern data to be drawn, and one grid (unit of one pixel (pixel)) on the substrate FS is, for example, Y The dimension Py in the direction is set to 3 mu m, and the dimension Px in the X direction is set to 3 mu m. In Fig. 19, SL1-1, SL1-2, SL1-3, ... SL1-6 represent drawing lines sequentially drawn by the drawing line SL1 in accordance with the movement of the substrate FS in the X direction (sub-scan in the longitudinal direction), and the drawing lines SL1-1, SL1- 2, SL1-3, ..., SSL1-6 is set to 1/2 of the dimension Px (3 占 퐉) of one pixel unit, for example, the conveying speed of the substrate FS is set.

Further, the dimension (spot size?) Of the spot light SP projected onto the substrate FS in the XY direction is approximately equal to or slightly larger than the unit of one pixel. Therefore, a size of φ is the effective diameter (the width of the 1 / e ² of the Gaussian distribution, or the full width at half maximum (全幅) of the peak intensity) of the spot light (SP), is set at about 3 ~ 4㎛, a drawing line (SL1) Therefore, when projecting the spot light SP continuously, the oscillation frequency Fs (pulse time interval) of the beam LB and the polygon mirror (pulse interval) are set so as to overlap with, for example, 1/2 of the effective diameter of the spot light SP The scanning speed Vs of the spot light SP by the exposure light source PM is set. That is, when the beam emitted from the polarization beam splitter 208 in the light source device 14A shown in Fig. 17 is referred to as a beam Lse (Fig. 18), the beam Lse is transmitted to the control circuit 222 (Fig. 19) in response to each clock pulse of the clock signal LTC output from the clock signal generator 222a.

The clock signal LTC and the clock signal CLK1 supplied to the counter section CN1 in the generating circuit 301 in Fig. 18 are set at a frequency ratio of 1: 2, and when the clock signal LTC is 100 MHz , The clock signal CLK1 is set to 50 MHz by a half cycle of the control circuit 500 in Fig. The frequency ratio between the clock signal LTC and the clock signal CLK1 may be an integer multiple. For example, the set frequency of the clock signal CLK1 may be reduced to 25 MHz, which is 1/4, The speed Vs may be set to be reduced to half.

The drawing bit stream data Sdw shown in Fig. 19 corresponds to the serial data DL1 output from the generator circuit 301. Here, for example, the drawing bit stream data Sdw shown in Fig. Pattern. The electro optical element 206 in the light source device 14a switches the polarization state in response to the rendering bit stream data Sdw so that the heptaxel beam Lse is in a state where the rendering bit stream data Sdw is in the On state ) While the drawing bit string data Sdw is in the Off state (low " 0 ") is generated by the shear light S1 from the DFB semiconductor laser element 200 in Fig. 17, And is generated by the shearing light S2 from the semiconductor laser element 202. [ The operation of the drawing exposure of the scanning unit U1 shown in Fig. 19 is the same in the other scanning units U2 to U6.

The DFB semiconductor laser device 200 is driven in response to the clock signal LTC while the drawing bit string data Sdw is in the ON state (high " 1 ") in the control circuit 222 of the light source device 14a. The semiconductor laser device 202 generates the light beam S1 (sharp pulse light) from the DFB semiconductor laser element 202 in response to the clock signal LTC while the drawing bit string data Sdw is in the OFF state (low "0" Optical element 206 shown in Figs. 17 and 18, the polarization beam splitter 208 shown in Fig. 17, the absorber (not shown) 210 may be omitted.

As described above, each pulse light of the light beam Lse is outputted in response to each clock pulse of the clock signal LTC generated by the clock generator 222a shown in Fig. 17, so that in this embodiment, the clock generator A circuit configuration for partially increasing or decreasing the time (period) between the pulses of the clock signal LTC is provided in the clock signal line 222a. The circuit configuration is provided with a reference (standard) clock generator that is a source of the clock signal LTC, a frequency divider counter circuit, a variable delay circuit, and the like.

20 is a time chart showing the relationship between the reference clock signal TC0 and the clock signal LTC from the reference clock generator in the clock generator 222a and shows the relationship between the magnification correction information CMg shown in Figs. Indicates a state in which correction based on is not performed. The variable delay circuit in the clock generator 222a delays the reference clock signal TC0 generated at a constant frequency Fs (constant time Td0) by the delay time DT0 according to the preset value and outputs it as the clock signal LTC . Therefore, for example, if the reference clock signal TC0 is 100 MHz (Td0 = 10 nS), the clock signal LTC continues to be 100 MHz (Td0 = 10 nS) as long as no change occurs in the preset value .

Therefore, when the reference clock signal TC0 is counted by the frequency divider circuit in the clock generator 222a and the count value reaches a predetermined value (Nv), the preset value set in the variable delay circuit is changed by a predetermined amount do. This will be described with reference to the time chart in Fig. In Fig. 21, until the reference clock signal TC0 is counted up to Nv by the frequency divider counter circuit, the preset value set in the variable delay circuit is the delay time DT0. Thereafter, when the frequency divider counter circuit counts up to Nv by one clock pulse Kn of the reference clock signal TC0, the preset value set in the variable delay circuit is immediately changed to the delay time DT1. Accordingly, each clock pulse (K'n + 1 and subsequent) of the clock signal LTC generated based on the clock pulse after the clock pulse Kn + 1 that occurs next to the clock pulse Kn of the reference clock signal TC0 is uniformly And is generated with a delay time DT1.

As a result, only when the preset value set in the variable delay circuit is changed by a certain amount, that is, by the time interval Td1 between the clock pulse K'n of the clock signal LTC and the clock pulse K'n + 1 And the time interval of the clock pulse of the subsequent clock signal LTC becomes Td0. In Fig. 21, it is also possible to increase the delay time DT1 from the delay time DT0 and to increase the time between two clock pulses of the clock signal LTC to be larger than Td0, but to decrease it. Further, the frequency divider counter circuit is reset to zero when the reference clock signal TC0 is counted up to Nv, and starts counting up to Nv again.

The initial value of the preset value set in the variable delay circuit is set to the delay time DT0, the variation amount of the delay time is set to ± ΔDh, the number of times that the frequency division counter circuit is reset by zero is Nz, and when the frequency division counter circuit counts up to Nv DTm, the delay time DTm is set in the relationship of DTm = DT0 + Nz (+ - DELTA Dh), where DTm is the delay time of the preset value sequentially set in the variable delay circuit. Therefore, as shown in Fig. 21, the delay time DT1 in which the number Nz of the zero resets is set to 1 (m = 1) becomes DTm = DT1 = DT0 +/- Dh and the next zero reset (Nz = 2, DTm = DT2 = DT0 + 2 占 (占 DELTA Dh). Therefore, the variation amount DELTA DELTA Dh of the delay time corresponds to the difference (difference) from the reference time Td0 of the time Td1 between the clock pulse K'n of the clock signal LTC and the clock pulse K'n + 1.

As described above, the operation of changing the time interval between the specific two clock pulses of the clock signal LTC is performed in accordance with the predetermined value Nv set in the frequency divider counter circuit by the operation of one of the drawing lines SL1 to SL6 And is performed discretely at a plurality of points in the entire length. This state is shown in Fig. 22 shows a plurality of positions that are zero-reset as correction points CPP over the entire length of the drawing line SL1 every time the counted value of the divider counter circuit reaches the predetermined value Nv. In each of the correction points CPP, the time between the two specific clock pulses of the clock signal LTC is stretched by ± DELTA Dh with respect to the time Td0.

The effective clock size of the reference clock signal TC0 is 100 MHz (Td0 = 10 nS), the effective size of the spot light SP in the main scanning direction is 3 m, and the length of the drawing line SL1 (SL2 to SL6) And the beam LB are overlapped by about half (1.5 mu m) in the main scanning direction, the length of the drawing line SL1 The number of clocks of the reference clock signal TC0 generated over the reference clock signal TC0 becomes 20,000. The variation amount DELTA Dh of the delay time is set to be sufficiently small, for example, about 2% with respect to the reference time interval Td0. Under this condition, when the pattern drawn along the drawing line SL1 is expanded and contracted by 150 ppm in the main-scan direction (Y direction), 150 ppm of the drawing line SL1 with a length of 30 mm corresponds to 4.5 占 퐉. Information about the rate of these drawing magnifications of 150 ppm or the actual dimension length of 4.5 mu m is stored as the information mg1 in the memory unit BM1a in Fig.

Therefore, of the 20,000 clock pulse strings of the clock signal LTC, the number of correction points CPP (FIG. 22) for time stretching and contracting by the time Ddh with respect to the time Td0 is 4.5 m / (1.5 m x 2%) = 150, The maximum predetermined value Nv set in the frequency divider counter circuit shown in Fig. 22 becomes about 133 from 20000/150.

When the variation amount DELTA Dh of the delay time is 5%, the number of correction points CPP is 4.5 m / (1.5 m x 5%) = 60, and the maximum value Nv ) Becomes about 333 from 20000/60. Thus, even if there is a pattern to be drawn at the correction point CPP because the amount of change DELTA Dh of the delay time is smaller than 10%, the size of the pattern is larger than the size of the spotlight SP, The drawing error due to slight positional deviation of the spot light SP in the main scanning direction in the scanning direction CPP can be ignored.

The setting of the delay amount change amount DELTA Dh, the number of correction points CPP, the predetermined value Nv by the frequency divider circuit, and the like are the same as the magnification correction information CMg ( ppm) and is set in the control circuit 222 shown in Fig. 17, and is set to a frequency divider counter circuit or a variable delay circuit in the clock generator 222a.

The beam LB from the light source device 14A can be supplied to each of the three scanning units U1, U3, and U5 in order in time division, and each of the scanning units U1, U3 and U5 of the scanning units U1, U3 and U5 can be individually performed in a serial manner along the drawing lines SL1, SL3 and SL5. Therefore, as shown in Fig. 18, (Mg1, mg3, mg5) can be set. Accordingly, even if the expansion and contraction of the substrate FS in the Y direction is not the same and the expansion and contraction ratios are different for several regions divided in the Y direction, the correction amount of the imaging magnification ratio optimum for each scanning unit Un can be set And it is possible to cope with the nonlinear deformation of the substrate FS.

A laser beam LB emitted from a beam (laser beam) LB that is connected to an apparatus for scanning a spot light SP focused on a workpiece (substrate FS) As shown in Figs. 17 and 18, the device 14A is provided with a first, second, third, fourth, fifth, sixth, seventh, eighth, A first semiconductor laser light source 200 for generating a pulse light (a seed light S1), and a second semiconductor laser light source 200 for emitting light in a shorter period than the predetermined period, A second semiconductor laser light source 202 which generates a broad second pulse light (a second light beam S2) having a long peak intensity and a second pulse light (a second light beam S2) Based on the information of the pattern to be drawn (drawing bit stream data Sdw), the spot light SP is formed on the object to be imaged, At the time of drawing, the first pulse light (the sheated light S1) is incident on the fiber optical amplifier, and when the non-projected light does not project the spot light SP onto the irradiated object, the second pulse light ) To the fiber optical amplifier 216 is provided. The switching device includes an electro-optical element 206 to be selected based on pattern information on which one of the first pulse light (the sheath S1) and the second pulse light (the sheath light S2) The first semiconductor laser light source 200 and the second semiconductor laser light source 202 (hereinafter referred to as " second semiconductor laser light source 202 ") are controlled based on the pattern information to be drawn so that either the pulse light And a circuit for controlling the driving of the driving circuit.

The third embodiment is also applicable to the first embodiment, the modification thereof, and the second embodiment. That is, the clock generator 222a in the control circuit 222 of the light source device 14A described in the third embodiment is used for the case where the clock generator 222a of the light source device 14A receives the magnification correction information from the control unit (control circuit 500) The function of expanding and contracting the time interval of the clock signal LTC in part (discrete) in accordance with the clock signal CMg in the light source device 14 of the first embodiment or its modification or the light source device 14 of the second embodiment (14). In this case, the light source device 14 may not have the DFB semiconductor laser device 202, the polarization beam splitter 204, the electro-optical element 206, the polarization beam splitter 208, and the absorber 210, It is preferable that the light source device 14 amplifies the pulsed sheathed light S1 emitted by the DFB semiconductor laser device 200 with the fiber optical amplifier 216 and emits the beam as the beam LB. In this case, since the light source device 14 does not have the electro-optical element 206, the serial data DL1, DL3, and DL5 generated by the generating circuits 301, 303, And is sent to the drawing optical element 106 or the drawing optical element 150.

[Fourth Embodiment]

23 is a diagram showing a schematic configuration of a device manufacturing system 10 including an exposure apparatus EX for performing exposure processing on a substrate (object to be irradiated) FS of the fourth embodiment. Unless otherwise specified, the same components as those of the first to third embodiments (including modified examples) are denoted by the same reference numerals or omitting the illustration, and only the other portions are described.

In the fourth embodiment, similar to the first to third embodiments (including the modified examples), the exposure apparatus EX as the beam scanning apparatus is an exposure apparatus of a coping mode without using a mask, that is, Type exposure apparatus. The exposure apparatus EX includes a beam switching member 20 and an exposure head 22 in place of the imaging head 16 described in the first to third embodiments (including modifications). The exposure apparatus EX also has a plurality of alignment microscopes AMm (AM1 to AM4). Although not specifically described in the first to third embodiments (including modified examples), the exposure apparatus EX of the first to third embodiments also includes a plurality of alignment microscopes AMm (AM1 to AM4) . It is needless to say that the exposure apparatus EX of the fourth embodiment also includes the substrate transport mechanism 12, the light source device 14 'and the control device 18. 17) of the light source device 14 (the light source devices 14a and 14b) described in the modification of the second embodiment (see FIG. 17) . The beam LB emitted by the light source device 14 'is incident on the exposure head 22 via the beam switching member 20.

The beam switching member 20 is connected to one scanning unit Un for performing one-dimensional scanning of the spot light SP among the plurality of scanning units Un (U1 to U6) constituting the exposure head 22, To switch the optical path of the beam LB so that the beam LB from the device 14 'is incident. The beam switching member 20 will be described later in detail.

The exposure head 22 has a plurality of scanning units Un (U1 to U6) through which the beams LB are incident. The exposure head 22 draws a pattern on a part of the substrate FS supported by the circumferential surface of the rotary drum DR by a plurality of scanning units Un (U1 to U6). The exposure head 22 is a so-called multi-beam type exposure head in which a plurality of scanning units Un (U1 to U6) having the same configuration are arranged. As shown in Fig. 23, the odd-number scan units U1, U3, and U5 are arranged on the upstream side (-X direction side) in the transport direction of the substrate FS with respect to the center plane Poc, Respectively. The even-numbered scanning units U2, U4 and U6 are disposed on the downstream side (+ X direction side) of the substrate FS with respect to the center plane Poc in the carrying direction of the substrate FS, and are arranged along the Y direction. The odd scanning units U1, U3 and U5 and the even scanning units U2, U4 and U6 are provided symmetrically with respect to the center plane Poc. That is, in the fourth embodiment, the arrangements of the odd-number scan units U1, U3, U5 and the even-number scan units U2, U4, U6 are the same as those of the first to third embodiments As shown in Fig.

The scanning unit Un irradiates the spot F onto the substrate FS while projecting the beam LB from the light source device 14 'to converge the beam LB onto the surface to be irradiated of the substrate FS into the spot light SP, Dimensional scanning by a rotating polygon mirror PM (see Fig. 28) along a predetermined linear drawing line (scanning line) SLn on the surface to be scanned of the polygon mirror PM.

The plurality of scanning units Un (U1 to U6) are arranged in a predetermined arrangement relationship. In the fourth embodiment, the plurality of scanning units Un (U1 to U6) are arranged so that the drawing lines SLn (SL1 to SL6) of the plurality of scanning units Un (U1 to U6) (The width direction of the substrate FS, the main scanning direction), as shown in FIG. 25, without being separated from each other. In addition, as described in the first to third embodiments (modified examples), the beams LB incident on the respective scanning units Un (U1 to U6) may be represented by LB1 to LB6, respectively. The beam LB incident on the scanning unit Un is a beam of linearly polarized light (P polarized light or S polarized light) polarized in a predetermined direction. In the fourth embodiment, the beam LB is a beam of P polarized light. In addition, the beams LB1 to LB6 incident on each of the six scanning units U1 to U6 may be referred to as a beam LBn.

Each of the scanning units Un (U1 to U6) is formed so as to cover all of the widthwise direction of the exposure area W with all of the plurality of scanning units Un (U1 to U6) , And scan areas. Thus, each of the scanning units Un (U1 to U6) can draw a pattern for each of a plurality of regions divided in the width direction of the substrate FS. For example, when the scanning length in the Y direction (length of the drawing line SLn) by one scanning unit Un is about 30 to 60 mm, three of the odd-numbered scanning units U1, U3, U5, By arranging the three total six scanning units Un of the even-numbered scanning units U2, U4, and U6 in the Y direction, the width in the Y-direction that can be drawn is widened to about 180 to 360 mm. The length (scanning length, drawing width in the main scanning direction) of each of the drawing lines SL1 to SL6 is, in principle, the same.

In addition, as described above, the actual drawing lines SLn (SL1 to SL6) are set to be slightly shorter than the maximum length at which the spot light SP can actually be scanned on the surface to be irradiated. By setting in this way, the position of the drawing line SLn (for example, the scanning length is 30 mm) is finely adjusted in the main scanning direction within the range of the maximum scanning length (for example, 31 mm) of the spotlight SP , It is possible to finely adjust the imaging magnification. The maximum scanning length of the spot light SP is determined mainly by the aperture of the f? Lens FT (see Fig. 28) provided behind the polygon mirror (rotating polygon mirror) PM in the scanning unit Un.

The plurality of drawing lines SLn (SL1 to SL6) are arranged in two rows in the circumferential direction of the rotary drum DR with the center plane Poc therebetween. The odd-numbered writing lines SL1, SL3 and SL5 are located on the surface to be irradiated of the substrate FS on the upstream side (-X direction side) in the carrying direction of the substrate FS with respect to the center plane Poc. The even-numbered drawing lines SL2, SL4 and SL6 are located on the substrate FS on the downstream side (+ X direction side) of the substrate FS with respect to the center plane Poc in the carrying direction of the substrate FS. The drawing lines SL1 to SL6 are substantially parallel to the width direction of the substrate FS, that is, the central axis AXo of the rotary drum DR.

The drawing lines SL1, SL3, and SL5 are arranged on a straight line at a predetermined interval along the width direction (scanning direction) of the substrate FS. The drawing lines SL2, SL4 and SL6 are likewise arranged on a straight line at a predetermined interval along the width direction (scanning direction) of the substrate FS. The scanning direction of the spot light SP of the beam LBn scanned along each of the odd-numbered imaging lines SL1, SL3, and SL5 is in one-dimensional direction and is in the -Y direction. The scanning direction of the spot light SP of the beam LBn scanned along each of the even-numbered imaging lines SL2, SL4, and SL6 is in the one-dimensional direction and is in the + Y direction.

In the fourth embodiment, the plurality of scanning units Un (U1 to U6) repeat scanning of the spot lights SP of the beam LBn in a predetermined order (predetermined order). For example, when the order of the scanning unit Un for scanning the spot light SP is U1 → U2 → U3 → U4 → U5 → U6, first, the scanning unit U1 irradiates the spot light SP) is performed once. When the scanning of the spot light SP of the scanning unit U1 is finished, the scanning unit U2 performs scanning of the spot light SP once, and when the scanning is finished, the scanning unit U3 moves the spot light SP A plurality of scanning units Un (U1 to U6) scan the spot light SP one time in a predetermined order in such a manner that the scanning of the spot SP is performed once. When the scanning of the spot light SP of the scanning unit U6 is completed, the scanning of the spot light SP of the scanning unit U1 is returned. In this manner, the plurality of scanning units Un (U1 to U6) repeat the scanning of the spot light SP in a predetermined order.

Each of the scanning units Un (U1 to U6) is configured to move each of the beams LBn to the substrate FS (not shown) so that each beam LBn advances toward the central axis AXo of the rotary drum DR, ). Thus, the optical path (beam central axis) of the beam LBn proceeding from each of the scanning units Un (U1 to U6) toward the substrate FS is parallel to the surface of the substrate FS on the XZ plane It becomes the same axis (parallel) as the normal (normal) line. In addition, each of the scanning units Un (U1 to U6) is arranged such that the beam LBn irradiating the drawing lines SLn (SL1 to SL6) is directed to the irradiated surface of the substrate FS in a plane parallel to the YZ plane The beam LBn is irradiated toward the substrate FS so as to be perpendicular to the substrate FS. That is, with respect to the main scanning direction of the spot light SP on the surface to be irradiated, the beams LBn (LB1 to LB6) projected on the substrate FS are scanned in a telecentric state. Herein, a line (also referred to as an optical axis) perpendicular to the surface to be irradiated of the substrate FS passing through each middle point of the drawing lines SLn (SL1 to SL6) defined by the respective scanning units Un (U1 to U6) Is referred to as an irradiation center axis (Len (Le1 to Le6)) (see Fig. 24).

Each of the irradiation central axes Len (Le1 to Le6) is a line connecting the drawing lines SL1 to SL6 and the central axis AXo in the XZ plane. The irradiation central axes Le1, Le3 and Le5 of the odd-number scan units U1, U3 and U5 are in the same direction in the XZ plane and the irradiation center axes Le1, Le3 and Le5 of the odd- The irradiation central axes Le2, Le4 and Le6 are in the same direction in the XZ plane. The irradiation central axes Le1, Le3 and Le5 and the irradiation central axes Le2, Le4 and Le6 are set so that the angle is ±? With respect to the central plane Poc in the XZ plane ).

The alignment microscope AMm (AM1 to AM4) shown in Fig. 23 is for detecting the alignment marks MKm (MK1 to MK4) formed on the substrate FS as shown in Fig. 25, (Four in the fourth embodiment) are provided. The alignment marks MKm (MK1 to MK4) are formed on the basis of a predetermined pattern drawn on the exposure area W of the surface to be irradiated of the substrate FS and a reference mark (alignment mark) for relatively positioning (aligning) to be. The alignment microscopes AMm (AM1 to AM4) detect the alignment marks MKm (MK1 to MK4) on the substrate FS supported by the circumferential surface of the rotary drum DR. The alignment microscopes AMm (AM1 to AM4) are arranged on the irradiation area (drawing lines SL1 to SL4) on the substrate FS by the spot lights SP of the beams LBn (LB1 to LB6) from the exposure head 22, SL) on the upstream side in the transport direction of the substrate FS (-X direction side).

The alignment microscope AMm (AM1 to AM4) includes a light source for projecting illumination light for alignment onto the substrate FS and a local region including alignment marks MKm (MK1 to MK4) on the surface of the substrate FS (Including an objective lens) for obtaining an enlarged image of the object (e.g., an image of the object), and an imaging device such as a CCD or CMOS for imaging the enlarged image with a high-speed shutter while the substrate FS is moving in the carrying direction. The imaging signals (image data) ig (ig1 to ig4) captured by the alignment microscopes AMm (AM1 to AM4) are sent to the control device 18. The control device 18 performs image analysis of the image pickup signals i g1 to i g4 and information on the rotational position of the rotary drum DR at the moment of image capture The position of the substrate FS is measured with high accuracy by detecting the position of the alignment marks MKm (MK1 to MK4) based on the measured values of the alignment marks EN1a and EN1b. The illumination light for alignment is light in a wavelength band that has little sensitivity to the photosensitive functional layer on the substrate FS, for example, light having a wavelength of about 500 to 800 nm.

Alignment marks (MK1 to MK4) are provided around the respective exposure regions (W). A plurality of alignment marks MK1 to MK4 are formed on both sides of the exposure region W in the width direction of the substrate FS with a predetermined interval DI along the longitudinal direction of the substrate FS. The alignment mark MK1 is formed on the -Y direction side in the width direction of the substrate FS and the alignment mark MK4 is formed on the + Y direction side in the width direction of the substrate FS. The alignment marks MK1 to MK4 are arranged so as to be at the same position with respect to the longitudinal direction (X direction) of the substrate FS in a state in which the substrate FS is subjected to a large tension or undergoes a thermal process and is not deformed . Further, the alignment marks MK2 and MK3 are provided between the alignment mark MK1 and the alignment mark MK4 in a margin portion between the + X direction side and the -X direction side of the exposure region W And is formed along the width direction (short side direction) of the substrate FS. Alignment marks MK2 and MK3 are formed between the exposure region W and the exposure region W. [ The alignment mark MK2 is formed on the -Y direction side in the width direction of the substrate FS and the alignment mark MK3 is formed on the + Y direction side of the substrate FS.

The distance in the Y direction between the alignment mark MK1 arranged on the side end portion of the substrate FS in the -Y direction and the alignment mark MK2 on the blank portion and the alignment mark MK2 on the blank portion, The spacing in the Y direction of the substrate MK3 and the spacing in the Y direction between the alignment mark MK4 arranged at the side end in the + Y direction of the substrate FS and the alignment mark MK3 at the blank portion are all set to the same distance . These alignment marks MKm (MK1 to MK4) may be formed together at the time of forming the pattern layer as the first layer. For example, when the pattern of the first layer is exposed, a pattern for an alignment mark may also be exposed around the exposure region W where the pattern is exposed. The alignment mark MKm may be formed in the exposure region W. [ For example, it may be formed along the outline of the exposure area W in the exposure area W. [ When the alignment mark MKm is formed in the exposure area W, the pattern part at a specific position in the pattern of the electronic device formed in the exposure area W, or a part of the specific shape, is used as the alignment mark MKm May be used.

The alignment microscope AM1 is arranged to image the alignment mark MK1 existing in the observation region (detection region) Vw1 by the objective lens. Similarly, the alignment microscopes AM2 to AM4 are arranged to image the alignment marks MK2 to MK4 existing in the observation regions Vw2 to Vw4 by the objective lens. Therefore, the plurality of alignment microscopes AM1 to AM4 correspond to the positions of the plurality of alignment marks MK1 to MK4 and are arranged in the order of the alignment microscopes AM1 to AM4 from the -Y direction side of the substrate FS. The alignment microscopes AMm (AM1 to AM4) are arranged so that the distance between the exposure positions (imaging lines SL1 to SL6) and observation regions Vw (Vw1 to Vw4) of the alignment microscope AMm in the X- Is shorter than the length of the area W in the X direction. The number of the alignment microscopes AMm provided in the Y direction can be changed in accordance with the number of alignment marks MKm formed in the width direction of the substrate FS. The size of the observation area Vw1 to Vw4 on the surface to be irradiated of the substrate FS is set according to the size of the alignment marks MK1 to MK4 and the alignment accuracy (position measurement accuracy). However, Size. Although not specifically described in the first to third embodiments (including the modified examples), a plurality of alignment marks MKm are also formed on the substrate FS used in the first to third embodiments.

As shown in Fig. 24, scale portions SD (SDa and SDb) having graduations formed annularly in the circumferential direction of the outer circumferential surface of the rotary drum DR are provided at both ends of the rotary drum DR. This scale part SD (SDa, SDb) is formed by engraving a grating line having a concave shape or a convex shape at a constant pitch (for example, 20 占 퐉) in the circumferential direction of the outer peripheral surface of the rotary drum DR Lattice, and is constructed as an incremental scale. The schedules SD (SDa, SDb) rotate integrally with the rotary drum DR around the center axis AXo. A plurality of encoders (scale read heads) ENn are provided so as to face the schedules SD (SDa, SDb). The encoder ENn optically detects the rotational position of the rotary drum DR. Three encoders ENn (EN1a, EN2a, EN3a) are provided opposite to the scaffold SDa provided at the end on the -Y direction side of the rotary drum DR. Similarly, three encoders ENn (EN1b, EN2b, EN3b) are provided opposite to the scraper portion SDb provided at the end on the + Y direction side of the rotary drum DR. Although not specifically described in the first to third embodiments (including the modified examples), the schedules SD (SDa, SDb) are provided at both ends of the rotary drum DR of the first to third embodiments And a plurality of encoders ENn (EN1a to EN3a, EN1b to EN3b) are provided so as to be opposed to each other.

The encoder ENn (EN1a to EN3a and EN1b to EN3b) projects the measurement light beam toward the schedules SD (SDa and SDb) and photoelectrically detects the reflected light flux (diffracted light) To the control device (18). The controller 18 counts the rotation angle position and the angle change of the rotary drum DR with the resolution of sub-micron (resolution) by counting the detection signal (pulse signal) by the counter circuit 356a can do. The counter circuit 356a individually counts the detection signals of the respective encoders ENn (EN1a to EN3a, EN1b to EN3b). The control device 18 may also measure the conveyance speed of the substrate FS from the angle change of the rotary drum DR. The counter circuit 356a for individually counting the detection signals of the respective encoders ENn (EN1a to EN3a and EN1b to EN3b) individually detects whether or not each of the encoders ENn (EN1a to EN3a and EN1b to EN3b) (Origin point pattern) ZZ formed in a part of the circumferential direction of the encoder ENa, SDb is reset, the count value corresponding to the encoder ENn is reset to zero.

The encoders EN1a and EN1b are disposed on the mounting diagonal line Lx1. The installation diagonal line Lx1 is a projection position (read position) on the scale part SD (SDa, SDb) of the measurement light beam of the encoders EN1a and EN1b and a central axis AXo It is a connecting line. The mounting diagonal line Lx1 is a line connecting the observation region Vw (Vw1 to Vw4) of the respective alignment microscopes AMm (AM1 to AM4) and the central axis AXo in the XZ plane.

The encoders EN2a and EN2b are provided on the upstream side (-X direction side) in the transport direction of the substrate FS with respect to the center plane Poc and also in the transport direction of the substrate FS with respect to the encoders EN1a and EN1b. And is provided on the downstream side (+ X direction side). The encoders EN2a and EN2b are disposed on the mounting diagonal line Lx2. The mounting diagonal line Lx2 is a line connecting the projection position onto the scaling part SD (SDa, SDb) of the measurement light beam of the encoders EN2a and EN2b and the central axis AXo in the XZ plane have. The mounting disposition line Lx2 overlaps with the irradiation central axis Le1, Le3, and Le5 at the same angular position in the XZ plane.

The encoders EN3a and EN3b are provided on the downstream side (+ X direction side) in the transport direction of the substrate FS with respect to the center plane Poc. The encoders EN3a and EN3b are arranged on the mounting diagonal line Lx3. The mounting diagonal line Lx3 is a line connecting the projection position onto the scale part SD (SDa, SDb) of the measurement light beam of the encoders EN3a and EN3b and the central axis AXo in the XZ plane have. This mounting diagonal line Lx3 overlaps with the same angular position as the irradiation central axis Le2, Le4, and Le6 in the XZ plane.

(Rotation angle position) of the detection signal from the encoders EN1a and EN1b and a count value (rotation angle position) of the detection signal from the encoders EN2a and EN2b and detection from the encoders EN3a and EN3b The count value (rotational angle position) of the signal is reset to zero at the moment when each encoder ENn detects the origin mark ZZ attached to one point in the circumferential direction of the rotary drum DR. Therefore, on the mounting disposition line Lx1 of the substrate FS wound on the rotary drum DR when the count value based on the encoders EN1a and EN1b is the first value (for example, 100) (The positions of the observation regions Vw1 to Vw4 of the alignment microscopes AM1 to AM4) is the first position, the first position on the substrate FS is the position on the mounting diagonal line Lx2 (For example, the positions of the sliders SL1, SL3 and SL5), the count value based on the encoders EN2a and EN2b becomes the first value (for example, 100). Similarly, when the first position on the substrate FS is conveyed to the position on the mounting orientation line Lx3 (positions of the drawing lines SL2, SL4, and SL6), the count value of the detection signal based on the encoders EN3a and EN3b is And becomes a first value (for example, 100).

By the way, the substrate FS is wound inside the scaffolds SDa and SDb at both ends of the rotary drum DR. 23, the radius from the central axis AXo of the outer peripheral surface of the schedules SD (SDa, SDb) is set smaller than the radius from the central axis AXo of the outer peripheral surface of the rotary drum DR. However, as shown in Fig. 24, the outer peripheral surface of the schedules SD (SDa, SDb) may be set to be flush with the outer peripheral surface of the substrate FS wound around the rotary drum DR. That is, the radius (distance) from the central axis AXo of the outer peripheral surface of the scale part SD (SDa, SDb) and the center axis of the outer peripheral surface (irradiated surface) of the substrate FS wound around the rotary drum DR AXo may be set to be equal to each other. The encoder ENn (EN1a, EN1b, EN2a, EN2b, EN3a, EN3b) is moved in the same radial direction as the surface to be irradiated on the substrate FS wound on the rotary drum DR, And Abbe error caused by the measurement position and the processing position (drawing lines SL1 to SL6) of the encoder ENn differing in the radial direction of the rotary drum DR can be reduced can do.

Based on the above, on the basis of the positions (count values by the encoders EN1a and EN1b) of the alignment marks MKm (MK1 to MK4) detected by the alignment microscopes AMm (AM1 to AM4) The start position of the exposure area W of the exposure area W in the longitudinal direction (X direction) of the substrate FS is determined by the exposure control section 40 and the count value based on the encoders EN1a and EN1b at this time is set to a first value For example, 100). In this case, when the count value based on the encoders EN2a and EN2b becomes the first value (for example, 100), the start position of the imaging exposure of the exposure area W in the longitudinal direction of the substrate FS Are positioned on the rendering lines SL1, SL3, and SL5. Therefore, the scanning units U1, U3, and U5 can start scanning of the spotlight SP based on the count values of the encoders EN2a and EN2b. When the count value based on the encoders EN3a and EN3b becomes the first value (for example, 100), the start position of the imaging exposure of the exposure area W in the longitudinal direction of the substrate FS SL2, SL4, and SL6. Therefore, the scanning units U2, U4, and U6 can start scanning of the spotlight SP based on the count values of the encoders EN3a and EN3b. Although not specifically described in the first to third embodiments (including the modified examples), the exposure apparatus EX according to the first to third embodiments are also applicable to the encoders ENn (EN1a to EN3a, EN1b to EN3b) and (SD (SDa, SDb)).

Fig. 26 is a configuration diagram of the beam switching member 20. Fig. The beam switching member 20 includes a plurality of selection optical elements AOMn (AOM1 to AOM6), a plurality of condenser lenses CD1 to CD6, a plurality of reflection mirrors M1 to M12, Mirrors IM1 to IM6, a plurality of collimator lenses CL1 to CL6, and an absorber TR. The optical elements for selection (AOMn (AOM1 to AOM6)) are transparent to the beam LB and are acousto-optic modulators (AOM) driven by ultrasonic signals. These optical members (selection optical elements AOM1 to AOM6), condenser lenses CD1 to CD6, reflection mirrors M1 to M12, unit side incident mirrors IM1 to IM6, collimate lenses CL1 to CL6, Absorbing member TR) is supported by a plate-like support member IUB. This supporting member IUB supports these optical members from below (on the -Z direction side) above the plurality of scanning units Un (U1 to U6). Therefore, the support member IUB has a function of cutting off heat between the selection optical elements AOMn (AOM1 to AOM6) and the plurality of scan units Un (U1 to U6) serving as a heat source Respectively.

The beam LB from the light source device 14 'is bent by the reflecting mirrors M1 to M12 into a curved shape and guided to the absorber TR. Hereinafter, the case in which all of the optical elements for selection (AOMn (AOM1 to AOM6)) are in an off state (state in which no ultrasonic signal is applied) will be described in detail. The beam LB (parallel light flux) from the light source device 14 'travels in the + Y direction parallel to the Y-axis and passes through the condenser lens CD1 and is incident on the reflection mirror M1. The beam LB reflected from the reflecting mirror M1 in the -X direction is transmitted through the first selecting optical element AOM1 arranged at the focus position (beam waist position) of the condensing lens CD1 in a straight line, The light flux becomes a parallel beam again by the mate lens CL1, and reaches the reflection mirror M2. The beam LB reflected from the reflecting mirror M2 toward the + Y direction is reflected from the reflecting mirror M3 toward the + X direction after passing through the condenser lens CD2.

The beam LB reflected by the reflecting mirror M3 is transmitted through the second selecting optical element AOM2 arranged at the focal position (beam waist position) of the condensing lens CD2 in a straight manner and is transmitted through the collimator lens CL2 And becomes a parallel beam again, and reaches the reflecting mirror M4. The beam LB reflected from the reflecting mirror M4 toward the + Y direction is reflected by the reflecting mirror M5 toward the -X direction after passing through the condenser lens CD3. The beam LB reflected from the reflecting mirror M5 toward the -X direction is transmitted through the third selecting optical element AOM3 disposed at the focus position (beam waist position) of the condensing lens CD3 in a straight line, It is again collimated by the mate lens CL3, and reaches the reflection mirror M6. The beam LB reflected from the reflecting mirror M6 toward the + Y direction is reflected toward the + X direction from the reflecting mirror M7 after passing through the condenser lens CD4.

The beam LB reflected by the reflecting mirror M7 is transmitted through the fourth selecting optical element AOM4 arranged at the focal position (beam waist position) of the condensing lens CD4 in a straight line, and passes through the collimator lens CL4 And then reaches the reflecting mirror M8. The beam LB reflected from the reflecting mirror M8 toward the + Y direction is reflected toward the -X direction by the reflecting mirror M9 after passing through the condenser lens CD5. The beam LB reflected from the reflecting mirror M9 in the -X direction is transmitted through the fifth selecting optical element AOM5 disposed at the focus position (beam waist position) of the condenser lens CD5 in a straight line, The light flux becomes a parallel beam again by the mate lens CL5, and reaches the reflection mirror M10. The beam LB reflected from the reflecting mirror M10 toward the + Y direction is reflected from the reflecting mirror M11 toward the + X direction after passing through the condenser lens CD6. The beam LB reflected by the reflecting mirror M11 passes straight through the sixth selecting optical element AOM6 disposed at the focal position (beam waist position) of the condensing lens CD6 and passes through the collimator lens CL6 And is reflected to the -Y direction side in the reflection mirror M12, and then reaches the absorber TR. The absorber TR is a light trap that absorbs the beam LB to suppress leakage of the beam LB to the outside.

As described above, the optical elements for selection AOM1 to AOM6 are arranged so as to sequentially transmit the beam LB from the light source device 14 ', and the condenser lenses CD1 to CD6 and the collimator lenses CL1 to CL6, Are arranged such that a beam waist of the beam LB is formed inside each of the optical elements for selection AOM1 to AOM6. As a result, the diameter of the beam LB incident on the selection optical elements AOM1 to AOM6 (acousto-optic modulation elements) is reduced, thereby increasing the diffraction efficiency and increasing the response.

Each of the optical elements for selection AOMn (AOM1 to AOM6) is a diffraction grating for diffracting an incident beam LB (zero-order light) by a diffraction angle corresponding to the frequency of a high frequency, when an ultrasonic signal (high- As an irradiation beam (beam LBn). In the fourth embodiment, a beam LBn emitted as first-order diffracted light from each of a plurality of selection optical elements AOMn (AOM1 to AOM6) is referred to as beams LB1 to LB6, (AOMn (AOM1 to AOM6)) treats it as achieving the function of deflecting the optical path of the beam LB from the light source device 14 '. However, as described above, in the actual acoustooptical modulation element, since the generation efficiency of the first-order diffracted light is about 80% of the zero-order light, the deflected beams LB1 to LB6 in the respective optical elements AOMn (AOM1 to AOM6) Is lower than the intensity of the original beam LB. When any one of the optical elements for selection (AOMn (AOM1 to AOM6)) is in an ON state, about 0% of the zero-order light remaining without diffraction remains, and this is finally absorbed by the absorber TR.

Since the selection optical element AOMn is a diffraction grating that causes a periodic coarse change of the refractive index in a predetermined direction in the transmission member by the ultrasonic waves, the incident beam LB is a linearly polarized light (P polarized light or S polarized light ), The polarization direction thereof and the periodic direction of the diffraction grating are set such that the efficiency of generation of first order diffracted light (diffraction efficiency) is the highest. 26, when the selection optical element AOMn is provided to diffract the incident beam LB in the Z direction, the periodic direction of the diffraction grating generated in the selection optical element AOMn is also the Z direction , And the polarization direction of the beam LB from the light source device 14 'is set (adjusted) so as to match with it.

26, each of the plurality of selection optical elements AOMn (AOM1 to AOM6) includes deflected beams LB1 to LB6 (first-order diffracted light) with respect to the incident beam LB -Z direction. The beams LB1 to LB6 deflected and emitted from each of the optical elements for selection AOMn (AOM1 to AOM6) are transmitted to the respective optical elements AOMn (AOM1 to AOM6) Incident mirrors IM1 to IM6, and are reflected so as to be parallel to the irradiation central axes Le1 to Le6 (same axis) in the -Z direction. The beams LB1 to LB6 reflected by the unit side incident mirrors IM1 to IM6 (hereinafter, simply referred to as mirrors IM1 to IM6) are arranged such that the respective openings TH1 to TH6 formed in the support member IUB And is incident on each of the scanning units Un (U1 to U6) so as to follow the irradiation central axes Le1 to Le6.

The same configuration, function, action, and the like of the optical elements for selection (AOMn (AOM1 to AOM6)) may be used. The plurality of optical elements for selection AOMn (AOM1 to AOM6) are configured to turn on the generation of the diffracted light obtained by diffracting the incident beam LB according to the on / off of the drive signal (high frequency signal) / Off. For example, the optical element for selection AOM1 transmits the incident beam LB without diffraction when the driving signal (high-frequency signal) from the control device 18 is not applied and is in the OFF state. Therefore, the beam LB transmitted through the optical element for selection AOM1 is transmitted through the collimator lens CL1 and is incident on the reflection mirror M2. On the other hand, the selection optical element AOM1 diffracts the incident beam LB to direct the mirror IM1 when the drive signal from the controller 18 is applied. That is, the selection optical element AOM1 is switched by this drive signal. The mirror IM1 reflects the beam LB1 diffracted by the selection optical element AOM1 toward the scanning unit U1 side. The beam LB1 reflected by the mirror IM1 passes through the opening TH1 of the supporting member IUB and is incident on the scanning unit U1 along the irradiation central axis Le1. Therefore, the mirror IM1 reflects the incident beam LB1 such that the optical axis of the reflected beam LB1 is coaxial with the irradiation central axis Le1. When the selection optical element AOM1 is in the ON state, the zero-order light (the intensity of about 20% of the incident beam) of the beam LB passing through the selection optical element AOM1 straightly passes through the collium Mite lenses CL1 to CL6, condenser lenses CD2 to CD6, reflection mirrors M2 to M12 and selection optical elements AOM2 to AOM6 to reach the absorber TR.

27A is a view showing the switching of the optical path of the beam LB by the optical element for selection AOM1 from the + Z direction side and Fig. 27B is a view showing the switching of the optical path of the beam LB by the optical element for selection AOM1 -Y direction. Fig. When the drive signal is in the OFF state, the selection optical element AOM1 transmits the incident beam LB toward the reflecting mirror M2 side without diffracting it. On the other hand, when the drive signal is on, the selection optical element AOM1 generates a beam LB1 that diffracts the incident beam LB toward the -Z direction, and directs it to the mirror IM1. Therefore, in the XY plane, the beam LB (zero-order light) and the deflected beam LB1 (first-order diffracted light) emitted from the optical element for selection AOM1 are not changed, LB1) (1st-order diffracted light). Thus, the control device 18 switches the selection optical element AOM1 by turning on / off (high / low) a drive signal (high frequency signal) to be applied to the selection optical element AOM1, Whether or not the deflected beam LB is directed to the subsequent selection optical element AOM2 or the deflected beam LB1 is directed to the scanning unit U1.

Likewise, when the drive signal (high-frequency signal) from the control device 18 is in the off state, the optical element for selection AOM2 is switched on so that the incident beam LB (which is not diffracted by the selection optical element AOM1, The beam LB is transmitted to the collimator lens CL2 side (on the side of the reflection mirror M4) without diffracting the beam LB of the incident beam LB, and when the drive signal from the control device 18 is ON, And directs the beam LB2, which is diffracted light, toward the mirror IM2. The mirror IM2 reflects the beam LB2 diffracted by the selection optical element AOM2 to the scanning unit U2 side. The beam LB2 reflected by the mirror IM2 passes through the opening TH2 of the support member IUB and coincides with the irradiation central axis Le2 and is incident on the scanning unit U2. In addition, the optical elements for selection AOM3 to AOM6 can control the collimator lenses CL3 to CL6 without diffracting the incident beam LB when the drive signal (high-frequency signal) from the control device 18 is in the off state, (LB3 to LB6), which are first-order diffracted lights of the incident beam LB, when the drive signal from the control device 18 is on, To the mirrors IM3 to IM6. The mirrors IM3 to IM6 reflect the beams LB3 to LB6 diffracted by the selection optical elements AOM3 to AOM6 toward the scanning units U3 to U6. The beams LB3 to LB6 reflected by the mirrors IM3 to IM6 are coaxial with the irradiation central axes Le3 to Le6 and pass through each of the opening portions TH3 to TH6 of the supporting member IUB, And is incident on the units U3 to U6. Thus, the control device 18 turns on / off (high / low) the drive signals (high-frequency signals) to be applied to each of the selection optical elements AOM2 to AOM6 so that the selection optical elements AOM2 to AOM6 Is switched so that one of the deflected beams LB2 to LB6 is directed to the next selection optical element AOM3 to AOM6 or the absorber TR by the corresponding scanning unit U2 to U6.

As described above, the beam switching member 20 is provided with the plurality of selection optical elements AOMn (AOM1 to AOM6) arranged in series along the traveling direction of the beam LB from the light source device 14 ' , The optical path of the beam LB can be switched and one scanning unit Un to which the beam LBn is incident can be selected. For example, when it is desired to cause the beam LB1 to be incident on the scanning unit U1, when it is desired to turn on the selection optical element AOM1 and to enter the beam LB3 into the scanning unit U3 , And the selection optical element AOM3 is turned on. The plurality of selection optical elements AOMn (AOM1 to AOM6) are provided corresponding to the plurality of scanning units Un (U1 to U6), and determine whether or not to allow the beam LBn to enter the corresponding scanning unit Un .

Since the plurality of scanning units Un (U1 to U6) repeat the operation of scanning the spot light SP in a predetermined order, the beam switching member 20 also rotates the beams LB1 to LB6 To the scanning units U1 to U6. For example, the order of the scanning unit (Un) for scanning the spot light (SP) is U1 → U2 → → U6, the beam switching member 20 also corresponds to this, and the scanning unit Un to which the beam LBn is incident is U1 → U2 → ... → U6.

As described above, the optical elements AOMn (AOM1 to AOM6) for selection of the beam switching member 20 are the same as those of the spotlight SP by the respective polygon mirrors PM of the scanning units Un (U1 to U6) It is only required to be in the ON state for one scanning period. When the number of reflection surfaces of the polygon mirror PM is Np and the rotation speed of the polygon mirror PM is Vp (rpm), the angle of rotation of one reflection surface RP of the polygon mirror PM, Is Tss = 60 / (Np 占 Vp) [sec]. For example, when the number of reflection surfaces Np is 8 and the rotation speed Vp is 30,000, one rotation of the polygon mirror PM is 2 milliseconds, and the time Tss is 0.25 milliseconds. This is 4 kHz in terms of frequency, and compared with an acoustooptic modulation device for modulating a beam LB of a wavelength in the ultraviolet band at a high speed of several tens of MHz in response to imaging data, it means. Therefore, it is possible to use those having large diffraction angles of beams LB1 to LB6 (first-order diffraction light) deflected with respect to the incident beam LB (zero-order light), and the optical elements for selection AOM1 to AOM6 The mirrors IM1 to IM6 (Figs. 26, 27A, and 27B) for separating the deflected beams LB1 to LB6 can be easily arranged with respect to the path of the beam LB passing therethrough.

Since the plurality of scanning units U1 to U6 repeat the operation of scanning the spot light SP one by one in a predetermined order, the serial data of the pattern data of each scanning unit Un DLn are outputted to the driving circuit 206a of the light source device 14 'in a predetermined order. The serial data DLn sequentially output to the driving circuit 206a is referred to as rendering bit stream data Sdw. For example, if the predetermined order is U1 → U2 → ... → U6, first, the serial data DL1 for one column is output to the drive circuit 206a, and then the serial data DL2 for one column is output to the drive circuit 206a And the serial data DL1 to DL6 for one column constituting the rendering bit stream data Sdw are outputted to the sequential driving circuit 206a. Thereafter, the serial data DL1 to DL6 of the next column are output to the sequential drive circuit 206a as the rendering bit stream data Sdw. A specific configuration for outputting the rendering bit stream data Sdw to the driving circuit 206a will be described later in detail.

The configuration of the scanning units Un (U1 to U6) may be the one used in the first to third embodiments. In the fourth embodiment, the scanning unit Un having the configuration shown in Fig. 28 . The scanning unit Un described below may be used as the scanning units of the first to third embodiments.

The optical configuration of the scanning unit Un (U1 to U6) used in the fourth embodiment will be described below with reference to Fig. In addition, since each of the scanning units Un (U1 to U6) has the same configuration, only the scanning unit U1 will be described, and the other scanning units Un will not be described. 28, the substrate FS is transferred from the processing apparatus PR1 to the exposure apparatus EX (EX) in a plane perpendicular to the Zt direction with the direction parallel to the irradiation central axis Len Le1 being the Zt direction. And the direction orthogonal to the Xt direction is defined as the Yt direction. The direction orthogonal to the Xt direction is a plane orthogonal to the Zt direction. That is, the three-dimensional coordinates of Xt, Yt, and Zt in FIG. 28 are obtained by transforming the three-dimensional coordinates of X, Y, and Z in FIG. 23 such that the Z axis direction about the Y axis is parallel to the irradiation center axis Len So that the three-dimensional coordinate is rotated.

As shown in Fig. 28, in the scanning unit U1, a reflecting mirror M20, a beam expander M21, and a beam expander M21 are disposed along the traveling direction of the beam LB1 from the incident position of the beam LB1 to the surface to be irradiated with the substrate FS. (BE), a reflection mirror M21, a polarization beam splitter BS, a reflection mirror M22, an image shift optical member SR, a field aperture (FA), a reflection mirror M23, A wavelength plate QW, a cylindrical lens CYa, a reflection mirror M24, a polygon mirror PM, an f? Lens FT, a reflection mirror M25, and a cylindrical lens CYb are provided. An optical lens system G10 and a photodetector DTS are provided in the scanning unit U1 for detecting the reflected light from the surface to be irradiated on the substrate FS via the polarizing beam splitter BS.

The beam LB1 incident on the scanning unit U1 travels in the -Zt direction and is incident on the reflection mirror M20 which is inclined by 45 占 with respect to the XtYt plane. The axis of the beam LB1 incident on the scanning unit U1 is incident on the reflection mirror M20 so as to be coaxial with the irradiation central axis Le1. The reflecting mirror M20 functions as an incident optical member for causing the beam LB1 to enter the scanning unit U1 and guides the incident beam LB1 toward the reflecting mirror M21 along the optical axis set parallel to the Xt axis Reflect in the -Xt direction. Therefore, the optical axis of the beam LB1 traveling in parallel with the Xt axis is orthogonal to the irradiation central axis Le1 in a plane parallel to the XtZt plane. The beam LB1 reflected by the reflecting mirror M20 is transmitted through the beam expander BE arranged along the optical axis of the beam LB1 traveling parallel to the Xt axis and is incident on the reflecting mirror M21. The beam expander BE enlarges the diameter of the transmitted beam LB1. The beam expander BE has a condenser lens Be1 and a collimator lens Be2 which collimates the beam LB1 converged by the condenser lens Be1 and diverged thereafter.

The reflecting mirror M21 is arranged at an angle of 45 DEG with respect to the YtZt plane, and reflects the incident beam LB1 toward the polarization beam splitter BS in the -Yt direction. The polarized light splitting surface of the polarized beam splitter BS is disposed at an angle of 45 占 with respect to the YtZt plane to reflect a beam of P polarized light and transmit a beam of linearly polarized light (S polarized light) polarized in a direction orthogonal to the P polarized light . Since the beam LB1 incident on the scanning unit U1 is a beam of P polarized light, the polarizing beam splitter BS reflects the beam LB1 from the reflecting mirror M21 in the -Xt direction, .

The reflecting mirror M22 is disposed at an angle of 45 占 with respect to the XtYt plane and reflects the incident beam LB1 toward the reflecting mirror M23 away from the reflecting mirror M22 in the -Zt direction in the -Zt direction. The beam LB1 reflected by the reflection mirror M22 passes through the image shifting optical member SR and the field aperture (field stop) FA along the optical axis parallel to the Zt axis and is reflected by the reflection mirror M23 . The image shift optical member SR two-dimensionally adjusts the center position in the cross section of the beam LB1 within a plane (XtYt plane) orthogonal to the traveling direction of the beam LB1. The image shifting optical member SR is composed of two quartzed parallel plates Sr1 and Sr2 arranged along the optical axis of the beam LB1 running parallel to the Zt axis and the parallel plate Sr1 is composed of the Xt axis And the parallel flat plate Sr2 can be inclined around the Yt axis. The center position of the beam LB1 is smoothed in two dimensions in the XtYt plane orthogonal to the traveling direction of the beam LB1 by inclining the parallel flat plates Sr1 and Sr2 about the Xt axis and the Yt axis, Shift. The parallel flat plates Sr1 and Sr2 are driven by an actuator (driving unit) (not shown) under the control of the control device 18.

The beam LB1 passed through the image shift optical member SR passes through the circular aperture of the field aperture FA and reaches the reflection mirror M23. The circular aperture of the field aperture FA is a diaphragm that cuts off a gentle portion of the intensity distribution in the cross section of the beam LB1 magnified in the beam expander BE. The intensity (luminance) of the spot light SP can be adjusted by using a variable iris diaphragm whose aperture of the circular aperture of the field aperture FA is adjustable.

The reflecting mirror M23 is arranged at an angle of 45 占 with respect to the XtYt plane and reflects the incident beam LB1 in the + Xt direction toward the reflecting mirror M24 away from the reflecting mirror M23 in the + Xt direction. The beam LB1 reflected by the reflection mirror M23 is transmitted through the? / 4 wave plate QW and the cylindrical lens CYa and is incident on the reflection mirror M24. The reflecting mirror M24 reflects the incident beam LB1 toward the polygon mirror (rotating polygon mirror, main scanning deflecting member) PM. The polygon mirror PM reflects the incident beam LB1 in the + Xt direction toward the f? Lens FT having the optical axis AXf parallel to the Xt axis. The polygon mirror PM deflects (reflects) the incident beam LB1 in a plane parallel to the XtYt plane so as to scan the spotlight SP of the beam LB1 on the surface to be irradiated on the substrate FS. More specifically, the polygon mirror PM has a rotation axis AXp extending in the Zt axis direction and a plurality of reflection surfaces RP (eight reflection surfaces RP in the fourth embodiment) formed around the rotation axis AXp )). The reflection angle of the pulse beam LB1 irradiated on the reflection surface RP can be continuously changed by rotating the polygon mirror PM around the rotation axis AXp in the predetermined rotation direction. Thereby, the reflection direction of the beam LB1 is deflected by one reflection surface RP, and the spot light SP of the beam LB1 irradiated onto the surface to be irradiated on the substrate FS is projected in the scanning direction (The width direction of the recording medium FS, the Yt direction).

The spot light SP of the beam LB1 can be scanned along the drawing line SL1 by one reflecting surface RP. The number of imaging lines SL1 in which the spot light SP is scanned on the surface to be irradiated with the substrate FS by one rotation of the polygon mirror PM is the same as the number of the reflective surfaces RP 8. The polygon mirror PM is rotated at a constant speed by a polygon driving unit RM including a motor or the like. The rotation of the polygon mirror PM by the polygon driving unit RM is controlled by the control unit 18. [ As described above, the effective length (for example, 30 mm) of the imaging line SL1 is a length of the maximum scanning length (for example, 31 mm) that allows the spot light SP to be scanned by the polygon mirror PM In the initial setting (design), the center point of the drawing line SL1 (through which the irradiation center axis Le1 passes) is set at the center of the maximum scan length.

As an example, the effective length of the drawing line SL1 is 30 mm, the spot light SP is overlapped with the drawing line SL1 while overlapping the spot lights SP having an effective size of 3 m by 1.5 占 퐉 Therefore, in the case of irradiating onto the surface to be irradiated on the substrate FS, the number of spot lights SP irradiated in a single scanning (the number of pulses of the beam LB from the light source device 14 ') is 20,000 / 1.5 占 퐉). If the scanning time of the spot light SP along the drawing line SL1 is 200 占 퐏 ec then the pulse spot light SP must be irradiated 20,000 times in the meantime so that the light emission frequency Fs Fs > 20000 times / 200 mu sec = 100 MHz.

The cylindrical lens CYa irradiates the incident beam LB1 with respect to the non-scanning direction (Zt direction) perpendicular to the scanning direction (rotating direction) by the polygon mirror PM to the reflecting surface 0.0 > RP). ≪ / RTI > When the reflective surface RP is inclined with respect to the Zt direction (inclination of the reflective surface RP with respect to the normal to the XtYt plane) by the cylindrical lens CYa whose busbars are parallel to the Yt direction, The influence thereof can be suppressed and the irradiation position of the beam LB1 irradiated on the surface to be irradiated on the substrate FS is prevented from shifting in the Xt direction.

The f? Lens FT having the optical axis AXf extending in the Xt axis direction is arranged so that the beam LB1 reflected by the polygon mirror PM is reflected by the reflection mirror (not shown) so as to be parallel to the optical axis AXf in the XtYt plane M25), which is a telecentric scan lens. The incident angle? Of the beam LB1 to the f? Lens FT changes in accordance with the rotation angle? / 2 of the polygon mirror PM. The f? lens FT projects the beam LB1 to an image-height position on the surface to be irradiated of the substrate FS proportional to the incident angle? via the reflecting mirror M25 and the cylindrical lens CYb. When the focal length is f0 and the image height is y, the f? Lens FT is designed to satisfy the relationship of y = f0. Therefore, it is possible to accurately scan the beam LB1 (spot light SP) in the Yt direction (Y direction) at the constant velocity by the f? Lens FT. When the incident angle? to the f? lens FT is 0 degree, the beam LB1 incident on the f? lens FT travels along the optical axis AXf.

The reflecting mirror M25 reflects the incident beam LB1 toward the substrate FS in the -Zt direction through the cylindrical lens CYb. the beam LB1 projected onto the substrate FS is projected onto the substrate FS in the order of several micrometers in diameter on the irradiated surface of the substrate FS by the f.theta. lens FT and the cylindrical lens CYb in which the bus line is parallel to the Yt direction (For example, 3 mu m). The spot light SP projected onto the surface to be processed of the substrate FS is one-dimensionally scanned by the imaging line SL1 extending in the Yt direction by the polygon mirror PM. Further, the optical axis AXf and the irradiation central axis Le1 of the f? Lens FT are on the same plane, and the plane thereof is parallel to the XtZt plane. The beam LB1 that has traveled on the optical axis AXf is reflected in the -Zt direction by the reflecting mirror M25 and is projected on the substrate FS in the same axis as the irradiation central axis Le1. In the fourth embodiment, at least the f? Lens FT functions as a projection optical system for projecting the beam LB1 deflected by the polygon mirror PM onto the surface to be irradiated on the substrate FS. At least the reflecting members (the reflecting mirrors M21 to M25) and the polarizing beam splitter BS function as an optical path deflecting member that bends the optical path of the beam LB1 from the reflecting mirror M20 to the substrate FS do. With this optical path deflecting member, the incidence axis of the beam LB1 incident on the reflection mirror M20 and the irradiation center axis Le1 can be made substantially the same axis. With respect to the XtZt plane, the beam LB1 passing through the scanning unit U1 passes through the substantially U-shaped or U-shaped optical path, and then travels in the -Zt direction and is projected onto the substrate FS.

As described above, in the state in which the substrate FS is transported in the X direction, the spot light SP of the beam LBn is projected in one direction (Y direction) in the scanning direction (Y direction) by each of the scanning units Un (U1 to U6) The spot light SP can be scanned two-dimensionally relative to the surface to be irradiated on the substrate FS. Thus, a predetermined pattern can be drawn and exposed in the exposure area W of the substrate FS.

The photodetector (DTS) has a photoelectric conversion element for photoelectrically converting the incident light. A predetermined reference pattern is formed on the surface of the rotary drum DR. The portion on the rotary drum DR on which the reference pattern is formed is made of a material having a low reflectance (10 to 50%) with respect to the wavelength band of the beam LB1, The other portion is made of a material having a reflectance of 10% or less or a material capable of absorbing light. Therefore, in the region where the reference pattern of the rotary drum DR is formed, in the state in which the substrate FS is not wound (or in a state where the substrate FS passes through the transparent portion of the substrate FS) When the spot light SP is irradiated, the reflected light is reflected by the cylindrical lens CYb, the reflection mirror M25, the f? Lens FT, the polygon mirror PM, the reflection mirror M24, the cylindrical lens CYa and enters the polarization beam splitter BS through the quarter-wave plate QW, the reflection mirror M23, the field aperture FA, the image shift optical member SR, and the reflection mirror M22. Here, a quarter wave plate QW is provided between the polarizing beam splitter BS and the substrate FS, specifically between the reflecting mirror M23 and the cylindrical lens CYa. Thus, the beam LB1 irradiated to the substrate FS is converted into circularly polarized light by the? / 4 wave plate QW from the P polarized light, and the polarized beam splitter BS Is converted into circularly polarized light by circularly polarized light by the? / 4 wave plate QW. Therefore, the reflected light from the substrate FS is transmitted through the polarized beam splitter BS and is incident on the photodetector DTS through the optical lens system G10.

At this time, in a state in which the pulse-like beam LB1 (preferably the beam LB1 derived from the sheath S1) is successively incident on the scanning unit U1, the rotary drum DR is rotated, The spot light SP is two-dimensionally irradiated onto the outer peripheral surface of the rotary drum DR by scanning the spot light SP. Therefore, the image of the reference pattern formed on the rotary drum DR can be acquired by the photodetector DTS. Specifically, in response to a change in the intensity of the photoelectric signal output from the photodetector DTS in response to a clock pulse signal (generated in the light source device 14 ') for pulse light emission of the spotlight SP, Dimensional image data in the Yt direction by digital sampling every time in the sub-scanning direction and further obtains a predetermined distance in the sub-scanning direction (for example, Two-dimensional image information of the surface of the rotary drum DR is obtained by lining the one-dimensional image data in the Yt direction in the Xt direction every 1/2 of the size φ of the spotlight SP. The controller 18 measures the tilt of the drawing line SL1 of the scanning unit U1 based on the acquired two-dimensional image information of the reference pattern of the rotary drum DR. The inclination of the drawing line SL1 may be a relative inclination between the scanning units Un (U1 to U6) or may be a slope (absolute slope) with respect to the central axis AXo of the rotary drum DR. Needless to say, it is also possible to similarly measure the tilt of each of the drawing lines SL2 to SL6.

An origin sensor (origin detector) OP1 is provided around the polygon mirror PM of the scanning unit U1 as shown in Fig. The origin sensor OP1 outputs a pulse-like origin signal SZ indicating the start of scanning of the spot light SP by each reflecting surface RP. The origin sensor OP1 outputs the origin signal SZ when the rotation position of the polygon mirror PM comes to a predetermined position just before the start of scanning of the spot light SP by the reflection surface RP. Since the polygon mirror PM can deflect the beam LB1 projected onto the substrate FS at the scanning angle range? S, the reflection direction (deflection direction) of the beam LB1 reflected by the polygon mirror PM becomes the scanning When the angle range? S is reached, the reflected beam LB1 is incident on the f? Lens FT. The origin sensor OP1 can detect the origin signal SZ when the rotation position of the polygon mirror PM comes to a predetermined position just before the reflecting direction of the beam LB1 reflected by the reflecting surface RP enters the scanning angle range? . In addition, the scanning angle range? S and the maximum scanning rotation angle range? Shown in Fig. 7 have a relationship of? S = 2 占.

Since the polygon mirror PM has eight reflecting surfaces RP, the origin sensor OP1 outputs the origin signal SZ eight times in a period in which the polygon mirror PM makes one rotation. The home position signal SZ detected by the home position sensor OP1 is sent to the control device 18. [ After the origin sensor OP1 outputs the origin signal SZ, the scanning along the drawing line SL1 of the spot light SP is started.

The origin sensor OP1 is a reflection surface RP adjacent to the reflecting surface RP for scanning the spot light SP (deflection of the beam LB1) (hereinafter referred to as a polygon mirror PM (The reflection surface RP in front of the rotation direction of the rotation angle? 1). 29, the reflecting surface RP for deflecting the current beam LB1 is denoted by RPa and the other reflecting surface RP is rotated counterclockwise (Rotation in the direction opposite to the direction of rotation of the polygon mirror PM), and is represented by RPb to RPh.

The origin sensor OP1 includes a light source unit 312 that emits a laser beam Bga of a non-photosensitive wavelength band such as a semiconductor laser and a light source unit 312 that reflects the laser beam Bga from the light source unit 312, And a beam emitting system Opa including mirrors 314 and 316 projecting on the reflecting surface RPb. The origin sensor OP1 includes a light receiving unit 318 and mirrors 320 and 322 for guiding reflected light (reflected beam Bgb) of the laser beam Bga reflected from the reflecting surface RPb to the light receiving unit 318. [ And a lens system 324 for condensing the reflected beam Bgb reflected by the mirror 322 into minute spot light. The light receiving section 318 has a photoelectric conversion element for converting the spot light of the reflected beam Bgb condensed by the lens system 324 into an electric signal. Here, the position where the laser beam Bga is projected on each reflection surface RP of the polygon mirror PM is set to be the pupil plane (position of the focal point) of the lens system 324.

When the rotation position of the polygon mirror PM becomes a predetermined position immediately before the start of the scanning of the spot light SP by the reflection surface RP, the beam transmission system Opa and the beam reception system Opb, And is provided at a position where the beam receiving system Opb can receive the reflected beam Bgb of the laser beam Bga emitted from the beam transmitting system Opa. That is, when the angle of the reflecting surface RP reaches a predetermined angle position, the beam transmitting system Opa and the beam receiving system Opb are arranged so that the reflected beam of the laser beam Bga emitted from the beam transmitting system Opa (Bgb) can be received. Reference numeral Msf in Fig. 29 is a shaft of the rotating motor of the polygon driving unit RM (see Fig. 28) arranged on the same axis as the rotating shaft AXp

In front of the light receiving surface of the photoelectric conversion element in the light receiving portion 318, a light shielding body having a slit opening with a minute width is provided (not shown). The reflected beam Bgb is incident on the lens system 324 while the angular position of the reflecting surface RPb is within the predetermined angular range and the spot beam of the reflected beam Bgb is incident on the light shielding body 318 in the light receiving portion 318. [ In a predetermined direction. The spotlight of the reflected beam Bgb transmitted through the slit opening of the light shielding body is received by the photoelectric conversion element of the light receiving section 318. The light receiving signal is amplified by the amplifier and is converted into the pulse shape origin signal SZ, .

The origin sensor OP1 is configured by using the reflection surface RPb which is one spot ahead of the rotation direction from the reflection surface RPa that deflects the beam LB1 (which scans the spot light SP) And the origin signal SZ is detected. Therefore, when the angle? J formed by the adjacent reflection surfaces RP (for example, the reflection surface RPa and the reflection surface RPb) is equal to the designed value (when the reflection surface RP is eight 135 degrees), there is a case where the timing of generation of the origin signal SZ varies for each reflection plane RP, as shown in Fig. 30, due to the deviation of the error.

In Fig. 30, the origin signal SZ generated by using the reflection surface RPb is referred to as SZb. Likewise, the origin signal SZ generated by using the reflection surfaces RPc, RPd, RPe, ... is denoted by SZc, SZd, SZe, ... . When the angle? J formed by the adjacent reflection surfaces RP of the polygon mirror PM is a designed value, the interval of the generation timing of each origin signal SZ (SZb, SZc, SZd, ...) do. This predetermined time Tpx is a time required for the polygon mirror PM to rotate by one face of the reflection plane RP. 30, the timing of the origin signals SZc and SZd generated by using the reflection surfaces RPc and RPd is determined by the error of the angle? J formed by the reflection surface RP of the polygon mirror PM, Is inconsistent with the timing of generation of the signal. Time intervals Tp1, Tp2, Tp3, ... during which the origin signals (SZb, SZc, SZd, SZe, ...) Is not constant in the order of microseconds due to a manufacturing error of the polygon mirror PM. In the time chart shown in Fig. 30, Tp1 < Tpx, Tp2 > Tpx, and Tp3 < Tpx. When the number of reflection surfaces RP is Np and the rotation speed of the polygon mirror PM is Vp, Tpx is represented by Tpx = 60 / (Np x Vp) [sec]. For example, if Vp is 30,000 rpm and Np is 8, then Tpx is 250 microseconds.

Therefore, the error of the angle? J between the adjacent reflection surfaces RP of the polygon mirror PM makes it possible to detect the position of the substrate FS of the spot light SP to be imaged by each of the reflection surfaces RP (RPa to RPh) (Scanning start point) of the imaging line SL1 on the surface to be imaged of the projection lens SL1 is disturbed in the main scanning direction. As a result, the position of the drawing end point of the drawing line SL1 is also disturbed in the main scanning direction. That is, since the position of the drawing line SL1 of the spot light SP drawn by each reflecting surface RP is shifted along the scanning direction (Y direction), the drawing start point of the drawing line SLn, The position of the end point does not become linear along the X direction. Tp1, Tp2, Tp3, ..., Tp3, Tp3, ..., Tp3, ..., Tp3, ..., Tp3, ..., Tp3, ..., Tp3, ..., = Tpx.

Therefore, in the fourth embodiment, as in the time chart shown in Fig. 30, after the time point Tpx after the generation of one pulse origin signal SZ is set as the imaging start point, the spot light SP is written . That is, the control device 18 controls the beam switching member 20 so that the beam LB1 is incident on the scanning unit U1 after the time Tpx after the origin signal SZ is generated, The drawing bit stream data Sdw of the scanning unit U1 to be scanned from now on, that is, the serial data DL1, is outputted to the driving circuit 206a of one light source device 14 '. As a result, the reflection surface RPb used for detecting the origin signal SZ and the reflection surface RP for actually scanning the spot light SP can be made to have the same reflection surface.

More specifically, the control device 18 controls the optical element AOM1 for selection of the beam switching member 20 after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZb, , A drive signal of a predetermined time (on-time Ton) is output. The predetermined time (on time Ton) during which the optical element for selection AOM1 is turned on is a predetermined time and the spot light SP is reflected by one reflection surface RP of the polygon mirror PM onto the imaging line (Scanning period) which is scanned once along the scanning lines SL1. Then, the control device 18 outputs the serial data DL1 of a certain column, for example, the first column to the drive circuit 206a of the light source device 14 '. Thus, during the scanning time at which the scanning unit U1 scans the spotlight SP, the beam LB1 is incident on the scanning unit U1, so that the scanning unit U1 can detect a specific row (for example, , The first column) of the serial data DL1. As described above, since the scanning unit U1 scans the spotlight SP after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZb, Scanning of the spot light SP due to the origin signal SZb can be performed on the reflection surface RPb used for detection.

Next, the control device 18 causes the optical element AOM1 for selection of the beam switching member 20 to be turned on, after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZd, And outputs a drive signal of a predetermined time (on-time Ton) ON. Then, the control device 18 outputs the next row, for example, the second-row serial data DL1 to the drive circuit 206a of the light source device 14 '. Thereby, during the time including the time required for the scanning unit U1 to perform the scanning of the spot light SP, the beam LB1 enters the scanning unit U1, so that the scanning unit U1 moves to the next column (For example, the second column) of the serial data DL1. Since the scanning unit U1 scans the spotlight SP after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZd, It is possible to perform scanning of the spot light SP due to the origin signal SZd at the reflection surface RPb used for detection of the origin signal SZd. When the scanning of the spot light SP is performed on one plane skipping rather than on each reflection plane RP of the polygon mirror PM, the origin signal SZ is skipped one by one Filtering) is performed. The reason for the rendering operation by such one skip will be described in detail below.

In this way, the controller 18 controls the scanning unit U1 to scan the spotlight SP after the time Tpx after the origin sensor OP1 of the scanning unit U1 outputs the origin signal SZ Controls the beam switching member 20 and outputs the serial data DL1 to the driving circuit 206a of the light source device 14 '. The control unit 18 reads out the column of serial data DL1 to be output each time the scanning by the scanning unit U1 is started in the first column, the second column, the third column, the fourth column, As shown in Fig. The scanning of the spot light SP by the other scanning unit Un (the scanning units U2 to U6) is performed during the period from one scanning to the next scanning of the spot light SP by the scanning unit U1 In order. The scanning of the spot light SP by the other scanning units Un (U2 to U6) is the same as the scanning of the scanning unit U1. In addition, the origin sensors OPn (OP1 to OP6) are provided for each of the scanning units Un (U1 to U6).

As described above, the spot light SP is scanned by using the reflection surface RP used for detecting the origin signal SZb of the scanning unit U1, The imaging start point and the imaging end point of the irradiated surface of the substrate FS of the spot light SP to be imaged by each of the reflective surfaces RP (RPa to RPh) Can be prevented from being disturbed in the main scanning direction.

In order to do so, it is necessary to rotate the polygon mirror PM at a constant speed, that is, the speed of the polygon mirror PM uniformly and precisely at a constant speed in the order of μsec. When the polygon mirror PM is rotated precisely at such a constant speed, the reflecting surface RP used for generating the origin signal SZ always rotates by exactly 45 degrees after the time Tpx, and the beam LB1 and is reflected toward the f? lens FT. Therefore, the rotation uniformity of the polygon mirror PM is increased, and the velocity non-uniformity during one rotation is minimized. Therefore, the position of the reflection surface RP used for generation of the origin signal SZ and the beam LB1 are deflected, The position of the reflecting surface RP used for scanning the scanning surface SP can be changed. In other words, since the generation timing of the origin signal SZ is delayed by the time Tpx, the operation equivalent to the detection of the origin signal SZ using the reflection surface RP for scanning the spot light SP I have. As a result, the degree of freedom of arrangement of the origin sensor OP1 (OPn) is improved, and a home sensor having a high rigidity and a stable configuration can be provided. The reflection surface RP to be detected by the origin sensor OP1 (OPn) is one in the rotational direction of the reflecting surface RP for deflecting the beam LB1 (LBn), but the polygon mirror PM ), And is not limited to one. In this case, when the reflection surface RP to be detected by the origin sensor OP is moved forward by n (an integer of 1 or more) in the rotation direction of the reflecting surface RP for deflecting the beam LB1 (LBn) , And the drawing start point may be set after n x time Tpx after origin of the origin signal SZ.

Further, for each of the origin signals SZb, SZd, ... occurring every other one from the origin sensor OP1 (OPn), the rendering start time is set to be after n times the time Tpx, There is a margin in the processing time for a read operation, a data transfer (communication) operation, or a correction calculation for one pixel data string. As a result, it is possible to reliably avoid a transmission error of the pixel data string and a partial loss of the pixel data string.

29, the reflection surface RP adjacent to the reflection surface RP for scanning the spot light SP (deflection of the beam LB1) (in the present embodiment, (The deflection of the beam LB1) of the spot light SP without providing the origin sensor OPn for detecting the origin sensor OPn for detecting the reflection surface RP of the spot PM It is also possible to provide an origin sensor for detecting the same reflection surface RP as the slope RP. 30, the time interval of the origin signal (pulse shape) SZ generated for each of the reflection surfaces RPa to RPh of the polygon mirror PM is disturbed, so that the reflection surfaces RPa to RPh ), It is necessary to add a time offset according to the deviation.

7, when the number Np of reflecting surfaces RP of the polygon mirror PM is 8 and the maximum scanning rotation angle range? Is 15 degrees, the scanning efficiency? /? Is 1/3 . For example, the beam LBn is distributed to the two scanning units Un other than the scanning unit U1 until the next time the scanning unit U1 scans the spot light SP and then performs the next scanning , And the spot light SP can be scanned. That is, while the polygon mirror PM of the scanning unit U1 rotates by one face, the corresponding beam LBn is distributed to each of the three scanning units Un including the scanning unit U1, It is possible to perform scanning of the light SP.

However, since the scanning efficiency of the polygon mirror PM is 1/3, when each of the scanning units Un scans the spot light SP with the maximum scanning rotation angle range? (15 degrees), the scanning unit U1 (U2 to U6) other than the scanning unit U1 while the polygon mirror PM of the scanning unit U1 rotates one part (? = 45 degrees) of the reflecting surface RP. ). That is to say, in the period from the start of the scanning of the spot light SP of the scanning unit U1 to the start of the scanning of the next spot light SP, the beam LBn is scanned by three or more scanning Can not be distributed to the units Un (U2 to U6). Thus, in the period from the start of scanning by the spot light SP of the scanning unit U1 to the start of the next scanning, the beam LBn is distributed to each of the other five scanning units Un (U2 to U6) In order to perform scanning with the spot light SP, the following method can be considered.

The scanning rotation angle range? 'Of the polygon mirror PM actually capable of scanning the spot light SP can be made smaller than the maximum scanning rotation angle range? (? = 15 degrees) even when the maximum scanning rotation angle range? Setting. Specifically, while each of the polygon mirrors PM of the scanning units Un (U1 to U6) is rotated for one plane (? = 45 degrees) of the reflection plane RP, the beam LBn Since the number of units Un is six, the scanning rotation angle range? 'Is?' = 45/6 = 7.5 degrees. That is, the deviation angle with respect to the optical axis AXf of the beam LBn incident on the f? Lens FT in Fig. 28 is limited to 占 7.5. Thereby, the beam LBn is guided to the six scanning units Un (U1 (U1)) while the polygon mirror PM of each scanning unit (Un) rotates by 45 degrees To U6), and the scanning units Un (U1 to U6) can sequentially perform scanning with the spot light SP. However, in this case, the scan rotation angle range? 'At which the spot light SP is actually scanned becomes too small, and the maximum scan range length in which the spot light SP is scanned, that is, the maximum scan length of the drawing line SLn Is too short. To avoid such a problem, an f.theta. Lens FT having a long focal length is prepared so as not to change the maximum scanning length at which the spot light SP is scanned, and the f.theta. Lens FT (Operation distance) of the first and second drive wheels is set longer. In this case, there is a concern that the f.theta. Lens FT is increased in size and the size of the scanning units Un (U1 to U6) is increased in the Xt direction, and the stability of beam scanning is lowered due to the longer working distance .

On the other hand, it is conceivable to reduce the number of reflection surfaces RP of the polygon mirror PM and to increase the rotation angle? At which the polygon mirror PM rotates by one side of the reflection surface RP. In this case, the polygon mirror PM of the scanning units Un (U1 to U6) is prevented from being reflected by the reflecting surface (U1 to U6) while suppressing the drawing line SLn becoming short or the scanning units Un RP), the six scanning units Un (U1 to U6) can sequentially scan the spot light SP while the beam LBn is being distributed. For example, when the number of reflecting surfaces RP of the polygon mirror PM is set to four, that is, when the shape of the polygon mirror PM is a square, the reflecting surface RP of the polygon mirror PM, The rotation angle? For rotating this one face becomes 90 degrees. Therefore, while the polygon mirror PM of the scanning unit U1 rotates one face of the reflecting surface RP, the beam LBn is distributed to the six scanning units Un (U1 to U6) The scanning rotation angle range? 'Of the polygon mirror PM capable of actually scanning the spot light SP becomes?' = 90/6 = 15 degrees and the maximum scanning rotation angle range? Lt; / RTI >

However, when the polygon mirror PM having a small polygon mirror PM having a small number of reflection surfaces Np such as a triangle or a square is rotated at a high speed, the air resistance (wind loss) becomes too large and the rotational speed and the number of revolutions decrease . For example, even if it is desired to rotate the polygon mirror PM at a high rotation speed of several tens of thousands of rpm (rotation per minute), the rotation speed is reduced by about 2 to 3% due to the air resistance, none. A method of increasing the size of the outer shape of the polygon mirror PM is also conceivable. However, the weight of the polygon mirror PM becomes too large, and a desired high rotation speed and high rotation speed can not be obtained. As a method for reducing the windage during rotation even when the number of reflection surfaces Np of the polygon mirror PM is reduced, the entire polygon mirror PM may be provided in a vacuum environment or in an environment of a gas (helium or the like) You can also think of installing. In this case, airtight structures for forming such an environment are provided around the polygon mirror PM, leading to enlargement of the scanning units Un (U1 to U6).

Thus, in the fourth embodiment, a polygon mirror (PM) capable of actually scanning the spot light SP is used while using a polygon mirror PM having a relatively large number of reflection surfaces Np, that is, Of the polygon mirror PM for scanning the spot light SP (deflection of the beam LBn) while setting the scanning rotation angle range? 'Of the spot light SP to a maximum scanning rotation angle range? (? = 15 degrees) 0.0 > RP) < / RTI > That is, the scanning of the spot light SP by each of the scanning units Un (U1 to U6) is repeated every one side of the reflecting surface RP of the polygon mirror PM (one side skipping). Therefore, during the period from the scanning of the spot light SP to the next scanning, the scanning units U2 to U6 other than the scanning unit U1 sequentially transmit the beams LB2- LB6 can be distributed and the spot light SP can be scanned. That is, while the polygon mirror PM of one scanning unit Un, which is one of the six scanning units Un (U1 to U6), rotates in two circles, the scanning units Un (U1 to U6) All of the six scanning units Un (U1 to U6) can perform scanning of the spot light SP by distributing the beams LB1 to LB6 to the respective scanning units Un (U1 to U6). In this case, until the respective scanning units Un (U1 to U6) start scanning of the spot light SP and then start scanning of the next spot light SP, the polygon mirror PM is divided into two portions 90 . In order to perform such a drawing operation, the polygon mirrors PM of the six scanning units Un (U1 to U6) are synchronously controlled so as to have the same rotational speed, and the reflection surfaces of the polygon mirrors PM RP are synchronously controlled so as to have a predetermined phase relationship with each other.

Further, since one reflection plane RP of the polygon mirror PM for scanning the spot light SP (deflection of the beam LBn) is formed by one plane, the polygon of each of the scanning units Un (U1 to U6) While the mirror PM makes one rotation, the number of scanning of the spot light SP corresponding to each of the rendering lines SLn (SL1 to SL6) is four. Therefore, in the case where the scanning of the spot light SP (deflection of the beam LBn) is repeated every polygon mirror PM on the continuous reflecting surface RP, that is, when each polygon mirror PM RP), the number of the drawing lines SLn is halved, so that the conveying speed of the substrate FS is also preferably reduced to half. The rotation speed of the polygon mirror PM of each of the scanning units Un (U1 to U6) and the oscillation frequency Fs are doubled when the conveyance speed of the substrate FS is not desired to be halved. For example, when the rotation speed of the polygon mirror PM when the polygon mirror PM repeats the scanning of the spot light SP (deflection of the beam LBn) for each successive reflecting surface RP is 20,000 rpm (The beam LBn) of the spot light SP is detected for each one-side reflections RP of the polygon mirror PM when the oscillation frequency Fs of the beam LB from the light source device 14 'is 200 MHz. The rotation speed of the polygon mirror PM is set to 40,000 rpm and the oscillation frequency Fs of the beam LB from the light source device 14 'is set to 400 MHz.

Here, the control device 18 manages which scanning unit Un among the plurality of scanning units Un (U1 to U6) scans the spotlight SP based on the origin signal SZ . However, the origin sensor OPn of each of the scanning units Un (U1 to U6) generates the origin signal SZ when each of the reflection planes RP becomes a predetermined angular position, The control device 18 judges that each of the scanning units Un (U1 to U6) scans the spot light SP for each successive reflecting surface RP. Therefore, the beam LBn can not be distributed to the other five scanning units Un until one scanning unit Un scans the spot light SP and then performs the next scanning. Therefore, in order to set every reflection surface RP of the polygon mirror PM for scanning the spot light SP, the minor point signal (minor point pulse signal) ZP (ZP) obtained by subtracting the origin signal SZ ). ≪ / RTI > Further, as described above, the origin signal SZ is detected using the reflection surface RP immediately preceding the rotation direction of the reflection surface RP for scanning (deflecting) the spot light SP Therefore, it is necessary to generate the minor point signal ZP in which the timing of generation of the origin signal SZ is delayed by time Tpx. Hereinafter, the configuration of the minor point generation circuit CA for generating the minor point signal ZP will be described.

31 is a configuration diagram of a minor point generation circuit CA for generating a minor point signal ZP in which the origin signal SZ is subtracted and the generation timing thereof is delayed by time Tpx. And is a diagram showing a time chart of the minor point signal ZP generated by the circuit CA. This minor point generation circuit (CA) has a frequency divider (330) and a delay circuit (332). The frequency divider 330 divides the frequency of the generation timing of the origin signal SZ by 1/2 and outputs it to the delay circuit 332 as the origin signal SZ '. The delay circuit 332 delays the sent origin signal SZ 'by time Tpx and outputs it as the minor point signal ZP. The minor point generation circuits CA are provided in a plurality corresponding to the origin sensors OPn of the respective scanning units Un (U1 to U6).

In addition, the minority point generation circuit CA corresponding to the origin sensor OPn of the scanning unit Un may be denoted by CAn. That is, the minority point generation circuit CA corresponding to the origin sensor OP1 of the scanning unit U1 is denoted by CA1 and the minority point generation circuit CA corresponding to the origin sensors OP2 to OP6 of the scanning units U2 to U6 (CA) may be denoted by CA2 to CA6. The origin signal SZ output from the origin sensor OPn of the scanning unit Un may be represented by SZn. The origin signal SZ output from the origin sensor OP1 of the scanning unit U1 is denoted by SZ1 and the origin signal SZ output from the origin sensors OP2 to OP6 of the scanning units U2 to U6 is denoted by SZ1 SZ2 to SZ6. The origin signal SZ 'and the minor point signal ZP generated based on the origin signal SZn may be represented by SZn' and ZPn. That is, the origin signal SZ 'and the minor point signal ZP generated based on the origin signal SZ1 are denoted by SZ1' and ZP1, and the origin signal SZ (Z) generated based on the origin signals SZ2 to SZ6 ), And the minor point signal ZP may be represented by SZ2 'to SZ6' and ZP2 to ZP6.

Fig. 33 is a block diagram showing an electrical configuration of the exposure apparatus EX. Fig. 34 shows timing of outputting the origin signals SZ1 to SZ6, the minor point signals ZP1 to ZP6 and the serial data DL1 to DL6 It is a time chart. The control device 18 of the exposure apparatus EX includes a rotation control section 350, a beam switching control section 352, a drawing data output control section 354 and an exposure control section 356. [ The exposure apparatus EX also includes motor drive circuits Drm1 to Drm6 for driving the polygon drive unit RM including the motors of the scan units Un (U1 to U6).

The rotation control unit 350 controls the rotation of the polygon mirror PM of each of the scan units Un (U1 to U6) by controlling the motor drive circuits Drm1 to Drm6. The rotation control unit 350 controls the motor driving circuits Drm1 to Drm6 so that the rotation angle positions of the polygon mirror PM of the plurality of scanning units Un (U1 to U6) And the polygon mirror PM of the scanning units Un (U1 to U6) of the scanning unit Un (U1 to U6). Specifically, the rotation control unit 350 controls the rotation of the polygon mirror PM so that the rotation speed (rotation number) of the polygon mirror PM of the plurality of scanning units U1 to U6 is equal to each other and the phase of the rotation angle position is shifted by a predetermined angle, And controls the rotation of the polygon mirror PM of the plurality of scanning units Un (U1 to U6). Reference signs PD1 to PD6 in Fig. 33 indicate control signals output from the rotation control section 350 to the motor drive circuits Drm1 to Drm6.

In the fourth embodiment, the rotational speed Vp of the polygon mirror PM is set at 3.9 million rpm (650 rps). Since the number of reflection surfaces Np is set to 8, the scanning efficiency (alpha / beta) is set to 1/3, and the reflection surface RP for scanning the spot light SP is set to one side, The phase difference of the rotational angle position is set to the maximum scanning rotational angle range?, That is, 15 degrees. The scanning of the spot light SP is performed by U1? U2? → U6 in this order. Therefore, the rotation control unit 350 controls the rotation of the polygon mirror PM of each of the six scanning units U1 to U6 such that the phases of the rotation angular positions of the polygon mirrors PM are shifted by 15 degrees at a constant speed. Thus, the shift of the phase of the rotation angle position between the scanning unit U1 and the scanning unit U4 is 45 degrees corresponding to the rotation angle of exactly one surface. Therefore, the phases of the rotational angular positions of the scanning unit U1 and the scanning unit U4, that is, the origin timing of the origin signals SZ1 and SZ4 may coincide with each other. Similarly, since the rotation angular positions of the scanning unit U2 and the scanning unit U5 and the phase deviations of the rotational angular positions of the scanning unit U3 and the scanning unit U6 are all 45 degrees, The origin timing of the origin signals SZ2 and SZ5 from each of the units U5 and the origin timing of the origin signals SZ3 and SZ6 from the scanning units U3 and U6 coincide on the time axis do.

More specifically, the rotation control unit 350 controls the rotation of the polygon mirror PM of the scanning unit U1 and the scanning unit U4, the rotation of the polygon mirror PM of the scanning unit U2 and the scanning unit U5, And the rotation of the polygon mirror PM of each of the scanning units U1 to U6 is controlled so that each rotation of the polygon mirror PM of the scanning unit U3 and the scanning unit U6 becomes the first control state, Are controlled via the circuits Drm1 to Drm6. This first control state is a state in which the phase difference of the main pulse signal outputted every time the polygon mirror PM makes one revolution is 0 (zero). That is to say, the scanning unit U1 and the scanning unit U4 are controlled so that the phase difference of the main pulse signal outputted every time the polygon mirror PM of the scanning unit U1 and the scanning unit U4 makes one rotation is zero The rotation of the polygon mirror PM of the polygon mirror PM is controlled. Similarly, when the phase difference of the main pulse signal outputted every time the polygon mirror PM of the scanning unit U2, the scanning unit U5, the scanning unit U3 and the scanning unit U6 makes one rotation is 0 (zero) And controls the rotation of the scanning unit U2 and the scanning unit U5 and the rotation of the polygon mirror PM of the scanning unit U3 and the scanning unit U6.

The main pulse signal may be a signal that is output once every time the origin signal SZn of the scanning unit Un is output eight times by a not-shown frequency divider. The main pulse signal may be a signal output from an encoder (not shown) provided in the polygon drive unit RM of each of the scan units Un (U1 to U6). A sensor for detecting the main pulse signal may be provided in the vicinity of the polygon mirror PM. In the example shown in Fig. 34, the main pulse signal is generated once every time the origin signal SZn of the scanning unit Un is output eight times, and the origin signal ( SZn are shown by dotted lines. The origin signal SZ1 and the origin signal SZ4 are set such that an error of an angle? J formed between the adjacent reflection surfaces RP (for example, the reflection surface RPa and the reflection surface RPb) (See FIG. 29) are not considered, the phases coincide on the time axis. Likewise, the respective origin signal SZ2, the origin signal SZ5, the origin signal SZ3 and the origin signal SZ6 are set such that the error of the angle? J between the adjacent reflection surfaces RP 29), the phase coincides with each other on the time axis. In Fig. 34, for ease of explanation, it is assumed that there is no error between angles? J formed between adjacent reflection surfaces RP.

The rotation control unit 350 controls the rotation angle position of the polygon mirror PM of the scanning units U1 and U4 and the polygon mirror PM of the scanning units U2 and U5 while maintaining the first control state, The rotation of the polygon mirror PM of the scanning units U2 and U5 is controlled so that the phase of the rotation angle position of the scanning units U2 and U5 is shifted by 15 degrees. Likewise, while maintaining the first control state, the rotation control unit 350 sets the rotation angle position of the polygon mirror PM of the scanning units U3 and U6 to the rotation angle position of the polygon mirror PM of the scanning units U1 and U4 The rotation of the scanning units U3 and U6 is controlled so that the phase of the rotation angle position is shifted by 30 degrees. The time for which the polygon mirror PM is rotated by 15 degrees (the maximum scanning time of the beam LBn) is Ts.

Specifically, the rotation control unit 350 controls the rotation unit 350 so that the main pulse signal obtained by the scanning units U2 and U5 is delayed by time Ts for the main pulse signal obtained by the scanning units U1 and U4 U2, and U5 (refer to FIG. 34). Likewise, the rotation control section 350 controls the rotation unit 350 so that the main pulse signal obtained by the scanning units U3 and U6 is delayed by time 2 占 퐏 for the main pulse signal obtained by the scanning units U1 and U4, U3, U6) (see Fig. 34). Assuming that the rotation speed Vp of the polygon mirror PM is 380,000 rpm (650 rps), the time Ts is Ts = [1 / (Vp x Np) x (? /?) = 1 / (650 x 8 x 3) (About 64.1 microseconds). By controlling the rotation of the polygon mirror PM of each of the scanning units U1 to U6 in this manner, U1 - > U2 - > → U6, the scanning units U1 to U6 can perform the scanning of the spot light SP in a time-division manner.

The beam switching control section 352 controls the optical elements for selection (AOMn (AOM1 to AOM6)) of the beam switching member 20 so that one scanning unit Un starts scanning, And distributes the beam LB from the light source device 14 'to the six scanning units Un (U1 to U6). Therefore, the beam switching control section 352 controls the beam switching control section 352 such that the scanning (deflection) of the beam LBn of the polygon mirror PM of each of the scanning units Un (U1 to U6) Any one of the beams LB1 to LB6 generated from the beam LB by the optical elements for selection AOM1 to AOM6 is time-divided into the respective scanning units Un (U1 to U6) To enter.

More specifically, the beam switching control section 352 generates a minor point signal ZPn (ZP1 to ZP6) based on the origin signal SZn (SZ1 to SZ6) (CAn (CA1 to CA6)). When the minor point signals ZPn (ZP1 to ZP6) are generated by the minor point generation circuits CAn (CA1 to CA6), the scanning unit Un (ZP1 to ZP6) resulting from generation of the minor point signals ZPn (AOMn (AOM1 to AOM6)) corresponding to the selected optical elements (U1 to U6) are turned on for a predetermined time (ON time Ton). For example, when the minor point signal ZP1 is generated, the optical element for selection AOM1 corresponding to the scanning unit U1 resulting from the generation of the minor point signal ZP1 is turned on for a predetermined period of time Ton do. This minor point signal ZPn is generated based on the origin signal SZn output from the origin sensor OPn and is obtained by dividing the frequency of the origin signal SZn by 1/2, And is delayed by the time Tpx. This predetermined time period (on time Ton) is a period from the time point when the minor point signal ZPn is generated to the point when the minor point signal ZPn is generated from the next scanning unit Un to be scanned, that is, PM correspond to the time Ts necessary for rotation by 15 degrees. When the ON time Ton of the optical element for selection AOMn is set to be longer than the time Ts, there arises a period in which two of the selection optical elements AOMn are simultaneously turned on, and the imaging operation by the spotlight SP must be performed The beams LB1 to LB6 can not be correctly introduced into the scanning unit Un. Therefore, the on time Ton is set to Ton? Ts.

At this time, the origin signal SZ1 and the origin signal SZ4 are set such that the error of the angle? J formed between the adjacent reflection surfaces RP (for example, the reflection surface RPa and the reflection surface RPb) The phases of the minor point signal ZP1 and the minor point signal ZP4 are set to be shifted by about half a period (see FIG. 34). The deviation of the phases of the minor point signal ZP1 and the minor point signal ZP4 about half a period is performed by the frequency divider 330 of the minority point generating circuits CAn (CA1 to CA6). That is, the frequency divider 330 delays the timing of pulling out the origin signal SZ1 and the timing of pulling out the origin signal SZ4 by almost half a period.

The relationship between the minor point signal ZP2 and the minor point signal ZP5 is also set so that the phases of the minor point signal ZP2 and the minor point signal ZP5 are shifted by about half a period 34). The relationship between the minor point signal ZP3 and the minor point signal ZP6 is also set so that the phases of the minor point signal ZP3 and the minor point signal ZP6 are shifted by about half a period (See FIG. 34).

Therefore, as shown in Fig. 34, the generation timings of the minor point signals ZP1 to ZP6 generated for each of the scanning units U1 to U6 are shifted by time Ts. In the fourth embodiment, the order of the scanning unit (Un) for scanning the spot light (SP) is U1 → U2 → → U6 so that the minor point signal ZPn also changes from ZP1 to ZP2 to ZP2 in a state in which the minor point signal ZP2 is generated after the time Ts from the generation of the minor point signal ZP1. → ZP6 in the order of time Ts. The beam switching control section 352 controls the optical elements for selection (AOMn (AOM1 to AOM6)) of the beam switching member 20 according to the generated minor point signals ZPn (ZP1 to ZP6) ... The corresponding beams LB1 to LB6 can be incident on each of the scanning units Un in the order of? That is, the scanning (deflection) of the beam LBn by the polygon mirror PM of each of the scanning units Un (U1 to U6) is adjusted so that the scanning (deflection) of each polygon mirror PM is repeated for each one- It is possible to switch the beam LBn incident on the scanning units Un (U1 to U6) to time division.

The rendering data output control unit 354 reads the serial data DLn of one column corresponding to the pattern of one rendering line SLn scanned by the scan unit Un with the rendering bit stream data Sdw, To the driving circuit 206a of the light source device 14 '. The order of the scanning unit Un for scanning the spot light SP is U1? U2? → U6, the drawing data output control unit 354 determines that the serial data DLn for one column is DL1? DL2? To DL6 in the order of the drawing bit stream data Sdw.

The configuration of the rendering data output control section 354 will be described in detail with reference to FIG. The rendering data output control section 354 has six generation circuits 360, 362, 364, 366, 368 and 370 corresponding to each of the scanning units U1 to U6 and an OR circuit GT8. More specifically, the generating circuit 360 includes a memory section BM1, a counter section CN1 and a gate section GT1, and the generating circuit 362 Includes a memory unit BM2, a counter unit CN2, and a gate unit GT2. The generation circuit 364 includes a memory unit BM4, a counter unit CN4, and a gate unit GT4. The memory unit BM3 includes a memory unit BM3, a counter unit CN3, and a gate unit GT3. Respectively. The generating circuit 368 includes a memory unit BM5, a counter unit CN5 and a gate unit GT5. The generating circuit 370 includes a memory unit BM6, a counter unit CN6, and a gate unit GT6. Respectively. The configuration of these generation circuits 360 to 370 may be the same as that of the generation circuits 301, 303, and 305 shown in Fig.

The memory units BM1 to BM6 are memories for storing pattern data (bitmaps) in accordance with a pattern to be drawn and exposed by each of the scanning units Un (U1 to U6). The counter units CN1 to CN6 store the serial data DL1 to DL6 for one drawing line SLn to be drawn next among the pattern data stored in the memory units BM1 to BM6, (CLK). 34, after the minor point signals ZP1 to ZP6 are outputted from the minority point generation circuits CA1 to CA6 of the beam switching control section 352, the counter sections CN1 to CN6 output one serial And outputs data DL1 to DL6.

The pattern data stored in the memory units BM1 to BM6 are shifted in the column direction by serial data DL1 to DL6 outputted by an address counter or the like (not shown). That is, the column to be read by the address counter (not shown) is the first column, the second column, the third column, As shown in FIG. The shift is performed by outputting all of the serial data DL1 if the memory unit BM1 corresponding to the scanning unit U1, for example, and then outputting a minor point signal (corresponding to the scanning unit U2 to be scanned next) ZP2) is generated. Similarly, the shift of the serial data DL2 of the pattern data stored in the memory unit BM2 is performed after the serial data DL2 are all output, ZP3) is generated. Similarly, the shift of the serial data DL3 to DL6 of the pattern data stored in the memory units BM3 to BM6 is performed after the serial data DL3 to DL6 are all output and then the scanning units U4 to U6 Are generated at the timing at which the minor point signals ZP4 to ZP6, ZP1 corresponding to the sub-point signals U1 to U1 are generated. In addition, the scanning of the spot light SP is performed in the order of U1? U2? U3? → U6.

In this manner, serial data DL1 to DL6 to be sequentially output are sequentially input to the six input terminals GT1 to GT6 via the gate portions GT1 to GT6 opened during a predetermined time (on time Ton) after the minor point signals ZP1 to ZP6 are applied. To the OR circuit GT8. The OR circuit GT8 outputs the serial data DL1? DL2? DL3? DL4? DL5? DL6? DL1 ... To the driving circuit 206a of the light source device 14 'as the rendering bit stream data Sdw. In this manner, each of the scanning units Un (U1 to U6) can perform drawing of the spot light SP, and simultaneously draw and expose a pattern corresponding to the pattern data.

In the fourth embodiment, pattern data is prepared for each of the scanning units Un (U1 to U6), and pattern data for each of the scanning units Un (U1 to U6) The serial data DL1 to DL6 are outputted in accordance with the order of the unit Un. However, since the order of the scanning unit Un for scanning the spot light SP is determined in advance, the serial data DL1 to DL6 of the pattern data of the scanning units Un (U1 to U6) Pattern data may be prepared. That is to say, the serial data DLn (DL1 to DL6) of each column of the pattern data of the respective scanning units Un (U1 to U6) are arrayed in the order of the scanning unit Un for scanning the spot light SP Pattern data may be constructed. In this case, the serial data DLn of one pattern data is set to 1 (zero) in accordance with the minor point signals ZPn (ZP1 to ZP6) based on the origin sensor OPn of each of the scanning units Un (U1 to U6) You can print them in order from the tenth.

The exposure control unit 356 shown in Fig. 33 controls the rotation control unit 350, the beam switching control unit 352, the drawing data output control unit 354, and the like. The exposure control section 356 analyzes the image pickup signals ig (ig1 to ig4) captured by the alignment microscopes AMm (AM1 to AM4) and detects the position of the alignment marks MKm (MK1 to MK4) on the substrate FS . The exposure control unit 356 detects (determines) the start position of the imaging exposure of the exposure area W on the substrate FS based on the position of the detected alignment mark MKm (MK1 to MK4) . The exposure control unit 356 includes a counter circuit 356a and the counter circuit 356a counts the detection signals detected by the encoders EN1a to EN3a and EN1b to EN3b shown in Fig. The exposure control unit 356 compares the count value (mark detection position) based on the encoders EN1a and EN1b when the start position of the imaging exposure is detected and the count value based on the encoders EN2a and EN2b SL3, and SL5 based on the positions of the lines SL1, SL2, SL3, and SLn. The exposure control unit 356 controls the drawing data output control unit 354 so that the scan units U1, U3, and U5 are provided with a spot on the spot The scanning of the light SP is started. The rotation control unit 350 and the beam switching control unit 352 are controlled by the exposure control unit 356 to control each of the scanning units Un ((ZP1 to ZP6)) based on the main pulse signal and the minor point signals ZPn U1 to U6) of the polygon mirror PM and the beam LBn by the beam switching member 20 are controlled.

The exposure control section 356 compares the count value (mark detection position) based on the encoders EN1a and EN1b when the start position of the imaging exposure is detected and the count value based on the encoders EN3a and EN3b SL4, and SL6 on the basis of the positions of the lines SL1, SL2, SL3, and SL4. The exposure control unit 356 controls the drawing data output control unit 354 to control the scanning units U2, U4, and U6 to determine whether the start position of the imaging exposure is located on the drawing lines SL2, SL4, The scanning of the spot light SP is started.

As shown in Fig. 25 described above, the imaging exposure in each of the imaging lines SL1, SL3, SL5 precedes the imaging exposure in the transport direction (+ X direction) of the substrate FS, , And then the imaging exposure is performed in each of the imaging lines SL2, SL4, and SL6. On the other hand, since the respective polygon mirrors PM of the six scanning units U1 to U6 are rotated and controlled to maintain a constant angular phase with respect to each other, the minor point signals ZP1 to ZP6 are generated by the sequential time Ts It continues to occur with a phase difference. Therefore, even from the start of the drawing exposure in the drawing lines SL1, SL3, and SL5 until just before the start of the drawing exposure in the drawing lines SL2, SL4, and SL6, the minor point signals ZP2 and ZP4 The gate portions GT2, GT4 and GT6 in Fig. 35 are opened by the light valves ZP1 and ZP6 and the selection optical elements AOM2, AOM4 and AOM6 are repeatedly turned on for a predetermined time Ton. 33, in the beam switching control section 352, there are provided, based on the count value of the encoders EN1a and EN1b determined in the exposure control section 356 or the count values of the encoders EN2a and EN2b It is preferable to provide a selection gate circuit for selecting whether or not to transmit each of the generated minor point signals ZP1 to ZP6 to the rendering data output control section 354 or not. Each of the driver circuits DRVn (DRV1 to DRV6) (see FIG. 38) of the optical elements AOM1 to AOM6 corresponding to the scanning units U1 to U6 is also supplied with the selection gate circuit It is preferable to give the minor point signals ZP1 to ZP6.

As described above, since the drawing lines SL1, SL3, and SL5 are located on the upstream side of the drawing direction of the substrate FS with respect to the drawing lines SL2, SL4, and SL6, SL3, and SL5, and then reaches the drawing lines SL2, SL4, and SL6 for a predetermined time thereafter. Therefore, until the start position of the drawing exposure reaches the drawing lines SL2, SL4, and SL6, the pattern drawing exposure is performed only with the scanning units U1, U3, and U5. Therefore, in the case where the selection gate circuit of the minor point signals ZP1 to ZP6 as described above is not provided in the beam switching control section 352, the exposure control section 356 outputs to the driving circuit 206a of the light source device 14 ' U4, and U6 by substantially all of the pixel data of the portion corresponding to the serial data DL2, DL4, and DL6 among the rendering bit stream data Sdw, The exposure is canceled. During the cancel period, the columns of the serial data DL2, DL4, and DL6 output from the memory units BM2, BM4, and BM6 are not shifted but remain in the first column. After the start position of the imaging exposure of the exposure area W reaches the drawing lines SL2, SL4 and SL6, the output of the serial data DL2, DL4 and DL6 is started and the serial data DL2, DL4, DL6 are shifted in the column direction.

Likewise, the end position of the imaging exposure of the exposure area W reaches the drawing lines SL1, SL3, and SL5 first, and then reaches the drawing lines SL2, SL4, and SL6 for a predetermined time thereafter . Therefore, until the end position of the drawing exposure reaches the drawing lines SL1, SL3, and SL5 and then reaches the drawing lines SL2, SL4, and SL6, only the scanning units U2, U4, So that the imaging exposure is performed. Thus, in the case where the selection gate circuit of the minor point signals ZP1 to ZP6 as described above is not provided in the beam switching control section 352, the exposure control section 356 is connected to the driving circuit 206a of the light source device 14 ' U3, and U5 by substantially all of the pixel data of the portion corresponding to the serial data DL1, DL3, and DL5 among the rendering bit stream data Sdw to be output The painting exposure is canceled. If the selection gate circuit is not provided, even if the imaging exposure is canceled, the selection optical system is controlled such that the beams LB1, LB3, LB5 are introduced into the scanning units U1, U3, U5, The elements AOM1, AOM3 and AOM5 are repeatedly turned on for a predetermined time Ton in response to the supplementary point signals ZP1, ZP3 and ZP5.

As described above, according to the fourth embodiment, the deflection (scanning) of the polygon mirror PM is repeated for each of the one reflecting surface RP of the polygon mirror PM of the scanning unit Un (U1 to U6) The beam switching control unit 352 controls the beam switching member 20 so that the one-dimensional scanning of the spot light SP is sequentially performed on each of the plurality of scanning units Un (U1 to U6). Thereby, one beam LB is distributed to the plurality of scanning units Un (U1 to U6) without shortening the length of the drawing lines SLn (SL1 to SL6) where the spotlight SP is scanned And can effectively utilize the beam LB. In addition, since the shape of the polygon mirror PM (the shape of the polygon) can be brought close to the circular shape, the rotation speed of the polygon mirror PM can be prevented from lowering and the polygon mirror PM can be rotated at high speed have.

The beam switching member 20 is arranged in a series of n in accordance with the traveling direction of the beam LB from the light source device 14 'and diffracts the beam LB so that any one of the deflected n beams LBn (AOMn (AOM1 to AOM6)) for selecting and introducing the selected optical element to the corresponding scanning unit (Un). Therefore, any one of the scanning units Un (U1 to U6) to which the beam LBn should be incident can be simply selected, and one scanning unit Un to be subjected to imaging exposure can be selected from the light source device 14 ' It is possible to efficiently concentrate the beam LB of the light beam LB and obtain a high exposure dose. For example, the beam LB emitted from the light source device 14 'is amplitude-divided into six beams using a plurality of beam splitters, and each of the six beams LBn (LB1 to LB6) In the case of guiding to the six scanning units U1 to U6 via the acoustooptic modulation element for imaging modulated by the serial data DL1 to DL6 of the data, The intensity of the spot light SP in one scanning unit Un is obtained by dividing the intensity of the source beam LB by 20% and the intensity of the beam intensity in the scanning unit Un by 30% When it is 100%, it becomes about 9.3%. On the other hand, as in the fourth embodiment, when the beam LB from the light source device 14 'is deflected by the selection optical element AOMn to be incident on any one of the six scanning units Un The intensity of the spot light SP in one scanning unit Un is about the intensity of the original beam LB when the beam intensity in the selection optical element AOMn is 20% 56%.

The rotation control unit 350 controls the rotation of the polygon mirror PM of the plurality of scanning units Un (U1 to U6) so that the rotation speeds are equal to each other and the phase of the rotation angle position is shifted by a predetermined angle. As a result, during the period from the one-dimensional scanning of the spot light SP by one scanning unit Un to the next one-dimensional scanning, the spot light SP by the plurality of other scanning units Un, It is possible to sequentially perform one-dimensional scanning of the two-dimensional image.

In the fourth embodiment, one beam LB is distributed to the six scanning units Un. However, one beam LB from the light source device 14 'may be divided into nine scanning units Un, (Un) (U1 to U9). In this case, if the scanning efficiency (? /?) Of the polygon mirror PM is 1/3, while the polygon mirror PM rotates by three reflection surfaces RP, nine scanning units U1 to U9 , The scanning of the spot light SP is performed for each of the two filtered reflecting surfaces RP. Thereby, until the spot light SP is scanned by one scanning unit Un and then the next spot light SP is scanned, the other eight scanning units Un are irradiated with the spot light SP) can be performed in order. When the scanning efficiency of the polygon mirror PM is 1/3, the polygon mirror PM rotates by three reflection surfaces RP, and one beam LB is distributed to the nine scanning units Un The frequency divider 330 of the minor point generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/3. In this case, the main pulse signals of the scanning units U1, U4, U7 are synchronized (they are in phase with each other on the time axis). Likewise, the main pulse signals of the scanning units U2, U5 and U8 are synchronized, and the main pulse signals of the scanning units U3, U6 and U9 are synchronized. The main pulse signal of the scanning units U2, U5 and U8 occurs later than the main pulse signal of the scanning units U1, U4 and U7 by the time Ts and the main pulse signal of the scanning units U3, U6 and U9 The signal occurs later than the main pulse signal of the scanning units U1, U4, U7 by 2 x time Ts. The generation timings of the minor point signals ZP1, ZP4 and ZP7 of the scanning units U1, U4 and U7 are shifted in phase by 1/3 of one period and similarly the phases of the scanning units U2, U5 and U8 The generation timings of the subsidiary point signals ZP2, ZP5 and ZP8 and the generation timings of the subsidiary point signals ZP3, ZP6 and ZP9 of the scanning units U3, U6 and U9 are also out of phase by 1/3 of one period . The time Ts is the time during which the polygon mirror PM rotates by the scan rotation angle range? 'Of the polygon mirror PM capable of scanning the spot light SP, and the polygon mirror PM is reflected by one reflection surface RP ) Multiplied by the scanning efficiency becomes the scan rotation angle range? '.

When the scanning efficiency of the polygon mirror PM is 1/3 and one beam LB is distributed to the twelve scanning units Un (U1 to U12), the polygon mirror PM is divided into four reflection surfaces RP), the beam LBn can be distributed to the twelve scanning units U1 to U12, so that the scanning of the spotlight SP is performed for each of the three filtered reflecting surfaces RP. When the scanning efficiency of the polygon mirror PM is 1/3, the polygon mirror PM rotates by four reflection surfaces RP and the beam LB from the light source device 14 'is arranged in series The beams LBn (LB1 to LB12) that are alternately deflected to the twelve selection optical elements AOMn (AOM1 to AOM12) can be made incident on the corresponding one scanning unit Un (U1 to U12) Therefore, the frequency divider 330 of the minor point generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/4. In this case, the main pulse signals of the scanning units U1, U4, U7, and U10 are synchronized (they are in phase with each other on the time axis). Similarly, the main pulse signals of the scanning units U2, U5, U8 and U11 are synchronized and the main pulse signals of the scanning units U3, U6, U9 and U12 are synchronized. The main pulse signal of the scanning units U2, U5, U8 and U11 occurs later than the main pulse signal of the scanning units U1, U4, U7 and U10 by the time Ts and the scanning units U3, U6 and U9 , And U12 are generated later than the main pulse signal of the scanning units U1, U4, U7, and U10 by 2 times Ts. The generation timings of the minor point signals ZP1, ZP4, ZP7 and ZP10 of the scanning units U1, U4, U7 and U10 are shifted in phase by ¼ of one period and similarly the scanning units U2 and U5 U6 and ZP9 of the scanning units U3, U6, U9 and U12 and the generation timings of the subsidiary point signals ZP2, ZP5, ZP7 and ZP11 of the scanning units U3, U8 and U11 , The phase is shifted by 1/4 of one cycle.

Although the scanning efficiency of the polygon mirror PM of the scanning unit Un is 1/3 in the fourth embodiment, the scanning efficiency may be 1/2 or 1/4. In the case where the scanning efficiency is 1/2, since the beam LBn can be distributed to the two scanning units Un while the polygon mirror PM rotates by one reflection plane RP, one beam LBn Is to be distributed to the six scanning units Un, the scanning of the spot light SP is performed for each of the two filtered reflecting surfaces RP of the polygon mirror PM. That is, when the scanning efficiency of the polygon mirror PM is 1/2, the beam LBn can be distributed to the six scanning units Un while the polygon mirror PM rotates by three reflection surfaces RP have. Thereby, until the spot light SP is scanned by one scanning unit Un and then the next spot light SP is scanned, the other five scanning units Un are irradiated with the spot light SP) can be performed in order. When the scanning efficiency of the polygon mirror PM is halved, the polygon mirror PM rotates by three reflection surfaces RP and one beam LB is distributed to the six scanning units Un The frequency divider 330 of the minor point generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/3. In this case, the main pulse signals of the scanning units U1, U3, and U5 are synchronized. Similarly, the main pulse signals of the scanning units U2, U4 and U6 are synchronized. The main pulse signal of the scanning units U2, U4 and U6 occurs later than the main pulse signal of the scanning units U1, U3 and U5 by the time Ts. The generation timings of the minor point signals ZP1, ZP3 and ZP5 of the scanning units U1, U3 and U5 are shifted in phase by 1/3 of one period, The generation timings of the point signals ZP2, ZP4, and ZP6 are also out of phase by 1/3 of one period.

When the scanning efficiency of the polygon mirror PM is 1/4, the beam LBn can be distributed to the four scanning units Un while the polygon mirror PM rotates by one reflection plane RP , And one beam LB is to be distributed to the eight scanning units Un, the scanning of the spot light SP is performed for each of the one reflecting surface RP of the polygon mirror PM. That is, when the scanning efficiency of the polygon mirror PM is 1/4, the beam LBn can be distributed to the eight scanning units Un while the polygon mirror PM rotates by two reflection surfaces RP have. Thereby, until the spot light SP is scanned by one scanning unit Un and then the next spot light SP is scanned, the other seven scanning units Un are irradiated with the spot light SP) can be performed in order. If the scanning efficiency of the polygon mirror PM is 1/4, the polygon mirror PM rotates by two reflection surfaces RP and one beam LB is distributed to the eight scanning units Un The frequency divider 330 of the minority point generation circuit CAn divides the frequency of the generation timing of the origin signal SZn by 1/2. In this case, the main pulse signals of the scanning units U1 and U5 are synchronized, and the main pulse signals of the scanning units U2 and U6 are synchronized. Likewise, the main pulse signals of the scanning units U3 and U7 are synchronized and the main pulse signals of the scanning units U4 and U8 are synchronized. The main pulse signal of the scanning units U2 and U6 occurs later than the main pulse signal of the scanning units U1 and U5 by the time Ts. The main pulse signal of the scanning units U3 and U7 occurs later than the main pulse signal of the scanning units U1 and U5 by 2 times Ts and the main pulse signal of the scanning units U4 and U8 is output to the scanning unit (3 占 time Ts) with respect to the main pulse signal of the sub-pulses U1 and U5. The generation timings of the minor point signals ZP1 and ZP5 of the scanning units U1 and U5 are shifted in phase by 1/2 of one period and the minor point signals ZP2 and ZP6 of the scanning units U2 and U6 Is also out of phase by 1/2 of one cycle. Similarly, the generation timings of the minor point signals ZP3 and ZP7 of the scanning units U3 and U7 and the minor point signals ZP4 and ZP8 of the scanning units U4 and U8 are phase shifted by 1/2 of one period, It is out of order.

In the fourth embodiment, the shape of the polygon mirror PM is octagonal (eight reflective surfaces RP), but may be hexagonal, hexagonal, or octagonal. This also changes the scanning efficiency of the polygon mirror PM. In general, as the number of reflective surfaces Np of the polygon mirror PM in the polygonal shape increases, the scanning efficiency on one reflective surface RP of the polygon mirror PM becomes larger. As the number of reflective surfaces Np becomes smaller, The scanning efficiency of the mirror PM becomes small.

The maximum scanning rotation angle range a of the scanable polygon mirror PM projected on the substrate FS by the spot light SP is the angle of incidence of the f? Lens FT (the scanning angle range? S , The polygon mirror PM having the optimum number of reflection surfaces Np can be selected in accordance with the incidence angle of incidence. In the case of the f? Lens FT having an incident angle of view? S of less than 30 degrees, as shown in the above example, a polygon mirror PM of 24 faces where the reflection plane RP changes by a rotation of 15 degrees, It may be a twelve polygon mirror PM in which the reflecting surface RP is changed by rotation. In this case, since the scanning efficiency (? /?) Is larger than 1/2 and smaller than 1.0 in the 24-plane polygon mirror (PM), the polygon mirror (24) of each of the six scanning units (U1 to U6) (PM) is controlled so as to perform scanning of the spot light (SP) by skipping five sides. In the twelve-plane polygon mirror PM, the scanning efficiency is greater than 1/3 and less than 1/2, so that the twelve-plane polygon mirror PM of each of the six scanning units U1 to U6 is And is controlled so as to scan the spot light SP by skipping two sides.

[Fifth Embodiment]

In the fourth embodiment, it is assumed that the scanning (deflection) of the spot light SP is repeated every surface of the reflective surface RP of the polygon mirror PM. However, in the fifth embodiment, it is determined whether the scanning (deflection) of the spot light SP is the first state in which the polygon mirror PM is repeated for each successive reflecting surface RP, (RP) to be in a second state repeated for each of the filter surfaces on one surface. That is, until the scanning unit U1 starts scanning the spot light SP and then starts the next scanning, it divides the beam LB into three scanning units Un in a time division manner, ) To be distributed in a time division manner.

The scanning efficiency of the polygon mirror PM is 1/3. Therefore, when the scanning of the spot light SP is repeated every reflection plane RP of the polygon mirror PM, the scanning unit U1, for example, It is not possible to distribute the beam LB to only the two scanning units Un other than the scanning unit U1 from the time when the spot light SP is scanned until the next scanning is performed. Accordingly, the two beams LB are prepared, the first beam LB is distributed to the three scanning units Un in a time division manner, and the second beam LB is distributed to the remaining three scanning units Un Time-sharing is distributed. Therefore, the scanning of the spot light SP is performed in parallel by the two scanning units Un. Two beams LB may be generated by providing two light source devices 14 'and two beams LB may be generated by dividing the beam LB from one light source device 14' by a beam splitter or the like. . In the exposure apparatus EX according to the fifth embodiment shown in Figs. 36 to 40, two light source devices 14 '(14A', 14B ') are provided (see Fig. 38). In the fifth embodiment, the same components as those in the fourth embodiment are denoted by the same reference numerals and only different portions will be described.

36 is a configuration diagram of the beam switching member (beam delivery unit) 20A of the fifth embodiment. The beam switching member 20A includes a plurality of selection optical elements AOMn (AOM1 to AOM6), a plurality of condenser lenses CD1 to CD6, a plurality of reflection mirrors M1 A plurality of mirrors IM1 to IM6 and a plurality of collimator lenses CL1 to CL6 and reflection mirrors M13 and M14 and absorbers TR1 and TR2. The absorber TR1 corresponds to the absorber TR shown in Fig. 26 described in the fourth embodiment, and absorbs the beam LB reflected by the reflection mirror M12.

The selection optical elements AOM1 to AOM3 constitute an optical element module (first optical element module) OM1. The selection optical elements AOM4 to AOM6 constitute an optical element module (second optical element module) . The optical elements AOM1 to AOM3 for selection of the first optical element module OM1 are arranged in series along the traveling direction of the beam LB as described in the fourth embodiment. Similarly, the optical elements AOM4 to AOM6 for selection of the second optical element module OM2 are also arranged in series along the traveling direction of the beam LB. The scanning units U1 to U3 corresponding to the optical elements AOM1 to AOM3 for selection of the first optical element module OM1 are referred to as a first scanning module. The scanning units U4 to U6 corresponding to the optical elements AOM4 to AOM6 for selection of the second optical element module OM2 are referred to as a second scanning module. The scanning units U1 to U3 of the first scanning module and the scanning units U4 to U6 of the second scanning module are arranged in a predetermined arrangement relationship as described in the fourth embodiment.

In the fifth embodiment, the reflection mirrors M6, M13, and M14 are arranged so that the first optical element module OM1 and the second optical element module OM2 are arranged in parallel with respect to the traveling direction of the beam LB (Movable member) SWE for switching the arrangement state and the second arrangement state in which the first optical element module OM1 and the second optical element module OM2 are arranged in series. The placement switching member SWE has a slide member SE for supporting the reflection mirrors M6, M13 and M14 and the slide member SE is movable in the X direction with respect to the support member IUB. The movement of the slide member SE (the arrangement switching member SWE) in the X direction is performed by the actuator AC (see Fig. 38). The actuator AC is driven under the control of the drive control section 352a (see Fig. 38) of the beam switching control section 352. [

The beam LB from the two light source devices 14 '(14A', 14B ') is simultaneously applied to the first optical element module OM1 and the second optical element module OM2 in the first arrangement state The beam LB from one light source device 14 '(14A') is incident on the first optical element module OM1 and the second optical element module OM2 in the second arrangement state, As shown in Fig. That is, in the second arrangement state, the beam LB transmitted through the first optical element module OM1 is incident on the second optical element module OM2. 36 shows a state in which the first optical element module OM1 and the second optical element module OM2 are arranged in a second arrangement state in series by the arrangement switching member SWE. That is, in this second arrangement state, all the selection optical elements AOM1 to AOM6 of the first optical element module OM1 and the second optical element module OM2 are arranged in series along the advancing direction of the beam LB And is the same as FIG. 26 shown in the fourth embodiment. Therefore, similarly to the fourth embodiment, by the optical elements AOMn (AOM1 to AOM6) for selection of the first optical element module OM1 and the second optical element module OM2 arranged in series, It is possible to select one scanning unit Un from which one deflected beam LBn is incident, out of the module and the second scanning modules U1 to U6. The position of the arrangement switching member SWE in Fig. 36 is referred to as a second position. In the first arrangement state, the beam LB incident on the first optical element module OM1 (AOM1 to AOM3) is referred to as a beam LBa from the first light source device 14A ' , The beam incident on the second optical element module OM2 (AOM4 to AOM6) is referred to as a beam LBb from the second light source device 14B '.

When the arrangement switching member SWE moves toward the -X direction and comes to the first position, the first optical element module OM1 and the second optical element module OM2 enter a first arrangement state in which they are arranged in parallel. 37 is a view showing the optical paths of the beams LBa and LBb when the position of the arrangement switching member SWE is at the first position. In the first arrangement state, the beam LBa is incident on the first optical element module OM1, and the beam LBb is incident on the second optical element module OM2. In order to distinguish the beam LB incident on each of the first optical element module OM1 and the second optical element module OM2, a beam LB incident on the first optical element module OM1 is represented by LBa And the beam LB directly incident on the second optical element module OM2 is denoted by LBb.

37, when the arrangement switching member SWE is moved to the first position, the position of the reflecting mirror M6 shifts in the -X direction, so that the beam LBa reflected by the reflecting mirror M6 Not the reflection mirror M7, but the absorber TR2. The beam LBa from the first light source device 14A 'incident on the first optical element module OM1 is incident only on the first optical element module OM1 (optical elements for selection AOM1 to AOM3) And is not incident on the second optical element module OM2. That is, the beam LBa can transmit only the optical elements AOM1 to AOM3 for selection. When the position of the arrangement switching member SWE becomes the first position, the beam LBb emitted from the second light source device 14B 'and traveling in the + Y direction toward the reflection mirror M13 is reflected by the reflection mirrors M13, M14 to the reflection mirror M7. Therefore, the beam LBb can transmit only the second optical element module OM2 (optical elements for selection AOM4 to AOM6).

Accordingly, the first optical element module OM1 is configured by three selection optical elements AOM1 to AOM3 arranged in series to one of the three scanning units U1 to U3 constituting the first scanning module, Any one of the beams LB1 to LB3 deflected from the beam LBa can be incident. The second optical element module OM2 is connected to one of the three scanning units U4 to U6 constituting the second scanning module by the three optical elements for selection AOM4 to AOM6 arranged in series, Any one of the beams LB4 to LB6 deflected from the beam LBb can be incident. The first scanning modules U1 to U3 and the second scanning modules U1 to U3 are arranged in parallel by the first optical element module OM1 (AOM1 to AOM3) and the second optical element module OM2 (AOM4 to AOM6) U4 to U6, one scanning unit Un to which the beam LB is incident can be selected, respectively. In this case, it is possible to perform scanning by scanning along the drawing line SLn of the spotlight SP by any one of the scanning units Un of the first scanning module and the scanning unit Un of the second scanning module And the exposure operation is performed in parallel.

When the scanning (deflection) of the spot light SP is a first state (first imaging mode) in which the polygon mirror PM is repeated for each successive reflection surface RP, the beam switching control unit 352 controls the actuator AC) to place the arrangement switching member SWE in the first position. When the beam switching control section 352 is in the second state (the second imaging mode) repeated for every one filter surface of the reflection surface RP of the polygon mirror PM, the beam switching control section 352 controls the actuator AC, And the switching member SWE is disposed at the second position.

38 is a diagram showing a configuration of the beam switching control section 352 in the fifth embodiment. 38, optional optical elements AOM1 to AOM6 and light source units 14 '(14A', 14B ') to be controlled by the beam switching control unit 352 are also shown. A light source device 14 'in which the beam LBa is incident from the first optical element module OM1 is denoted by 14A' and a light source device 14 'in which the beam LBb is incident directly into only the second optical element module OM2. ) Is indicated by 14b '.

38, the beam LBa (LB) from the light source device 14A 'is switched from AOM1 to AOM2 to AOM3 to AOM3, as shown in Fig. 38. When the arrangement switching member SWE is in the second position, To AOM6 in this order, and the beam LBa passing through the selection optical element AOM6 is incident on the absorber TR1. When the arrangement switching member SWE is moved to the first position, the beam LBa from the light source device 14A 'can pass through the selection optical element AOMn in the order of AOM1? AOM2? AOM3, The beam LBa having passed through the optical element AOM3 is incident on the absorber TR2. When the arrangement switching member SWE is moved to the first position, the beam LBb from the light source device 14B 'passes through the selection optical element AOMn in the order of AOM4? AOM5? AOM6 And the beam LB having passed through the selection optical element AOM6 is incident on the absorber TR1. 38 is a conceptual diagram, and is different from the actual configuration of the arrangement switching member SWE shown in Figs. 36 and 37. Fig. In the example shown in Fig. 38, the arrangement switching member SWE is in the second position, that is, the second arrangement state in which the first optical element module OM1 and the second optical element module OM2 are arranged in series, And the selection optical element AOM5 is in the ON state. This causes the beam LB5 deflected by the diffraction from the beam LBa from the light source device 14A 'to be incident on the scanning unit U5.

The beam switching control section 352 includes driver circuits DRVn (DRV1 to DRV6) for driving each of the selection optical elements AOM1 to AOM6 with ultrasonic waves (high frequency signals), and scanning circuits Un (U1 to U6) Point generating circuits CAan (CAa1 to CAa6) for generating the minor point signals ZPn (ZP1 to ZP6) in accordance with the origin signals SZn (SZ1 to SZ6) from the origin sensor OPn of the origin point sensor OPn. Information on the ON time Ton for turning on the selection optical elements AOM1 to AOM6 by a predetermined time after receiving the minor point signals ZPn (ZP1 to ZP6) is exposed in the driver circuits DRVn (DRV1 to DRV6) And is sent from the control unit 356. When the minor point signal ZP1 is sent from the minority point generation circuit CAa1, the driver circuit DRV1 turns on the selection optical element AOM1 by the ON time Ton. Likewise, when the minor point signals ZP2 to ZP6 are sent from the minority point generating circuits CAa2 to CAa6, the driver circuits DRV2 to DRV6 turn on the selection optical elements AOM2 to AOM6 for the ON time Ton do. When the rotation speed of the polygon mirror PM is changed, the exposure control unit 356 changes the length of the ON time Ton accordingly. The driver circuits DRVn (DRV1 to DRV6) are provided similarly in the beam switching control section 352 of Fig. 33 in the fourth embodiment.

The minority point generation circuits CAan (CAa1 to CAa6) have a logic circuit (LCC) and a delay circuit (332). The origin signal SZn (SZ1 to SZ6) from the origin sensor OPn of each of the scanning units Un (U1 to U6) is supplied to the logic circuit LCC of the minority point generating circuits CAan (CAa1 to CAa6) . That is, the origin signal SZ1 is input to the logic circuit LCC of the minority point generation circuit CAa1 and the origin signals SZ2 to SZ6 are similarly input to the logic circuit LCC of the minority point generation circuits CAa2 to CAa6 . The status signal STS is input to the logic circuit LCC of each of the minority point generating circuits CAan (CAa1 to CAa6). This status signal (logical value) STS is set to "1" in the case of the first state in which the polygon mirror PM is repeated for each successive reflecting surface RP, ) Is set to " 0 " in the case of the second state which is repeated for each of the one-face filtered faces. The status signal STS is sent from the exposure control section 356.

Each logic circuit LCC generates the origin signal SZn '(SZ1' to SZ6 ') based on the inputted origin signal SZn (SZ1 to SZ6) and outputs it to each delay circuit 332 . Each delay circuit 332 delays the input origin signal SZn '(SZ1' to SZ6 ') by time Tpx and outputs the minor point signals ZPn (ZP1 to ZP6).

39 is a diagram showing a configuration of a logic circuit (LCC) for inputting the origin signals SZn (SZ1 to SZ6) and the status signal (STS). The logic circuit LCC is composed of a 2-input OR gate LC1, a 2-input AND gate LC2 and a one-shot pulse generator LC3. The status signal STS is applied as one input signal of the OR gate LC1. The output signal (logical value) of the OR gate LC1 is applied as one input signal of the AND gate LC2, and the origin signal SZn is applied as the other input signal of the AND gate LC2. The output signal (logical value) of the AND gate LC2 is input to the delay circuit 332 as the origin signal SZn '. Shot pulse generator LC3 normally outputs a signal SDo having a logical value of 1. When the origin signal SZn '(SZ1' to SZ6 ') is generated, the one-shot pulse generator LC3 generates a logical value " 0 " And outputs a signal SDo. That is, the one-shot pulse generator LC3 inverts the logical value of the signal SDo by a predetermined time Tdp when the origin signal SZn '(SZ1' to SZ6 ') is generated. The time Tdp is set to a relation of 2 x Tpx > Tdp > Tpx, and is preferably set to Tdp 1.5 x Tpx.

40 is a timing chart for explaining the operation of the logic circuit (LCC) of Fig. The left half of FIG. 40 shows the case of the first state in which the scanning of the spot light SP by each of the scanning units Un (U1 to U6) is performed for each successive reflective surface RP without skipping the surface And the right half shows a case of scanning the spot light SP by each of the scanning units Un (U1 to U6) in the second state in which the reflection plane RP is skipped by one plane. 40, for the sake of simplicity, it is assumed that the angle formed by the adjacent reflection surfaces RP of the polygon mirror PM (for example, the reflection surface RPa and the reflection surface RPb) it is assumed that there is no error in eta j and that the origin signal SZn is accurately generated at intervals of time Tpx.

The status signal STS is " 1 ", so that the output signal of the OR gate LC1 becomes the signal (" 1 ") when the scanning of the spot light SP is performed for each reflection surface RP without skipping the surface 1 " regardless of the state of " SDo " Therefore, the output signal (origin signal SZn ') output from the AND gate LC2 is output at the same timing as the origin signal SZn. That is, in the first state, the origin signal SZn and the origin signal SZn 'can be regarded as being the same. In the first state, the time interval Tpx of the origin signal SZn 'applied to the one-shot pulse generator LC3 is smaller than the time Tpd. Therefore, the signal SDo from the one-shot pulse generator LC3 remains "0". Further, even when the angle? J between the reflecting surfaces RP of the polygon mirror PM has an error, the time interval of the origin signal SZn 'is smaller than the time Tpd.

The status signal STS is switched to " 0 " when the scanning of the spot light SP becomes the second state in which the scanning is performed by skipping one side of the reflection surface RP. Therefore, the output signal of the OR gate LC1 becomes "1" only when the signal SDo is "1". The origin signal SZn (the origin signal SZn is referred to as the first signal SZn for convenience) in the state where the signal SDo is "1" (in this case, the output signal of the OR gate LC1 is also "1" The origin signal SZn ') is applied, the AND gate LC2 also outputs the origin signal SZn' in response thereto. However, when the origin signal SZn 'is generated, the signal SDo from the one-shot pulse generator LC3 changes to " 0 " Therefore, during the time Tpd, the two inputs of the OR gate LC1 become "0" signals, so that the output signal of the OR gate LC1 remains "0". As a result, during the time Tpd, the output signal of the AND gate LC2 also becomes "0". Therefore, even if the second origin signal SZn is applied to the AND gate LC2 before the time Tpd elapses, the AND gate LC2 does not output the origin signal SZn '.

Since the signal SDo from the one-shot pulse generator LC3 is inverted to " 1 " when the time Tpd has elapsed, as in the case of the first origin signal SZn, The origin signal SZn 'in accordance with the origin signal SZn of the gate signal SZn is outputted from the AND gate LC2. By repeating this operation, the logic circuit LCC converts the origin signal SZn repeatedly generated every time Tpx into the origin signal SZn 'generated repeatedly every 2 占 time Tpx. From a different point of view, the logic circuit LCC generates the origin signal SZn 'which is generated by repeating one pulse of the origin signal SZn repeatedly generated every time Tpx, that is, the origin signal SZn' The frequency of the occurrence timing is divided by 1/2. The logic circuit LCC of the minority point generation circuit CAan may be replaced with the frequency divider 330 (FIG. 31) of the minority point generation circuit CAn described in the fourth embodiment. In the case of replacing with the frequency divider 330, the frequency divider 330 divides the origin signal SZn by 1/2 in the second state and does not divide the origin signal SZn in the first state It is good. The minor point generation circuit CAn of the fourth embodiment may be replaced by the minor point generation circuit CAan of the fifth embodiment. In the case of the second state, the origin signal SZ1 'output from the logic circuit LCC of the minority point generation circuit CAa1 and the origin signal SZ2' output from the logic circuit LCC of the minority point generation circuit CAa4 The signal SZ4 'is out of phase with the half period. Likewise, the origin signals SZ2 'and SZ3' output from the logic circuit LCC of the minority point generation circuits CAa2 and CAa3 and the origin signals SZ2 'and SZ3' output from the logic circuit LCC of the minority point generation circuits CAa5 and CAa6 The signals SZ5 'and SZ6' are out of phase with each other.

By simply inverting the value of the status signal STS input to the logic circuit LCC of each of the minority point generating circuits CAa1 to CAa6 of the beam switching control section 352 as described above, The first state in which the imaging exposure by the scanning of the spot light SP is repeated for each reflection surface RP or the first state in which the imaging of the spot light SP is performed for each of the reflection surfaces RP of the reflection surface RP of the polygon mirror PM It is possible to arbitrarily switch between the first state and the second state in which the imaging exposure by the light emitting element is repeated.

Also in the fifth embodiment, rotation control of the polygon mirror PM of each of the scanning units Un (U1 to U6) is the same as that of the fourth embodiment. That is to say, the origin signals SZn (SZ1 to SZ6) output from the origin sensor OPn of the respective scanning units Un (U1 to U6) have the relationship as shown in Fig. 34, Un (U1 to U6)) of the polygon mirror PM is controlled. Therefore, in the first state in which the scanning of the spot light SP is performed for each reflection surface RP without skipping the surface, the scanning units U1 to U3 scan the spot light SP in the order of U1? U2? U3, And the scanning units U4 to U6 can repeatedly perform the scanning of the spot light SP in the order of U4? U5? U6.

It is preferable that the time Tpd set in the one-shot pulse generator LC3 can be changed in accordance with the information of the rotational speed of the polygon mirror PM from the exposure control unit 356. [ 39, the time Tpd is set to (n + 1) × Tpx> Tdp> n × Tpx (n + 1) × Tpx To the relationship between the two. In addition, n represents the number of reflection surfaces RP skipped. For example, when n is 2, it means that the scanning of the spot light SP is performed by skipping two sides of the reflection surface RP. When n is 3, the scanning of the spot light SP Is performed by skipping three sides of the reflection surface RP.

Next, when the light source devices 14A 'and 14B' are operated by the drawing data output control section 354 in the first state in which the scanning of the spot light SP is performed for each reflection surface RP without skipping the surface, The output control of the drawing bit stream data Sdw to the drive circuit 206a of FIG. In the first state, scanning of the spot light SP is performed in parallel by the first scanning module (scanning units U1 to U3) and the second scanning module (scanning units U4 to U6). Therefore, the drawing data output control section 354 corresponds to each of the scanning units U1 to U3 to the driving circuit 206a of the light source device 14A 'for emitting the beam LBa incident on the first scanning module The driving circuit 206a of the light source device 14B 'for outputting the drawing bit stream data Sdw in which the serial data DL1 to DL3 are synthesized in a time series and for emitting the beam LBb incident on the second scanning module ) Outputs the rendering bit stream data Sdw obtained by synthesizing the serial data DL4 to DL6 corresponding to the scanning units U4 to U6 in a time series manner.

The rendering data output control section 354 shown in FIG. 35 can be used as it is in the case where the status signal STS is either "1" or "0". In the first state in which the scanning of the spot light SP is performed on the reflection surface RP without skipping the surface, the minor point signal ZP2 is generated after the time Ts after the generation of the minor point signal ZP1 , And further generates the minor point signal ZP3 after the time Ts. Therefore, the counter units CN1 to CN3 repeatedly output the serial data DL1 to DL3 in the order of DL1? DL2? DL3. Serial data DL1 to DL3 sequentially output through the gate portions GT1 to GT3 opened during a predetermined time (on-time Ton) after the minor-point signals ZP1 to ZP3 are applied are written in the drawing bit stream data Sdw, Is inputted to the driving circuit 206a of the first light source device 14A '. Likewise, in the first state in which the scanning of the spot light SP is performed on each reflection surface RP without skipping the surface, the minor point signal ZP5 is generated after the generation of the minor point signal ZP4 after the time Ts And further generates the minor point signal ZP6 after the time Ts. Therefore, the counter units (CN4 to CN6) repeatedly output the serial data (DL4 to DL6) in the order of DL4? DL5? DL6. Serial data DL4 to DL6 sequentially output through the gate portions GT4 to GT6 opened during a predetermined time (on-time Ton) after application of the minor-point signals ZP4 to ZP6 are supplied to the rendering bit stream data Sdw ) To the driving circuit 206a of the second light source device 14B '.

Next, the shift of the serial data DL1 to DL6 in the first state will be briefly described. The shift of the serial data DL1 in the column direction is performed at the timing at which the subsidiary point signal ZP2 corresponding to the scanning unit U2 to be scanned next occurs after outputting all the serial data DL1. The shift of the serial data DL2 in the column direction is performed at the timing at which the subsidiary point signal ZP3 corresponding to the scanning unit U3 to be next scanned is generated after all the serial data DL2 are outputted. The shift of the serial data DL3 in the column direction is performed at the timing at which the subsidiary point signal ZP1 corresponding to the scanning unit U1 to be scanned next occurs after outputting all the serial data DL3. The shift of the serial data DL4 in the column direction is performed at the timing at which the subsidiary point signal ZP5 corresponding to the scanning unit U5 to be next scanned is generated after all the serial data DL4 are outputted . The shift of the serial data DL5 in the column direction is performed at the timing at which the supplemental point signal ZP6 corresponding to the scanning unit U6 to be scanned next occurs after outputting all of the serial data DL5. The shift of the serial data DL6 in the column direction is performed at the timing at which the subsidiary point signal ZP4 corresponding to the scanning unit U4 to be scanned next occurs after outputting all the serial data DL6. The control of outputting the rendering bit stream data Sdw in the second state is the same as that in the fourth embodiment, and a description thereof will be omitted. The output control of the rendering bit stream data Sdw in the first state is the same as the control principle of the first to third embodiments, except for the order of the serial data DLn to be output. That is, the serial data DLn are outputted in the order of DL1? DL3? DL5, DL2? DL4? DL6, or the serial data DLn in the order of DL1? DL2? DL3, DL4? DL5? Difference.

In the case of the second state in which the scanning of the spot light SP is performed by skipping one side of the reflection plane RP, compared with the first state in which the spot light SP is skipped and not on the reflection plane RP, The scanning start interval of the spot light SP of each of the scanning units Un (U1 to U6) is long. For example, in the case where the spot light SP is scanned by skipping one side of the reflection surface RP, as compared with the case where the skip skipping is not performed, the spot of each of the scanning units Un (U1 to U6) The scanning start interval of the light SP is doubled. When the reflection plane RP is skipped by two planes, the scanning start interval of the spot light SP becomes three times as compared with the case where the skip skipping is not performed. Therefore, in the first state and the second state, if the rotation speed of the polygon mirror PM and the transfer speed of the substrate FS are made the same, the exposure results become different in the first state and the second state.

Thus, at least one of the rotation speed of the polygon mirror PM and the transfer speed of the substrate FS is changed (corrected) in the first state and the second state, and the exposure results in the first state and the second state are changed May be provided in the exposure control section 356. [0156] For example, when the scanning start interval of the spot light (SP) in the first state and the scanning start interval of the spot light (SP) in the second state are 1: 2, the exposure control unit (356) The rotation control unit 350 is controlled so that the ratio of the rotation speed of the polygon mirror PM at the first state to the rotation speed of the polygon mirror PM at the second state becomes 1: 2. More specifically, the rotational speed of the polygon mirror PM at the first state is set at 20,000 rpm, and the rotational speed of the polygon mirror PM at the second state is set at 40,000 rpm. If the light emission frequency Fs of the beam LB (LBa, LBb) of the light source device 14 '(14A', 14B ') is set to, for example, 200 MHz in the first state and 400 MHz in the second state do. This makes it possible to make the interval of the generation timing of the minority point signal ZPn in the first state substantially equal to the interval of the generation timing of the minority point signal ZPn in the second state.

For example, when the scanning start interval of the spot light SP in the first state and the scanning start interval of the spot light SP in the second state are 1: 2, in the first state The driving rollers R1 to R3 and the control for controlling the rotational speed of the rotary drum DR such that the ratio of the conveying speed of the substrate FS of the first state to the conveying speed of the substrate FS in the second state is 2: Mode may be provided in the exposure control section 356. [ The control mode (scan correction mode) for correcting the rotation speed of the polygon mirror PM or the light emission frequency Fs (frequency of the clock signal LTC) or the control mode for correcting the conveyance speed of the substrate FS (SL1 (SL1 to SL6) on the substrate FS in the first state) and the distance in the X direction between the drawing lines SLn (SL1 to SL6) on the substrate FS (For example, 1.5 占 퐉) in the X direction of the drawing lines SLn (SL1 to SL6) on the drawing plane SL1. Further, in the first state and the second state, the pattern data (bit map) stored in each of the memory units BM1 to BM6 in the rendering data output control unit 354 need not be corrected and can be used as it is have.

In order to equalize the pattern drawn on the substrate FS in the first state and the pattern drawn on the substrate FS in the second state using both the above-described scan correction mode and transfer correction mode, Correction may be performed. For example, in the first state (in the case of beam scanning for each reflection surface RP of the polygon mirror PM), the rotation speed of the polygon mirror PM is 20,000 rpm and the light source device 14 ' (The reflection surface RP of the polygon mirror PM) is 200 MHz when the light emission frequency Fs of the beam LB of the polygon mirror PM is 1 mm and the transport speed of the substrate FS is 5 mm / , The rotation speed of the polygon mirror PM is set at 30,000 rpm, which is 1.5 times the speed of the beam LB (in the case of the beam scanning by the beam splitter), the transfer speed of the substrate FS is set to 3.75 mm / ) May be set to 300 MHz, which is 1.5 times the emission frequency Fs. By combining both the scan correction mode and the transport correction mode as described above, in the case of the second state, it is not necessary to lower the transport speed of the substrate FS by half, so extreme reduction in productivity is suppressed.

Also in the fifth embodiment, as described in the fourth embodiment, the number of the scanning units Un for distributing the beams LBa and LBb may be arbitrarily changed. Also, the scanning efficiency of the polygon mirror PM may be arbitrarily changed. In the fifth embodiment, since the scanning efficiency of the polygon mirror PM is 1/3 and the number of the scanning units Un is six, six optical elements AOMn (AOM1 to AOM6) Optical element modules OM1 and OM2, and correspondingly, six scanning units Un (U1 to U6) are divided into two scanning modules. However, when the scanning efficiency of the polygon mirror PM is 1 / M, the number of the scanning units Un and the number of the optical elements AOMn are Q, the Q selection optical elements AOMn are Q / It is sufficient to divide it into element modules OM1, OM2, ..., and divide Q scanning units Un into Q / M scanning modules. In this case, the number of the selection optical elements AOMn included in each of the optical element modules OM1, OM2, ... is the same, and the number of the scanning units Un included in each of the Q / M scanning modules . It is preferable that Q / M is an integer. That is, Q is preferably a multiple of M.

For example, when the scanning efficiency of the polygon mirror PM is 1/2, and the number of the scanning units Un and the number of the selection optical elements AOMn is 6, the six selection optical elements AOMn are three optical elements The device modules OM1, OM2, and OM3, and divide the six scanning units Un by three scanning modules. In the case of the first state, three optical element modules OM1, OM2 and OM3 are arranged in parallel, and three optical element modules OM1, OM2 and OM3 are respectively connected to three light source devices 14 ' LBa, LBb and LBc of the first optical element OM1 are incident in parallel in the first state and the three optical element modules OM1, OM2 and OM3 are arranged in series in the case of the second state, The beam LB from the device 14 'may be incident so as to serially pass through the three optical element modules OM1, OM2 and OM3.

As described above, according to the fifth embodiment, the deflection (scanning) of the beam LBn (spot light SP) by the polygon mirror PM of the scanning unit Un is performed in such a manner that the polygon mirror PM is deflected (Second imaging mode) repeated for every at least one filtered reflective surface RP among the polygon mirror PM and the first state (first imaging mode) repeated for each slant surface RP The beam switching control unit 352 controls the beam switching member 20A to sequentially perform one-dimensional scanning of the spot light SP by the plurality of scanning units Un. Thereby, the same effect as that of the fourth embodiment can be obtained. In addition, the spot light SP is scanned by skipping the surface, or the spot light SP is scanned without skipping the surface Can be switched.

In the case of the first state, when the scanning efficiency (alpha / beta) of the polygon mirror PM becomes less than 1/2, the number of scanning units Un corresponding to the reciprocal of the scanning efficiency is grouped as one scanning module , And one scanning unit (Un) performs one-dimensional scanning of the spot light (SP) for each scanning module using a plurality of the grouped scanning modules. As a result, among the plurality of imaging lines SLn, the same number of imaging lines SLn as the number of scanning modules can be simultaneously scanned with the spot light SP. In the case of the second state, since the beam scanning is controlled to be performed for each of at least one filtered reflective surface RP of the polygon mirror PM, it is possible to perform the scanning according to the reciprocal of the scanning efficiency? /? Of the polygon mirror PM. All of the plurality of scanning units Un are capable of scanning the spot light SP along the drawing line SLn while effectively utilizing the beam LB even with a plurality of the scanning units Un larger than the number have.

In the first state, the beams LBa and LBb from the light source units 14A 'and 14B' are simultaneously incident on the grouped two scanning modules, Each of the optical elements AOM1 to AOM6 is switched on by the beam switching control section 352 such that the beams LB1 to LB6 are incident on the corresponding scanning units U1 to U6 on a time- / OFF state is switched.

The arrangement switching member SWE provided in the beam switching member 20A is configured to switch the beam LBa from the first light source device 14A 'to three scanning units U1 to U3 out of the six scanning units U1 to U6 And the beam LBb from the second light source device 14B 'is distributed to each of the remaining three scanning units U4 to U6 as beams LB4 to LB6 The three selection optical elements AOM1 to AOM3 are arranged in series along the optical path of the beam LBa and the selection optical elements AOM4 to AOM6 are arranged in series along the optical path of the beam LBb So as to distribute the beam LBa from one light source device 14A 'to the six scanning units U1 to U6 as the beams LB1 to LB6, In the second arrangement state in which the six selection optical elements AOM1 to AOM6 are arranged in series along the optical path of the second optical element AOM1 to AOM6.

Thereby, in the case of the first state, by setting the first arrangement state by the arrangement switching member SWE, each of the scanning units U1 to U6 is arranged so that the polygon mirror PM is a continuous reflecting surface The scanning by the spot light SP can be repeated for each of the scanning units U1 to RP and the two scanning units of the six scanning units U1 to U6 can perform the scanning by the spot light SP almost simultaneously. In the case of the second state, beam scanning is performed for every at least one filtered reflecting surface RP of the polygon mirror PM by setting the second arrangement state by the arrangement switching member SWE, The scanning with the spot light SP can be repeated for all of the pixels U1 to U6.

Therefore, according to the fifth embodiment, in the initial setup of the drawing apparatus, one light source device 14A 'is used to set the arrangement switching member SWE to be in the second arrangement state, If it is desired to increase the conveying speed of the light source device FS, the second light source device 14B 'may be additionally provided to set the placement switching member SWE to be in the first arrangement state. On the hardware, The drawing apparatus can be upgraded with a simple operation such as switching of the switching member SWE.

In each of the embodiments described above, the reflecting surface RP for deflecting the beam LBn of the polygon mirror PM is used by using the reflecting surface RP immediately preceding the rotational direction of the polygon mirror PM The origin signal SZn may be detected by using the reflecting surface RP itself which deflects the beam LBn. In this case, since it is not necessary to delay the origin signal SZn 'obtained from the origin signal SZn or the origin signal SZn by the time Tpx, the origin signal SZn or the origin signal SZn' Signal ZPn.

In the fourth and fifth embodiments, the electro-optical element 206 as the light modulating optical modulator of the light source device 14 '(14A', 14B ') is switched by using the drawing bit stream data Sdw However, as in the second embodiment, the optical element for drawing (AOM) may be used as the drawing light modulator. This optical element for painting (AOM) is an acousto-optic modulator (AOM). That is, in the fourth embodiment, the optical element for drawing (AOM) is disposed between the light source device 14 'and the optical element AOM1 for the first stage, The beam LB from the light source device 14 'transmitted through the optical element AOM1 may be incident on the selection optical element AOM1. In this case, the optical element for painting AOM is switched in accordance with the drawing bit stream data Sdw. Even in this case, the same effect as that of the fourth embodiment can be obtained.

In the fifth embodiment, the first light source device 14A 'and the first optical element AOM1 of the first optical element module OM1 are disposed between the second light source device 14B' The optical elements for drawing (AOM (AOMa, AOMb)) are disposed between the first-stage selection optical element AOM4 of the second optical element module OM2. That is, the beam LBa from the light source device 14A ', which has transmitted the imaging optical element AOMa, is incident on the selection optical element AOM1, and the light source device 14B 'Is incident on the selection optical element AOM4. In this case, in the case of the first state, the optical element for drawing AOMa is switched in accordance with the drawing bit stream data Sdw composed of the serial data DL1 to DL3, and the optical element for drawing AOMb is switched to the serial And is switched according to the rendering bit stream data Sdw composed of data DL4 to DL6. In the case of the second state, only the optical element for drawing AOMa is switched in accordance with the drawing bit stream data Sdw composed of the serial data DL1 to DL6.

As in the first embodiment, an optical element for drawing (AOM) as a light modulating optical modulator may be provided for each scanning unit Un. In this case, the optical element for painting AOM may be provided in front of the reflection mirror M20 (see Fig. 28) of each scanning unit Un. The imaging optical element AOM of each of the scanning units Un (U1 to U6) is switched in accordance with each serial data DLn (DL1 to DL6). For example, the optical element for drawing (AOM) of the scanning unit U3 is switched in accordance with the serial data DL3.

[Sixth Embodiment]

41 shows a configuration of the beam switching member (beam delivery unit) 20B according to the sixth embodiment. Here, a beam (hereinafter referred to as " beam switching member " LBw (LB)) is a parallel light flux of circularly polarized light. The beam switching member 20B is provided with six selecting optical elements AOM1 to AOM6, two absorbers TR1 and TR2, six lens systems CG1 to CG6, mirrors M30, M31 and M32, ), A polarization beam splitter BS1 and two imaging optical elements (acousto-optic modulation elements) AOMa and AOMb. The same components as those of the fourth embodiment or the fifth embodiment are denoted by the same reference numerals.

The beam LBw incident on the beam switching member 20B is separated into a linear P polarized beam LBp and a linear S polarized beam LBs by the polarizing beam splitter BS1 through the condenser lens CG0 do. The S-polarized beam LBs reflected by the polarization beam splitter BS1 is incident on the imaging optical element AOMa. The beam LBs incident on the imaging optical element AOMa is converged to be the beam waist in the imaging optical element AOMa by the condensing action of the condenser lens CG0. The drawing bit stream data Sdw (DLn) as shown in Fig. 19 is applied to the drawing optical element AOMa via the driver circuit DRVn. The drawing bit stream data Sdw is obtained by synthesizing the serial data DL1, DL3, and DL5 corresponding to the odd-number scan units U1, U3, and U5. Therefore, the imaging optical element AOMa is turned on when the drawing bit stream data Sdw (DLn) is " 1 ", and the first-order diffracted light of the incident beam LBs is deflected by the deflected imaging beam And is emitted toward the mirror M31. The imaging beam reflected by the mirror M31 is incident on the selection optical element AOM1 through the lens system CG1. The zero-order light LBs emitted from the drawing optical element AOMa when the drawing bit stream data Sdw (DLn) is "0" is reflected by the mirror M31, but is reflected by the subsequent lens system CG1 Proceed at an angle that is not incident. The lens system CG1 condenses the imaging beam emitted from the imaging optical element AOMa in the diffraction portion of the selection optical element AOM1 to form a beam waist.

The imaging beam that has passed through the selection optical element AOM1 is incident on the selection optical element AOM3 via the same lens system CG3 as the lens system CG1 and passes through the imaging optical element AOM3, The beam is incident on the selection optical element AOM5 via the same lens system CG5 as the lens system CG1. In Fig. 41, three selection optical elements AOM1, AOM3, and AOM5 are arranged in series along the beam path, only the optical element AOM3 for selection among them is turned on, And the intensity-modulated imaging beam is incident on the corresponding scanning unit U3 as the beam LB3. The lens systems CG1, CG3 and CG5 correspond to a combination of one collimator lens CL and one condenser lens CD in Figs. 26 and 36. Fig.

On the other hand, the P-polarized beam LBp transmitted through the polarized beam splitter BS1 is reflected by the mirror M30 and is incident on the imaging optical element AOMb. The beam LBp incident on the imaging optical element AOMb is converged to be the beam waist in the imaging optical element AOMb by the condensing action of the condenser lens CG0. The drawing bit stream data Sdw (DLn) as shown in Fig. 19 is applied to the drawing optical element AOMb via the driver circuit DRVn. The rendering bit stream data Sdw is obtained by synthesizing the serial data DL2, DL4, and DL6 corresponding to the even-number scan units U2, U4, and U6. Therefore, the imaging optical element AOMb is turned on when the rendering bit stream data Sdw (DLn) is " 1 ", and the first-order diffracted light of the incident beam LBp is converted into the deflected imaging beam Modulated beam) toward the mirror M32. The imaging beam reflected by the mirror M32 passes through the same lens system CG2 as the lens system CG1 and enters the selection optical element AOM2. The zero-order light LBp emitted from the imaging optical element AOMb when the rendering bit stream data Sdw (DLn) is "0" is reflected by the mirror M32 but is reflected by the subsequent lens system CG2 Proceed at an angle that is not incident. The lens system CG2 condenses the imaging beam emitted from the imaging optical element AOMb into the diffraction portion of the selection optical element AOM2 to form a beam waist.

The imaging beam transmitted through the selection optical element AOM2 is incident on the selection optical element AOM4 via the same lens system CG4 as the lens system CG1, The beam is incident on the selection optical element AOM6 via the same lens system CG6 as the lens system CG1. 41, three selection optical elements AOM2, AOM4 and AOM6 are arranged in series along the beam path, only the optical element AOM2 for selection among them is turned on, and the optical element AOMb for drawing And the intensity-modulated imaging beam is incident on the corresponding scanning unit U2 as the beam LB2. The lens systems CG2, CG4 and CG6 correspond to a combination of one collimator lens CL and one condenser lens CD in Figs. 26 and 36. Fig.

Using the beam switching member (beam delivery unit) 20B as shown in FIG. 41 described above, the beam LBw from one light source device 14 'is divided into two beams by the polarization beam splitter BS1, The imaging beams LB1, LB3 and LB5 generated by the imaging optical element AOMa from the beams LBs are sequentially incident on any one of the odd-numbered scanning units U1, U3 and U5, The imaging beams LB2, LB4 and LB6 generated by the imaging optical element AOMb from the other beam LBp divided by the splitter BS1 are transmitted to either one of the even-numbered scanning units U2, U4 and U6 It is possible to make an incident in one order.

In the sixth embodiment, the beam LBw from the light source device 14 'is divided into two beams by the polarization beam splitter BS1, and then the beams LB The intensity of the spot light SP by each of the six scanning units U1 to U6 is set so that the attenuation in the polarization beam splitter BS1 is -50% The intensity of the source beam LBw is 100% when the attenuation in the optical elements AOMa and AOMb and the selection optical element AOMn is -20% and the attenuation in the scanning units U1 to U6 is -30% ), Which is about 22.4%. However, when the scanning efficiency of each polygon mirror PM of the six scanning units U1 to U6 is 1/3 or less and the beam LBw from one light source device 14 'is used, It is possible to perform pattern drawing by scanning of the spot light SP in each of the six drawing lines SLn without beam-scanning the reflecting surface RP of the mirror PM by skipping one surface.

[Modified Example 1]

The beams LBs incident on the odd-numbered selection optical elements AOM1, AOM3 and AOM5 and the beams LBp incident on the even-numbered selection optical elements AOM2, AOM4 and AOM6 When the polarization directions are orthogonal, it is necessary to arrange the odd-numbered selection optical element AOMn and the even-numbered selection optical element AOMn by 90 degrees relative to the beam incident axis. Fig. 42 shows a configuration in the case where the selection optical element AOM3 among the odd-numbered selection optical elements AOM1, AOM3, AOM5 is rotated by 90 degrees with respect to the even-numbered selection optical element AOMn . Since the imaging optical element AOM3 receives the imaging beam of the S-polarized light having passed through the lens system CG3, the direction in which the diffraction efficiency is high becomes the Y direction parallel to the XY plane. That is, the selection optical element AOM3 is rotated by 90 degrees so that the periodic direction of the diffraction grating generated in the selection optical element AOM3 is the Y direction.

Due to the arrangement of the selection optical element AOM3, the beam LB3 deflected and emitted when the selection optical element AOM3 is in the on state advances inclined in the Y direction with respect to the advancing direction of the zero-order light . Therefore, the beam LB3 from the optical element for selection AOM3 is split so that the beam LB3 is separated from the optical path of the zero-order light and the beam LB3 passes through the opening TH3 of the support member IUB in the Z- And a mirror IM3b that reflects the beam LB3 reflected by the mirror IM3a in the -Z direction so as to pass through the opening TH3. Similarly, for each of the other odd-numbered selection optical elements AOM1 and AOM5, a set of mirrors IM1a and IM1b and a set of mirrors IM5a and IM5b are provided. 41, the polarization directions of the beams LBs and LBp incident on the imaging optical elements AOMa and AOMb are orthogonal to each other. Therefore, the optical elements for drawing (AOMa and AOMb) Relative to each other.

However, when the polarization beam splitter BS1 in Fig. 41 is a beam splitter or a half mirror of amplitude division, if the polarization direction of the beam LBw is made only in one direction (for example, P polarization) One of the odd-numbered optical elements AOMa and AOMb and the odd-numbered selection optical element AOMn and the even-numbered selection optical element AOMn need not be rotated by 90 degrees relative to each other as shown in Fig.

[Modified Example 2]

In the sixth embodiment, all of the scanning units U1 to U6 corresponding to each of the six optical elements for selection AOM1 to AOM6 are connected to the imaging line SL1 for every reflection surface RP of the polygon mirror PM. To SL6, respectively, in the scanning direction of the spot light SP. The optical elements for selection AOM5 and AOM5 shown in Fig. 41 are arranged so that the beam (the beam modulated by the imaging optical element AOMa), which has passed through the odd-numbered selection optical elements AOM1, AOM3 and AOM5, Three optical elements for selection AOM7, AOM9 and AOM11 are provided in series between the absorber TR2 and beams sequentially passed through the even-numbered selection optical elements AOM2, AOM4 and AOM6 Three additional selection optical elements AOM8, AOM10, and AOM12 are connected in series between the selection optical element AOM6 and the absorber TR1 so as to make the three optical elements AOM1, . The six scanning units U7 to U12 to which the deflected (switched) beams LB7 to LB12 are introduced respectively in the optical elements for selection AOM7 to AOM12 are added to a total of twelve scanning units U1 to U12, Are arranged in the width direction (Y direction) of the substrate FS. As a result, the continuous drawing exposure of the twelve drawing lines SL1 to SL12 becomes possible, and the maximum exposure width in the Y direction can be doubled.

In this case, when the scanning efficiency of each polygon mirror PM of the scanning units U1 to U12 is 1/3 or less, odd-numbered scanning units U1, U3, U5, U7, U9, U1, U11, U6, U8, U10, and U12 grouped as a second imaging module are all formed on the surface of one side of the reflective surface RP of the polygon mirror PM, LBn). In this way, even when the width of the substrate FS in the Y direction is increased, only the scanning units U7 to U12 and the selection optical elements AOM7 to AOM12 are added, 5, Fig. 25) can be rendered. The configuration in which the six scanning units U7 to U12 and the selection optical elements AOM7 to AOM12 are extended to form the twelve scanning units U1 to U12 is the same as the fifth embodiment The same can be applied to the case where the two light source devices 14A 'and 14B' described in FIG. 38 are used.

[Modification 3]

Fig. 43 shows the arrangement relationship of the transporting mode of the substrate FS and the scanning unit Un (drawing line SLn) according to the third modification. Here, twelve scanning units U1 to U12 Are arranged on the rotary drum DR so that the drawing lines SL1 to SL12 of the respective scanning units Un can be jointly exposed and exposed in the Y direction. The length in the direction of the rotary shaft (Y direction) of the rotary drum DR, various rollers R1 to R3, RT1 and RT2, etc. in the substrate transport mechanism 12 shown in Fig. 23 is Hd, Sh (Sh <Hd) is the maximum drawing width in the Y direction that can be exposed by the coupling operation by the unit Un, and Tf is the maximum support width of the substrate FS0 that can be exposed. Each of the twelve scanning units U1 to U12 corresponding to each of the twelve rendering lines SL1 to SL12 in Modification Example 3 is provided with one light source device 14 A beam switching member (beam delivery unit) 20B of the type that splits the beam LBw from the beam splitter 20b into two parts, that is, a beam splitter and a half mirror, 20B from the beam switching member (beam delivery unit) 20A using the beams LBa and LBb from each of the beam splitting members 14A 'and 14B' . Therefore, for example, when the lengths of the drawing lines SL1 to SL12 in the Y direction are 50 mm, the maximum drawing width Sh is 600 mm, and the width of the substrate FS0, which is a maximum support width Tf, is 650 mm, And the length Hd of the discharge space DR can be set to about 700 mm.

When the substrate FS0 having the same width as the maximum support width Tf is exposed by the imaging apparatus shown in Fig. 43, the four alignment microscopes AM1 to AM4 (observation region Vw1 to Vw4) and three alignment microscopes AM5 to AM7 (observation regions Vw5 to Vw7) in the Y direction. In this case, the alignment microscope AM1 (observation region Vw1) and the alignment microscope AM7 (observation region Vw7) located on both sides in the width direction of the substrate FS0 are arranged on both sides of the substrate FS0, An alignment mark formed at a constant pitch in the X direction is detected. In addition, the alignment microscope AM4 (observation region Vw4) is arranged so as to be located substantially at the center of the maximum support width Tf.

In the case of the substrate FS1 capable of patterning in the exposure area W by the drawing lines SL1 to SL6 by each of the six scanning units U1 to U6 as described in the foregoing embodiments, Since the width Tf1 is about half of the maximum support width Tf of the rotary drum DR, the substrate FS1 is carried on the -Y direction side of the outer peripheral surface of the rotary drum DR, for example. At this time, each of the alignment marks MK1 to MK4 (Fig. 25) on the substrate FS1 can be detected by the observation regions Vw1 to Vw4 of the four alignment microscopes AM1 to AM4. In the case of exposure of the substrate FS1, since only the six scanning units U1 to U6 are used, each of the scanning units U1 to U6 is configured so that the polygon mirror PM is a continuous reflecting surface RP, It is possible to perform spot scanning along each of the rendering lines SL1 to SL6 in either of the beam scanning for each of the scanning lines SL1 to SL6 or the one reflection plane (RP) of the polygon mirror PM.

For example, when the beams LBa and LBb from the two light source devices 14A 'and 14B' are set to be used together as in the fifth embodiment, the beam from the light source device 14A ' AOM3, AOM9, AOM9, and AOM11 corresponding to the odd-number scan units U1, U3, U5, U7, U9, and U11 in series, The beam LBa from the light source device 14A 'is grouped in the beam switching member 20A and the beam LBa from the light source device 14A' is grouped in the beam switching member 20A. (AOM2, AOM4, AOM6, AOM8, AOM10, AOM12) in series in the beam switching member 20A. During exposure of the substrate FS1, the odd-numbered scanning units U1, U3, and U3 are turned on based on only the three origin signals SZ1, SZ3, and SZ5 output from the polygon mirror PM for each successive reflecting surface RP. The polygon mirror PM is controlled to repeat the beam scanning for each successive reflecting surface RP in the order of the three origin signals U1 to U5 and the polygon mirror PM is output for each successive reflecting surface RP The polygon mirror PM is controlled so that the beam scanning is repeated for each successive reflective surface RP in the order of the even-numbered scanning units U2, U4, U6 based on only the SZ2, SZ4, SZ6.

When the substrate FS2 having a width Tf2 smaller than the maximum support width Tf and larger than the width Tf1 of the substrate FS1 is exposed, the substrate FS2 is moved to the center of the maximum support width Tf of the rotary drum DR So as to fit the part. At this time, it is assumed that the exposure area W on the substrate FS2 is drawn by the drawing lines SL3 to SL10 by the eight scanning units U3 to U10 connected in the Y direction. In this case, the four optical selection elements AOM3, AOM5, AOM7, and AOM9 of the odd number, from which the beam LBa (intensity modulated beam) from the light source device 14A ' LB5, LB7 and LB9 are sequentially generated and the four optical elements for selection (AOM4, AOM6 (AOM6), and AOM6 AOM8, and AOM10 are controlled to sequentially generate any one of the time-division beams LB4, LB6, LB8, and LB10. Therefore, each of the at least eight scanning units U3 to U10 is set to the mode of one reflection plane (RP) filtered beam scanning of the polygon mirror PM.

During the exposure of the substrate FS2, the four minor point signals ZP3 and ZP5 outputted from one reflection surface RP of each polygon mirror PM of the odd-number scan units U3, U5, U7 and U9 , ZP7, and ZP9), the beam scanning is controlled so that the beam scanning is repeated on one reflection surface RP of the polygon mirror PM in the order of the odd-numbered scanning units U3, U5, U7, and U9, Based on only the four minor point signals (ZP4, ZP6, ZP8, ZP10) outputted through one reflection surface (RP) of each polygon mirror (PM) of each of the first to fourth scanning units (U4, U6, U8, U10) The scanned beam scanning of one reflection surface RP of the polygon mirror PM is controlled to be repeated in the order of the scanning units U4, U6, U8, and U10. In Fig. 43, alignment marks (corresponding to alignment marks MK1 and MK4 in Fig. 25) formed on both sides in the width direction on the substrate FS2 correspond to the observation regions Vw2 and AM3 of the alignment microscopes AM2 and AM6, Vw6. However, depending on the size of the exposure area W in the Y direction, it may not necessarily be arranged in such a relationship. In this case, it is preferable to provide a configuration in which some of the seven alignment microscopes AM1 to AM7 can be moved in the Y direction so that the positional interval of the observation regions Vw1 to Vw7 in the Y direction can be adjusted.

According to the third modified example described above, efficient exposure can be performed using only the necessary scanning unit Un in accordance with the width of the substrate FS to be exposed and the dimension of the exposure area W in the Y direction. When the scanning efficiency of each of the polygon mirrors PM of the twelve scanning units U1 to U12 is 1/3 or less as shown in FIG. 43, for example, three reflection surfaces RP of each polygon mirror PM ), It is possible to perform pattern drawing well over the maximum imaging width Sh, even if the beam from one light source device 14 'is used.

In the case of constructing the drawing apparatus with the nine scanning units U1 to U9, the odd-numbered five scanning units U1, U3, U5, U7 and U9 and the even- U4, U6, U8) are used. Therefore, when patterning in the exposure area W by the imaging lines SL1 to SL9 by all of the nine scanning units U1 to U9, when the scanning efficiency of the polygon mirror PM is 1/3 or less For example, one reflection surface (RP) of each polygon mirror PM may be scanned by beam scanning. In this case, only the minor point signals ZP1, ZP3, ZP5, ZP7, and ZP9 generated from the respective origin signals SZn of the odd-number scan units U1, U3, U5, U7, The spot scanning is performed in each of the odd-numbered imaging lines SL1, SL3, SL5, SL7 and SL9 and the origin signals of the even-numbered scanning units U2, U4, U6 and U8 are repeated, ZP4, ZP6, and ZP8 generated from the even-numbered drawing lines SL2, SL4, SL6, and SL8 are repeated in this order to repeat the spot scanning in each of the even-numbered drawing lines SL2, SL4, SL6, .

As described above, in the modified example 3, a plurality of scanning units Un for scanning the spot light SP of the beam from the light source device 14 'along the drawing line SLn are drawn by each drawing line SLn And a plurality of scanning units and a substrate FS are relatively moved in a sub scanning direction intersecting the main scanning direction with respect to the substrate FS in such a manner that the pattern is arranged so as to extend in the direction of the drawing line SLn (main scanning direction) The width of the substrate FS in the main scanning direction or the width of the main scanning direction of the exposure area to be patterned on the substrate FS or the position of the exposure area is selected from the plurality of scanning units Un Modulated beam based on the pattern data to be drawn in each of the specific scanning units via the beam delivery unit for delivering the beam from the light source device 14 ' The specific scan unit The pattern writing method comprising sequentially supplied to each of the alternative is provided. As a result, in the third modified example, even if the width of the substrate FS changes or the width or position of the exposure area W on the substrate FS changes, the transport position of the substrate FS in the Y direction is appropriately Precision patterning that maintains a high continuous precision can be realized. At this time, not only the rotation speed and the rotation angle phase are synchronized among all the polygon mirrors PM of the plurality of scanning units, but only between the polygon mirrors PM of the specific scanning unit contributing to pattern drawing, The rotational speed or the rotational angle phase may be synchronized.

[Modification 4]

As another configuration of the drawing apparatus using the nine scanning units U1 to U9, the drawing unit Un is not divided into the odd-numbered and the even-numbered groups, but is simply divided into two groups in the order in which the scanning units Un are arranged It is possible. The first scanning module is divided into a first scanning module by six scanning units U1 to U6 and a second scanning module by three scanning units U7 to U9. , And the beam LBb from the second light source device 14B 'may be supplied to the second scanning module. In this case, if the scanning efficiency? /? Of the polygon mirror PM is 1/4 <(? /?)? 1/3, each of the six scanning units U1 to U6 in the first scanning module, The spot light SP is scanned along each of the rendering lines SL1 to SL6 by the filtered scanning of one reflective surface RP of the polygon mirror PM similarly to the fourth embodiment (Fig. 33) do.

On the other hand, each of the three scanning units U7 to U9 in the second scanning module can beam-scan every reflection surface RP of the polygon mirror PM. Therefore, if each of the three scanning units U7 to U9 performs beam scanning for every reflection surface RP of the polygon mirror PM as it is, each of the scanning lines U1 to U6, The time interval ΔTc1 at which the scanning of the spot light SP in the scanning lines SL1 to SL6 is repeated and the time interval ΔTc1 of the spot light The time interval? Tc2 in which the scanning of the scanning lines SL1 to SL9 is repeated is the relation of? Tc1 = 2? Tc2 so that the pattern is drawn on the substrate FS by the drawing lines SL1 to SL6, The pattern drawn on the screen FS becomes different, and good continuous exposure can not be performed.

Thus, in each of the three scanning units U7 to U9 capable of beam scanning for every reflection surface RP of the polygon mirror PM, one reflection surface RP of the polygon mirror PM is subjected to filtered beam scanning . This control is performed by inputting the origin signals SZ7 to SZ9 generated from each of the scanning units U7 to U9 to the circuit of Fig. 31 or the minority point generating circuit CAan of Fig. 38, In response to the minor-point signals ZP7 to ZP9, the corresponding selection optical elements AOM7 to AOM9 are sequentially turned on for a predetermined time Ton, and at the same time, Each of the drawing serial data DL7 to DL9 corresponding to the pattern to be drawn in each of the first to fourth light source devices 14A to 16D is sequentially transmitted to the driving circuit 206a of the electro-optical element 206 in the second light source device 14B ' .

[Modified Example 5]

44 shows the structure of a driver circuit DRVn of the optical element for selection AOMn according to the fifth modification. When each of the plurality of scanning units Un is scanned by more than one reflection surface RP of the polygon mirror PM as in each of the above embodiments or modified examples, the light source device 14 '(14A' And the beams LBs and LBp emitted from the imaging optical elements AOMa and AOMb are transmitted through the plurality of selection optics And transmits the element AOMn. 44, after the beam LB is transmitted through the selection optical elements AOM1 and AOM2, the beam LB3 is switched by the selection optical element AOM3 to generate the beam LB3 directed to the scanning unit U3 . In general, the optical material in the optical element for selection AOMn has a relatively high transmittance with respect to the beam LB (for example, wavelength 355 nm) in the ultraviolet wavelength band, but has a decay rate on the order of several percent.

When the transmittance of the individual optical element AOMn is 95%, when the optical element AOM3 is turned on as shown in Fig. 44, the beam LB incident on the optical element AOM3 for selection, of strength, so, it has the attenuation by the optical element for the two selected (AOM1, AOM2), with respect to the original beam intensity (100%) impinging on the selected optical elements (AOM1) for about 90% (0.95 ²⁾ do. Further, in the case where the six selection optical elements AOM1 to AOM6 are arranged, the intensity of the beam LB incident on the last selection optical element AOM6 is the same as that of the five selection optical elements AOM1 to AOM5 , It becomes about 77% (0.95 ⁵ ) with respect to the original beam intensity (100%).

Thus, the intensity of the beam LB incident on each of the six optical elements AOM1 to AOM6 is 100%, 95%, 90%, 85%, 81%, and 77%, respectively. This means that the intensity of the beams LB1 to LB6 deflected and emitted from each of the optical elements for selection AOM1 to AOM6 also changes at the ratio. Thus, in the fifth modification, in each driver circuit DRVn of the plurality of selection optical elements AOMn shown in Fig. 38, the driving conditions of the selection optical elements AOM1 to AOM6 are adjusted, (LB1 to LB6).

In Fig. 44, the driver circuits DRV1 to DRV6 (DRV5 and DRV6 are not shown) have the same configuration, and therefore, detailed description is made only for the driver circuit DRV1. 38, each of the driver circuits (DRV1 to DRV6) is provided with the on-state ON state of each of the selection optical elements AOM1 to AOM6 (in Fig. 44, the AOM5 and AOM6 are omitted) 44, the high frequency transmission source 400 for applying ultrasonic waves to each of the selection optical elements AOM1 to AOM6 is connected to the input optical element AOM1 to AOM6, The driver circuit DRV1 includes a switching element 401 for receiving a high frequency signal from the high frequency source 400 and switching it to a high speed whether to transmit it to the amplifier 402 amplifying it at a high voltage amplitude, A logic circuit 403 for controlling opening and closing of the switching element 401 on the basis of the information for setting the on-time Ton and the auxiliary point signal ZP1 and the amplification factor (gain) A gain adjustment for adjusting the amplitude of the high-frequency high-frequency signal applied to the element AOM1 (404).

The diffraction efficiency of the selection optical element AOM1 can be finely adjusted by changing the amplitude of the high-frequency high-frequency signal applied to the selection optical element AOM1 within the allowable range, and the beam LB1 deflected and emitted Diffracted light) can be changed. Thus, in the fifth modification, the selection optical element AOM6 on the side away from the light source device 14 'is extended from the driver circuit DRV1 of the selection optical element AOM1 near the light source device 14' The gain adjuster 404 is adjusted so that the amplitude of the high-frequency high-frequency signal applied to the optical element for selection AOMn is increased in the order of the driver circuit DRV6 of the driver circuit DRV6. For example, the amplitude of the high-frequency high-frequency signal applied to the selection optical element AOM6 at the end of the optical path of the beam LB is set to a value Va6 at which the diffraction efficiency is the highest, The amplitude of the high-frequency high-frequency signal applied to the first optical element for selection AOM1 in the optical path of the optical path AOM1 is set to a value Va1 at which the diffraction efficiency is reduced within the allowable range. The amplitudes Va2 to Va5 of the high-frequency high-frequency signal applied to the optical elements AOM2 to AOM5 between them are set so that Va1 <Va2 <Va3 <Va4 <Va5 <Va6.

With the above setting, the intensity unbalance of the beams LB1 to LB6 emitted from each of the six optical elements for selection AOM1 to AOM6 can be mitigated or suppressed. This makes it possible to suppress the unevenness of the exposure amount of the pattern drawn by each of the drawing lines SL1 to SL6, thereby enabling high-precision pattern drawing. The amplitudes Va1 to Va6 of the high-frequency high-frequency signal set by the driver circuits DRV1 to DRV6 do not have to be gradually increased in that order. For example, Va1 = Va2 &lt; Va3 = Va4 & The intensity of the imaging beams LB1 to LB6 serving as the spot light SP for each of the scanning units U1 to U6 may be adjusted in the same manner as in the fifth modification , Or a method of providing a neutral density filter (ND filter) having a predetermined transmittance in the optical paths in the respective scanning units U1 to U6.

In the driver circuit DRVn of FIG. 44, it is determined whether or not to transmit the high-frequency signal from the high-frequency source 400 to the amplifier 402 by the switching element 401. [ However, in order to increase the response (start-up characteristic) at the time of switching on / off of the selection optical element AOMn, a state in which the diffraction efficiency can be regarded as substantially zero, for example, Frequency signal of 1/1000 or less with respect to the intensity of the ON state is continuously applied to the selection optical element AOMn and the high-frequency signal of the appropriate high level is applied to the selection optical element AOMn . Fig. 45 shows the structure of such a driver circuit DRVn, and the structure of the driver circuit DRV1 is exemplarily shown here, and the same elements as those in Fig. 44 are assigned the same reference numerals.

In the configuration of Fig. 45, two resistors RE1 and RE2 connected in series are added. The series circuit of the resistors RE1 and RE2 is inserted in parallel into the high frequency source 400 in front of the switching element 401 so that the high frequency signal from the high frequency source 400 divided by the resistance ratio RE2 / (RE1 + RE2) And is applied to the constant-current amplifier 402. When the resistance RE2 is a variable resistor and the intensity of the first order diffracted light, that is, the beam LB1, emitted from the optical element for selection AOM1 is sufficiently high when the switching element 401 is off (non-conducting) The level of the high-frequency signal applied to the optical element for selection AOM1 is adjusted so as to be a small value (for example, 1/1000 or less of the original intensity). Thus, by applying the bias (rise) of the high-frequency signal to the selection optical element AOM1 by the resistors RE1 and RE2, the response can be enhanced. In this case, the beam LB1 is incident on the corresponding scanning unit U1 even though the switching element 401 is in the off (non-conducting) state. Therefore, When the conveyance speed of the substrate FS is reduced or stopped, the shutter provided at the exit of the light source device 14 '(14A', 14B ') is closed or the photosensitive filter is inserted.

[Modified Example 6]

In each of the above-described embodiments and modified examples, the sheet-like substrate FS is brought into close contact with the outer circumferential surface of the rotary drum DR, and the surface of the substrate FS curved in a cylindrical surface- The pattern drawing is performed along the drawing line SLn by each of the plurality of scanning units Un. However, for example, as disclosed in International Publication No. 2013/150677 pamphlet, the substrate FS may be supported in a planar shape while being exposed in a long direction while performing exposure processing. In this case, assuming that the surface of the substrate FS is set to be parallel to the XY plane, for example, the irradiation central axes Le1 (U1, U3, U5) of the odd- Le3 and Le5 of the even scan units U2 and U4 and U6 are parallel to the Z axis when viewed in a plane parallel to the XZ plane A plurality of scanning units U1 to U6 may be arranged so as to be spaced apart from each other in the X direction.

Claims (15)

On the object to be irradiated by scanning spot light of the intensity-modulated intensity beam based on the drawing information indicating the ON state for drawing the pixels of the pattern and the drawing information indicating the OFF state for rendering the object, A light source device for patterning, which projects the imaging beam for imaging a pattern,
A first polarization state in which pulse oscillation is performed so that the first peak intensity is at a predetermined frequency Fs higher than a frequency determined by Vs / Ds when the effective size of the spot light in the scanning direction is Ds and the scanning speed of the spot light is Vs, A first laser light source unit for generating a first seed light of the first laser light source,
Energy is the same as the first peak, a pulse oscillates at the predetermined frequency Fs at a second peak intensity lower than the first peak intensity, and a polarization direction is 90 degrees with respect to the first polarization state A second laser light source section for generating a second sheated light in the second polarized light state,
When the drawing information indicates the off state, the first and second heights are emitted without modulating the polarization states of the first and second heights, and the drawing information is in the on state An electro-optical element for modulating the first light from the first polarization state to the second polarization state and modulating the second light from the second polarization state to the first polarization state for emission,
A polarizing beam splitter for causing one of the first and second light beams, which is emitted from the electro-optical element to enter the second polarization state, to enter the optical amplifier;
The wavelength of the first healds emitted from the optical amplifier is converted into a pulse light of an ultraviolet wavelength having a high peak intensity, and the wavelength of the second healds emitted from the optical amplifier when the off- And a wavelength conversion optical member for converting the pulsed light into pulsed light having an ultraviolet wavelength with a low peak intensity to generate the imaging beam. The method according to claim 1,
Wherein the rendering information is a bit stream of binary data indicating either the ON state or the OFF state for each of a plurality of pixels divided in the scanning direction of the spot light,
And a driving circuit for outputting a driving signal for modulating the polarization state of the electro-optical element in response to the applied bit stream. The method of claim 2,
And a frequency of a clock signal for applying the bit stream to the driving circuit portion by one bit is Fcc, the predetermined frequency Fs and the frequency Fcc are set to n · Fcc = Fs is set to a relationship of Fs. The method of claim 3,
The first laser light source unit and the second laser light source unit are made to pulse-oscillate in response to a clock pulse of the clock signal of the predetermined frequency Fs to generate the first and second pulses in a pulse shape, The first laser light source unit and the second laser light source unit are arranged such that the energy of one pulse of the first healds and the energy of one pulse of the second healds generated in response to the clock pulse, And a control circuit for controlling the light source. The method of claim 4,
Wherein the bit stream to be applied to the driving circuit portion is a reference signal which is generated every time when each reflection surface of the rotary polygonal mirror becomes a predetermined angle when the imaging beam is deflected by the rotary polygonal mirror for scanning the spot light, And a light source for emitting the pattern. The method according to any one of claims 1 to 5,
Wherein the optical amplifier is a fiber optical amplifier that receives either one of the first and second light beams alternately projected from the polarization beam splitter and a predetermined excitation light. The method of claim 6,
Wherein each of the first laser light source portion and the second laser light source portion includes a DFB semiconductor laser element for generating the first and second light beams. The method of claim 6,
And a movable shutter which closes an injection window of the imaging beam in a non-projection period in which pattern drawing is not performed. The method according to any one of claims 1 to 5,
Wherein each of the first laser light source portion and the second laser light source portion includes a DFB semiconductor laser element for generating the first and second light beams. The projection beam is projected onto a substrate which is intensity-modulated based on imaging information indicating an on state for imaging pixels of a pattern and an off state for non-imaging, onto a substrate moving in one direction, An exposure light source device for supplying said imaging beam to an exposure apparatus,
A first laser light source section for generating a first laser light of a first polarization state oscillating so as to have a first peak intensity at a predetermined frequency Fs in a range of 100 MHz to 400 MHz,
Energy is the same as the first peak, a pulse oscillates at the predetermined frequency Fs at a second peak intensity lower than the first peak intensity, and a polarization direction is 90 degrees with respect to the first polarization state A second laser light source section for generating a second sheated light in the second polarized light state,
When the drawing information indicates the off state, the first and second heights are emitted without modulating the polarization states of the first and second heights, and the drawing information is in the on state An electro-optical element for modulating the first light from the first polarization state to the second polarization state and modulating the second light from the second polarization state to the first polarization state for emission,
A polarizing beam splitter for causing one of the first and second light beams, which is emitted from the electro-optical element to enter the second polarization state, to enter the optical amplifier;
The wavelength of the first healds emitted from the optical amplifier is converted into a pulse light of an ultraviolet wavelength having a high peak intensity, and the wavelength of the second healds emitted from the optical amplifier when the off- And a wavelength conversion optical member for converting the pulse light into an ultraviolet light having a low peak intensity and generating the imaging beam. The method of claim 10,
The first laser light source unit and the second laser light source unit are made to pulse-oscillate in response to a clock pulse of the clock signal of the predetermined frequency Fs to generate the first and second pulses in a pulse shape, The first laser light source unit and the second laser light source unit are arranged such that the energy of one pulse of the first healds and the energy of one pulse of the second healds generated in response to the clock pulse, And a control circuit for controlling the light source. The method of claim 11,
Wherein the optical amplifier is a fiber optical amplifier that receives either one of the first and second light beams that is alternatively emitted from the polarization beam splitter and the predetermined excitation light. The method according to any one of claims 10 to 12,
Wherein each of the first laser light source portion and the second laser light source portion includes a DFB semiconductor laser element for generating the first and second heights. 14. The method of claim 13,
And a movable shutter that closes an injection window of the imaging beam in a non-projection period during which the pattern is not exposed. 15. The method of claim 14,
Wherein the predetermined frequency Fs is set to any one of 100 MHz, 200 MHz, 300 MHz, and 400 MHz.

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